JPH0448516B2 - - Google Patents
Info
- Publication number
- JPH0448516B2 JPH0448516B2 JP63033942A JP3394288A JPH0448516B2 JP H0448516 B2 JPH0448516 B2 JP H0448516B2 JP 63033942 A JP63033942 A JP 63033942A JP 3394288 A JP3394288 A JP 3394288A JP H0448516 B2 JPH0448516 B2 JP H0448516B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- processing
- precision
- tank
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
【発明の詳細な説明】
<産業上の利用分野>
開示技術は、精密機器の光学機械等に用いるプ
ラスチツク製のレンズやガラス等精密機器の仕上
げ洗浄や精密機器を硬化処理するコーテイングを
付与する等の液処理技術分野に属する。[Detailed Description of the Invention] <Industrial Application Fields> The disclosed technology is applicable to finishing cleaning of precision instruments such as plastic lenses and glasses used in precision instruments such as optical machines, and applying coatings for hardening of precision instruments. belongs to the field of liquid processing technology.
<要旨の概要>
而して、この発明は光学装置等に用いるガラス
やプラスチツクのレンズ等を硬化処理するに液処
理槽に浸漬させた後上部の温暖ガス中に引き上げ
して速やかに乾燥させ、所定の次段処理工程に搬
送したり、純水による仕上げ洗浄を行うようにす
る精密機器の液処理方法に関する発明であり、特
に、上記液処理槽内に於ける処理液を液処理槽の
一側側から他側側へかけて上下部の流速を同速度
にして側方で複段に整流して層流状に側流させ、
加温状態で循環濾過したりするようにした精密機
器の液処理方法に係る発明である。<Summary of the gist> Therefore, this invention cures glass or plastic lenses used in optical devices, etc. by immersing them in a liquid treatment tank and then lifting them into warm gas at the top to quickly dry them. This invention relates to a liquid processing method for precision equipment in which the processing liquid is transported to a predetermined next processing step or subjected to final cleaning with pure water, and in particular, the processing liquid in the liquid processing tank is transferred to one of the liquid processing tanks. The upper and lower flow velocities are set at the same speed from one side to the other, and the flow is rectified in multiple stages on the side to create a laminar side flow.
This invention relates to a liquid processing method for precision equipment that performs circulation filtration in a heated state.
<従来の技術>
周知の如く、市民生活や産業社会が隆盛になつ
てくる近時においては近代科学に負うところが極
めて大であり、特に、各種の情報機器によるとこ
ろが甚だしく大である。<Prior Art> As is well known, in recent years, when civil life and industrial society have become more prosperous, we owe an extremely large amount to modern science, and in particular, we owe an extremely large amount to various information devices.
而して、当然のことながら、かかる情報機器は
所謂IC部品や電子光学機器の組合せによつて高
度に精密にされており、したがつて、該種IC部
品や光学部品等の精密機器は超精密の仕上がり精
度が厳しく要求され、ミクロン単位は勿論のこ
と、近時はサブミクロン単位の清浄度が要求され
るようになつてきている。 Naturally, such information equipment is highly precise due to the combination of so-called IC parts and electro-optical equipment, and therefore, such precision equipment such as IC parts and optical parts are extremely precise. Precision finishing accuracy is strictly required, and cleanliness not only on the micron level but also on the submicron level has recently become required.
したがつて、かかる精密機器の製造工程にあつ
ては、最終仕上がり工程において各種の薬液によ
る洗浄後に純水による仕上げ洗浄を行つたり、プ
ラスチツクスやガラス等の光学製品には使用やメ
ンテナンス時の傷付きを防止し光透過性を良好に
するべく硬化処理のためのコーテイング付与工程
等があり、これらはほとんどの場合液処理による
浸漬、及び、該浸漬後の温暖ガス中での乾燥を経
てなされる。 Therefore, in the manufacturing process of such precision instruments, finishing cleaning with pure water is performed after cleaning with various chemicals in the final finishing process, and optical products such as plastics and glass are cleaned during use and maintenance. In order to prevent scratches and improve light transmittance, there is a coating application process for hardening treatment, and in most cases, this is done through immersion in a liquid treatment and drying in warm gas after the immersion. Ru.
而して、旧来態様の液処理方法を第2図によつ
て略説すれば、次の通りである。 The conventional liquid processing method is briefly explained below with reference to FIG.
