JPH043662B2 - - Google Patents

Info

Publication number
JPH043662B2
JPH043662B2 JP58187866A JP18786683A JPH043662B2 JP H043662 B2 JPH043662 B2 JP H043662B2 JP 58187866 A JP58187866 A JP 58187866A JP 18786683 A JP18786683 A JP 18786683A JP H043662 B2 JPH043662 B2 JP H043662B2
Authority
JP
Japan
Prior art keywords
pressure
flow rate
gas
temperature
lens barrel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58187866A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6079357A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58187866A priority Critical patent/JPS6079357A/ja
Priority to US06/656,746 priority patent/US4690528A/en
Publication of JPS6079357A publication Critical patent/JPS6079357A/ja
Publication of JPH043662B2 publication Critical patent/JPH043662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58187866A 1983-10-05 1983-10-07 投影露光装置 Granted JPS6079357A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58187866A JPS6079357A (ja) 1983-10-07 1983-10-07 投影露光装置
US06/656,746 US4690528A (en) 1983-10-05 1984-10-01 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58187866A JPS6079357A (ja) 1983-10-07 1983-10-07 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6079357A JPS6079357A (ja) 1985-05-07
JPH043662B2 true JPH043662B2 (fr) 1992-01-23

Family

ID=16213583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58187866A Granted JPS6079357A (ja) 1983-10-05 1983-10-07 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6079357A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
US4616908A (en) * 1984-07-19 1986-10-14 Gca Corporation Microlithographic system
JPS6221222A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd 露光装置
JP2556328B2 (ja) * 1987-06-15 1996-11-20 キヤノン株式会社 露光装置
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JP2625076B2 (ja) * 1993-11-26 1997-06-25 株式会社日立製作所 投影露光方法およびその装置
JP3521416B2 (ja) * 1995-10-06 2004-04-19 株式会社ニコン 投影露光装置
US5798838A (en) * 1996-02-28 1998-08-25 Nikon Corporation Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
KR101527242B1 (ko) * 2007-08-24 2015-06-08 칼 짜이스 에스엠테 게엠베하 광학 소자 내의 온도 분포에 영향을 주기 위한 방법, 광학 보정 장치 및 이러한 광학 보정 장치를 갖는 투영 노광 장치
NL2008186A (en) * 2011-03-14 2012-09-17 Asml Netherlands Bv Projection system, lithographic apparatus and device manufacturing method.

Also Published As

Publication number Publication date
JPS6079357A (ja) 1985-05-07

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