JPH0447031B2 - - Google Patents
Info
- Publication number
- JPH0447031B2 JPH0447031B2 JP34384689A JP34384689A JPH0447031B2 JP H0447031 B2 JPH0447031 B2 JP H0447031B2 JP 34384689 A JP34384689 A JP 34384689A JP 34384689 A JP34384689 A JP 34384689A JP H0447031 B2 JPH0447031 B2 JP H0447031B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon steel
- treatment
- printing
- silicon
- powdered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 238000011282 treatment Methods 0.000 claims description 33
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 238000009792 diffusion process Methods 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000011812 mixed powder Substances 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 3
- 230000035699 permeability Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000005255 carburizing Methods 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 3
- 229910003470 tongbaite Inorganic materials 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005256 carbonitriding Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、ケイ素鋼の機械的特性を改善する
ための処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a treatment method for improving the mechanical properties of silicon steel.
[従来技術]
ワイヤドツトプリンタのプリンタヘツドでは、
印字ワイヤの後端に印字レバーを配置し、印字レ
バーを磁気による吸引,反発により駆動して印字
ワイヤを打撃し、この印字ワイヤにより印字を行
つている。印字レバーは磁気特性として高透磁
率,高磁束密度,低保磁力が要求されるために、
ケイ素鋼や電磁軟鉄が使用される。なかでもケイ
素鋼は磁気応答性等優れた磁気特性を有するため
に、プリンタの高速印字化等に対応させることも
可能であるが、ケイ素鋼や電磁軟鉄は母材硬度が
ピツカース硬度100〜300Hvと低いので、上述の
ように印字ワイヤを打撃するレバーとして用いる
ためには、耐摩耗性等の機械的特性を向上させな
ければならない。しかし、ケイ素鋼は表面浸炭焼
入や浸炭窒化焼入を施すことができないので、従
来はニツケルメツキを行つていた。このニツケル
メツキは例えばホウ素又はリン成分が適当量含有
された無電解メツキであり、メツキ後の加熱処理
によりメツキ硬度を700〜1000Hv程度にしてい
た。[Prior art] In the printer head of a wire dot printer,
A printing lever is arranged at the rear end of the printing wire, and the printing lever is driven by magnetic attraction and repulsion to strike the printing wire, and printing is performed using this printing wire. The printing lever requires high magnetic permeability, high magnetic flux density, and low coercive force as magnetic properties.
Silicon steel and electromagnetic soft iron are used. Among them, silicon steel has excellent magnetic properties such as magnetic response, so it can be used for high-speed printing of printers, but silicon steel and electromagnetic soft iron have a base material hardness of 100 to 300 Hv on the Pickers hardness. Therefore, mechanical properties such as abrasion resistance must be improved in order to use it as a lever for hitting the printing wire as described above. However, since silicon steel cannot be subjected to surface carburizing and quenching or carbonitriding, nickel plating has conventionally been performed. This nickel plating is, for example, electroless plating containing an appropriate amount of boron or phosphorus, and the plating hardness is made to be about 700 to 1000 Hv by heat treatment after plating.
[解決しようとする課題]
しかし700〜1000Hv程度の硬度では耐摩耗性等
の耐久性が十分ではなく、印字レバーのように強
に打撃力が作用する部材や繰返しの摺動作用が生
じる部材には用いることができなかつた。印字レ
バーに用いる場合、径0.3〜0.2mmのワイヤの後端
部を直接打撃できず、ワイヤの後端部にワイヤピ
ン等を取り付けて径を大きくしてこのワイヤピン
部を打撃するようにしていた。従つてこの場合は
印字ワイヤの重量が増し、印字速度の高速化の妨
げとなり、印字ワイヤのコストアツプになつてい
た。[Problem to be solved] However, a hardness of about 700 to 1000 Hv does not provide sufficient durability such as wear resistance, and is not suitable for parts that are subjected to strong impact force, such as printing levers, or parts that undergo repeated sliding movements. could not be used. When used in a printing lever, the rear end of a wire with a diameter of 0.3 to 0.2 mm cannot be directly struck, so a wire pin or the like is attached to the rear end of the wire to increase the diameter and the wire pin is struck. Therefore, in this case, the weight of the printing wire increases, which hinders an increase in printing speed and increases the cost of the printing wire.
