JPH04500698A - Radiation-curable binder system containing α-substituted sulfonyl compounds as photoactivators - Google Patents
Radiation-curable binder system containing α-substituted sulfonyl compounds as photoactivatorsInfo
- Publication number
- JPH04500698A JPH04500698A JP2509714A JP50971490A JPH04500698A JP H04500698 A JPH04500698 A JP H04500698A JP 2509714 A JP2509714 A JP 2509714A JP 50971490 A JP50971490 A JP 50971490A JP H04500698 A JPH04500698 A JP H04500698A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- compounds
- radiation
- compound
- curing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011230 binding agent Substances 0.000 title claims description 40
- 125000000472 sulfonyl group Chemical class *S(*)(=O)=O 0.000 title description 8
- 150000001875 compounds Chemical class 0.000 claims description 69
- 238000001723 curing Methods 0.000 claims description 28
- 239000003377 acid catalyst Substances 0.000 claims description 19
- 230000005855 radiation Effects 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 9
- 150000007513 acids Chemical class 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 230000002285 radioactive effect Effects 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000004414 alkyl thio group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 125000001589 carboacyl group Chemical group 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 150000003254 radicals Chemical class 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- -1 Amine salts Chemical class 0.000 description 13
- 239000000203 mixture Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 230000004913 activation Effects 0.000 description 6
- 239000003973 paint Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 238000003847 radiation curing Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KXFOGXCLRAHGPD-UHFFFAOYSA-N 1-(4-methylphenyl)sulfonylbutan-1-ol Chemical compound CCCC(O)S(=O)(=O)C1=CC=C(C)C=C1 KXFOGXCLRAHGPD-UHFFFAOYSA-N 0.000 description 2
- CAYNTDUWBKLZGG-UHFFFAOYSA-N 2-hydroxy-2-(4-methoxyphenyl)sulfonyl-1-phenylethanone Chemical compound C(C1=CC=CC=C1)(=O)C(O)S(=O)(=O)C1=CC=C(C=C1)OC CAYNTDUWBKLZGG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000004753 textile Substances 0.000 description 2
- 238000001029 thermal curing Methods 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- BXEXEGLXXGXRHP-UHFFFAOYSA-N (4-methylphenyl)sulfonylmethanol Chemical compound CC1=CC=C(S(=O)(=O)CO)C=C1 BXEXEGLXXGXRHP-UHFFFAOYSA-N 0.000 description 1
- YYDNBUBMBZRNQQ-UHFFFAOYSA-N 1-methyl-4-methylsulfonylbenzene Chemical compound CC1=CC=C(S(C)(=O)=O)C=C1 YYDNBUBMBZRNQQ-UHFFFAOYSA-N 0.000 description 1
- FNDFKMXAOATGJU-UHFFFAOYSA-N 1-phenyl-2-sulfonylethanone Chemical class O=S(=O)=CC(=O)C1=CC=CC=C1 FNDFKMXAOATGJU-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- NBIBDIKAOBCFJN-UHFFFAOYSA-N 2,2-dihydroxy-1-phenylethanone Chemical compound OC(O)C(=O)C1=CC=CC=C1 NBIBDIKAOBCFJN-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- PJPNYVUCECPCNB-UHFFFAOYSA-N 2-hydroxy-2-(4-methylphenyl)sulfonyl-1-phenylethanone Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(O)C(=O)C1=CC=CC=C1 PJPNYVUCECPCNB-UHFFFAOYSA-N 0.000 description 1
- NEAQRZUHTPSBBM-UHFFFAOYSA-N 2-hydroxy-3,3-dimethyl-7-nitro-4h-isoquinolin-1-one Chemical compound C1=C([N+]([O-])=O)C=C2C(=O)N(O)C(C)(C)CC2=C1 NEAQRZUHTPSBBM-UHFFFAOYSA-N 0.000 description 1
- VLUWLNIMIAFOSY-UHFFFAOYSA-N 2-methylbenzenesulfinic acid Chemical compound CC1=CC=CC=C1S(O)=O VLUWLNIMIAFOSY-UHFFFAOYSA-N 0.000 description 1
- BNCADMBVWNPPIZ-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n,6-n-hexakis(methoxymethyl)-1,3,5-triazine-2,4,6-triamine Chemical compound COCN(COC)C1=NC(N(COC)COC)=NC(N(COC)COC)=N1 BNCADMBVWNPPIZ-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- 229920003270 Cymel® Polymers 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 238000006135 Kohler reaction Methods 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241000276498 Pollachius virens Species 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000004457 alkyl amino carbonyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- JOVAETLWJHXYPO-UHFFFAOYSA-N benzenesulfonylmethanol Chemical compound OCS(=O)(=O)C1=CC=CC=C1 JOVAETLWJHXYPO-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000906 photoactive agent Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical group CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/43—Compounds containing sulfur bound to nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 α スルホニル A パ とし む バインダシステム 本発明はある種のα置換スルホニル化合物を光活性剤として含有する放射線硬化 性バインダシステムに関する0本バインダシステム(系)は、本発明に関する光 活性剤がフリーラジカル生成用光活性剤および/又は放射活性化性潜在的酸触媒 として作用する、フリーラジカルおよび/又は酸硬化性成分に基づくものである 。[Detailed description of the invention] α sulfonyl A pa binder system The present invention relates to a radiation-curable compound containing certain α-substituted sulfonyl compounds as a photoactive agent. The zero binder system (system) relating to the adhesive binder system is The activator is a photoactivator for free radical generation and/or a radioactivatable latent acid catalyst. are based on free radical and/or acid-curing components that act as .
塗料および塗装技術におけるバインダの大多数は、架橋、従って硬化が重縮合に よって生起する熱硬化性材料にもとづいている0重縮合可能な基礎材料は通常ア ミノプラスチック樹脂であり、その熱による硬化は酸類とくに有機スルホン酸が 触媒として働く、頻繁に用いられる典型的な酸触媒はパラトルエンスルホン酸( PTS)である、しかし酸硬化性システムには一旦酸触−媒と反応すると保存性 が限定され、短時間に処理しないとゲル化するという欠点がある。アミン塩類ま たはヒドロキサム酸のオキシムエステルの様なブロックされた形態にあるスルホ ン酸触媒の場合は保存性が改良される。高温度に加熱することによって、触媒活 性を持つ酸類がブロック化物から放出される。しかし、この方法によって、対応 する系の硬化にはエネルギーと時間が余計に消費される。熱硬化は一般に非常に 時間のかかるものであり、これは工業生産においては不利である。The majority of binders in paint and coating technology require crosslinking and therefore curing by polycondensation. Therefore, zero-polycondensable basic materials based on thermosetting materials are usually It is a minoplastic resin, and its heat curing is achieved by acids, especially organic sulfonic acids. A typical frequently used acid catalyst that acts as a catalyst is para-toluenesulfonic acid ( PTS), but acid-curing systems have a shelf life once reacted with an acid catalyst. It has the disadvantage that it has a limited amount of water and gels if it is not treated in a short period of time. Amine salts or sulfonate in a blocked form such as the oxime ester of hydroxamic acid. In the case of a carbonic acid catalyst, storage stability is improved. Catalytic activation is achieved by heating to high temperatures. Acids with properties are released from the blocked product. However, with this method, Curing systems that do this require additional energy and time. Heat curing is generally very It is time consuming, which is a disadvantage in industrial production.
