JPH0452215A - Vacuum furnace and temperature equalization method in vacuum furnace - Google Patents

Vacuum furnace and temperature equalization method in vacuum furnace

Info

Publication number
JPH0452215A
JPH0452215A JP16045590A JP16045590A JPH0452215A JP H0452215 A JPH0452215 A JP H0452215A JP 16045590 A JP16045590 A JP 16045590A JP 16045590 A JP16045590 A JP 16045590A JP H0452215 A JPH0452215 A JP H0452215A
Authority
JP
Japan
Prior art keywords
heaters
treated
temperature
vacuum
vacuum furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16045590A
Other languages
Japanese (ja)
Other versions
JP3082211B2 (en
Inventor
Masatomo Nakamura
雅知 中村
Yoichi Nakanishi
洋一 中西
Koji Matsui
宏司 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP02160455A priority Critical patent/JP3082211B2/en
Publication of JPH0452215A publication Critical patent/JPH0452215A/en
Application granted granted Critical
Publication of JP3082211B2 publication Critical patent/JP3082211B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Control Of Resistance Heating (AREA)
  • Powder Metallurgy (AREA)
  • Furnace Details (AREA)
  • Control Of Temperature (AREA)

Abstract

PURPOSE:To uniformize temp. distribution of the whole material to be treated by individually arranging calorific value adjustor to plural heaters for heating the material to be treated and individual deflection setter for giving the deflection to calorific value of the heater between the calorific value adjustor and temp. detector for the material to be treated. CONSTITUTION:By conducting electric power to the heaters 12a-12f after vacuum evacuating the vacuum vessel 2, the heat is generated with these and the material 3 to be treated is heated mainly with radiation and transfer of the heat from the heaters 12a-12f. Then, temp. of the material 31 to be treated is detected with the temp. detector 13 and based on these signals, current adjustor 26 is controlled through the temp. adjustor 28 and the deflection setter 29 to control output of each heater 12a-12f. Further, control of the outputs to these heaters 12a-12f is executed under condition of giving the deflection preset to the deflection setter 29. Therefore, the material 31 to be treated set in the setting space 11 is heated to almost uniform temp. at the every parts.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は種々の被処理材に焼入や焼戻或いは焼結、焼
成などの熱処理を施す為に用いられる真空炉及びその真
空炉における温度均一化方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vacuum furnace used for subjecting various materials to heat treatment such as quenching, tempering, sintering, and firing, and a method for controlling the temperature in the vacuum furnace. Concerning a homogenization method.

[従来の技術] この種の炉においては、例えば真空容器内において被処
理材の存置空間の上面側と下面側に夫々ヒータが配設さ
れると共に、被処理材の温度を検出する為の温度検出器
が設けられ、その検出値に基づいて上記ヒータの発熱量
制御が行われる。
[Prior Art] In this type of furnace, for example, heaters are provided on the upper surface side and the lower surface side of the space where the material to be treated is placed in a vacuum container, and a temperature sensor is installed to detect the temperature of the material to be treated. A detector is provided, and the amount of heat generated by the heater is controlled based on the detected value.

[発明が解決しようとする課題] このような従来の真空炉では被処理材は上面と下面とか
ら加熱されるのみである為、側面側の加熱が充分でなく
、上面側や下面側との温度差が大きくなる問題点があっ
た。そこで上記側面側にもヒータと温度検出器とを設け
、その温度検出器による検出値に基づいて該側面側のヒ
ータを制御する技術が案出された。このような技術は、
被処理材の全体の温度の均一化を向上させる上において
好ましい。しかし温度検出器の数が増加すればそれの制
御網が極めて複雑となってしまう問題点がある。
[Problems to be Solved by the Invention] In such conventional vacuum furnaces, the material to be processed is heated only from the top and bottom surfaces, so the side surfaces are not sufficiently heated, and there is a There was a problem that the temperature difference became large. Therefore, a technique has been devised in which a heater and a temperature detector are also provided on the side surface side, and the heater on the side surface side is controlled based on the detected value by the temperature sensor. Such technology is
This is preferable in terms of improving uniformity of the temperature of the entire material to be treated. However, there is a problem in that as the number of temperature detectors increases, the control network becomes extremely complex.