即ち、プラスチツク製のレンズ1の精密機器の
純水による仕上げ洗浄後におけるコーテイング処
理において、コーテイング処理液2を貯留するコ
ーテイング槽3に対し、循環ポンプ4、及び、フ
イルタ5を介してサークル状に循環させ、処理籠
6によりレンズ1をコーテイング処理液2内にど
ぶ浸け状に浸漬して所定時間後に温暖ガス中に引
き上げするようにされているが、液処理槽3内に
於けるコーテイング処理液2はサークル状に循環
されるために一部の塵埃等はフイルタ5により除
去されはするものの、経時的にサブミクロン単位
の塵埃や比重の重い前工程の薬液等が停滞浮遊す
る等し、しばしばコーテイング処理液2中に遊散
して引き上げされる籠6内のレンズ1の表面に付
着する場合が多かつた。 That is, in the coating process after final cleaning of a precision instrument of a plastic lens 1 with pure water, the coating liquid 2 is circulated in a circular manner via the circulation pump 4 and the filter 5 to the coating tank 3 that stores the coating liquid 2. The lens 1 is immersed in the coating liquid 2 using the processing basket 6 and then pulled up into the warm gas after a predetermined period of time. Because it is circulated in a circle, some of the dust is removed by the filter 5, but over time, submicron-sized dust and chemicals from previous processes with heavy specific gravity stagnate and float, often resulting in coating problems. In many cases, it was scattered in the processing liquid 2 and attached to the surface of the lens 1 inside the basket 6 that was pulled up.
しかしながら、かかる精密機器においてはサブ
ミクロン単位の清浄度が要求されるために、最終
工程純水による仕上げ洗浄や薬液によるコーテイ
ング処理の液処理において、サブミクロン単位の
塵埃や、微粒子に対してはフイルタ等による完全
濾過を図つているが、不測にして処理液中に浮遊
して捕捉し切れずに滞留している該サブミクロン
単位の塵埃等が侵入している場合も無くはなく、
したがつて、所定の処理液に浸漬して温暖ガス中
に引き上げする工程での処理液の濃縮や、該温暖
ガス中に於ける乾燥プロスでのサブミクロン単位
の塵埃や微粒子の付着による所謂シミが除去出来
ない場合には不合格品となり、該種製品の精密機
器に電気的なシヨートや傷が付き易くなるという
不測の事態が生じかねず、製品精度に対する信頼
度を下落するという不都合さがあつた。 However, since such precision equipment requires cleanliness on the submicron level, filters are used to prevent dust and fine particles on the submicron level during final cleaning with pure water and chemical coating treatment. Although we are trying to achieve complete filtration by using methods such as the
Therefore, so-called stains may occur due to the concentration of the treatment liquid during the process of immersing it in a specified treatment liquid and lifting it into warm gas, and the adhesion of submicron-level dust and fine particles during the drying process in the warm gas. If it cannot be removed, the product will be rejected, and the precision equipment of the product may be easily damaged by electrical shots or scratches, which may lead to an inconvenience in which the reliability of the product accuracy will be reduced. It was hot.
特に、従来技術による純水やコーテイング液等
の処理液に対する精密機器のどぶ浸け状態の浸漬
後の温暖ガス中への引き上げに際しては、精密機
器の処理面にスポツト状やブロツク状の液が付着
して、乾燥工程において該処理液が濃縮されるプ
ロセスでシミが生ずるという欠点があつた。 In particular, when precision equipment is immersed in processing liquids such as pure water or coating liquid using conventional techniques and then pulled up into warm gas, spots or blocks of liquid may adhere to the processing surface of the precision equipment. However, there was a drawback in that stains were generated during the process in which the processing liquid was concentrated in the drying process.
したがつて、これまでは処理の度ごとに洗浄液
を洗浄の度ごと排出して入れ換えており、そのた
め、タクトが短縮出来ないという不具合があつた
り、高価な洗浄液の交換による多量使用を介して
のコストアツプにつながる不利点があつた。 Therefore, until now, the cleaning solution has been drained and replaced after each cleaning process, which has resulted in problems such as not being able to shorten the takt time, and due to the large amount of expensive cleaning solution being used. There were disadvantages that led to increased costs.
