JPH0440762U - - Google Patents
Info
- Publication number
- JPH0440762U JPH0440762U JP8283990U JP8283990U JPH0440762U JP H0440762 U JPH0440762 U JP H0440762U JP 8283990 U JP8283990 U JP 8283990U JP 8283990 U JP8283990 U JP 8283990U JP H0440762 U JPH0440762 U JP H0440762U
- Authority
- JP
- Japan
- Prior art keywords
- disposed outside
- crucible
- reflecting plate
- heater section
- cooling pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001816 cooling Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 239000005416 organic matter Substances 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は、本考案の有機蒸発用Ｋセルの構造を
示す断面図、第２図は、従来のＫセルの構造を示
す断面図である。 １……坩堝、２……坩堝のフランジ部、３……
支持筒、４……ヒータ部、５……単層反射板、６
……多層反射板、７……坩堝受け、８……セラミ
ツクパイプ、９……コイルばね、１０……下側反
射板、１１……保護筒、１２……キヤツプ、２０
……冷却パイプ、２１……熱電対。
示す断面図、第２図は、従来のＫセルの構造を示
す断面図である。 １……坩堝、２……坩堝のフランジ部、３……
支持筒、４……ヒータ部、５……単層反射板、６
……多層反射板、７……坩堝受け、８……セラミ
ツクパイプ、９……コイルばね、１０……下側反
射板、１１……保護筒、１２……キヤツプ、２０
……冷却パイプ、２１……熱電対。
Claims (1)
- 円筒状の坩堝と、該坩堝の外部に配されたヒー
タ部と、該ヒータ部の外部に配された少なくとも
一層の反射板と、該反射板の外部に配された冷却
パイプとを備えたことを特徴とする有機物蒸発用
クヌーセンセル。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8283990U JPH0440762U (ja) | 1990-08-03 | 1990-08-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8283990U JPH0440762U (ja) | 1990-08-03 | 1990-08-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0440762U true JPH0440762U (ja) | 1992-04-07 |
Family
ID=31630003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8283990U Pending JPH0440762U (ja) | 1990-08-03 | 1990-08-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0440762U (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100430104B1 (ko) * | 2001-09-18 | 2004-05-03 | 디지웨이브 테크놀러지스 주식회사 | 선형 증착과 간접 가열을 이용한 진공증착장치 및 그증착방법 |
| JP2006063447A (ja) * | 2004-08-25 | 2006-03-09 | Samsung Sdi Co Ltd | 有機物蒸着装置 |
| JP2014125681A (ja) * | 2012-12-26 | 2014-07-07 | Au Optronics Corp | 蒸着装置 |
-
1990
- 1990-08-03 JP JP8283990U patent/JPH0440762U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100430104B1 (ko) * | 2001-09-18 | 2004-05-03 | 디지웨이브 테크놀러지스 주식회사 | 선형 증착과 간접 가열을 이용한 진공증착장치 및 그증착방법 |
| JP2006063447A (ja) * | 2004-08-25 | 2006-03-09 | Samsung Sdi Co Ltd | 有機物蒸着装置 |
| JP2014125681A (ja) * | 2012-12-26 | 2014-07-07 | Au Optronics Corp | 蒸着装置 |