JPH0453932A - Production of nonlinear optical element - Google Patents
Production of nonlinear optical elementInfo
- Publication number
- JPH0453932A JPH0453932A JP16364290A JP16364290A JPH0453932A JP H0453932 A JPH0453932 A JP H0453932A JP 16364290 A JP16364290 A JP 16364290A JP 16364290 A JP16364290 A JP 16364290A JP H0453932 A JPH0453932 A JP H0453932A
- Authority
- JP
- Japan
- Prior art keywords
- nonlinear optical
- optical waveguide
- waveguide groove
- dry etching
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、レーザ光の波長変換を行う非線形光学素子に
おいて、その光導波路の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing an optical waveguide in a nonlinear optical element that converts the wavelength of laser light.
(従来波i)
多種ある非線形光学現象の中でも第2次高調波発生(S
HG)はレーザ光の波長を簡便に半分に短波長化できる
ため、オプトエレクトロニクス分野において光デイスク
用の光源やレーザプリンタ用の光源等光記録、光源への
応用を目視した研究がなされている。(Conventional wave i) Among the many types of nonlinear optical phenomena, second harmonic generation (S
Since HG) can easily shorten the wavelength of laser light by half, visual research is being conducted on its application to optical recording and light sources such as light sources for optical disks and light sources for laser printers in the field of optoelectronics.
最近、2− methyl−4−nitroanili
ne(MNA )に代表されるπ−電子共役系を有した
有機結晶が、極めて2次の非線形光学特性が高く、従来
のKDP(KHzPOa )やL N (L 1Nbo
3)などのような、よく知られた無機結晶に比して、1
03倍程度効率が高いことが予想され、多くの研究がな
されている。Recently, 2-methyl-4-nitroanili
Organic crystals with a π-electron conjugated system, represented by ne (MNA), have extremely high second-order nonlinear optical properties, and are superior to conventional KDP (KHzPOa) and LN (L1Nbo).
3) Compared to well-known inorganic crystals such as
It is expected that the efficiency will be about 3 times higher, and many studies have been conducted.
また、非線形光学現象は光のパワー密度が高いことが要
求されるため、なるべく狭い領域に光を閉じ込める方法
が検討されている。その方法としては、
(1)2枚のガラス基板間に平面状に有機非線形光学単
結晶薄膜を成長させて、スラブ型光導波路とする方法、
(2)2枚のガラス基板間にスペーサーを設けて、その
隙間に有機非線形光学素材を充填し、その後結晶成長さ
せて三次元光導波路とする方法、などが検討されている
。Furthermore, since nonlinear optical phenomena require high optical power density, methods of confining the light in as narrow a region as possible are being studied. The methods include: (1) growing an organic nonlinear optical single crystal thin film between two glass substrates to form a slab-type optical waveguide; (2) providing a spacer between the two glass substrates. Therefore, methods of filling the gap with an organic nonlinear optical material and then growing crystals to form a three-dimensional optical waveguide are being considered.
(発明が解決しようとする課題)
一般にMNAなどの高い非線形光学特性を有する材料で
も、なるべく狭い領域に効率よくその材料を充填し、か
つ結晶成長させた光導波路形態をとらなければ、実用的
にはその効果は減少してしまう。(Problems to be Solved by the Invention) In general, even with materials such as MNA that have high nonlinear optical properties, it is difficult to put them into practical use unless the material is efficiently filled into a narrow area and a crystal-grown optical waveguide is formed. The effect will be reduced.
前記(1)のスラブ型光導波路では、垂直方向への光の
閉じ込めは可能であるが、水平方向への光の閉じ込めは
不可能であシ、そのため非線形光学効果は減少してしま
う。In the slab type optical waveguide of (1) above, light can be confined in the vertical direction, but light can not be confined in the horizontal direction, so the nonlinear optical effect is reduced.
また、前記(2)の三次元光導波路では垂直方向。In addition, in the three-dimensional optical waveguide of (2) above, the vertical direction.
