JPH04344634A - Silver halide photographic sensitive material for making printing plate - Google Patents

Abstract

PURPOSE:To reduce occurrence of pinholes and deterioration of antistaticness even after processing and to enhance reduction processing aptitude. CONSTITUTION:The silver halide photographic sensitive material having at least one photosensitive silver halide emulsion layer on one side of a support and a nonphotosensitive antihalation layer on the other side is characterized by lowering surface resistivity on the other side than that on one side by <=1/100 at 23 deg.C and in a relative humidity of 50% by using a conductive material made of an electric charge transfer type boron atom and basic nitrogen atom composition. As preferable embodiments, at least one nonphotosensitive hydrophilic colloidal layer is formed on the photosensitive silver halide emulsion layer or a nonphotosensitive antihalation layer or the side of <=1/100 surface resistivity is the side of the antihalation layer. The photosensitive silver halide emulsion layer contains a hydrazine compound or a tetrazolium compound, and the nonphotosensitive antihalation layer contains a halation dye absorbing >=20% light in the ultraviolet and visible wavelength regions.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material for plate making (hereinafter referred to as a "sensitive material for plate making"), and more particularly to a silver halide photographic light-sensitive material having excellent antistatic ability and power reduction properties.

0002

[Background of the Invention] In order to obtain the final halftone image or line image, photosensitive materials for platemaking are subjected to a process called reduction processing in order to reproduce the subtle tone of the image and satisfy artistic expression. , images are often partially or completely modified. For this reason, one of the extremely important performances of photosensitive materials for plate making is whether or not they have force-reducing properties. In the printing plate-making process, a method is often used in which the shading (tone) of an original image is expressed by the size of the area of minute dots, that is, by a halftone image.

[0003] In order to reduce the pressure of a photosensitive material for plate making on which a halftone image or a line image has been formed through exposure and development processing, there is a method of bleaching the metallic silver forming the halftone dot or line image with an oxidizing agent. etc. are known.

For example, Mies, The Theory of
The Photographic Process (Mees, The
Theory of the Photography
c Process) P738-P739 (1954
(published by Macmillan Publishing Co., Ltd.) describes a reducing solution using reducing ingredients such as permanganate, ferric salt, ceric salt, red blood salt, dichromate, and persulfate. .

[0005] The reduction process ultimately oxidizes the silver image, and the greater the amount of silver per unit area that is dissolved, the wider the range in which the image can be corrected by the reduction process.
That is, when a halftone dot image is subjected to power reduction processing, when the halftone dot area is reduced by the power reduction processing, the blackening density per halftone dot generally decreases in parallel. When the area is reduced, the smaller the reduction in blackening density per halftone dot area, the wider the range that can be corrected by force reduction. In other words, the measure of the correctable range of the halftone dot image can be expressed by showing how much the halftone dot area can be reduced while keeping the blackening density per halftone dot above a certain value.

[0006] In the present invention, when the blackening density of the halftone dots is reduced by force reduction treatment to the minimum value required in the plate-making process, how much the halftone dot area is reduced compared to the halftone dot area before the treatment is determined. This will be indicated by the term "reduction width."

As mentioned above, generally speaking, the greater the amount of silver forming the image, the greater the reduction range, and therefore the greater the extent to which the image can be corrected by reduction processing.

[0008] To achieve this, it would be better to increase the amount of silver halide coated per unit area used in the photosensitive material for plate making, but as is well known, silver is extremely expensive, so it is difficult to unnecessarily increase the amount of silver coated. is unfavorable from the viewpoint of both the cost of the photosensitive material for plate making and resource saving.

[0009] Therefore, one of the important challenges in the art is to produce a photosensitive material for plate making having the necessary properties using as little silver as possible.

Furthermore, from the viewpoint of dimensional stability, plastic supports such as polyester are generally used in photosensitive materials for plate making, and are relatively easily charged. Therefore, for example, compounds having a sulfonic acid group as described in JP-A-2-105143 or metal oxides as described in JP-A-1-20733 have been conventionally used as conductive materials. However, these conductive materials have a problem in that their charging performance deteriorates when the sensitive material is processed, and failures such as pinholes due to adhesion of foreign matter tend to occur.

[0011] It is known that in plate-making photosensitive materials, if abnormal points called pinholes occur in the halftone image, the quality of the halftone dots will be significantly impaired, and such pinholes will also impede the force reduction characteristics. It is being

Possible causes of this include, in addition to the adhesion of foreign matter due to charging, poor dispersion of the matting agent added to the sensitive material, and contamination of foreign matter into the emulsion. This problem can be solved by making the plate-making workshop cleaner, improving the matting agent dispersion method, and making the emulsion manufacturing process cleaner.

