JPH0452989Y2 - - Google Patents

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a processing apparatus suitable for use in, for example, developing processing or etching processing during a photolithography process for manufacturing photomasks and semiconductor devices.

[Conventional technology]

Conventionally, as the above-mentioned processing apparatus, one configured as shown in FIG. 2 is known.

That is, this processing apparatus includes a processing chamber 1 and a drive motor (not shown) disposed within the processing chamber 1.
The sample stage 2 rotates at a constant speed (for example, during development and etching processing: 100 to 500 rpm), and a nozzle 3 as a processing liquid discharging means attached to the upper part of the inner wall of the processing chamber 1 is provided.

In this processing apparatus, while the sample stage 2 is rotating at a constant speed, an object to be processed 4 (for example, a photomass blank on which a selectively exposed resist film is attached) is placed and held on the sample stage 2. ) from the nozzle 3 toward the surface of the
is injected to treat the object 4. In addition, the second
The reference numeral 6 shown in the figure is a discharge port for discharging the processing liquid etc. scattered from the surface of the rotating workpiece 4. In order to increase the discharge force from the discharge port 6, a lower part of the discharge port 6 is provided. An exhaust fan (not shown) is attached.

[Problem that the invention attempts to solve]

By the way, during the processing of the object to be processed 4, the processing liquid 5 such as a developer or an etching liquid vaporizes in large quantities in the processing chamber 1 and takes away the heat of vaporization. ) decreases moment by moment during the process, and at the end of the process it is much lower than at the start of the process.

Further, as described above, since the processing liquid 5 vaporizes in large quantities within the processing chamber 1, the humidity within the processing chamber 1 increases moment by moment during processing.

As described above, in conventional processing apparatuses, the temperature and humidity inside the processing chamber 1 change moment by moment while processing a certain object 4, making it difficult to perform a prescribed process on the object 4. The following problem arises.

Furthermore, another problem is that when processing a plurality of objects in succession, the processing conditions sometimes become unstable. Here, if we take development processing as an example, some positive resists have
The development speed may vary greatly depending on the temperature and humidity within the processing chamber, and what is worse is that the temperature and humidity within the processing chamber change moment by moment during processing, as described above. After one treatment, it takes a considerable amount of time to return the temperature and humidity inside the treatment chamber to the initial state (temperature and humidity) unless a forced operation is performed. Therefore, unless there is a considerable time interval between processes, processes will begin at different temperatures and humidity, and the development process will be different for each process. To solve this problem, constant temperature and humidity devices may be installed, but
Both of these devices are large-scale, and especially when controlling humidity, the devices are quite large-scale and expensive. Note that, not only in the case of development processing but also in the case of etching processing, the etching processing differs for each processing, as described above.

Therefore, the present invention aims to solve the above-mentioned problems and provide a processing apparatus that has a simple structure, suppresses fluctuations in temperature and humidity within the processing chamber, and can easily carry out predetermined processing. .

[Means for solving problems]

The present invention was made to achieve the above-mentioned object, and includes a processing chamber, a sample stage arranged in the processing chamber and rotated by a drive device, and an object to be processed placed on the sample stage. The processing chamber includes a discharge means for discharging a processing liquid toward the processing chamber, and a spray means for discharging a mist made of a liquid containing water as a main component, and the mist is generated within the processing chamber. .

Furthermore, in order to most effectively suppress fluctuations in temperature and humidity within the processing chamber, it is desirable that the mist be generated while filling the processing chamber.

[Effect]

In the processing apparatus according to the present invention, since a mist of liquid mainly composed of water is generated inside the processing chamber, the processing liquid is difficult to vaporize, and thus fluctuations in temperature and humidity inside the processing chamber are suppressed. . Furthermore, when the processing chamber is filled with and generated mist, fluctuations in temperature and humidity within the processing chamber are most effectively suppressed.

〔Example〕

Hereinafter, a processing apparatus according to an embodiment of the present invention will be explained with reference to FIG. In FIG. 1, the same components and parts as shown in FIG. 2 are designated by the same reference numerals, and their explanations will be omitted.

As shown in FIG. 1, the processing apparatus according to the present embodiment includes a processing chamber 1a with an open top, and a processing chamber 1a with an open top.
a hood 7 that covers the surroundings of the processing chamber 1a, and an injection nozzle 9 that is attached upward to a side plate portion of the hood 7 near the upper end of the processing chamber 1a and that sprays a mist 8 made of pure water, which will be described later. The injection nozzle 9 always injects the atomized material 8 toward the upper side of the opening of the processing chamber 1a, and the atomized material 8 is discharged by an exhaust fan (not shown) attached below the discharge port 6. ), the particles settle from above to below the processing chamber 1a, filling the processing chamber 1a.

