JPH0451499B2 - - Google Patents
Info
- Publication number
- JPH0451499B2 JPH0451499B2 JP18430184A JP18430184A JPH0451499B2 JP H0451499 B2 JPH0451499 B2 JP H0451499B2 JP 18430184 A JP18430184 A JP 18430184A JP 18430184 A JP18430184 A JP 18430184A JP H0451499 B2 JPH0451499 B2 JP H0451499B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon dioxide
- amorphous silicon
- dioxide powder
- component
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 58
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000001354 calcination Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 4
- 230000008014 freezing Effects 0.000 claims description 2
- 238000007710 freezing Methods 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000018044 dehydration Effects 0.000 claims 1
- 238000006297 dehydration reaction Methods 0.000 claims 1
- 239000011863 silicon-based powder Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 21
- 239000011734 sodium Substances 0.000 description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- 239000002994 raw material Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 238000004017 vitrification Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000007872 degassing Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000011049 filling Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
Landscapes
- Glass Compositions (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は真空溶融法によつて透明な石英ガラス
製造するに適した材料に関するもののである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a material suitable for producing transparent quartz glass by a vacuum melting method.
従来工業的規模で透明石英ガラスを製造する方
法としてベルヌーイ法あるいは真空溶融法が知ら
れている。ベルヌーイ法は水晶粉又は非晶質二酸
化珪素粉をアルゴン−酸素プラズマ炎あるいは酸
水素炎等の炎中に供給して溶融させ、透明石英ガ
ラスを得るものであり、また真空溶融法は水晶粉
をグラフアイト製ルツボに入れ真空下で長時間焼
結溶融することにより透明石英ガラスを得るもの
である。
Conventionally, the Bernoulli method or the vacuum melting method is known as a method for producing transparent quartz glass on an industrial scale. In the Bernoulli method, crystal powder or amorphous silicon dioxide powder is fed into a flame such as an argon-oxygen plasma flame or an oxyhydrogen flame and melted to obtain transparent quartz glass, and in the vacuum melting method, crystal powder is Transparent quartz glass is obtained by placing it in a graphite crucible and sintering and melting it under vacuum for a long time.
しかし、ベルヌーイ法では、原料供給の速さに
限度がある等のことから生ずる生産性の悪さ、あ
るいは純度のよい製品を得るにはエネルギーコス
トが高くなるなどの不都合点があり、また真空溶
融法では、前記ベルヌーイ法に比し、泡が多く高
純度のもののが期待できず、水晶粉を使用してい
るため原料供給に難点がある。
However, the Bernoulli method has disadvantages such as poor productivity due to limitations on the speed of raw material supply, and high energy costs to obtain products with good purity, and the vacuum melting method However, compared to the Bernoulli method, there are many bubbles and high purity cannot be expected, and since quartz powder is used, it is difficult to supply raw materials.
このように透明石英ガラスを得るための原料と
しては非晶質二酸化珪素粉又は水晶粉が通常用い
られ、非晶質二酸化珪素粉を原料とす場合は純度
の高いものが要求され、殊にNa等溶融過程にお
いて結晶化をもたらす不純物の存在は好ましくな
いとされていた。 In this way, amorphous silicon dioxide powder or quartz powder is usually used as a raw material to obtain transparent quartz glass, and when amorphous silicon dioxide powder is used as a raw material, high purity is required, especially Na The presence of impurities that cause crystallization during the isomelting process was considered undesirable.
本発明者等は上記の如き実情に鑑み種々考究し
た結果、資源的制約のない非晶質二酸化珪素粉を
原料とした真空溶融法による透明石英ガラスの製
造法を見出した。この方法は、非晶質二酸化珪素
粉を加熱して結晶化させると共に焼結して焼結体
を得、ついでこれを真空下溶融してガラス化させ
ることを特徴とするものであり、本発明はこれを
実施するに好適な材料を提供することを目的とす
るものである。 As a result of various studies in view of the above-mentioned circumstances, the present inventors have discovered a method for producing transparent quartz glass using a vacuum melting method using amorphous silicon dioxide powder as a raw material without resource constraints. This method is characterized by heating amorphous silicon dioxide powder to crystallize it and sintering it to obtain a sintered body, which is then melted under vacuum to vitrify it, and the present invention The purpose of the present invention is to provide materials suitable for carrying out this method.