Therefore, in addition to improving halftone dot quality, prevention of pinholes is also desired in order to improve force reduction characteristics.

001
4]

OBJECTS OF THE INVENTION In order to solve the above-mentioned problems, the first object of the present invention is to provide a photosensitive material for plate making that has excellent reduction processing characteristics.

The second object is to provide a photosensitive material for plate making that does not deteriorate in antistatic ability even after processing, has less adhesion of foreign matter, and has fewer pinhole failures.

[0016]

[Structure of the Invention] The above object of the present invention is to provide at least one light-sensitive silver halide emulsion layer on one side of a support and a non-light-sensitive antihalation layer on the other side. In silver halide photographic light-sensitive materials, a conductive material consisting of a charge-transfer type bond of boron atoms and basic nitrogen atoms has a surface resistivity of 100 at 23°C and 50% relative humidity on one side relative to the other side. This can be achieved by using a silver halide photographic material which is characterized by a reduction in temperature to one-fold or less.

In a further preferred embodiment, at least one non-photosensitive hydrophilic colloid layer is provided on the photosensitive silver halide emulsion layer or the non-photosensitive antihalation layer, and the surface resistivity is lower than that on the other side. The side with a thickness of 1/100 or less is an antihalation layer. The photosensitive silver halide emulsion layer contains a hydrazine compound or a tetrazolium compound, and the non-photosensitive antihalation layer contains a halation dye that absorbs 20% or more of ultraviolet and visible light. It is preferable to let

The present invention will be explained in detail below.

The silver image formed using the silver halide photographic light-sensitive material of the present invention is characterized by high contrast and a large reduction width, and is therefore useful as a silver halide light-sensitive material used in a plate-making process.

The silver halide of the photosensitive silver halide emulsion layer preferably used in the present invention is fine silver halide grains having an average grain size of 0.60 μm or less and 0.40 μm or more. Further, it is preferable that the silver halide grains are monodispersed and have a uniform shape. Here, the monodispersity is expressed as a value obtained by dividing the standard deviation of particle diameter by the average particle diameter and multiplying it by 100. The monodispersity of the silver halide emulsion used in the present invention is preferably adjusted to a value of 5 to 100, more preferably 10 to 50.

Silver halide that can be used in the present invention includes:
For example, a type having a multilayer laminated structure of at least two layers can be used. For example, silver chlorobromide particles may have silver chloride in the core and silver bromide in the shell, or conversely, silver bromide in the core and silver chloride in the shell. At this time, iodine can be contained in any layer within 5 mol%.

When preparing the silver halide emulsion used in the present invention, a rhodium salt can be added to control the sensitivity or gradation. It is generally preferable to add the rhodium salt at the time of grain formation, but it may also be added at the time of chemical ripening or at the time of preparing the emulsion coating solution.

When using rhodium salts, other inorganic compounds such as iridium salts, platinum salts, thallium salts, cobalt salts, gold salts, etc. may also be used in combination. Iridium salts can be preferably used in amounts ranging from 10@-8 mol to 10@-6 mol per mol of silver, often for the purpose of imparting high-intensity properties.

In the present invention, it is preferable that the silver halide emulsion layer contains a tetrazolium compound. In this case, the tetrazolium compound to be contained in carrying out the present invention is typically represented by the following general formulas [I], [I
I] or [III].

[0025]

[Chemical formula 1]

[In the formula, R1, R3, R4, R5, R8,
R9, R10 and R11 are each an alkyl group (e.g. methyl group, ethyl group, propyl group, dodecyl group, etc.)
, alkenyl groups (e.g. vinyl, allyl, propenyl, etc.), aryl groups (e.g. phenyl, tolyl, hydroxyphenyl, carboxyphenyl, aminophenyl, mercaptophenyl, α-naphthyl, β-naphthyl) group, hydroxynaphthyl group, carboxynaphthyl group, aminonaphthyl group, etc.), and heterocyclic group
(For example, a thiazolyl group, a benzothiazolyl group, an oxazolyl group, a pyrimidinyl group, a pyridyl group, etc.), and any of these may be a group that forms a metal chelate or a complex.

