JPH0450072B2 - - Google Patents
Info
- Publication number
- JPH0450072B2 JPH0450072B2 JP62192142A JP19214287A JPH0450072B2 JP H0450072 B2 JPH0450072 B2 JP H0450072B2 JP 62192142 A JP62192142 A JP 62192142A JP 19214287 A JP19214287 A JP 19214287A JP H0450072 B2 JPH0450072 B2 JP H0450072B2
- Authority
- JP
- Japan
- Prior art keywords
- circulation pump
- flow rate
- ultrapure water
- pressure
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 63
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 47
- 239000012498 ultrapure water Substances 0.000 claims description 47
- 238000004519 manufacturing process Methods 0.000 claims description 33
- 239000012528 membrane Substances 0.000 claims description 13
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000003456 ion exchange resin Substances 0.000 claims description 4
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、超純水製造装置の制御方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method of controlling an ultrapure water production apparatus.
一般に、超純水製造システムは、純水製造装置
を多段に直列接続して順次純度を高め、最終段の
サブシステム、所謂超純水製造装置において理論
純水に近い超純水を得るようにしているのが普通
で、工業用水、上水等の原水又は原水に回収水を
混ぜたものを用いて超純水の製造を行ない、例え
ばIC，LSI等の半導体の洗浄水として使用され
る。
Generally, ultrapure water production systems connect multiple stages of pure water production equipment in series to increase the purity one after another, and the final stage subsystem, the so-called ultrapure water production equipment, produces ultrapure water close to theoretical purity. Ultrapure water is usually produced using raw water such as industrial water, tap water, or a mixture of raw water and recovered water, and is used, for example, as cleaning water for semiconductors such as ICs and LSIs.
第３図は従来の超純水製造装置（サブシステ
ム）の代表的なフローを示している。 FIG. 3 shows a typical flow of a conventional ultrapure water production apparatus (subsystem).
超純水製造装置１は、純水槽２、循環ポンプ，、
流量設定弁４、流量計５、紫外線照射装置６、イ
オン交換樹脂が充填されたカートリツジポリシヤ
ー７、逆浸透膜又は限外濾過膜等からなる膜処理
装置８、ユースポイント９、圧力検出器１０、圧
力調節弁１１から構成され、純水槽２には、超純
水製造装置１の前段の純水製造装置（以下１次純
水製造装置と称す）における補給水ポンプ１２か
らの純水が給水されるとともに、液面変動による
環境からの汚染防止の目的から高純度窒素ガスが
封入されている。純水槽２内の純水は、循環ポン
プ３により順に紫外線照射装置６、カートリツジ
ポリシヤー７、膜処理装置８を経て殺菌処理及び
微粒子、有機物、イオン等の不純物の除去処理に
より超純水化され、ユースポイント９に給水され
て消費される。その際、循環ポンプ３から紫外線
照射装置６に向け供給される純水は、流量計５で
流量を検出しながら流量設定弁４により予め設定
した流量に調節されている。 The ultrapure water production device 1 includes a pure water tank 2, a circulation pump,
Flow rate setting valve 4, flow meter 5, ultraviolet irradiation device 6, cartridge polisher 7 filled with ion exchange resin, membrane treatment device 8 consisting of a reverse osmosis membrane or ultrafiltration membrane, etc., use point 9, pressure detector 10, a pressure regulating valve 11, and the pure water tank 2 receives pure water from the make-up water pump 12 in the pure water production device (hereinafter referred to as the primary pure water production device) in the previous stage of the ultrapure water production device 1. In addition to being supplied with water, it is also filled with high-purity nitrogen gas to prevent environmental pollution caused by fluctuations in the liquid level. The pure water in the pure water tank 2 is turned into ultrapure water by a circulation pump 3, which passes through an ultraviolet irradiation device 6, a cartridge polisher 7, and a membrane treatment device 8 in order, and sterilizes it and removes impurities such as fine particles, organic matter, and ions. water is supplied to use point 9 and consumed. At this time, the pure water supplied from the circulation pump 3 to the ultraviolet irradiation device 6 is adjusted to a preset flow rate by the flow rate setting valve 4 while the flow rate is detected by the flow meter 5.