本発明は、上記目的を達成するため、第１発明
は、非晶質二酸化珪素粉を仮焼して焼結体を得、
これを真空溶融によりガラス化させるに際し、結
晶化し成型化された焼結体とするため、前記非晶
質二酸化珪素粉をNa成分の含有溶液中に混合せ
しめて、重量比で100ppm以上のNa成分を前記非
晶質二酸化珪素粉に付着せしめてなる透明石英ガ
ラス用材料であり、第２発明は、非晶質二酸化珪
素粉を仮焼して焼結体を得、ついでこれを真空下
で溶融してガラス化させる透明石英ガラス製造法
に使用される材料であつて、前記非晶質二酸化珪
素粉をNa成分の含有溶液中に混合せしめて重量
比で100ppm以上のNa成分が付着するようにした
後、Na成分及び非晶質二酸化珪素粉を含む溶液
を凍結し、ついで脱水、乾燥せしめ、該焼結体が
適度な基持強度をもち、かつ脱ガス容易となるよ
う、粒度調整されてなる透明石英ガラス用材料で
ある。
In order to achieve the above-mentioned object, the present invention provides a first aspect of the present invention, which includes obtaining a sintered body by calcining amorphous silicon dioxide powder;
When vitrifying this by vacuum melting, in order to crystallize and form a sintered body, the amorphous silicon dioxide powder is mixed into a solution containing Na component, and the Na component is 100 ppm or more by weight. is a transparent quartz glass material made by adhering to the amorphous silicon dioxide powder, the second invention is a material for transparent quartz glass, which is obtained by calcining the amorphous silicon dioxide powder to obtain a sintered body, and then melting this in a vacuum. A material used in a method for producing transparent quartz glass in which the amorphous silicon dioxide powder is vitrified by mixing the amorphous silicon dioxide powder into a solution containing a Na component so that a Na component of 100 ppm or more by weight is attached. After that, the solution containing Na component and amorphous silicon dioxide powder is frozen, then dehydrated and dried, and the particle size is adjusted so that the sintered body has appropriate base strength and is easily degassed. This is a material for transparent quartz glass.
本発明に使用されるNa成分は、水酸化ナトリ
ウムあるいはナトリウムを含む各種塩類等の化合
物であつて、均一に溶解されるものであれば良
い。 The Na component used in the present invention may be a compound such as sodium hydroxide or various salts containing sodium, as long as it can be uniformly dissolved.
以下本発明の詳細について説明すると、前記し
たように本発明者等が別途開発した透明石英ガラ
スの製造法は、従来方法の如く、非晶質二酸化珪
素粉又は水晶粉等の原料を直接ガラス化せしめる
ものではなく、原料粉を結晶化した焼結体を得る
仮焼プロセス真空下で焼結体を加熱溶融してガラ
ス化させることを特徴とする。即ち、非晶質二酸
化珪素粉を適宜な容器に充填した後、加熱し、焼
結化して成型物を得、ついでこれを真空加熱炉で
減圧下加熱し、不純物を除去して溶融せしめガラ
ス化させることにあり、これによつて従来の如く
原料粉を直接ガラス化させる方法に比し、生産性
が大幅に向上する比較的大型のインゴツトが得ら
れる等の効果をもたらす。
The details of the present invention will be explained below.As mentioned above, the method for manufacturing transparent quartz glass, which was separately developed by the present inventors, is similar to the conventional method, by directly vitrifying raw materials such as amorphous silicon dioxide powder or quartz powder. The calcination process for obtaining a sintered body by crystallizing raw material powder is characterized by heating and melting the sintered body under vacuum to vitrify it. That is, after filling a suitable container with amorphous silicon dioxide powder, it is heated and sintered to obtain a molded product, which is then heated in a vacuum heating furnace under reduced pressure to remove impurities and melted to form a vitrified product. Compared to the conventional method of directly vitrifying raw material powder, this method has the advantage of greatly improving productivity and producing relatively large ingots.
