JPH0442911Y2 - - Google Patents
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- Publication number
- JPH0442911Y2 JPH0442911Y2 JP1984022015U JP2201584U JPH0442911Y2 JP H0442911 Y2 JPH0442911 Y2 JP H0442911Y2 JP 1984022015 U JP1984022015 U JP 1984022015U JP 2201584 U JP2201584 U JP 2201584U JP H0442911 Y2 JPH0442911 Y2 JP H0442911Y2
- Authority
- JP
- Japan
- Prior art keywords
- seed crystal
- crystal
- holding
- crucible
- holding surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
【考案の詳細な説明】
(イ) 産業上野利用分野
本考案は単結晶、特にsic単結晶成長に用いる
装置に関する。[Detailed description of the invention] (a) Industrial application field The present invention relates to an apparatus used for growing single crystals, particularly SIC single crystals.
(ロ) 従来技術
sic(シリコンカーバイド)は、その物理的、化
学的性質から耐環境性半導体素子材料として注目
をあびている。また同一組成で多数の結晶形を有
し、そのエネルギーギヤツプは2.4ev(3cタイプ)
〜3.0ev(6Hタイプ)の多岐にわたる。従つて6H
タイプのsix単結晶は青色発光ダイオード材料と
しても実用化されつつある。(b) Prior Art SIC (silicon carbide) is attracting attention as an environmentally resistant semiconductor element material due to its physical and chemical properties. It also has many crystal forms with the same composition, and its energy gap is 2.4ev (3c type)
~3.0ev (6H type). Therefore 6H
Type six single crystals are also being put into practical use as materials for blue light-emitting diodes.
第1図はJournal of Crystal Growth52(1981)
146−150に掲載されたY u.M.TAIROVとV.F.
TSVETKOVとの論文「GENERAL
PRINCIPLE OF GROWING LARGE−SIZE
SINGLE CRYSTALS OF VARIOUS
SILICONCARBID POLYTYPES」中に開示さ
れたこの種装置を示し、1はグラフアイトからな
るルツボ、2は該ルツボ中に収納されたsic原材
料、3は上記ルツボ1の上面開口を閉塞するよう
に載置されたsic種結晶である。 Figure 1 is from Journal of Crystal Growth52 (1981)
Y uMTAIROV and VF published in 146-150
The paper “GENERAL” with TSVETKOV
PRINCIPLE OF GROWING LARGE−SIZE
SINGLE CRYSTALS OF VARIOUS
SILICONCARBID POLYTYPES'', in which 1 is a crucible made of graphite, 2 is a SIC raw material stored in the crucible, and 3 is placed so as to close the upper opening of the crucible 1. It is a SIC seed crystal.
斯る装置では上記sic原材料2を加熱昇華させ
ることにより上記種結晶3の上記原材料2と対向
する面にsic単結晶4が成長する。しかし乍ら、
sic単結晶成長にあたつて種結晶3は小面積のも
のしか得られなく、かつその成長の水平方向への
拡がりもルツボ側壁により規制されるため大面積
化が困難であり、また成長中にルツボ側壁の影響
を受け成長した単結晶の周囲が多結晶化してしま
う。 In such an apparatus, by heating and sublimating the SIC raw material 2, a SIC single crystal 4 is grown on the surface of the seed crystal 3 facing the raw material 2. However,
When growing a SIC single crystal, the seed crystal 3 can only have a small area, and the horizontal spread of the growth is also restricted by the side walls of the crucible, making it difficult to increase the area. The area around the single crystal that grows under the influence of the side walls of the crucible becomes polycrystalline.
(ハ) 考案の目的
本考案は斯る点に鑑みてなされたもので、成長
した結晶中に多結晶が発生することを抑止可能で
かつ成長する単結晶の大面積化が図れる単結晶成
長装置を提供せんとするものである。(c) Purpose of the invention The present invention has been made in view of these points, and provides a single crystal growth apparatus that can suppress the generation of polycrystals in the grown crystal and can increase the area of the growing single crystal. We aim to provide the following.
(ニ) 考案の構成
本考案の構成的特徴は原材料が収納されるルツ
ボと、種結晶を保持する保持面を有し、該保持面
が上記ルツボ中において上記原材料に対向配置さ
れた保持部とを備え、上記原材料を加熱昇華させ
て上記種結晶上に結晶を成長させる単結晶成長装
置において、上記保持部の上記種結晶の保持面が
上記種結晶の結晶成長面と略同一形状をなすこと
にある。(d) Structure of the invention The structural features of the invention include a crucible in which a raw material is stored, a holding surface for holding a seed crystal, and the holding surface is a holding part disposed opposite to the raw material in the crucible. In the single crystal growth apparatus, which heats and sublimates the raw material to grow a crystal on the seed crystal, a holding surface of the seed crystal of the holding part has substantially the same shape as a crystal growth surface of the seed crystal. It is in.