R2, R6 and R7 are allyl groups,
A phenyl group that may have a substituent, a naphthyl group that may have a substituent, a heterocyclic group, an alkyl group (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a mercaptomethyl group, a mercaptoethyl group, etc.) ), hydroxyl group, carboxyl group or its salt, alkoxycarbonyl group (e.g. methoxycarbonyl group, ethoxycarbonyl group, etc.)
, represents a group selected from an amino group (for example, an amino group, an ethylamino group, an anilino group, etc.), a mercapto group, a nitro group, or a hydrogen atom, D represents a divalent aromatic group, and E represents an alkylene group or an arylene group. , aralalkylene group, X- represents a sulfur atomized anion, and n represents an integer of 1 or 2. However, when the compound forms an inner salt, n is 1. ] Next, the above general formula [I]
, [II] or [III], but the present invention is not limited thereto. Exemplary compound: (1) 2-(benzothiazol-2-yl)-3-
Phenyl-5-dodecyl-2H-tetrazolium (2) 2,3-diphenyl-5-(4-t-octyloxyphenyl)-2H-tetrazolium (3) 2,3,5-triphenyl-2H-tetrazolium (4 ) 2,3,5-tri(p-carboxyethylphenyl)-2H-tetrazolium (5) 2-(benzothiazol-2-yl)-3-
Phenyl-5-(o-chlorophenyl)-2H-tetrazolium (6) 2,3-diphenyl-2H-tetrazolium (7) 2,3-bis(p-methoxyphenyl)-5-phenyl-2H-tetrazolium (8 ) 2-(p-methoxyphenyl)-3-(p-
Tolyl)-5-phenyl-2H-tetrazolium (9) 2,3-diphenyl-5-ethyl-2H-tetrazolium (10) 2,3-diphenyl-5-n-hexyl-
2H-tetrazolium (11) 5-cyano-2,3-diphenyl-2H-
Tetrazolium (12) 2-(benzothiazol-2-yl)-5
-Phenyl-3-(4-tolyl)-2H-tetrazolium(13) 2-(benzothiazol-2-yl)-
5-(4-chlorophenyl)-3-(4-nitrophenyl)-2H-tetrazolium (14) 5-ethoxycarbonyl-2,3-di(3
-nitrophenyl)-2H-tetrazolium (15) 5-acetyl-2,3-di(p-ethoxyphenyl)-2H-tetrazolium (16) 2,5-diphenyl-3-(p-tolyl)-2H-tetrazolium (17) 2,5-diphenyl-3-(p-iodophenyl)-2H-tetrazolium (18) 2,3-diphenyl-5-(p-diphenyl)-2H-tetrazolium (19) 5-(p-promo phenyl)-2-phenyl-3-(2,4,6-trichlorophenyl)-2H-
Tetrazolium (20) 3-(p-hydroxyphenyl)-5-(p-nitrophenyl)-2-phenyl-2H-tetrazolium (21) 5-(3,4-dimethoxyphenyl)-3-(2-ethoxyphenyl )−
2-(4-methoxyphenyl)-2H-tetrazolium (22) 5-(4-cyanophenyl)-2,3-diphenyl-2H-tetrazolium (23) 3-(p-acetamidophenyl)-2,
5-diphenyl-2H-tetrazolium (24) 5-acetyl-2,3-diphenyl-2H
-Tetrazolium (25) 5-(Flu-2-yl)-2,3-diphenyl-2H-tetrazolium (26) 5-(Thien-2-yl)-2,3-diphenyl-2H-tetrazolium (27) 2 ,3-diphenyl-5-(pyrido-4-
yl)-2H-tetrazolium (28) 2,3-diphenyl-5-(quinol-2
-yl)-2H-tetrazolium (29) 2,3-diphenyl-5-(benzoxazol-2-yl)-2H-tetrazolium (30) 2,3,5-tri(p-ethylphenyl)
-2H-tetrazolium (31) 2,3,5-tri(p-allylphenyl)
-2H-tetrazolium (32) 2,3,5-tri(p-hydroxyethyloxyethoxyphenyl)-2H-tetrazolium (33) 2,3,5-tri(p-dodecylphenyl)-2H-tetrazolium (34) 2,3,5-tri(p-benzylphenyl)-2H-tetrazolium Next, the anion part of the tetrazolium compound represented by the above general formula [I], [II] or [III] is represented by the following general formula [
It can be represented by a], [b], [c], [d] or [e].

[0028]

[Case 2]

In the formula, R12 represents an alkyl group having 1 to 32 carbon atoms, such as a methyl group, an ethyl group, a propyl group, a hexyl group, a nonyl group, a dodecyl group, a hexadecyl group, etc. Contains one sulfur atom. n represents an integer of 1 to 3, and n1 represents an integer of 0 to 4.

[0030]

[Chemical formula 3]

In the formula, R13, R14, R16, R17 and R18 each represent a linear or branched alkyl group having 1 to 32 carbon atoms, such as a methyl group, ethyl group, butyl group, isobutyl group, or pentyl group. , hexyl group, octyl group, nonyl group, decyl group, dodecyl group, octadecyl group, etc., but it may also be a cyclic alkyl group, and these groups contain at least one sulfur atom. Also R13,R
14, R16, R17 and R18 each represent an aryl group, such as a phenyl group or a naphthyl group, and these aryl groups contain at least one sulfur atom.