従つてこの方法を実施する上で重要なことは、
仮焼プロセススにおける成型化された焼結体が、
ガラス化工程において充分な脱ガスが可能なもの
でしかもこれが製造できることである。 Therefore, the important thing in implementing this method is that
The molded sintered body in the calcination process is
It is possible to produce sufficient degassing during the vitrification process.
本発明者等は上記事情に鑑み、種々考究した結
果、焼結体を結晶質の状態で得ること、即ち非晶
質二酸化珪素を加熱により、容易に結晶かつ焼結
化せしめるため予め非晶質二酸化珪素粉にNa成
分を重量比で100ppm以上含有させること、そし
て該Na成分はガラス化のため溶庸する真空下で
処理し、除去する方法によつて前記要求を満足せ
しめることを見出した。前記したように従来方法
においては、結晶化のプロセスはないから原料と
して使用される非晶質二酸化珪素粉中には結晶化
に起因する成分は不純物として積極的に除去され
るか、かかる不純物を含まない材料が選択され
る。しかし、本発明においては結晶化のためNa
成分を含むことが必須要件であり、従来概念によ
れば、純度の高い透明石英ガラスを得ることと、
原料中に不純物を添加する、もしくは純度の低い
非晶質二酸化珪素を選択使用することとは相反す
ることになるが、添加されたNa成分は仮焼プロ
セススによつて得られる焼結体を結晶化すると共
に多孔質に富むものに形成することにより真空下
で加熱した際容易に除去できる。 In view of the above circumstances, the present inventors have conducted various studies and found that it is possible to obtain a sintered body in a crystalline state, that is, to easily crystallize and sinter the amorphous silicon dioxide by heating the amorphous silicon dioxide. It has been found that the above requirements can be met by making the silicon dioxide powder contain Na component in a weight ratio of 100 ppm or more, and by removing the Na component by treating it under vacuum to dissolve it for vitrification. As mentioned above, in the conventional method, there is no crystallization process, so components caused by crystallization in the amorphous silicon dioxide powder used as a raw material are actively removed as impurities, or such impurities are Materials that do not contain are selected. However, in the present invention, Na
According to the conventional concept, it is necessary to obtain transparent quartz glass with high purity.
Although it is contradictory to adding impurities to the raw material or selectively using low-purity amorphous silicon dioxide, the added Na component increases the sintered body obtained by the calcination process. By crystallizing and forming a highly porous material, it can be easily removed when heated under vacuum.
本発明は上記した透明石英ガラスの製造法を実
施するに適した材料であり、以下に実施例を述べ
る。 The present invention is a material suitable for carrying out the above-described method for producing transparent quartz glass, and examples thereof will be described below.
実験例
内容積13のステンレス製円筒容器に脱イオン
水５を入れ、常温、常圧下で脱イオン水を撹拌
しつつ非晶質二酸化珪素粉500ｇを加えて、水−
二酸化珪素混合系を得た。つぎにNa成分を
NaOHの形で添加混合する。この場合、Na成分
の添加量は、二酸化珪素に付着するNa成分が、
最終的に重量比で約1000ppmとなるよう調整さ
れ、そのために水−二酸化珪素混合系に2300ppm
のNa成分を１規定NaOHの形で50ml添加した。
これによつて、非晶質二酸化珪素にNaが均一に
イオンとして付着する。ついでこの混合系を約60
分撹拌操作した後、フイルタープレスによつて固
液分離し、さらに乾燥処理を行つて、、二酸化珪
素粉にNa成分が重量比で1000ppm程度物理吸着
もしくは化学結合された粉体が得られた。Experimental example: Pour 5 liters of deionized water into a stainless steel cylindrical container with an internal volume of 13, and add 500 g of amorphous silicon dioxide powder while stirring the deionized water at room temperature and pressure.
A silicon dioxide mixed system was obtained. Next, add Na component
Add and mix in the form of NaOH. In this case, the amount of Na component added is such that the Na component attached to silicon dioxide is
The final weight ratio was adjusted to approximately 1000ppm, and for that purpose, 2300ppm was added to the water-silicon dioxide mixture system.
