JPH0452405B2 - - Google Patents
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- Publication number
- JPH0452405B2 JPH0452405B2 JP58037346A JP3734683A JPH0452405B2 JP H0452405 B2 JPH0452405 B2 JP H0452405B2 JP 58037346 A JP58037346 A JP 58037346A JP 3734683 A JP3734683 A JP 3734683A JP H0452405 B2 JPH0452405 B2 JP H0452405B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- flux
- flux concentration
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、半田付け工程後のプリント基板等か
ら、半田付け工程で付着したフラツクスを除去す
るための洗浄に用いる洗浄装置に関し、特に洗浄
液中のフラツクス濃度を測定する方法に関する。Detailed Description of the Invention [Field of Application of the Invention] The present invention relates to a cleaning device used for cleaning a printed circuit board or the like after a soldering process to remove flux attached during the soldering process, and in particular, to This invention relates to a method for measuring flux concentration.
プリント基板の組立工程には一般に半田付け工
程が含まれるが、この半田付け工程では接続品質
を確保するためにフラツクスが使用される。この
フラツクスはプリント基板に残留させたままにし
ておくと、腐食や電気的接触不良等の問題を引き
起こす原因となるため、プリント基板を洗浄して
残留フラツクスを洗い流す必要がある。
The assembly process of printed circuit boards generally includes a soldering process, and flux is used in this soldering process to ensure connection quality. If this flux remains on the printed circuit board, it may cause problems such as corrosion and poor electrical contact, so it is necessary to wash the printed circuit board to wash away the residual flux.
ところで、一定量の洗浄液中でプリント基板の
洗浄を繰り返すと、プリント基板から除去された
フラツクスが洗浄液中に蓄積するため、洗浄液中
のフラツクス濃度が徐々に上昇する。一方、洗浄
後のプリント基板の表面には、洗浄液中のフラツ
クス濃度に相当する量のフラツクスが残留する。
したがつて、洗浄液中のフラツクス濃度レベルを
あるレベル以下に管理しないと、プリント基板か
ら十分にフラツクスを除去できず、腐食や接触不
良等を十分に防止できない。 By the way, when a printed circuit board is repeatedly cleaned in a certain amount of cleaning liquid, the flux removed from the printed circuit board accumulates in the cleaning liquid, so that the flux concentration in the cleaning liquid gradually increases. On the other hand, an amount of flux corresponding to the flux concentration in the cleaning liquid remains on the surface of the printed circuit board after cleaning.
Therefore, unless the flux concentration level in the cleaning solution is controlled below a certain level, the flux cannot be sufficiently removed from the printed circuit board, and corrosion, poor contact, etc. cannot be sufficiently prevented.
第１図は、洗浄液中フラツクス濃度と、プリン
ト基板上のコネクタの接触不良発生率との相関を
調べた結果を示している。この図から明らかなよ
うに、十分な洗浄効果を達成するには、洗浄液中
のフラツクス濃度を一定の濃度以下に保たねばな
らない。 FIG. 1 shows the results of investigating the correlation between the flux concentration in the cleaning solution and the incidence of poor contact of connectors on printed circuit boards. As is clear from this figure, in order to achieve a sufficient cleaning effect, the flux concentration in the cleaning solution must be kept below a certain level.
さて、洗浄液中のフラツクス濃度を管理する前
提として、フラツクス濃度を知る必要がある。そ
こで従来は、洗浄槽から抜き取つた洗浄液の汚れ
具合を目視にて調べ、フラツクス濃度を推定した
り、洗浄液の比重とフラツクス濃度の相関からフ
ラツクス濃度を求めるという方法を採用してい
る。しかし、このような方法では、前記のような
10-2重量パーセント以下のオーダの濃度を精密に
測定することは困難であつた。 Now, as a prerequisite for managing the flux concentration in the cleaning solution, it is necessary to know the flux concentration. Conventionally, therefore, a method has been adopted in which the degree of contamination of the cleaning liquid extracted from the cleaning tank is visually inspected to estimate the flux concentration, or the flux concentration is determined from the correlation between the specific gravity of the cleaning liquid and the flux concentration. However, in such a method, the above
It has been difficult to precisely measure concentrations on the order of 10 -2 weight percent or less.
