JPH0452217A - vacuum furnace - Google Patents
vacuum furnaceInfo
- Publication number
- JPH0452217A JPH0452217A JP16249490A JP16249490A JPH0452217A JP H0452217 A JPH0452217 A JP H0452217A JP 16249490 A JP16249490 A JP 16249490A JP 16249490 A JP16249490 A JP 16249490A JP H0452217 A JPH0452217 A JP H0452217A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- heater
- insulating wall
- heat insulating
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Furnace Details (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は種々の被処理材に焼入や焼戻或いは焼結、焼
成などの熱処理を施す為に用いられる真空炉に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum furnace used for subjecting various materials to heat treatment such as quenching, tempering, sintering, and firing.
[従来の技術]
この種の炉においては、例えば真空容器内において被処
理材の存置空間の近くにヒータが配設され、そのヒータ
からの熱によって被処理材が加熱される。[Prior Art] In this type of furnace, a heater is disposed, for example, in a vacuum container near a space in which a material to be treated is placed, and the material to be treated is heated by heat from the heater.
[発明が解決しようとする課題コ
このような従来の真空炉では、被処理材において例えば
ヒータに近くてそれから直接に多くの熱を受ける箇所は
温度が高くなり、一方ヒータから遠くて上記直接的な受
熱の量が少ない箇所は比較的温度が低くなり、被処理材
の各所に温度差ができてしまう問題点があった。[Problems to be Solved by the Invention] In such conventional vacuum furnaces, the temperature of the material to be processed is high in areas that are close to the heater and receive a lot of heat directly from it; There is a problem in that the temperature is relatively low in locations where a small amount of heat is received, resulting in temperature differences at various locations on the material to be treated.
本発明は上記従来技術の問題点(技術的謀H)を解決す
る為になされたもので、被処理材がヒータから直接的に
受ける熱量が少ない場所に対しては反射体により反射し
た熱を補うようにして、被処理材全体の温度分布を均一
化させうるようにした真空炉を提供することを目的とす
る。The present invention was made to solve the problem (technical plan H) of the prior art described above, and in places where the material to be treated receives a small amount of heat directly from the heater, the heat reflected by the reflector is used. It is an object of the present invention to provide a vacuum furnace that can compensate for the temperature distribution of the entire material to be processed.
[課題を解決する為の手段]
上記目的を達成する為に、本願発明の真空炉は、内部に
被処理材の存置空間を有する真空容器内においては、上
記存置空間の周囲を囲う断熱壁が設けられ、上記断熱壁
の内部においては、上記存置空間に存置される被処理材
を加熱する為のヒータが備えられている真空炉において
、上記存置空間のうち上記ヒータからの直接的な受熱量
が少ない箇所と対向する部分における断熱壁の外面、内
面又はそれらの両面に低輻射率の材料で形成された反射
体を添設したものである。[Means for Solving the Problems] In order to achieve the above object, the vacuum furnace of the present invention has a heat insulating wall surrounding the periphery of the storage space in a vacuum container having a storage space for the material to be treated inside. In a vacuum furnace that is provided with a heater for heating the material to be processed that is placed in the holding space inside the heat insulating wall, the amount of heat directly received from the heater in the holding space is A reflector made of a material with a low emissivity is attached to the outer surface, inner surface, or both surfaces of the heat insulating wall in the portion facing the area where there is little radiation.
[作用〕
ヒータの発熱によって被処理材に熱が与えられる。この
場合、被処理材においてヒータからの直接的な受熱量が
大きい部分はその熱によって充分に加熱される。一方上
記直接的な受熱量が少ない部分はヒータからの熱に加え
て反射体で反射された熱をも受け、その部分も充分に加
熱される。その結果、被処理材はその全体が均一な温度
分布の状態に加熱される。[Operation] Heat is applied to the material to be treated by the heat generated by the heater. In this case, a portion of the material to be treated that receives a large amount of direct heat from the heater is sufficiently heated by the heat. On the other hand, the portions that receive a small amount of direct heat receive not only the heat from the heater but also the heat reflected by the reflector, and these portions are also sufficiently heated. As a result, the entire material to be treated is heated to have a uniform temperature distribution.
[実施例] 以下本願の実施例を示す図面について説明する。[Example] The drawings showing the embodiments of the present application will be described below.