50 ml of Na component was added in the form of 1N NaOH.
As a result, Na is uniformly attached to the amorphous silicon dioxide as ions. Next, add this mixture to about 60
After stirring for several minutes, solid-liquid separation was performed using a filter press, followed by drying to obtain a powder in which about 1000 ppm of Na components were physically adsorbed or chemically bonded to the silicon dioxide powder by weight.
次に得られた粉体の粒径も前記製造法を効果的
ならしめるために大きな隣因となる。即ち、真空
下でガラス化する際脱ガスが容易な多孔質に富む
焼結体を得ることが望ましいが、通常得られる非
晶質約0.2μｍが微粉状態であるが故に焼結が急速
に進行し、密な焼結体が出来易くなる。極めて密
な焼結体によつて真空下ガラス化すると、脱ガス
が不充分なため、純度の高いものが得られ難くな
る。従つて望しくは比較的ゆるやかな焼結体を得
ることであり、このため本発明では前記Na成分
の添加調整工程において、脱イオン水中に非晶質
二酸化珪素粉の分散系を生成せしめた後NaOH
を所望量添加して混合した後、冷凍庫等に格納し
て凍結させる。これにより溶液中の非晶質二酸化
珪素粉は、凝集し、当初の粒径より大きな粒子が
生成される。この凍結物はついで解凍されるが、
解凍手段は自然解凍してもよいし、解凍液が沸騰
しない程度に加熱してもよい。完全に解凍される
と凍結前に分散系であつたものが、固液二相に分
離されるので底部に留つたスラリー状物を取出し
適宜脱水した後、乾燥庫等に入れて乾操させる。
得られた乾燥粉体は部分的に柔かに固まつた状態
にあるので簡単な破砕手段により解粒する。通常
得られる非晶質二酸化珪素粉は、0.01〜1φμｍ程
度であるが、前記処理により大部分が50〜500φμ
ｍのものが得られる。 Next, the particle size of the obtained powder is also a major factor in making the above manufacturing method effective. That is, it is desirable to obtain a highly porous sintered body that can be easily degassed during vitrification under vacuum, but since the amorphous material usually obtained is in the form of a fine powder of approximately 0.2 μm, sintering progresses rapidly. This makes it easier to form a dense sintered body. If an extremely dense sintered body is vitrified under vacuum, degassing will be insufficient, making it difficult to obtain a product of high purity. Therefore, it is desirable to obtain a relatively loose sintered body, and for this reason, in the present invention, in the addition adjustment step of the Na component, after forming a dispersion system of amorphous silicon dioxide powder in deionized water. NaOH
After adding and mixing the desired amount, store in a freezer or the like and freeze. As a result, the amorphous silicon dioxide powder in the solution aggregates, producing particles larger than the original particle size. This frozen material is then thawed,
The thawing means may be used to thaw naturally or to heat the thawed liquid to such an extent that it does not boil. When completely thawed, the dispersed system before freezing is separated into two solid-liquid phases, so the slurry that remains at the bottom is removed, dehydrated as appropriate, and then placed in a drying cabinet or the like for drying.
Since the obtained dry powder is partially soft and solidified, it is pulverized by simple crushing means. Normally obtained amorphous silicon dioxide powder has a diameter of about 0.01 to 1φμm, but by the above treatment, most of the powder has a diameter of 50 to 500μm.
m can be obtained.
このようにして得られた二酸化珪素粉を、内径
120mm、高さ150mmのムライト質でなる円筒容器に
充填した後、電気炉で1100℃まで加熱した。これ
により76mmφ×91mmのクリストバライト結晶相を
持つ円柱状の焼結体が得られたので、これを500
℃以上に保持して真空加熱炉に搬入し、0.5mb以
下の真空下で1750℃まで加熱してガラス化した。
この時の昇温バランスとしては1600℃まで３時
間、1750℃で１時間であり、これにより80mmφ×
45mmで重量約500ｇの透明な石英ガラスを得た。 The silicon dioxide powder obtained in this way was
After filling a cylindrical container made of mullite with a diameter of 120 mm and a height of 150 mm, the mixture was heated to 1100°C in an electric furnace. As a result, a cylindrical sintered body with a cristobalite crystal phase of 76 mmφ x 91 mm was obtained.