一方、ユースポイント９での消費残の超純水は
圧力調節弁１１を径て純水槽２に戻るが、超純水
の消費量が変動してもユースポイント９における
超純水の吐出圧を必要な圧力に維持するために、
圧力検出器１０で圧力検出を行ない圧力調節弁１
１で設定圧力に調節している。 On the other hand, the remaining ultrapure water consumed at the use point 9 returns to the pure water tank 2 through the pressure control valve 11, but even if the amount of ultrapure water consumed changes, the discharge pressure of the ultrapure water at the use point 9 is To maintain the required pressure,
The pressure is detected by the pressure detector 10 and the pressure regulating valve 1 is
1 adjusts the pressure to the set pressure.
そして、純水槽２内の液面が所定値より下がつ
た分だけ補給水ポンプ１２から純水が補給され
る。 Then, pure water is replenished from the make-up water pump 12 by the amount that the liquid level in the deionized water tank 2 falls below a predetermined value.
ところで、このような超純水製造装置１におい
て、純水び超純水に滞留が生じると生菌が繁殖
し、そのために超純水の純度低下を招くので、純
水及び超純水の滞留を極力避ける配管としている
が、配管の工夫だけでは滞留の問題を解決できな
いことが指摘されている。 By the way, in such an ultrapure water production apparatus 1, if pure water or ultrapure water stagnates, viable bacteria will propagate, which will lead to a decrease in the purity of the ultrapure water. However, it has been pointed out that piping alone cannot solve the problem of stagnation.
つまり、超純水製造装置１は、ユースポイント
９での超純水消費量の変動を吸収するために、常
時純水を貯留しておく純水槽２を装備しているこ
とから、この純水槽２内で純水の滞留が生じ、運
転時間の増大とともに純水槽２内での生菌、微粒
子が増大する点である。 In other words, the ultrapure water production equipment 1 is equipped with a pure water tank 2 that constantly stores pure water in order to absorb fluctuations in the amount of ultrapure water consumed at the point of use 9. Purified water stagnates in the deionized water tank 2, and as the operating time increases, viable bacteria and fine particles in the deionized water tank 2 increase.
また、上記した滞留の問題とは別に、純水槽２
の液面変動により絶えず高純度窒素が消費される
という問題や、純水槽２の占有面積が超純水製造
装置１の中でかなりの割合を占めるという問題も
指摘されている。 In addition to the above-mentioned retention problem, the pure water tank 2
It has also been pointed out that high purity nitrogen is constantly consumed due to fluctuations in the liquid level, and that the area occupied by the pure water tank 2 occupies a considerable proportion of the ultrapure water production apparatus 1.
そこで、超純水製造装置１から純水槽２を徹去
した場合、ユースポイント９での超純水の消費量
は常に一定ではなく、大量に消費する時もあれば
全く消費しない時もあることから、消費の変動に
追従して流量の補正と、圧力の補正を迅速に行な
う必要がある。 Therefore, when the pure water tank 2 is removed from the ultrapure water production equipment 1, the amount of ultrapure water consumed at the use point 9 is not always constant, and there are times when a large amount is consumed and times when it is not consumed at all. Therefore, it is necessary to quickly correct the flow rate and pressure in accordance with fluctuations in consumption.
