JPH0447912B2 - - Google Patents

Info

Publication number
JPH0447912B2
JPH0447912B2 JP60192937A JP19293785A JPH0447912B2 JP H0447912 B2 JPH0447912 B2 JP H0447912B2 JP 60192937 A JP60192937 A JP 60192937A JP 19293785 A JP19293785 A JP 19293785A JP H0447912 B2 JPH0447912 B2 JP H0447912B2
Authority
JP
Japan
Prior art keywords
mask
track
center hole
guide track
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60192937A
Other languages
Japanese (ja)
Other versions
JPS6252741A (en
Inventor
Kenji Oota
Junji Hirokane
Akira Takahashi
Tetsuya Inui
Shoshichi Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP19293785A priority Critical patent/JPS6252741A/en
Priority to CA000516113A priority patent/CA1298728C/en
Priority to DE3689593T priority patent/DE3689593T2/en
Priority to DE8686306711T priority patent/DE3682985D1/en
Priority to EP19860306711 priority patent/EP0214824B1/en
Priority to EP90203177A priority patent/EP0434114B1/en
Publication of JPS6252741A publication Critical patent/JPS6252741A/en
Priority to US07/229,753 priority patent/US4925776A/en
Publication of JPH0447912B2 publication Critical patent/JPH0447912B2/ja
Priority to US08/074,272 priority patent/US5470694A/en
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〈発明の技術分野〉 本発明は、光ビーム照射により情報の記録、再
生、消去の少くとも1つの動作を行う光メモリ素
子の製造の改良に関するものであり、更に詳細に
は光メモリ素子のガイドトラツク、トラツク番地
等の形成に使用するマスクの改良に関するもので
ある。
[Detailed Description of the Invention] <Technical Field of the Invention> The present invention relates to an improvement in manufacturing an optical memory element that performs at least one operation of recording, reproducing, and erasing information by irradiation with a light beam. This invention relates to an improvement of a mask used for forming guide tracks, track addresses, etc. of an optical memory element.

〈発明の技術的背景とその問題点〉 近年光メモリ素子は高密度大容量のメモリ素子
として注目されている。この光メモリ素子はその
使用形態により、再生専用メモリ、追加記録可能
メモリ及び書き換え可能メモリの3種に分けるこ
とができる。
<Technical background of the invention and its problems> In recent years, optical memory devices have attracted attention as high-density, large-capacity memory devices. This optical memory device can be divided into three types depending on its usage: read-only memory, additionally recordable memory, and rewritable memory.

このうち、追加記録可能メモリ及び書き換え可
能メモリとして使用する光メモリ素子の場合は情
報の記録、再生を行う光ビームのスポツトを光メ
モリ素子の所定の位置に案内するためにガイドト
ラツクやトラツク番号部分等を通常備えている。
特に光メモリ素子が第3図に示すごとき光デイス
クである時はその基板1にガイドトラツク3およ
びトラツク番号部分2(トラツクが多くのセクタ
ーに分かれる場合はセクター番地も同様に形成さ
れる)が同心円状もしくは螺旋状に形成されてい
る。なお第3図においては簡略化して1本のトラ
ツク3および1個所の番地2のみを示している。
Among these, in the case of an optical memory element used as an additional recordable memory or a rewritable memory, a guide track or a track number part, etc. are used to guide the light beam spot for recording and reproducing information to a predetermined position on the optical memory element. Usually equipped.
In particular, when the optical memory element is an optical disk as shown in FIG. 3, a guide track 3 and a track number part 2 (if the track is divided into many sectors, sector addresses are also formed in the same way) are formed concentrically on the substrate 1. Or it is formed in a spiral shape. In FIG. 3, only one track 3 and one address 2 are shown for simplicity.

さて、このトラツクや番地をそなえたデイスク
基板の製法には種々のものがあるが、たとえば特
願昭59−51977に記載したようにガラス円板にレ
ジスト材を塗布し、ガイドトラツクや番地の入つ
たマスクを密着して、露光し、レジスト材を現像
後、ドライやウエツト等のエツチングでガラス円
板に直接トラツクや番地を溝やピツト形で形成す
る方法では、ガイドトラツクの中心とガラス円板
の中心穴の中心とをできるだけ一致させる必要が
ある。もしガイドトラツクとガラス円板の中心穴
との同心度が悪いと、第4図に示すように記録、
再生、消去時にガラス中心穴を回転軸4に固定
し、ガラス円板を回転させた時ガイドトラツク
が、記録、再生、消去用レーザ光5に対して大き
く振れまわるため、レンズの位置制御を行うトラ
ツクサーボが困難になつた。以上の点よりガイド
トラツク露光時にガイドトラツクとガラス円板中
心穴の同心度を精度よく(好ましくは20μm以内)
合わす必要がある。
Now, there are various methods of manufacturing disk substrates equipped with these tracks and addresses, but for example, as described in Japanese Patent Application No. 59-51977, a resist material is applied to a glass disk, and guide tracks and addresses are entered. In the method of directly forming tracks and addresses in the form of grooves and pits on the glass disk by dry or wet etching after exposing the resist material to light and developing the resist material, the center of the guide track and the glass disk are It is necessary to match the center of the center hole as much as possible. If the concentricity between the guide track and the center hole of the glass disc is poor, record it as shown in Figure 4.
During reproduction and erasing, the center hole of the glass is fixed to the rotating shaft 4, and when the glass disk is rotated, the guide track swings around greatly relative to the laser beam 5 for recording, reproduction, and erasing, so the position of the lens is controlled. Track servo has become difficult. From the above points, the concentricity of the guide track and the center hole of the glass disk should be maintained accurately (preferably within 20 μm) during guide track exposure.
It is necessary to match.

