JPH0442914Y2 - - Google Patents
Info
- Publication number
- JPH0442914Y2 JPH0442914Y2 JP12885486U JP12885486U JPH0442914Y2 JP H0442914 Y2 JPH0442914 Y2 JP H0442914Y2 JP 12885486 U JP12885486 U JP 12885486U JP 12885486 U JP12885486 U JP 12885486U JP H0442914 Y2 JPH0442914 Y2 JP H0442914Y2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- workpiece
- mounting table
- illuminator
- wrapping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 49
- 238000005286 illumination Methods 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は、例えばシリコンウエハーの研磨工程
における欠け等の不良品を自動画像計測処理によ
つて判別する装置の照明装置として好適なもので
ある。[Detailed description of the invention] [Industrial application field] The present invention is suitable as an illumination device for a device that uses automatic image measurement processing to identify defective products such as chips in the polishing process of silicon wafers, for example. .
従来ラツピング後のシリコンウエハーの欠け等
の不良品を検査する際、シリコンウエハーの下方
から照明するが、シリコンウエハーに水玉状に付
いたラツピング液が照明器に落ちて照明器が汚
れ、照度が落ちて見にくくなつたり、更に照明器
の中央にワーク載置台があるため拭き取りに時間
が掛かる欠点がある。又、自動画像計測装置で画
像処理をすると汚れがノイズとして検出されるた
め、その都度汚れを拭き取らなければならないの
で作業効率が悪く、自動化がむずかしい等の欠点
があつた。
Conventionally, when inspecting defective products such as chips in silicon wafers after wrapping, illumination is applied from below the silicon wafer, but the lapping liquid that adheres to the silicon wafer in the form of droplets falls onto the illuminator, staining the illuminator and reducing the illuminance. Furthermore, since the workpiece mounting table is located in the center of the illuminator, it takes time to wipe it off. In addition, when image processing is performed using an automatic image measuring device, dirt is detected as noise, so the dirt must be wiped off each time, resulting in poor work efficiency and difficulty in automation.
本考案は上記欠点に鑑み、簡単な構成で照明器
がラツピング液などの汚れた液で汚さないように
して自動化が出来る照明装置を提案することであ
る。
SUMMARY OF THE INVENTION In view of the above drawbacks, the present invention proposes a lighting device that has a simple structure and can be automated by preventing the lighting device from being contaminated with dirty liquid such as wrapping liquid.
本考案は、ケース体に液体を溜めるようにした
液体溜部と上記液体を循環させる液体循環機構
と、上記液体溜部の液体の上面より上方に突出し
てワークの外径より小径に形成されたワークを載
置するワーク載置台と、上記液体を介して光を照
射する光源とを有することにある。
The present invention includes a liquid reservoir that stores liquid in a case body, a liquid circulation mechanism that circulates the liquid, and a liquid reservoir that protrudes upward from the upper surface of the liquid in the liquid reservoir and is formed to have a diameter smaller than the outer diameter of the workpiece. The present invention includes a workpiece mounting table on which a workpiece is placed, and a light source that irradiates light through the liquid.
以上、図示の一実施例で本考案を説明する。照
明装置は第1図、第2図でケース体1の上部に液
体2を溜めるようにした液体溜部3が固定されて
液体溜部3に液体循環機構の供給側ボート4及び
排出側ポート5から複数本のパイプ6,7を介し
て液体2が循環供給されている。第1図では4ケ
所の注入口6aと3ケ所の排出口7aが設けられ
ている。液体溜部3上面にはワーク載置台8が密
着固定され、液体溜部3の下側には上方に向けて
光を放射する光源の照明器9が設けられ、ワーク
載置台8に載せられたワーク10は液体溜部3の
底板3aと液体2を透過した照明器9の光源で照
射される。
The present invention will be described above with reference to one embodiment shown in the drawings. In the lighting device, as shown in FIGS. 1 and 2, a liquid reservoir 3 for storing liquid 2 is fixed to the upper part of a case body 1, and a supply side boat 4 and a discharge side port 5 of a liquid circulation mechanism are connected to the liquid reservoir 3. A liquid 2 is circulated and supplied through a plurality of pipes 6 and 7. In FIG. 1, four injection ports 6a and three discharge ports 7a are provided. A workpiece mounting table 8 is closely fixed to the upper surface of the liquid reservoir 3, and an illuminator 9, which is a light source that emits light upward, is provided on the lower side of the liquid reservoir 3. The workpiece 10 is illuminated by the light source of the illuminator 9 that passes through the bottom plate 3a of the liquid reservoir 3 and the liquid 2.
上記液体2はどのような液体でもよいが、例え
ばフロン、アルコール等が用いられる。 The liquid 2 may be any liquid, but for example, fluorocarbon, alcohol, etc. are used.
上記液体溜部3の底部3aには拡散効果を持つ
材料が用いられて底板3aを透過した光は均一の
光になるようにするとよい。 It is preferable that a material having a diffusion effect be used for the bottom part 3a of the liquid reservoir 3 so that the light transmitted through the bottom plate 3a becomes uniform light.
上記ワーク載置台8は液体2の上面より上方に
突出する高さにすると共に、外径はワーク載置台
8上に載せる例えば10cm×10cm又はφ10cmのワー
ク10の外径より小径のφ8cmに形成されている。 The workpiece mounting table 8 has a height that protrudes above the upper surface of the liquid 2, and has an outer diameter of 8 cm, which is smaller than the outer diameter of the workpiece 10 of, for example, 10 cm x 10 cm or 10 cm in diameter, which is placed on the workpiece mounting table 8. ing.