これに対処するに、特開昭62−277734号公報発
明や実開昭61−130389号公報考案等もあつて、処
理液を処理槽の側方へ層流化して側流させる技術
があるが、処理槽内での側流の整流が単段である
ことから層流が確実に生ぜず、処理槽内にミクロ
ン単位の不純物が残留し易い難点があつた。 To deal with this, there is a technique, such as the invention disclosed in Japanese Unexamined Patent Publication No. 62-277734 and the invention proposed in Japanese Utility Model Application No. 61-130389, in which the processing liquid is made into a laminar flow to the side of the processing tank. However, since the side flow within the processing tank is rectified in a single stage, laminar flow cannot be reliably produced, and impurities on the micron scale tend to remain in the processing tank.
<発明の目的>
この発明の目的は上述従来技術に基づく精密機
器に対する仕上げ洗浄や後工程のコーテイング処
理における精密機器の処理液中への浸漬の処理の
問題点を解決すべき技術的課題とし、液処理槽内
に於ける処理液の静穏な貯留状態への精密機器の
浸漬、及び、上部の温暖ガス中への引き上げによ
る乾燥プロセスでの濃縮工程を介してのシミ発生
の問題に着目し、浸漬から引き上げにかけての液
処理において、液処理槽内に於ける塵埃や前工程
での微粒子の浮遊や不純物の滞留を阻止し、これ
らを完全に循環工程において除去し、浸漬して温
暖ガス中に引き上げする精密機器の面に塵埃の付
着が絶対に生じないようにし、又、処理液の使用
量を少くし、コストダウンを進め、タクトの短縮
が図れるようにして精密機器製造産業における清
浄化技術利用分野に益する優れた精密機器の液処
理方法を提供せんとするものである。<Objective of the Invention> The object of the present invention is to solve the technical problem of immersing precision instruments in a processing liquid during finish cleaning and post-process coating treatment of precision instruments based on the above-mentioned prior art. We focused on the problem of stains occurring through the concentration process in the drying process, where precision equipment is immersed in a calm storage state of processing liquid in a liquid processing tank and pulled up into the warm gas at the top. During liquid treatment from immersion to withdrawal, we prevent dust and fine particles from floating in the liquid treatment tank and the accumulation of impurities from the previous process, and completely remove them in the circulation process. Cleaning technology in the precision equipment manufacturing industry that absolutely prevents dust from adhering to the surfaces of precision equipment being pulled up, reduces the amount of processing liquid used, reduces costs, and shortens takt times. The purpose of this invention is to provide an excellent liquid processing method for precision equipment that is beneficial to the field of application.
<課題を解決するための手段・作用>
上述目的に沿い先述特許請求の範囲を要旨とす
るこの発明の構成は前述課題を解決するために、
液処理槽により仕上げ洗浄やコーテイングを精密
機器に対して施す処理液の循環を介してのサブミ
クロン単位の塵埃等のフイルタ等による濾過除去
は液処理槽外のサイクル回路で行い、該液処理槽
内に於いては上下部の流速が同一である層流状の
側流を横方向複段の整流化によつて行い、サブミ
クロン単位の塵埃微粒子や不純物の浮遊や滞留の
ない処理液による速やかに排出し、高精度の液処
理を行うようにし、処理液の使用量を経済的に抑
制し、タクトの短縮が行えるようにした技術的手
段を講じたものである。<Means/effects for solving the problem> In order to solve the above problem, the structure of the present invention, which is based on the scope of the above-mentioned claims, is as follows:
Final cleaning and coating are applied to precision equipment using a liquid treatment tank.Through the circulation of the treatment liquid, dust and other particles in the submicron range are filtered out using a filter, etc., in a cycle circuit outside the liquid treatment tank. Inside the chamber, a laminar side flow with the same flow velocity at the top and bottom is rectified in multiple stages in the horizontal direction, and the treatment liquid is quickly processed without floating or stagnation of submicron dust particles or impurities. This technology takes technical measures to economically control the amount of processing liquid used and shorten the takt time by discharging the liquid and performing high-precision liquid processing.
<実施例>
次に、この発明の1実施例を第1図に従つて説
明すれば以下の通りである。<Example> Next, an example of the present invention will be described below with reference to FIG.
尚、第2図と同一態様部分は同一符号を用いて
説明するものとする。 Note that the same parts as in FIG. 2 will be explained using the same reference numerals.
