JPH0443844B2 - - Google Patents

Info

Publication number
JPH0443844B2
JPH0443844B2 JP59182774A JP18277484A JPH0443844B2 JP H0443844 B2 JPH0443844 B2 JP H0443844B2 JP 59182774 A JP59182774 A JP 59182774A JP 18277484 A JP18277484 A JP 18277484A JP H0443844 B2 JPH0443844 B2 JP H0443844B2
Authority
JP
Japan
Prior art keywords
monosilane
nitrogen
oxygen
boiling point
ppm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59182774A
Other languages
Japanese (ja)
Other versions
JPS6163516A (en
Inventor
Atsuhiko Hiai
Kazuo Wakimura
Masao Tanaka
Nobuhiro Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP18277484A priority Critical patent/JPS6163516A/en
Publication of JPS6163516A publication Critical patent/JPS6163516A/en
Publication of JPH0443844B2 publication Critical patent/JPH0443844B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〔技術分野〕 本発明は、高純度モノシランの貯蔵方法に関す
る。更に詳しくは、酸素、窒素、水素、アルゴ
ン、ヘリウム、メタン等のモノシランより沸点の
低いガスを含有しないモノシランとして貯槽内に
貯蔵する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for storing high purity monosilane. More specifically, it relates to a method of storing monosilane in a storage tank that does not contain gases such as oxygen, nitrogen, hydrogen, argon, helium, and methane, which have a lower boiling point than monosilane.

〔従来技術〕[Prior art]

エレクトロニクス産業市場の急成長に伴いモノ
シランは、IC、太陽電池、光感光体ドラム等に
おける半導体薄膜を形成するための原料ガスとし
て近年急激に需要が増加している。モノシランガ
スの製造方法としては四塩化硅素又は三塩化硅素
等のクロロシラン類をアルカリ金属ハイドライド
又はアルギルアルミニウムハイドライドで還元す
る方法あるいは、Mg2Si等の合金と塩酸又は塩化
アンモニウム等を反応させる方法が一般的であ
る。
With the rapid growth of the electronics industry market, demand for monosilane has increased rapidly in recent years as a raw material gas for forming semiconductor thin films in ICs, solar cells, photoreceptor drums, etc. Common methods for producing monosilane gas include reducing chlorosilanes such as silicon tetrachloride or silicon trichloride with an alkali metal hydride or argylaluminium hydride, or reacting an alloy such as Mg 2 Si with hydrochloric acid or ammonium chloride. It is true.

これらの方法により得られるモノシランガス
は、活性炭やモレキユラーシーブ等の吸着剤を用
いて吸着精製したり、蒸留により精製したり、あ
るいは、これらを組み合わせて精製し、実用に供
していた。これらの精製法は、モノシランの沸点
(−112℃)よりも高い沸点の不純物に対しては、
充分な精製効果があるが、酸素、窒素、水素、ア
ルゴン、ヘリウム、メタン等の、モノシランより
沸点の低い不純物に対しては、充分な精製効果が
得られない。従つて、このような微量の不純物の
混入したまま、通常はモノシランの沸点以下の温
度で製品タンクに貯蔵され、ボンベ等の容器に充
填されて各種用途に使用されていた。
Monosilane gas obtained by these methods has been purified by adsorption using an adsorbent such as activated carbon or molecular sieve, purified by distillation, or purified by a combination of these methods for practical use. These purification methods are effective against impurities with a boiling point higher than the boiling point of monosilane (-112℃).
Although it has a sufficient purification effect, a sufficient purification effect cannot be obtained for impurities having a boiling point lower than that of monosilane, such as oxygen, nitrogen, hydrogen, argon, helium, and methane. Therefore, it is usually stored in a product tank at a temperature below the boiling point of monosilane with such trace amounts of impurities mixed in, and is then filled into containers such as cylinders and used for various purposes.