本発明の目的は、洗浄装置における洗浄液中の
フラツクス濃度を簡単な構成で高精度に測定する
方法を提供することにあり、特に、１台または直
列的に接続された複数台の洗浄槽に、蒸留機を介
在させて洗浄液を循環させる構成の洗浄装置に好
適なフラツクス濃度測定方法を提供することにあ
る。
An object of the present invention is to provide a method for measuring flux concentration in a cleaning liquid in a cleaning device with a simple configuration and with high accuracy. It is an object of the present invention to provide a flux concentration measuring method suitable for a cleaning device configured to circulate cleaning liquid with a distiller interposed therebetween.
洗浄液中のフラツクスは、特定の波長の光に対
し固有の吸収特性を有する。また、その吸収量は
フラツクスの量、つまり濃度に依存する。したが
つて、特定の波長の光を洗浄液に入射し、その光
の吸収量または透過量を測定すれば、フラツクス
濃度を知ることができる。しかしこれは、吸収量
または透過量が洗浄液中のフラツクス以外の物質
によつて影響を受けない場合の話であり、実際の
洗浄装置にそのまま適用することはできない。こ
れについて、以下に説明する。
The flux in the cleaning solution has unique absorption characteristics for light of specific wavelengths. Moreover, the amount of absorption depends on the amount of flux, that is, the concentration. Therefore, the flux concentration can be determined by injecting light of a specific wavelength into the cleaning liquid and measuring the amount of absorption or transmission of the light. However, this is a case where the amount of absorption or permeation is not affected by substances other than flux in the cleaning liquid, and cannot be directly applied to actual cleaning equipment. This will be explained below.
洗浄装置は一般に、洗浄槽中の汚れた洗浄液を
蒸留機に送り、そこで加熱蒸留してフラツクスを
除去した後、洗浄槽に再び送り込む構成であり、
洗浄液は繰り返し加熱冷却される。この加熱の繰
り返しによる洗浄液自体の化学的分解を防止する
ため、洗浄液中に分解防止剤が添付される。例え
ば代表的な洗浄液であるトリクロルエタン（クロ
ロセン）の場合、1.4−ジオキサン、ブチレンオ
キサイド、ニトロメタン等が分解防止剤として添
加される。これらの物質の中には、代表的なロジ
ン系フラツクス中のロジンと光の吸収波長領域が
一部重複する。しかも、分解防止剤の濃度は洗浄
液の使用時間、つまり蒸留再生の熱来歴に応じて
変化する。したがつて、光の吸収量または透過量
から10-2重量パーセント程度の微量なフラツクス
濃度を測定するには、分解防止剤による光吸収、
および分解防止剤の濃度変化による影響を除去す
ることが不可欠である。 The cleaning device generally has a configuration in which the dirty cleaning liquid in the cleaning tank is sent to a distillation machine, where it is heated and distilled to remove flux, and then sent back to the cleaning tank.
The cleaning liquid is repeatedly heated and cooled. In order to prevent chemical decomposition of the cleaning liquid itself due to repeated heating, a decomposition inhibitor is added to the cleaning liquid. For example, in the case of trichloroethane (chlorocene), which is a typical cleaning liquid, 1,4-dioxane, butylene oxide, nitromethane, etc. are added as decomposition inhibitors. Some of these substances have light absorption wavelength regions that partially overlap with rosin in a typical rosin-based flux. Moreover, the concentration of the decomposition inhibitor changes depending on the usage time of the cleaning solution, that is, the thermal history of distillation regeneration. Therefore, in order to measure a minute flux concentration of about 10 -2 weight percent from the amount of light absorbed or transmitted, light absorption by the decomposition inhibitor,
It is essential to eliminate the effects of changes in the concentration of decomposition inhibitors and decomposition inhibitors.