図示実施例は精密機器としての光学レンズの表
面に対する硬化コーテイングの処理液の様であ
り、液処理槽3の内部にはプラスチツク製のレン
ズ1を収納した籠6が浸漬、引き上げ自在にされ
ており、所定のコーテイング処理液2が所定量貯
留されて、液処理槽3の一側部と他側部には第一
段の整流機構7,7′が設けられて、バルブ8、
補助タンク9、循環ポンプ10、フイルタ11、
ヒータ12、バルブ13を直列に介装した循環回
路14がサークル状に接続されており、該液処理
槽3の内部には所定サイズの微細な孔を多数穿設
された上下方向の多孔板15,15,15,15
が横4段に第2,3段の整流機構として設置され
ている。 The illustrated embodiment is a treatment liquid for hardening coating on the surface of an optical lens used as a precision instrument, and inside the liquid treatment tank 3 is a basket 6 containing a plastic lens 1 which can be immersed and pulled up. A predetermined amount of a predetermined coating treatment liquid 2 is stored, and a first stage rectifying mechanism 7, 7' is provided on one side and the other side of the liquid treatment tank 3, and a valve 8,
Auxiliary tank 9, circulation pump 10, filter 11,
A circulation circuit 14 having a heater 12 and a valve 13 interposed in series is connected in a circular manner, and inside the liquid processing tank 3 there is a perforated plate 15 in the vertical direction, which has a large number of fine holes of a predetermined size. ,15,15,15
are installed horizontally in four stages as second and third stage rectifying mechanisms.
尚、液処理槽3の外部、特に、上部には所定の
乾燥ガスが図示しない超精密フイルタによりサブ
ミクロン単位の塵埃を捕捉し、可及的に緩い速度
で加熱循環するようにされている。 Note that a predetermined drying gas is heated and circulated at the slowest possible speed outside the liquid processing tank 3, particularly in the upper part thereof, by capturing submicron-sized dust using an ultra-precision filter (not shown).
上述システムにおいて、前工程で所定に成形製
造されたプラスチツク製のレンズ1を前段の純水
による仕上げ洗浄を経て籠6により移動し、所定
に乾燥した後、液処理槽3に於いて所定のコーテ
イング処理をその表面に施すに際し、予め液処理
槽3に対し、コーテイング処理液2を循環回路1
4を介し補助タンク9、循環ポンプ10により循
環圧送し、フイルタ11によりサブミクロン単位
の塵埃を捕捉しヒータ12により設定温度の適温
に加温し、整流機構7,7′により一方側から他
方側へ拡散して液処理槽3内に圧入して可及的に
上下での側流を整流にし、続いて第2,3段の整
流機構の多孔板15,15,15…を流過するプ
ロセスで上下部の流速は同一速度に調整されて一
種の層流状の均一な整流の側流として流動し、し
たがつて、ミクロン単位の混入している塵埃も何
ら液処理槽3内に浮遊滞留することなく側方に確
実に低速で流動して循環し、フイルタ11により
完全に捕捉され、レンズ1の表面はサブミクロン
単位の塵埃のない処理液2によりコーテイング作
用を受ける。 In the above-mentioned system, the plastic lens 1, which has been molded and manufactured in a predetermined manner in the previous step, is transferred to a basket 6 after finishing cleaning with pure water in the previous stage, dried to a predetermined value, and then coated in a predetermined manner in a liquid treatment tank 3. When applying the treatment to the surface, the coating treatment liquid 2 is passed through the circulation circuit 1 to the liquid treatment tank 3 in advance.
4, the auxiliary tank 9 and the circulation pump 10 circulate and pressure feed, the filter 11 captures submicron dust, the heater 12 heats it to an appropriate set temperature, and the rectifier mechanism 7, 7' moves the air from one side to the other. A process in which the liquid is diffused into the liquid and press-fitted into the liquid treatment tank 3 to rectify the upper and lower side flows as much as possible, and then flows through the perforated plates 15, 15, 15, etc. of the second and third stage rectification mechanisms. The upper and lower flow velocities are adjusted to the same speed, and the flow flows as a kind of laminar, uniform rectified side flow, so that even the mixed dust in the micron scale does not remain suspended in the liquid treatment tank 3. The processing liquid 2 reliably flows and circulates laterally at a low speed without causing dust, is completely captured by the filter 11, and the surface of the lens 1 is coated with the processing liquid 2, which is free of submicron-level dust.
そして、所定時間後に籠6を処理液2により上
部の温暖ガス中に引き上げして乾燥され、ミクロ
ン単位の塵埃のない該温暖ガス中より次段処理に
移送されていき、所謂シミ等が生ぜず、均一なコ
ーテイング乾燥が施されて設計通りのコーテイン
グがなされたレンズ1が得られる。 After a predetermined period of time, the basket 6 is pulled up into the warm gas at the top using the processing liquid 2, dried, and transferred to the next stage of processing from within the warm gas, which is free of micron-level dust, so that so-called stains do not occur. , a lens 1 coated as designed by uniform coating drying is obtained.
そして、この間、処理液の全量入れ換え等がな
く、したがつて、経済的でタクトの短縮化が図れ
る。 During this time, there is no need to replace the entire amount of processing liquid, and therefore it is economical and the takt time can be shortened.
尚、この発明の実施態様は上述実施例に限るも
のでないことは勿論であり、例えば、液処理槽の
循環回路に流量計を設けて循環ポンプの循環速度
や循環圧力を調整するようにし、液処理槽内の層
流状の整流の側流の速度を可及的に低速にするよ
うにする等種々の態様が採用可能である。 It goes without saying that the embodiments of the present invention are not limited to the above-mentioned embodiments. For example, a flow meter may be provided in the circulation circuit of the liquid processing tank to adjust the circulation speed and circulation pressure of the circulation pump, so that the liquid Various aspects can be adopted, such as making the speed of the side flow of laminar rectification in the processing tank as low as possible.
又、適用対象はプラスチツク製のレンズ等に対
するコーテイング処理ばかりでなく、洗浄工程に
おける各洗浄段階や純水による仕上げ洗浄につい
ても適用出来ること等も勿論のことである。 Moreover, it goes without saying that the present invention can be applied not only to the coating treatment of plastic lenses, etc., but also to each cleaning step in the cleaning process and the final cleaning with pure water.
<発明の効果>
以上、この発明によれば、電子部品や光学レン
ズやガラス等の精密機器の洗浄やコーテイング等
の精密液処理において、処理液を貯留して洗浄
し、浸漬後温暖ガス中に引き上げするに処理液を
液処理槽の一側側から他側側に複数段の整流処理
をして層流状の側流にして、上下部の流速が等速
度になるような整流状の横移動を行うようにした
ことにより、液処理槽内に於ける処理液は液処理
槽内にて特定のサークル状の循環を行うことな
く、全体的に層流状の整流とつて均一速度で横移
動するために、不測にして混在するサブミクロン
単位の塵埃や前工程からの微粒子等が液処理槽内
部に浮遊して滞留したりせず、したがつて、浸漬
した精密機器の表面にこれらのサブミクロン単位
の塵埃や粒子等が上部の温暖ガス中への引き上げ
に際して付着することなく、したがつて、コーテ
イングや洗浄の仕上げに際し、混入するサブミク
ロン単位の塵埃や重い前工程の薬液によるシミ等
が生ぜず、設計通りの精度の高い均一な完全洗浄
やコーテイング等が行えるという優れた効果が奏
される。<Effects of the Invention> As described above, according to the present invention, in precision liquid processing such as cleaning and coating of precision equipment such as electronic parts, optical lenses, and glass, the processing liquid is stored and cleaned, and after immersion, it is immersed in warm gas. Before pulling up the processing liquid, the processing liquid is rectified in multiple stages from one side of the liquid processing tank to the other side to create a laminar side flow. By moving the liquid in the liquid processing tank, the processing liquid in the liquid processing tank does not circulate in a specific circle, but flows horizontally at a uniform speed as a whole in a laminar flow rectification. Because of the movement, sub-micron dust and fine particles from the previous process, which are mixed unexpectedly, do not float and stay inside the liquid treatment tank, and therefore, these particles do not reach the surface of the immersed precision equipment. Submicron-scale dust and particles do not adhere when pulled up into the warm gas at the top. Therefore, during coating and cleaning finishing, submicron-scale dust and particles that get mixed in and stains caused by heavy chemicals from previous processes can be avoided. This provides an excellent effect in that complete cleaning, coating, etc. can be carried out with high precision and uniformity as designed.
したがつて、最終製品として得られる精密機器
に対する信頼度も高く、歩留り向上にも役立ち、
製品品質度を高めることが出来るという優れた効
果が奏される。 Therefore, the reliability of the precision equipment obtained as a final product is high, and it also helps improve yield.
The excellent effect of increasing product quality is achieved.
そして、貴重な処理液については処理の度ごと
に総入れ換えする必要がなく、液処理槽内のコー
テイング処理液の清浄度がより一層高められコス
トダンを図れ、タクトの短縮化が図られるという
効果も奏される。 In addition, there is no need to completely replace the valuable treatment liquid every time the treatment is carried out, and the cleanliness of the coating treatment liquid in the liquid treatment tank is further improved, reducing costs and takt time. It is played.