〔発明の目的〕[Purpose of the invention]

しかしながら、高純度を要求される半導体、太
陽電池、光感光体ドラム等の用途には、製品モノ
シランガス中の酸素、窒素、水素、アルゴン、ヘ
リウム、メタン等の低沸点物質の不純物の混入
は、当該用途における製品の品質に大きな影響を
与える。本発明者らは、とくに、非晶質シリコン
太陽電池用には、原料モノシラン中に酸素や窒素
等の不純物が、非常に微小量存在しただけで該電
池の性能、とくに経日劣化特性に著しい影響を及
ぼすことを見い出した。
However, for applications such as semiconductors, solar cells, and photoreceptor drums that require high purity, contamination of low-boiling point substances such as oxygen, nitrogen, hydrogen, argon, helium, and methane in the product monosilane gas is a problem. It has a significant impact on the quality of the product in its application. The present inventors have found that, in particular, for amorphous silicon solar cells, the presence of very small amounts of impurities such as oxygen and nitrogen in the raw material monosilane significantly affects the performance of the cell, especially its aging characteristics. found that it has an effect.

しかして、本発明の目的は、かかる非晶質シリ
コン太陽電池のごとき特に高品質を要求される分
野に好適に使用できるように高純度のモノシラン
ガスを容器に充填貯蔵する方法を提供することで
ある。
Therefore, an object of the present invention is to provide a method for filling and storing a container with high-purity monosilane gas so that it can be suitably used in fields that require particularly high quality, such as amorphous silicon solar cells. .

〔発明の開示〕[Disclosure of the invention]

本発明の上記目的は液体モノシランの貯槽内で
モノシランの還流下に保持することにより達成さ
れる。
The above objects of the invention are achieved by maintaining the monosilane under reflux in a reservoir of liquid monosilane.

以下、本発明を詳細に説明する。 The present invention will be explained in detail below.

本発明の適用しうるモノシランは、クロロシラ
ン類を還元剤を用いて還元して製造したものも、
Mg2Siのごとき合金と塩酸又は塩化アンモニウム
等を反応させて製造したものも、いずれでもよ
い。いかなる製造プロセスを経るにせよ、精製さ
れた水素を同伴しているモノシランは、凝縮され
て製品ホルダー(貯槽)に貯液される。
Monosilanes to which the present invention can be applied include those produced by reducing chlorosilanes using a reducing agent;
Any material manufactured by reacting an alloy such as Mg 2 Si with hydrochloric acid or ammonium chloride may also be used. Regardless of the manufacturing process, the monosilane entrained with purified hydrogen is condensed and stored in a product holder.

本発明においては、この貯槽内で、モノシラン
を還流下、好ましくは、モノシランの沸点である
−112℃付近に保持するものである。しかるのち、
貯槽から好適には貯槽の下部から、ポンプで抜き
出し、気化器で加熱してボンベ等の容器に充填さ
れ、出荷される。ポンプで抜き出す際には、モノ
シランを液状で抜出しもよいが、また、還流下に
保持した貯槽の気相部からモノシランを圧縮器で
抜出し、容器に充填してもよい。
In the present invention, monosilane is maintained in this storage tank under reflux, preferably at around -112°C, which is the boiling point of monosilane. Afterwards,
It is extracted from the storage tank, preferably from the lower part of the storage tank, with a pump, heated with a vaporizer, filled into a container such as a cylinder, and shipped. When extracting monosilane with a pump, monosilane may be extracted in liquid form, but monosilane may also be extracted with a compressor from the gas phase of a storage tank held under reflux and filled into a container.

〔実施例〕〔Example〕

以下本発明を実施例により具体的に説明する。 The present invention will be specifically explained below using examples.

(実施例 1) 40のジヤケツト付液体シランホルダーに3m2
の伝熱面積を有する逆流コンデンサーを設置し
た。逆流コンデンサーは、5Kg/cm2Gの圧力の液
体窒素で冷却した。ホルダー部分は、75mm厚のウ
レタンフオームで保冷した。ホルダー部分のジヤ
ケツトには液体窒素を流さない。このホルダー
に、毎時10Nm3のキヤリアガス(窒素1500ppm、
酸素とアルゴン100ppmを含有する水素)を用い
て毎時1.2Kgのシランを10時間供給し、液体シラ
ン12Kgを貯液した。
(Example 1) 3 m 2 in a liquid silane holder with 40 jackets
A countercurrent condenser with a heat transfer area of The counterflow condenser was cooled with liquid nitrogen at a pressure of 5 Kg/cm 2 G. The holder part was kept cool with 75mm thick urethane foam. Do not pour liquid nitrogen into the jacket of the holder. This holder is supplied with a carrier gas of 10Nm3 per hour (nitrogen 1500ppm,
Hydrogen containing 100 ppm of oxygen and argon was used to supply 1.2 kg of silane per hour for 10 hours, and 12 kg of liquid silane was stored.

