JPH0434448B2 - - Google Patents

Info

Publication number
JPH0434448B2
JPH0434448B2 JP61112790A JP11279086A JPH0434448B2 JP H0434448 B2 JPH0434448 B2 JP H0434448B2 JP 61112790 A JP61112790 A JP 61112790A JP 11279086 A JP11279086 A JP 11279086A JP H0434448 B2 JPH0434448 B2 JP H0434448B2
Authority
JP
Japan
Prior art keywords
chamber
ultrafine
ultrafine particles
group
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61112790A
Other languages
Japanese (ja)
Other versions
JPS62269743A (en
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vacuum Metallurgical Co Ltd
Original Assignee
Vacuum Metallurgical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vacuum Metallurgical Co Ltd filed Critical Vacuum Metallurgical Co Ltd
Priority to JP61112790A priority Critical patent/JPS62269743A/en
Publication of JPS62269743A publication Critical patent/JPS62269743A/en
Publication of JPH0434448B2 publication Critical patent/JPH0434448B2/ja
Granted legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006Processes utilising sub-atmospheric pressure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、弧立又は短チエイン状超微粒子の製
造法並に製造装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method and apparatus for producing ultrafine particles in the form of arcuate or short chains.

(従来の技術) 従来の超微粉体の製造は、ガス中蒸発法により
生成しているが、捕集室で付着し、回収した超微
粒子は凝集態となつたり、超微粒子が40〜50ケつ
ながり、長さにして1μm以上の長チエイン状超
微粒子の集合体として得られるので、磁気記録材
料として基材に塗布する場合、容易に分散しなか
つたり、高密度磁性塗膜が得られないなどの不都
合をもたらした。この従来の製造法の欠点を解消
する発明は、弧立超微粒子の生成法並に生成装置
は、特開昭60−78635号などで公知である。
(Prior art) Conventional ultrafine powder is produced by evaporation in gas, but the ultrafine particles adhere in the collection chamber and are collected into an agglomerated state. Since it is obtained as an aggregate of long chain-like ultrafine particles with a length of 1 μm or more, it is not easily dispersed or a high-density magnetic coating cannot be obtained when applied to a substrate as a magnetic recording material. This caused such inconvenience. An invention for solving the drawbacks of this conventional manufacturing method, a method and a device for producing erect ultrafine particles, is known in Japanese Patent Application Laid-Open No. 78635/1983.

(発明が解決しようとする問題点) 上記に鑑み、上記提案の発明に基き、その弧立
超微粒子から成る超微粉の生産性を高めることが
望ましい。又、例えば磁気記録材料として基材に
塗布用として最適とされる弧立超微粒子或は短チ
エイン状超微粒例えば、超微粒子が5〜10ケ程度
つながり、長さで0.15〜0.3μm程度の短チエイン
超微粒子の集合体から成る超微粉体が必要に応じ
製造できることが望ましい。
(Problems to be Solved by the Invention) In view of the above, it is desirable to increase the productivity of ultrafine powder made of vertical ultrafine particles based on the above proposed invention. In addition, for example, arcuate ultrafine particles or short chain-like ultrafine particles are suitable for coating on substrates as magnetic recording materials, for example, about 5 to 10 ultrafine particles are connected and short particles with a length of about 0.15 to 0.3 μm are used. It is desirable that ultrafine powder consisting of an aggregate of chain ultrafine particles can be produced as needed.

(問題点を解決するための手段) 本発明は、上記の要望を満足する弧立超微粒子
の製造法を提供するもので、ガス中蒸発法により
生成した超微粒子蒸気を生成せしめる超微粒子生
成室と、該生成室内の蒸発源に対向して先端が開
口し後端が高真空室に連通する細管を設け、該真
空室内の真空度を該生成室内の真空度よりも高め
て差圧を生ぜしめ、これによりり該生成室内の蒸
気を該細管を介して該真空室側へ引込むようにし
た弧立超微粒子の製造法において、細管を互に空
〓を存して多数本で構成し、該細管群の下端面積
を前記蒸発源の面積より大きくし、かつ該細管群
の下端と該蒸発源の距離を調節可能に構成し、該
細管群を介して生成室内に生成した超微粒子蒸気
を該真空室側へ引込むようにしたことを特徴とす
る。
(Means for Solving the Problems) The present invention provides a method for producing vertical ultrafine particles that satisfies the above-mentioned needs. A thin tube is provided at the tip facing the evaporation source in the generation chamber and whose rear end communicates with the high vacuum chamber, and the degree of vacuum in the vacuum chamber is made higher than the degree of vacuum in the generation chamber to generate a pressure difference. In a method for producing erect ultrafine particles in which the vapor in the generation chamber is drawn into the vacuum chamber through the thin tubes, the thin tubes are composed of a large number of tubes with air space between them. The lower end area of the capillary tube group is made larger than the area of the evaporation source, and the distance between the lower end of the capillary tube group and the evaporation source is configured to be adjustable, and the ultrafine particle vapor generated in the generation chamber is transferred through the capillary tube group to the evaporation source. It is characterized by being drawn into the vacuum chamber side.

その第2発明は、前記の短チエイン状超微粒子
の製造法を提供するもので、ガス中蒸発法により
生成した超微粒子蒸気を生成せしめる超微粒子生
成室と、該生成室内の蒸発源に対向して先端が開
口し後端が高真空室に連通する細管を多数本併設
し、該細管群の外周に、磁化装置を設け、該真空
室内の真空度を該生成室内の真空度より高めて差
圧を生ぜしめ、これにより該生成室内の蒸気を該
細管群を介して該真空室側へ引込むようにすると
共に各細管内に該磁化装置により生成せしめた磁
場内を該超微粒子を通過させるようにしたことを
特徴とする。
The second invention provides a method for producing the above-mentioned short chain-shaped ultrafine particles, and includes an ultrafine particle generation chamber that generates ultrafine particle vapor generated by an evaporation method in a gas, and an evaporation source in the generation chamber that faces the ultrafine particle vapor. A large number of thin tubes each having an open tip and a rear end communicating with a high vacuum chamber are provided, and a magnetization device is provided around the outer periphery of the group of thin tubes, and the degree of vacuum in the vacuum chamber is higher than the degree of vacuum in the generation chamber. A pressure is generated, thereby drawing the vapor in the generation chamber into the vacuum chamber through the group of capillary tubes, and causing the ultrafine particles to pass through the magnetic field generated by the magnetization device in each capillary tube. It is characterized by what it did.

更に、その第3発明は、上記の弧立又は短チエ
イン状超微粒子の製造装置を提供するもので、ガ
ス中蒸発法により生成した超微粒蒸気を生成せし
める超微粒子生成室と、該生成室内の蒸発源に対
向して先端が開口し後端が高真空室に夫々連通し
て設けた多数本の細管と該細管群の外周に設けた
磁化装置とから成り、且つ該高真空室の1部を超
微粒子表面処理室に構成して成る。
Furthermore, the third invention provides an apparatus for producing the above-mentioned vertical or short chain-shaped ultrafine particles, which includes an ultrafine particle generation chamber for generating ultrafine vapor produced by an in-gas evaporation method, and It consists of a large number of thin tubes each having an open tip facing the evaporation source and a rear end communicating with a high vacuum chamber, and a magnetization device provided on the outer periphery of the group of thin tubes, and is a part of the high vacuum chamber. is configured in an ultrafine particle surface treatment chamber.