本発明は、このような観点に鑑みなされたもの
で、純水槽のない超純水製造装置において、ユー
スポイントでの超純水の要求される消費量を常に
満たすことができる超純水製造装置の制御方法を
提供することを目的とするものである。
The present invention was made in view of this point of view, and is an ultrapure water production device that does not have a pure water tank and can always meet the required consumption of ultrapure water at the point of use. The purpose of this invention is to provide a control method for
本発明の目的を達成するための要旨とするとこ
ろは、紫外線照射装置、イオン交換樹脂塔、膜処
理装置及び該紫外線照射装置の前段に配置される
循環ポンプ等からなり、該循環ポンプにより１次
純水をこれらに順次通水し超純水を製造しユース
ポイントに供給する第１の系と、該ユースポイン
トで未使用の超純水を該第１の系の循環ポンプの
入口側に戻すとともに、前段に配置される１次純
水製造装置の給水ポンプからの１次純水が供給さ
れる第２の系とを有する超純水製造装置におい
て、前記第１の系の循環ポンプの吐出流量を所定
流量に調節するか又は該第１の系の流量を検出し
て目標流量に該循環ポンプの回転数を制御すると
ともに、前記第２の系の圧力を検出し、第２の系
の圧力を目標圧力となるように前記１次純水製造
装置の給水ポンプの回転数を制御することを特徴
とする超純水製造装置の製造方法にある。
The gist of the present invention for achieving the purpose of the present invention is that it consists of an ultraviolet irradiation device, an ion exchange resin tower, a membrane treatment device, a circulation pump placed upstream of the ultraviolet irradiation device, etc. A first system that sequentially passes pure water through these to produce ultrapure water and supplies it to the use point, and returns unused ultrapure water at the use point to the inlet side of the circulation pump of the first system. and a second system to which primary pure water is supplied from the water supply pump of the primary pure water manufacturing apparatus disposed in the preceding stage, the discharge of the circulation pump of the first system. The flow rate is adjusted to a predetermined flow rate, or the flow rate of the first system is detected and the rotation speed of the circulation pump is controlled to the target flow rate, and the pressure of the second system is detected and the flow rate of the second system is controlled. A method for producing an ultrapure water production apparatus, characterized in that the rotation speed of a water supply pump of the primary pure water production apparatus is controlled so that the pressure becomes a target pressure.
以下本発明を図面に示す実施例に基づいて詳細
に説明する。
The present invention will be described in detail below based on embodiments shown in the drawings.
実施例 １
第１図は本発明の実施例１のフローを示してい
る。Embodiment 1 FIG. 1 shows the flow of Embodiment 1 of the present invention.
本実施例の超純水製造装置２０は、循環ポンプ
３、流量設定弁４、流量計５、紫外線照射装置
６、カートリツジポリシヤー７、膜処理装置８を
直列に接続して閉ループの循環系を構成し、ユー
スポイント９で消費した残りの超純水を循環ポン
プ３の入口側に戻すとともに、１次純水製造装置
の補給水ポンプ１２からの純水を循環ポンプ３に
直接供給している。なお、本実施例の補給水ポン
プ１２はインバータで回転数制御が行なわれる。 The ultrapure water production apparatus 20 of this embodiment has a closed loop circulation system in which a circulation pump 3, a flow rate setting valve 4, a flow meter 5, an ultraviolet irradiation device 6, a cartridge policyer 7, and a membrane treatment device 8 are connected in series. The remaining ultrapure water consumed at the use point 9 is returned to the inlet side of the circulation pump 3, and the pure water from the make-up water pump 12 of the primary pure water production device is directly supplied to the circulation pump 3. There is. Note that the rotation speed of the make-up water pump 12 of this embodiment is controlled by an inverter.