ホルダー内のシランは沸騰状態に保持され逆流
コンデンサーで還流される。
The silane in the holder is kept at boiling point and refluxed in a counterflow condenser.

この貯槽下部からポンプにより液体シランを抜
き出し、気化させたのち、47ボンベ2本にシラ
ンガスを充填した。ボンベ中の不純物を分析した
ところ、窒素0.7ppm、酸素とアルゴンの和
0.3ppm、水素5ppm、メタン不検出であつた。
Liquid silane was extracted from the bottom of the storage tank using a pump, vaporized, and then filled into two 47 cylinders with silane gas. Analysis of impurities in the cylinder revealed 0.7 ppm of nitrogen, the sum of oxygen and argon.
0.3ppm, hydrogen 5ppm, and no methane detected.

(比較例 1) ホルダーのジヤケツトに液体窒素を通して、−
120℃に保持した以外は実施例1と同様にしてモ
ノシランをボンベに充填した結果、ボンベ中の不
純物は、窒素12ppm、酸素とアルゴンの和4ppm
であつた。
(Comparative example 1) Pass liquid nitrogen through the jacket of the holder and -
A cylinder was filled with monosilane in the same manner as in Example 1 except that the temperature was maintained at 120°C. As a result, the impurities in the cylinder were 12 ppm of nitrogen and 4 ppm of oxygen and argon.
It was hot.

〔発明の効果及び産業上の利用可能性〕[Effects and industrial applicability of the invention]

本発明方法により貯蔵されたモノシランを、例
えば「47ボンベ」に充填した場合、窒素の混入
量は、1ppm以下、酸素の混入量は、0.5ppm以下
とすることができ、水素も10ppm以下となり、さ
らに、アルゴン、ヘリウム、メタン等は不検出と
いうような超高純度シリコンを容器に充填するこ
とが可能となる。したがつて、このようにして容
器に充填されたモノシランは、IC、太陽電池、
光感光体ドラム等の用途に効果的に供されるもの
である。
When monosilane stored by the method of the present invention is filled into a "47 cylinder", for example, the amount of nitrogen mixed in can be 1 ppm or less, the amount of oxygen mixed in can be 0.5 ppm or less, and hydrogen can also be 10 ppm or less, Furthermore, it becomes possible to fill the container with ultra-high purity silicon that does not detect argon, helium, methane, etc. Therefore, monosilane filled into a container in this way can be used for ICs, solar cells,
It is effectively used in applications such as photosensitive drums.

Claims (1)

【特許請求の範囲】[Claims] 1 液体モノシランの貯槽内でモノシランの還流
下に保持することを特徴とする高純度モノシラン
の貯蔵方法。
1. A method for storing high-purity monosilane, which comprises maintaining monosilane under reflux in a liquid monosilane storage tank.
JP18277484A 1984-09-03 1984-09-03 Method of storing high-purity monosilane Granted JPS6163516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18277484A JPS6163516A (en) 1984-09-03 1984-09-03 Method of storing high-purity monosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18277484A JPS6163516A (en) 1984-09-03 1984-09-03 Method of storing high-purity monosilane

Publications (2)

Publication Number Publication Date
JPS6163516A JPS6163516A (en) 1986-04-01
JPH0443844B2 true JPH0443844B2 (en) 1992-07-17

Family

ID=16124181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18277484A Granted JPS6163516A (en) 1984-09-03 1984-09-03 Method of storing high-purity monosilane

Country Status (1)

Country Link
JP (1) JPS6163516A (en)

Also Published As

Publication number Publication date
JPS6163516A (en) 1986-04-01

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