JPH0442915Y2 - - Google Patents

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Publication number
JPH0442915Y2
JPH0442915Y2 JP1984107346U JP10734684U JPH0442915Y2 JP H0442915 Y2 JPH0442915 Y2 JP H0442915Y2 JP 1984107346 U JP1984107346 U JP 1984107346U JP 10734684 U JP10734684 U JP 10734684U JP H0442915 Y2 JPH0442915 Y2 JP H0442915Y2
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Japan
Prior art keywords
temperature
heat exchange
processing liquid
tank
detected
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Expired
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JP1984107346U
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Japanese (ja)
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JPS6122340U (en
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Description

【考案の詳細な説明】[Detailed explanation of the idea]

「産業上の利用分野」 本考案は、エツチング液等の半導体処理液の熱
交換を行なう装置に関する。 「従来の技術」 半導体処理液の温度管理を行なうため、熱交換
器およびポンプを介在させた循環路を処理槽に接
続し、この処理槽より流通させた半導体処理液を
上記熱交換器で交換したのち再び処理槽に戻すこ
とが行なわれている。 この場合、温度センサによつて処理槽中の半導
体処理液の温度が検出され、上記センサの検出温
度が目標温度になるように上記熱交換器の熱交換
媒体(たとえば水)の温度が制御される。 〔考案が解決しようとする課題〕 ところが、熱交換器の半導体処理液の収容量は
かなり大きく、このため従来つぎのような問題を
生じている。 すなわち、上記センサの検出温度が目標温度に
達した時点では、熱交換器より処理槽に至るバス
の影響で処理槽内の処理液の温度と熱交換器に収
容されている処理液の温度とに差を生じる。 それゆえ、上記時点以後、熱交換器に収容され
ていた大量の処理液が処理槽に流入した場合、該
処理槽内の処理液の温度が目標温度から変化し、
その結果、上記熱交換器の熱交換媒体に対してそ
れまでとは逆の方向の温度制御が行なわれること
になる。 つまり、ハンチングを伴つた温度制御が行なわ
れることになり処理槽内の処理液が目標温度が整
定されるまでに時間を要する。 本考案の目的は、上記処理槽中の処理液の温度
を可及的速やかに整定することが可能な熱交換装
置を提供することにある。 〔課題を解決するための手段〕 本考案に係る熱交換装置は、第1の熱交換手段
が介在され、処理槽より流出した半導体処理液を
上記第1の熱交換手段で熱交換したのち再び上記
処理槽に戻す第1の循環路と、加熱冷却要素を備
えた第2の熱交換手段が介在され、この第2の熱
交換手段で熱交換された熱交換媒体を上記第1の
熱交換手段に供給する第2の循環路と、上記処理
槽中において、上記半導体処理液の温度を検出す
る第1の温度検出手段と、上記熱交換媒体の温度
を検出する第2の温度検出手段と、上記処理槽中
における上記半導体処理液の目標温度を設定する
目標温度設定手段と、上記目標温度と上記第1の
温度検出手段の検出温度とを比較し、該検出温度
の値が上記目標温度を中心とする所定の温度範囲
以外であるか否かを判定する比較手段と、上記検
出温度の値が上記温度範囲以外の場合に、該検出
温度が上記目標温度に近づくように上記加熱冷却
手段を制御し、かつ上記検出温度の値が上記温度
範囲内の場合に、上記第2の温度検出手段の検出
温度が上記目標温度に近づくように上記加熱冷却
手段を制御する制御手段とを備えている。 〔作用〕 この熱交換装置によれば、第1の温度検出手段
の検出温度が上記温度範囲以外である場合は、該
第1の温度検出手段の検出温度に基づいて上記加
熱冷却手段が制御される。また第1の温度検出手
段の検出温度が上記温度範囲内である場合には、
第2の温度検出手段の検出温度に基づいて加熱冷
却手段が制御される。 「実施例」 以下、図面を参照して本考案の実施例を説明す
る。 第1図は、本考案に係る熱交換装置の一実施例
を概念的に示す。 この実施例は、コイル状に巻かれたパイプ1が
その内部に配設された熱交換用のタンク2を備え
ている。上記パイプ1は、テフロン等の耐処理液
性の材料で形成されており、その一端が管理3を
介して処理槽4の内槽4Aの底部に、またその他
端が管路5を介して上記処理槽4の外槽4Bに
各々連結されている。なお、管路5の途中にはポ
ンプ6が介在されている。また、上記パイプ1の
外周には襞が形成されている。 ケミカルサーキユレータ7は、第2図に示すよ
うに、熱交換器8と温度制御回路9とから構成さ
れている。熱交換器8は、熱交換媒体たる恒温用
液体が通過する通路81と、この通路81の両側
に設けられたサーモモジユール82,82と、こ
れらのサーモモジユールに各々付設された放熱器
83,83と、上記通路81内に配設された温度
センサ84とを備えている。そして、上記通路8
1の一端および他端は、各々管路10および11
を介して前記タンク2の上部および下部に連結さ
れている。なお、管路11にはポンプ12が介在
されている。 上記サーモモジユール82,82は、半導体熱
電素子によつて電子的に冷却または加熱を行なう
ものであり、その印加電圧の極性を変えることに
より、冷却作用と加熱作用とが切換わる。なお、
このサーモモジユールの構造および動作原理は公
知であるので、ここではその説明を省略する。 前記放熱器83,83は、上記サーモモジユー
ルが発生する熱を放熱するものであり、水道水に
よつて冷却される。 温度制御回路9に設けられた比較回路91は、
処理槽4内の処理液の温度を検出するセンサ13
の出力と、温度設定器92の出力とを比較し、各
出力の差が一定以上の場合に切換スイツチ93を
接点b側に切換える作用をなす。この実施例で
は、温度設定器92によつて設定される前記処理
槽4内の処理液目標温度と、センサ13で検出さ
れる処理液の温度との差が±1°以上となつた場合
に上記スイツチ93が接点b側に切換えられるよ
うに比較回路91の動作点が定められている。 この実施例において、タンク2内に恒温用液体
としてたとえば水を入れ、しかるのちポンプ12
を作動させると、タンク2内の水が管路11、熱
交換器9の通路81および管路10からなる循環
路を介して循環される。またポンプ6を作動させ
ると、処理槽4内の半導体処理液が管路5、パイ
プ1および管路3からなる循環路を介して循環さ
れる。したがつて、パイプ1内を循環する半導体
処理液は、該タンク内の水によつて熱交換され
る。 次に、前記温度制御回路9の作用を説明する。
いま、前記温度設定器92による設定温度がたと
えば23℃で、処理槽4内の半導体処理液の温度が
20℃であるとすると、前記切換スイツチ93が接
点b側に切換えられ、これによつてサーモモジユ
ール駆動回路94にはセンサ13の出力と設定器
92の出力とが加えられる。そこで上記駆動回路
94は、それらの出力の差が小さくなるようにサ
ーモモジユール82の加熱作動させる。つまり、
熱交換器8を通過する水を加熱することによつて
タンク2内の水の温度を上昇させ、これによつて
パイプ1内を通過する半導体処理液の温度を上昇
させる。 ところで、センサ13の出力のみを使用して温
度制御を行つた場合、以下のような問題を生じ
る。すなわちこの場合、処理槽4内の半導体処理
液の温度が23℃になつた以後、パイプ1内を通過
していた相当量の処理液が処理槽4内に流入して
くることになるので、該処理槽4内の処理液の温
度が設定温度23℃よりも大きくなるという現象
を生じ、そのため今度は処理液の温度を低下させ
るようにサーモモジユール82が作動されること
になる。つまり、温度が整定されるまでにハンチ
ング現象を生じて、その整定時間が長くなる。 ところが上記実施例では、処理槽4内の処理液
の温度が20℃から22℃まで上昇した時点でスイツ
チ93が接点a側に接続されるので、つまりセン
サ13の出力に代えてセンサ84の出力が駆動回
路94に加えられるので、温度の整定時間を短縮