第1図はこの発明の1実施例の縦断面図、第2
図は在来態様の精密機器に対する液処理方法の縦
断面図である。
1…精密機器、2…処理液、3…液処理槽、1
0…循環ポンプ、11…フイルタ、12…ヒー
タ、14…循環回路。
Fig. 1 is a longitudinal sectional view of one embodiment of the present invention, Fig.
The figure is a longitudinal cross-sectional view of a conventional liquid processing method for precision instruments. 1... Precision equipment, 2... Processing liquid, 3... Liquid processing tank, 1
0...Circulation pump, 11...Filter, 12...Heater, 14...Circulation circuit.
Claims (1)
て次段処理に搬送するようにした液処理方法にお
いて、上記液処理槽内にて処理液を一側から他側
へ該液処理槽の上下部に亘る全ての部分の流速を
同速にして層流状に側流させて循環させるに際し
横方向複段の整流作用を行わせて上記精密機器に
対する所定の液処理をするようにすることを特徴
とする精密機器の液処理方法。1. In a liquid processing method in which precision equipment is immersed in a liquid processing tank and then lifted up and transported to the next stage of processing, the processing liquid is transferred from one side to the other in the liquid processing tank above and below the liquid processing tank. When circulating the fluid in a laminar side flow with the same flow velocity in all parts, a rectification action is performed in multiple stages in the horizontal direction to perform a prescribed liquid treatment on the precision equipment. Characteristic liquid processing method for precision equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63033942A JPH01210091A (en) | 1988-02-18 | 1988-02-18 | Treatment of precision apparatus with liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63033942A JPH01210091A (en) | 1988-02-18 | 1988-02-18 | Treatment of precision apparatus with liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01210091A JPH01210091A (en) | 1989-08-23 |
| JPH0448516B2 true JPH0448516B2 (en) | 1992-08-06 |
Family
ID=12400562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63033942A Granted JPH01210091A (en) | 1988-02-18 | 1988-02-18 | Treatment of precision apparatus with liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01210091A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0360776A (en) * | 1989-07-27 | 1991-03-15 | Mita Ind Co Ltd | Washing liquid circulator |
| JPH0426082U (en) * | 1990-06-26 | 1992-03-02 | ||
| JPH0736399B2 (en) * | 1991-12-12 | 1995-04-19 | 孝夫 中澤 | Cleaning rinse tank for semiconductor wafers |
-
1988
- 1988-02-18 JP JP63033942A patent/JPH01210091A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01210091A (en) | 1989-08-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4722752A (en) | Apparatus and method for rinsing and drying silicon wafers | |
| US4902350A (en) | Method for rinsing, cleaning and drying silicon wafers | |
| US5327921A (en) | Processing vessel for a wafer washing system | |
| US4092176A (en) | Apparatus for washing semiconductor wafers | |
| EP0022528B1 (en) | Dip-coating method and apparatus | |
| CN110813888A (en) | Mask plate cleaning device and mask plate cleaning method | |
| BRPI0803743B1 (en) | Apparatus for moistening and covering ophthalmic lenses and method of submersion of optical lenses in a liquid bath | |
| US5236515A (en) | Cleaning device | |
| US4902608A (en) | Immersion development and rinse machine and process | |
| US4131483A (en) | Methods for cleaning articles with upward flowing liquids | |
| JPH0448516B2 (en) | ||
| JPH0448515B2 (en) | ||
| US4361605A (en) | Apparatus used in surface treatment and a method of surface treatment using said apparatus | |
| CN218394973U (en) | Wafer cleaning equipment process cavity and wafer cleaning equipment | |
| US5025280A (en) | Immersion development and rinse machine and process | |
| KR102785703B1 (en) | An apparatus for cleaning and drying a plurality of reclaimed wafers | |
| JP3386892B2 (en) | Wash tank | |
| JPS63110731A (en) | Semiconductor substrate processor | |
| KR100952121B1 (en) | Surface polishing method and surface polishing apparatus for resin products | |
| JPS5990667A (en) | Coating method | |
| US20030041877A1 (en) | State of the art constant flow device | |
| JPS63128186A (en) | Wet etching device | |
| TWI611473B (en) | Liquid level control system and method | |
| GB1558648A (en) | Cleaning articles | |
| JPH02288334A (en) | Apparatus for lifting from demineralized water tank and drying |