本発明は上記従来技術の問題点(技術的謀B)を解決す
る為になされたもので、一つの温度検出器からの検出値
でもって、複数のヒータの発熱量を相互に偏差を持たせ
た状態で制御することにより、簡易な制御網でもって被
処理材の温度分布の均一化を向上させた状態での加熱を
行い得るようにした真空炉及び真空炉における温度均一
化方法を提供することを目的とする。
The present invention was made in order to solve the problem (technical plan B) of the prior art described above, and uses the detected value from one temperature sensor to create a deviation in the amount of heat generated by a plurality of heaters. To provide a vacuum furnace and a temperature uniformization method in a vacuum furnace, which can perform heating in a state in which the temperature distribution of a material to be treated is improved with a simple control network by controlling the material in a state in which the temperature is uniform. The purpose is to

[課題を解決する為の手段] 上記目的を達成する為に、本願発明の真空炉は、内部に
被処理材の存置空間を有する真空容器内においては、上
記存置空間の周囲に夫々上記存置空間に存置される被処
理材を加熱する為の複数のヒータを備えている真空炉に
おいて、上記各ヒータの給電経路には発熱量調節器を夫
々個別に介設し、それらの発熱量調節器と真空容器内の
被処理材の温度を検出する為に真空容器内に設けられた
温度検出器との間には、上記複数のヒータの発熱量に偏
差を持たせ得るよう夫々個別の偏差設定器を介設したも
のである。
[Means for Solving the Problems] In order to achieve the above object, the vacuum furnace of the present invention provides, in a vacuum container having a storage space for a material to be treated inside, the storage spaces around the storage space. In a vacuum furnace equipped with a plurality of heaters for heating the material to be processed, which is placed in the A separate deviation setting device is installed between the temperature detector installed in the vacuum container to detect the temperature of the material to be processed in the vacuum container so as to allow deviation in the amount of heat generated by the plurality of heaters. This is an intervention.

[作用] 被処理材には上面側、下面側及び側面側の各ヒータから
熱が与えられて、その全体の温度分布の均一化が向上さ
れる。その加熱の場合、温度検出器によって被処理材の
温度が検出され、その検出値に基づいて複数のヒータの
発熱量が制御される。
[Function] Heat is applied to the material to be treated from the heaters on the upper surface side, lower surface side, and side surface side, and the uniformity of the temperature distribution over the entire surface is improved. In the case of heating, the temperature of the material to be treated is detected by a temperature detector, and the amount of heat generated by the plurality of heaters is controlled based on the detected value.

該′vI御の場合、一つの温度検出器による検出値に基
づき、複数のヒータの発熱量が予め偏差設定器に設定さ
れた偏差を持たせた状態で制御される。
In the case of the 'vI control, the amount of heat generated by the plurality of heaters is controlled with a deviation set in advance in a deviation setting device based on a value detected by one temperature detector.

その結果、被処理材をその全体の温度を均一化した状態
で加熱できる。
As a result, the material to be processed can be heated with the entire temperature being made uniform.

「実施例コ 以下本願の実施例を示す図面について説明する。"Example code" The drawings showing the embodiments of the present application will be described below.

第1.2図において、1は真空炉を示す。2は真空容器
で、本体3とその本体3の出入口に設けた扉4とから構
成しである。5は断熱壁で、本体6とその本体6の出入
口に設けた扉7とから構成され、その内側の空間が熱処
理室8となっている。
In Figure 1.2, 1 indicates a vacuum furnace. Reference numeral 2 denotes a vacuum container, which is composed of a main body 3 and a door 4 provided at the entrance/exit of the main body 3. Reference numeral 5 denotes a heat insulating wall, which is composed of a main body 6 and a door 7 provided at the entrance/exit of the main body 6, and the space inside thereof serves as a heat treatment chamber 8.

10は熱処理室8内に設けられた載置台で、その上側の
空間が被処理材の存置空間11となっている。
Reference numeral 10 denotes a mounting table provided in the heat treatment chamber 8, and the space above it serves as a storage space 11 for the material to be treated.