本発明はこのような考察に基づいたものであ
り、１台または直列的に接続された複数台の洗浄
槽に蒸留機を介在させて洗浄液を循環させる洗浄
装置において、蒸留機から送出された直後の洗浄
液について、特定波長の光の吸収量または透過量
を測定するとともに、蒸留機から送出された洗浄
液が最初に流入する最前段の洗浄槽内の洗浄液に
ついて同波長光の吸収量または透過量を調べ、上
記２個所の測定結果から最前段洗浄槽内の洗浄液
中のフラツクス濃度を正確に求めるものである。 The present invention is based on such consideration, and is a cleaning device in which a distillation machine is interposed between one or a plurality of washing tanks connected in series to circulate the cleaning liquid. In addition to measuring the amount of absorption or transmission of light of a specific wavelength for the cleaning liquid, we also measure the amount of absorption or transmission of light of the same wavelength for the cleaning liquid in the first stage cleaning tank, where the cleaning liquid sent from the distillation machine first flows. The purpose is to accurately determine the flux concentration in the cleaning liquid in the first-stage cleaning tank from the measurement results at the two locations mentioned above.
即ち、蒸留機から送出直後の洗浄液と、最前段
の洗浄槽内の洗浄液は、蒸留による熱来歴回数は
ほぼ等しいため、両方の洗浄液中の分解防止剤濃
度は極めて接近している。換言すれば、分解防止
剤による影響は、各測定位置に対して実質的に均
等に及ぶ。したがつて、各測定位置の測定値を減
算ないし比較すれば、分解防止剤に影響されるこ
となくフラツクス濃度を求めることができる。 That is, since the cleaning liquid immediately after being sent out from the distiller and the cleaning liquid in the first-stage cleaning tank have approximately the same number of thermal histories due to distillation, the decomposition inhibitor concentrations in both cleaning liquids are extremely close to each other. In other words, the influence of the decomposition inhibitor is substantially evenly applied to each measurement position. Therefore, by subtracting or comparing the measured values at each measurement position, the flux concentration can be determined without being affected by the decomposition inhibitor.
第２図によつて、本発明の一実施例を説明す
る。
An embodiment of the present invention will be explained with reference to FIG.
本実施例は２台の洗浄槽２，３を備える洗浄装
置の例であり、洗浄液７は前段の洗浄槽３から後
段の洗浄槽２に流れ、さらにポンプ４によつて蒸
留機５に送られる。この蒸留機５によつて蒸留さ
れ、フラツクスを除去された洗浄液は再び前段の
洗浄槽３に送り込まれる。蒸留機５は公知の構造
のものであり、洗浄液加熱用のヒータ８、凝縮用
の冷却コイル９、凝縮液（蒸留再生後の洗浄液）
を受ける受け皿１０を密閉容器内に備えて成る。
以上が洗浄装置の基本構成である。プリント基板
等のフラツクスの付着した被洗浄物１を洗浄する
場合、被洗浄物１をまず後段の洗浄槽２にて洗浄
して大部分のフラツクスを落とした後、その被洗
浄物１を前段の洗浄槽３で仕上げ洗浄する。した
がつて、洗浄液７中のフラツクス濃度は後段の洗
浄槽２の方が高い。最終的に被洗浄物１に残留す
るフラツクスの量は、前段洗浄槽３内の洗浄液中
のフラツクス濃度に依存するから、フラツクス濃
度の管理を行うためには同洗浄槽３内のフラツク
ス濃度を測定する必要がある。 The present embodiment is an example of a cleaning device equipped with two cleaning tanks 2 and 3, and the cleaning liquid 7 flows from the front-stage cleaning tank 3 to the rear-stage cleaning tank 2, and is further sent to the distiller 5 by a pump 4. . The cleaning liquid distilled by the distiller 5 and from which the flux has been removed is sent again to the cleaning tank 3 in the preceding stage. The distiller 5 has a known structure, and includes a heater 8 for heating the cleaning liquid, a cooling coil 9 for condensation, and a condensate (cleaning liquid after distillation and regeneration).
