JPH0448449A - Production of magneto-optical disk - Google Patents

Production of magneto-optical disk

Info

Publication number
JPH0448449A
JPH0448449A JP15614990A JP15614990A JPH0448449A JP H0448449 A JPH0448449 A JP H0448449A JP 15614990 A JP15614990 A JP 15614990A JP 15614990 A JP15614990 A JP 15614990A JP H0448449 A JPH0448449 A JP H0448449A
Authority
JP
Japan
Prior art keywords
target
magnetic field
film
recording film
magneto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15614990A
Other languages
Japanese (ja)
Inventor
Masami Tsutsumi
正己 堤
Yoshiyuki Nanba
義幸 難波
Akira Shioda
明 潮田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15614990A priority Critical patent/JPH0448449A/en
Publication of JPH0448449A publication Critical patent/JPH0448449A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve recording sensitivity by using plural electromagnets to constitute a magnet to apply a magnetic field on a target, and controlling the current in the electromagnets by on-off control or at a specified value so as to control the intensity of the magnetic field and the columnar degree of grains in the recording film. CONSTITUTION:A target 31 is a disk type, to which plural numbers of electromagnets 32 are disposed in the center and along concentrical circles. This target 31 is disposed in a sputtering chamber 33, as two kinds of targets, one for formation of a recording film and the other for formation of a protective film. A film containing column-like grains and a film containing no column- like grains can be formed by controlling the current applied on these electromagnets to specified value. Thereby, a magneto-optical recording medium having a four-layer structure comprising a protective film 47, recording film 48 containing no column-like grains, recording film 49 comprising column-like grains, and protective film cane easily obtained in a simplified process without increasing the number of targets. The obtd. recording medium has higher sensitivity.

Description

【発明の詳細な説明】 〔概 要〕 光磁気記録媒体の製造方法に関し、 データの転送速度を向上させるために、光磁気ディスク
を高速回転させても、小さいレーザパワーで記録できる
ような記録感度の向上した光磁気記録媒体の製造方法を
目的とし、 磁場を印加させる磁石を備えたターゲットと、基板とを
真空容器内で対向配置し、該容器内にスパッタガスを導
入し、マグネトロンスパッタ方法で前記基板上に希土類
−遷移金属アモルファス合金を記録膜とする光磁気記録
媒体を製造する方法に於いて、 前記ターゲットに磁場を印加させる磁石を、複数の電磁
石で構成し、該複数の電磁石に印加する電流をオンオフ
、或いは所定の値に制御することで磁場の強さを制御し
、前記記録膜の柱状化度を制御するようにして構成する
[Detailed Description of the Invention] [Summary] Regarding a method of manufacturing a magneto-optical recording medium, in order to improve the data transfer speed, the recording sensitivity is such that even when the magneto-optical disk is rotated at high speed, it can be recorded with a small laser power. A target equipped with a magnet for applying a magnetic field and a substrate are placed facing each other in a vacuum container, a sputtering gas is introduced into the container, and a magnetron sputtering method is provided. In the method for manufacturing a magneto-optical recording medium having a rare earth-transition metal amorphous alloy as a recording film on the substrate, the magnet for applying a magnetic field to the target is composed of a plurality of electromagnets, and the magnetic field is applied to the plurality of electromagnets. The strength of the magnetic field is controlled by turning the current on and off or controlling it to a predetermined value, thereby controlling the degree of columnarization of the recording film.

〔産業上の利用分野] 本発明は光磁気記録媒体の製造方法に関する。[Industrial application field] The present invention relates to a method for manufacturing a magneto-optical recording medium.

光磁気ディスク装置に於いては、メモリとしての応用分
野を拡大するために、データの転送速度を向上させるこ
とが望まれる。
In magneto-optical disk devices, it is desired to improve the data transfer speed in order to expand the field of application as memory.

このため、光磁気ディスクを高速回転させても小さいレ
ーザパワーで記録することができるように、光磁気ディ
スク媒体自体の記録感度を向上させることが望まれる。
Therefore, it is desired to improve the recording sensitivity of the magneto-optical disk medium itself so that recording can be performed with a small laser power even when the magneto-optical disk is rotated at high speed.