することができる。 すなわち、センサ84の出力はほぼタンク2内
の水の温度を示唆し、この水の温度は23℃よりも
大きいので処理槽内の処理液の温度が22℃になつ
た時点でサーモモジユール82が冷却作動する。
この結果、処理槽4内の処理液は23℃近傍に速や
かに整定され、その時点で該処理槽内の処理液温
度とパイプ1内の処理液温度がほぼ等しくなると
ともに、その温度タンク1内の水の温度とが平衡
する。なお、この時点においてサーモモジユール
82の加熱または冷却作用はほぼ停止状態とな
る。 かくして、この実施例によれば、きわめて安定
した処理液の温度制御を行なうことができる。 上記実施例では温度制御用の加熱冷却手段とし
てサーモモジユール82を使用しているが、これ
に代えて他の汎用の加熱冷却手段を用いても本考
案は実施可能である。また上記実施例では、処理
槽4内の処理液の温度と設定温度との差が±1℃
以上になつた場合にスイツチ93を接点b側に切
換作動させているが、この温度差についてのしき
い値範囲は半導体処理液の量、熱交換器8の加熱
冷却容量、恒温用液体の量等に応じて適宜所望の
値に設定される。 なお、上記タンク2、熱交換器8の通路81、
管路10,11等は、パイプ1からの半導体処理
液の万一の漏洩事故に備えて耐処理液性の材料で
形成しておくことが好ましい。 上記半導体処理液としては、エツチング液等が
あり、本考案の装置によつて熱交換されれる代表
的なエツチング液を用途別に例示すると以下のと
おりである。
"Industrial Application Field" The present invention relates to an apparatus for heat exchange of semiconductor processing liquids such as etching liquids. "Prior art" In order to control the temperature of the semiconductor processing solution, a circulation path with a heat exchanger and a pump is connected to the processing tank, and the semiconductor processing solution flowing from the processing tank is exchanged with the heat exchanger. After that, it is returned to the treatment tank. In this case, the temperature of the semiconductor processing liquid in the processing tank is detected by the temperature sensor, and the temperature of the heat exchange medium (for example, water) in the heat exchanger is controlled so that the temperature detected by the sensor becomes the target temperature. Ru. [Problems to be Solved by the Invention] However, the capacity of the heat exchanger for semiconductor processing liquid is quite large, which has conventionally caused the following problems. In other words, when the temperature detected by the sensor reaches the target temperature, the temperature of the processing liquid in the processing tank and the temperature of the processing liquid stored in the heat exchanger are different due to the influence of the bus from the heat exchanger to the processing tank. It makes a difference. Therefore, if a large amount of processing liquid stored in the heat exchanger flows into the processing tank after the above-mentioned point, the temperature of the processing liquid in the processing tank changes from the target temperature,
As a result, the temperature of the heat exchange medium of the heat exchanger is controlled in the opposite direction. In other words, temperature control with hunting is performed, and it takes time for the target temperature of the processing liquid in the processing tank to be established. An object of the present invention is to provide a heat exchange device that can set the temperature of the processing liquid in the processing tank as quickly as possible. [Means for Solving the Problems] The heat exchange device according to the present invention includes a first heat exchange means, heat exchanges the semiconductor processing liquid flowing out from the processing tank with the first heat exchange means, and then heats the semiconductor processing liquid again. A first circulation path returning to the processing tank and a second heat exchange means including a heating and cooling element are interposed, and the heat exchange medium heat exchanged by the second heat exchange means is transferred to the first heat exchange medium. a first temperature detection means for detecting the temperature of the semiconductor processing liquid in the processing tank; and a second temperature detection means for detecting the temperature of the heat exchange medium. A target temperature setting means for setting a target temperature of the semiconductor processing liquid in the processing tank compares the target temperature with the detected temperature of the first temperature detecting means, and the value of the detected temperature is determined to be the target temperature. a comparison means for determining whether or not the detected temperature is