２１は循環ポンプ３の入口側圧力P1を検出す
る圧力検出器で、検出した循環ポンプ３の入口圧
力P1は、マイクロコンピユータ等からなる制御
装置２２に出力される。制御装置２２には目標圧
力P2が設定され、循環ポンプ３の入口側圧力P1
が目標圧力P2と等しくなるように補給水ポンプ
１２の回転数制御を行なう。なお、２３は補給水
ポンプ１２から超純水製造装置２０に補給される
純水が、誤つて循環ポンプ３、紫外線照射装置６
等を経ることなく直接ユースポイント９側に流れ
るのを防止するための逆止弁である。 21 is a pressure detector that detects the inlet pressure P 1 of the circulation pump 3, and the detected inlet pressure P 1 of the circulation pump 3 is output to a control device 22 consisting of a microcomputer or the like. A target pressure P 2 is set in the control device 22, and the inlet side pressure P 1 of the circulation pump 3
The rotation speed of the make-up water pump 12 is controlled so that the pressure becomes equal to the target pressure P2. Note that 23 indicates that the pure water supplied from the make-up water pump 12 to the ultrapure water production device 20 is mistakenly supplied to the circulation pump 3 and the ultraviolet irradiation device 6.
This is a check valve to prevent the water from flowing directly to the point of use 9 without passing through.
本実施例は循環水量に比べてユースポイント９
の一か所当たりの消費量が少ない場合を想定した
もので、この場合、循環ポンプ３に戻る水量の変
化が緩やかであること及びカートリツジポリシヤ
ー７、膜処理装置８等の圧力損失が短期的にみる
とほぼ一定であることから、流量設定弁４で流量
を設定することにより概一定の流量を確保でき、
ユースポイント９で要求される量の超純水を常に
供給することができることとなる。 This example has 9 use points compared to the amount of circulating water.
This is based on the assumption that the amount of water consumed per location is small, and in this case, the amount of water returned to the circulation pump 3 changes gradually and the pressure loss of the cartridge policyr 7, membrane treatment device 8, etc. is short-term. Considering that the flow rate is approximately constant, by setting the flow rate with the flow rate setting valve 4, an approximately constant flow rate can be ensured.
This means that the amount of ultrapure water required at use point 9 can always be supplied.
また、ユースポイント９での超純水の消費によ
り循環ポンプ(3)の入口圧力P1が変動するが、制
御装置２２により圧力検出器２１で検出した循環
ポンプ３の入口圧力P1が目標圧力P2と等しくな
るように補給水ポンプ１２の回転数制御を行なつ
てその変動分を補正し、ユースポイント９におけ
る超純水の吐出圧を常に目標圧力P2に維持する
ことができることとなる。 In addition, the inlet pressure P 1 of the circulation pump (3) fluctuates due to the consumption of ultrapure water at the use point 9, but the control device 22 sets the inlet pressure P 1 of the circulation pump 3 detected by the pressure detector 21 to the target pressure. By controlling the rotation speed of the make-up water pump 12 so that it is equal to P 2 and correcting the variation, it is possible to always maintain the ultrapure water discharge pressure at the point of use 9 at the target pressure P 2 . .
実施例 ２ 第２図は実施例２のフローを示している。Example 2 FIG. 2 shows the flow of the second embodiment.
上記の実施例１は流量設定弁４により循環ポン
プ３の吐出流量を設定しているが、本実施例の超
純水製造装置３０は、循環ポンプ３をインバータ
により回転数制御可能とするとともに、流量検出
器３１により循環ポンプ３の吐出流量Q1を検出
し、マイクロコンピユータ等からなる制御装置３
２に出力して循環ポンプ３の回転数制御を行な
い、循環流量を制御するようにしたもので、循環
ポンプ３の入口側圧力の制御は上記実施例１と同
様に制御装置３２により圧力検出器２１の検出圧
力P1と目標圧力P2との変動分を補給水ポンプ１
２の回転数制御で補正するようにしている。 In the first embodiment described above, the discharge flow rate of the circulation pump 3 is set by the flow rate setting valve 4, but in the ultrapure water production apparatus 30 of this embodiment, the rotation speed of the circulation pump 3 can be controlled by an inverter, and The flow rate detector 31 detects the discharge flow rate Q1 of the circulation pump 3, and the control device 3 consisting of a microcomputer etc.