A receiving tray 10 for receiving the container is provided in a closed container.
The above is the basic configuration of the cleaning device. When cleaning the object 1 to be cleaned, such as a printed circuit board, with flux attached, the object 1 to be cleaned is first cleaned in the cleaning tank 2 in the latter stage to remove most of the flux, and then the object 1 to be cleaned is transferred to the cleaning tank 2 in the former stage. Finish cleaning is done in cleaning tank 3. Therefore, the flux concentration in the cleaning liquid 7 is higher in the latter cleaning tank 2. The amount of flux that ultimately remains on the object to be cleaned 1 depends on the flux concentration in the cleaning liquid in the front-stage cleaning tank 3, so in order to manage the flux concentration, the flux concentration in the same cleaning tank 3 must be measured. There is a need to.
次に、フラツクス濃度の測定等について説明す
る。 Next, measurement of flux concentration, etc. will be explained.
蒸留機５と前段洗浄槽３の間の洗浄液流路の途
中に、洗浄液を一時的にプールするための予備タ
ンク６が設けられている。この予備タンク６内の
洗浄液は小型ポンプ１２ａによつてセル１１ａに
送られ、セル１１ａを通過した洗浄液は再び予備
タンク６に戻される。また、前段洗浄槽３内の洗
浄液も、小型ポンプ１２ｂによつてセル１１ｂを
通じ循環させられる。 A reserve tank 6 for temporarily pooling the cleaning liquid is provided in the middle of the cleaning liquid flow path between the distiller 5 and the pre-stage cleaning tank 3. The cleaning liquid in this preliminary tank 6 is sent to the cell 11a by a small pump 12a, and the cleaning liquid that has passed through the cell 11a is returned to the preliminary tank 6 again. Further, the cleaning liquid in the pre-stage cleaning tank 3 is also circulated through the cell 11b by the small pump 12b.
セル１１ａを間に発光器１３ａと光度計１４ａ
が対向して設置され、同様にセル１１ｂを間に発
光器１３ｂと光度計１４ｂが対向配置されてい
る。発光器１３ａ，１３ｂは一定の強さの特定波
長の光をセル１１ａ，１１ｂに投射するものであ
り、その光の波長は洗浄液の循環によつても若干
異るが、ロジン系フラツクスの濃度の測定を意図
する場合、250nｍまたは310nｍ（波長）に選ぶ
ことができる。セル１１ａ，１１ｂはこのような
波長の光を効率良く透過させる透光性材料で作る
必要があり、例えば石英ガラス製とする。 A light emitter 13a and a photometer 14a are placed between the cell 11a.
are placed facing each other, and similarly, a light emitter 13b and a photometer 14b are placed facing each other with a cell 11b in between. The light emitters 13a and 13b project light with a certain intensity and a specific wavelength onto the cells 11a and 11b.The wavelength of the light varies slightly depending on the circulation of the cleaning solution, but it depends on the concentration of the rosin flux. If measurements are intended, 250 nm or 310 nm (wavelength) can be chosen. The cells 11a and 11b must be made of a translucent material that efficiently transmits light of such wavelengths, and are made of, for example, quartz glass.