Furthermore, R15 and R19 represent an acid group such as a carboxylate group, a sulfonato group or a phosphoric acid group.

[0033]

[C4]

In the formula, R20 represents a saturated or unsaturated linear or branched alkyl group having 1 to 32 carbon atoms. Examples of the saturated alkyl group include methyl group, ethyl group, butyl group, isobutyl group, It represents a hexyl group, a dodecyl group, an octadecyl group, etc., and as an unsaturated alkyl group, it represents, for example, an allyl group, a butenyl group, an octenyl group, etc. These saturated and unsaturated alkyl groups contain at least one sulfur atom. n2 and n3 represent integers of 1 to 3. Moreover, n4 represents an integer of 0 to 6.

[0035]

[C5]

In the formula, Y is a sulfur atom, a selenium atom, an oxygen atom, a nitrogen atom, or a R22 group (where R22 is a hydrogen atom or =N-, an alkyl group having 1 to 3 carbon atoms, such as a methyl group, an ethyl group) R21 represents a group having the same meaning as the group represented by R12 in the above general formula [a] or an aryl group containing at least one sulfur atom (for example, a phenyl group, a naphthyl group, etc.). Z represents an atomic group necessary to form a 5- or 6-membered heterocycle, examples of which include a thiazole ring, selenazole ring, oxazole ring, imidazole ring, pyrazole ring, triazole ring, tetrazole ring, pyrimidine ring. A triazine ring etc. can be mentioned.

The above heterocycle may further have a substituent such as an alkyl group or an aryl group. The tetrazolium compounds used in the present invention may be used alone or in combination.
It is also possible to use a combination of two or more species in any ratio.

The tetrazolium compound according to the present invention is contained in an amount of 1 x 10-6 mol to 10 mol, particularly 2 x 10-4 mol, per mol of silver halide contained in the light-sensitive material of the invention.
It is preferable to use it in a range of mol to 2×10 −1 mol.

It is particularly preferred that the silver halide photographic light-sensitive material for plate making of the present invention contains a hydrazine compound represented by the following general formula [H] in the light-sensitive silver halide emulsion layer.

[0040]

[C6]

With this configuration, it is possible to exhibit high-contrast photographic characteristics that have high contrast characteristics and control pin-like fog in halftone images.

In the above general formula [H], R1 is
Represents a hydrogen atom, formyl group, acyl group, sulfonyl group, carbamoyl group, sulfamoyl group, alkoxycarbonyl group, thioacyl group, or optionally substituted oxalyl group, and R2 is a hydrogen atom, acyl group, sulfonyl group, alkoxycarbonyl group , R3 represents a monovalent organic group, X1 represents a pyridine ring, a quinoline ring, a benzene ring, or a naphthalene ring, and m represents an integer from 0 to 6.

Further, the above substituents and m are detailed as follows.

R1 is a hydrogen atom, a formyl group, an acyl group,
(For example, acetyl group, trifluoroacetyl group, α
- (2,4-di-t-amylphenoxy) acetyl group, benzoyl group, etc.), sulfonyl group (e.g. methylsulfonyl group, toluenesulfonyl group, 4-dodecyloxybenzenesulfonyl group, etc.), carbamoyl group (e.g. carbamoyl group, dodecylcarbamoyl group,
dimethylcarbamoyl group, etc.), sulfamoyl group (
(e.g., sulfamoyl group, butylsulfamoyl group, dimethylsulfamoyl group, etc.), alkoxycarbonyl group (e.g., methoxycarbonyl group, tetradexyloxycarbonyl group, etc.), thioacyl group (e.g., thioacetyl group, etc.), oxalyl group (e.g., dimethyl (oxalyl group, methoxyoxalyl group, etc.), and among these, a hydrogen atom, a formyl group, an acyl group, and a sulfonyl group are particularly preferred.

R2 represents a hydrogen atom, an acyl group (eg, acetyl group, pivaloyl group, etc.), a sulfonyl group (eg, methanesulfonyl group, toluenesulfonyl group, etc.), an alkoxycarbonyl group (eg, methoxycarbonyl group, dodecyloxycarbonyl group, etc.). hydrogen atom is particularly preferred.

Examples of the monovalent organic group represented by R3 include a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an alkylthio group, an arylthio group, a sulfonyl group, an alkoxycarbonyl group, and an aryl group. Oxycarbonyl group, carbamoyl group, sulfamoyl group, acyl group, amino group, alkylamino group, arylamino group, acylamino group, sulfonamide group, arylaminothiocarbonylamino group,
Represents a hydroxy group, carboxy group, sulfo group, nitro group, cyano group, etc. Each of the groups described above for R1, R2, and R3 may further have a substituent, and includes each of the above-mentioned groups substituted in this way.

m represents an integer from 0 to 6. Preferably it is 0 to 3.