またこの光磁気記録媒体を容易に製造する方法も望まれ
ている。
A method for easily manufacturing this magneto-optical recording medium is also desired.

〔従来の技術〕[Conventional technology]

従来より光磁気ディスクの磁性膜としては一般に、希土
類−遷移金属アモルファス合金薄膜が使用されている。
Conventionally, rare earth-transition metal amorphous alloy thin films have generally been used as magnetic films for magneto-optical disks.

この希土類元素としてはテルビウム(Tb)、ジスプロ
シウム(Dy)、ガドリニウム(Gd)、ホルミウム(
no)等が用いられ、遷移金属元素には鉄(Fe)、コ
バルト(Co)等が用いられ、テルビウム・鉄・コバル
ト(TbFeCo)や、ジスプロシウム・鉄・コバルト
(DyFeCo)等のアモルファス合金薄膜を形成して
いる。
These rare earth elements include terbium (Tb), dysprosium (Dy), gadolinium (Gd), and holmium (
Iron (Fe), cobalt (Co), etc. are used as transition metal elements, and amorphous alloy thin films such as terbium-iron-cobalt (TbFeCo) and dysprosium-iron-cobalt (DyFeCo) are used. is forming.

ところで上記希土類−遷移金属アモルファス合金の光磁
気記録媒体を有する光磁気ディスクを、3600rpm
の高速回転で回転させて光磁気記録させるためには、1
5■賀の極めて大きい書き込みレーザパワーを必要とす
る。
By the way, the magneto-optical disk having the magneto-optical recording medium of the rare earth-transition metal amorphous alloy was heated at 3600 rpm.
In order to perform magneto-optical recording by rotating at a high speed of 1.
It requires an extremely high writing laser power of 5 sec.

然し、このような大出力のレーザパワーを半導体レーザ
装置で得ようとするのは困難である。また大出力のレー
ザパワーが得られるヘリウム−ネオン(He−Ne) 
 レーザ光源を用いると、装置が大型化するとともに消
費電力が大となり、形成される磁気記録媒体も高価なも
のとなる。
However, it is difficult to obtain such a large laser power with a semiconductor laser device. Helium-neon (He-Ne) also provides high laser power.
If a laser light source is used, the device becomes larger and consumes more power, and the magnetic recording medium that is formed also becomes more expensive.

従来、高い信号品質と高感度を兼ね備えた光磁気ディス
クの記録媒体として、基板/保護膜/非柱状化記録膜/
柱状化記録膜/保護膜の四層構造の記録媒体を本出願人
は以前に提案している。
Conventionally, magneto-optical disk recording media that combine high signal quality and high sensitivity have been made up of substrates, protective films, non-columnar recording films,
The present applicant has previously proposed a recording medium having a four-layer structure of a columnar recording film/protective film.

この柱状化記録膜の構造を模式的に第8図に示す。図示
するように典型的な柱状構造の記録膜1は、記録面2に
対して垂直方向に軸を有する微細な柱状体(コラム)3
が集合して構成されている。
The structure of this columnar recording film is schematically shown in FIG. As shown in the figure, a recording film 1 having a typical columnar structure consists of fine columnar bodies (columns) 3 having an axis perpendicular to a recording surface 2.
is composed of a collection of

そして各柱状体3の間には該柱状体3同士が接触してい
ない間隙4が形成されている。このような柱状化記録膜
は走査型電子顕微鏡により観察される。
A gap 4 is formed between each columnar body 3 in which the columnar bodies 3 are not in contact with each other. Such a columnar recording film is observed using a scanning electron microscope.

このような柱状化記録膜を設けることで、この柱状化記
録膜の間隙4が熱伝導が悪いために、熱を横方向に伝達
し難く、記録時のレーザ光を効率良く熱エネルギーに変
換することができ、記録膜の温度を効率良く上昇させる
ことによって記録感度を上昇させることができる。
By providing such a columnar recording film, since the gaps 4 of the columnar recording film have poor thermal conductivity, it is difficult to transfer heat laterally, and laser light during recording is efficiently converted into thermal energy. By efficiently increasing the temperature of the recording film, the recording sensitivity can be increased.

