JPH0434447B2 - - Google Patents
Info
- Publication number
- JPH0434447B2 JPH0434447B2 JP15422885A JP15422885A JPH0434447B2 JP H0434447 B2 JPH0434447 B2 JP H0434447B2 JP 15422885 A JP15422885 A JP 15422885A JP 15422885 A JP15422885 A JP 15422885A JP H0434447 B2 JPH0434447 B2 JP H0434447B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- collective
- gas treatment
- guide chamber
- piping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004891 communication Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 118
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000009434 installation Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Pipeline Systems (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はガスを各ガス処理装置へ送つて処理し
たのち、集めて、他の工程へ排出する集合ガス処
理装置の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to an improvement in a collective gas treatment device that sends gas to each gas treatment device for treatment, then collects and discharges the gas to other processes.
（従来の技術）
従来の集合ガス処理装置には、例えば(i)特開昭
54−158596号公報に記載のもの、(ii)特公昭55−
25893号公報に記載のものがある。前記(i)の集合
ガス処理装置は、複数台のガス処理装置を連絡す
るガス配管を集合ガス処理装置の内部に設けたも
のであり、前記(ii)の集合ガス処理装置は、複数台
のガス処理装置を連絡するガス配管を集合ガス処
理装置の外部に設けたものである。(Prior art) Conventional collective gas processing equipment includes, for example, (i)
54-158596, (ii) Special Publication No. 1585-
There is one described in Publication No. 25893. The collective gas treatment equipment in (i) above is equipped with gas piping that connects multiple gas treatment equipments, and the collective gas treatment equipment in (ii) above is equipped with gas piping that connects multiple gas treatment equipments. Gas piping that connects the gas treatment equipment is provided outside the collective gas treatment equipment.
また従来の集合ガス処理装置のさらに他の例と
しては、、(iii)特開昭57−113830号公報に記載のも
のがある。この集合ガス処理装置は、集合ガス処
理装置の上部にガス配管を設け、さらに同ガス配
管と複数台のガス処理装置とを同ガス配管から分
かれた複数の分岐配管により接続したものであ
る。 Further, as yet another example of the conventional collective gas treatment apparatus, there is one described in (iii) Japanese Patent Application Laid-Open No. 113830/1983. This collective gas processing device has a gas pipe provided above the collective gas processing device, and further connects the gas pipe and a plurality of gas processing devices through a plurality of branch pipes separated from the gas pipe.
（発明が解決しようとする問題点）
前記(i)の集合ガス処理装置は、複数種類のガス
配管のための空間部を必要としており、集合ガス
処理装置の全体が大型化して、製作コストが高く
なる。また前記(ii)の集合ガス処理装置は、集合ガ
ス処理装置外で大気中で接続する必要があつて、
厳密にシールしなければならない上に、接続個所
が多くて、製作コストが高くなる。また前記(iii)の
集合ガス処理装置は、集合ガス処理装置上部のガ
ス配管から分かれた複数の分岐配管におけるガス
の通路抵抗が大きい。またこのガスの通路抵抗を
低減するために、分岐配管の径を大きくすると集
合ガス処理装置の全体が大型化して、製作コスト
が高くなるという問題があつた。(Problems to be Solved by the Invention) The collective gas treatment device described in (i) above requires spaces for multiple types of gas piping, which increases the overall size of the collective gas treatment device and increases manufacturing costs. It gets expensive. In addition, the collective gas treatment equipment in (ii) above needs to be connected in the atmosphere outside the collective gas treatment equipment,
In addition to requiring strict sealing, there are many connection points, which increases manufacturing costs. Further, in the collective gas processing device (iii), the gas passage resistance in the plurality of branch pipes separated from the gas pipe in the upper part of the collective gas processing device is large. Furthermore, if the diameter of the branch piping is increased in order to reduce the gas passage resistance, there is a problem in that the overall size of the collective gas treatment apparatus becomes large and the manufacturing cost increases.
