JPH0438184Y2 - - Google Patents

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a clean room pollution prevention structure, and particularly to a clean room pollution prevention structure suitable for clean rooms such as semiconductor manufacturing factories.

[Conventional technology]

Semiconductor manufacturing requires a dust-free environment, so it is usually performed in a clean room. Said,
The clean room consists of multiple
An air circulation system is adopted in which clean air is blown into the clean room through a HEPA (high performance) filter, the air inside the room is sucked in through a floor grating with a ventilation structure, and then passed through a HEPA filter on the ceiling again. There is a downflow (laminar flow) in the air.

Incidentally, in such a clean room, depending on the flow of the semiconductor manufacturing process, the room may be partitioned by wall plates. For example, the previous process uses hydrochloric acid (HCl) in the semiconductor manufacturing process, and the next process uses ammonia (NH ₃ ) in the semiconductor manufacturing process, so that the process atmosphere of the previous process does not have a negative impact on the next process. There is a wall board installed. In addition, in this case, in order to prevent pressure differences between rooms partitioned by wall plates, openings are provided in the wall plates to allow air to freely flow in and out of the room to equalize the pressure. There is.

[Problem that the invention attempts to solve]

However, when openings are provided in the wall plate,
The process atmosphere from the previous process may leak into the next process room and the pre-previous process room through the opening, contaminating the next process and pre-previous process room with the process atmosphere from the previous process. It was hot.

The present invention was developed in view of the above circumstances, and an object of the present invention is to provide a clean room contamination prevention structure that maintains uniform pressure within the room and prevents contamination of the room.

[Means for solving problems]

In order to achieve the above object, this invention blows clean air into the room through a high-performance filter attached to the ceiling, and also draws air from the room into an underfloor chamber and exhausts it. The present invention is characterized in that an opening is provided in a wall plate that partitions the room, and a chemical filter is attached to the opening.

[Effect]

According to the present invention, a chemical filter having good air permeability and a function of removing chemical substances is attached to the opening of the wall plate. This makes it possible to maintain uniform pressure between the rooms, and also removes process atmosphere such as chemicals used in that room with the chemical filter, thereby preventing contamination of adjacent rooms.

〔Example〕

Preferred embodiments of the clean room pollution prevention structure according to the present invention will be described in detail below with reference to the accompanying drawings.

The figure is a sectional view of a clean room pollution prevention structure according to the present invention. The ceiling chambers 16, 16... of the clean room 10 are provided with air outlets 17, 17... (the air outlet of the ceiling chamber 16 in the center of the figure is not shown), and the circulating air passes through the air outlets 17, 17... to the ceiling. It is supplied to chambers 16, 16... Also ceiling room 16,
16... has multiple HEPA filters 18, 18
... is arranged, and the air in the ceiling chambers 16, 16... is
Room 2 passes through HEPA filters 18, 18...
They are sent to 0A to 20C, respectively. The rooms 20A to 20C are partitioned by wall plates 12A and 12B, and the openings 13 of these wall plates 12A and 12B
A, 13B are provided with chemical filters 14A to 14C that have good ventilation and remove chemical substances.

On the other hand, the foundation floor 24 has the wall plates 12A and 12B.
is erected, and a floor grating 22 is laid by wall plates 12A and 12B, and air from the rooms 20A to 20C is sucked into the underfloor chamber 28 through this grating 22. Intake ports 30, 30... are provided in the underfloor chambers 28, 28..., respectively.
(The air intake port 30 of the underfloor chamber 28 in the center of the figure is not shown), and the air conditioners 34, 3
4... together with outside air introduction ducts 36, 36..., and the conditioned air mixed by the air conditioners 34, 34... is sent to the ceiling room 16 through the blower ducts 40, 40... by the blowers 38, 38... ,16
... will be supplied again.

The operation of the clean room pollution prevention structure configured as described above will be explained.

Clean air is blown out into the rooms 20A to 20C through a plurality of HEPA filters 18, 18... installed in the ceiling chambers 16, 16.... In this case, the manufacturing process of the rooms 20A to 20C is, for example, a process using hydrochloric acid in the room 20A, a process using ammonia in the room 20B, and a process using sulfuric acid in the room 20C. The chemical filter on the room 20A side installed in section 13A is replaced with hydrochloric acid removal filter 1.
4A, and the chemical filter on the room 20B side is an ammonia removal filter 14B. Furthermore, wall board 1
Room 2 attached to opening 13B of 2B
The chemical filter on the 0B side is the ammonia removal filter 14B as described above, and the chemical filter on the room 20C side is the sulfuric acid removal filter 14C. As a result, the chemical mist such as hydrochloric acid used in the rooms 20A to 20C is transferred to the chemical filter 14A.
to 14C. Therefore, the adjacent rooms 20A to 20C are not contaminated with chemical mist or the like.

Further, since the chemical filters 14A to 14C have air permeability, it is possible to maintain uniform pressure between the rooms 20A to 20C.

On the other hand, the clean air blown into the rooms 20A to 20C becomes a downward airflow and is sucked into the grating 22 on the lower surface, and is then sucked into the underfloor chambers 28, 28...
Air is blown to. Furthermore, the underfloor chambers 28, 28
The air of... is inlet 30, 30..., inlet duct 3
2, 32..., air conditioners 34, 34..., blowers 8, 38..., etc., and are again supplied into the ceiling chambers 16, 16....

[Effect of idea]

As explained above, according to the clean room pollution prevention structure according to the present invention, a chemical filter is selected according to the manufacturing process and installed in the opening of the wall plate, so that there is no possibility of contaminating the adjacent room. At the same time, the mutual pressure between the rooms can be kept uniform.

[Brief explanation of the drawing]

The figure is a sectional view showing an embodiment of the clean room pollution prevention structure according to the present invention. 10...Clean room, 12...Wall board, 14
A...Hydrochloric acid removal filter, 14B...Ammonia removal filter, 14C...Sulfuric acid removal filter, 1
6...Ceiling room, 17...Air vent, 18...
HEPA filter, 20...Room, 22...Grating, 24...Foundation floor, 28...Underfloor chamber, 30...Intake port, 32...Intake duct, 3
4...Air conditioner, 36...Outside air introduction duct, 3
8...Blower, 40...Blower duct.

Claims (1)

[Scope of Claim for Utility Model Registration] In a clean room where clean air is blown into the room through a high-performance filter installed on the ceiling, and the air inside the room is sucked into a chamber under the floor and exhausted, an adjacent room is A pollution prevention structure for a clean room, characterized in that an opening is provided in a partitioning wall plate, and a chemical filter is attached to the opening.