また上記柱状化記録膜上に非柱状化記録膜を積層するこ
とで、柱状化記録膜と非柱状化記録膜との境界面でレー
ザ光の多重反射を起こさせ、書き込み効率を向上させ、
書き込んだ記録の信号品質を高めることができる。
Furthermore, by laminating a non-columnar recording film on the columnar recording film, multiple reflections of the laser beam occur at the interface between the columnar recording film and the non-columnar recording film, thereby improving writing efficiency.
The signal quality of written records can be improved.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところで、上記四層構造の記録膜を形成するには、例え
ば基板/保護膜/柱状化記録膜/保護膜、或いは基板/
保護膜/非柱状化記録膜/保護膜の三層構造記録膜を形
成する場合に比較してスパッタ用のターゲットが、更に
余分に1つ必要となり、また記録膜の製造工程が1つ増
加することによってその分だけ、余分に時間が掛り、形
成される光磁気記録媒体のコストが大になる問題がある
By the way, in order to form a recording film having the above-mentioned four-layer structure, for example, a combination of substrate/protective film/columnar recording film/protective film or substrate/protective film is required.
Compared to the case of forming a three-layer recording film of a protective film/non-columnized recording film/protective film, one additional target for sputtering is required, and one additional recording film manufacturing process is required. This poses a problem in that it takes extra time and increases the cost of the magneto-optical recording medium to be formed.

また通常、一般に用いられているマグネトロンスパッタ
装置の構造は第6図に示すように、容器11内に基板1
2とターゲット13とを対向配置させ、このターゲット
は、該ターゲットの下部に設けられた永久磁石14A、
14Bによってに磁界を付与されている。そして第7図
に示すようにこの永久磁石の構造は中心部の永久磁石1
4Aとその周囲に同心円状に配置された永久磁石14B
とで構成される。
Further, the structure of a commonly used magnetron sputtering apparatus is as shown in FIG.
2 and a target 13 are arranged opposite to each other, and this target has a permanent magnet 14A provided at the lower part of the target,
A magnetic field is applied by 14B. As shown in Figure 7, the structure of this permanent magnet is that the permanent magnet 1 in the center is
4A and a permanent magnet 14B arranged concentrically around it.
It consists of

そしてこれらのターゲットは保護膜形成用ターゲット、
柱状化記録膜形成用ターゲット、非柱状化記録膜形成用
ターゲットと3種類、円周状に配置され、このターゲッ
トと基板の間に開口部を有するシャッターが配置され、
基板が該複数のターゲットを配置した円周上を回転し、
基板が回転して所定のターゲット上に移動すると、シャ
ーターが開いて基板とターゲット間に高電圧が印加され
てターゲットの成分を基板上に被着するようにしている
These targets are targets for forming a protective film,
Three types of targets, a target for forming a columnar recording film and a target for forming a non-columnar recording film, are arranged in a circumferential manner, and a shutter having an opening is arranged between the target and the substrate,
The substrate rotates on a circumference on which the plurality of targets are arranged,
When the substrate is rotated and moved onto a predetermined target, the shutter opens and a high voltage is applied between the substrate and the target to deposit components of the target onto the substrate.

ところで従来の永久磁石を用いたターゲットでは、エロ
ージョン領域(ターゲットがスパッタ中に最も多く使用
されて削られる領域)が限定されるため、ターゲットの
全領域を有効に使用できない問題がある。
However, in conventional targets using permanent magnets, the erosion area (the area where the target is most often used and scraped during sputtering) is limited, so there is a problem that the entire area of the target cannot be used effectively.