Examples of the 5- or 6-membered nitrogen-containing aromatic heterocyclic group represented by X1 include a pyrazolyl group, a benzimidazolyl group, a pyridyl group, a pyrimidyl group, and a quinolyl group. Particularly preferred are a pyridyl group, a quinolyl group, a phenylene group, a naphthalene group, and the like.

Compounds representative of the above general formula [H] include, for example, (1) to (21) described on pages 25 to 29 of JP-A-2-105143. Representative compounds are listed below. However, of course,
The specific compounds of general formula [H] that can be used in carrying out the present invention are not limited to these compounds.

[0050]

[C7]

[0051]

[Chemical formula 8]

[0052]

[Chemical formula 9]

The silver halide photographic light-sensitive material of the present invention preferably contains a compound represented by the above general formula [H]. In this case, the compound represented by the general formula [H] contained in the photographic light-sensitive material of the present invention The amount of the compound [H] is 5 x 10 - per mole of silver halide contained in the photographic light-sensitive material of the present invention.
Preferably, it is 7 to 5×10 −1 mol.

Next, the conductive material used in the present invention will be explained.

In the present invention, the surface resistivity of the emulsion layer and the antihalation layer is 23% on one side and on the other side.
C and 50 RH%, and for this purpose, for example, an emulsion layer or an antihalation layer, preferably a conductive layer is provided on the antihalation layer.

As the conductive material used in the present invention, a charge transfer type bond of boron atoms and basic nitrogen atoms can be used.

That is, the above-mentioned conjugate is a reaction product of an organic boron compound represented by the following general formula [B] and a tertiary amine having a total carbon number of 5 to 82 and having at least one hydroxyl group.

[0058]

[Chemical formula 10]

Specific compounds of general formula [B] are listed below, but the present invention is not limited thereto.

[0060]

[Chemical formula 11]

[0061]

[Chemical formula 12]

[0062]

[Chemical formula 13]

[0063]

[Chemical formula 14]

[0064]

[Chemical formula 15]

[0065]

[Chemical formula 16]

[0066]

[Chemical formula 17]

Examples of the tertiary amine having a total carbon number of 5 to 82 and having at least one hydroxyl group to be reacted with the organic boron compound represented by the above general formula include diethylhydroxymethylamine, dimethyl-2-hydroxypropylamine, methyl -di-(hydroxylethyl)amine,
Di-benzyl-2-hydroxypropylamine, di-(
Examples include ethylene oxide (1 to 25 mol) adducts of amine (hexadecyl).

The method for synthesizing the boron-containing polymer of the present invention is described in JP-A-1-259052, JP-A-1-259051,
No. 1-266153, page 4, JP-A-1-2
It can be synthesized by the method described on page 3 of No. 30653.

The polymer can be added by dissolving it in water, alcohols such as methanol, ethanol, isopropanol, etc., adding it by dispersing it in acid-treated or alkali-treated gelatin, or adding it by dissolving it in gelatin treated with acid or alkali. , Added by dissolving in acids such as lactic acid, itaconic acid, sulfurous acid, carbonic acid, salicylic acid, boric acid, etc. Added by dissolving in alkalis such as sodium carbonate, sodium acetate, sodium salicylate, sodium hydroxide, sodium bicarbonate, Dodecylbenzenesulfonic acid Anionic active agents such as soda, sodium octylbenzenesulfonate, sulfonated potassium salt of esterified product of succinic acid and hexanol, sodium isopropylnaphthalenesulfonate, saponin,
It can be added by dispersing it in natural products such as starch and albumin, or it can be added by dispersing it in polymers such as polyacrylic acid amide, styrene maleic acid copolymer, poval/butyral/sulfonated polyester, etc.

For example, an aqueous solution 95 containing 5% ethanol
An aqueous solution containing 5 g of the compound of the present invention dissolved in g is used.

The silver halide used in the photosensitive silver halide emulsion layer of the photosensitive material for plate making of the present invention is not particularly limited, and any silver halide can be used. For example, silver chloride, silver chlorobromide, silver chloride, etc. Silver bromide, silver iodobromide, silver bromide, etc. can be used, but especially chloride containing at least 60 mol% (preferably 75% or more) of silver chloride and 0 to 2 mol% of silver iodide. Silver oxide or silver chloroiodobromide is preferred. There are no particular restrictions on the morphology, crystal habit, size distribution, etc. of the silver halide grains, but the grain size is 0.60 μm or less.