12a〜12fは上記存置空間11の周囲に配設された
ヒータで、夫々上記存置空間11の上面側、下面側、及
び左、右、前、後の各側面側に設けられたものを示しく
本明細書中では扉の側を前、その反対側を後と呼び、左
右は扉の側から見ての左右を言う)、各々は断熱壁に取
付けである。向上記前面側及び後面側のヒータ12e、
12fは設けられない例もある。13は処理室8内に備
えられた温度検出器で、高温度の検出が可能なものであ
り、例えば熱電対が用いられる。次に15は被処理材の
周知の冷却機構を示し、以下これについて説明する。1
6はクーラ、17は冷却ファンで、ファンモータ18に
よって運転されるようになっている。19はモータカバ
ーで、真空保持用のものである。20.21は夫々ダク
トで、ダクト20はその下面に、ダクト21は上面に夫
々ガスの流通口を有している。22.23は上下流切替
用のダンパーである。このような冷却機構15にあって
は、ダンパー22.23が図示の如き状態においてクー
ラ16及びファン17を運転することにより、冷却用の
ガスが実線矢印の如き経路で循環し、存置空間11に置
かれた被処理材が冷却される。尚ダンパー22.23を
切り替えることにより、冷却用のガスを存置空間11に
下から上へ向けて流して被処理材の冷却を行うこともで
きる。
12a to 12f are heaters disposed around the storage space 11, and are provided on the upper surface side, the lower surface side, and the left, right, front, and rear sides of the storage space 11, respectively. In this specification, the door side is referred to as the front, the opposite side is referred to as the rear, and left and right refer to the left and right as seen from the door side), and each is attached to a heat insulating wall. heaters 12e on the front side and rear side;
In some cases, 12f is not provided. Reference numeral 13 denotes a temperature detector provided in the processing chamber 8, which is capable of detecting high temperatures, and uses a thermocouple, for example. Next, reference numeral 15 indicates a well-known cooling mechanism for the material to be treated, which will be explained below. 1
6 is a cooler, and 17 is a cooling fan, which is driven by a fan motor 18. 19 is a motor cover for maintaining vacuum. Reference numerals 20 and 21 designate ducts, and the duct 20 and the duct 21 have gas flow ports on their lower and upper surfaces, respectively. 22 and 23 are dampers for upstream and downstream switching. In such a cooling mechanism 15, when the dampers 22 and 23 operate the cooler 16 and fan 17 in the state shown in the figure, the cooling gas is circulated along the path shown by the solid arrow, and is supplied to the storage space 11. The placed material to be treated is cooled. By switching the dampers 22 and 23, the material to be processed can also be cooled by flowing the cooling gas from the bottom to the top in the holding space 11.

次に上記ヒータ12a〜12fの制御系統を示す第3図
について説明する。尚第3図において符号数字に付した
英小文字a −fは、それらを付した符号で示される各
部材が上記各ヒータ12a〜12fに対応する部材であ
ることを示すものであり、以下においては必要のある場
合を除き英小文字a −rを省略した符号で説明を行う
。25は電源端子で、商用電源に接続される。26はヒ
ータへの給電経路に介設した発熱量調節器で、−例とし
て電流調節器が用いである。このような電流調節器とし
ては、例えばサイリスタが用いられる。27は変圧器で
、電圧を降下させるようにしたものである。上記電流調
節器26と変圧器27とは図示の如き順序に接続するこ
とにより、電流gliff器2Gは小電流容量のもので
足りる。28は周知の温度調節計で、温度検出器13か
ら得られる温度の検出値に基づいて制御信号を出力する
ようにしたものである。29は偏差設定器で、温度調節
計28からの制御信号を受け、自体に予め設定された偏
差値をその制御信号に加え、その偏差値の加えられた信
号を上記電流調節器26に与えるようにしである。
Next, FIG. 3 showing the control system of the heaters 12a to 12f will be explained. In FIG. 3, lowercase letters a to f attached to the reference numbers indicate that each member indicated by the reference number corresponds to each of the heaters 12a to 12f, and in the following, Unless necessary, the explanation will be given using symbols omitting the lowercase letters a - r. A power terminal 25 is connected to a commercial power source. Reference numeral 26 denotes a heat generation amount regulator interposed in the power supply path to the heater, and for example, a current regulator is used. For example, a thyristor is used as such a current regulator. 27 is a transformer that lowers the voltage. By connecting the current regulator 26 and transformer 27 in the order shown in the figure, it is sufficient that the current gliff device 2G has a small current capacity. Reference numeral 28 denotes a well-known temperature controller which outputs a control signal based on the detected temperature value obtained from the temperature detector 13. Reference numeral 29 denotes a deviation setting device which receives a control signal from the temperature controller 28, adds a preset deviation value to the control signal, and provides a signal to which the deviation value has been added to the current controller 26. It's Nishide.

