JPH043475A - electronic components - Google Patents

electronic components

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Publication number
JPH043475A
JPH043475A JP2103030A JP10303090A JPH043475A JP H043475 A JPH043475 A JP H043475A JP 2103030 A JP2103030 A JP 2103030A JP 10303090 A JP10303090 A JP 10303090A JP H043475 A JPH043475 A JP H043475A
Authority
JP
Japan
Prior art keywords
semiconductor
thermal conductivity
type
electronic
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2103030A
Other languages
Japanese (ja)
Other versions
JP2936174B2 (en
Inventor
Yoichiro Yokoya
横谷 洋一郎
Koichi Kugimiya
公一 釘宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2103030A priority Critical patent/JP2936174B2/en
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to DE69132779T priority patent/DE69132779T2/en
Priority to EP91106177A priority patent/EP0455051B1/en
Priority to EP97120243A priority patent/EP0834930B1/en
Priority to DE69130654T priority patent/DE69130654T2/en
Priority to US07/688,424 priority patent/US5168339A/en
Publication of JPH043475A publication Critical patent/JPH043475A/en
Priority to US08/330,565 priority patent/USRE35441E/en
Application granted granted Critical
Publication of JP2936174B2 publication Critical patent/JP2936174B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To reduce thermal conductivity as the performance index of a semiconductor substance is left as it is by forming the inside of the semiconductor substance of a porous body in an electronic part for electronic cooling and heating utilizing a heat-generation heat- absorption phenomenon or for thermoelectric generation using electromotive force. CONSTITUTION:The insides of semiconductor substances are formed of a porous body or sections among the semiconductor substances are filled with insulating inorganic porous bodies or powder. Even when there are pores in the semiconductor substances, a Seebeck coefficient is approximately the same as that of a semiconductor substance having no pore because of not only the small contribution of the reduction of mobility of carriers by distortion, a grain boundary, etc., in the substances but also the insulating pores. Volume percentage of 5.0% or more in the semiconductor substance is favorable in the pores at that time. On the contrary, electric conductivity and thermal conductivity lower with the increase of porosity, but the ratio is approximately the same as a semiconductor substance having no porosity approximately up to the wide range of the porosity. When the clearances of P-type semiconductor 1 and N-type semiconductor substances 3 are filled with an insulating inorganic porous substance or powder and the sections of the clearances are deaerated until the sections are brought to a vacuum state, the convection of air by temperature difference generated in the clearance sections is prevented, thus reducing thermal conductivity as an element component. The vacuum state of lmmHg or less is favorable at that time.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、電子冷却、加熱素子や熱電発電素子などの電
子部品に関し、特に、熱伝導性の低い熱電物質および素
子で構成された電子部品に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to electronic components such as electronic cooling, heating elements, and thermoelectric power generation elements, and particularly to electronic components composed of thermoelectric substances and elements with low thermal conductivity. It is related to.

(従来の技術) 近年、地球環境問題からのフロン使用規制や、電子機器
等の局所冷却、除湿などの小形冷却装置などに対する要
求、小規模廃熱の利用の要求力1ら、ペルチェ効果、ゼ
ーベック効果を利用した電子冷却、加熱素子や、熱電発
電素子等の電子部品番こ対する要求は大きい。
(Conventional technology) In recent years, regulations on the use of fluorocarbons due to global environmental issues, demand for local cooling of electronic equipment, demand for compact cooling devices such as dehumidification, demand for small-scale waste heat utilization1, etc., Peltier effect, Seebeck, etc. There is a great demand for electronic parts such as electronic cooling and heating elements and thermoelectric power generation elements that utilize this effect.

このうち、室温付近で用いる電子冷却用の素子としては
、B1−Te系の単結晶もしくは、多結晶凝固体を半導
体物質として使用し、p形、n形物質を交互に金属銅板
などで接合し各物質の量器ま空隙とする構成を取ってい
た。また熱電発電用素子としてはFe、Siなどの多結
晶焼結体が用0られておりp形とn形物質を高温で直接
接合した構成を取っていた。
Among these, for electronic cooling elements used near room temperature, a B1-Te system single crystal or polycrystalline solidified body is used as the semiconductor material, and p-type and n-type materials are alternately bonded with metal copper plates, etc. The structure was such that the meter for each substance was a void. Furthermore, polycrystalline sintered bodies of Fe, Si, etc. have not been used as thermoelectric power generation elements, and have a structure in which p-type and n-type materials are directly joined at high temperatures.