(ホ) 実施例
第2図は本考案の一実施例を示し、第1図従来
装置との相違点は種結晶3の保持部5にある。即
ち、斯る保持部5は上記ルツボ1の開口を閉塞す
る基部5aと該基部5aの略中央より垂下せる載
置部5bとからなり、斯る載置部5bの原材料2
と対向する面5c(以下保持面と称す)に種結晶
3を固定する。斯る固定は第3図に示す如くL字
部材6,6をその一辺が種結晶3表面に当接し、
他辺が載置部5bの側壁にビス7,7止めされる
ことにより行なう。また第3図より明らかなよう
に保持面5cの平面形状は種結晶3のそれと略同
一としてある。更に上記保持部5、L字部材6,
6、ビス7,7はカーボンで構成される。尚、第
2図中第1図と同一箇所には同一番号を符して説
明を省略する。(E) Embodiment FIG. 2 shows an embodiment of the present invention, and the difference from the conventional device shown in FIG. 1 lies in the holding portion 5 for the seed crystal 3. That is, the holding part 5 is composed of a base part 5a that closes the opening of the crucible 1 and a placing part 5b that hangs down from approximately the center of the base part 5a.
The seed crystal 3 is fixed on the surface 5c (hereinafter referred to as the holding surface) facing the . For such fixing, one side of the L-shaped members 6, 6 is brought into contact with the surface of the seed crystal 3, as shown in FIG.
This is done by fixing the other side to the side wall of the mounting portion 5b with screws 7, 7. Further, as is clear from FIG. 3, the planar shape of the holding surface 5c is substantially the same as that of the seed crystal 3. Furthermore, the holding portion 5, the L-shaped member 6,
6. Screws 7 and 7 are made of carbon. Note that the same parts in FIG. 2 as in FIG. 1 are denoted by the same numbers, and explanations thereof will be omitted.
このような装置ではルツボ1は種結晶3の大き
さにかかわりなくその内径を充分大きくでき、従
つて単結晶の水平方向への拡がり、即ち種結晶3
を頂点とした末広がりの成長がルツボ1により規
制されることはなく、また成長中にルツボ1側壁
の影響により多結晶が成長するという危惧もなく
なり、大面積のsic単結晶が得られる。 In such an apparatus, the inner diameter of the crucible 1 can be made sufficiently large regardless of the size of the seed crystal 3, so that the horizontal spread of the single crystal, that is, the size of the seed crystal 3 can be increased.
The growth spreading toward the end with the peak is not restricted by the crucible 1, and there is no fear that polycrystals will grow due to the influence of the side walls of the crucible 1 during growth, and a large-area SIC single crystal can be obtained.
本実施例装置において、保持面5cを種結晶3
と略同一形状としてのは、保持面5cが種結晶3
より大きい場合、保持面5cの一部が露出するた
め、成長の際にこの露出部分にSiC多結晶が堆積
していき、これが種結晶3上に成長しているSiC
単結晶に接触するとその接触部分が多結晶化し、
実質的にSiC単結晶の成長空間を広くすることは
できないからである。 In the device of this embodiment, the holding surface 5c is connected to the seed crystal 3
The holding surface 5c has approximately the same shape as the seed crystal 3.
If the size is larger, a part of the holding surface 5c will be exposed, so SiC polycrystals will be deposited on this exposed part during growth, and this will cause the SiC polycrystals growing on the seed crystal 3 to
When it comes into contact with a single crystal, the contact area becomes polycrystalline,
This is because it is not possible to substantially widen the growth space of the SiC single crystal.
第4図は本考案の他の実施例を示す。斯る実施
例では上記第1の実施例において種結晶3をカー
ボン製のL字部材6で固定しているため、斯るL
字部材6表面にもsic結晶が成長し、かつその結
晶は多結晶となる危惧があることから上記種結晶
3の保持面5cへの固着方法の改良を図つたもの
である。 FIG. 4 shows another embodiment of the invention. In this embodiment, since the seed crystal 3 is fixed with an L-shaped member 6 made of carbon in the first embodiment, such L-shaped member 6 is fixed.
Since there is a risk that SIC crystals will grow on the surface of the character member 6 and that the crystals will become polycrystals, the method for fixing the seed crystal 3 to the holding surface 5c has been improved.
具体的にはまず載置部5bの保持面5c上にsi層
8(例えばsi単結晶体から切出した薄板)、種結
晶3を順次積層し(第5図A)、次いで1500℃程
度で1時間保持することによりsi層8が溶融しsi
層8と保持面5cとのなじみ及びsi層8と種結晶
3とのなじみを良好となす。その後保持温度を
1800℃以上となす。斯る温度で長時間保持すると
載置部5bを形成するc(炭素)とsi層8中のsi
(シリコン)とが結合し、sic化する(第5図B)。
斯るsic化は保持面5c側より徐々に種結晶3側
に進み、最終的には上記si層8が全てsic単結晶
化し、種結晶3と載置部5bとの接着が強固なも
のとなる(第5図c)。Specifically, first, an Si layer 8 (for example, a thin plate cut from a Si single crystal) and a seed crystal 3 are sequentially laminated on the holding surface 5c of the mounting portion 5b (FIG. 5A), and then heated at about 1500°C. By holding the si layer 8 for a long time, the si layer 8 melts.
