JPH04588B2 - - Google Patents

Info

Publication number
JPH04588B2
JPH04588B2 JP58186266A JP18626683A JPH04588B2 JP H04588 B2 JPH04588 B2 JP H04588B2 JP 58186266 A JP58186266 A JP 58186266A JP 18626683 A JP18626683 A JP 18626683A JP H04588 B2 JPH04588 B2 JP H04588B2
Authority
JP
Japan
Prior art keywords
optical system
projection optical
projection
temperature
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58186266A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6078456A (ja
Inventor
Shoichi Tanimoto
Kazunori Imamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP58186266A priority Critical patent/JPS6078456A/ja
Priority to US06/656,746 priority patent/US4690528A/en
Publication of JPS6078456A publication Critical patent/JPS6078456A/ja
Publication of JPH04588B2 publication Critical patent/JPH04588B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58186266A 1983-10-05 1983-10-05 投影露光装置 Granted JPS6078456A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58186266A JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置
US06/656,746 US4690528A (en) 1983-10-05 1984-10-01 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58186266A JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6078456A JPS6078456A (ja) 1985-05-04
JPH04588B2 true JPH04588B2 (fr) 1992-01-08

Family

ID=16185274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58186266A Granted JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6078456A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6167036A (ja) * 1984-09-10 1986-04-07 ゼネラルシグナルジャパン株式会社 投影露光装置における投影倍率の補償方法及びその装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JP2562725Y2 (ja) * 1991-11-15 1998-02-16 三菱重工業株式会社 冷凍装置用ドライヤー
JP2644705B2 (ja) * 1995-07-17 1997-08-25 キヤノン株式会社 素子製造方法及び露光装置
WO2003025987A1 (fr) * 2001-09-14 2003-03-27 Nikon Corporation Barillet d'objectif, dispositif d'exposition et procede pour produire ce dispositif
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives

Also Published As

Publication number Publication date
JPS6078456A (ja) 1985-05-04

Similar Documents

Publication Publication Date Title
US4786947A (en) Projection exposure apparatus
US4690528A (en) Projection exposure apparatus
JP5110029B2 (ja) 露光装置及びデバイス製造方法
JP3365571B2 (ja) 光学式計測装置及び露光装置
KR100443452B1 (ko) 주사형노광장치
TWI430330B (zh) Exposure apparatus, exposure method, and device manufacturing method
US6342941B1 (en) Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method
US20010028456A1 (en) Exposure method, exposure apparatus, and method for producing device
EP1041605A1 (fr) Procede de reglage de la temperature et graveur a projection auquel il est applique
JP5574799B2 (ja) 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置
JPH043662B2 (fr)
JP4474871B2 (ja) 露光装置
US7317505B2 (en) Exposure apparatus and device manufacturing method
JPH0845827A (ja) 投影露光装置及びそれを用いた半導体デバイスの製造方法
JPH04588B2 (fr)
JP2000243684A (ja) 露光装置およびデバイス製造方法
JPS60159748A (ja) 投影露光装置
JP2005033179A (ja) 露光装置及びデバイス製造方法
JP4835970B2 (ja) 調整方法
JP4466042B2 (ja) 温調装置及び温調方法、露光装置、並びにデバイス製造方法
JP3286994B2 (ja) 露光方法、および露光装置
JPH04589B2 (fr)
JP3936153B2 (ja) 環境チャンバ及び基板処理装置並びに基板処理方法
JP2001291663A (ja) 露光方法及び装置、ステージモジュール、露光装置の製造方法、並びにデバイス製造方法
JPH10284405A (ja) リソク゛ラフィシステム