2, the rotation speed of the circulation pump 3 is controlled, and the circulation flow rate is controlled.The pressure on the inlet side of the circulation pump 3 is controlled by the pressure detector 32 by the control device 32, as in the first embodiment. The variation between the detected pressure P 1 of 21 and the target pressure P 2 is calculated by the make-up water pump 1.
This is corrected by the rotation speed control in step 2.
制御装置３２は閉循環ループにおける目標流量
Q2が予め設定され、流量検出器３１で検出した
循環ポンプ３の吐出流量Q1と目標流量Q2とを比
較し、その変動分（Q2−Q1）を循環ポンプ３の
回転数制御で補正する。 The controller 32 controls the target flow rate in the closed circulation loop.
Q2 is set in advance, and the discharge flow rate Q1 of the circulation pump 3 detected by the flow rate detector 31 is compared with the target flow rate Q2 , and the variation ( Q2 - Q1 ) is used to control the rotation speed of the circulation pump 3. Correct with.
したがつて、本実施例によれば、ユースポイン
ト９おける超純水の消費量が大きく変動しても目
標流量Q2及び目標圧力P2に迅速に補正され、必
要とする量の超純水を給水することが可能とな
る。 Therefore, according to this embodiment, even if the consumption amount of ultrapure water at the use point 9 fluctuates greatly, it is quickly corrected to the target flow rate Q2 and target pressure P2 , and the required amount of ultrapure water is It becomes possible to supply water.
なお、上記した各実施例において、１次純水製
造装置については補給水ポンプ１２のみ説明した
が、例えば補給水ポンプ１２の前段又は後段にイ
オン交換樹脂塔、逆浸透膜又は限外濾過膜等の膜
処理装置を配置してもよい。 In each of the above-described embodiments, only the make-up water pump 12 has been described with respect to the primary pure water production apparatus, but for example, an ion exchange resin column, a reverse osmosis membrane, an ultrafiltration membrane, etc. may be installed before or after the make-up water pump 12. A membrane treatment device may also be installed.
また、超純水製造装置２０または３０は、循環
ポンプ３の後段に紫外線照射装置６を配置してい
るが、循環ポンプ３の後段にカートリツジポリシ
ヤー７を配置し、その後段に紫外線照射装置６お
よび膜処理装置８を配置するようにしてもよい。 In addition, the ultrapure water production apparatus 20 or 30 has an ultraviolet irradiation device 6 disposed after the circulation pump 3, but a cartridge polisher 7 is disposed after the circulation pump 3, and an ultraviolet irradiation device is disposed after the circulation pump 3. 6 and membrane treatment device 8 may be arranged.
以上説明してきたように、本発明によれば、ユ
ースポイントでの超純水の消費量変動を吸収する
ための純水槽を装備しなくても、ユースポイント
で要求される量の超純水を常に安定状態で供給す
ることが可能になるとともに全体の系において１
次純水の滞留がないので、高純度の超純水を供給
でき、また超純水製造装置のコンパクト化を図
れ、しかも純水槽に供給していた窒素ガスも不要
になる等の効果が得られる。
As explained above, according to the present invention, the amount of ultrapure water required at the point of use can be obtained without equipping a pure water tank to absorb fluctuations in the amount of ultrapure water consumed at the point of use. It is possible to always supply in a stable state, and the entire system has 1
Since there is no accumulation of secondary pure water, it is possible to supply highly pure ultrapure water, and the ultrapure water production equipment can be made more compact. Moreover, the nitrogen gas that was previously supplied to the pure water tank is no longer necessary. It will be done.