光度計１４ａ，１４ｂは、発光器１３ａ，１３
ｂから出てセル１１ａ，１１ｂを透過した光を受
光し、その光度に比例（または反比例）した電圧
値または電流値の電気信号を出力する。つまり、
セル１１ａ，１１ｂ内の洗浄液を透過した光量
（または同洗浄液により吸収された光量）に比例
した値の電気信号が得られる。この電気信号の
値、つまり透過光量（または吸収光量）は、洗浄
液中のフラツクス濃度のみならず、分解防止剤の
濃度によつても変化することは前述の通りであ
る。ここで、セル１１ａ，１１ｂ内の洗浄液はほ
ぼ同じ蒸留再生熱来歴を持つため、そこに含まれ
る分解防止剤の濃度はほぼ同一とみなし得るか
ら、光度計１４ａ，１４ｂの出力信号値の差はセ
ル１１ａ，１１ｂ内の洗浄液中のフラツクス濃度
の差に相当すると考えてよい。しかも、セル１１
ａ内の洗浄液は蒸留直後であつてフラツクスは実
質的に含まないとみなし得るため、光度計１４
ａ，１４ｂの出力信号値の差はセル１１ｂ内の洗
浄液のフラツクス濃度に相当する。したがつて、
濃度測定回路１５によつて光度計１４ａ，１４ｂ
の出力信号値の減算または比較を行うことによ
り、セル１１ｂ内の洗浄液、つまり前段洗浄槽３
内の洗浄液中のフラツクス濃度を高精度で求める
ことができる。 The photometers 14a, 14b are light emitters 13a, 13
It receives the light that has come out from cell 11a, 11b and outputs an electrical signal with a voltage or current value proportional to (or inversely proportional to) the luminous intensity. In other words,
An electrical signal having a value proportional to the amount of light transmitted through the cleaning liquid in the cells 11a and 11b (or the amount of light absorbed by the cleaning liquid) is obtained. As described above, the value of this electrical signal, that is, the amount of transmitted light (or amount of absorbed light) changes not only depending on the flux concentration in the cleaning liquid but also on the concentration of the decomposition inhibitor. Here, since the cleaning liquids in the cells 11a and 11b have almost the same history of distillation and regeneration heat, the concentration of the decomposition inhibitor contained therein can be considered to be almost the same, so the difference in the output signal values of the photometers 14a and 14b is It can be considered that this corresponds to the difference in flux concentration in the cleaning fluids in the cells 11a and 11b. Moreover, cell 11
Since the cleaning solution in a has just been distilled and can be considered to contain substantially no flux, the photometer 14
The difference between the output signal values of a and 14b corresponds to the flux concentration of the cleaning liquid in the cell 11b. Therefore,
The photometers 14a and 14b are controlled by the concentration measuring circuit 15.
By subtracting or comparing the output signal values of
The flux concentration in the cleaning solution can be determined with high accuracy.
このようにして求められたフラツクス濃度は電
気信号としてコントローラ１６に入力される。コ
ントローラ１６は、測定されたフラツクス濃度が
上限（例えば10-2重量パーセント）を越えること
のないように、ポンプ４および蒸留機５の動作を
制御して洗浄液の再生循環速度を調整し、前段洗
浄槽３内の洗浄液のフラツクス濃度を上限以下に
管理する。このように、本実施例はフラツクス濃
度を自動的に連続モニタリングする。 The flux concentration thus determined is input to the controller 16 as an electrical signal. The controller 16 controls the operation of the pump 4 and the distiller 5 to adjust the regeneration circulation speed of the cleaning liquid so that the measured flux concentration does not exceed an upper limit (for example, 10 -2 weight percent), and the pre-washing The flux concentration of the cleaning liquid in tank 3 is controlled to be below the upper limit. In this way, this embodiment automatically and continuously monitors flux concentration.
なお、本実施例では２台の洗浄槽を直列的に接
続しているが、３台以上の洗浄槽を直列的に接続
した洗浄装置では、その最前段の洗浄槽内の洗浄
液中フラツクス濃度を同様に測定すればよい。ま
た洗浄槽が１台のみの場合は、その洗浄槽におけ
るフラツクス濃度を同様にして測定する。 In this example, two cleaning tanks are connected in series, but in a cleaning device in which three or more cleaning tanks are connected in series, the flux concentration in the cleaning liquid in the first stage cleaning tank should be You can measure it in the same way. If there is only one cleaning tank, the flux concentration in that cleaning tank is measured in the same way.
