JPH0441673A - Vacuum device and leaking method therefor - Google Patents

Abstract

PURPOSE:To prevent the whirling up of the contaminant and particles in a vacuum device by providing a diffusion member of a porous stainless steel at the tip of a leak pipe to be inserted into the device. CONSTITUTION:A material 6 such as a substrate is treated in an evacuated vacuum device 1, and then the pressure in the device is returned to atmospheric pressure to discharge the material 6. In this case, a leak gas such as nitrogen purified by a filter 4 is sent to a diffusion member 7 from a leak pipe 3 and uniformly diffused into the device from the innumerable holes of micron order. Consequently, the unidirectional current of the leak gas is not generated in the device, the contaminant and particles are not whirled up in the device, the material 6 is not contaminated, and the yield of product is sufficiently increased.

Description

[Detailed Description of the Invention] [Summary] This invention relates to a vacuum device and a leakage method that prevent contaminants and particles inside the device from being rolled up due to leakage flow when the inside of the device is returned from vacuum to atmospheric pressure. In order to prevent contaminants and particles from being stirred up, a diffusion member made of porous stainless steel is installed at the tip of the leak pipe inserted into the vacuum device to diffuse the leak flow. Configure it as follows.

[Industrial application field]

The present invention relates to a vacuum device and a leakage method that prevent contaminants and particles inside the device from being rolled up due to leakage flow when the inside of the device is returned from vacuum to atmospheric pressure.

[Conventional technology]

FIG. 3 is a diagram showing an example of a conventional vacuum device.

In the figure, 1 is a vacuum device such as a CVD device for manufacturing semiconductor devices, 2 is a vacuum exhaust port thereof, 3 is a leak pipe, 4 is a filter, and 5 is a leak port. In this apparatus, a workpiece 6 such as a substrate is inserted into the apparatus 1, and after exhausting air from the exhaust port 2, the workpiece is subjected to a process such as CVD. The material to be processed 6 is introduced from the leak port 5 through the filter 4, and after returning the inside of the apparatus 1 to atmospheric pressure, the material to be processed 6 is taken out.

[Problem to be solved by the invention]

In the above-mentioned conventional vacuum device, when returning the inside of the device 1 to atmospheric pressure, even if highly clean gas is fed, the fed gas leaks only in one direction from the leak port 5, and its force causes the inside of the device to flow in the direction shown by the arrow. circulate. If the inside of the apparatus 1 is contaminated at this time, there is a problem in that the introduced gas stirs up contaminants and particles and deposits them on the object to be processed 6, thereby contaminating the object to be processed.

SUMMARY OF THE INVENTION In view of the above-mentioned conventional problems, it is an object of the present invention to provide a vacuum device and a leakage method in a vacuum device that prevent contaminants and particles from rolling up inside the device.

[Means to solve the problem]

In order to achieve the above object, in the vacuum device of the present invention, at the tip of the leak pipe 3 inserted into the vacuum device 1,
Porous stainless steel to diffuse leak flow
A feature is that a diffusion member 7 made of steel is provided.

Further, in the leakage method in a vacuum device of the present invention, the vacuum device 1
When returning the inside of the device from vacuum to atmospheric pressure, leak gas is introduced into the device through the porous diffusion member 7 attached to the tip of the leak pipe 3 inserted into the vacuum device 1, It is characterized by preventing contaminants and particles from rolling up inside the device by diffusing the flow of leak gas.

[For production]

A porous diffusion member 7 is attached to the tip of the leak pipe 3 inserted into the vacuum device 1, and when returning the inside of the device from a vacuum state to atmospheric pressure, leak gas is introduced into the device through the diffusion member 7. As a result, the leakage gas flows through the diffusion member 7.
It is spread in all directions.

Therefore, since no strong unidirectional flow occurs, there is less chance of stirring up contaminants and particles within the apparatus, and it is possible to prevent contamination of objects to be processed, such as substrates.

〔Example〕

FIG. 1 is a diagram showing an embodiment of the vacuum apparatus of the present invention.

As shown in the figure, this embodiment includes a vacuum device 1 for processing a workpiece 6 such as a substrate, a vacuum exhaust port 2 for evacuating the inside of the device, and a filter 4 for leaking gas into the device. It is the same as the conventional example explained in FIG. At its tip, a square box-shaped diffusion member 7 made of porous stainless steel and having numerous holes in its bottom and side walls is provided. Note that the shape of the diffusion member 7 is not limited to a rectangular shape, and may be other shapes such as a spherical shape or a spherical shape, and in short, any shape is sufficient as long as it can diffuse the leak gas in all directions.

A leakage method of the vacuum apparatus using this embodiment configured as described above will be explained with reference to FIG. 2. In this figure, the same parts as in FIG. 1 are designated by the same reference numerals.

After the vacuum apparatus 1 processes a workpiece 6 such as a substrate in a vacuum state, when the inside of the apparatus is returned to atmospheric pressure before taking out the processed workpiece 6, the filter 4 is removed from the leak pipe 3. By sending purified leak gas such as nitrogen to the diffusion member 7, the leak gas sent to the diffusion member 7 can be uniformly diffused into the device as shown by the arrow from the countless holes in each compartment of the diffusion member 7. Let it happen.

As a result, a strong unidirectional flow of leakage gas is not generated within the apparatus, so that contaminants and particles within the apparatus are not stirred up, and objects to be processed such as substrates are not contaminated.

〔Effect of the invention〕

As explained above, according to the present invention, by providing a porous diffusion member at the tip of a leak pipe inserted into a vacuum device, it is possible to prevent contaminants and particles from rolling up inside the device when a leak occurs. Therefore, it is possible to prevent contamination of the objects to be processed within the apparatus, which greatly contributes to improving the yield of products.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing an embodiment of the vacuum device of the present invention, FIG. 2 is a diagram for explaining the leakage method of the vacuum device of the present invention, and FIG. 3 is a diagram showing an example of a conventional vacuum device. be. In the figure, l is the vacuum device, 2 is the vacuum exhaust port, 3 is the leak pipe, 4 is the filter, 6 is the object to be processed,
7 indicates a diffusion member. Figure 2 for explaining the leakage method of the vacuum device of the present invention
Figure 1... Vacuum device 4... Filter 6... Processed object 7... Diffusion member Figure 1 showing an embodiment of the vacuum device of the present invention. Figure 7... Vacuum device 2... Vacuum Exhaust port 3...Leak pipe 4...Filter 6...Workpiece 7...Diffusion member Fig. 3 is a diagram showing an example of a conventional vacuum device.

Claims (2)

[Claims] 1. Leak pipe (3) inserted into the vacuum device (1)
) is provided with a diffusion member (7) made of porous stainless steel for diffusing the flow of leakage. 2. In a vacuum device (1), when returning the inside of the device from vacuum to atmospheric pressure, the air is passed through a porous diffusion member (7) attached to the tip of a leak pipe (3) inserted into the vacuum device (1). 1. A leakage method in a vacuum device, characterized in that a leakage gas is introduced into the device and the flow of the leakage gas is diffused to prevent contaminants and particles from being rolled up inside the device.