(実施例) 第1図及び第2図は、本発明の方法並に装置の
実施例を示す。1は、超微粒子を蒸発生成せしめ
る生成室を示し、該生成室1は、その底壁にガス
導入管2を有し、その内部下位に蒸発材料3を収
容したるつぼ4とその外周に誘電加熱コイル5と
を有し、その生成室1の口縁壁に外部の真空排気
装置に接続する排気口6を設ける。本発明によれ
ば、前記蒸発源、即ちるつぼ4の上方に、所要の
間隔を存して多数本の細管7を垂直に且つ互に平
行に延び、生成室1の上端壁を気密に貫通する細
管群8を設ける。これら細管群8は、細管7相互
を接して束状に併設してもよいが、図示のよう
に、後記するように、各細管7は冷却又は加熱媒
体により冷却又は加熱を夫々受けるように、互に
所望の空隙9を存するように併設される。外部に
導出した細管群8の外端、即ち各細管7の外端
は、後記するように、生成室1の真空度より高い
真空度に保たれる高真空室10内に開口連通して
いる。該高真空室10は、外部の真空排気ポンプ
に連なる真空排気管11を備え、これに介入した
調節弁12を介し、高真空室10内を所要の真空
度に保持するようにする。該高真空室10の後端
側は超微粒子捕集室13とする。即ち、該高真空
室10の上壁の1部にその内部を2つに仕切り自
在の仕切りバルブ14を、上下方向に前進後退動
自在に設け、その高真空室10の端部側の空間内
を捕集室13とする。該捕集室13の下端には、
大気に連なる前記真空排気装置の真空排気管15
を調節弁16を介して設ける。捕集室13内に
は、必要に応じ皿状の回収容器やサプストレート
などを予め収容してもよい。捕集室13の端壁は
気密の開閉扉に構成する。図面で17は、覗き窓
を示す。図示の実施例の該細管群8は、高さスペ
ースを可及的に取らないように、その途中より屈
曲し水平に延びる屈曲細管群に構成した。該高真
空室10は、必要に応じ、その下方に、その水平
細管群8の下方に位置して超微粒子コーテイング
用の蒸発材料の加熱蒸発装置18を収容した蒸発
室19を設けて超微粒子用表面処理室に構成する
ことができる。
(Example) Figures 1 and 2 show an example of the method and apparatus of the present invention. Reference numeral 1 indicates a generation chamber in which ultrafine particles are evaporated, and the generation chamber 1 has a gas introduction pipe 2 on its bottom wall, a crucible 4 containing an evaporation material 3 in the lower part thereof, and a dielectric heating on its outer periphery. The generation chamber 1 has a coil 5 and an exhaust port 6 connected to an external evacuation device on the edge wall of the generation chamber 1. According to the present invention, above the evaporation source, that is, the crucible 4, a plurality of thin tubes 7 extend vertically and parallel to each other at a required interval, and penetrate the upper end wall of the production chamber 1 in an airtight manner. A group of thin tubes 8 is provided. These thin tube groups 8 may be arranged in a bundle with the thin tubes 7 in contact with each other. They are placed side by side so that a desired gap 9 exists between them. The outer end of the group of capillary tubes 8 led out to the outside, that is, the outer end of each capillary tube 7, is in open communication with a high vacuum chamber 10 that is maintained at a higher vacuum level than the vacuum level of the production chamber 1, as described later. . The high vacuum chamber 10 is equipped with an evacuation pipe 11 connected to an external evacuation pump, and the interior of the high vacuum chamber 10 is maintained at a desired degree of vacuum via a control valve 12 interposed therein. The rear end side of the high vacuum chamber 10 is an ultrafine particle collection chamber 13. That is, a partition valve 14 is provided on a part of the upper wall of the high vacuum chamber 10 to freely partition the interior into two parts, and is movable forward and backward in the vertical direction. is defined as the collection chamber 13. At the lower end of the collection chamber 13,
Vacuum exhaust pipe 15 of the vacuum exhaust device connected to the atmosphere
is provided via the control valve 16. In the collection chamber 13, a dish-shaped collection container, a substrate, etc. may be stored in advance, if necessary. The end wall of the collection chamber 13 is configured as an airtight opening/closing door. In the drawing, 17 indicates a viewing window. The thin tube group 8 in the illustrated embodiment is formed into a bent thin tube group that is bent from the middle and extends horizontally so as to take up as little height space as possible. If necessary, the high vacuum chamber 10 is provided with an evaporation chamber 19 located below the horizontal thin tube group 8 and housing a heating evaporation device 18 for evaporation material for ultrafine particle coating. It can be configured as a surface treatment chamber.

又、該高真空室10は、必要に応じ、これに連
通開口する酸素、窒素などの超微粒子の表面を気
相反応などで表面処理するためのガス導入管20
を接続して超微粒子用表面処理室に構成すること
ができる。図示のように、蒸発室19とガス導入
管20の両者を設けた或は図示しないが、そのい
づれか1方のみを設けた表面処理室に構成でき
る。
The high vacuum chamber 10 also has a gas introduction pipe 20 for surface treatment of ultrafine particles of oxygen, nitrogen, etc. by gas phase reaction, etc., which is communicated with the high vacuum chamber 10, if necessary.
can be connected to form a surface treatment chamber for ultrafine particles. As shown in the figure, the surface treatment chamber can be configured with both an evaporation chamber 19 and a gas introduction pipe 20, or with only one of them (not shown).

細管群8の途中には、図面では、その生成室1
の上方に位置して、その外周に、これら細管群8
を気液密に被包してジヤケツト21を設ける。該
ジヤケツト21の下部には、冷媒又は熱媒の供給
管22がその上部にはその排出管23が接続され
ている。
In the drawing, there is a generation chamber 1 in the middle of the thin tube group 8.
These thin tube groups 8 are located above and on the outer periphery of
A jacket 21 is provided by enclosing the jacket in an air-liquid tight manner. A refrigerant or heat medium supply pipe 22 is connected to the lower part of the jacket 21, and a discharge pipe 23 thereof is connected to the upper part.

更に、必要に応じ、該細管群8の下部外周に
は、外部のDO電源に接続する環状磁場形成用ソ
レノイドから成る磁化装置24を設ける。該磁化
装置24は、該生成室1内壁に固設した腕部材2
5と該磁化装置24の外周に突設したフランジ2
6との間に介在せしめた高さ調節装置27により
その高さ位置を調節できるようにした。
Furthermore, if necessary, a magnetization device 24 consisting of an annular magnetic field forming solenoid connected to an external DO power source is provided on the lower outer periphery of the thin tube group 8. The magnetization device 24 includes an arm member 2 fixed to the inner wall of the generation chamber 1.
5 and a flange 2 protruding from the outer periphery of the magnetizing device 24.
The height position can be adjusted by a height adjustment device 27 interposed between the height adjustment device 6 and the height adjustment device 27.