本発明は上記した問題点を解決し、記録膜の積層数が増
加してもターゲットの増加を必要とせず、かつエロージ
ョン領域が限定されない光磁気記録媒体の製造方法の提
供を目的とする。
The present invention solves the above-mentioned problems, and aims to provide a method for manufacturing a magneto-optical recording medium that does not require an increase in the number of targets even when the number of stacked recording films increases, and in which the erosion area is not limited.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成する本発明の光磁気記録媒体の製造方法
は、磁界を発生させる磁石を備えたターゲットと、基板
とを真空容器内で対向配置し、該容器内にスパッタガス
を導入し、マグネトロンスパッタ方法で前記基板上に希
土類−遷移金属アモルファス合金を記録膜とする光磁気
記録媒体を製造する方法に於いて、 前記ターゲットに磁界を発生させる磁石を、複数の電磁
石で構成し、該複数の!磁石に印加する電流をオンオフ
、或いは所定の値に制御することで磁場の強さを制御し
、前記記録膜の柱状化度を制御するようにする。更に前
記磁界発生用の複数のNvL石を、ターゲットに対して
同心円状に配置し、前記電磁石に電流を印加することで
前記ターゲットに対向する同心円に沿って部分的に磁場
が発生するようにする。
A method for manufacturing a magneto-optical recording medium of the present invention that achieves the above object includes arranging a target equipped with a magnet that generates a magnetic field and a substrate facing each other in a vacuum container, introducing sputtering gas into the container, and In the method for manufacturing a magneto-optical recording medium using a rare earth-transition metal amorphous alloy as a recording film on the substrate by a sputtering method, the magnet for generating a magnetic field in the target is composed of a plurality of electromagnets, ! The strength of the magnetic field is controlled by turning on and off the current applied to the magnet or controlling it to a predetermined value, thereby controlling the degree of columnarization of the recording film. Furthermore, a plurality of NvL stones for generating the magnetic field are arranged concentrically with respect to the target, and a magnetic field is partially generated along the concentric circle facing the target by applying a current to the electromagnet. .

〔作 用〕[For production]

一般にターゲットに印加する磁場の大きさが大きく成る
程、記録膜の柱状化度が小となる傾向があり、ターゲッ
トに印加する磁場の大きさが小さくなる程、柱状化度が
大となる傾向がある。
Generally, as the magnitude of the magnetic field applied to the target increases, the degree of columnarization of the recording film tends to decrease, and as the magnitude of the magnetic field applied to the target decreases, the degree of columnarization tends to increase. be.

またスパッタガスのガス圧が大に成る程、柱状化度が大
となり、またスパッタガス圧が小に成る程、柱状化度が
小となる。
Further, as the gas pressure of the sputtering gas increases, the degree of columnarization increases, and as the sputtering gas pressure decreases, the degree of columnarization decreases.

そのため、従来の方法では非柱状化記録膜と柱状化記録
膜を形成する場合、同一成分のターゲットを2個設け、
一方のターゲットに印加する磁場の強さを大きくして非
柱状化記録膜を形成し、他方のターゲットに印加する磁
場の強さを小さくして柱状化記録膜を形成している。
Therefore, in the conventional method, when forming a non-columnar recording film and a columnar recording film, two targets of the same composition are provided, and
A non-columnar recording film is formed by increasing the strength of the magnetic field applied to one target, and a columnar recording film is formed by decreasing the strength of the magnetic field applied to the other target.

第5図はマグネトロン磁場と光磁気記録媒体の感度との
関係図で、図の横軸は成膜する際のマグネトロンの磁場
の強さを示し、縦軸はビットの書き込みを開始するレー
ザパワーの出力を示す。
Figure 5 is a diagram showing the relationship between the magnetron magnetic field and the sensitivity of the magneto-optical recording medium. Show the output.

図の曲線21に示すようにスパッタ成膜する際の磁場が
2000e以下となると書き込みレーザパワーの出力が
低下していることが判る。このことはスパッタ成膜する
際の磁場の強さが弱い程、記録膜の柱状化度が進行し、
小さいレーザパワーでビットの書き込みを開始できる。
As shown by curve 21 in the figure, it can be seen that when the magnetic field during sputter film formation becomes 2000 e or less, the output of the writing laser power decreases. This means that the weaker the magnetic field strength during sputtering film formation, the more columnar the recording film becomes.
Bit writing can be started with low laser power.

このことより、本発明では非柱状化記録膜、および柱状
化記録膜を形成するターゲットを複数の電磁石を備えた
共通のターゲットとし、前記ターゲットに印加する磁場
の強さを、複数の電磁石に印加する電流の強さを制御す
ることで、或いは複数の11N石に印加する電流をオン
オフすることで、スパッタ成膜される記録膜の柱状化度
を制御することができる。
Therefore, in the present invention, the target for forming the non-columnar recording film and the columnar recording film is a common target equipped with a plurality of electromagnets, and the strength of the magnetic field applied to the target is applied to the plurality of electromagnets. The degree of columnarization of the recording film formed by sputtering can be controlled by controlling the strength of the current applied or by turning on and off the current applied to the plurality of 11N stones.