As the injection nozzle 9, a two-fluid nozzle such as an air atomizing nozzle that introduces gas into the liquid to be injected was used in order to eject the liquid such as pure water in the form of a fine mist. One end of the injection nozzle 9 is provided with a pipe 12 for supplying pure water 11 contained in a pure water tank 10, and a gas (for example, N ₂ gas)
A pipe 13 for introducing the water is attached. Then, the pure water 11 contained in the pure water tank 10 is supplied to the injection nozzle 9 through the pump 1 through the piping 12.
4 and pressurized gas (N ₂ ) is also introduced through the pipe 13, and the injection nozzle 9 injects the mist 8. Note that 1 shown in Figure 1
5 is a filter for purifying pure water 11;
Further, 16 and 17 are valves which are opened when supplying pure water 11 and introducing gas, respectively.

When processing the object 4 using the processing apparatus described above, a door (not shown) provided on the side plate of the hood 7 that can be opened and closed is opened while the processing chamber 1a is filled with the mist 8. ), the object to be processed 4 is placed on the sample stand 2, and then the sample stand 2 is rotated at a constant speed, and the processing liquid 5 is sprayed from the nozzle 3 toward the object to be processed 4 for processing. In addition, when processing is performed on multiple objects to be processed continuously, the 4 objects to be processed that have finished processing
is removed from the processing apparatus, and then the next object to be processed is placed on the sample stage 2 as described above and processed in the same manner, and this operation is repeated thereafter. Incidentally, since the injection nozzle 9 constantly sprays the mist 8, the processing chamber 1a is filled with the mist 8 during each of the above-mentioned treatments.

Thus, according to the processing apparatus described above, the processing chamber 1
Since the mist 8 made of pure water fills and is generated in the chamber a, the processing liquid 5 is difficult to vaporize during processing of the object 4 and effectively suppresses fluctuations in temperature and humidity within the processing chamber 1a. can. Therefore, it becomes easy to perform the predetermined treatment on the object 4 as originally expected.

Furthermore, even when processing a plurality of objects in succession, fluctuations in temperature and humidity within the processing chamber 1a are effectively suppressed as described above. The next process can be started with the temperature and humidity substantially the same as the initial state (temperature and humidity), and the process is performed while suppressing fluctuations in temperature and humidity within the process chamber 1a during the next process. be able to. Therefore, even if the processing is performed continuously, it is possible to prevent the processing condition from changing for each processing, and to perform stable and uniform processing on each object to be processed. In addition, since the temperature and humidity inside the processing chamber 1a when starting the next consecutive process are approximately the same as the initial state, there is no need to wait a considerable amount of time until the initial state returns to the previous state. It is also possible to improve the operating rate of the processing equipment.

The present invention is not limited to the embodiments described above.

In addition to the two-fluid nozzle, other types of injection nozzles that spray atomized material may be used as the injection nozzle, and other means such as an injector may be used as the injection means other than the injection nozzle. good.

In the above embodiment, the processing chamber was filled with mist and was generated, but it does not necessarily have to be filled.
It is sufficient that the occurrence occurs to the extent that fluctuations in temperature and humidity within the processing chamber can be suppressed. Further, the degree of generation of the mist can be determined depending on the allowable range of variation in the processing condition of the object to be processed, the processing interval during continuous processing, and the like. Further, the atomized material does not necessarily need to be constantly injected from the injection nozzle, but may be injected intermittently as long as the generation of the atomized material within the processing chamber is ensured.

Although the installation position and direction of the spray nozzle can be set arbitrarily, in order to prevent the treatment of the processed material from being affected by the sprayed mist,
It is desirable to set the spray nozzle so that the atomized material is not sprayed directly toward the object to be processed, and for example, a spray nozzle with the spray port facing upward may be disposed above the opening of the processing chamber.

In the above embodiments, the mist was made of pure water, but it may be made of water as a main component mixed with other substances (for example, a developer or a substance constituting the developer during development processing).

In addition to the nozzle described in the above embodiments, the means for discharging the treatment liquid may be a pipe-shaped means for dropping the treatment liquid. In addition, the hood may be omitted if you are not concerned about the mist scattering around the processing equipment. can be installed directly in the processing chamber.

Processing chambers are not limited to those with an open top;
The spray nozzle may be disposed within the processing chamber, and the upper portion may be closed so as to ensure sufficient space within the processing chamber so as not to obstruct the spraying of the atomized material.

[Effect of idea]

As explained above, according to the processing apparatus of the present invention, mist is generated in the processing chamber to suppress the vaporization of the processing liquid, so the structure is simple and the fluctuations in temperature and humidity inside the processing chamber can be effectively controlled. can be suppressed to Therefore, it is easy to perform a predetermined process on the object to be processed, and furthermore, even when processing a plurality of objects in succession, stable and uniform processing can be performed. Furthermore, the practical effects are extremely large, such as being able to improve the operating rate of the device.

[Brief explanation of drawings]

FIG. 1 is a block diagram showing a processing apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram showing a conventional processing apparatus. 1a...Processing chamber, 2...Sample table, 3...Nozzle, 4...Processing object, 5...Processing liquid, 8...Mist, 9...Spray nozzle, 11...Pure water.

Claims (1)

[Scope of utility model registration request] A processing chamber, a sample stage arranged in the processing chamber and rotated by a drive device, a discharge means for discharging a processing liquid toward an object to be processed placed on the sample stage, and a system comprising water as a main component. and a spraying means for spraying a mist made of a liquid, wherein the mist is generated within the processing chamber.