outside a predetermined temperature range centered at and controlling the heating/cooling means so that the detected temperature of the second temperature detecting means approaches the target temperature when the value of the detected temperature is within the temperature range. There is. [Function] According to this heat exchange device, when the temperature detected by the first temperature detection means is outside the above temperature range, the heating and cooling means is controlled based on the temperature detected by the first temperature detection means. Ru. Further, when the detected temperature of the first temperature detection means is within the above temperature range,
The heating and cooling means are controlled based on the temperature detected by the second temperature detection means. "Embodiments" Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 conceptually shows an embodiment of a heat exchange device according to the present invention. This embodiment includes a heat exchange tank 2 in which a coiled pipe 1 is disposed. The pipe 1 is made of a treatment liquid-resistant material such as Teflon, and one end of the pipe 1 is connected to the bottom of the inner tank 4A of the treatment tank 4 via the management 3, and the other end is connected to the bottom of the inner tank 4A of the processing tank 4 via the pipe line 5. They are each connected to the outer tank 4B of the processing tank 4. Note that a pump 6 is interposed in the middle of the pipe line 5. Moreover, pleats are formed on the outer periphery of the pipe 1. The chemical circulator 7 is composed of a heat exchanger 8 and a temperature control circuit 9, as shown in FIG. The heat exchanger 8 includes a passage 81 through which a constant temperature liquid serving as a heat exchange medium passes, thermo modules 82, 82 provided on both sides of this passage 81, and a radiator 83 attached to each of these thermo modules. , 83 and a temperature sensor 84 disposed within the passage 81. And the above passage 8
One end and the other end of 1 are connected to conduits 10 and 11, respectively.
It is connected to the upper and lower parts of the tank 2 via. Note that a pump 12 is interposed in the pipe line 11. The thermomodules 82, 82 perform electronic cooling or heating using semiconductor thermoelectric elements, and by changing the polarity of the applied voltage, the cooling action and the heating action can be switched. In addition,
Since the structure and operating principle of this thermomodule are well known, their explanation will be omitted here. The heat radiators 83, 83 radiate the heat generated by the thermo module, and are cooled by tap water. The comparison circuit 91 provided in the temperature control circuit 9 is
A sensor 13 that detects the temperature of the processing liquid in the processing tank 4
The output of the temperature setting device 92 is compared with the output of the temperature setting device 92, and when the difference between the respective outputs is greater than a certain value, the changeover switch 93 is switched to the contact b side. In this embodiment, when the difference between the target temperature of the processing liquid in the processing tank 4 set by the temperature setting device 92 and the temperature of the processing liquid detected by the sensor 13 is ±1° or more, The operating point of the comparator circuit 91 is determined so that the switch 93 is switched to the contact b side. In this embodiment, for example, water is poured into the tank 2 as a constant temperature liquid, and then the pump 12
When activated, water in the tank 2 is circulated through a circulation path consisting of the pipe 11, the passage 81 of the heat exchanger 9, and the pipe 10. Further, when the pump 6 is operated, the semiconductor processing liquid in the processing tank 4 is circulated through the circulation path consisting of the pipe 5, the pipe 1, and the pipe 3. Therefore, the semiconductor processing liquid circulating in the pipe 1 undergoes heat exchange with the water in the tank. Next, the operation of the temperature control circuit 9 will be explained.