また上記ターゲットに磁界を付与する複数の電磁石の電
流値を制御することで、或いは電流値をオンオフするこ
とで、エロージョン領域を所望の領域に制御できるよう
になる。
Further, by controlling the current value of the plurality of electromagnets that apply a magnetic field to the target, or by turning the current value on and off, the erosion region can be controlled to a desired region.

このようにしてターゲットに印加する電流値を制御する
ことで、共通の1個のターゲットで非柱状化記録膜と柱
状化記録膜が形成でき、ターゲットの必要個数が少なく
成り、また非柱状化記録膜形成用ターゲットと柱状化記
録膜形成用ターゲットの2種類のターゲット上に基板を
移動させる必要が無(なるので、記録膜を形成する時間
も短縮できる。
By controlling the current value applied to the target in this way, it is possible to form a non-columnar recording film and a columnar recording film with one common target, which reduces the number of targets required, and also allows for non-columnar recording. There is no need to move the substrate onto two types of targets: a film forming target and a columnar recording film forming target, so the time for forming the recording film can also be shortened.

またターゲットの電磁石に印加する電流を制御すること
で、エロージ式ン領域を適当な範囲に制御できるので、
ターゲットの使用回数が増大するのでスパッタに要する
コストが低下する。
In addition, by controlling the current applied to the target electromagnet, the erosion area can be controlled within an appropriate range.
Since the number of times the target is used increases, the cost required for sputtering decreases.

〔実 施 例〕〔Example〕

以下、図面を用いて本発明の一実施例につき詳細に説明
する。
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第1図は本発明の方法に用いる装置の模式図で、第2図
は本発明の方法に用いるターゲットの模式図で、該ター
ゲットを裏面側より見た平面図である。
FIG. 1 is a schematic diagram of an apparatus used in the method of the present invention, and FIG. 2 is a schematic diagram of a target used in the method of the present invention, which is a plan view of the target viewed from the back side.

第1図、および第2図に示すように本発明の方法に用い
るターゲット31は円板状で、この円板状のターゲット
の中心、および該ターゲットの同心円に沿って複数の電
磁石32を配設する。そしてこのターゲット31をスパ
ッタ容器33内に保護膜形成用ターゲットと、記録膜形
成用ターゲットの二種類のターゲットを設置し、柱状化
記録膜と非柱状化記録膜は前記記録膜形成用ターゲット
の電磁石に印加する電流値を所定の値に制御することで
形成する。
As shown in FIGS. 1 and 2, a target 31 used in the method of the present invention is disc-shaped, and a plurality of electromagnets 32 are arranged at the center of this disc-shaped target and along concentric circles of the target. do. Two types of targets, a protective film forming target and a recording film forming target, are installed in the sputtering container 33, and the columnar recording film and the non-columnar recording film are connected to the electromagnet of the recording film forming target. It is formed by controlling the current value applied to a predetermined value.

本発明の方法に於いては第1図に示すような電磁石を備
えたRF型マグネトロンスパッタ装置を用いたが、この
装置はDCスパッタ装置に於いても適用できる。
In the method of the present invention, an RF type magnetron sputtering apparatus equipped with an electromagnet as shown in FIG. 1 was used, but this apparatus can also be applied to a DC sputtering apparatus.

このような本発明の方法を用いて光磁気ディスクを形成
する場合について述べる。
The case where a magneto-optical disk is formed using such a method of the present invention will be described.

第3図、および第4図に示すように、スパッタ容器33
内に基板41と保護膜形成用ターゲット42と記録膜形
成用ターゲット43とを対向して設置し、該基板と両者
のターゲット間にシャッター44を配置する。次いで排
気管45に連なる排気ポンプ(図示せず)を用いて容器
内を高真空に排気した後、ガス供給管46よりArガス
を容器内の圧力が1.8Paと成る迄供給すする。
As shown in FIGS. 3 and 4, the sputtering container 33
A substrate 41, a protective film forming target 42, and a recording film forming target 43 are placed facing each other in the inside, and a shutter 44 is placed between the substrate and both targets. Next, the inside of the container is evacuated to a high vacuum using an exhaust pump (not shown) connected to the exhaust pipe 45, and then Ar gas is supplied from the gas supply pipe 46 until the pressure inside the container reaches 1.8 Pa.