Silver halide emulsions include gold compounds such as chlorauric acid salts and gold trichloride, salts of noble metals such as rhodium and iridium, sulfur compounds that react with silver salts to form silver sulfate, and stannous salts. The sensitivity can be increased without making the particles coarser by using reducing substances such as amines.

Further, salts of noble metals such as rhodium and iridium, and iron compounds such as red blood salts may be present during physical ripening of silver halide grains or during nucleation. As the hydrophilic colloid binder used in the present invention, it is advantageous to use gelatin, but other hydrophilic colloids can also be used. The silver halide emulsion layer or other layers include U.S. Pat.
, No. 411,912, No. 3,142,568, No. 3,
No. 325,286, No. 3,547,650, Special Publication No. 4
Polymer latexes made of homo- or copolymers of alkyl acrylates, alkyl methacrylates, acrylic acids, glycidyl acrylates, etc., described in No. 5-5331, etc., are used for purposes such as improving the dimensional stability of photographic materials and improving film properties. It can be made to contain.

[0074] Photographic emulsions include 4-
Many heterocyclic compounds and mercury-containing compounds including hydroxy-6-methyl-1,3,3a-7-tetraazaindene, 3-methylbeizothiazole, 5-methylbenzotriazole, 1-phenyl-5-mercaptotetrazole In addition to mercapto compounds, anti-fogging agents well known in the art such as those described in JP-A No. 49-81024, JP-A No. 50-6306, JP-A No. 50-19429, and U.S. Patent No. 3,850,639 are used. Any agent can be used. Hardeners are not particularly limited, but include aldehyde compounds, ketone compounds, 2-hydroxy-4,6
- Compounds with reactive halogens such as dichloro-1,3,5-triazine, compounds with reactive olefins
(For example, a vinyl sulfone compound), an N-methylol compound, an aziridine compound, a carbodiimide compound, etc. can be used.

A surfactant may be added to the silver halide emulsion layer used in the present invention for purposes such as a coating aid and improvement of photographic properties.

Examples of the surfactant include natural surfactants such as saponin, nonionic surfactants such as alkylene oxide type and glycidol type, carboxylic acid, and sulfonic acid.
(for example, the surfactants described in U.S. Pat. No. 3,415,649), phosphoric acid, sulfuric acid ester groups, anionic surfactants containing acidic groups such as phosphoric ester groups, amino acids, aminosulfonic acids, sulfuric acid or phosphoric acid of amino alcohols Amphoteric surfactants such as esters are preferably used.

The photosensitive material for plate making of the present invention is preferably developed in the presence of a polyalkylene oxide compound. The polyalkylene oxide compound may be included in the sensitive material and/or the developer, and its usage may be in accordance with conventional methods.

The polyalkylene oxide compound preferably used in the present invention is an alkylene oxide having 2 to 4 carbon atoms, such as ethylene oxide, propylene-1,2-
polyalkylene oxide consisting of at least 10 units, such as butylene-1,2-oxide, preferably ethylene oxide, and active hydrogen atoms such as water, aliphatic alcohol, aromatic alcohol, aliphatic, organic amine, hexitol derivatives, etc. It includes a condensate with at least one compound or a block copolymer of two or more polyalkylene oxides. Namely. Examples of polyalkylene oxide compounds include polyalkylene glycols, polyalkylene glycol alkyl ethers, polyalkylene glycol aryl ethers, polyalkylene glycol (arykyl aryl) esters, polyalkylene glycol esters, polyalkylene glycol fatty acid amides, and polyalkylene glycols. Amines, polyalkylene glycol block copolymers, polyalkylene glycol graft polymers, and the like can be used.

Specific examples of polyalkylene oxide compounds preferably used in the present invention are as follows.

Examples of polyalkylene oxide compounds

008
1]

[Chemical formula 18]

In the non-photosensitive layer used in the photographic material of the present invention, a hydrophilic colloid binder (eg, gelatin), a surfactant, a gelatin plasticizer, a polymer latex, a hardening agent, etc. can be used. Furthermore, in addition to the matting agent, antistatic agents, slip agents, colloidal silica, etc. can also be used in the surface protective film layer. It is desirable that the amount of the hydrophilic colloid binder be greater than that of the photosensitive silver halide emulsion layer, and that the layer be hardened in layers so that the degree of hardening is also higher, in order to improve suitability for reduction processing, which is the object of the present invention. Non-photosensitive layer and sub (photosensitive silver halide)
The thickness of the emulsion layer is preferably 0.01 μm to 100 μm,
Particularly preferred is 0.1 μm to 10 μm.