即ち、該高さ調節装置27は、蛇腹、ばね、な
どの伸縮部材27aと調節ねじ27bとから成
り、そのねじ27bの回動によりソレノイド24
のるつぼ上端からの高さ位置を例えば50〜100mm
に調節し得るようにし、磁化装置24の作動時
に、細管群8内に生成する磁場の高さ位置を予め
設定できるようにした。ジヤケツト21は筒壁2
1aと該筒壁21aの両端の閉塞板21b,21
bとから成る。該閉塞板21bは、細管群8の各
細管7を所定位置で挿通し溶接により固定保持す
ると共に、これら細管7間の空間を閉塞しその内
部空間を水などの冷却又は加熱用媒体の流通空間
に構成する。更に、閉塞板21bは、ジヤケツト
21の筒壁21aより外方へ突出のフランジ部2
8を設け、これと該生成室1の頂壁口縁部との間
に、前記と同様の高さ調節装置29を設けた。該
細管用の高さ調節装置29は、伸縮部材29aと
ねじ29bとから成る。これにより、該細管群8
の下端と蒸発源との高さ距離を例えば80〜150mm
の範囲で調節し得るようにした。図面で該細管群
8は外周を略円形となるよう配設し、その下端面
の外周径は、るつぼ4の蒸発材料3を収容した口
径より大径とし、例えば、少なくとも略2倍の大
きさとすることが好ましい。かくして該蒸発材料
3の加熱により生成した蒸気の上昇流は、かゝる
大径の細管群8下面で充分受け入れるようにし
た。更に、細管群8の下端面を図示のように中央
が高い凹面とし、蒸発超微粒子の外部への逸出を
可及的に防止することが好ましい。該生成室1の
上部壁に、細管群8の外周に位置して蒸発超微粒
子受壁30を突設すると共にその受壁31の下面
に位置して排出口31を設けて、該細管群8に吸
込まれない余分の蒸発超微粒子は、前記の受壁3
0で受止められて排気口31より、該排気口31
に接続の排出管32を介して外部で回収されるよ
うにした。
That is, the height adjustment device 27 is composed of an elastic member 27a such as a bellows or a spring, and an adjustment screw 27b, and when the screw 27b rotates, the solenoid 24
For example, set the height from the top of the crucible to 50 to 100 mm.
When the magnetizing device 24 is activated, the height position of the magnetic field generated within the thin tube group 8 can be set in advance. The jacket 21 is attached to the cylinder wall 2
1a and closing plates 21b, 21 at both ends of the cylinder wall 21a.
It consists of b. The closing plate 21b inserts each thin tube 7 of the thin tube group 8 at a predetermined position and fixes it by welding, closes the space between these thin tubes 7, and makes the internal space a circulation space for a cooling or heating medium such as water. Configure. Furthermore, the closing plate 21b has a flange portion 2 that protrudes outward from the cylindrical wall 21a of the jacket 21.
8, and a height adjustment device 29 similar to that described above was provided between this and the edge of the top wall of the generation chamber 1. The height adjustment device 29 for the thin tube consists of a telescopic member 29a and a screw 29b. As a result, the thin tube group 8
The height distance between the lower end and the evaporation source is, for example, 80 to 150 mm.
It can be adjusted within a range of In the drawing, the thin tube group 8 is arranged so that the outer periphery is approximately circular, and the outer peripheral diameter of the lower end surface is larger than the diameter of the opening that accommodates the evaporation material 3 of the crucible 4, for example, at least approximately twice as large. It is preferable to do so. In this way, the upward flow of vapor generated by heating the evaporative material 3 was sufficiently received at the lower surface of the large-diameter thin tube group 8. Furthermore, it is preferable that the lower end surface of the capillary tube group 8 be made into a concave surface with a high center as shown in the figure to prevent the evaporated ultrafine particles from escaping to the outside as much as possible. An evaporated ultrafine particle receiving wall 30 is provided on the upper wall of the generation chamber 1 so as to protrude from the outer periphery of the thin tube group 8, and a discharge port 31 is provided on the lower surface of the receiving wall 31. Excess evaporated ultrafine particles that are not sucked into the receiving wall 3
0 and from the exhaust port 31, the exhaust port 31
It was designed to be collected externally via a discharge pipe 32 connected to the .

尚、本装置の真空室側は、図示しない固定壁よ
り突設した上下の支持腕33に、前記高さ調節装
置29と同様の高さ調節装置などの伸縮自在装置
34を介して支持するようにした。
The vacuum chamber side of this device is supported by upper and lower support arms 33 protruding from a fixed wall (not shown) via a telescoping device 34 such as a height adjustment device similar to the height adjustment device 29 described above. I made it.

次に本発明の上記装置の作動を説明する。生成
室1内の高空度を例えば1×10-4トールとしてガ
ス中蒸発を行なうとき、高真空室10内の真空度
を生成室1内の前記真空度より高い例えば5×
10-2トールに真空排気する。かくするときは、る
つぼ4より蒸発する蒸発材料、例えば金属又は合
金材料の蒸気は、その上方に対面する大径の細管
群8の下面に達するが、その各細管7には、後端
が高真空室10に開口しているので、該高真空室
10の前記高真空によりその各細管7内に強い吸
引作用を生じ、その各細管7の下端吸引口より前
気の蒸気(超微粒子)は吸引されて急速度で(秒
速数10メートル)で、その生成室1内の不活性ガ
スと共に流入し高真空室10内へ引き込まれる。
かくして、その捕集室13内に弧立超微粒子が集
積されて得られる。この場合、本発明装置では、
蒸発する超微粒子を多数の細管7により吸引捕集
するので、大量生産が可能となる。得られる弧立
超微粒子の粒径は、通常のガス中蒸発法における
条件(蒸発材料の溶湯温度、ガスの種類(分子
量)、真空度)の他、細管群8の下端吸入口と蒸
発材料との距離を、細管群8の上下動又は図示し
ないが蒸発面の上下動によつて適宜変えることに
より、10〜500Åの範囲で変えることができる。
Next, the operation of the above device of the present invention will be explained. When performing evaporation in gas by setting the high degree of vacuum in the production chamber 1 to, for example, 1×10 -4 Torr, the degree of vacuum in the high vacuum chamber 10 is set to a degree higher than the vacuum degree in the production chamber 1, for example, 5×.
Evacuate to 10 -2 torr. In this case, the vapor of the evaporated material, such as a metal or alloy material, evaporated from the crucible 4 reaches the lower surface of the group of large-diameter thin tubes 8 facing above, but each of the thin tubes 7 has a rear end that is high. Since it opens into the vacuum chamber 10, the high vacuum of the high vacuum chamber 10 produces a strong suction action in each of the capillary tubes 7, and the vapor (ultrafine particles) in the previous air is discharged from the lower end suction port of each capillary tube 7. It is sucked in and flows at a rapid speed (several tens of meters per second) together with the inert gas in the generation chamber 1, and is drawn into the high vacuum chamber 10.
In this way, the erect ultrafine particles are accumulated in the collection chamber 13. In this case, in the device of the present invention,
Since the evaporating ultrafine particles are collected by suction through a large number of thin tubes 7, mass production becomes possible. The particle size of the obtained arcuate ultrafine particles is determined by the conditions used in the normal gas evaporation method (molten temperature of the evaporation material, type of gas (molecular weight), degree of vacuum), as well as the lower end inlet of the capillary group 8 and the evaporation material. The distance can be changed within the range of 10 to 500 Å by appropriately changing the vertical movement of the thin tube group 8 or the vertical movement of the evaporation surface (not shown).

上記の作動において、高真空室10内に予め設
けてある蒸発室19内の加熱装置18内に収容し
た蒸発材料として、コーテイング材、例えば合成
樹脂を用意し、これを加熱蒸発させる。然るとき
は、前記の細管群8より高真空室10内へ排出さ
れる無数の弧立超微粒子は夫々合成樹脂蒸気のコ
ーテイングを施され、合成樹脂被覆の弧立超微粒
子の集合体が得られる。
In the above operation, a coating material such as a synthetic resin is prepared as an evaporation material stored in a heating device 18 in an evaporation chamber 19 provided in advance in a high vacuum chamber 10, and is heated and evaporated. In such a case, the countless erect ultrafine particles discharged from the thin tube group 8 into the high vacuum chamber 10 are each coated with synthetic resin vapor to obtain an aggregate of erect ultrafine particles coated with synthetic resin. It will be done.