そこで本発明の目的は、ケイ素鋼の機械的特性
並びに磁気的特性を改善するための処理方法を提
供することにある。 SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a treatment method for improving the mechanical and magnetic properties of silicon steel.
[課題を解決するための手段]
上記目的を達成するために、本発明のケイ素鋼
の処理方法は、ケイ素成分が2.8%〜6.5%のケイ
素鋼を浸炭処理して表面に20〜200μmの厚みの
浸炭層を形成し、粉末クロム又は粉末バナジウム
又は粉末チタン又はこれらの組合せと触媒との混
合粉中にこのケイ素鋼を埋込・加熱する固体拡散
処理を施してケイ素鋼の表面に2〜10μmの厚み
の上記金属の炭化物層を形成するものである。[Means for Solving the Problems] In order to achieve the above object, the silicon steel treatment method of the present invention carburizes silicon steel with a silicon content of 2.8% to 6.5% to form a surface with a thickness of 20 to 200 μm. A solid diffusion treatment is performed to form a carburized layer of 2 to 10 μm on the surface of the silicon steel by embedding and heating the silicon steel in a mixed powder of powdered chromium, powdered vanadium, powdered titanium, or a combination of these and a catalyst. A carbide layer of the above-mentioned metal is formed with a thickness of .
[実施例]
以下、本発明の具体的な実施例について詳細に
説明する。[Examples] Hereinafter, specific examples of the present invention will be described in detail.
被処理部材としてケイ素成分が3%の市販のケ
イ素鋼を使用し、磁気による吸引、反発により駆
動させてプリンタヘツドの印字ワイヤを直接打撃
する印字レバーを製作して以下に記す処理を施し
た。 Commercially available silicon steel with a silicon content of 3% was used as the member to be treated, and a printing lever was manufactured that was driven by magnetic attraction and repulsion to directly impact the printing wire of the printer head, and was subjected to the following treatments.
実施例 1
この印字レバーを850℃で45分間ガス浸炭して、
100μmの厚みの浸炭層を形成した。Example 1 This printing lever was gas carburized at 850°C for 45 minutes.
A carburized layer with a thickness of 100 μm was formed.
次に粉末クロムと粉末アルミナと塩化アンモニ
ウムとが適当量調合された混合粉中に、浸炭処理
された上記印字レバーを埋込み、アルゴン気流中
にて1050℃で45分間保つ固体拡散処理を行つた。
以下、この処理方法を「処理条件B」という。 Next, the carburized printing lever was embedded in a mixed powder containing appropriate amounts of powdered chromium, powdered alumina, and ammonium chloride, and solid diffusion treatment was performed at 1050° C. for 45 minutes in an argon stream.
Hereinafter, this processing method will be referred to as "processing condition B."
この処理条件Bで処理された印字レバーの表面
には、5〜6μmの炭化クロム層が形成され、表
面硬度は1400〜1700Hvであつた。 A chromium carbide layer with a thickness of 5 to 6 μm was formed on the surface of the printing lever treated under this treatment condition B, and the surface hardness was 1400 to 1700 Hv.
また上記の100μmの厚みの浸炭層が形成され
た印字レバーを、アルゴン気流中にて1050℃で90
分保つ固体拡散処理を行つた。以下、この処理方
法を処理条件Cという。これによると、印字レバ
ーの表面に8〜10μmの炭化クロム層が形成さ
れ、表面硬度は処理時間が45分の場合と同じく、
1400〜1700Hvであつた。 In addition, the printing lever on which the above 100 μm thick carburized layer was formed was heated to 90°C at 1050°C in an argon stream.