次に上記真空炉を用いた被処理材の熱処理を説明する。Next, heat treatment of a material to be treated using the vacuum furnace will be explained.

m4,7が開けられ、被処理材31が載置台10の上に
乗せられる。載置状態は、大きな被処理材31はそのま
ま、小さなものは例えば棚に積んだ状態である。次に扉
4.7が閉しられ、真空容器2内が真空排気され、ヒー
タ12a〜12fへの通電によってそれらが発熱され、
それらヒータ12a〜12fからの主として輻射伝熱に
よって被処理材31が加熱される。
m4 and m7 are opened, and the material to be processed 31 is placed on the mounting table 10. The placed state is such that large objects 31 are left as they are, and small objects 31 are stacked on a shelf, for example. Next, the door 4.7 is closed, the inside of the vacuum container 2 is evacuated, and the heaters 12a to 12f are energized to generate heat.
The material to be treated 31 is heated mainly by radiation heat transfer from the heaters 12a to 12f.

上記加熱の場合、被処理材31の温度は温度検出器13
によって検出され、それからの信号に基づき温度調節計
28、偏差設定器29を経て電流調節器26が制御され
、各ヒータ12a〜12fの出力が制御される。それら
ヒータ12a〜12fの出力の制御は、予め偏差設定器
29に設定された偏差をもった状態で行われる。従って
存置空間11に存置された被処理材31はその何れの部
分も略均−な温度に加熱される。
In the case of the above heating, the temperature of the material to be treated 31 is measured by the temperature detector 13.
Based on the signal therefrom, the current regulator 26 is controlled via the temperature controller 28 and the deviation setting device 29, and the output of each heater 12a to 12f is controlled. The outputs of the heaters 12a to 12f are controlled with a deviation set in the deviation setting device 29 in advance. Therefore, all parts of the material 31 placed in the storage space 11 are heated to a substantially uniform temperature.

向上記各偏差設定器292〜29fに設定すべき偏差値
は、被処理材3Iの形態、大きさ、存置空間11での積
載状態等の違いに応じて、夫々存置空間11の各部の被
処理材31の温度を均一にすることのできる種々の値を
予め実験的に求めておき、それらの値のうちから実情に
合ったものを選択して用いるのが良い。
The deviation value to be set in each of the deviation setting units 292 to 29f described above is determined depending on the shape and size of the material to be processed 3I, the loading state in the storage space 11, etc. It is preferable to experimentally determine in advance various values that can make the temperature of the material 31 uniform, and to select and use one of these values that suits the actual situation.

上記のようにして被処理材31に所定の加熱が施された
ならば、ヒータへの通電が停止され、冷却用のガスが真
空容器2内に導入され、クーラ16やファン17が前述
のように運転されて、被処理材31の冷却が行われる。
Once the material to be processed 31 has been heated to a predetermined level as described above, the power supply to the heater is stopped, cooling gas is introduced into the vacuum container 2, and the cooler 16 and fan 17 are activated as described above. The processing target material 31 is cooled.

そして冷却が終了すると、扉4,7が開かれて熱処理を
終えた被処理材31が取り出される。
When the cooling is finished, the doors 4 and 7 are opened and the processed material 31 that has undergone heat treatment is taken out.