It was maintained at a temperature above ℃ and carried into a vacuum heating furnace, and heated to 1750 ℃ under a vacuum of 0.5 mb or less to vitrify it.
The temperature increase balance at this time is 3 hours to 1600℃ and 1 hour to 1750℃, which allows 80mmφ×
A transparent quartz glass with a diameter of 45 mm and a weight of approximately 500 g was obtained.
本発明に係る透明石英ガラス用材料は以上の説
明から明らかなように、非晶質二酸化珪素粉に
Na成分を重量比で100ppm以上含ませたものであ
るから結晶化された焼結体が容易に得られるので
これを真空下加熱溶融することにより純度のよい
透明石英ガラスが製造できる。又粒度を比較的大
径になるよう処理したので、ガラス化程における
脱ガスが一層効率的に行え、品質が更に向上す
る。
As is clear from the above explanation, the material for transparent quartz glass according to the present invention is made of amorphous silicon dioxide powder.
Since it contains a Na component of 100 ppm or more by weight, a crystallized sintered body can be easily obtained, and transparent quartz glass with good purity can be produced by heating and melting this in a vacuum. Furthermore, since the particle size is treated to be relatively large, degassing during the vitrification process can be performed more efficiently, further improving quality.
Claims (1)
ついでこれを真空下で溶融してガラス化させる透
明石英ガラス製造法に使用される材料であつて、
前記非晶質二酸化珪素粉をNa成分の含有溶液中
に混合せしめて、重量比で100ppm以上のNa成分
を前記非晶質二酸化珪素粉に付着せしめてなるこ
とを特徴とする透明石英ガラス用材料。 ２ 非晶質二酸化珪素粉を仮焼して焼結体を得、
ついでこれを真空下で溶融してガラス化させる透
明石英ガラス製造法に使用される材料であつて、
前記非晶質二酸化珪素粉をNa成分の含有溶液中
に混合せしめて、重量比で100ppm以上のNa成分
を前記非晶質二酸化珪素粉に付着するようにした
後、Na成分及び非晶質二酸化珪素粉含む溶液を
凍結し、ついで脱水、乾燥せしめてなることを特
徴とする透明石英ガラス用材料。[Claims] 1. Obtaining a sintered body by calcining amorphous silicon dioxide powder,
It is a material used in a transparent quartz glass manufacturing method in which it is then melted and vitrified under vacuum.
A material for transparent quartz glass, characterized in that the amorphous silicon dioxide powder is mixed in a solution containing a Na component, and a Na component of 100 ppm or more by weight is attached to the amorphous silicon dioxide powder. . 2 Calcinate amorphous silicon dioxide powder to obtain a sintered body,
It is a material used in a transparent quartz glass manufacturing method in which it is then melted and vitrified under vacuum.
The amorphous silicon dioxide powder is mixed in a solution containing Na component so that Na component of 100 ppm or more by weight is attached to the amorphous silicon dioxide powder, and then the Na component and the amorphous silicon dioxide are mixed. A material for transparent quartz glass, which is obtained by freezing a solution containing silicon powder, followed by dehydration and drying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18430184A JPS6163537A (en) | 1984-09-03 | 1984-09-03 | Material for transparent quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18430184A JPS6163537A (en) | 1984-09-03 | 1984-09-03 | Material for transparent quartz glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6163537A JPS6163537A (en) | 1986-04-01 |
| JPH0451499B2 true JPH0451499B2 (en) | 1992-08-19 |
Family
ID=16150934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18430184A Granted JPS6163537A (en) | 1984-09-03 | 1984-09-03 | Material for transparent quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6163537A (en) |
-
1984
- 1984-09-03 JP JP18430184A patent/JPS6163537A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6163537A (en) | 1986-04-01 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |