JPH0436255U - - Google Patents

Info

Publication number
JPH0436255U
JPH0436255U JP7773990U JP7773990U JPH0436255U JP H0436255 U JPH0436255 U JP H0436255U JP 7773990 U JP7773990 U JP 7773990U JP 7773990 U JP7773990 U JP 7773990U JP H0436255 U JPH0436255 U JP H0436255U
Authority
JP
Japan
Prior art keywords
diffusion layer
type
semiconductor substrate
type semiconductor
photothyristor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7773990U
Other languages
Japanese (ja)
Other versions
JP2521745Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990077739U priority Critical patent/JP2521745Y2/en
Publication of JPH0436255U publication Critical patent/JPH0436255U/ja
Application granted granted Critical
Publication of JP2521745Y2 publication Critical patent/JP2521745Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Thyristors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本案の一実施例の略断面図、第2図は
他の実施例の略断面図、第3図は従来例の略断面
図である。 1……N型半導体基板、2……アノード拡散層
、3……Pゲート拡散層、4……カソード拡散層
、8……N型拡散層。
FIG. 1 is a schematic sectional view of one embodiment of the present invention, FIG. 2 is a schematic sectional view of another embodiment, and FIG. 3 is a schematic sectional view of a conventional example. 1... N-type semiconductor substrate, 2... Anode diffusion layer, 3... P-gate diffusion layer, 4... Cathode diffusion layer, 8... N-type diffusion layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] N型半導体基板の表面のPゲート拡散層とアノ
ード拡散層との間のN型の領域とその表面の絶縁
膜との界面に、N型半導体基板の不純物濃度より
も高い濃度のN型拡散層を形成したフオトサイリ
スタ。
An N-type diffusion layer with an impurity concentration higher than that of the N-type semiconductor substrate is formed at the interface between the N-type region between the P gate diffusion layer and the anode diffusion layer on the surface of the N-type semiconductor substrate and the insulating film on the surface. photothyristor formed.
JP1990077739U 1990-07-20 1990-07-20 Photo thyristor Expired - Lifetime JP2521745Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990077739U JP2521745Y2 (en) 1990-07-20 1990-07-20 Photo thyristor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990077739U JP2521745Y2 (en) 1990-07-20 1990-07-20 Photo thyristor

Publications (2)

Publication Number Publication Date
JPH0436255U true JPH0436255U (en) 1992-03-26
JP2521745Y2 JP2521745Y2 (en) 1997-01-08

Family

ID=31620401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990077739U Expired - Lifetime JP2521745Y2 (en) 1990-07-20 1990-07-20 Photo thyristor

Country Status (1)

Country Link
JP (1) JP2521745Y2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562668A (en) * 1979-06-21 1981-01-12 Nec Corp Planar type thyristor
JPS6353973A (en) * 1986-08-22 1988-03-08 Sharp Corp Photothyristor chip

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562668A (en) * 1979-06-21 1981-01-12 Nec Corp Planar type thyristor
JPS6353973A (en) * 1986-08-22 1988-03-08 Sharp Corp Photothyristor chip

Also Published As

Publication number Publication date
JP2521745Y2 (en) 1997-01-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term