上記照明装置を用いてワーク10の自動画像処
理がなされる時はワーク10の上方に図示しない
自動画像計測装置が設けられ、ワーク10として
例えばラツピング後のラツピング液が水玉状に付
着したシリコンウエハーがラツピング面を下側に
してワーク載置台8上に図示しないロボツトで載
せられて光源の照明器9の光が照射される。 When automatic image processing of the workpiece 10 is carried out using the above-mentioned illumination device, an automatic image measurement device (not shown) is installed above the workpiece 10, and the workpiece 10 is, for example, a silicon wafer to which wrapping liquid after wrapping has adhered in the form of droplets. The workpiece is placed on a workpiece mounting table 8 by a robot (not shown) with the wrapping surface facing downward, and is irradiated with light from an illuminator 9 serving as a light source.
この時水玉状に付着したラツピング液がワーク
載置台8に載せられたシヨツクでシリコンウエハ
ーから離れて落下しても下は循環する液体2が注
入口6aから排出口7aに向かつて流れているの
でラツピング液は希釈されると共に一箇所に溜ま
らないので照度が一様な光で照射されることにな
る。ラツピングによる欠けなどの画像計測処理が
終了したワーク10はロボツトにより次工程へ送
られる。 At this time, even if the wrapping liquid adhering in the form of droplets separates from the silicon wafer and falls on the shock placed on the workpiece mounting table 8, the liquid 2 circulating below flows from the inlet 6a toward the outlet 7a. Since the wrapping liquid is diluted and does not accumulate in one place, it is irradiated with light of uniform illuminance. The workpiece 10 on which the image measurement process for defects such as chips due to wrapping has been completed is sent to the next process by the robot.
上記のように照明装置が構成されるとラツピン
グ液で照明器9が汚されることが防止されるので
汚れを拭き取る必要がなく、常に照度が一様な光
で照射されるから計測処理を自動化することが出
来て作業効率が著しく向上され、自動画像計測処
理において汚れによるノイズによつて誤つた判定
などが起こらない。 When the illumination device is configured as described above, the illuminator 9 is prevented from being soiled by the wrapping liquid, so there is no need to wipe it off, and the measurement process is automated because the illuminant is always irradiated with light with uniform illuminance. As a result, work efficiency is significantly improved, and erroneous judgments due to noise caused by dirt do not occur in automatic image measurement processing.
上記説明の構造ではワーク載置台8の内側には
液体2が流れないが、流れるように構成してもよ
い。 In the structure described above, the liquid 2 does not flow inside the workpiece mounting table 8, but it may be configured so that it flows.
更に液体溜部3の高さを高くして液体2を流
し、液体2の中に防水した照明器9を入れてワー
ク10を照射してもよい。 Further, the height of the liquid reservoir 3 may be increased to allow the liquid 2 to flow therein, and a waterproof illuminator 9 may be placed in the liquid 2 to illuminate the workpiece 10.
液体2は液体循環機構の供給側ポート4及び排
出側ポート5で流量が調整され、逆方向に液体2
を流すように構成してもよい。 The flow rate of the liquid 2 is adjusted at the supply side port 4 and the discharge side port 5 of the liquid circulation mechanism, and the liquid 2 flows in the opposite direction.
It may be configured to flow.
本考案は上述のように構成されたから、ワーク
に付着した汚れた液が落下しても流れる液体で希
釈されると共に一箇所に溜まることがなく流され
るので照明の照度が一様な光でワークが照明さ
れ、汚れを拭き取る作業が不要であるから画像計
測処理を自動化することが出来て作業効率が著し
く向上される等実用上優れた効果を奏する照明装
置を提供することが出来る。
Since the present invention is constructed as described above, even if the dirty liquid adhering to the workpiece falls, it is diluted by the flowing liquid and is flowed away without accumulating in one place, so that the illuminance of the illumination can be uniformly applied to the workpiece. It is possible to provide an illumination device that has excellent practical effects, such as being able to automate image measurement processing and significantly improving work efficiency, since the work of wiping off dirt is not required.
図面は本考案の一実施例が示され、第1図は照
明装置の平面図、第2図は照明装置要部断面側面
図である。
1……ケース体、2……液体、3……液体溜
部、4,5,6,7……液体循環機構、8……ワ
ーク載置台、9……光源の照明器、10……ワー
ク。
The drawings show an embodiment of the present invention, and FIG. 1 is a plan view of the lighting device, and FIG. 2 is a cross-sectional side view of the main part of the lighting device. DESCRIPTION OF SYMBOLS 1...Case body, 2...Liquid, 3...Liquid reservoir, 4, 5, 6, 7...Liquid circulation mechanism, 8...Workpiece mounting table, 9...Light source illuminator, 10...Workpiece .
Claims (1)
上記液体を循環させる液体循環機構と、上記液体
溜部の液体の上面より上方に突出してワークの外
径より小径に形成されたワークを載置するワーク
載置台と、上記液体を介して光を照射する光源と
を有する照明装置。 A liquid reservoir for storing liquid in a case body, a liquid circulation mechanism for circulating the liquid, and a workpiece protruding upward from the upper surface of the liquid in the liquid reservoir and having a smaller diameter than the outer diameter of the workpiece. An illumination device comprising: a workpiece mounting table that emits light through the liquid; and a light source that emits light through the liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12885486U JPH0442914Y2 (en) | 1986-08-26 | 1986-08-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12885486U JPH0442914Y2 (en) | 1986-08-26 | 1986-08-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6336036U JPS6336036U (en) | 1988-03-08 |
| JPH0442914Y2 true JPH0442914Y2 (en) | 1992-10-12 |
Family
ID=31024898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12885486U Expired JPH0442914Y2 (en) | 1986-08-26 | 1986-08-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0442914Y2 (en) |
-
1986
- 1986-08-26 JP JP12885486U patent/JPH0442914Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6336036U (en) | 1988-03-08 |
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