JPH0444364U - - Google Patents
Info
- Publication number
- JPH0444364U JPH0444364U JP8727090U JP8727090U JPH0444364U JP H0444364 U JPH0444364 U JP H0444364U JP 8727090 U JP8727090 U JP 8727090U JP 8727090 U JP8727090 U JP 8727090U JP H0444364 U JPH0444364 U JP H0444364U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrode support
- plasma processing
- support rod
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Description
第１図は、この考案の一実施例に係るプラズマ
処理装置の電極板周りを拡大して部分的に示す図
である。第２図は、プラズマ処理装置の一例を示
す概略図である。第３図は、従来のプラズマ処理
装置の電極板周りを拡大して部分的に示す図であ
る。
２……真空容器、４……電極支持棒、６……電
極板、８……基板、２４……絶縁碍子管。
FIG. 1 is an enlarged partial view showing the vicinity of an electrode plate of a plasma processing apparatus according to an embodiment of the invention. FIG. 2 is a schematic diagram showing an example of a plasma processing apparatus. FIG. 3 is an enlarged view partially showing the area around an electrode plate of a conventional plasma processing apparatus. 2... Vacuum container, 4... Electrode support rod, 6... Electrode plate, 8... Substrate, 24... Insulator tube.
Claims (1)
本の電極支持棒を収納し、この電極支持棒に、複
数の電極板であつてその上に基板が載せられるも
のを交互にかつ多段状に取り付け、かつ各電極支
持棒の少なくとも電極板間の部分に絶縁碍子管を
被せた構造のプラズマ処理装置において、前記各
絶縁碍子管を半割れ構造にし、かつ当該絶縁碍子
管によつて電極支持棒の電極板取付け部以外を覆
つていることを特徴とするプラズマ処理装置。 In the vacuum vessel into which the gas is introduced, at least two
A book of electrode support rods is stored, and a plurality of electrode plates on which substrates can be placed are attached to the electrode support rods alternately and in multiple stages, and at least between the electrode plates of each electrode support rod. A plasma processing apparatus having a structure in which a portion is covered with an insulator tube, characterized in that each of the insulator tubes has a half-split structure, and the insulator tube covers the electrode support rod other than the electrode plate mounting portion. plasma processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8727090U JPH0444364U (en) | 1990-08-20 | 1990-08-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8727090U JPH0444364U (en) | 1990-08-20 | 1990-08-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0444364U true JPH0444364U (en) | 1992-04-15 |
Family
ID=31819479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8727090U Pending JPH0444364U (en) | 1990-08-20 | 1990-08-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0444364U (en) |
-
1990
- 1990-08-20 JP JP8727090U patent/JPH0444364U/ja active Pending
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