次いで基板41を回転させて保護膜形成用ターゲット4
2の直上に移動させ、シャッター44を開いて基板とタ
ーゲット間に高周波電圧を印加し、ターゲットに電磁石
32によって磁界を形成しながら基板上に厚さが90n
mのテルビウム−二酸化珪素(TbSiO□)膜よりな
る保護膜47を形成する。上記電磁石32の内側と外側
の電磁石の磁場の大きさを調節することでエロージッン
領域が所望の範囲に拡大し、保護膜形成用ターゲットが
多数回のスパッタでも部分的に削られることが無くなり
、有効に長時間使用できる。
Next, the substrate 41 is rotated to form a protective film formation target 4.
2, open the shutter 44 and apply a high frequency voltage between the substrate and the target, and while forming a magnetic field on the target with the electromagnet 32, a 90 nm thick film is placed on the substrate.
A protective film 47 made of a terbium-silicon dioxide (TbSiO□) film is formed. By adjusting the magnitude of the magnetic fields of the inner and outer electromagnets of the electromagnet 32, the erosion region can be expanded to a desired range, and the target for forming a protective film will not be partially scraped even after multiple sputtering operations, making it effective. Can be used for a long time.

更に基板41を回転させて記録膜形成用ターゲット43
の直上に移動させ、シャッター44を開いて基板と記録
膜形成用ターゲット間に高周波電圧を印加し、記録膜形
成用ターゲットに!磁石32によって磁界を10000
 e以上の強磁界とし、更にスパッタガス圧を0.2P
aと低下した状態で基板上に厚さがIonsのテルビウ
ム−鉄−コパルl−(TbFeCo)の非柱状化記録膜
48を形成する。
Further, the substrate 41 is rotated to form a target 43 for forming a recording film.
, and open the shutter 44 to apply a high frequency voltage between the substrate and the target for forming a recording film. Magnet 32 generates a magnetic field of 10,000
The magnetic field is stronger than e, and the sputtering gas pressure is 0.2P.
A non-columnarized recording film 48 of terbium-iron-copal l-(TbFeCo) having a thickness of Ions is formed on the substrate in a state where the thickness is reduced to a.

更に基板41はそのままの状態で移動させずに、記録膜
形成用ターゲット43に磁場を印加する電磁石32の磁
場を1000eの弱い磁場とし、かつスパッタガス圧を
1.8Paと増加させて基板上に厚さが80n−の柱状
化記録膜49を形成する。
Furthermore, without moving the substrate 41 as it is, the magnetic field of the electromagnet 32 that applies a magnetic field to the target 43 for forming a recording film is set to a weak magnetic field of 1000 e, and the sputtering gas pressure is increased to 1.8 Pa, and the sputtering gas is sputtered onto the substrate. A columnar recording film 49 having a thickness of 80 nm is formed.

このようにすれば、基板を回転移動することなく、かつ
1個のターゲットで記録膜形成用ターゲットに磁場を印
加する電磁石に流す電流の強さを制御して、ターゲット
に印加する磁場の強さを制御することで、柱状化記録膜
と非柱状化記録膜の両方の記録膜が、容易に形成できる
In this way, the strength of the magnetic field applied to the target can be adjusted by controlling the strength of the current flowing through the electromagnet that applies the magnetic field to the recording film forming target using one target without rotating the substrate. By controlling the above, both a columnar recording film and a non-columnar recording film can be easily formed.

次いで基板41を回転させて保護膜形成用ターゲット4
2の直上に移動させ、シャッター44を開いて基板とタ
ーゲット間に高周波電圧を印加し、ターゲットに電磁石
32によって磁界を形成しながら基板上に厚さが9On
−のテルビウム−二酸化珪素(TbSiO□)膜よりな
る保護膜47を形成する。
Next, the substrate 41 is rotated to form a protective film formation target 4.
2, open the shutter 44 and apply a high frequency voltage between the substrate and the target, and while forming a magnetic field on the target by the electromagnet 32, a 9 On-thick film is placed on the substrate.
A protective film 47 made of a terbium-silicon dioxide (TbSiO□) film is formed.