Now, the temperature set by the temperature setting device 92 is, for example, 23°C, and the temperature of the semiconductor processing liquid in the processing tank 4 is
Assuming that the temperature is 20° C., the changeover switch 93 is switched to the contact b side, whereby the output of the sensor 13 and the output of the setting device 92 are applied to the thermomodule drive circuit 94. Therefore, the drive circuit 94 heats the thermomodule 82 so that the difference between the outputs thereof becomes small. In other words,
By heating the water passing through the heat exchanger 8, the temperature of the water in the tank 2 is increased, thereby increasing the temperature of the semiconductor processing liquid passing through the pipe 1. By the way, when temperature control is performed using only the output of the sensor 13, the following problems occur. That is, in this case, after the temperature of the semiconductor processing liquid in the processing tank 4 reaches 23°C, a considerable amount of the processing liquid that had passed through the pipe 1 will flow into the processing tank 4. A phenomenon occurs in which the temperature of the processing liquid in the processing tank 4 becomes higher than the set temperature of 23° C., and therefore the thermomodule 82 is operated to lower the temperature of the processing liquid. In other words, a hunting phenomenon occurs until the temperature is stabilized, and the settling time becomes longer. However, in the above embodiment, the switch 93 is connected to the contact a side when the temperature of the processing liquid in the processing tank 4 rises from 20°C to 22°C. is added to the drive circuit 94, the temperature settling time can be shortened. In other words, the output of the sensor 84 indicates approximately the temperature of the water in the tank 2, and since the temperature of this water is higher than 23°C, the thermo module 82 is activated for cooling.
As a result, the processing liquid in the processing tank 4 is quickly settled to around 23°C, and at that point, the temperature of the processing liquid in the processing tank and the temperature of the processing liquid in the pipe 1 become almost equal, and the temperature in the tank 1 becomes almost equal. The temperature of the water is in equilibrium. Note that at this point, the heating or cooling action of the thermomodule 82 is almost stopped. Thus, according to this embodiment, extremely stable temperature control of the processing liquid can be performed. In the above embodiment, the thermomodule 82 is used as a heating/cooling means for temperature control, but the present invention can be implemented by using other general-purpose heating/cooling means instead. Further, in the above embodiment, the difference between the temperature of the processing liquid in the processing tank 4 and the set temperature is ±1°C.
The switch 93 is switched to the contact b side when the temperature difference exceeds the threshold value, but the threshold range for this temperature difference is the amount of semiconductor processing liquid, the heating and cooling capacity of the heat exchanger 8, and the amount of constant temperature liquid. It is set to a desired value as appropriate depending on the situation. Note that the tank 2, the passage 81 of the heat exchanger 8,
Preferably, the pipes 10, 11, etc. are made of a material resistant to processing liquid in case the semiconductor processing liquid leaks from the pipe 1. Examples of the semiconductor processing liquid include etching liquids, etc. Typical etching liquids heat exchanged by the apparatus of the present invention are exemplified by use as follows.