〈発明の目的〉 本発明はマスクを用いることによりガイドトラ
ツクや番地部をデイスク上に塗布されたレジスト
膜に転写する際にデイスク穴中心とトラツク中心
との一致を容易にするマスクを提供することを目
的とする。
<Object of the Invention> The present invention provides a mask that facilitates alignment of the center of a disk hole and the center of a track when transferring guide tracks and address areas to a resist film coated on a disk. With the goal.

〈発明の実施例〉 以下本発明に係る光メモリ素子製造用マスクの
実施例を図面を用いて詳細に説明する。
<Embodiments of the Invention> Examples of the mask for manufacturing an optical memory element according to the present invention will be described in detail below with reference to the drawings.

第1図は本発明に係る光デイスク基板用マスク
の一実施例の平面図である。本マスクはたとえば
石英ガラス円板上にCrやCrOの膜を形成し、第1
図に示すようなパターンが残るようにCrやCrOを
エツチングしてマスクを形成したものである。図
中の斜線部分はCrやCrOが残されている部分であ
る。aの領域が情報領域であり、この領域の一部
にトラツク3、番地2がらせん状もしくは同心円
状に形成されている。マスクの内部にはCrもし
くはCrOが除去された部分bがあり、そのbの領
域内に一ケ所位置決め用の基準マーカCを設けて
いる。この基準マーカCをマスクのガイドトラツ
ク記録時に同一記録装置を用いて記録しておけば
トラツク部との同心度は補償される。たとえばマ
ーカCの直径を第3図のガラスデイスクの中心穴
径とほゞ等しくしておくと、マスクによりガラス
デイスクにパターンを転写する際デイスク中心穴
とこのマーカCとを一致させることで容易にデイ
スク穴中心とトラツク中心とを一致し得る。
FIG. 1 is a plan view of an embodiment of a mask for an optical disk substrate according to the present invention. For example, this mask forms a film of Cr or CrO on a quartz glass disk, and
A mask is formed by etching Cr or CrO so that the pattern shown in the figure remains. The shaded area in the figure is the area where Cr and CrO remain. The area a is an information area, and a track 3 and an address 2 are formed in a spiral or concentric circle in a part of this area. Inside the mask, there is a portion b where Cr or CrO is removed, and a reference marker C for positioning is provided at one location within the region b. If this reference marker C is recorded using the same recording device when recording the mask guide track, the concentricity with the track portion can be compensated. For example, if the diameter of marker C is made approximately equal to the diameter of the center hole of the glass disk shown in Fig. 3, when a pattern is transferred to the glass disk using a mask, it will be easier to match the center hole of the disk with this marker C. The center of the disk hole and the center of the track can be aligned.

尚、マーカは必ずしも上記実施例に限らず、た
とえばマーカCを第2図のごとく2本設け、その
間隔をたとえば10〜20μmとし、その間にガラス
デイスクの中心穴が入るような径にしてもよい。
すなわちガラスデイスクの中心穴の径が15mmとす
るとマーカCの一本の直径は14.09mm、他の一本
の値径は15.01mmとすれば、ガラスデイスクの中
心穴との位置あわせが容易である。ここで通常ガ
ラスデイスクの中心穴は真円度が良いが直径は製
作工程により変化があるのでたとえば15±0.5mm
のように幅を持つことが多い。その時はマーカC
を複数個設け同心円を形成する様にその径を少し
ずつ変えておくと1板のマスクで、中心穴径の異
つたデイスクに対応でき便利である。また第1図
のcをはぶき、bの領域をせばめてbの部分をマ
ーカとすることも可能である。さらに上記実施例
においては斜線部分をCrやCrOの膜としたが、
Ni,Ti,Ta等他の金属膜でも良いことはもちろ
んである。
Incidentally, the markers are not necessarily limited to the above embodiments, and for example, two markers C may be provided as shown in FIG. 2, and the interval between them may be, for example, 10 to 20 μm, and the diameter may be such that the center hole of the glass disk can fit between them. .
In other words, if the diameter of the center hole of the glass disk is 15 mm, the diameter of one marker C is 14.09 mm, and the diameter of the other marker C is 15.01 mm, making it easy to align with the center hole of the glass disk. . Normally, the center hole of a glass disk has good roundness, but the diameter varies depending on the manufacturing process, so for example, 15 ± 0.5 mm.
It often has a width such as . At that time, marker C
By providing a plurality of disks and changing their diameters little by little so as to form concentric circles, one mask can conveniently accommodate disks with different center hole diameters. It is also possible to erase c in FIG. 1 and shorten the area b to use the part b as a marker. Furthermore, in the above example, the shaded area was made of Cr or CrO film, but
Of course, other metal films such as Ni, Ti, Ta, etc. may also be used.