このように非柱状化記録膜/柱状化記録膜を成膜するの
に、同一のターゲットを用いて行い、Arガス圧、11
M1石の大きさを瞬時に変えることにより、連続して成
膜できるようになる。
In this way, the same target was used to form the non-columnarized recording film/columnarized recording film, and the Ar gas pressure was set to 11
By instantaneously changing the size of the M1 stones, continuous film formation becomes possible.

またターゲットに磁場を付与する磁石を、従来、使用し
ていた永久磁石からMTa石に置き代えることにより、
ターゲットの数を1つ減らすことができ、かつスパッタ
時間を通常の50分(保護膜の成膜時間も含む)から4
0分に短縮することができる。
In addition, by replacing the conventionally used permanent magnet with MTa stone as the magnet that applies the magnetic field to the target,
The number of targets can be reduced by one, and the sputtering time is reduced from the usual 50 minutes (including the time for forming the protective film) to 4 minutes.
It can be shortened to 0 minutes.

更に電磁石に流れる電流値を制御したり、または電磁石
の個数を切り換えることで、エロージョン領域を変える
ことができるため、通常の永久磁石のスパッタ装置では
1つのターゲットで1200枚の光磁気ディスクしか作
成出来なかったが、本発明の電磁石を用いた装置により
2倍の2300枚の光磁気ディスクの製造ができるよう
に成った。
Furthermore, the erosion area can be changed by controlling the current value flowing through the electromagnets or by switching the number of electromagnets, so a normal permanent magnet sputtering device can only produce 1,200 magneto-optical disks with one target. However, with the device using the electromagnet of the present invention, it has become possible to manufacture twice as many 2,300 magneto-optical disks.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように本発明によれば、保護膜
、非柱状化記録膜、柱状化記録膜、非柱状化記録膜の四
層構造の光磁気記録媒体がターゲットの数量を増加する
ことなく、かつ製造工程を短縮した状態で容易に得られ
る。
As is clear from the above description, according to the present invention, a magneto-optical recording medium having a four-layer structure of a protective film, a non-columnar recording film, a columnar recording film, and a non-columnar recording film can increase the number of targets. It can be easily obtained with a shortened manufacturing process.

またターゲットに印加する磁場を電磁石に印加する電流
の強さを変えることで制御できるので、エロージョン領
域が所望の範囲に制御でき、ターゲットの使用効率が増
加するのでターゲットの消費量が少なくて済み、スパッ
タに要するコストが低下する効果がある。
In addition, since the magnetic field applied to the target can be controlled by changing the strength of the current applied to the electromagnet, the erosion area can be controlled within the desired range, increasing target usage efficiency and reducing target consumption. This has the effect of reducing the cost required for sputtering.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法を示す模式図、 第2図は本発明の方法に用いるターゲットの模式図、 第3図は本発明の方法で形成した光磁気ディスクの断面
図、 第4図は本発明の方法の一実施例を示す模式図、第5図
はマグネトロンの磁場と光磁気記録媒体の感度との関係
図、 第6図は従来の方法に用いる装置の模式図、第7図は従
来の方法に用いるターゲットの模式第8図は柱状化記録
膜の模式図である。 図において、 31はターゲット、32は電磁石、33はスパッタ容器
、41は基板、42は保護膜形成用ターゲット、43は
記録膜形成用ターゲット、44はシャッター、45は排
気管、46はガス供給管、47は保護膜、48は非$4
ey4 p ’Ink 7 ノiFX 咋1 硫1f”
a7q Q arA第3− 不発所6方法ε末T項式H 第te1 7!t4s2;5’t+:rfl=s 1−’y;I−
−jl(rXJ(4utノ 従来、眉盪l−,FfI、・3(ト隷人図第611 6を輩^方汁h4・シフーゲ:/トt)更式乙り第 7
 図
FIG. 1 is a schematic diagram showing the method of the present invention, FIG. 2 is a schematic diagram of a target used in the method of the present invention, FIG. 3 is a cross-sectional view of a magneto-optical disk formed by the method of the present invention, and FIG. 4 is a schematic diagram showing the method of the present invention. A schematic diagram showing an embodiment of the method of the present invention, FIG. 5 is a diagram of the relationship between the magnetic field of the magnetron and the sensitivity of the magneto-optical recording medium, FIG. 6 is a schematic diagram of the apparatus used in the conventional method, and FIG. A schematic diagram of a target used in the conventional method. FIG. 8 is a schematic diagram of a columnar recording film. In the figure, 31 is a target, 32 is an electromagnet, 33 is a sputtering container, 41 is a substrate, 42 is a target for forming a protective film, 43 is a target for forming a recording film, 44 is a shutter, 45 is an exhaust pipe, and 46 is a gas supply pipe. , 47 is a protective film, 48 is a non-$4
ey4 p 'Ink 7 no iFX 1 sulfur 1f'
a7q Q arA 3rd - misfire site 6 method ε end T term formula H th te1 7! t4s2;5't+:rfl=s 1-'y;I-
-jl (rXJ (4utノconventional, eyebrows l-, FfI, ・3 (Toreijinzu no. 611 6 ^ side soup h4・shifuuge:/tot) Sarashiki Otori No. 7
figure