【表】 「考案の効果」 本考案に係る熱交換装置によれば、処理槽中の
処理液の温度が可及的速やかに目標温度に整定さ
れるのでエツチング処理等を効率よくかつ適性に
行なうことができる。
[Table] "Effects of the invention" According to the heat exchange device according to the invention, the temperature of the processing liquid in the processing tank is set to the target temperature as quickly as possible, so etching processing etc. can be carried out efficiently and appropriately. be able to.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案に係る熱交換装置の一実施例を
示した概念図、第2図は第1図に示すサーキユレ
ーターの一構成例を示した概念図である。 1……パイプ、2……タンク、4……処理槽、
6,12……ポンプ、7……ケミカルサーキユレ
ータ、8……熱交換器、9……温度制御回路、1
3,84……温度センサ、91……比較回路、9
2……温度設定器、93……切換スイツチ、94
……サーモモジユール駆動回路。
FIG. 1 is a conceptual diagram showing an embodiment of a heat exchange device according to the present invention, and FIG. 2 is a conceptual diagram showing an example of the configuration of the circulator shown in FIG. 1. 1...pipe, 2...tank, 4...processing tank,
6, 12...Pump, 7...Chemical circulator, 8...Heat exchanger, 9...Temperature control circuit, 1
3, 84... Temperature sensor, 91... Comparison circuit, 9
2... Temperature setting device, 93... Changeover switch, 94
...Thermo module drive circuit.