また従来の集合ガス処理装置では、カスケード
状に配置する場合、第４，５図に示すように、各
ガス処理装置１からガス配管２ａ，２ｂ，２ｃを
延設して、同各ガス配管２ａ，２ｂ，２ｃを各ガ
ス配管３ａ，３ｂ，３ｃに接続しているが、この
場合には、集合ガス処理装置の据付スペースの全
域にわたりガス配管を必要とするために、ガス配
管の製作費及び据付費が嵩むという問題があつ
た。 In addition, in conventional collective gas treatment apparatuses, when arranged in a cascade, gas pipes 2a, 2b, 2c are extended from each gas treatment apparatus 1, as shown in FIGS. , 2b, 2c are connected to each gas piping 3a, 3b, 3c, but in this case, gas piping is required throughout the entire installation space of the collective gas treatment equipment, so the manufacturing cost and cost of the gas piping are increased. There was a problem of high installation costs.
（問題点を解決するための手段）
本発明は前記の問題点に対処するもので、集合
容器の内部に複数台のガス処理装置を収納した集
合ガス処理装置において、前記集合容器の上部を
共通のカバーにより覆つて同カバーと前記各ガス
処理装置との間にガス案内室を形成し、同ガス案
内室の内部に１つ以上の集合ガス室を設けて、同
集合ガス室と前記各ガス処理装置とを前記ガス案
内室の内部に配設した内部配管及び連絡口を介し
て接続したことを特徴とする集合ガス処理装置に
係わり、その目的とする処は、製作コストを低減
できる。据付面積を節減できる。さらに信頼性を
向上できる改良された集合ガス処理装置を供する
点にある。(Means for Solving the Problems) The present invention addresses the above-mentioned problems, and provides a collective gas processing apparatus in which a plurality of gas processing apparatuses are housed inside a collective vessel, in which the upper part of the collective vessels is shared. A gas guide chamber is formed between the cover and each of the gas processing devices, and one or more collective gas chambers are provided inside the gas guide chamber, and the collective gas chamber and each of the gases are The present invention relates to a collective gas processing device characterized in that it is connected to a processing device through an internal pipe and a communication port arranged inside the gas guide chamber, and the object thereof is to reduce manufacturing costs. Installation area can be reduced. Another object of the present invention is to provide an improved collective gas treatment device that can further improve reliability.
（実施例）
次に本発明の集合ガス処理装置を第１図に示す
一実施例により説明すると、１′が複数台のガス
処理装置、４が同各ガス処理装置１′を収納した
集合容器、８ａが両端部のガス処理装置１′を除
く他の各ガス処理装置１′の上端開口部を覆うフ
ランジ、８ｂ，８ｃは両端部のガス処理装置１′
の上端開口部を覆うフランジ、５が同集合容器４
の上部を覆うカバーで、同カバー５と上記集合容
器４との間は溶接等によりシールされ、また同カ
バー５と上記各ガス処理装置１′のフランジ８ａ，
８ｂ，８ｃとの間にガス案内室６ａが形成されて
いる。同ガス案内室６ａの内部のうち、両端部の
ガス処理装置１′のフランジ８ｂ，８ｃの真上に
は、同フランジ８ｂ，８ｃと上部仕切板７ｂ，７
ｃとにより集合ガス室６ｂ，６ｃが形成されてい
る。また８a′，８a″，８ａが両端部のガス処理
装置１′を除く他の各ガス処理装置１′の上端開口
部を覆うフランジ８ａに設けたガス通路、８b′，
８b″，８ｂが一端部のガス処理装置１′の上端
開口部を覆うフランジ８ｂに設けたガス通路、８
c′，８c″，８ｃが他端部のガス処理装置１′の
上端開口部を覆うフランジ８ｃに設けたガス通
路、９ｂ，９ｃが上記集合ガス室６ｂの内部に設
けた内部配管、１０ａが上記ガス案内室６ａに開
口した集合ガス配管の入口管、１１ｂ，１１ｃが
上記集合ガス室６ｂ，６ｃから延びた集合ガス配
管の出口管である。また第２，３図は、上記第１
図の集合ガス処理装置１２をカスケード配置した
場合の配管図で、１０が各集合ガス処理装置１２
を接続する集合ガス配管である。(Embodiment) Next, the collective gas treatment apparatus of the present invention will be explained with reference to an embodiment shown in FIG. , 8a is a flange that covers the upper end opening of each gas treatment device 1' other than the gas treatment device 1' at both ends, and 8b and 8c are flanges that cover the upper end openings of the gas treatment devices 1' at both ends.