以上に詳述したように、本発明によれば洗浄液
中の微量のフラツクス濃度を簡単な構成で高精度
に測定することができる。
As described in detail above, according to the present invention, it is possible to measure a trace amount of flux concentration in a cleaning liquid with high precision using a simple configuration.
第１図は洗浄液中のフラツクス濃度と接触不良
発生率との相関を示す図、第２図は本発明の一実
施例である洗浄装置の構成図である。
２，３……洗浄槽、４……ポンプ、５……蒸留
機、６……補助タンク、１１ａ，１１ｂ……セ
ル、１２ａ，１２ｂ……小型ポンプ、１３ａ，１
３ｂ……発光器、１４ａ，１４ｂ……光度計、１
５……濃度測定回路、１６……コントローラ。
FIG. 1 is a diagram showing the correlation between the flux concentration in the cleaning liquid and the incidence of poor contact, and FIG. 2 is a diagram showing the configuration of a cleaning apparatus that is an embodiment of the present invention. 2, 3...Cleaning tank, 4...Pump, 5...Distiller, 6...Auxiliary tank, 11a, 11b...Cell, 12a, 12b...Small pump, 13a, 1
3b...Light emitter, 14a, 14b...Photometer, 1
5...Concentration measurement circuit, 16...Controller.
Claims (1)
に蒸留機を介在させて洗浄液を循環させる構成の
洗浄装置において、蒸留機から送り出された洗浄
液が最初に流入する最前段の洗浄槽内の洗浄液に
ついて特定波長光の吸収量または透過量を測定す
るとともに、該蒸留機から送り出されて該最前段
洗浄槽に流入する前の洗浄液について該特定波長
光の吸収量または透過量を測定し、これら２つの
測定の測定値から該最前段洗浄槽内の洗浄液中の
フラツクス濃度を求めることを特徴とするフラツ
クス濃度測定方法。1. In a cleaning device configured to circulate cleaning liquid through one or multiple cleaning tanks connected in series with a distiller interposed, the cleaning tank in the first stage into which the cleaning liquid sent out from the distiller first flows. The amount of absorption or transmission of light of a specific wavelength is measured for the cleaning liquid, and the amount of absorption or transmission of light of a specific wavelength is measured for the cleaning liquid sent out from the distillation machine before flowing into the first-stage cleaning tank, and these are measured. A flux concentration measuring method characterized in that the flux concentration in the cleaning liquid in the first-stage cleaning tank is determined from the measured values of two measurements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3734683A JPS59163541A (en) | 1983-03-09 | 1983-03-09 | Flux concentration measurement method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3734683A JPS59163541A (en) | 1983-03-09 | 1983-03-09 | Flux concentration measurement method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59163541A JPS59163541A (en) | 1984-09-14 |
| JPH0452405B2 true JPH0452405B2 (en) | 1992-08-21 |
Family
ID=12495014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3734683A Granted JPS59163541A (en) | 1983-03-09 | 1983-03-09 | Flux concentration measurement method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59163541A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0453484U (en) * | 1990-09-11 | 1992-05-07 | ||
| WO1996029598A1 (en) * | 1995-03-17 | 1996-09-26 | Hitachi, Ltd. | Waste water control system |
| JP5303395B2 (en) * | 2009-08-05 | 2013-10-02 | アクトファイブ株式会社 | Cleaning method and cleaning device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0228917A (en) * | 1988-07-19 | 1990-01-31 | Hitachi Condenser Co Ltd | Capacitor in case |
-
1983
- 1983-03-09 JP JP3734683A patent/JPS59163541A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59163541A (en) | 1984-09-14 |
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