次に被処理材の種別、例えば大きさ、形状、材質等が変
更になった場合における熱処理について説明する。−例
として、被処理材が大きなものに変更になった場合にお
ける熱処理の場合には、例エバヒータ12bの発熱量が
大きくなるように偏差設定器29bの設定値を変更し、
その状態で上記の場合と同様の操作が行われる。その結
果、その変更された被処理材であっても均一な温度分布
の状態で熱処理を行うことができる。
Next, heat treatment when the type of the material to be treated, such as size, shape, material, etc., is changed will be explained. - For example, in the case of heat treatment when the material to be treated is changed to a larger material, the setting value of the deviation setting device 29b is changed so that the emitted heat amount of the Evaporator heater 12b becomes larger,
In this state, the same operations as in the above case are performed. As a result, even the changed material can be heat-treated with a uniform temperature distribution.

次に、第3図の制御系統において、上記の如き偏差設定
器29を用いずに全ヒータの発熱制御を行った場合と、
前記のように偏差設定器29を用いて全ヒータの発熱制
御を行った場合とにおいて夫々炉内の温度分布幅を実測
したところ、次の第1表の如き改善が見られた。
Next, in the control system shown in FIG. 3, when heat generation control is performed for all heaters without using the deviation setting device 29 as described above,
When the temperature distribution width in the furnace was actually measured in the case where the heat generation of all the heaters was controlled using the deviation setting device 29 as described above, improvements as shown in Table 1 below were observed.

第1表 次に、上記炉内のヒータ12a−12fの制御は、第3
図に2点鎖線で示されるように、ヒータ12a〜12f
を2組(例えばヒータ12a〜12cとヒータ12d〜
12f)に区分し、各々の組において夫々温度検出器1
3’、13”及び温度調節計28’、2B’ により前
記実施例と同様の制御を行っても良い。また断熱壁5の
形状は、第2図の如き断面が四角な形状以外に、円筒状
であっても良い。
Table 1 Next, the control of the heaters 12a to 12f in the furnace is controlled by the third
As shown by the two-dot chain line in the figure, the heaters 12a to 12f
two sets (for example, heaters 12a to 12c and heaters 12d to
12f), and each set has a temperature sensor 1.
3', 13'' and temperature controllers 28', 2B' may be used to perform the same control as in the above embodiment.Also, the shape of the heat insulating wall 5 may be cylindrical, in addition to the square cross-sectional shape as shown in FIG. It may be in the form of

[発明の効果] 以上のように本発明にあっては、被処理材31を加熱す
る場合、その被処理材31には周囲の複数のヒータから
熱が与えられるから、被処理材31の全体を温度分布の
均一化を向上させた状態で加熱できる効果があるは勿論
のこと、 上記加熱の場合、温度検出S13によって被処理材31
の温度を検出し、その検出値に基づいて上記ヒータの発
熱量を制御するから、被処理材31の温度状況に即した
加熱ができる効果がある。
[Effects of the Invention] As described above, in the present invention, when the material to be treated 31 is heated, heat is applied to the material to be treated 31 from a plurality of surrounding heaters, so that the entire material to be treated 31 is heated. Of course, this has the effect of heating the material 31 with improved uniformity of temperature distribution, and in the case of the above heating, the temperature detection S13
Since the temperature of the material 31 to be treated is detected and the amount of heat generated by the heater is controlled based on the detected value, there is an effect that heating can be performed in accordance with the temperature condition of the material 31 to be treated.

しかも上記制御の場合、上記温度検出器13による温度
の検出は一箇所であっても、複数のヒータの発p+量は
相互に偏差を持たせた状態で制御できるから、上記被処
理材31は、上記複数のヒータを夫々個別制御した場合
と同様の全域の温度制御ができる特長がある。このこと
は、被処理材の温度均一化の為の制御網の単純化を可能
にできる有用性を有する。
Moreover, in the case of the above control, even if the temperature is detected by the temperature detector 13 at one location, the amount of p+ generated by the plurality of heaters can be controlled with a mutual deviation. , it has the advantage of being able to control the temperature over the entire area in the same way as when each of the plurality of heaters is individually controlled. This has the usefulness of making it possible to simplify the control network for uniformizing the temperature of the material to be treated.