熱硬化法とは別に、光化学的硬化も塗料および塗装技術において重要となって来 た。この方法では、放射エネルギーの変換には光活性化剤や光開始剤を含む特殊 な放射線硬化性組成物を使用する。放射線による硬化の特色は特に反応速度が高 く使用エネルギーが少ないことである。実用的に最も重要な光重合反応はエチレ ン性二重結合のフリーラジカルによる重付加反応である。従って対応する放射線 硬化系はラジカル重合性又は架橋性のエチレン性二重結合およびフリーラジカル 生成光開始剤を含有する材料にもとづくことになる。Apart from thermal curing methods, photochemical curing has also become important in paint and coating technology. Ta. In this method, the conversion of radiant energy requires a special method containing a photoactivator or photoinitiator. A radiation-curable composition is used. The characteristic of curing by radiation is that the reaction rate is particularly high. The main advantage is that it uses less energy. The most practically important photopolymerization reaction is ethylene. This is a polyaddition reaction caused by free radicals on a reactive double bond. Therefore the corresponding radiation The curing system consists of radically polymerizable or crosslinkable ethylenic double bonds and free radicals. The production will be based on materials containing photoinitiators.
酸触媒による熱硬化が生起する系も、従来の熱酸触媒の代りに、光化学的に活性 化可能な潜在的酸触媒を使用すれば、原則的にいって、放射線による硬化に使用 出来る。実際の硬化を行う触媒として働く酸は、熱エネルギーの追加投入が望ま しいが、放射線の作用によって之等から放出可能でなければならない、ある期間 この目的に使われた、ハローまたはスルホニルオキシアセトフェノン型の化合物 には、腐食、硬化フィルムの黄変その他の欠点がある。さらにフィルムの安定性 もしくは相溶性の問題が生ずる。Acid-catalyzed thermal curing systems are also photochemically active instead of conventional thermal acid catalysts. In principle, the use of latent acid catalysts that can be used for radiation curing I can do it. The acid that acts as a catalyst for the actual curing requires additional input of thermal energy. however, it must be possible to emit it from such sources by the action of radiation over a period of time. Halo- or sulfonyloxyacetophenone-type compounds used for this purpose has corrosion, yellowing of the cured film, and other drawbacks. Furthermore, film stability Otherwise, compatibility problems arise.
酸触媒による熱硬化系の既知の欠点を緩和し、かつ紫外線の照射による光化学的 活性化の利点をその中において利用するために、より新たな努力が払われている 6例えば欧州特許第192.967においては、光化学的活性化可能潜在的酸触 媒として使用出来る芳香族、脂肪族ケトンのスルホニル誘導体、特にα−スルホ ニルアセトフェノン化合物が開示されている。既知の紫外性酸触媒と比較すると 、之等の化合物は、特に硬化フィルムやバインダシステムの保存性に対する影響 に関して、これに起因する応用特性は、より効果的であインダーおよびラジカル 硬化性又は酸硬化性成分に基づく混成バインダー系のためのフリーラジカル生成 用光開始剤として使用出来る。Alleviates the known drawbacks of acid-catalyzed thermosetting systems and allows photochemical Newer efforts are being made to exploit the benefits of activation in 6 For example, in European Patent No. 192.967, photochemically activatable latent acid catalysts Sulfonyl derivatives of aromatic and aliphatic ketones that can be used as vehicles, especially α-sulfonyl derivatives. Nylacetophenone compounds are disclosed. Compared to known ultraviolet acid catalysts , etc., have particular effects on the shelf life of cured films and binder systems. Regarding, the applied properties resulting from this are more effective and inder and radical Free radical generation for hybrid binder systems based on curable or acid-curable components It can be used as a photoinitiator.
併しながら欧州特許第192.967に記載の化合物には、反応がおだやかであ るに過ぎないという欠点がある。所与の硬化結果について見ると、かなり高い放 射性出力および/又は長時間の照射時間が必要である。However, the compound described in European Patent No. 192.967 has a mild reaction. The disadvantage is that it is only a small amount of information. For a given curing result, a fairly high emission radiation output and/or long irradiation times are required.
更に、之等の化合物の持つ欠点は、合成コストがかなり高く、毒性のある原料と 溶剤を使用し有毒性副産物が生成することである。従って、その工業規模での生 産と使用とは経済的見地および今日の環境と工業安全の要求から見て問題がある 。Furthermore, the disadvantages of these compounds are that their synthesis costs are quite high and that they require toxic raw materials. The use of solvents produces toxic by-products. Therefore, its production on an industrial scale production and use are problematic from an economic standpoint and from today's environmental and industrial safety requirements. .
従って本発明の目的は、フリーラジカル生成用光開始剤として、並びにフリーラ ジカルおよび/又は酸で硬化可能な成分にもとづく、放射線硬化性バインダシス テム(系)における放射線活性化可能の潜在的酸触媒として、使用可能な他の化 合物の確認である。The object of the present invention is therefore to use it as a photoinitiator for the generation of free radicals as well as to Radiation-curable binder systems based on radically and/or acid-curable components Other compounds that can be used as potential radiation-activatable acid catalysts in systems This is a confirmation of the compound.
好ましい化合物は、相当条件下で従来使用されている化合物よりも反応性が高い と同時に、なるべく簡単に容易に入手し得るものである。Preferred compounds are more reactive than conventionally used compounds under comparable conditions At the same time, it should be as easy and easily available as possible.
我々は、ある種のα置換スルホニル化合物がこうした要求によく答えることを発 見した。We have discovered that certain α-substituted sulfonyl compounds meet these requirements well. I saw it.
それは式■の化合物である。It is a compound of formula ■.