A solid diffusion treatment was performed to maintain the temperature. Hereinafter, this processing method will be referred to as processing condition C. According to this, a chromium carbide layer of 8 to 10 μm is formed on the surface of the printing lever, and the surface hardness is the same as when the processing time is 45 minutes.
It was 1400-1700Hv.
また同様の条件で処理温度を1000℃、処理時間
を45分とした場合には、表面に2μmの炭化クロ
ム層が形成された。 Under similar conditions, a 2 μm thick chromium carbide layer was formed on the surface when the treatment temperature was 1000° C. and the treatment time was 45 minutes.
第1図に、横軸を処理条件とし、縦軸を最大透
磁率,保磁力として、各処理条件により得られた
製品の磁気特性を比較して示している。このグラ
フ中で、処理条件Aはケイ素鋼の磁気特性をよく
するために従来普通行われている真空磁性焼鈍で
あつて、これは、ケイ素鋼を850℃で45分保つ処
理を行つたものである。 FIG. 1 shows a comparison of the magnetic properties of products obtained under each treatment condition, with the horizontal axis representing the processing conditions and the vertical axis representing maximum magnetic permeability and coercive force. In this graph, processing condition A is vacuum magnetic annealing, which is conventionally commonly performed to improve the magnetic properties of silicon steel. be.
この第1図示のグラフで、従来の処理条件Aの
ものと、本発明の処理条件B及びCのものとを対
比してみると、処理条件B及びCは、最大透磁率
が上昇し、保磁力が大幅に低下していることが判
る。印字レバーとして用いるために、磁気特性と
しては、最大透磁率が大きい程よく、保磁力は小
さいほどよいので、本発明に係る処理を行うと、
最大透磁率と保磁力が共に大幅に改善され、磁気
特性が向上する結果が得られた。 In the graph shown in Figure 1, if we compare the conventional treatment condition A with the treatment conditions B and C of the present invention, we find that under treatment conditions B and C, the maximum permeability increases and the retention It can be seen that the magnetic force has decreased significantly. In order to use it as a printing lever, the higher the maximum magnetic permeability, the better the magnetic properties, and the lower the coercive force, the better.
Both maximum magnetic permeability and coercive force were significantly improved, resulting in improved magnetic properties.
実施例 2
上例と同様にして100μmの厚みの浸炭層を形
成した印字レバーを、粉末バナジウム中に埋没
し、上記と同様の処理条件B及びCで固体拡散処
理を行つた。この処理により表面に炭化バナジウ
ム層が形成され、表面硬度2500〜2800Hvが得ら
れた。Example 2 A printing lever on which a 100 μm thick carburized layer was formed in the same manner as in the above example was buried in powdered vanadium, and solid diffusion treatment was performed under the same treatment conditions B and C as described above. Through this treatment, a vanadium carbide layer was formed on the surface, and a surface hardness of 2500 to 2800 Hv was obtained.
実施例 3
上例と同様にして100μmの厚みの浸炭層を形
成した印字レバーを、粉末チタン中に埋没し、上
記と同様の処理条件B及びCで固体拡散処理を行
つた。この処理により表面に炭化チタン層が形成
され、表面硬度3000Hvが得られた。Example 3 A printing lever on which a 100 μm thick carburized layer was formed in the same manner as in the above example was buried in powdered titanium, and solid diffusion treatment was performed under the same treatment conditions B and C as described above. Through this treatment, a titanium carbide layer was formed on the surface, and a surface hardness of 3000 Hv was obtained.
第2図は横軸を処理温度とし、縦軸を最大透磁
率とし、ケイ素成分が異なるケイ素鋼について、
上例と同様にして100μmの厚みの浸炭層を形成
した印字レバーを、980℃,1020℃,1050℃の処
理温度で45分間の固体拡散処理を行つた場合のそ
れぞれの透磁率の変化を示したものである。市販
の3%ケイ素鋼を使用したものでは、1000℃以上
に加熱して固体拡散処理を行うと、最大透磁率が
著しく向上するが、2.5%及び1%のケイ素鋼で
は最大透磁率の改善はほとんど見られない。ケイ
素成分が2.8%以上、望ましくは3%以上のケイ
素鋼に関して本発明の処理方法を行なうと磁気特
性の改善が見られる。またこのグラフから、固体
拡散処理を十分に行わせるのに、処理温度は1000
℃以上が望ましいことが判る。 In Figure 2, the horizontal axis shows the processing temperature and the vertical axis shows the maximum magnetic permeability, for silicon steels with different silicon components.