〈発明の効果〉 以上のように、本発明のマスクを用いれば光デ
イスク基板のガイドトラツクと中心穴との同心度
を良くすることができ、情報の記録、再生、消去
時にガイドトラツクの振れまわりが少くなり、レ
ーザ光を集光する対物レンズのサーボが容易にな
る利点がある。
<Effects of the Invention> As described above, by using the mask of the present invention, the concentricity between the guide track and the center hole of the optical disk substrate can be improved, and the whirling of the guide track can be improved when recording, reproducing, or erasing information. This has the advantage that the servo of the objective lens that condenses the laser beam becomes easier.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る光デイスク用マスクの一
実施例の平面図、第2図は他の実施例の一部平面
図、第3図は光デイスクの斜視図、第4図は光デ
イスク装置の一部断面図を示す。 図中、1……基板、2……番地、3……トラツ
ク、4……回転軸、5……レーザ光。
FIG. 1 is a plan view of one embodiment of an optical disk mask according to the present invention, FIG. 2 is a partial plan view of another embodiment, FIG. 3 is a perspective view of an optical disk, and FIG. 4 is a plan view of an optical disk mask. A partial cross-sectional view of the device is shown. In the figure, 1...board, 2...address, 3...track, 4...rotation axis, 5...laser light.

Claims (1)

【特許請求の範囲】 1 中心穴を有するガラス円板にレジスト材を塗
布し、ガイドトラツク等のパターンが記録された
光デイスク基板用マスクを密着し、露光して現像
した後エツチングすることによつて、前記ガラス
円板に直接ガイドトラツク等を形成して光デイス
ク基板を得るための光デイスク基板用マスクにお
いて、 前記ガラス円板の中心穴と略々同半径であり、
かつ、前記ガイドトラツク等のパターンと同心の
マーカを有することを特徴とする光デイスク基板
用マスク。
[Scope of Claims] 1. A resist material is applied to a glass disk having a center hole, an optical disk substrate mask on which a pattern such as a guide track is recorded is closely attached, exposed to light, developed, and then etched. Accordingly, in a mask for an optical disk substrate for obtaining an optical disk substrate by forming a guide track or the like directly on the glass disk, the hole has approximately the same radius as the center hole of the glass disk;
A mask for an optical disk substrate, further comprising a marker concentric with a pattern such as the guide track.
JP19293785A 1985-08-30 1985-08-30 Mask for optical memory disk Granted JPS6252741A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP19293785A JPS6252741A (en) 1985-08-30 1985-08-30 Mask for optical memory disk
CA000516113A CA1298728C (en) 1985-08-30 1986-08-15 Optical memory element and manufacturing method thereof
DE3689593T DE3689593T2 (en) 1985-08-30 1986-08-29 Optical storage element and method of making the same.
DE8686306711T DE3682985D1 (en) 1985-08-30 1986-08-29 METHOD FOR PRODUCING AN OPTICAL DIRECTORY.
EP19860306711 EP0214824B1 (en) 1985-08-30 1986-08-29 Manufacturing method for an optical memory element
EP90203177A EP0434114B1 (en) 1985-08-30 1986-08-29 Optical memory element and manufacturing method thereof
US07/229,753 US4925776A (en) 1985-08-30 1988-08-08 Optical memory element and manufacturing method thereof
US08/074,272 US5470694A (en) 1985-08-30 1993-06-10 Optical memory element and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19293785A JPS6252741A (en) 1985-08-30 1985-08-30 Mask for optical memory disk

Publications (2)

Publication Number Publication Date
JPS6252741A JPS6252741A (en) 1987-03-07
JPH0447912B2 true JPH0447912B2 (en) 1992-08-05

Family

ID=42116049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19293785A Granted JPS6252741A (en) 1985-08-30 1985-08-30 Mask for optical memory disk

Country Status (2)

Country Link
JP (1) JPS6252741A (en)
CA (1) CA1298728C (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814336A (en) * 1981-07-20 1983-01-27 Toshiba Corp Information storage medium and its production

Also Published As

Publication number Publication date
JPS6252741A (en) 1987-03-07
CA1298728C (en) 1992-04-14

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