(発明が解決しようとする課題) 電子冷却用の素子では、素子の消費電力あたりの冷却側
吸収熱量は、半導体物質の性能指数2で規定されること
が知られており、このZは半導体物質のゼーベック係数
S、電気伝導度σと熱伝導度kを用いて、z == s
 2 xσ/にで表現される。
(Problem to be Solved by the Invention) In electronic cooling elements, it is known that the amount of heat absorbed on the cooling side per unit of power consumption of the element is defined by the figure of merit 2 of the semiconductor material, and this Z is Using the Seebeck coefficient S, electrical conductivity σ and thermal conductivity k, z == s
It is expressed as 2xσ/.

このことから、半導体物質は、高いゼーベック係数をも
ちなから、高い電気伝導度と低い熱伝導度をもつことが
要求される。さらに、−旦冷却温度に到達後装置を間欠
運転する運転方法では、素子は、電圧印加時以外はでき
るだけ断熱性のよいことが必要であるため、性能指数が
同じでも熱伝導度が小さいことを求められる。
For this reason, semiconductor materials are required to have high electrical conductivity and low thermal conductivity since they have a high Seebeck coefficient. Furthermore, in the operation method in which the device is operated intermittently after reaching the cooling temperature, the device must have as good insulation as possible except when voltage is applied, so even if the figure of merit is the same, the thermal conductivity is small. Desired.

熱電発電用の素子では、高温側と低温側の温度差を維持
するため、素子の熱伝導度は小さいほうが好ましい。
In an element for thermoelectric power generation, in order to maintain a temperature difference between a high temperature side and a low temperature side, it is preferable that the thermal conductivity of the element is small.

これに対し、B1Te系の単結晶では、さらに、sbや
Seなどを固溶させて熱伝導の格子振動寄与を低下させ
る手法や、材料を溶融状態から単結晶成長させないで粒
径を制御した多結晶凝固体として熱伝導度を低下する手
法などが知られている。
On the other hand, in the case of B1Te-based single crystals, there are methods that reduce the contribution of lattice vibration to thermal conduction by solid solutioning sb, Se, etc., and methods that control the grain size without growing single crystals from the molten state. A method of reducing thermal conductivity as a crystal solidified body is known.

本発明は上記の諸要求を解決するもので、半導体物質あ
るいは素子構成として、熱伝導度の小さい電子冷却、加
熱用、熱電発電用電子部品を提供するものである。
The present invention solves the above-mentioned demands and provides an electronic component for electronic cooling, heating, and thermoelectric power generation that has low thermal conductivity as a semiconductor material or element configuration.

(課題を解決するための手段) 本発明は、半導体物質を多孔体とするものである。また
は、半導体物質の間を絶縁性の無機物多孔体又は粉末で
充填するか、もしくは内部を真空状態に脱気するか、あ
るいはいずれかの手段を複合するものである。
(Means for Solving the Problems) The present invention uses a semiconductor material as a porous body. Alternatively, the spaces between the semiconductor materials may be filled with an insulating inorganic porous material or powder, the interior may be evacuated to a vacuum state, or any of these methods may be combined.

(作 用) 半導体物質中に気孔が存在しても、物質中の歪、粒界等
によるキャリアの易動度減少の寄与は小さく、また、気
孔は絶縁性なので、ゼーベック係数はほとんど気孔の無
いものと変わらない。一方、電気伝導度と熱伝導度は、
気孔率の増加とともに低下するが、その比は気孔率の広
い範囲までほぼ気孔率の無いものと変わらないため、半
導体物質の性能指数はそのままで、熱伝導度を低下させ
ることができる。
(Function) Even if pores exist in a semiconductor material, the contribution of reducing carrier mobility due to strain in the material, grain boundaries, etc. is small, and since pores are insulating, the Seebeck coefficient is almost the same as that without pores. It's no different from anything else. On the other hand, electrical conductivity and thermal conductivity are
Although it decreases as the porosity increases, the ratio is almost the same as that of no porosity over a wide range of porosity, so the thermal conductivity can be lowered while the figure of merit of the semiconductor material remains the same.

