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Priority to JP17846086UpriorityCriticalpatent/JPH0451409Y2/ja
Publication of JPS6383754UpublicationCriticalpatent/JPS6383754U/ja
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Publication of JPH0451409Y2publicationCriticalpatent/JPH0451409Y2/ja
Utilisation d'une couche de masquage sacrificielle et de l'exposition de la face arriere dans la formation d'ouvertures destinees a recevoir une matiere photoemettrice et structure photoemettrice associee
Dispositif emetteur d'electrons; procede de fabrication de ce dispositif; source d'electrons et appareil de visualisation comportant ce type de dispositif