第1図において、1は真空炉を示す。2は真空容器で、
本体3とその本体3の出入口に設けた扉4とから構成し
である。5は断熱壁で、本体6とその本体6の出入口に
設けた!#7とから構成され、その内側の空間が熱処理
室8となっている。10は熱処理室8内に設けられた載
置台で、その上側の空間が被処理材の存置空間11とな
っている。12は上記存置空間11の周囲に配設された
ヒータで、断熱壁に取付けである。次に第2図に示され
る13は反射体で、低輻射率の材料で形成された板体、
例えば磨きステンレス板(厚みは例えば1.60)が用
いてあり(その他の低輻射率の材料としては例えばモリ
ブデンがある)、上記断熱壁5における117の外面に
添設しである。その添設の状態は、例えば図示の如く、
断熱壁5とそれを支える周知の枠体14との間に挟み込
んである(扉7に貼り付けても良い) この反射体1
3は、上記存置空間11のうち上記ヒータ12からの直
接的な受熱量が少ない箇所と対向する部分における断熱
壁、例えば図示の如くヒータ12が設けられていない側
の断熱壁に添設される。添設する面は、本例の如き外面
の他、内面又は内外両面であっても良い。次に15は被
処理材の周知の冷却構造を示し、以下これについて説明
する。16はクーラ、17は冷却ファンで、ファンモー
タ18によって運転されるようになっている。19はモ
ータカバーで、真空保持用のものである。 20.21
は夫々整流板、22.23は上下流切替用のダンパーで
ある。このような冷却構造15にあっては、ダンパー2
2.23が図示の如き状態においてクーラ16及びファ
ン17を運転することにより、冷却用のガスが実線矢印
の如き経路で循環し、存置空間11に置かれた被処理材
が冷却される。尚ダンパー22.23を切り替えること
により、冷却用のガスを存置空間11に下から上へ向け
て流して被処理材の冷却を行うこともできる。In FIG. 1, 1 indicates a vacuum furnace. 2 is a vacuum container,
It consists of a main body 3 and a door 4 provided at the entrance/exit of the main body 3. 5 is a heat insulating wall installed at the main body 6 and the entrance to the main body 6! #7, and the space inside thereof serves as a heat treatment chamber 8. Reference numeral 10 denotes a mounting table provided in the heat treatment chamber 8, and the space above it serves as a storage space 11 for the material to be treated. Reference numeral 12 denotes a heater disposed around the storage space 11, which is attached to a heat insulating wall. Next, 13 shown in FIG. 2 is a reflector, which is a plate made of a material with low emissivity.
For example, a polished stainless steel plate (thickness, for example, 1.60 mm) is used (another low emissivity material is molybdenum, for example), and is attached to the outer surface of the heat insulating wall 5 at 117. For example, the attached state is as shown in the figure.
This reflector 1 is sandwiched between a heat insulating wall 5 and a well-known frame 14 that supports it (it may also be attached to the door 7).
3 is attached to a heat insulating wall in a portion of the storage space 11 that faces a portion where the amount of direct heat received from the heater 12 is small, for example, a heat insulating wall on the side where the heater 12 is not provided as shown in the figure. . The attached surface may be an inner surface or both inner and outer surfaces in addition to the outer surface as in this example. Next, reference numeral 15 indicates a well-known cooling structure for a material to be treated, which will be explained below. 16 is a cooler, and 17 is a cooling fan, which is driven by a fan motor 18. 19 is a motor cover for maintaining vacuum. 20.21
22 and 23 are current plates, respectively, and dampers for upstream and downstream switching. In such a cooling structure 15, the damper 2
By operating the cooler 16 and fan 17 in the state shown in FIG. 2.23, the cooling gas circulates along the path shown by the solid arrow, and the material to be processed placed in the storage space 11 is cooled. By switching the dampers 22 and 23, the material to be processed can also be cooled by flowing the cooling gas from the bottom to the top in the holding space 11.
次に上記真空炉を用いた被処理材の熱処理を説明する。Next, heat treatment of a material to be treated using the above-mentioned vacuum furnace will be explained.
、扉4,7が開けられ、被処理材31が載置台10の上
に乗せられる。載置状態は、大きな被処理材31はその
まま、小さなものは例えば棚に積んだ状態である。次に
扉4.7が閉じられ、真空容器2内が真空排気され、ヒ
ータ12への通電によってそれが発熱され、そのヒータ
12からの主として輻射伝熱によって被処理材31が加
熱される。, the doors 4 and 7 are opened, and the material to be processed 31 is placed on the mounting table 10. The placed state is such that large objects 31 are left as they are, and small objects 31 are stacked on a shelf, for example. Next, the door 4.7 is closed, the inside of the vacuum container 2 is evacuated, the heater 12 is energized to generate heat, and the material to be processed 31 is heated mainly by radiation heat transfer from the heater 12.