Claims (2)

【特許請求の範囲】[Claims] (1) 磁場を印加する磁石を備えたターゲット(31
,42,43)と、基板(41)とを真空容器(33)
内で対向配置し、該容器内にスパッタガスを導入し、マ
グネトロンスパッタ方法で前記基板上に希土類−遷移金
属アモルファス合金を記録膜とする光磁気記録媒体を製
造する方法に於いて、 前記ターゲット(31,42,43)に磁場を印加する
磁石を、複数の電磁石(32)で構成し、該複数の電磁
石に印加する電流をオンオフ、或いは所定の値に制御す
ることでターゲットに印加する磁場の強さを制御して前
記記録膜の柱状化度を制御するようにしたことを特徴と
する光磁気記録媒体の製造方法。
(1) Target equipped with a magnet that applies a magnetic field (31
, 42, 43) and the substrate (41) in a vacuum container (33).
In a method for manufacturing a magneto-optical recording medium having a rare earth-transition metal amorphous alloy as a recording film on the substrate by a magnetron sputtering method, the targets ( 31, 42, 43) is composed of a plurality of electromagnets (32), and the magnetic field applied to the target can be controlled by turning on/off the current applied to the plurality of electromagnets or controlling it to a predetermined value. A method for producing a magneto-optical recording medium, characterized in that the degree of columnarization of the recording film is controlled by controlling the strength.
(2) 前記磁場印加用の複数の電磁石(32)を、タ
ーゲット(31,42,43)の裏面側に同心円状に対
向配置し、前記電磁石(32)に電流を印加することで
前記ターゲットに同心円状に磁場が発生するようにした
ことを特徴とする請求項(1)記載の光磁気記録媒体の
製造方法。
(2) A plurality of electromagnets (32) for applying the magnetic field are arranged concentrically opposite to each other on the back side of the target (31, 42, 43), and a current is applied to the electromagnet (32) to apply the magnetic field to the target. 2. The method of manufacturing a magneto-optical recording medium according to claim 1, wherein the magnetic field is generated concentrically.
JP15614990A 1990-06-13 1990-06-13 Production of magneto-optical disk Pending JPH0448449A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15614990A JPH0448449A (en) 1990-06-13 1990-06-13 Production of magneto-optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15614990A JPH0448449A (en) 1990-06-13 1990-06-13 Production of magneto-optical disk

Publications (1)

Publication Number Publication Date
JPH0448449A true JPH0448449A (en) 1992-02-18

Family

ID=15621412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15614990A Pending JPH0448449A (en) 1990-06-13 1990-06-13 Production of magneto-optical disk

Country Status (1)

Country Link
JP (1) JPH0448449A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003046905A1 (en) * 2001-11-29 2003-06-05 Matsushita Electric Industrial Co., Ltd. Magneto-optical recording medium and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003046905A1 (en) * 2001-11-29 2003-06-05 Matsushita Electric Industrial Co., Ltd. Magneto-optical recording medium and manufacturing method thereof
US7180831B2 (en) 2001-11-29 2007-02-20 Matsushita Electric Industrial Co., Ltd. Magneto-optical recording medium having a recording layer of columnar structure

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