As the dye used in the non-photosensitive antihalation layer used in the present invention, dyes known in the photosensitive material industry that have a light absorption of 20% or more in the ultraviolet and visible regions can be used.

As the support for the photosensitive material for plate making of the present invention, polyester films such as polyethylene terephthalate films and cellulose ester films such as cellulose triacetate films are preferably used.

In the present invention, exposure to obtain an image may be carried out using a conventional method. In other words, natural light (
sunlight), tungsten electric lamp, fluorescent lamp, mercury lamp, xenon, arc lamp, carbon arc lamp, xenon flash lamp,
Any of a variety of known light sources can be used, such as a cathode ray tube flying spot. The exposure time is not only the 1/1000 second to 1 second exposure time normally used with a camera, but also the exposure time shorter than 1/1000 second, such as 1/104 to 1/106 second exposure using a xenon flash lamp or cathode ray tube. or exposures longer than 1 second can be used. If necessary, the spectral composition of the light used for exposure can be adjusted using a color filter. Laser light can also be used for exposure.

There are no particular limitations on the method of developing the photosensitive material for plate making of the present invention, and any method generally used for processing photosensitive materials for plate making can be used. The developing method may be carried out manually or by using an automatic developing machine. When processing with an automatic developing machine, there is no particular restriction on the method of conveyance (for example, roller conveyance, belt conveyance), and any conveying type automatic developing machine used in the industry can be used. In addition, U.S. Pat. No. 3,025,779 and U.S. Pat.
, No. 078,024, No. 3,122,086, No. 3,
No. 149,551, No. 3,156,173, No. 3,2
The descriptions in No. 24,356, No. 3,573,914, etc. can be referred to.

Regarding the silver halide emulsion layer, other layers, support, processing method, etc. of the photosensitive material for plate making of the present invention, please refer to Research Disclosure magazine.
Disclosure) Vol. 176, pp. 22-28 (19
(December 1978) can be referred to.

There are no particular limitations on the reducing liquid used in the reducing process of the photosensitive material for plate making of the present invention. the
Photographic Process) can be effectively used.

That is, reducing force components such as permanganates, persulfates, ferric salts, cupric salts, ceric salts, red blood salts, dichromates, etc. are used alone or in combination, and if necessary A reducing solution containing inorganic acids such as sulfuric acid, alcohols, or reducing components such as red blood salt, ethylenediamine, ferric tetraacetate, thiosulfate, rhodan salt, thiourea or its derivatives, etc. A reducing solution containing a silver halide solvent and, if necessary, an inorganic acid such as sulfuric acid is used.

The reducing liquid used for reducing the force of the photosensitive material for plate making of the present invention may further contain a compound having a mercapto group, if necessary.

There are no particular restrictions on the composition of the reducing liquid used for reducing the force of the photosensitive material for plate making of the present invention and the processing conditions (temperature, time, etc.), and can be appropriately determined by those skilled in the art.

Regarding the force reducing liquid and the force reducing method, the descriptions in the following patents can be referred to.

[0093] JP-A-51-140733, JP-A No. 52-6
No. 8419, No. 53-14002, No. 54-1192
No. 36, No. 54-119237, No. 55-2245, No. 55-2244, No. 55-17123, No. 55
No. -79444, No. 55-81344

[0094]

[Examples] The present invention will be explained below in more detail with reference to Examples, but the technical scope of the present invention is not limited in any way by the Examples below, and various embodiments are possible. be.

Example 1 Silver chlorobromide grains containing 1.8×10 −6 mol of rhodium chloride/1 mol of silver halide and having a silver bromide content of 30 mol % and the particles shown in Table 1 Cubic crystal grains of silver halide and grain sizes were prepared as follows. This emulsion was subjected to gold-sulfur sensitization in the presence of 4-hydroxy-1,3,3a-7-tetrazaindene. 50 mg/m2 of 2,3-bis(p-methoxyphenyl)-5-phenyl-2H tetrazolium chloride (Specific Example No. 7) was added to this emulsion as a contrast enhancer.
Added. Furthermore, 1-phenyl-
5-mercaptotetrazole 30mg/m2, 5-methylbenzotriazole 20mg/m2, nonylphenoxy-polyethylene glycol as a development regulator (specific example No. 4 with 30 ethylene oxide units) 30mg
/m2, acrylic acid-butyl methacrylate-styrene polymer latex 1 g/m2, U.S. Pat. No. 4,355
, No. 098, 20 mg/m2 of the desensitizing dye of Specific Example 4, further addition of a hardening agent such as bisvinylsulfonyl methyl ether (30 mg added per gram gelatin) and glyoxazole, and further addition of the conductive material shown in Table 1. After adding
It was coated on a 100 μm thick polyethylene terephthalate film base coated with latex according to Example 1 of JP-A-59-19941 in an amount of 3.0 g of silver and 1.6 g of gelatin per 1 m 2 . Further, on this silver halide emulsion layer, a matting agent, yellow dye tartrazine, colloidal silica 0.2 g/m2, and Japanese Patent Publication No. 53-2
8084, page 5, and the lower layer containing mordant dye M-1 and sodium fluorinated dodecylbenzenesulfonate and the upper layer containing the conductive material of the present invention as shown in Table 1, were mixed with gelatin per 1 m2. is upper layer 0.8g, lower layer 1.0
Sample No. 1~No. 12 was created. The protective film was hardened in layers according to Example 2 on page 2 of Japanese Patent Publication No. 61-35541.