上記加熱の場合、被処理材31においてヒータ12と直
に対向している箇所はそのヒータ12から直接的に受け
る熱量が多く充分に加熱される。一方ヒータ12と直に
対向していない箇所例えば扉7の側は、ヒータ12から
直接的に受ける熱量が少ない。しかしその側においては
、反射体13が断熱壁5の外に逃げようとする熱を断熱
壁5の側に反射する。その結果その部分の断熱壁5の温
度は充分に高く保たれ、断熱壁5による抜熱が防止され
る。このように反射体13の存在により熱処理室8にお
ける処理室有効寸法内の温度分布が改善されている為、
被処理材31はその全体が均一な温度分布の状態で加熱
される。In the case of the above-mentioned heating, the portion of the material to be treated 31 directly facing the heater 12 receives a large amount of heat directly from the heater 12 and is sufficiently heated. On the other hand, a portion not directly facing the heater 12, for example, the side of the door 7, receives a small amount of heat directly from the heater 12. However, on that side, the reflector 13 reflects the heat that attempts to escape to the outside of the heat insulating wall 5 to the side of the heat insulating wall 5. As a result, the temperature of the heat insulating wall 5 in that part is kept sufficiently high, and heat loss by the heat insulating wall 5 is prevented. In this way, the presence of the reflector 13 improves the temperature distribution within the effective dimensions of the heat treatment chamber 8;
The treated material 31 is heated with uniform temperature distribution throughout.
上記のようにして被処理材31に所定の加熱が施された
ならば、ヒータへの通電が停止され、冷却用のガスが真
空容器2内に導入され、クーラ16やファン17が前述
のように運転されて、被処理材31の冷却が行われる。Once the material to be processed 31 has been heated to a predetermined level as described above, the power supply to the heater is stopped, cooling gas is introduced into the vacuum container 2, and the cooler 16 and fan 17 are activated as described above. The processing target material 31 is cooled.
そして冷却が終了すると、扉4.7が開かれて熱処理を
終えた被処理材31が取り出される。When the cooling is finished, the door 4.7 is opened and the processed material 31 that has undergone heat treatment is taken out.
向上記の如き反射体13が用いてない場合と用いた場合
とにおいて夫々加熱時の温度分布幅を実測したところ、
用いてない場合には10℃であったものが、用いた場合
には5.5℃に改善された。When the temperature distribution width during heating was actually measured when the reflector 13 as described above was not used and when it was used, it was found that
When not used, the temperature was 10°C, but when it was used, the temperature improved to 5.5°C.
次に第2図は本願の異なる実施例を示すもので、断熱壁
5eで囲まれた内部の空間に抜熱要素が備えられている
例を示すものである。図において、21は搬送用のロー
ルで、被処理材31eを紙面と垂直な方向に搬送する為
のものであり、真空容器2eの外に設けられる回動装置
によって回動されるようになっている。該ロール21は
断熱壁5e内部の空間の高熱に耐えられるよう周知の如
く水冷の構造となっているものであり、上記抜熱要素の
一例として示されるものである。該ロール21は被処理
材を受ける為の例えば黒鉛製の環状の受部材22を有し
ており、それ以外の部分23は断熱材によって覆われて
いると共にその外側を前述の如き低輻射率の材料で形成
された板状の反射体で覆われている。Next, FIG. 2 shows a different embodiment of the present application, and shows an example in which a heat removal element is provided in an internal space surrounded by a heat insulating wall 5e. In the figure, reference numeral 21 denotes a transport roll for transporting the material to be processed 31e in a direction perpendicular to the plane of the paper, and is rotated by a rotation device provided outside the vacuum container 2e. There is. The roll 21 has a well-known water-cooled structure so as to be able to withstand the high heat of the space inside the heat insulating wall 5e, and is shown as an example of the above-mentioned heat extraction element. The roll 21 has an annular receiving member 22 made of graphite, for example, for receiving the material to be treated, and the other part 23 is covered with a heat insulating material and the outside is covered with a low emissivity material as described above. It is covered with a plate-shaped reflector made of material.
このような構成のものにあっては、被処理材31eの加
熱時に、上記反射体は上記抜熱要素であるロール21が
被処理材31eから抜熱することを阻止し、その結果被
処理材の均一加熱が可能となる。With such a configuration, when the material to be treated 31e is heated, the reflector prevents the roll 21, which is the heat extraction element, from removing heat from the material to be treated 31e, and as a result, the material to be treated is heated. uniform heating is possible.
なお、機能上前図のものと同−又は均等構成と考えられ
る部分には、前回と同一の符号にアルファベットのeを
付して重複する説明を省略した。It should be noted that parts that are considered to have the same or equivalent structure as those in the previous figure in terms of function are given the same reference numerals as in the previous figure with the letter e, and redundant explanations are omitted.