上記の合成樹脂に代え、例えばCuを被覆する
には、予め細管群8の各細管7中を通過するNi
超微粒子流を400〜500℃に加熱しておくことが好
ましい。この場合には、ジヤケツト21内に加熱
オイルなどの加熱媒体を通して、各細管7を加熱
し、その中を通るNi超微粒子を400〜500℃に加
熱した状態として高真空室10内へ放出させ、こ
れに、前記蒸発源18より蒸発のCu超微粒子を
コーテイングしてCu被覆Ni弧立超微粒子の集合
体が得られる。
For example, in order to coat Cu instead of the synthetic resin described above, Ni
Preferably, the ultrafine particle stream is heated to 400-500°C. In this case, each thin tube 7 is heated by passing a heating medium such as heating oil into the jacket 21, and the Ni ultrafine particles passing through the tube are heated to 400 to 500°C and released into the high vacuum chamber 10. This is coated with Cu ultrafine particles evaporated from the evaporation source 18 to obtain an aggregate of Cu-coated Ni arcuate ultrafine particles.

又、細管群8より放出の弧立金属超微粒子に酸
素、窒素などの気相反応を行ないその表面を酸
化、窒化などの被膜を形成した弧立超微粒子を製
造するときは、ガス導入管20より酸素、窒素な
の所望のガスを導入する。この場合、所望の反応
温度は、前記のジヤケツト21内を通す所要温度
に加熱した媒体を通して得られる。通常ガスで搬
送される各細管7内の超微粒子は、200〜300℃で
あるが、特にそれ以下の温度が例えば100℃以下
の望まれるときは、冷水などの冷却媒体をジヤケ
ツト21に通すことにより達成される。細管群8
は空〓を存して多数本の細管7で構成されている
ので、各細管7内を通過する超微粒子が上述のよ
うに加熱あるいは冷却される。そして加熱によれ
ば、細管7内の超微粒子を集合、合体により成長
させ得、更に後述の短チエイン状超微粒子の場合
は、粒子同士のつながりの強さを向上させること
が出来る。また冷却により細管7内の超微粒子の
成長を抑えることが出来る。
In addition, when producing arcuate ultrafine particles in which the arcuate ultrafine metal particles discharged from the capillary tube group 8 are subjected to a gas phase reaction with oxygen, nitrogen, etc. to form a coating such as oxidation or nitridation on the surface, the gas introduction tube 20 is used. Introduce the desired gas such as oxygen or nitrogen. In this case, the desired reaction temperature is obtained by passing a heated medium to the required temperature through the jacket 21 mentioned above. The temperature of the ultrafine particles in each thin tube 7, which is normally conveyed by gas, is 200 to 300°C, but if a temperature lower than that is desired, for example, 100°C or less, a cooling medium such as cold water may be passed through the jacket 21. This is achieved by Tube group 8
Since it is composed of a large number of thin tubes 7 with an empty space, the ultrafine particles passing through each thin tube 7 are heated or cooled as described above. By heating, the ultrafine particles in the capillary tube 7 can be aggregated and coalesced to grow, and in the case of short chain-like ultrafine particles described below, the strength of the connections between the particles can be improved. Furthermore, the growth of ultrafine particles within the thin tube 7 can be suppressed by cooling.

上記の装置により、短チエイン超微粒子の集合
体を製造する場合には、前記磁化装置24の磁場
形成ソレノイドにDC電流を流し、その内部空間
に、即ちその細管群8の各細管7内にその所定の
長さ範囲に磁場を形成せしめた状態をつくり、各
細管7中を20〜30m/Sの高速で通過するFe、
Co、Niなどの遷移金属もしくはこれらの合金の
磁性材料の蒸発超微粒子は、温度がキユーリー点
より降下したのち、前記の磁場の所定域内を通過
する間に磁化されて、個々の粒子が配向され、例
えば粒子が5〜10ケ程度の範囲でつながり、長さ
0.15〜0.3μmの短チエイン状超微粒子が形成され
て各細管7より高真空室10内へ放出されて捕集
室13内に短チエイン超微粒子の集合体、即ち粉
末が得られる。
When producing an aggregate of short-chain ultrafine particles using the above-mentioned apparatus, a DC current is passed through the magnetic field forming solenoid of the magnetization device 24, and a DC current is applied to the internal space of the magnetic field forming solenoid, that is, into each capillary tube 7 of the capillary group 8. Fe passes through each thin tube 7 at a high speed of 20 to 30 m/s, creating a state in which a magnetic field is formed in a predetermined length range,
After the temperature of the evaporated ultrafine particles of magnetic materials of transition metals such as Co and Ni or their alloys falls below the Curie point, they are magnetized while passing within the predetermined region of the magnetic field, and the individual particles are oriented. , for example, particles are connected in a range of about 5 to 10, and the length
Short chain-shaped ultrafine particles of 0.15 to 0.3 μm are formed and discharged from each capillary tube 7 into the high vacuum chamber 10, and an aggregate of short chain ultrafine particles, ie, powder, is obtained in the collection chamber 13.

上記の短チエイン状超微粒子を得るには、磁化
装置24のソレノイドの長さ(高さ)、高真空室
と生成室との圧力差、高真空室の真空度の大き
さ、形成すべき磁場と蒸発源との距離などを調節
する。この短チエイン超微粒子に気相反応や蒸着
などによりコーテイングするなどの表面処理され
たものを得るには、上記と仝様に、該蒸発源19
やガス導入管20などを利用して達成される。
In order to obtain the short chain-shaped ultrafine particles described above, the length (height) of the solenoid of the magnetization device 24, the pressure difference between the high vacuum chamber and the generation chamber, the degree of vacuum in the high vacuum chamber, and the magnetic field to be formed. Adjust the distance between the evaporation source and the evaporation source. In order to obtain surface-treated short chain ultrafine particles such as coating by vapor phase reaction or vapor deposition, the evaporation source 19 is
This is accomplished by using a gas inlet pipe 20 or the like.

第3図は、上記の高真空室10の上流側、即
ち、細管群8の放出端との間に多孔板35で区割
された中間排気用導管36を介し真空装置に接続
されて居り、その作動時は、生成室1と高真空室
10との夫々の真空度の中間の真空度例えば1×
10-1程度に排気減圧されるようにする。
FIG. 3 shows the high vacuum chamber 10 connected to the vacuum device via an intermediate exhaust conduit 36 separated by a perforated plate 35 between the upstream side of the high vacuum chamber 10, that is, the discharge end of the thin tube group 8; During operation, the vacuum level is between the vacuum levels of the generation chamber 1 and the high vacuum chamber 10, for example 1×.
Make sure that the exhaust pressure is reduced to about 10 -1 .

然るときは、各細管7より放出されるキヤリヤ
ガスは、この真空排気用導管36より排出され
る。1方、各細管7より放出の弧立又は短チエイ
ン超微粒子は、慣性により直進し、該多孔板35
の該細管7に対向して予め設けた多数の透孔35
aを通過して高真空室10内に入り高真空処理室
10内に過剰なキヤリヤーガスの流入による影響
が少なく又は全くなくして、該真空処理室10内
でのコーテイング処理を良好に行なえるようにす
ることができる。
In such a case, the carrier gas discharged from each capillary tube 7 is discharged from this evacuation conduit 36. On the other hand, the arcuate or short chain ultrafine particles released from each thin tube 7 travel straight due to inertia and reach the perforated plate 35.
A large number of through holes 35 are provided in advance to face the thin tube 7.
a, enters the high vacuum chamber 10, and reduces or eliminates the influence of excessive carrier gas flowing into the high vacuum processing chamber 10, so that the coating process within the vacuum processing chamber 10 can be performed well. can do.