p形、n形半導体物質の間隙を絶縁性無機多孔質もしく
は粉末で充填したり、さらにその部分を真空に脱気すれ
ば、間隙部で生ずる温度差による空気対流が防がれるた
め、素子構成体としての熱伝導度を小さくすることがで
きる。
By filling the gaps between p-type and n-type semiconductor materials with an insulating inorganic porous material or powder, and then evacuating the area to a vacuum, air convection due to the temperature difference that occurs in the gaps is prevented, and the element configuration can be improved. It is possible to reduce the thermal conductivity of the body.

(実施例) 本発明の実施例5例についてそれぞれ、第1図ないし第
5図により説明する。
(Example) Five examples of the present invention will be explained with reference to FIGS. 1 to 5, respectively.

まず、第1の実施例について説明する。First, a first example will be described.

半導体物質としてB1−Te系について検討したもので
、n形物質として(Bi、5b)2Te3を、n形物質
としてB12(’re、 5e)aをそれぞれ選択した
試料を作った。まず、各物質の多結晶凝固体の原料を粗
砕した後、ボールミル中で溶媒としエタノールを、粉砕
媒体として2mnφのジルコニアボールをそれぞれ用い
て粉砕する。乾燥した粉末を白金チューブにいれ脱気後
封止し、温度500℃圧力10kg/cdから1000
kg/cdでHIP処理を施した。
The B1-Te system was studied as a semiconductor material, and samples were prepared in which (Bi, 5b)2Te3 was selected as the n-type material and B12('re, 5e)a was selected as the n-type material. First, raw materials for polycrystalline solidified bodies of each substance are coarsely crushed, and then crushed in a ball mill using ethanol as a solvent and zirconia balls of 2 mm diameter as a crushing medium. The dried powder was put into a platinum tube, sealed after degassing, and heated at a temperature of 500℃ and a pressure of 10kg/cd to 1000℃.
HIP treatment was performed at kg/cd.

作成した試料は、白金チューブより取り出し3m X 
3 mm X 20mmに切断し、常温で嵩密度を測定
し気孔率を決定した。さらに、室温で約5℃の温度差を
素子両端につけ、起電力と両端の温度を測定しゼーベッ
ク係数を求めた。さらに、素子全体を室温で保持し4端
子法により抵抗値を測定し電気伝導率を求めた。また、
素子を室温真空中で0.07Iφの導線で両端を吊リバ
ーマー法で素子性能指数2を求め、電気伝導度、ゼーベ
ック係数より熱伝導度を求めた。
The prepared sample was taken out from the platinum tube and
It was cut into 3 mm x 20 mm, and the bulk density was measured at room temperature to determine the porosity. Furthermore, a temperature difference of about 5° C. was applied to both ends of the element at room temperature, and the electromotive force and temperature at both ends were measured to determine the Seebeck coefficient. Furthermore, the entire device was held at room temperature, and the resistance value was measured by the four-probe method to determine the electrical conductivity. Also,
The element was suspended at both ends with a conductive wire of 0.07 Iφ in vacuum at room temperature, and the element figure of merit 2 was determined by the Rivermer method, and the thermal conductivity was determined from the electrical conductivity and Seebeck coefficient.

第1表にp形材料、第2表にn形材料の試料の気孔率と
電気伝導度、熱伝導度、ゼーベック係数、性能指数をそ
れぞれ示す。
Table 1 shows the porosity, electrical conductivity, thermal conductivity, Seebeck coefficient, and figure of merit of the samples of the p-type material and the table 2 of the n-type material, respectively.