[発明の効果]
以上のように本発明にあっては、ヒータ12の発熱によ
って被処理材31を加熱できるは勿論のこと、その加熱
の場合、被処理材31においてヒータ12からの直接的
な受熱量が大きい部分はその熱によって充分に加熱でき
、一方上記直接的な受熱量が少ない部分は、ヒータ12
からの熱に加えて反射体13で反射された熱をも受ける
ことができてその部分も充分に加熱することができ、被
処理材31をその全体が均一な温度分布の状態で加熱で
きる効果がある。[Effects of the Invention] As described above, according to the present invention, the material to be treated 31 can of course be heated by the heat generated by the heater 12, and in the case of heating, the material to be treated 31 is directly heated by the heater 12. The portions receiving a large amount of heat can be sufficiently heated by the heat, while the portions receiving a small amount of heat directly can be heated by the heater 12.
In addition to the heat from the reflector 13, the heat reflected by the reflector 13 can be received, and that part can be sufficiently heated, and the entire object to be treated 31 can be heated with a uniform temperature distribution. There is.
しかも上記反射体13は単に熱を反射するだけのもので
あるから、例えば扉7のような可動部にも付設できると
いう使用場所の任意性がある。Moreover, since the reflector 13 merely reflects heat, it can be attached to a movable part such as the door 7, giving it flexibility in its use.
図面は本願の実施例を示すもので、第1図は真空炉の縦
断面図、第2図は第1図の要部拡大図、第3図は異なる
実施例を示す縦断面図。
2・・・真空容器、5・・・断熱壁、11・存置空間、
12・・・ヒータ、13・・・反射体。
第1図
第2図
第3図The drawings show an embodiment of the present application; FIG. 1 is a longitudinal sectional view of a vacuum furnace, FIG. 2 is an enlarged view of the main part of FIG. 1, and FIG. 3 is a longitudinal sectional view showing a different embodiment. 2...Vacuum container, 5...Insulating wall, 11. Storage space,
12... Heater, 13... Reflector. Figure 1 Figure 2 Figure 3
Claims (1)
いては、上記存置空間の周囲を囲う断熱壁が設けられ、
上記断熱壁の内部においては、上記存置空間に存置され
る被処理材を加熱する為のヒータが備えられている真空
炉において、上記存置空間のうち上記ヒータからの直接
的な受熱量が少ない箇所と対向する部分における断熱壁
の外面、内面又はそれらの両面に低輻射率の材料で形成
された反射体を添設したことを特徴とする真空炉。 2、内部に被処理材の存置空間を有する真空容器内にお
いては、上記存置空間の周囲を囲う断熱壁が設けられ、
上記断熱壁の内部においては、上記存置空間に存置され
る被処理材を加熱する為のヒータと抜熱要素とが備えら
れている真空炉において、上記抜熱要素を低輻射率の材
料で形成された抜熱防止用の反射体で囲んだことを特徴
とする真空炉。[Claims] 1. In a vacuum container having a storage space for a material to be treated inside, a heat insulating wall surrounding the storage space is provided,
Inside the heat insulating wall, in a vacuum furnace equipped with a heater for heating the material to be processed left in the holding space, a portion of the holding space where the amount of direct heat received from the heater is small. A vacuum furnace characterized in that a reflector made of a material with a low emissivity is attached to the outer surface, inner surface, or both surfaces of the heat insulating wall in a portion facing the wall. 2. In a vacuum container having a storage space for the material to be treated inside, a heat insulating wall surrounding the storage space is provided,
Inside the heat insulating wall, the vacuum furnace is equipped with a heater and a heat extraction element for heating the workpiece placed in the storage space, and the heat extraction element is made of a material with a low emissivity. A vacuum furnace characterized by being surrounded by a reflector to prevent heat loss.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16249490A JP2936655B2 (en) | 1990-06-20 | 1990-06-20 | Vacuum furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16249490A JP2936655B2 (en) | 1990-06-20 | 1990-06-20 | Vacuum furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0452217A true JPH0452217A (en) | 1992-02-20 |
| JP2936655B2 JP2936655B2 (en) | 1999-08-23 |
Family
ID=15755690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16249490A Expired - Lifetime JP2936655B2 (en) | 1990-06-20 | 1990-06-20 | Vacuum furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2936655B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009052900A1 (en) * | 2009-11-13 | 2011-05-19 | Ipsen International Gmbh | Method and device for conducting flow in industrial furnaces for the heat treatment of metallic materials / workpieces |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7300504B2 (en) | 2003-10-20 | 2007-11-27 | Cabot Corporation | Inkjet inks and methods of preparing the same |
-
1990
- 1990-06-20 JP JP16249490A patent/JP2936655B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009052900A1 (en) * | 2009-11-13 | 2011-05-19 | Ipsen International Gmbh | Method and device for conducting flow in industrial furnaces for the heat treatment of metallic materials / workpieces |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2936655B2 (en) | 1999-08-23 |
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