尚、弧立又は短チエイン超微粒子のコーテイン
グを1種の物質でその被膜の厚さを増大せしめる
とき、或は2種又はそれ以上の物質の積層被膜を
形成する場合には、図示しないが、上記の蒸発室
19やガス導入管20をもつ同様の表面処理室を
2つ以上構成する。
Although not shown, when coating the vertical or short chain ultrafine particles with one type of substance to increase the thickness of the coating, or when forming a laminated coating of two or more types of substances, Two or more similar surface treatment chambers having the above-mentioned evaporation chamber 19 and gas introduction pipe 20 are configured.

上記のようにして捕集室13に蓄積された弧立
超微粒子、短チエイン超微粒子、或はこれらの表
面処理された弧立超微粒子又は短チエイン超微粒
子などの集合体、即ち、粉体を外部に取り出すと
きは、原料の加熱蒸発、真空排気などの運転を止
めた後真空排気管15の連なる真空排気装置の作
動を止め、大気を該調節弁16を介して該捕集室
13内に導入して、高真空室10(捕集室13を
含む)を大気圧とし、常法に従い外部に取り出し
所望の容器に回収する。
The erect ultrafine particles, short chain ultrafine particles, or aggregates of these surface-treated erect ultrafine particles or short chain ultrafine particles, that is, powder, accumulated in the collection chamber 13 as described above are collected. When taking out the raw material to the outside, after stopping operations such as heating and evaporating the raw material and evacuation, the operation of the evacuation device connected to the evacuation pipe 15 is stopped, and the atmosphere is drawn into the collection chamber 13 through the control valve 16. The high vacuum chamber 10 (including the collection chamber 13) is brought to atmospheric pressure, and the sample is taken out to the outside and collected in a desired container according to a conventional method.

尚、運転を完全に止めないで継続するときは、
仕切りバルブ14を下動させて捕集室13を仕切
り、該捕集室13のみを前記と同様の操作で大気
圧とする1方、るつぼ内の材料が蒸発しないよう
加熱を一時中継し、或は加熱温度を下げる。粉体
の外部への取出し終了後、仕切りバルブ14を上
動後退させて、再び蒸発温度に加熱する。
In addition, if you continue driving without completely stopping,
The collection chamber 13 is partitioned by lowering the partition valve 14, and only the collection chamber 13 is brought to atmospheric pressure by the same operation as described above, while the heating is temporarily relayed so that the material in the crucible does not evaporate, or lower the heating temperature. After the powder has been taken out to the outside, the partition valve 14 is moved upward and backward, and the powder is heated to the evaporation temperature again.

次に更に詳細な実施例を説明する。 Next, more detailed examples will be described.

実施例 1 (弧立超微粒子の製造) 生成室の内部に設けた内径150mmの耐火物製る
つぼの中にシヨツト状電解Niを8.5Kg充填し、先
づ、1×10-4トールの高真空に排気したのち、
Heガスを導入する。1方高周波電源からの供給
電力1KHz38KWで加熱し、るつぼ内のNiを溶解
し、1800℃の溶湯温度を保持する。生成室の底部
よりHeガスを10/minの流量で供給し、生成
室の真空度を2トールとし、蒸発するNi超微粒
子(黒い煙状で観察される)を搬送するようにす
る。るつぼの上方には、るつぼ上端から130mmの
距離を存してその上方に吸入口を対面して多数本
の細管群を予め設けてある。該細管群が構成する
円形外周の直径は略200mmとし、その各細管は、
内径2mm、肉厚0.5mmの銅製の円形細管から成り、
その150本により細管群を構成する。細管相互間
に13mmの空隙ピツチを存して併設するように配設
してある。1方高真空室内を油回転ポンプとメカ
ニカルプースターとを組合せた排気系で排気し、
5×10-2トールとし、生成室の真空度2トールと
の間に圧力差を付けて該細管群の下端吸込面から
その下方から上昇してくるNi蒸気の煙をHeガス
と共に各細管内へ吸引し勢い良く秒速400mの高
速で高真空室側へ吸引する。
Example 1 (Manufacture of arcuate ultrafine particles) 8.5 kg of electrolytic Ni shot was filled into a refractory crucible with an inner diameter of 150 mm provided inside a generation chamber, and the mixture was first placed in a high vacuum of 1 x 10 -4 Torr. After exhausting to
Introduce He gas. On the other hand, it is heated with 1KHz38KW of power supplied from a high frequency power source to melt the Ni in the crucible and maintain the molten metal temperature at 1800℃. He gas is supplied from the bottom of the generation chamber at a flow rate of 10/min, the vacuum level of the generation chamber is set to 2 Torr, and the evaporating Ni ultrafine particles (observed as black smoke) are transported. Above the crucible, a large number of thin tube groups were provided in advance at a distance of 130 mm from the upper end of the crucible, with the suction ports facing each other. The diameter of the circular outer periphery of the group of thin tubes is approximately 200 mm, and each of the thin tubes is
Consists of a circular copper tube with an inner diameter of 2 mm and a wall thickness of 0.5 mm.
The 150 tubes constitute a group of tubules. The thin tubes are arranged so that they are juxtaposed with a gap of 13 mm between them. One side, the high vacuum chamber is evacuated using an exhaust system that combines an oil rotary pump and a mechanical booster.
5 × 10 -2 Torr, and with a pressure difference between the vacuum level of the generation chamber and the vacuum level of 2 Torr, the smoke of Ni vapor rising from the lower end suction surface of the group of capillary tubes and He gas is inside each capillary tube. and then forcefully suck it into the high vacuum chamber at a high speed of 400 m/s.

かくして、生成室で蒸発のNi超微粒子は、該
細管群より放出された無数のNi弧立超微粒子は
そのまゝ飛行して捕集室内に蓄積する。或はサブ
ストレート面に付着し捕集される。得られたNi
弧立超微粒子の平均粒径は200Åで、その半値幅
は30Åのシヤープな粒径分布を示していた。
In this way, the Ni ultrafine particles evaporated in the generation chamber and the countless standing ultrafine Ni particles released from the group of capillary tubes fly as they are and accumulate in the collection chamber. Alternatively, it adheres to the substrate surface and is collected. Obtained Ni
The average particle diameter of the erect ultrafine particles was 200 Å, and the half-width was 30 Å, showing a sharp particle size distribution.

本運転でのNi超微粒子蒸発生成速度は120g/
hrでその捕集室に得られるNi弧立超微粒子の生
成速度は49g/hrであつた。これは蒸発量の約41
%が弧立超微粒子として製造できることを示す。
The Ni ultrafine particle evaporation generation rate in the actual operation was 120g/
The production rate of Ni arcuate ultrafine particles obtained in the collection chamber was 49 g/hr. This is approximately 41% of the evaporation amount.
% indicates that it can be produced as vertical ultrafine particles.

尚、細管群下端とるつぼ上端から100mmの距離
とし、上記と同様に実施した所粒径100ÅのNi超
微粒子が得られた。
Incidentally, ultrafine Ni particles with a particle size of 100 Å were obtained by carrying out the same procedure as above, with a distance of 100 mm from the lower end of the capillary group and the upper end of the crucible.

実施例 2 (コーテイング弧立超微粒子の製造) るつぼとNi原料並に生成室内の初期は実施例
1の場合と同じとし、その後Heガスを導入し1.5
トールとする。高周波電源からの供給電力1KHz
32kwで加熱し、るつぼ内のNiを溶解し、1750℃
の溶湯温度を保持する。生成室の底部よりHeガ
スを0.6/minの流量で供給し、Ni蒸発超微粒
子をるつぼ上端から100mmの位置に固定された細
管群へ搬送する。細管群は150本の細管から成り、
各細管は内径2mm、肉厚0.5mm、長さ200mmであ
る。1方、高真空室内に設けた蒸発室にはアルミ
ナ製るつぼ内に予め充填した100gのポリスチレ
ンをるつぼ外部からニクロム線ヒーターで加熱し
て250℃の温度に保ち、高真空室内は油拡散ポン
プと油回転ポンプとメカニカルブースターを組合
わせた真空排気系で真空排気し1×10-3トールに
保たれ、ポリスチレン0.35g/minの蒸発を行な
う。該高真空室とこれに連通する細管群の導入端
との間に、透孔板を介在し、該細管群導入端と透
孔板との間に設けた中間排気室内をこれに接続し
た油回転ポンプとメカニカルブースターを組合せ
た排気系で真空排気し1×10-1トールに保持す
る。かくして、該高真空室側の高真空と生成室の
低真空との差圧により前記蒸発Ni超微粒子の煙
は該細管群の下端吸口群より細管群内へキヤリヤ
ガスと共に吸い込まれて流速350m/secの高速で
先づ中間排気室内へ引込まれ、茲でキヤリヤーガ
スは排除される1方Ni超微粒子流は直進し該透
孔板の透孔板の透孔を通り該高真空室内へ吸込ま
れる。このとき飛行Ni弧立超微粒子は前記のポ
リエチレン蒸気ゾーンを通過するので、これによ
りコーデングされるが、この場合のコーテイング
処理を良好に行なうべく弧立超微粒子が、細管群
から中間排気室へ放出される以前の細管群内を通
過する間に、Heガス及びNi弧立超微粒子をその
外周のジヤケツトに流す冷却水により100℃以下
に冷却しておく。かくして、膜厚30〜50Å、平均
40Åのポリエチレン蒸着膜が平均粒径100ÅのNi
弧立超微粒子の表面を被覆した製品が捕集室に得
られる。捕集室には、サブストレートを予めセツ
トし、これに付着させるようにしてもよい。本運
転でのNi超微粒子蒸発生成速度は82g/hで、
その捕集室に得られるポリエチレン被覆Ni弧立
超微粒子の生成速度は、7.2g/hr(Ni弧立超微粒
子のみでは4.4g/hr)であつた。これは、蒸発
量の約5.4%がNi弧立超微粒子として製造された
ことを意味する。
Example 2 (Manufacture of coated arc-shaped ultrafine particles) The initial stage of the crucible, Ni raw material, and production chamber were the same as in Example 1, and then He gas was introduced and the temperature was increased to 1.5
Toll. Power supply from high frequency power supply 1KHz
Heating with 32kw to melt the Ni in the crucible to 1750℃
Maintain the molten metal temperature. He gas is supplied from the bottom of the generation chamber at a flow rate of 0.6/min, and the Ni evaporated ultrafine particles are transported to a group of thin tubes fixed at a position 100 mm from the top of the crucible. The tubule group consists of 150 tubules,
Each tube has an inner diameter of 2 mm, a wall thickness of 0.5 mm, and a length of 200 mm. On the other hand, in the evaporation chamber installed in the high vacuum chamber, 100 g of polystyrene filled in an alumina crucible in advance is heated from the outside of the crucible with a nichrome wire heater and kept at a temperature of 250℃, and the high vacuum chamber is equipped with an oil diffusion pump. The vacuum pumping system is a combination of an oil rotary pump and a mechanical booster, and the vacuum is maintained at 1×10 -3 Torr, and 0.35 g/min of polystyrene is evaporated. A perforated plate is interposed between the high vacuum chamber and the introduction end of a group of thin tubes communicating therewith, and an intermediate exhaust chamber provided between the introduction end of the group of thin tubes and the perforated plate is connected to the oil evacuation chamber. The vacuum is maintained at 1×10 -1 Torr using an exhaust system that combines a rotary pump and a mechanical booster. Thus, due to the pressure difference between the high vacuum on the high vacuum chamber side and the low vacuum in the generation chamber, the vaporized Ni ultrafine particle smoke is sucked into the capillary group from the lower end suction port group of the capillary tube group together with the carrier gas, and the flow rate is 350 m/sec. is first drawn into the intermediate exhaust chamber at a high speed, and the carrier gas is removed by a screw, while the Ni ultrafine particle flow goes straight and is sucked into the high vacuum chamber through the holes in the perforated plate. At this time, the flying Ni arcuate ultrafine particles pass through the polyethylene vapor zone and are coded. In order to perform the coating process well, the arcuate ultrafine particles are released from the thin tube group into the intermediate exhaust chamber. While passing through the group of thin tubes before being heated, the He gas and the Ni arcuate ultrafine particles are cooled to below 100°C by cooling water flowing into the jacket around the outer periphery. Thus, film thickness 30-50 Å, average
A 40 Å polyethylene vapor deposited film is made of Ni with an average grain size of 100 Å.
A product whose surface is coated with vertical ultrafine particles is obtained in the collection chamber. A substrate may be set in advance in the collection chamber and the substrate may be adhered thereto. The Ni ultrafine particle evaporation generation rate in the actual operation was 82 g/h.
The production rate of polyethylene-coated Ni arcuate ultrafine particles obtained in the collection chamber was 7.2 g/hr (4.4 g/hr for Ni arcuate ultrafine particles only). This means that approximately 5.4% of the evaporated amount was produced as Ni arcuate ultrafine particles.

実施例 3 (短チエイン状Fe−CO合金超微粒子の製造) 生成室内の内径150mmの耐火性るつぼ内に、蒸
発材料として、電解Fe4.9Kg、電解Co3.6Kg計8.5
Kgをチヤージし、先づ1×10-4トールの高真空に
排気したのち、Heガスを2トールになるように
導入する。高周波電源からの供給電力1KHz38Kw
で加熱し、るつぼ内のFe及びCoを溶解し、1800
℃のFe−Co合金溶湯を保持する。細管群の構成
並に細管群とるつぼとの高さ距離は実施例1と同
じである。高真空室内は、油回転ポンプとメカニ
カルプースターを組合せた排気系で5×10-2トー
ルに真空排気を保持する。前記の蒸発したFe−
Co合金蒸気は、該細管群の下端の吸込口群より
吸い込まれるが、その超微粒子の温度がキユーリ
ー点より低くなつた状態でソレノイドにより形成
される磁場内を通り磁化され、この実施例では、
ソレノイドの高さの上半部(200mm)の長さ域
(ゾーン)で磁化されるようにし、その超微粒子
は10m/secの高速でこのゾーンを通過するので、
そのゾーンにおける滞留時間は比較的短かく、
0.02秒であつた。その結果8〜12ケの範囲内で弧
立超微粒子がつらなつた短チエイン状超微粒子に
形成され、これがそのまゝキヤリヤーガスと共に
細管群より高真空室内に引込まれて捕集室に集積
される。生成した60Fe−40Coの弧立超微粒子の
集合体の平均粒径は、200Å、その半値幅は30Å
のシヤープな粒度分布を示していた。その短チエ
インの粒子の数は、集合体の約80%が8〜12ケの
範囲内であり、5〜15ケの範囲外のチエインは殆
んど見られなかつた。
Example 3 (Production of short chain-shaped Fe-CO alloy ultrafine particles) In a fireproof crucible with an inner diameter of 150 mm in the generation chamber, 4.9 kg of electrolytic Fe and 3.6 kg of electrolytic Co were placed as evaporation materials, totaling 8.5 kg.
Kg is charged and first evacuated to a high vacuum of 1×10 -4 Torr, then He gas is introduced to a pressure of 2 Torr. Supply power from high frequency power supply 1KHz38Kw
Heating at 1800℃ to dissolve Fe and Co in the crucible,
Hold the molten Fe-Co alloy at ℃. The structure of the capillary group and the height distance between the capillary group and the crucible are the same as in Example 1. The vacuum inside the high vacuum chamber is maintained at 5×10 -2 Torr using an exhaust system that combines an oil rotary pump and a mechanical booster. The evaporated Fe-
The Co alloy vapor is sucked in through the suction port group at the lower end of the thin tube group, and in a state where the temperature of the ultrafine particles is lower than the Curie point, it passes through the magnetic field formed by the solenoid and is magnetized.
The upper half of the height of the solenoid (200mm) is magnetized, and the ultrafine particles pass through this zone at a high speed of 10m/sec.
Residence time in that zone is relatively short;
It was 0.02 seconds. As a result, 8 to 12 erect ultrafine particles are formed into short chain-like ultrafine particles, which are drawn into the high vacuum chamber together with the carrier gas through the tube group and accumulated in the collection chamber. . The average grain size of the aggregate of 60Fe−40Co vertical ultrafine particles produced is 200 Å, and its half-width is 30 Å.
It showed a sharp particle size distribution. Regarding the number of short chain particles, approximately 80% of the aggregates were within the range of 8 to 12 particles, and chains outside the range of 5 to 15 particles were hardly observed.

本運転での60Fe−40Co超微粒子蒸発生成速度
は108g/hrで、短チエイン状超微粒子の捕集速
度は47g/hrであり、蒸発量の約44%が短チエイ
ン状超微粒子として製造できた。従来の数十ケの
超微粒子がつらかつた長チエイン状超微粒子を磁
気気録テープの製造においてそのテープ基材に塗
布する際、分散、配向が困難で、磁気記録特性
に、ばらつきが多かつたが、本実施例で製造した
短チエイン状超微粒子は、上記の難点を解消し、
良好な磁気記録特性が得られた。尚ソレノイド下
端とるつぼ上端との間隔を50mmとし、前記と仝様
に実施した所5〜10ケつながつた短チエイン状超
微粒子が得られた。
In the actual operation, the evaporation production rate of 60Fe-40Co ultrafine particles was 108 g/hr, and the collection rate of short chain ultrafine particles was 47 g/hr, and approximately 44% of the evaporation amount was produced as short chain ultrafine particles. . When applying conventional long chain-shaped ultrafine particles consisting of dozens of ultrafine particles to the tape base material in the production of magnetic recording tape, it is difficult to disperse and orient the particles, and the magnetic recording properties vary widely. However, the short chain-shaped ultrafine particles produced in this example solved the above-mentioned difficulties, and
Good magnetic recording characteristics were obtained. When the same procedure as described above was carried out with the distance between the lower end of the solenoid and the upper end of the crucible being 50 mm, short chain-shaped ultrafine particles having 5 to 10 pieces connected were obtained.

実施例 4 (酸化被膜をもつ短チエイン状超微粒子の製
造) 前記実施例3と同じ条件で、且つ高真空室内へ
ガス導入管より酸素を4×10-3/minで流入さ
せて、細管群より放出される短チエイン状60Fe
−40Co超微粒子を酸素ガス雰囲気に触れさせて
その表面を酸化被覆をもつものに製造した。短チ
エインのFe超微粒子は、個々のFe超微粒子の表
面に10〜20Åの膜厚の酸化鉄(Fe3O4)の膜が均
一に形成されていた。
Example 4 (Production of short chain-shaped ultrafine particles with oxide film) Under the same conditions as in Example 3, oxygen was introduced into the high vacuum chamber from the gas introduction tube at a rate of 4×10 -3 /min to form a group of thin tubes. Short chain-like 60Fe released by
-40Co ultrafine particles were exposed to an oxygen gas atmosphere to produce a surface coated with oxide. In the short chain Fe ultrafine particles, an iron oxide (Fe 3 O 4 ) film with a thickness of 10 to 20 Å was uniformly formed on the surface of each Fe ultrafine particle.

細管群内を選ばれる弧立又は短チエイン超微粒
子の流速は、差圧の調節、高真空室の真空度によ
り所望の高速に調節され、例えば20〜30m/Sで
ある。固みに、従来のガス中蒸発法のみの場合は
1〜2m/Sが一般である。
The flow velocity of the arcuate or short chain ultrafine particles selected within the group of capillary tubes is adjusted to a desired high speed by adjusting the differential pressure and the degree of vacuum in the high vacuum chamber, and is, for example, 20 to 30 m/s. In the case of only the conventional evaporation method in gas, the hardness is generally 1 to 2 m/S.

(発明の効果) このように本発明によるときは、ガス中蒸発法
を行なう生成室の真空度より高真空度の真空度を
大きくし、その差圧により生成室内に生成の超微
粒子蒸気を、互に空〓を存した多数本の細管から
なる細管群であつて該細管群の下端面積が蒸発源
の面積よりも大きく、かつ該細管群の下端と蒸発
源の距離が調節可能な細管群を介して生成室から
前記真空室へと引込み捕集するようにしたので、
該細管群を空〓を流通する媒体で加熱或は冷却し
て超微粒子の成長を制御し、或は短チエイン状超
微粒子のつながり強さを向上させることが出来る
と共に蒸発材料の蒸発量に対し大きい割合で弧立
超微粒子の集合体を得ることができ、又その細管
群内を超微粒子が高速に通過する途上で磁化装置
により磁化せしめるときは、短チエイン状超微粒
子を捕集することができ、更に、その高真空室側
にコーテイング材の蒸発装置或は/及びガス導入
孔を設けた表面処理室を設けるときは、細管群か
ら出た弧立又は短チエイン超微粒子をコーテイン
グ処理でき、表面処理された製品を得ることがで
き、この場合、細管群の外周に設けたジケツト内
に冷媒又は加熱媒体を通すときは、適当な温度で
良質の表面処理された弧立又は短チエイン状超微
粒子を得ることができる。
(Effects of the Invention) According to the present invention, the degree of vacuum is higher than the degree of vacuum in the generation chamber in which the in-gas evaporation method is performed, and the ultrafine particle vapor generated in the generation chamber is caused by the differential pressure. A group of thin tubes consisting of a large number of thin tubes with air space between them, the lower end area of the thin tube group being larger than the area of the evaporation source, and the distance between the lower end of the thin tube group and the evaporation source being adjustable. Since it was designed to be drawn from the generation chamber to the vacuum chamber via the vacuum chamber and collected,
By heating or cooling the group of thin tubes with a medium flowing through the air, it is possible to control the growth of ultrafine particles, or to improve the connection strength of short chain-shaped ultrafine particles, and to control the amount of evaporation material. It is possible to obtain a large aggregate of erect ultrafine particles, and when the ultrafine particles are magnetized by a magnetization device while passing through the tube group at high speed, it is possible to collect short chain-shaped ultrafine particles. Furthermore, when a coating material evaporation device and/or a surface treatment chamber equipped with a gas introduction hole is provided on the high vacuum chamber side, the arcuate or short chain ultrafine particles emitted from the thin tube group can be coated. A surface-treated product can be obtained, and in this case, when passing the refrigerant or heating medium through the jiket provided on the outer periphery of the tube group, use a high-quality surface-treated arc or short chain superstructure at an appropriate temperature. Fine particles can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の実施例装置の1部を截除し
た側面図、第2図は−線截断面図、第3図は
変形例の1部の截断側面図を示す。 1……生成室、7……細管、8……細管群、1
0……高真空室、19……蒸発室、20……ガス
導入管。
FIG. 1 is a partially cut-away side view of an apparatus according to an embodiment of the present invention, FIG. 2 is a cut-away sectional view taken along the - line, and FIG. 3 is a partially cut-away side view of a modified example. 1... Generation chamber, 7... Thin tube, 8... Thin tube group, 1
0... High vacuum chamber, 19... Evaporation chamber, 20... Gas introduction pipe.

Claims (1)

【特許請求の範囲】 1 ガス中蒸発法により生成した超微粒子蒸気を
生成せしめる超微粒子生成室と、該生成室内の蒸
発源に対向して先端が開口し後端が高真空室に連
通する細管を設け、該真空室内の真空度を該生成
室内の真空度より高めて差圧を生ぜしめ、これに
より該生成室内の蒸気を該細管を介して該真空室
側へ引込むようにした弧立超微粒子の製造法にお
いて、細管を互に空〓を存して多数本で構成し、
該細管群の下端面積を前記蒸発源の面積より大き
くし、かつ該細管群の下端と該蒸発源の距離を調
節可能に構成し、該細管群を介して生成室内に生
成した超微粒子蒸気を該真空室側へ引込むように
したことを特徴とする弧立超微粒子の製造法。 2 ガス中蒸発法により生成した超微粒子蒸気を
生成せしめる超微粒子生成室と、該生成室内の蒸
発源に対向して先端が開口し後端が高真空室に連
通する細管を多数本併設し、該細管群の外周に、
磁化装置を設け、該真空室内の真空度を該生成室
内の真空度より高めて差圧を生ぜしめ、これによ
り該生成室内の蒸気を該細管群を介して該真空室
側へ引込むようにすると共に各細管内に核磁化装
置により生成せしめた磁場内を該超微粒子を通過
させるようにしたことを特徴とする短チエイン状
超微粒子の製造法。 3 ガス中蒸発法により生成した超微粒蒸気を生
成せしめる超微粒子生成室と、該生成室内の蒸発
源に対向して先端が開口し後端が高真空室に夫々
連通して設けた多数本の細管と該細管群の外周に
設けた磁化装置とから成り、且つ該高真空室の1
部を超微粒子表面処理室に構成して成る弧立又は
短チエイン状超微粒子の製造装置。 4 該超微粒子表面処理室は、該真空室内にコー
テイング用材の蒸発源を設けて成る特許請求の範
囲第3に記載の製造装置。 5 該超微粒子表面処理室は、該真空室内に連通
するガス導入管を設けて成る特許請求の範囲3に
記載の製造装置。 6 該細管群の下端面積は、蒸発源の面積よりも
大きい特許請求の範囲の3に記載の製造装置。 7 ガス中蒸発法により生成した超微粒蒸気を生
成せしめる超微粒子生成室と、該生成室内の蒸発
源に対向して先端が開口し後端が高真空度に夫々
連通して設けた多数本の細管と、該細管群の外周
を被包するジヤケツトと、該細管群の外周に設け
た環状磁化装置とから成り、且つ該真空室の1部
を超微粒子表面処理室に構成して成る弧立又は短
チエイン状超微粒子の製造装置。
[Scope of Claims] 1. An ultrafine particle generation chamber that generates ultrafine particle vapor generated by an in-gas evaporation method, and a thin tube whose front end is open facing an evaporation source in the generation chamber and whose rear end communicates with a high vacuum chamber. , the degree of vacuum in the vacuum chamber is made higher than the degree of vacuum in the generation chamber to create a pressure difference, and thereby the vapor in the generation chamber is drawn into the vacuum chamber through the thin tube. In the manufacturing method, a large number of thin tubes are formed with holes between them,
The area of the lower end of the group of capillary tubes is made larger than the area of the evaporation source, and the distance between the lower end of the group of capillary tubes and the source of evaporation is adjustable, and the ultrafine particle vapor generated in the generation chamber is transmitted through the group of capillary tubes. A method for producing erect ultrafine particles, characterized in that the particles are drawn into the vacuum chamber. 2. An ultrafine particle generation chamber for generating ultrafine particle vapor generated by in-gas evaporation method, and a large number of thin tubes facing the evaporation source in the generation chamber, each having an open tip and a rear end communicating with a high vacuum chamber, On the outer periphery of the group of tubules,
A magnetization device is provided, and the degree of vacuum in the vacuum chamber is made higher than the degree of vacuum in the generation chamber to generate a pressure difference, thereby drawing the steam in the generation chamber into the vacuum chamber side through the group of capillary tubes. 1. A method for producing short chain-shaped ultrafine particles, characterized in that the ultrafine particles are passed through a magnetic field generated by a nuclear magnetization device in each capillary. 3. An ultrafine particle generation chamber that generates ultrafine vapor generated by in-gas evaporation method, and a large number of tubes each having an open tip and a rear end communicating with a high vacuum chamber, facing the evaporation source in the generation chamber. It consists of a thin tube and a magnetization device provided on the outer periphery of the thin tube group, and one of the high vacuum chambers.
An apparatus for manufacturing ultrafine particles in an arcuate or short chain shape, comprising an ultrafine particle surface treatment chamber. 4. The manufacturing apparatus according to claim 3, wherein the ultrafine particle surface treatment chamber is provided with an evaporation source for a coating material within the vacuum chamber. 5. The manufacturing apparatus according to claim 3, wherein the ultrafine particle surface treatment chamber is provided with a gas introduction pipe communicating with the vacuum chamber. 6. The manufacturing apparatus according to claim 3, wherein the lower end area of the thin tube group is larger than the area of the evaporation source. 7. An ultrafine particle generation chamber that generates ultrafine vapor generated by in-gas evaporation method, and a large number of tubes each having an open tip facing the evaporation source in the generation chamber and a rear end communicating with a high degree of vacuum. An arc structure consisting of a thin tube, a jacket enclosing the outer periphery of the thin tube group, and an annular magnetization device provided on the outer periphery of the thin tube group, and in which a part of the vacuum chamber is configured as an ultrafine particle surface treatment chamber. Or an apparatus for producing short chain-shaped ultrafine particles.
JP61112790A 1986-05-19 1986-05-19 Method and device for producing isolated or short-chain ultra-fine particle Granted JPS62269743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61112790A JPS62269743A (en) 1986-05-19 1986-05-19 Method and device for producing isolated or short-chain ultra-fine particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61112790A JPS62269743A (en) 1986-05-19 1986-05-19 Method and device for producing isolated or short-chain ultra-fine particle

Publications (2)

Publication Number Publication Date
JPS62269743A JPS62269743A (en) 1987-11-24
JPH0434448B2 true JPH0434448B2 (en) 1992-06-08

Family

ID=14595581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61112790A Granted JPS62269743A (en) 1986-05-19 1986-05-19 Method and device for producing isolated or short-chain ultra-fine particle

Country Status (1)

Country Link
JP (1) JPS62269743A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100349311C (en) 2003-01-06 2007-11-14 三星Sdi株式会社 Cathode active material of rechargeable lithium battery and rechargeable lithium battery
US7384448B2 (en) * 2004-02-16 2008-06-10 Climax Engineered Materials, Llc Method and apparatus for producing nano-particles of silver

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6078635A (en) * 1983-10-07 1985-05-04 Res Dev Corp Of Japan Method and apparatus for forming discrete ultra-fine particles

Also Published As

Publication number Publication date
JPS62269743A (en) 1987-11-24

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