Claims (1)

【実用新案登録請求の範囲】 第1の熱交換手段が介在され、処理槽より流出
した半導体処理液を上記第1の熱交換手段で熱交
換したのち再び上記処理槽に戻す第1の循環路
と、 加熱冷却要素を備えた第2の熱交換手段が介在
され、この第2の熱交換手段で熱交換された熱交
換媒体を上記第1の熱交換手段に供給する第2の
循環路と、 上記処理槽中において、上記半導体処理液の温
度を検出する第1の温度検出手段と、 上記熱交換媒体の温度を検出する第2の温度検
出手段と、 上記処理槽中における上記半導体処理液の目標
温度を設定する目標温度設定手段と、 上記目標温度と上記第1の温度検出手段の検出
温度とを比較し、該検出温度の値が上記目標温度
を中心とする所定の温度範囲以外であるか否かを
判定する比較手段と、 上記検出温度の値が上記温度範囲以外の場合
に、該検出温度が上記目標温度に近づくように上
記加熱冷却手段を制御し、かつ上記検出温度の値
が上記温度範囲内の場合に、上記第2の温度検出
手段の検出温度が上記目標温度に近づくように上
記加熱冷却手段を制御する制御手段と を備えることを特徴とする半導体処理液の熱交換
装置。
[Claims for Utility Model Registration] A first circulation path in which a first heat exchange means is interposed, and the semiconductor processing liquid flowing out from the processing tank is heat exchanged with the first heat exchange means and then returned to the processing tank. and a second circulation path in which a second heat exchange means equipped with a heating and cooling element is interposed and supplies the heat exchange medium heat exchanged by the second heat exchange means to the first heat exchange means. , a first temperature detection means for detecting the temperature of the semiconductor processing liquid in the processing tank; a second temperature detection means for detecting the temperature of the heat exchange medium; and a first temperature detection means for detecting the temperature of the semiconductor processing liquid in the processing tank. a target temperature setting means for setting a target temperature of the first temperature detecting means; and a target temperature setting means for setting a target temperature of a comparison means for determining whether or not a value of the detected temperature exists, and a comparison means for controlling the heating and cooling means so that the detected temperature approaches the target temperature when the value of the detected temperature is outside the temperature range, and the value of the detected temperature; and a control means for controlling the heating and cooling means so that the temperature detected by the second temperature detection means approaches the target temperature when the temperature is within the temperature range. Device.
JP10734684U 1984-07-16 1984-07-16 Heat exchange equipment for semiconductor processing liquid Granted JPS6122340U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10734684U JPS6122340U (en) 1984-07-16 1984-07-16 Heat exchange equipment for semiconductor processing liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10734684U JPS6122340U (en) 1984-07-16 1984-07-16 Heat exchange equipment for semiconductor processing liquid

Publications (2)

Publication Number Publication Date
JPS6122340U JPS6122340U (en) 1986-02-08
JPH0442915Y2 true JPH0442915Y2 (en) 1992-10-12

Family

ID=30666593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10734684U Granted JPS6122340U (en) 1984-07-16 1984-07-16 Heat exchange equipment for semiconductor processing liquid

Country Status (1)

Country Link
JP (1) JPS6122340U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010164277A (en) * 2009-01-19 2010-07-29 Tekkusu Iijii:Kk Liquid temperature adjustment device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943523A (en) * 1982-09-03 1984-03-10 Yamagata Nippon Denki Kk Chemical liquid feeding method in semiconductor etching process

Also Published As

Publication number Publication date
JPS6122340U (en) 1986-02-08

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