式において、XはOR’もしくはNR’R’であり、R1はH%R、R−0、R J%R−COlR−COO、R”NGO5R3はH%R、R’はH%R、−CH R’−5Ox−R”である、Rはアルキル、シクロアルキル又はアリールで各々 炭素原子数カ月0以下、かつ各々は未置換又はOH、ハロゲン、シアノ、ニトロ 、アルキル、アルコキシ、アルキルチオ、モノアルキルアミノ、もしくはビスア ルキルアミノ、アルカノイル、アルカノイルオキシ、アルカノイルアミド、アル コキシカルボニル、アルキルアミノカルボニールもしくはアリールオキシ基でモ ノ−もしくは多置換されており、それぞれの置換基の炭素原子数は6以下である 。In the formula, X is OR' or NR'R', and R1 is H%R, R-0, R J%R-COlR-COO, R”NGO5R3 is H%R, R’ is H%R, -CH R'-5Ox-R'', R is alkyl, cycloalkyl or aryl, respectively 0 or less carbon atoms, and each is unsubstituted or OH, halogen, cyano, nitro , alkyl, alkoxy, alkylthio, monoalkylamino, or bisa lucylamino, alkanoyl, alkanoyloxy, alkanoylamide, alkyl mole with koxycarbonyl, alkylaminocarbonyl or aryloxy group. Unsubstituted or polysubstituted, each substituent having 6 or less carbon atoms .
式Iの化合物は波長200ないし450止mの紫外線の照射によって、先ずフリ ーラジカルを生成し、次いで、反応環境に応じ酸性の崩壊生成物を生ずる。ラジ カルおよび/又は酸硬化性成分にもとづくバインダ系における光活性剤として使 用すると、この化合物は従来の化合物、特に欧州特許第1’32.967で既知 のスルホニルアセトフェノン系化合物よりも、驚くべく明確に高い反応性を示す 。The compound of formula I is first freed by irradiation with ultraviolet light having a wavelength of 200 to 450 m. -radicals and then, depending on the reaction environment, acidic decay products. Raji Use as a photoactivator in binder systems based on cal- and/or acid-curing components. When used, this compound can be compared with conventional compounds, especially those known from European Patent No. 1'32.967. shows surprisingly higher reactivity than sulfonylacetophenone compounds. .
本発明はまた同時に、フリーラジカルおよび/又は酸により硬化する成分にもと づくバインダー系におけるフリーラジカル生成性光開始剤および/又は放射線で 活性化する潜在的酸触媒としての式Iの化合物の使用に関する。At the same time, the present invention also provides for free-radical and/or acid-curable components. Free radical-generating photoinitiators and/or radiation in binder systems Concerning the use of compounds of formula I as activating latent acid catalysts.
本発明は更に、フリーラジカル生成性酸触媒および/又は放射線で活性化する潜 在的酸触媒として、少なくとも一種の式Iの化合物の有効量を含む、フリーラジ カルおよび/又は酸硬化性成分にもとづく、放射線硬化性バインダー系に関する 。The present invention further provides free radical-generating acid catalysts and/or radiation activated latent catalysts. free radicals containing an effective amount of at least one compound of formula I as a conventional acid catalyst; Concerning radiation-curable binder systems based on cal- and/or acid-curable components .
更に本発明は、少なくとも式1の化合物の一つ以上の効果的な量をバインダー系 に添加し、硬化は200ないし450r+mの波長の紫外線照射によるか、放射 線と加熱との組合せによっておこなわれる、フリーラジカルおよび/又は酸で硬 化する成分にもとづくバインダー系の硬化方法に関する。Furthermore, the present invention provides an effective amount of at least one or more compounds of formula 1 in a binder system. curing is by UV irradiation with a wavelength of 200 to 450 r+m or by radiation. Hardening with free radicals and/or acids carried out by a combination of radiation and heating. The present invention relates to a method for curing binder systems based on the components to be cured.
本発明はまた最終的には基材上の放射線で硬化した塗装の製造法に関し、式1の 化合物の一つ以上の効果的な量を含むフリーラジカルおよび/又は酸で硬化する 成分にもとづくバインダー系を基材に塗装し、硬化反応の実施は波長200ない し450止の紫外線の照射により行われるか、照射と加熱との組合せによる。The present invention also ultimately relates to a method for producing radiation-cured coatings on substrates, with formula 1 Curing with free radicals and/or acids containing an effective amount of one or more compounds A binder system based on the ingredients is applied to the substrate, and the curing reaction takes place at a wavelength of 200. This can be done by irradiation with ultraviolet light at 450°C, or by a combination of irradiation and heating.
上記の意味を持つ式1のα置換スルホニル誘導体は本来既知の化合物である1式 1において、スルホニル基のα位の置換基Xは、水酸基もしくはアミノ基であり 、これらはそれ自体が置換されていてもよい、結局、Ia、 Ib、 Icとい った従属式の従属構造に到達する。The α-substituted sulfonyl derivative of formula 1 having the above meaning is originally a known compound of formula 1. In 1, the substituent X at the α-position of the sulfonyl group is a hydroxyl group or an amino group. , these may themselves be substituted; after all, Ia, Ib, Ic arrive at the dependent structure of the dependent expression.
従属式raの化合物は、構造の単純性および特に経済的な入手可能性の故に好ま しいものである。併し、従属式IbおよびIcの化合物も、本発明の視点からは 同程度に有効である。Compounds of the dependent formula ra are preferred because of their structural simplicity and especially economic availability. It's something new. However, from the point of view of the present invention, compounds of the dependent formulas Ib and Ic are also equally effective.
式1の化合物と更に好ましい式1aないしIcの化合物はスルホニル基のβ位に カルボニール基を持つものである。Compounds of formula 1 and more preferred compounds of formulas 1a to Ic are present in the β-position of the sulfonyl group. It has a carbonyl group.
従属式Idによって代表される対応する化合物は特に好ましい。Particular preference is given to the corresponding compounds represented by the subformula Id.
式lおよび■δないしIdの代表的な例として以下の化合物があげられる。The following compounds are representative examples of formulas I and ■δ to Id.
