JPH0435733A - Vacuum exhaust equipment - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a vacuum evaporation apparatus for coating a metal film or a dielectric multilayer film on a substrate made of glass, ceramic, plastic, or the like.

[Conventional technology]

Conventionally, a metal film or a dielectric multilayer film has been coated on a substrate made of glass, ceramic, plastic, or the like.

To coat a metal film or dielectric multilayer film on a substrate made of glass, ceramic, plastic, etc., the substrate must be plasma cleaned or ion bombarded as a pretreatment to increase the adhesion of the film to the substrate. Etc. processing is being carried out.

By performing this pretreatment, organic contaminants such as oils and fats adhering to the surface of the substrate can be decomposed and removed, the surface of the substrate is etched, and the metal film or dielectric multilayer film is strongly adhered to the substrate.

By the way, in a conventional roughing vacuum evaporation apparatus, for example, as shown in FIG. A rough evacuation valve 4 is provided between 2 and 2, and by adjusting the rough evacuation valve 4, the inside of the vacuum chamber 1 is evacuated to about 10-2, and rough evacuation is performed.

After this, the vacuum chamber is evacuated to about 10''4 using a diffusion pump 5 connected to the vacuum chamber 1, and the main evacuation is performed.

[Problem to be solved by the invention]

However, according to the above-mentioned vacuum evaporation apparatus, the gas in the vacuum chamber 1 and the connecting piping is disturbed, especially when roughing the vacuum chamber 1.
There is a drawback that foreign matter such as minute dust adheres to the substrate, resulting in defective products.

[Purpose of the invention]

The present invention was invented in view of the above points.

To provide a vacuum evaporation device capable of reliably depositing a film on a substrate with less gas turbulence and no fine foreign matter in the vacuum chamber adhering to the substrate when roughing the vacuum chamber. With the goal.

[Means to solve the problem] The present invention has the following configuration in order to solve the above problems.

In other words, an oil rotary pump is connected to the vacuum chamber in which the board is mounted using connection piping.

Additionally, a roughing valve will be connected between the vacuum tank and the oil rotary pump.

Also, connect a pressure switch and gas introduction valve between the vacuum tank and the oil rotary pump.

Then, the gas introduction valve is opened, and while applying a load to the oil rotary pump, the roughing valve is opened, and the inside of the apparatus is gradually evacuated.

After this, the inside of the vacuum chamber is evacuated to about 10-1, and the main vacuum is drawn.

[Function] According to the vacuum evaporation apparatus with the structure described above, the gas introduction valve is opened, and the roughing valve is opened while applying a load to the oil rotary pump, and the inside of the apparatus is gradually evacuated. There is little turbulence in the gas in the chamber, and fine foreign matter in the vacuum chamber does not adhere to the substrate.

〔Example〕

The invention will now be explained with reference to FIGS. 1 and 2. In the figure, 11 is a vacuum chamber in which the substrate is mounted, and 12 is a vacuum chamber 1.
1 is an oil rotary pump connected by piping, 13 is a vacuum chamber 1
a roughing valve connected between 1 and the oil rotary pump 12;
14 is a gas introduction valve connected between the vacuum chamber 11 and the oil rotary pump 12; 15 is a pressure switch connected between the vacuum chamber 11 and the gas introduction valve 14; and 16 is a gas introduction valve connected between the vacuum chamber 11 and the roughing valve 13. The dust filter 17 is connected to the gas introduction valve 14, and the dust filter 18 is a dehumidification filter connected to the dust filter 17, and the dust filter 17 is connected to the gas introduction valve 14. Reference numeral 620 for injection is a high vacuum pump connected to the vacuum chamber 11, and reference numeral 21 is a high vacuum valve connected between the vacuum chamber 11 and the high vacuum pump 20. 22 is an auxiliary valve connected between the pipe 23 and the high vacuum pump 20.

In the same device, open the gas introduction valve 14.

The roughing valve 13 is opened while applying a load to the oil rotary pump 12, and the vacuum tank 11 is gradually evacuated.

Then, it is roughly drawn to a pressure of about 10-2.

After this, the high vacuum pump 20 connected to the vacuum chamber 11
Switch to evacuate to about 10-4, then do the main pull.

According to the vacuum evaporation apparatus of the present invention described above, a load can be applied to the oil rotary pump by the gas (air) introduced through the gas introduction valve. At this time, the pumping speed of the oil rotary pump is lower than that without gas introduction, as shown in Figure 2, so it is possible to gradually roughen the vacuum chamber compared to conventional vacuum evaporation equipment. So,
There is little turbulence in the gas inside the vacuum chamber.

〔Effect of the invention〕

As described above, the present invention connects a roughing valve with piping to the vacuum chamber in which the substrate is mounted, and connects an oil rotary pump to the roughing valve with piping, and also connects one end of the roughing valve with the oil rotary pump. A gas inlet valve is connected between the pump and the other end is connected to the vacuum chamber, and has a pressure switch.

The gas inlet valve is opened and the oil rotary pump is loaded while the roughing valve is opened and the inside of the device is gradually evacuated, so there is less turbulence in the gas in the vacuum chamber during rough evacuation. This has the unique effect of preventing fine foreign matter from the vacuum chamber from adhering to the substrate.

[Brief explanation of drawings]

FIG. 1 is a front view of a vacuum evaporation apparatus according to the present invention, FIG. 2 is an explanatory diagram showing the relationship between pumping speed and pressure between the vacuum evaporation apparatus according to the present invention and a conventional vacuum evaporation apparatus, and FIG. FIG. 2 is a side view of a conventional vacuum evaporation apparatus. 11...Vacuum tank 12...Oil rotary pump 13...Roughing valve 14...Gas introduction valve 15...Pressure switch 20...High vacuum pump j[2 Figure pressure (Torr) 0. 1

Claims (1)

[Claims] 1. A vacuum chamber in which a substrate is mounted. A roughing valve connected to the vacuum chamber with piping, an oil rotary pump connected to the roughing valve with piping, one end connected between the roughing valve and the oil rotary pump, and the other end connected to the vacuum chamber. The system is connected to a gas introduction valve and has a pressure switch, and in response to a signal from the pressure switch, the gas introduction valve is opened, and while applying a load to the oil rotary pump, the roughing valve is opened, and the inside of the device is gradually evacuated. A vacuum evacuation device characterized by being configured as follows.