5 is a flange covering the upper end opening of the container 4
The space between the cover 5 and the collecting vessel 4 is sealed by welding or the like, and the flanges 8a,
A gas guide chamber 6a is formed between 8b and 8c. Inside the gas guide chamber 6a, the flanges 8b, 8c and the upper partition plates 7b, 7 are located directly above the flanges 8b, 8c of the gas treatment device 1' at both ends.
collective gas chambers 6b and 6c are formed by c. Further, 8a', 8a'', 8a are gas passages provided in the flange 8a that covers the upper end opening of each gas treatment apparatus 1' except for the gas treatment apparatus 1' at both ends, 8b',
8b'', 8b is a gas passage provided in a flange 8b covering the upper end opening of the gas treatment device 1' at one end;
c', 8c'', 8c are gas passages provided in the flange 8c covering the upper end opening of the gas treatment device 1' at the other end; 9b, 9c are internal pipes provided inside the collective gas chamber 6b; 10a is The inlet pipes 11b and 11c of the collective gas pipes opening into the gas guide chamber 6a are the outlet pipes of the collective gas pipes extending from the collective gas chambers 6b and 6c.
In the piping diagram when the collective gas treatment devices 12 shown in the figure are arranged in a cascade, 10 indicates each collective gas treatment device 12.
This is the collective gas piping that connects the
（作用）
次に前記第１，２，３図の集合ガス処理装置の
作用を説明する。集合ガス配管１０の入口管１１
ａからガス案内室６ａへ供給されたガスは、同ガ
ス案内室６ａ内を流れて、各ガス処理装置１′の
ガス通路８a′，８b′，８c′から同各ガス処理装置
１′内へ供給され、また同各ガス処理装置１′で処
理されたガスは、同各ガス処理装置１′の８a′，
８ａ，８b″，８ｂ，８c″，８ｃから内部配
管９ａ及び９ｂ内を流れて集合ガス室６ｂ，６ｃ
に集約され、さらに外部配管１１ｂ及び１１ｃか
ら他のガス処理装置１′へ供給される。(Function) Next, the function of the collective gas treatment apparatus shown in FIGS. 1, 2, and 3 will be explained. Inlet pipe 11 of collective gas pipe 10
The gas supplied to the gas guide chamber 6a from the gas guide chamber 6a flows through the gas guide chamber 6a, and enters the gas treatment device 1' through the gas passages 8a', 8b', and 8c' of each gas treatment device 1'. The gas supplied and processed in each gas processing device 1' is transferred to 8a' and 8a' of each gas processing device 1'.
8a, 8b'', 8b, 8c'', 8c through internal pipes 9a and 9b to collect gas chambers 6b, 6c.
and further supplied to other gas processing equipment 1' from external pipes 11b and 11c.
（発明の効果）
本発明は前記のように集合容器の内部に複数台
のガス処理装置を収納した集合ガス処理装置にお
いて、前記集合容器の上部を共通のカバーにより
覆つて同カバーと前記各ガス処理装置との間にガ
ス案内室を形成し、同ガス案内室の内部に１つ以
上の集合ガス室を設けて、同集合ガス室と前記各
ガス処理装置とを前記ガス案内室の内部に配設し
た内部配管及び連絡口を介して接続しており、同
内部配管及び連絡口を介して接続しており、同内
部配管が上記ガス案内室の内部にあつて、同内部
配管の内部と外部とに圧力差が生ぜず、同内部配
管の接続を厳密なシールを必要とせずに接続でき
て、製作コストを低減できる。また前記集合容器
の上部を共通のカバーにより覆つて同カバーと前
記各ガス処理装置との間に、ガスの流路抵抗の小
さいガス案内室（ガス通路）を設けており、集合
ガス処理装置をカスケード配置にした場合に、集
合ガス処理装置間のガス配管を第２，３図に示す
ように簡略化できて、カスケード当りのガス配管
数を従来に比べ減少できて、この点でも製作コス
トを低減できる。また上記のようにカスケード当
たりのガス配管数を従来に比べ減少できるので、
集合ガス処理装置の配置を稠密化できて、据付面
積を節減できる。またガス配管の接続部の数が減
少するので、集合ガス処理装置の信頼性を向上で
きる効果がある。(Effects of the Invention) The present invention provides a collective gas processing apparatus in which a plurality of gas processing apparatuses are housed inside a collective vessel as described above, in which the upper part of the collective vessel is covered with a common cover, and the cover and each gas A gas guide chamber is formed between the gas guide chamber and the gas guide chamber, one or more collective gas chambers are provided inside the gas guide chamber, and the collective gas chamber and each of the gas processing devices are connected to the gas guide chamber. The internal piping is located inside the gas guide chamber, and the internal piping is connected to the inside of the gas guide chamber. There is no pressure difference with the outside, and the internal piping can be connected without requiring strict sealing, reducing manufacturing costs. Further, the upper part of the collective container is covered with a common cover, and a gas guide chamber (gas passage) with low gas flow resistance is provided between the cover and each of the gas treatment devices, and the collective gas treatment device is When using a cascade arrangement, the gas piping between the collective gas treatment devices can be simplified as shown in Figures 2 and 3, and the number of gas piping per cascade can be reduced compared to the conventional method, which also reduces manufacturing costs. Can be reduced. Also, as mentioned above, the number of gas pipes per cascade can be reduced compared to conventional methods.