次に、上記の試料を用いて、第1図に示す冷却パネルを
試作した。冷却パネルは、上記のp形およびn形材料を
用い、1.5m立方に切断して作成したp形およびn形
冷却素子1および2を2.0m間隙で縦横15個ずつ計
225個をpn交互に配列し、電気的に直列に各素子1
および2をNi板3で結び、上下面に厚み1m、55!
l1lX55園のアルミナ板4を付けた。
Next, a cooling panel shown in FIG. 1 was prototyped using the above sample. The cooling panel was made by cutting the above p-type and n-type materials into 1.5m cubes, making a total of 225 p-type and n-type cooling elements 1 and 2 with a gap of 2.0m, 15 in each direction and in each direction. Each element 1 is arranged alternately and electrically in series.
and 2 are tied together with a Ni plate 3, with a thickness of 1 m on the top and bottom surfaces, 55!
I attached alumina plate 4 from l1lX55 Sono.

上記の冷却パネルの上下両面間の熱伝導を測定し、パネ
ルの単位面積当りの熱伝導度を求めた。
Thermal conductivity between the upper and lower surfaces of the above cooling panel was measured, and the thermal conductivity per unit area of the panel was determined.

素子気孔率と熱伝導率の関係を第3表に示す。Table 3 shows the relationship between element porosity and thermal conductivity.

傘部は請求の範囲外の比較例 第 、 特許請求の範囲外の比較例 嗜印は本発明の範囲外の比較例で 半導体は多結晶凝固体を用いた。The umbrella part is a comparative example outside the scope of claims. No. , Comparative example outside the scope of claims The stamp is a comparative example outside the scope of the present invention. A polycrystalline solidified body was used as the semiconductor.

第1表、第2表および第3表より明らかなように、半導
体物質中に気孔の存在するものは、物質としての熱伝導
度が低下し、またこれを用いて作製した冷却素子1およ
び2自体の熱伝導度も低下する。
As is clear from Tables 1, 2, and 3, semiconductor materials with pores have lower thermal conductivity as a material, and Cooling Elements 1 and 2 manufactured using the semiconductor materials have lower thermal conductivity. Its thermal conductivity also decreases.

特に気孔率が5.0%以上の範囲にあるものは、熱伝導
度が大きく低下する割に性能指数の低下が少ない。
In particular, when the porosity is in the range of 5.0% or more, the decrease in the figure of merit is small even though the thermal conductivity is greatly decreased.

次に、第2の実施例について説明する。Next, a second example will be described.

第2図は本実施例を示す冷却パネルの側面断面図で、第
1図に示した第1の実施例と異なる点は、P形およびn
形半導体物質として、第1表および第2表の比較例とし
て掲載した気孔を含まない多結晶凝固体および気孔率3
0%の試料を用いたp形およびn形冷却素子1および2
を使用した点と、両者の間隙に嵩比重0.04g/a+
?のガラス繊維断熱材又は平均粒径15μ■のパーライ
ト粉末5を充填し周辺を無機接着材6で固めた点である
。その他は第1の実施例と変わりがないので、同一構成
部品には同一符号を付して、その説明を省略する。
FIG. 2 is a side sectional view of a cooling panel showing this embodiment. The difference from the first embodiment shown in FIG.
Polycrystalline solids containing no pores and porosity 3, which are listed as comparative examples in Tables 1 and 2, are used as type semiconductor materials.
P-type and n-type cooling elements 1 and 2 using 0% samples
The bulk specific gravity is 0.04g/a+ in the gap between the two.
? The glass fiber insulation material or perlite powder 5 with an average particle size of 15 μm was filled and the surrounding area was solidified with an inorganic adhesive 6. Since the rest is the same as the first embodiment, the same components are given the same reference numerals and their explanations will be omitted.

第4表にパネルの単位面積当りの熱伝導率(W/a+f
−deg)を示す。
Table 4 shows the thermal conductivity per unit area of the panel (W/a+f
-deg).

第4表 第4表から明らかなように、P形およびn形冷却素子1
および2の間隙部をガラス繊維又はパーライト粉末で充
填された冷却パネルは、間隙部の空気の対流による熱伝
導が抑えられるため、パネルの熱伝導率が低下する。ま
た、半導体中に気孔を含む冷却素子1および2を用いた
パネルは、さらに熱伝導率が低下する。
Table 4 As is clear from Table 4, P-type and n-type cooling elements 1
In the case of a cooling panel in which the gap between 2 and 2 is filled with glass fiber or pearlite powder, heat conduction due to air convection in the gap is suppressed, so the thermal conductivity of the panel decreases. Moreover, the thermal conductivity of panels using cooling elements 1 and 2 containing pores in the semiconductor is further reduced.