Good conformability is achieved between the layer 8 and the holding surface 5c and between the Si layer 8 and the seed crystal 3. Then set the holding temperature
Made at 1800℃ or higher. When kept at such a temperature for a long time, c (carbon) and si in the si layer 8 form the mounting portion 5b.
(silicon) and becomes sic (Fig. 5B).
Such SIC conversion gradually progresses from the holding surface 5c side to the seed crystal 3 side, and eventually the entire SI layer 8 becomes a SIC single crystal, and the adhesion between the seed crystal 3 and the mounting portion 5b becomes strong. (Figure 5c).
このようにして種結晶3を保持面5cに固着す
ると種結晶3表面には何ら異物(例えば第1実施
例のL字部材6)が存在しないため種結晶3表面
には単結晶のみが成長し、多結晶が成長する危具
はなくなる。 When the seed crystal 3 is fixed to the holding surface 5c in this way, only a single crystal grows on the surface of the seed crystal 3 because no foreign matter (for example, the L-shaped member 6 in the first embodiment) is present on the surface of the seed crystal 3. , the danger of polycrystal growth is eliminated.
(ヘ) 考案の効果
本考案の装置を用いれば、成長空間を広くでき
るので、成長する単結晶がルツボの側壁に接触し
て結晶化することを防止でき、また、保持部の保
持面を種結晶と略同一形状としているので、成長
する単結晶が保持面の露出部分に堆積する多結晶
に接触し多結晶化することも防止できる。従つ
て、本考案装置によれば、多結晶の存在しない大
面積の単結晶を得ることができる。(f) Effects of the invention By using the device of the invention, the growth space can be made wider, so it is possible to prevent the growing single crystal from contacting the side wall of the crucible and crystallizing it. Since the shape is substantially the same as that of the crystal, it is possible to prevent the growing single crystal from coming into contact with the polycrystal deposited on the exposed portion of the holding surface and becoming polycrystalline. Therefore, according to the device of the present invention, a large-area single crystal without polycrystals can be obtained.
第1図は従来例を示し、第1図は断面図、また
第2図乃至第4図は本考案の実施例を示し、第2
図及び第4図は断面図、第3図は斜視図である。
1……ルツボ、2……原材料、3……種結晶、
5……保持部、5c……保持面。
FIG. 1 shows a conventional example, FIG. 1 is a sectional view, and FIGS. 2 to 4 show embodiments of the present invention.
4 and 4 are cross-sectional views, and FIG. 3 is a perspective view. 1... Crucible, 2... Raw materials, 3... Seed crystal,
5... Holding part, 5c... Holding surface.
Claims (1)
る保持面を有し、該保持面が上記ルツボ中におい
て上記原材料に対向配置された保持部とを備え、
上記原材料を加熱昇華させて上記種結晶上に結晶
を成長させる単結晶成長装置において、上記保持
部の上記種結晶の保持面は上記種結晶の結晶成長
面と略同一形状をなすことを特徴とする単結晶成
長装置。 comprising a crucible in which a raw material is stored, and a holding part having a holding surface for holding a seed crystal, the holding surface being disposed in the crucible to face the raw material,
A single crystal growth apparatus for heating and sublimating the raw material to grow a crystal on the seed crystal, characterized in that a holding surface of the seed crystal of the holding section has substantially the same shape as a crystal growth surface of the seed crystal. Single crystal growth equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984022015U JPS60136134U (en) | 1984-02-17 | 1984-02-17 | Single crystal growth equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984022015U JPS60136134U (en) | 1984-02-17 | 1984-02-17 | Single crystal growth equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60136134U JPS60136134U (en) | 1985-09-10 |
| JPH0442911Y2 true JPH0442911Y2 (en) | 1992-10-12 |
Family
ID=30513928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984022015U Granted JPS60136134U (en) | 1984-02-17 | 1984-02-17 | Single crystal growth equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60136134U (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE50006005D1 (en) * | 1999-07-07 | 2004-05-13 | Siemens Ag | NUCLEAR CRYSTAL HOLDER WITH SIDE EDGE OF A SIC NUCLEAR CRYSTAL |
| JP4523733B2 (en) * | 2001-04-05 | 2010-08-11 | 新日本製鐵株式会社 | Method for producing silicon carbide single crystal ingot and method for mounting seed crystal for growing silicon carbide single crystal |
| JP2011219337A (en) * | 2010-04-14 | 2011-11-04 | Sumitomo Electric Ind Ltd | Manufacturing method for crystal, crystal, and semiconductor device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5138284A (en) * | 1974-09-30 | 1976-03-30 | Tokyo Shibaura Electric Co | Itajotanketsushono seizohoho |
| JPS53147700A (en) * | 1977-05-30 | 1978-12-22 | Sharp Corp | Method of producing silicon carbide substrate |
| JPS55100299A (en) * | 1979-01-25 | 1980-07-31 | Sharp Corp | Production of silicon carbide crystal layer |
-
1984
- 1984-02-17 JP JP1984022015U patent/JPS60136134U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60136134U (en) | 1985-09-10 |
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