フェニル−スルホニ−ルーメタノール (2)α3召→2−CH2−0■ p−トリルスルホニ−ルーメタノール o−トリルスルホニ−ルーメタノール (4) CH3o@so□−cm2−onp−メトキシフェニル−スルホニ−ル ーメタノール(5) (IOSO□−CH2−OH p−クロロフェニル−スルホニ−ルーメタノール(6)O□N0802−α2噛 p−ニトロフェニル−スルホニ−ルーメタノールβ−ナフチル−スルホニ−ルー メタノール1−(フェニル−スルホニール)エタノール1−(p−)リルースル ホニール)プロパツール1−(p−トリル−スルホニール)ブタノール(m−ニ トロフェニル)(p−トリルスルホニール)メタノール (p−ニトロフェニル) (p−トリルスルホニール)メタノール ベンゾイル(p−トリルスルホニール)メタノール(m−ニトロベンゾイル)= (フェニルスルホニール)メタノール ベンゾイル(p−メトキシフェニル−スルホニール)メタノール ール)メタノール ベンゾイル(メチルスルホニール)メタノールベンゾイル(プロピルスルホニー ル)メタノールベンゾイル(ジメチルアミノ−スルホニール)メタノール ベンゾイル−エトキシ(p−トリルスルホニール)ピバロイル(p−トリルスル ホニール)メタノール(シクロへキシル−カルボニール)−(p−トリルスルホ ニール)メタノール ジ[(p−トリルスルホニール)−(ヒドロキシメチル)1ベンゼン (25) ()WIT−a(2−so□%oi3N−(p−トリルスルホニ−ル ーメチル)−アニリンリン ジ(p−トリルスルホニールメチル)アミンメチルージ(p−トリルスルホニー ルメチル)アミン エチルージ(p−トリルスルホニールメチル)アミン ベンゾイル(フェニルアミノ)(p4リルースルホニール)メタン (33) cH3−co4so□−cm2−oHp−アセチルアミノ−N−(フ ェニル−スルホニ−ルーメチル)アニリン N−メチル−N−(フェニルスルホニ−ルーメチル)−アニリン (p−トリルスルホニール)−メタン 特に好轡しい化合物は、ベンゾイル(p−トリルスルホニール)メタノール、( m−ニトロベンゾイル)(フェニル−スルホニール)メタノールおよびベンゾイ ル(p−メトキシフェニル−スルホニール)−メタノール、特にベンゾイル(p −トリルスルホニール)メタノールである。Phenyl-sulfonylu-methanol (2) α3 call → 2-CH2-0■ p-Tolylsulfonylumethanol o-Tolylsulfonylumethanol (4) CH3o@so□-cm2-onp-methoxyphenyl-sulfonyl -Methanol (5) (IOSO□-CH2-OH p-chlorophenyl-sulfonylu-methanol (6) O□N0802-α2 p-nitrophenyl-sulfonylu methanol β-naphthyl-sulfonylu Methanol 1-(phenyl-sulfonyl)ethanol 1-(p-) lyrusul 1-(p-tolyl-sulfonyl)butanol (m-ni) trophenyl)(p-tolylsulfonyl)methanol (p-nitrophenyl) (p-tolylsulfonyl)methanol Benzoyl (p-tolylsulfonyl)methanol (m-nitrobenzoyl) = (phenylsulfonyl)methanol Benzoyl (p-methoxyphenyl-sulfonyl)methanol methanol) Benzoyl (methylsulfonyl) methanol benzoyl (propylsulfony) methanol)benzoyl(dimethylamino-sulfonyl)methanol Benzoyl-ethoxy(p-tolylsulfonyl)pivaloyl(p-tolylsulfonyl) methanol (cyclohexyl-carbonyl)-(p-tolylsulfonyl) Neil) methanol di[(p-tolylsulfonyl)-(hydroxymethyl)1benzene (25) ()WIT-a(2-so□%oi3N-(p-tolylsulfonyl -methyl)-aniline phosphorus di(p-tolylsulfonylmethyl)aminemethyldi(p-tolylsulfonylmethyl)amine methyl)amine Ethyludi(p-tolylsulfonylmethyl)amine Benzoyl (phenylamino) (p4 lyrusulfonyl) methane (33) cH3-co4so□-cm2-oHp-acetylamino-N-(F (phenyl-sulfonylu-methyl)aniline N-methyl-N-(phenylsulfonylumethyl)-aniline (p-tolylsulfonyl)-methane Particularly preferred compounds are benzoyl(p-tolylsulfonyl)methanol, ( m-nitrobenzoyl)(phenyl-sulfonyl)methanol and benzoyl (p-methoxyphenyl-sulfonyl)-methanol, especially benzoyl (p-methoxyphenyl-sulfonyl)-methanol, -tolylsulfonyl)methanol.
式1の化合物でXがOH−基のものは、形式的には次式の反応形式に従うスルフ ィン酸のアルデヒドへの付加生成物であると見なされる。Formally, compounds of formula 1 in which X is an OH- group are sulfur compounds according to the reaction format of the following formula. It is considered to be an addition product of phosphoric acid to an aldehyde.
実際上、それ等の化合物はいずれもこの反応形式で容易にすぐれた収率で得られ る。対応するアミノ化合物は、この反応をアミン類の存在下で遂行するか、引続 いての置換反応によっても作ることが出来る0式■の化合物の合成法についての 実際の情報は例えば下記において見ることができる。In fact, all of these compounds can be easily obtained in excellent yields using this reaction format. Ru. For the corresponding amino compounds, this reaction can be carried out in the presence of amines or subsequently Regarding the synthesis method of the compound of formula 0 which can also be made by substitution reaction using Actual information can be found, for example, below.
(1) E、V、Meyer。(1) E. V. Meyer.
J、Prakt、Chew、53. 167(1901)(2)E、P、Koh ler、M、Reimer、J、Amer。J, Prakt, Chew, 53. 167 (1901) (2) E, P, Koh ler, M., Reimer, J., Amer.
Che+++、Soc、31. 163(1904)(3) )!、Brede reck、E、Bffider。Che+++, Soc, 31. 163 (1904) (3))! , Brede rec, E, Bffider.
Chesm、Bar、87 、 128 (1954)(4) H,Brede reck、E、B11der。Chesm, Bar, 87, 128 (1954) (4) H, Brede rec, E, B11der.
Cheap、Ber、87 、 784(1954)(5)E、B11er、) 1.D、Hermann。Cheap, Ber, 87, 784 (1954) (5) E, B11er,) 1. D. Hermann.
(6)に、5chank。(6), 5ch.
CheI!1. Ber、 99 、 48 (1966)(7) K、5ch ank。Che I! 1. Ber, 99, 48 (1966) (7) K, 5ch ank.
Liebigs Ann、Che+o、υ6 、 8?(1968)式1の多数 の化合物について、参考文献にその特性が示されている。Liebigs Ann, Che+o, υ6, 8? (1968) Many of Equation 1 The properties of the compounds are shown in the references.
本発明によれば、式Iの化合物はバインダー系に用いる放射活性剤として非常に 有利に使用出来る。これらの化合物の特別な利点は、放射線の作用によってフリ ーラジカルが放出されるばかりでなく、放射線で誘起される分解を受けて酸性分 解物を生じ、これが酸触媒として作用することが可能となる点にある。この酸生 成分解は加熱により更に誘起されるので、熱の作用によって、この反応を一層促 進させたり、この反応のみを起こさせることも可能となる。According to the invention, the compounds of formula I are very suitable as radioactive agents for use in binder systems. Can be used to advantage. A special advantage of these compounds is that they are free from the effects of radiation. - Radicals are not only released, but also acidic components undergo radiation-induced decomposition. The point is that a decomposition product is produced, which can act as an acid catalyst. This acidic Since component decomposition is further induced by heating, this reaction is further promoted by the action of heat. It is also possible to allow this reaction to proceed, or to cause only this reaction to occur.