次に、第3実施例について説明する。Next, a third example will be described.

第3図は本実施例を示す冷却パネルの側面断面図で5本
実施例が第2図に示した第2の実施例と異なる点は、ガ
ラス繊維又はパーライト粉末5による間隙充填に替って
、真空中で冷却パネル全体を加熱し、パネル外周部に低
融点ガラス封止部7を形成したのち冷却してP形および
n形冷却素子1および2の間隙を0.001mHg程度
の真空状態とした点である。
FIG. 3 is a side sectional view of a cooling panel showing this embodiment. The difference between this embodiment and the second embodiment shown in FIG. The entire cooling panel is heated in vacuum to form a low-melting glass sealing part 7 on the outer periphery of the panel, and then cooled to create a vacuum state of about 0.001 mHg between the P-type and N-type cooling elements 1 and 2. This is the point.

その他は第2の実施例と変わりがないので、同じ構成部
品には、同一符号を付してその説明を省略する。
The rest is the same as the second embodiment, so the same components are given the same reference numerals and their explanations will be omitted.

第5表にパネルの単位面積あたりの熱伝導率(w/cn
−deg)を示す。
Table 5 shows the thermal conductivity per unit area of the panel (w/cn
-deg).

第5表 第5表より明らかなように、p形およびn形冷却素子1
および2の間隙部を真空状態にしたものは、間隙部の空
気の対流による熱伝導が抑えられるため、パネルの熱伝
導率が低下する。また、冷却パネルとして使用する際に
、冷却素子結合部に結露を生じないため、結合部の腐食
劣化を防止することができる。
Table 5 As is clear from Table 5, p-type and n-type cooling elements 1
In the case of 2 and 2 in which the gap is in a vacuum state, heat conduction due to air convection in the gap is suppressed, resulting in a decrease in the thermal conductivity of the panel. Further, when used as a cooling panel, since no dew condensation occurs at the cooling element joint portion, corrosion and deterioration of the joint portion can be prevented.

次に、第4.第5の実施例について説明する・第4図お
よび第5図は、共に本実施例の冷却ノ(ネルを示す側面
断面図で、第2図に示した第2の実施例と異なる点は、
第4図では、パネル全体を真空中で加熱してパネル外周
部の低融点ガラス封止部7を形成したのち、冷却して冷
却素子1および2の間隙を0.01mmHg程度の真空
状態とした点と、第5図では、周辺部を樹脂約1mmモ
ールドした樹脂封止部8を形成したのち、樹脂封止部8
の一端より内部をlmmHg程度の真空状態に脱気した
点である。
Next, the fourth. Explanation of the fifth embodiment - Figures 4 and 5 are side sectional views showing the cooling channel of this embodiment, and the differences from the second embodiment shown in Figure 2 are as follows.
In Fig. 4, the entire panel is heated in vacuum to form a low melting point glass sealing part 7 on the outer periphery of the panel, and then cooled to create a vacuum state of about 0.01 mmHg between the cooling elements 1 and 2. In FIG. 5, after forming the resin sealing part 8 by molding the peripheral part with resin to a thickness of about 1 mm, the resin sealing part 8 is
The interior was evacuated from one end to a vacuum state of approximately 1 mmHg.

その他は第2の実施例と変わりがないので、同し構成部
品には同一符号を付してその説明を省略する。
Since the rest is the same as the second embodiment, the same components are given the same reference numerals and their explanations will be omitted.

第6表にパネルの単位面積あたりの熱伝導率(W/ff
l−deg)を示す。
Table 6 shows the thermal conductivity per unit area of the panel (W/ff
l-deg).

第 表 第 表 つづき 第6表から明らかなように、p形およびn形冷却素子1
および2の間隙部を絶縁性のガラス繊維又はパーライト
・粉末で充填しさらに真空状態にした冷却パネルは、間
隙部の空気の対流による熱伝導が抑えられるため、パネ
ルの熱伝導率を低下する。また、冷却パネルとして使用
する際に、冷却素子1および2の接合部に結露を生じな
いため、接合部の腐食劣化を防止することができる。特
に。
As is clear from Table 6, p-type and n-type cooling elements 1
A cooling panel in which the gap between 2 and 2 is filled with insulating glass fiber or perlite powder and is further evacuated will reduce the thermal conductivity of the panel because heat conduction due to air convection in the gap is suppressed. Further, when used as a cooling panel, since no dew condensation occurs at the joint between the cooling elements 1 and 2, corrosion and deterioration of the joint can be prevented. especially.

試料番号63で示すように、間隙を絶縁性のガラス繊維
又はパーライト粉末で充填し、さらに真空状態にした構
成をとった場合、粉末真空断熱材の寄与で1+wn[(
g程度の低い真空度で高い熱伝導率の低下が達成でき、
構成、製造プロセスも容易であり、かつ結露防止効果も
充分である。
As shown in sample number 63, when the gap is filled with insulating glass fiber or pearlite powder and a vacuum is created, 1+wn[(
A high reduction in thermal conductivity can be achieved with a vacuum degree as low as 1.5 g.
The structure and manufacturing process are easy, and the dew condensation prevention effect is sufficient.

(発明の効果) 以上説明したように、本発明によれば、電子冷却・加熱
素子や、熱電発電用素子などの電子部品に使用すれば性
能指数を低下させることなく低い熱伝導性が得られ、電
圧を印加しない運転時の熱伝導によるロスを防ぐことが
できる。
(Effects of the Invention) As explained above, according to the present invention, when used in electronic components such as electronic cooling/heating elements and thermoelectric generation elements, low thermal conductivity can be obtained without reducing the figure of merit. , it is possible to prevent loss due to heat conduction during operation without applying voltage.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1の実施例の電子冷却パネルの斜視
図、第2図、第3図、第4図および第5図は本発明によ
る第2.第3.第4および第5の実施例を示す電子冷却
パネルの側面断面図である。 第1図 1・・・p最冷却素子、 2・”n形冷却素子・3・・
・Ni板、 4・・・アルミナ板、  5・・ガラス繊
維又はパーライト粉末、  7・・・低融点ガラス封止
部、  8・・・樹脂封止部。 特許出願人 松下電器産業株式会社 第2区 代 理 人 星 野 恒 司 パーライト粉本 第3図 第5区 第4図 8子會丁851寸止号習 手続補正書(自制 平成3年5月20日
FIG. 1 is a perspective view of an electronic cooling panel according to a first embodiment of the present invention, and FIGS. Third. FIG. 7 is a side sectional view of an electronic cooling panel showing fourth and fifth embodiments. Fig. 1 1... P-type cooling element, 2... N-type cooling element, 3...
-Ni plate, 4...Alumina plate, 5...Glass fiber or pearlite powder, 7...Low melting point glass sealing part, 8...Resin sealing part. Patent Applicant Matsushita Electric Industrial Co., Ltd. District 2 Agent Koji Hoshino Perlite Powder Book Figure 3 District 5 Figure 4 Figure 8 Child Meeting No. 851 Dimension Procedure Amendment (Self-Regulation May 20, 1991)

Claims (7)

【特許請求の範囲】[Claims] (1)p形とn形の半導体素子を電気的に直列に接合し
、直流電流を流した時の接合界面における発熱吸熱現象
を利用した電子冷却・加熱用電子部品や、接合界面の温
度差による起電力を利用した熱電発電用電子部品におい
て、半導体素子が多孔体であることを特徴とする電子部
品。
(1) Electronic components for electronic cooling and heating that utilize heat generation and endothermic phenomena at the bonding interface when p-type and n-type semiconductor elements are electrically bonded in series and DC current is applied, and temperature differences at the bonding interface. An electronic component for thermoelectric power generation using electromotive force, characterized in that the semiconductor element is a porous body.
(2)半導体素子の気孔率が5.0%以上であることを
特徴とする請求項(1)記載の電子部品。
(2) The electronic component according to claim (1), wherein the semiconductor element has a porosity of 5.0% or more.
(3)複数のp形とn形の半導体素子を面状に配置し電
気的に直列に接合し、直流電流を流した時の接合界面に
おける発熱吸熱現象を利用した電子冷却・加熱用電子部
品において、半導体素子の間隙を絶縁性の無機物多孔体
もしくは粉末で充填したことを特徴とする電子部品。
(3) Multiple p-type and n-type semiconductor elements are arranged in a planar manner and electrically connected in series, and electronic components for electronic cooling and heating utilize heat generation and endothermic phenomena at the bonding interface when direct current is passed. An electronic component characterized in that a gap between a semiconductor element is filled with an insulating inorganic porous material or powder.
(4)半導体素子が多孔体であることを特徴とする請求
項(3)記載の電子部品。
(4) The electronic component according to claim (3), wherein the semiconductor element is a porous body.
(5)p形とn形の半導体物質を面状に配置し電気的に
直列に接合した構成をとり、直流電流を流した時の接合
界面における発熱吸熱現象を利用した電子冷却・加熱用
電子部品において、半導体素子の間隙を真空状態にした
ことを特徴とする電子部品。
(5) P-type and n-type semiconductor materials are arranged in a planar manner and electrically connected in series, and electrons for electronic cooling and heating utilize the exothermic and endothermic phenomenon at the bonding interface when a direct current is applied. An electronic component characterized by having a gap between semiconductor elements in a vacuum state.
(6)半導体素子の間隙部をさらに1mmHg以下の真
空状態に脱気したことを特徴とする請求項(5)記載の
電子部品。
(6) The electronic component according to claim (5), wherein the gap between the semiconductor elements is further evacuated to a vacuum state of 1 mmHg or less.
(7)半導体素子の間隙部をさらに1mmHg以下の真
空状態に脱気したことを特徴とする請求項(5)記載の
電子部品。
(7) The electronic component according to claim (5), wherein the gap between the semiconductor elements is further evacuated to a vacuum state of 1 mmHg or less.
JP2103030A 1990-04-20 1990-04-20 Electronic components Expired - Fee Related JP2936174B2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2103030A JP2936174B2 (en) 1990-04-20 1990-04-20 Electronic components
EP91106177A EP0455051B1 (en) 1990-04-20 1991-04-18 Thermoelectric semiconductor having a porous structure deaerated into a vacuum and thermoelectric panel
EP97120243A EP0834930B1 (en) 1990-04-20 1991-04-18 Thermoelectric semiconductor deaerated into a vacuum and thermoelectric panel using p-type and n-type thermoelectric semiconductors
DE69130654T DE69130654T2 (en) 1990-04-20 1991-04-18 Vacuum-insulated thermoelectric semiconductor consisting of a porous structure and thermoelectric component
DE69132779T DE69132779T2 (en) 1990-04-20 1991-04-18 Vacuum insulated thermoelectric semiconductors and thermoelectric devices using P and N type thermoelectric semiconductors
US07/688,424 US5168339A (en) 1990-04-20 1991-04-22 Thermoelectric semiconductor having a porous structure deaerated in a vacuum and thermoelectric panel using p-type and n-type thermoelectric semiconductors
US08/330,565 USRE35441E (en) 1990-04-20 1994-10-28 Thermoelectric semiconductor having a porous structure deaerated in a vacuum and thermoelectric panel using p-type and n-type thermoelectric semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2103030A JP2936174B2 (en) 1990-04-20 1990-04-20 Electronic components

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JPH043475A true JPH043475A (en) 1992-01-08
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Country Link
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US5984752A (en) * 1994-10-05 1999-11-16 Matsushita Electric Industrial Co., Ltd. Electron emission cathode; an electron emission device, a flat display, a thermoelectric cooling device incorporating the same; and a method for producing the electron emission cathode
US5777427A (en) * 1994-10-05 1998-07-07 Matsushita Electric Industrial Co., Ltd. Electron emission cathode having a semiconductor film; a device including the cathode; and a method for making the cathode
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