さらに本発明の方法にあっては、被処理材31の種別が
変わった場合においても、その変更に応じて上記偏差の
設定値を変えるから、変更になった被処理材に対しても
上記の如き温度分布の均一化を向上させた状態での加熱
を行い得る効果がある。
Furthermore, in the method of the present invention, even when the type of the material to be treated 31 changes, the set value of the deviation is changed in accordance with the change, so the above-mentioned method also applies to the changed material to be treated. There is an effect that heating can be performed in a state where the uniformity of temperature distribution is improved.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本願の実施例を示すもので、第1図は真空炉の縦
断面図、第2図はヒータの配置状態を示す為の第1図に
おける■−■線断面図、第3図はヒータの制御系統を示
す回路図。 2・・・真空容器、11・・・存置空間、12a〜12
f・・・ヒータ、13・・・温度検出器、26・・発熱
量調節器、29・・・偏差設定器。 π 第1図 第3図 第2図
The drawings show an embodiment of the present application, and FIG. 1 is a vertical sectional view of a vacuum furnace, FIG. 2 is a sectional view taken along the line ■-■ in FIG. 1 to show the arrangement of the heater, and FIG. FIG. 3 is a circuit diagram showing a control system. 2... Vacuum container, 11... Storage space, 12a-12
f... Heater, 13... Temperature detector, 26... Calorific value regulator, 29... Deviation setting device. π Figure 1 Figure 3 Figure 2

Claims (1)

【特許請求の範囲】 1、内部に被処理材の存置空間を有する真空容器内にお
いては、上記存置空間の周囲に夫々上記存置空間に存置
される被処理材を加熱する為の複数のヒータを備えてい
る真空炉において、上記各ヒータの給電経路には発熱量
調節器を夫々個別に介設し、それらの発熱量調節器と真
空容器内の被処理材の温度を検出する為に真空容器内に
設けられた温度検出器との間には、上記複数のヒータの
発熱量に偏差を持たせ得るよう夫々個別の偏差設定器を
介設したことを特徴とする真空炉。 2、内部に被処理材の存置空間を有する真空容器内にお
いては、上記存置空間の周囲に夫々上記存置空間に存置
される被処理材を加熱する為の複数のヒータを備えてい
る真空炉において、上記各ヒータの給電経路には発熱量
調節器を夫々個別に介設し、それらの発熱量調節器と真
空容器内の被処理材の温度を検出する為に真空容器内に
設けられた温度検出器との間には、上記複数のヒータの
発熱量に偏差を持たせ得るよう夫々個別の偏差設定器を
介設して、上記存置空間に被処理材を存置させてそれを
加熱するに当たっては、その存置させた被処理材の種別
に応じて上記各偏差設定器の設定値を調節することによ
り、上記存置空間に存置させた被処理材の全体の温度を
均一化させることを特徴とする真空炉における温度均一
化方法。
[Claims] 1. In a vacuum container having a storage space for a material to be processed inside, a plurality of heaters are arranged around the storage space to respectively heat the material to be processed that is placed in the storage space. In the vacuum furnace equipped with the above-mentioned vacuum furnace, a calorific value regulator is individually installed in the power supply path of each of the heaters, and the vacuum vessel is connected to the vacuum vessel in order to detect the temperature of these calorific value regulators and the material to be processed in the vacuum vessel. A vacuum furnace characterized in that an individual deviation setting device is interposed between each of the plurality of heaters and a temperature detector provided therein so as to provide a deviation in the amount of heat generated by each of the plurality of heaters. 2. In a vacuum container having a space for holding the material to be processed inside, a vacuum furnace is provided with a plurality of heaters around the space for heating the material to be processed, respectively, which are placed in the space. , A heat generation amount regulator is individually installed in the power supply path of each of the above heaters, and a temperature control device provided in the vacuum container is installed to detect the temperature of the heat generation amount regulator and the material to be processed in the vacuum container. An individual deviation setting device is interposed between the heater and the detector so that the heat generation amount of the plurality of heaters can be varied, and when the material to be treated is placed in the holding space and heated. is characterized in that the temperature of the entire material to be treated left in the storage space is made uniform by adjusting the setting values of each of the deviation setting devices according to the type of the material to be treated that is left in the storage space. A method for equalizing temperature in a vacuum furnace.
JP02160455A 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace Expired - Lifetime JP3082211B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02160455A JP3082211B2 (en) 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02160455A JP3082211B2 (en) 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace

Publications (2)

Publication Number Publication Date
JPH0452215A true JPH0452215A (en) 1992-02-20
JP3082211B2 JP3082211B2 (en) 2000-08-28

Family

ID=15715310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02160455A Expired - Lifetime JP3082211B2 (en) 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace

Country Status (1)

Country Link
JP (1) JP3082211B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001092537A (en) * 1999-09-22 2001-04-06 Toyo Seiki Seisakusho:Kk Method for controlling temperature of furnace body or the like and device provided with the furnace body or the like
JP2008298977A (en) * 2007-05-30 2008-12-11 Kyushu Nissho:Kk Heat treatment apparatus
WO2011118201A1 (en) 2010-03-25 2011-09-29 住友金属工業株式会社 Heat treatment method for long material, manufacturing method for long material, and heat treatment furnace used in above methods
CN104094072A (en) * 2011-11-30 2014-10-08 杰富意钢铁株式会社 Heating method for strips in radiant heating furnace and radiant heating furnace
JP2020521268A (en) * 2018-04-02 2020-07-16 寧波恒普真空技術有限公司 Vacuum sintering furnace capable of controlling heating element and multi-region temperature

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112412U (en) * 1990-03-02 1991-11-18

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001092537A (en) * 1999-09-22 2001-04-06 Toyo Seiki Seisakusho:Kk Method for controlling temperature of furnace body or the like and device provided with the furnace body or the like
JP2008298977A (en) * 2007-05-30 2008-12-11 Kyushu Nissho:Kk Heat treatment apparatus
WO2011118201A1 (en) 2010-03-25 2011-09-29 住友金属工業株式会社 Heat treatment method for long material, manufacturing method for long material, and heat treatment furnace used in above methods
CN104094072A (en) * 2011-11-30 2014-10-08 杰富意钢铁株式会社 Heating method for strips in radiant heating furnace and radiant heating furnace
CN104094072B (en) * 2011-11-30 2017-02-15 杰富意钢铁株式会社 Heating method for strips in radiant heating furnace and radiant heating furnace
JP2020521268A (en) * 2018-04-02 2020-07-16 寧波恒普真空技術有限公司 Vacuum sintering furnace capable of controlling heating element and multi-region temperature

Also Published As

Publication number Publication date
JP3082211B2 (en) 2000-08-28

Similar Documents

Publication Publication Date Title
US8257644B2 (en) Iron core annealing furnace
US4925388A (en) Apparatus for heat treating substrates capable of quick cooling
KR101197430B1 (en) Strip material treatment apparatus
JP5054275B2 (en) Temperature control of single-wafer semiconductor substrate processing reactor
US5291514A (en) Heater autotone control apparatus and method
US3737553A (en) Vacuum electric furnace
JP2017106711A (en) Heating apparatus and heating method
JPH0452215A (en) Vacuum furnace and temperature equalization method in vacuum furnace
WO1993012629A1 (en) Microwave heating method and apparatus
JPH0796168A (en) Temperature control method for heat treatment equipment
JP2867629B2 (en) Vacuum furnace
US4179617A (en) Ion-nitriding apparatus
JP3223604B2 (en) Vacuum furnace and method of heating material to be processed in vacuum furnace
JP2009084633A (en) Plasma nitriding apparatus and continuous plasma nitriding method
JPH05271751A (en) Vacuum furnace temperature control method
JP3466673B2 (en) Vacuum furnace with movable heat reflector
KR100346358B1 (en) Thermal treatment unit for windless heating of plate type work
US5876198A (en) Sequential step belt furnace with individual concentric heating elements
JP2018048805A (en) Heating device
JPS6141725A (en) Method for controlling hearth roll temperature of continuous annealing furnace
US3783238A (en) Electric curing oven
KR102821067B1 (en) Heat treat furnace
JP2513195Y2 (en) Heat treatment furnace
JP2000036469A (en) Heat treatment furnace for substrate
JPS61144580A (en) Temperature controlling method of burn-in testing device

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090630

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100630

Year of fee payment: 10

EXPY Cancellation because of completion of term