式Iの化合物は、こうした多機能的特性に関連して、フリーラジカルにより硬化 する成分にもとづくバインダー系のフリーラジカル生成性光開始剤として、また 酸硬化性成分にもとづくバインダー系、また混合系、すなわちフリーラジカル硬 化性および酸硬化性成分が隣り合って含まれている。いわゆる混成へイブリッド 型バインダー系の放射線による活性化可能の潜在性酸触媒としても、等しく使用 可能である。In conjunction with these multifunctional properties, the compounds of formula I are characterized by their ability to be cured by free radicals. As a binder-based free radical-generating photoinitiator based on Binder systems based on acid-curing components, as well as mixed systems, i.e. free-radical hardening Contains acid-curable and acid-curable components side by side. so-called hybrid hybrid Equally used as a radiation-activatable latent acid catalyst in type binder systems It is possible.
本発明にもとづいて、こうしたバインダー系において光活性化剤として式1の化 合物を使用するに当っては、これ等のバインダー組成物と単純に混合し、必要な らば少し加熱したり、分布の均一性を促進するために、少量の溶剤を加えたりす る0式1の化合物は現行の用途や加工法に対しては、バインダー系中に重量で0 .1ないし20%含まれれば充分な活性を持っている。According to the invention, compounds of formula 1 can be used as photoactivators in such binder systems. When using the compound, simply mix it with these binder compositions and add the necessary You can heat it slightly or add a small amount of solvent to promote uniformity of distribution. For current applications and processing methods, the compound of formula 1 is .. If the content is 1 to 20%, it has sufficient activity.
その好ましい量は1ないし10重量%であり、バインダー系の総重量に対して約 2%が特に好ましくまた経済的である。Its preferred amount is 1 to 10% by weight, based on the total weight of the binder system. 2% is particularly preferred and economical.
式1の化合物の光化学的賦活は置換基R1およびR8の性格によって、約20な いし450nmの波長の紫外線の照射によって達成される0式Iの化合物、とく に置換基RIおよびR零がフェニル基もしくは低置換フェニル基である従属式I ’dの化合物は特に、主として200ないし300nmの短、中波長の紫外線の 範囲で有効である。必要もしくは望ましい場合には、紫外線の感度領域がせまい 時は、芳香族ケトンの様な、より長波長領域で吸収する既知の共増感剤を添加す ることによって感度が増大する。The photochemical activation of compounds of formula 1 varies from about 20 to 20, depending on the nature of substituents R1 and R8. Compounds of formula I achieved by irradiation with ultraviolet radiation at a wavelength of 450 nm, in particular Substituents RI and R zero are phenyl groups or lower substituted phenyl groups, In particular, the compounds of Valid within a range. If necessary or desirable, a narrow UV-sensitive region can be used. In some cases, known co-sensitizers that absorb at longer wavelengths, such as aromatic ketones, are added. Sensitivity is increased by
本発明の式1の化合物がフリーラジカルを生成する光開始剤および/又は放射線 による賦活可能な潜在的酸触媒として使用出来る、フリーラジカルにより、およ び/又は酸により硬化する成分にもとづく放射線硬化バインダー系自体は既知の ものである。Photoinitiators and/or radiation with which the compounds of formula 1 of the invention generate free radicals free radicals, which can be used as latent acid catalysts that can be activated by Radiation-curing binder systems based on components that cure with and/or acids are themselves known. It is something.
フリーラジカルによる硬化成分にもとづく放射線硬化性バインダー系は通常、フ リーラジカルで光重合するエチレン性不飽和化合物の少なくとも一つと、適切な 他の通例的な添加物から成る混合物である。フリーラジカルによって重合する成 分として適当なものは、実際にはオレフィン性不飽和二重結合をもつものならば いずれでも良い、特にモノマー、オリゴマーおよびポリマーであって、それぞれ 、少なくとも一つ好ましくはより多くのアクリレートもしくはビニール型の不飽 和性機能をもつものである。之に該当する材料は当業界の識者には数多く知られ ている。かかる化合物の例としては、アクリル化合物、特に脂肪族および芳香族 モノヒドロキシもしくはポリヒドロキシ化合物のアクリレート、例えば(メタ) クリル酸とその塩類およびアミド類、(メタ)アクリロニトリル、(メタ)アク リル酸アルキル類、ヒドロキシエチル(メタ)アクリレート、ビニール(メタ) アクリレート、エチレングリコール・ジメタアクリレート、1.6−ヘキサンジ オール・ (メタ)アクリレート、トリメチロールプロパン・ジ(メタ)アクリ レート、ペンタエリスリトール・トリ(メタ)アクリレート、また更には、塩化 ビニル、塩化ビニリデン、スチレン、ジビニルベンゼン、N−ビニルピロリドン およびN−ビニルカルバゾールなどのビニル化合物が挙げられる。高分子量のポ リマー、バインダー成分としては、アクリル化ポリエステル、アクリレート、エ ポキシ、ウレタン、ポリアミドおよびシリコーン樹脂がある。放射線硬化性バイ ンダー系は殆どが、前記の低分子量および高分子量の不飽和成分の混合物である 。Radiation-curable binder systems based on free-radical curing components typically at least one ethylenically unsaturated compound that photopolymerizes with radicals and a suitable A mixture of other customary additives. Compounds polymerized by free radicals In fact, suitable substances are those that have an olefinically unsaturated double bond. any, especially monomers, oligomers and polymers, each of which , at least one preferably more acrylate or vinyl type unsatisfactory It has a harmonious function. There are many materials that fall under this category that are known to experts in the industry. ing. Examples of such compounds include acrylic compounds, especially aliphatic and aromatic compounds. Acrylates of monohydroxy or polyhydroxy compounds, e.g. (meth) Acrylic acid and its salts and amides, (meth)acrylonitrile, (meth)acrylic acid Alkyl lylates, hydroxyethyl (meth)acrylate, vinyl (meth) Acrylate, ethylene glycol dimethacrylate, 1,6-hexane di All (meth)acrylate, trimethylolpropane di(meth)acrylate chloride, pentaerythritol tri(meth)acrylate, or even chloride Vinyl, vinylidene chloride, styrene, divinylbenzene, N-vinylpyrrolidone and vinyl compounds such as N-vinylcarbazole. High molecular weight Rimmer and binder components include acrylated polyester, acrylate, and There are poxies, urethanes, polyamides and silicone resins. Radiation curable bi Under systems are mostly mixtures of the low molecular weight and high molecular weight unsaturated components mentioned above. .
式Iの化合物の本発明にもとづく使用分野を同じく代表する酸硬化性バインダー 系としては、少なくとも1個の酸触媒による重縮合可能の成分を持つすべての系 がある。これらは色々に改質出来るメラミンもしくは尿素系の樹脂が殆どである 。当業界の熟達者ならばこれ等の材料は熟知のことであろうが、それ等は大量に 工業生産されており、種々な用途に応じて特性は改質されている。メラミン系材 料の代表例はへキサメトキシメチル・メラミンである。更に、酸硬化性バインダ ー系は随意に他の成分を色々な分量で含んでも良いが、これはアミノプラスチッ ク樹脂業界では普通である。その例としては、アルキド系、フェノール系、ポリ エステル、アクリルおよびポリビニル樹脂もしくはそれらの混合物が挙げられる 。Acid-curing binders which also represent the field of use according to the invention of compounds of the formula I As a system, any system that has at least one component that can be polycondensed using an acid catalyst. There is. Most of these are melamine or urea-based resins that can be modified in various ways. . Those skilled in the industry will be familiar with these materials, but they cannot be produced in large quantities. It is produced industrially, and its properties are modified for various uses. melamine material A typical example of this material is hexamethoxymethyl melamine. Furthermore, acid-curing binder - system may optionally contain other ingredients in varying amounts; This is common in the resin industry. Examples include alkyd, phenolic, poly esters, acrylics and polyvinyl resins or mixtures thereof. .
式1の化合物は放射線賦活触媒として好適であるが、また特にフリーラジカルで 重合可能な成分と同様、重縮合可能な酸触媒反応性成分を含有する複合バインダ ー系にも好適である0本発明によれば、之等の化合物は純粋に光化学的に、もし くは、好ましくは光化学的および熱的な条件の組合せによりて活性化出来る。更 にこれ等の化合物は、フリーラジカルおよび酸の発生物質として同程度にはたら く、従って実際上、同時に、混合系の各種の成分の硬化作用を示す、かかる混合 系に対する好適な酸硬化性成分は既述の化合物のすべておよび、同様に例λば重 縮合もしくは重付加反応で熱により架橋するが、フリーラジカルによっては架橋 しない化合物が使用し得る。その例としては。Compounds of formula 1 are suitable as radiation-activated catalysts, but are also particularly suitable for free radical activation. Composite binders containing acid-catalyzed reactive components capable of polycondensation as well as polymerizable components According to the invention, such compounds can be prepared purely photochemically, if It can be activated preferably by a combination of photochemical and thermal conditions. Change These compounds act equally well as free radical and acid generators. and therefore in practice simultaneously exhibit the hardening action of the various components of the mixture system. Suitable acid-curing components for the system include all of the compounds already mentioned and also examples such as Cross-links due to heat during condensation or polyaddition reactions, but cross-links due to free radicals Compounds that do not As an example.
酸硬化性メラミン樹脂とポリウレタン類もしくはポリエステル類を生成する反応 性樹脂がある。フリーラジカル重合性成分として好適なものは、既述のオレフィ ン性不飽和二重結合を持つ既述の化合物な也ば実際上とれでも差支えない、こう した混成バインダー系においては、酸硬化性およびフリーラジカル重合性成分の 量は10ないし90重量%という広い範囲に変えることが出来る。Reaction between acid-curable melamine resin and polyurethanes or polyesters There is a synthetic resin. Suitable free radical polymerizable components include the olefins mentioned above. In practice, there is no problem with any of the compounds mentioned above having an unsaturated double bond. In the hybrid binder system, acid-curable and free-radically polymerizable components are The amount can vary over a wide range from 10 to 90% by weight.
放射碑硬化性バインダー系は水性分散液であっても良いが、その水分は通常、塗 装した後で短時間加熱して除去するのが普通である。The radiant curable binder system may be an aqueous dispersion, but the water is typically It is common to heat the material for a short period of time to remove it.
式1の化合物を光賦活剤として硬化するバインダー系は、ラジカル重合単独、酸 硬化単独もしくは両者の混成、の何れの場合でも、定性的および定量的組成の広 い範囲において変更が出来、特に他の成分および添加物を含んでいてもよい、こ れに関連して、反応性成分の使用量は10重量%以下でないことが好ましい、特 定の目的で通常量で用いられる、その他の成分と添加物としては、無機および有 機の顔料、塗料、充填剤、流動制御剤、海面活性剤、マット剤、可塑剤、溶剤、 補助分散剤、その他のバインダーおよび樹脂、他の光開始剤、分光増感剤および 既知の共開始剤、他の熱反応性もしくは光反応性ラジカル開始剤およびカチオン 生成性もしくは酸生成性触媒がある。The binder system that is cured using the compound of formula 1 as a photoactivator can be used for radical polymerization alone, acid Whether curing alone or a combination of both, qualitative and quantitative compositions are widely available. This product can be varied within a wide range and, in particular, may contain other ingredients and additives. In this connection, the amount of reactive components used is preferably not less than 10% by weight, especially Other ingredients and additives used in customary amounts for specific purposes include inorganic and organic Machine pigments, paints, fillers, flow control agents, surfactants, matting agents, plasticizers, solvents, co-dispersants, other binders and resins, other photoinitiators, spectral sensitizers and Known coinitiators, other thermally or photoreactive radical initiators and cations There are acid-producing or acid-producing catalysts.
上記のバインダー系による基材、それは主として平坦な物体であるが、その塗装 は既知の方式で行われる。業界の専門かであれば適当な塗装技術や使用し得る設 備を熟知している。Substrates with the above binder systems, which are mainly flat objects, can be painted is performed in a known manner. If you are an expert in the industry, you should know the appropriate painting techniques and the equipment that can be used. Familiar with preparations.
用途は主として薄膜の製造であるが、その例としては、この目的に通常使用する すべての材料と基材への塗料の塗装がある。その材料は主として、紙、木材、繊 維基布、プラスチックおよび金属である0重要な用途分野としては、印刷インキ やスクリーン印刷材料の乾燥もしくは硬化であるが、後者は例えば缶、管や金属 製の閉止栓の表面塗装もしくは装飾に好んで用いられる。The application is primarily for the production of thin films, examples of which are There is a coating of paint on all materials and substrates. Its materials are mainly paper, wood, and textiles. Important application areas include printing inks, textiles, plastics and metals. and drying or curing of screen-printed materials, the latter for example on cans, tubes and metals. It is preferably used for surface painting or decoration of manufactured stopcocks.
式1の化合物を含む本発明のバインダー系もしくはこれを用いた塗装物は放射線 エネルギー、特に波長が200ないし450na+の紫外線の作用によって硬化 する。The binder system of the present invention containing the compound of formula 1 or the coated product using the same is free from radiation. Cured by the action of energy, especially ultraviolet light with a wavelength of 200 to 450 na+ do.
放射線源としては、従来からの高圧、中圧もしくは低圧水銀蒸気灯、例えばキセ ノンもしくはタングステン灯が使用出来る。Sources of radiation include conventional high-pressure, medium-pressure or low-pressure mercury vapor lamps, e.g. Non- or tungsten lamps can be used.
ある種の、主として酸硬化もしくは混成バインダー系の場合、熱エネルギーを同 時にもしくは引続いて投入して硬化を促進するのが好ましい、この追加的な熱賦 活は酸触媒下の熱硬化系に対して普通な温度範囲で行われる。この温度は80な いし150℃、好ましくは100ないし120℃である。For some, primarily acid-cured or hybrid binder systems, thermal energy This additional heat application, which is preferably applied at times or subsequently, to accelerate curing. Activation is carried out in the temperature range common for acid-catalyzed thermosetting systems. This temperature is 80 The temperature is from 100 to 120°C, preferably from 100 to 120°C.
式1の化合物の特に有益な特性というのは、その光化学的、熱的活性は、置換基 を選択的に選ぶことで変化させ相互に調和させたり、または特定の感度が選択的 に制御出来ることである。A particularly advantageous property of compounds of formula 1 is that their photochemical and thermal activity can be varied and harmonized with each other by selectively selecting the It is something that can be controlled.
硬化は連続的にも不連続的にも遂行出来る。照射時間は方法の性格、使用する重 合物質の量及び性質、光賦活剤の性格と濃度、並びに光源の強度によって変化さ れる。塗装物の放射硬化において、照射時間は通常、数秒から数分である。十分 に硬化するため追加して行われることが好ましい熱処理の時間は、温度とバイン ダー系の種類にもよるが、数分から数時間である。Curing can be accomplished continuously or discontinuously. The irradiation time depends on the nature of the method and the weight used. may vary depending on the amount and nature of the compound, the nature and concentration of the photoactivator, and the intensity of the light source. It will be done. In radiation curing of painted objects, the irradiation time is usually from several seconds to several minutes. sufficient The preferred additional heat treatment time for curing depends on the temperature and binder. Depending on the type of powder, it can take anywhere from a few minutes to several hours.
比較の出来る放射賦活剤、特にEP192.967において既知のα−スルホニ ルアセトフェノン類と較べると、式1の化合物は、対比出来る塗布及び加工条件 下で作ったフィルムの硬度が明瞭に大きいという予期しなかった利点を示した。Comparable radioactivators, in particular the α-sulfonyl compounds known in EP 192.967. Compared to ruacetophenones, the compound of formula 1 has comparable application and processing conditions. The hardness of the films produced below showed an unexpected advantage of distinctly greater hardness.
所与のフィルム硬度を得るのに必要な照射時間は短くて済む。Shorter irradiation times are required to obtain a given film hardness.
上記の化合物は既知の放射線賦活性かつ加熱酸触媒に対して、これで処理したバ インダー系の保存性において一層すぐれている。また硬化した最終製品にマイナ スの影響、特に黄変の傾向は見られない。The above compounds reacted with known radioactive and heated acid catalysts to the buffers treated with them. It has even better storage stability than the Inder type. Also, the cured final product may have a negative impact. No influence of dust, especially no tendency towards yellowing, was observed.
式Iの化合物の単純で問題の無い入手可能性とそのすぐれた応用特性が、これら 化合物を特に実用上の価値を高めるものである。The simple and unproblematic availability of the compounds of formula I and their excellent application properties make them This makes the compound particularly valuable for practical purposes.
(実施例) A、I A 下記第1表の式Iの化合物のの調製と特性(特徴づけ)化を引用文献に記述され た方法もしくは類似の方法で行った。調製された化合物はすべて正しい元素分析 値を示した。(Example) A, I A The preparation and characterization of compounds of formula I in Table 1 below are described in the cited literature. or a similar method. All prepared compounds have correct elemental analysis The value was shown.
′ に る ′ A 31 フエニルグリオキザール水和物7.6g (50ma+ol)とアニリン4.6 g (50mmol)との混合物をTHF 50m1中、室温で2時間攪拌した 0次いでトルエンスルフィン酸7.8g(50ooaol)を加え、更に16時 間攪拌を続けた0分離した沈澱は吸引濾別し、エーテルで洗いトルエンから再結 晶させた。得たものは融点131.5℃のベンゾイル(フェニルアミノ) (p −)リルスルホニル)メタンの9.9g (27IDmol=理論値の54%) であった。′ ’ A 31 Phenylglyoxal hydrate 7.6g (50ma+ol) and aniline 4.6 g (50 mmol) was stirred in 50 ml of THF at room temperature for 2 hours. Next, 7.8 g (50 ooaol) of toluenesulfinic acid was added, and the mixture was further heated at 16 o'clock. The separated precipitate was separated by suction filtration, washed with ether, and reconsolidated from toluene. crystallized. The obtained product was benzoyl (phenylamino) (p -)lylsulfonyl)methane 9.9g (27IDmol=54% of theoretical value) Met.
第」二底 へ ℃ 1 3 65.5 60 2 1.3 96 95 8 2.3 52 11 2、 3 91.5 110 12 2.3 109−111 11613 92.5 24 128.5 30 155.5 31 131.5 35(分解温度〉90) B 、 ・、 被験用(化合物番号14)の本発明の式Iの化合物の2%および比較物質(EP 192.967にょる”DTA”)の2%をn−ブタノール中lθ%溶液とし、 それぞれを、下記を含む塗料系(混成バインダー系)中に均一に攪拌混合した。To the second bottom ℃ 1 3 65.5 60 2 1.3 96 95 8 2.3 52 11 2, 3 91.5 110 12 2.3 109-111 11613 92.5 24 128.5 30 155.5 31 131.5 35 (decomposition temperature>90) B, ・, 2% of the compound of formula I of the invention for test use (compound no. 14) and the comparative substance (EP A 2% lθ% solution of 192.967 (DTA) in n-butanol, Each was uniformly stirred and mixed into a coating system (compound binder system) containing the following:
72重量部のアクリル化芳香族エポキシ樹脂CBASF製 ラロマー■EA81 ) 18重量部のヘキサンジオール・ジアクリレート10重量部のへキサメトキシメ チルメラミン(ダイン・シアナミド製 サイメル■303)上記調製ずみの塗料 試料をガラス板(10cmX 10cm)に膜厚80μmに塗装し、空気中室温 で10分間曝露し溶媒を除去した。72 parts by weight of acrylated aromatic epoxy resin CBASF Laromar EA81 ) 18 parts by weight hexanediol diacrylate 10 parts by weight hexamethoxime Chilmelamine (manufactured by Dyne Cyanamid Cymel ■303) Paint prepared above The sample was coated on a glass plate (10cm x 10cm) to a film thickness of 80μm, and left in air at room temperature. for 10 minutes and the solvent was removed.
曝気の後、塗装したガラス板を紫外線実験乾燥器(ベルトロン社製BE22型) 中をコンベア・ベルト速度2、5m/分から40■/分(放射時間として1.5 秒/lないし24秒/mに対応)で、出力801/cmの中圧水銀灯下10cm の距離をおいて通過させた。After aeration, the painted glass plate was placed in an ultraviolet experimental dryer (Beltron model BE22). Inside the conveyor belt speed 2.5m/min to 40cm/min (radiation time 1.5m/min) sec/l to 24 sec/m) and 10 cm under a medium pressure mercury lamp with an output of 801/cm. It was passed at a distance of .
紫外線照射の後、塗装したパネルを実験用乾燥炉中で120℃、30分で硬化し た。硬化、冷却の後、表面状態を感覚試験で測定し、約20時間の焼付の後、硬 度の目安としてケーニッヒ振子硬度(DN 53157)を測定した。After UV irradiation, the painted panels were cured in a laboratory drying oven at 120°C for 30 minutes. Ta. After curing and cooling, the surface condition was measured by a sensory test, and after about 20 hours of baking, the hardness The Koenig pendulum hardness (DN 53157) was measured as a measure of hardness.
結果は第2表と第1図に示した。The results are shown in Table 2 and Figure 1.
第2表 (注) (a) DIN 53157にもとづく振子硬度(秒)、硬化後20時間に測定 。Table 2 (note) (a) Pendulum hardness (seconds) according to DIN 53157, measured 20 hours after curing .
(b)熱硬化直後の表面状態 + =乾いた表面 (+)=乾燥不十分 −=粘着性表面 ここで判ることは、本発明の化合物を用いた硬化速度の全範囲に亘って、比較物 質による場合よりも顕著に硬度の高い塗装面が得られることである。(b) Surface condition immediately after thermosetting + = dry surface (+) = insufficient drying −=sticky surface It can be seen that over the entire range of cure rates using the compounds of the invention, the comparative It is possible to obtain a painted surface with significantly higher hardness than that obtained by coating with high quality paint.
所定の振子硬度(例えば170秒)の塗膜を達成するためには、本発明の化合物 を賦活用に用いると、比較用物質を使用した場合よりも速い速度で硬化を行うこ とになる(例えば4ffl/分の代りに6m/分の速度)。In order to achieve a coating film with a predetermined pendulum hardness (for example 170 seconds), the compounds of the invention When used for activation, curing occurred at a faster rate than when using the comparison material. (e.g. a speed of 6 m/min instead of 4 ffl/min).
シ 1jη 国際調査報告 −一■−1−一−mkPcT/EP 90100927国際調査報告1jη international search report -1■-1-1-mkPcT/EP 90100927 International Search Report
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3921459.1 | 1989-06-30 | ||
| DE3921459A DE3921459A1 (en) | 1989-06-30 | 1989-06-30 | RADIATION-curable BINDING AGENT SYSTEMS WITH (ALPHA) SUBSTITUTED SULFONYL COMPOUNDS AS PHOTO ACTIVATORS |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04500698A true JPH04500698A (en) | 1992-02-06 |
Family
ID=6383969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2509714A Pending JPH04500698A (en) | 1989-06-30 | 1990-06-13 | Radiation-curable binder system containing α-substituted sulfonyl compounds as photoactivators |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0431122A1 (en) |
| JP (1) | JPH04500698A (en) |
| KR (1) | KR920701331A (en) |
| AU (1) | AU5928290A (en) |
| BR (1) | BR9006841A (en) |
| CA (1) | CA2035460A1 (en) |
| DD (1) | DD296301A5 (en) |
| DE (1) | DE3921459A1 (en) |
| WO (1) | WO1991000312A1 (en) |
| ZA (1) | ZA905121B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07225473A (en) * | 1991-05-20 | 1995-08-22 | At & T Corp | Preparation of device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4510290A (en) * | 1982-01-11 | 1985-04-09 | Ciba Geigy Corporation | Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof |
| US4395520A (en) * | 1982-01-20 | 1983-07-26 | Union Carbide Corporation | Process for curing thermosetting resins using sulfur dioxide containing compounds as latent catalysts |
| US4477618A (en) * | 1982-09-29 | 1984-10-16 | Ppg Industries, Inc. | Aminoplast curable coating compositions containing sulfonic acid esters as latent acid catalysts |
| IT1208494B (en) * | 1985-01-28 | 1989-07-10 | Lamberti Flli Spa | Polymerization. SULPHURATED DERIVATIVES OF AROMATIC-ALIPHATIC AND ALIPHATIC KETONES AS PHOTOINITIATORS OF |
| US4839427A (en) * | 1987-09-03 | 1989-06-13 | Monsanto Company | Resin systems cured with blocked acid catalysts |
| US4835227A (en) * | 1987-09-03 | 1989-05-30 | Monsanto Company | Blocked acid catalysts |
-
1989
- 1989-06-30 DE DE3921459A patent/DE3921459A1/en not_active Withdrawn
-
1990
- 1990-06-13 KR KR1019910700219A patent/KR920701331A/en not_active Withdrawn
- 1990-06-13 WO PCT/EP1990/000927 patent/WO1991000312A1/en not_active Ceased
- 1990-06-13 BR BR909006841A patent/BR9006841A/en unknown
- 1990-06-13 CA CA002035460A patent/CA2035460A1/en not_active Abandoned
- 1990-06-13 AU AU59282/90A patent/AU5928290A/en not_active Abandoned
- 1990-06-13 JP JP2509714A patent/JPH04500698A/en active Pending
- 1990-06-13 EP EP90909650A patent/EP0431122A1/en not_active Ceased
- 1990-06-29 DD DD90342360A patent/DD296301A5/en not_active IP Right Cessation
- 1990-06-29 ZA ZA905121A patent/ZA905121B/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07225473A (en) * | 1991-05-20 | 1995-08-22 | At & T Corp | Preparation of device |
Also Published As
| Publication number | Publication date |
|---|---|
| DD296301A5 (en) | 1991-11-28 |
| EP0431122A1 (en) | 1991-06-12 |
| DE3921459A1 (en) | 1991-01-03 |
| KR920701331A (en) | 1992-08-11 |
| AU5928290A (en) | 1991-01-17 |
| CA2035460A1 (en) | 1990-12-31 |
| BR9006841A (en) | 1991-08-06 |
| WO1991000312A1 (en) | 1991-01-10 |
| ZA905121B (en) | 1991-05-29 |
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