第１図は本発明方法を実施する超純水製造装置
の実施例１のフロー、第２図は実施例２のフロ
ー、第３図は従来の超純水製造装置のフローを示
している。
１…超純水製造装置、２…純水槽、３…循環ポ
ンプ、４…流量設定弁、５…流量計、６…紫外線
照射装置、７…カートリツジポリシヤー、８…膜
処理装置、９…ユースポイント、１０…圧力検出
器、１１…圧力調節弁、１２…補給水ポンプ、２
０，３０…超純水製造装置、２１…圧力検出器、
３１…流量検出器。
FIG. 1 shows a flow of a first embodiment of an ultrapure water production apparatus that implements the method of the present invention, FIG. 2 shows a flow of a second embodiment, and FIG. 3 shows a flow of a conventional ultrapure water production apparatus. DESCRIPTION OF SYMBOLS 1... Ultrapure water production device, 2... Pure water tank, 3... Circulation pump, 4... Flow rate setting valve, 5... Flow meter, 6... Ultraviolet irradiation device, 7... Cartridge polisher, 8... Membrane processing device, 9... Point of use, 10...Pressure detector, 11...Pressure control valve, 12...Makeup water pump, 2
0, 30... Ultrapure water production device, 21... Pressure detector,
31...Flow rate detector.
Claims (1)
装置及び該紫外線照射装置の前段に配置される循
環ポンプ等からなり、該循環ポンプにより１次純
水をこれらに順次通水し超純水を製造しユースポ
イントに供給する第１の系と、 該ユースポイントで未使用の超純水を該第１の
系の循環ポンプの入口側に戻すとともに、前段に
配置される１次純水製造装置の給水ポンプからの
１次純水が供給される第２の系とを有する超純水
製造装置において、 前記第１の系の循環ポンプの吐出流量を所定流
量に調節するか又は該第１の系の流量を検出して
目標流量に該循環ポンプの回転数を制御するとと
もに、前記第２の系の圧力を検出し、該第２の系
の圧力を目標圧力となるように前記１次純水製造
装置の給水ポンプの回転数を制御することを特徴
とする超純水製造装置の制御方法。[Scope of Claims] 1 Consists of an ultraviolet irradiation device, an ion-exchange resin tower, a membrane treatment device, and a circulation pump placed upstream of the ultraviolet irradiation device, and the circulation pump sequentially passes primary pure water through these. a first system that produces ultrapure water and supplies it to the use point, and a first system that returns unused ultrapure water at the use point to the inlet side of the circulation pump of the first system, and a In an ultrapure water production apparatus having a second system to which primary pure water is supplied from a water supply pump of the secondary pure water production apparatus, the discharge flow rate of the circulation pump of the first system is adjusted to a predetermined flow rate. Alternatively, the flow rate of the first system is detected and the rotation speed of the circulation pump is controlled to a target flow rate, and the pressure of the second system is detected and the pressure of the second system is adjusted to the target pressure. A method for controlling an ultrapure water production apparatus, comprising controlling the rotation speed of a water supply pump of the primary pure water production apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62192142A JPS6438185A (en) | 1987-07-31 | 1987-07-31 | Controlling method for ultrapure water producing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62192142A JPS6438185A (en) | 1987-07-31 | 1987-07-31 | Controlling method for ultrapure water producing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6438185A JPS6438185A (en) | 1989-02-08 |
| JPH0450072B2 true JPH0450072B2 (en) | 1992-08-13 |
Family
ID=16286390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62192142A Granted JPS6438185A (en) | 1987-07-31 | 1987-07-31 | Controlling method for ultrapure water producing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6438185A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020076881A (en) * | 2001-03-31 | 2002-10-11 | 제이에이비에이코리아(주) | Movement condition displaying method for Reverse-Osmosis and Ultra-Pure manufacturing system and movement condition displaying device thereof |
| JP2023008823A (en) * | 2021-07-02 | 2023-01-19 | オルガノ株式会社 | Pure water production apparatus and its operational method |
| JP7584574B1 (en) * | 2023-06-15 | 2024-11-15 | 野村マイクロ・サイエンス株式会社 | Liquid Circulation System |
-
1987
- 1987-07-31 JP JP62192142A patent/JPS6438185A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6438185A (en) | 1989-02-08 |
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| LAPS | Cancellation because of no payment of annual fees |