The arrangement of the collective gas treatment equipment can be made denser, and the installation area can be reduced. Furthermore, since the number of gas piping connections is reduced, there is an effect that the reliability of the collective gas treatment apparatus can be improved.
以上本発明を実施例について説明したが、勿論
本発明はこのような実施例にだけ局限されるもの
ではなく、本発明の精神を逸脱しない範囲で種々
の設計の改変を施しうるものである。 Although the present invention has been described above with reference to embodiments, it goes without saying that the present invention is not limited to such embodiments, and can be modified in various ways without departing from the spirit of the present invention.
第１図は本発明に係わる集合ガス処理装置の一
実施例を示す縦断側面図、第２図は同集合ガス処
理装置をカスケード構成にした場合の配管系統
図、第３図は第２図の矢視−線に沿う側面
図、第４図は従来の集合ガス処理装置を示す側面
図、第５図は第４図の矢視−線に沿う側面図
である。
１′……ガス処理装置、５……カバー、６ａ…
…ガス案内室、６ｂ，６ｃ……集合ガス室、８
a′，８a″，８ａ，８b′，８b″，８ｂ，８c′，
８c″，８ｃ……連絡口、９ｂ，９ｃ……内部配
管。
Fig. 1 is a vertical cross-sectional side view showing one embodiment of the collective gas treatment device according to the present invention, Fig. 2 is a piping system diagram when the same collective gas treatment device is configured in a cascade configuration, and Fig. 3 is the same as that shown in Fig. 2. 4 is a side view showing a conventional collective gas treatment apparatus, and FIG. 5 is a side view taken along the line shown in FIG. 4. 1'...Gas treatment device, 5...Cover, 6a...
...Gas guide room, 6b, 6c...Collected gas chamber, 8
a', 8a'', 8a, 8b', 8b'', 8b, 8c',
8c'', 8c...Connection port, 9b, 9c...Internal piping.
Claims (1)
納した集合ガス処理装置において、前記集合容器
の上部を共通のカバーにより覆つて同カバーと前
記各ガス処理装置との間にガス案内室を形成し、
同ガス案内室の内部に１つ以上の集合ガス室を設
けて、同集合ガス室と前記各ガス処理装置とを前
記ガス案内室の内部に配設した内部配管及び連絡
口を介して接続したことを特徴とする集合ガス処
理装置。1. In a collective gas processing device in which a plurality of gas processing devices are housed inside a collective container, the upper part of the collective container is covered with a common cover to form a gas guide chamber between the cover and each of the gas processing devices. death,
One or more collective gas chambers are provided inside the gas guide chamber, and the collective gas chambers and each of the gas processing devices are connected through internal piping and communication ports arranged inside the gas guide chamber. A collective gas processing device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15422885A JPS6214927A (en) | 1985-07-15 | 1985-07-15 | Apparatus for treating gathering gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15422885A JPS6214927A (en) | 1985-07-15 | 1985-07-15 | Apparatus for treating gathering gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6214927A JPS6214927A (en) | 1987-01-23 |
| JPH0434447B2 true JPH0434447B2 (en) | 1992-06-08 |
Family
ID=15579651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15422885A Granted JPS6214927A (en) | 1985-07-15 | 1985-07-15 | Apparatus for treating gathering gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6214927A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6159644A (en) * | 1996-03-06 | 2000-12-12 | Hitachi, Ltd. | Method of fabricating semiconductor circuit devices utilizing multiple exposures |
-
1985
- 1985-07-15 JP JP15422885A patent/JPS6214927A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6214927A (en) | 1987-01-23 |
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