The graph shows the change in magnetic permeability when a printing lever with a 100 μm thick carburized layer formed in the same manner as in the above example was subjected to solid diffusion treatment for 45 minutes at treatment temperatures of 980°C, 1020°C, and 1050°C. It is something that For products using commercially available 3% silicon steel, the maximum magnetic permeability is significantly improved when heated to 1000℃ or higher and subjected to solid diffusion treatment, but for 2.5% and 1% silicon steels, the maximum magnetic permeability does not improve. Almost never seen. When the treatment method of the present invention is applied to silicon steel having a silicon content of 2.8% or more, preferably 3% or more, the magnetic properties are improved. Also, from this graph, it is clear that the processing temperature is 1000 to ensure sufficient solid diffusion processing.
It can be seen that a temperature of ℃ or higher is desirable.
本発明に係る処理方法は、上記例の他、着磁ヨ
ークなど十分な磁気特性と耐摩耗性とを合わせ持
つことが要求される部品の表面処理に最適であ
る。 In addition to the above examples, the treatment method according to the present invention is most suitable for surface treatment of parts such as magnetizing yokes that are required to have both sufficient magnetic properties and wear resistance.
なお本発明において、ケイ素成分が2.8%〜6.5
%のケイ素鋼に限定しているのは、前述のよう
に、ケイ素成分が2.8%未満では良好な磁気特性
は得られず、またケイ素成分量を増やしていくと
磁気特性が向上するが、6.5%で最高になること
が知られており、それ以上はケイ素成分量が増え
るに従つて鋼が脆くなり使用しにくくなるためで
ある。 In the present invention, the silicon component is 2.8% to 6.5%.
% silicon steel, as mentioned above, if the silicon content is less than 2.8%, good magnetic properties cannot be obtained, and as the silicon content increases, the magnetic properties improve, but 6.5% It is known that the maximum value is %, and as the amount of silicon content increases beyond that, the steel becomes brittle and becomes difficult to use.
浸炭処理の方法は固体浸炭法,液体浸炭法,ガ
ス浸炭法等、種々の方法で行うことができる。 The carburizing treatment can be carried out using various methods such as solid carburizing, liquid carburizing, and gas carburizing.
浸炭層の厚みを20〜200μmとするのは、20μm
より少ないと固体拡散処理時に必要量の金属炭化
物を得るための炭素量を補給できないからであ
り、また200μmより多いと、浸炭処理によりケ
イ素鋼内部に入つた炭素が、固体拡散処理の際に
金属炭化物形成の反応に完全に費されず、さらに
ケイ素鋼内部への拡散で余つた炭素が粒界面に残
り、磁気特性が悪化するからである。 The thickness of the carburized layer is 20 μm to 200 μm.
If it is less than 200 μm, it will not be possible to replenish the amount of carbon needed to obtain the required amount of metal carbide during solid diffusion treatment, and if it is more than 200 μm, the carbon that has entered the silicon steel during carburization will be absorbed into the metal during solid diffusion treatment. This is because carbon that is not completely consumed in the carbide-forming reaction and is left over due to diffusion into the silicon steel remains at the grain interface, deteriorating the magnetic properties.
固体拡散処理に用いられる金属は粉末クロム又
は粉末バナジウム粉末チタンのいずれか一つを単
独で用いてもよく、またこれらのうちから適宜選
択して混合して用いてもよい。触媒としては粉末
塩化アンモニウム等が用いられる。 As for the metal used in the solid diffusion treatment, either powdered chromium or powdered vanadium or titanium powder may be used alone, or an appropriate mixture of these may be selected and used. Powdered ammonium chloride or the like is used as the catalyst.