Next, a backing layer having the following composition was provided on the undercoat layer on the side opposite to the support.

(Backing layer) Latex polymer: Butyl acrylate-styrene copolymer 0.5 g/m2 Saponin

200
mg/m2 conductive material

Amounts shown in Table 1

[0098]

[Chemical formula 19]

Ossein gelatin

2.0g/m2 (backing layer protective film) dioctyl sulfosuccinate ester
300mg/
m2 Matting agent: methyl methacrylate (average particle size 4.
0μm) 100mg/m2 Tin oxide (2% antimony doped) Ossein gelatin (isoelectric point 4.9)
1.1g/m2 Sodium fluorinated dodecylbenzenesulfonate
50mg/m2 conductive material

Amounts shown in Table 1

[0100]

[Table 1]

[0101] Next, the halftone dot image prepared in advance as an original was brought into close contact with the actual sample, and 50% of the original halftone dots were exposed to light using a tungsten halogen lamp, and after development, 55% of the original halftone dots were exposed.
% halftone dots. Furthermore, the development process is based on a patent application filed in 1986.
Processing was carried out using the developer composition and development conditions described in No. 13512, pages 47 to 48. The surface resistivity was measured before and after development.

[0102] The force reduction treatment was carried out using a force reduction liquid having the following formulation. (Reduction liquid) A solution Sodium thiosulfate (hypo) 400g water 10
00 lB liquid red blood salt
With 250g water
1000 liters of liquid used are A:B:
Water = 5:1:6 (20°C). Second result
Shown in the table.

[0103]

[Table 2]

[0104] In evaluating the results, pinholes were evaluated on a five-point scale based on the number of pinholes, with 5 being particularly excellent with no pinholes observed, and 2 or less being at a level that could not be put to practical use.

[0105] From Table 2, samples of the present invention (No. 2~
It can be seen that sample No. 12) significantly prevents the occurrence of pinholes compared to the comparative sample (No. 1), has less decrease in concentration due to force reduction, and has a wider force reduction range. It is also seen that the sample of the present invention exhibits little deterioration in surface resistivity before development.

It is also seen that the samples of the present invention have sufficient suitability for reduction processing even with a small amount of coated silver as in this example.

[0107]

Effects of the Invention As described above, the silver halide photographic light-sensitive material for plate making of the present invention has fewer pinholes, has excellent suitability for reduction processing, and can reduce the amount of silver coated per unit area even when the amount of silver coated per unit area is reduced. It was possible to provide a silver halide photographic light-sensitive material for plate making, which has the effect that the force processing suitability does not deteriorate and the force reduction range is wide, and furthermore, the antistatic ability shows little deterioration even after processing.

Claims (6)

[Claims] Claim 1: On one side on the support, at least one
In a silver halide photographic light-sensitive material in which a light-sensitive silver halide emulsion layer is provided on the other side and a non-light-sensitive antihalation layer is provided on the other side, a conductive material consisting of a charge-transfer bond of a boron atom and a basic nitrogen atom is used. 1. A silver halide photographic material, characterized in that the surface resistivity of one side is reduced to 1/100 or less at 23° C. and 50% relative humidity, depending on the material. 2. On the photosensitive silver halide emulsion layer,
2. The silver halide photographic material according to claim 1, further comprising at least one non-photosensitive hydrophilic colloid layer. 3. The silver halide photographic material according to claim 1, further comprising at least one non-photosensitive hydrophilic colloid layer provided on the non-photosensitive antihalation layer. 4. The surface resistivity is 100% lower than the other side.
A silver halide photographic light-sensitive material, characterized in that the side having a thickness of 1/2 or less is an antihalation layer. 5. The silver halide photographic material according to claim 1, wherein the photosensitive silver halide emulsion layer contains a hydrazine compound or a tetrazolium compound. 6. The silver halide photographic material according to claim 1, wherein the non-photosensitive antihalation layer contains 20% or more of a light-absorbing dye in the ultraviolet and visible regions.