JPH0450801U - - Google Patents

Info

Publication number
JPH0450801U
JPH0450801U JP9269290U JP9269290U JPH0450801U JP H0450801 U JPH0450801 U JP H0450801U JP 9269290 U JP9269290 U JP 9269290U JP 9269290 U JP9269290 U JP 9269290U JP H0450801 U JPH0450801 U JP H0450801U
Authority
JP
Japan
Prior art keywords
beams
substrate
substrate holder
interference exposure
beam interference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9269290U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9269290U priority Critical patent/JPH0450801U/ja
Publication of JPH0450801U publication Critical patent/JPH0450801U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、本考案の１具体例である二光束干渉
露光装置の概念図、第２図は従来装置の概念図、
第３図は干渉部分の拡大説明図である。 FIG. 1 is a conceptual diagram of a two-beam interference exposure apparatus that is a specific example of the present invention, and FIG. 2 is a conceptual diagram of a conventional apparatus.
FIG. 3 is an enlarged explanatory diagram of the interference portion.

Claims (1)

【実用新案登録請求の範囲】 (1) 写真乾板あるいは感光剤を塗布した基板に
、任意の交叉角を持つ二光束による干渉縞を露光
する二光束干渉露光装置において、光源と、該光
源から照射されたビームを平行な二光束に分割す
る分割手段と、分割された一方の光束を反射する
ための平板状ミラーを設け、写真乾板あるいは感
光剤を塗布した基板と直交するように該平板状ミ
ラーを基板ホルダーに結合させ、回転機構及び直
線移動機構を該基板ホルダーに付設したことを特
徴とする二光束干渉露光装置。 (2) 請求項(1)記載の二光束干渉露光装置におい
て、基板ホルダーの移動機構として、基板表面の
二光束の交点を回転中心とする回転機構を用いた
ことを特徴とする二光束干渉露光装置。[Scope of Claim for Utility Model Registration] (1) A two-beam interference exposure device that exposes a photographic plate or a substrate coated with a photosensitizer with interference fringes by two beams having an arbitrary intersecting angle; A splitting means for splitting the resulting beam into two parallel beams, and a flat mirror for reflecting one of the divided beams are provided, and the flat mirror is arranged perpendicularly to a photographic plate or a substrate coated with a photosensitizer. A two-beam interference exposure apparatus characterized in that: is coupled to a substrate holder, and a rotation mechanism and a linear movement mechanism are attached to the substrate holder. (2) A two-beam interference exposure apparatus according to claim (1), characterized in that the substrate holder is moved by a rotation mechanism whose center of rotation is the intersection of two light beams on the surface of the substrate. Device.
JP9269290U 1990-09-05 1990-09-05 Pending JPH0450801U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9269290U JPH0450801U (en) 1990-09-05 1990-09-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9269290U JPH0450801U (en) 1990-09-05 1990-09-05

Publications (1)

Publication Number Publication Date
JPH0450801U true JPH0450801U (en) 1992-04-28

Family

ID=31829352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9269290U Pending JPH0450801U (en) 1990-09-05 1990-09-05

Country Status (1)

Country Link
JP (1) JPH0450801U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6169021A (en) * 1984-09-12 1986-04-09 Sharp Corp Optical device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6169021A (en) * 1984-09-12 1986-04-09 Sharp Corp Optical device

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