金属炭化物層の厚さは2〜10μmとしている。
これは2μm未満では強い打撃力が作用する部材
や繰返しの摺動作用が生じる部材等に使用するの
に十分な機械的特性が得られないからであり、一
方実用的に十分な機械的特性を得るためには10μ
mあれば十分であるからである。 The thickness of the metal carbide layer is 2 to 10 μm.
This is because if the thickness is less than 2 μm, sufficient mechanical properties cannot be obtained for use in parts that are subjected to strong impact forces or parts that undergo repeated sliding motions. 10μ to get
This is because m is sufficient.
[効果]
以上に述べた本発明の処理方法によつてケイ素
鋼を処理すると、その表面の機械的特性が十分に
改善され、しかも優れた磁気特性を備えたものと
することができる。[Effects] When silicon steel is treated by the treatment method of the present invention described above, the mechanical properties of its surface are sufficiently improved, and it can be made to have excellent magnetic properties.
第1図は従来の処理条件Aと本発明の処理条件
B及びCによる製品の磁気特性を対比して示すグ
ラフ、第2図はケイ素成分の異なるケイ素鋼を各
温度条件で処理した場合の透磁率を対比して示す
グラフである。
Figure 1 is a graph comparing the magnetic properties of products under conventional treatment conditions A and treatment conditions B and C of the present invention, and Figure 2 is a graph showing the magnetic properties of products processed under various temperature conditions when silicon steels with different silicon compositions are treated. It is a graph showing a comparison of magnetic rates.
Claims (1)
処理して表面に20〜200μmの厚みの浸炭層を形
成し、 粉末クロム又は粉末バナジウム又は粉末チタン
又はこれらの組合せと触媒との混合粉中に上記ケ
イ素鋼を埋込・加熱する固体拡散処理を施して上
記ケイ素鋼の表面に2〜10μmの厚みの上記金属
の炭化物層を形成する ことを特徴とするケイ素鋼の処理方法。[Scope of Claims] 1. Silicon steel with a silicon content of 2.8% to 6.5% is carburized to form a carburized layer with a thickness of 20 to 200 μm on the surface, and is treated with powdered chromium, powdered vanadium, powdered titanium, or a combination thereof. A silicon steel characterized in that a carbide layer of the metal with a thickness of 2 to 10 μm is formed on the surface of the silicon steel by performing a solid diffusion treatment of embedding and heating the silicon steel in a mixed powder with a catalyst. Processing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34384689A JPH03202459A (en) | 1989-12-28 | 1989-12-28 | Treatment for silicon steel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34384689A JPH03202459A (en) | 1989-12-28 | 1989-12-28 | Treatment for silicon steel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03202459A JPH03202459A (en) | 1991-09-04 |
| JPH0447031B2 true JPH0447031B2 (en) | 1992-07-31 |
Family
ID=18364691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34384689A Granted JPH03202459A (en) | 1989-12-28 | 1989-12-28 | Treatment for silicon steel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03202459A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5021966B2 (en) * | 2006-07-06 | 2012-09-12 | 本田技研工業株式会社 | Abrasion resistant parts and method of manufacturing the same |
| KR20110070994A (en) | 2008-10-16 | 2011-06-27 | 보르그워너 인코퍼레이티드 | Steel article coated with Group 5 metal source carbide and method for manufacturing same |
| JP6448175B2 (en) * | 2013-04-22 | 2019-01-09 | オムロン株式会社 | Magnetic component and electronic component including the magnetic component |
| JP6310639B2 (en) * | 2013-04-22 | 2018-04-11 | オムロン株式会社 | Manufacturing method of magnetic parts |
| CN111041360B (en) * | 2019-12-16 | 2021-04-09 | 宁国市铸丰钢球铸造有限公司 | Wear-resistant hammer head and manufacturing method thereof |
-
1989
- 1989-12-28 JP JP34384689A patent/JPH03202459A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03202459A (en) | 1991-09-04 |
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