水平方向ともに光の閉じ込めが可能であるが、従来から
光導波溝の作製の際には一般にスペーサを設けることが
多く、任意のキャピラリ形状を容易得ることが困難であ
った。そのため歩留シが悪くまた作業効率も低下し、非
線形光学素子の製造工程上好ましくなかった。Although it is possible to confine light both in the horizontal direction, conventionally, spacers have often been provided when producing optical waveguide grooves, making it difficult to easily obtain an arbitrary capillary shape. As a result, the yield rate was poor and the working efficiency was also reduced, which was unfavorable in the manufacturing process of nonlinear optical elements.
(課題を解決するための手段及び作用)本発明の目的は
、従来の光導波路に比べて垂直方向、水平方向ともに有
機非線形光学結晶を閉じ込められる狭い領域を確保した
三次元光導波路を再現性よく作製し、従来にないより高
い非線形光学効果を引き出すことを実現可能ならしめる
有機非線形光学素子とその製造方法とを提供することに
ある。(Means and Effects for Solving the Problems) An object of the present invention is to create a three-dimensional optical waveguide that has a narrow area in which an organic nonlinear optical crystal can be confined in both the vertical and horizontal directions, with better reproducibility than conventional optical waveguides. An object of the present invention is to provide an organic nonlinear optical element that can be produced and bring out higher nonlinear optical effects than ever before, and a method for manufacturing the same.
本発明における非線形光学素子は、中心部は非線形光学
特性の高い素材からなり、その周囲が対象とする波長領
域で透明である(空気も含む)材料からなる平面型非線
形光学素子において、三次元光導波路構造を構成するに
際して、直接ドライエツチング法によシ光導波溝t−形
成し、その先導波溝内に有機非線形光学素材を充填し、
結晶成長させることによシ得られるものである。The nonlinear optical element of the present invention is a planar nonlinear optical element whose central part is made of a material with high nonlinear optical properties and whose surroundings are made of a material that is transparent (including air) in the target wavelength range. When configuring the waveguide structure, an optical waveguide groove T is formed by a direct dry etching method, and an organic nonlinear optical material is filled in the leading wave groove.
It is obtained by growing crystals.
光導波溝形成にドライエツチング法を用いることによシ
、簡便かつ一度に大量にしかも歩留まりよく、非線形光
学素子を作成することができるとの結論に達した。We have reached the conclusion that by using the dry etching method to form optical waveguide grooves, nonlinear optical elements can be produced simply and in large quantities at a time with a high yield.
〔実施例)
本発明の一実施例を第1図から第3図を用いて説明する
が、本発明はこれに限定されるものではない。[Example] An example of the present invention will be described using FIGS. 1 to 3, but the present invention is not limited thereto.
第1図fal乃至filは光導波溝の作製工程である。FIG. 1 fal to fil are steps for manufacturing an optical waveguide groove.
本実施例では反応性イオンエツチング(RIE:Rea
ctive Ion Etching以下RIEという
。)を用いた。工程としては通常のエツチング工程とあ
る。ただし、半導体プロセスでRIEを用いる場合それ
ほど深くエツチングする必要がなくc数十nm〜数百n
m )、マスクもポジのフォトレジストだけで十分であ
るが、本発明では工・1チング深さをミクロンオーダー
で任意に設定可能とする之め、金属とポジのフ・オドレ
ジストの両方を重ねて用いた。これはフォトレジストだ
けでは十分なエツチング深さが得られないためである。In this example, reactive ion etching (RIE: Rea
Active Ion Etching is hereinafter referred to as RIE. ) was used. The process is a normal etching process. However, when RIE is used in the semiconductor process, it is not necessary to etch as deeply as the etching depth is from several tens of nanometers to several hundred nanometers.
m), a positive photoresist is sufficient for the mask, but in the present invention, since the etching depth can be arbitrarily set on the order of microns, both the metal and the positive photoresist are overlapped. Using. This is because sufficient etching depth cannot be obtained with photoresist alone.
以下第1図(al〜(ilを用いて説明する。The following will be explained using FIGS. 1(al to il).
ガラス基板(24awX241WX1■)をよく洗浄し
九後、真空蒸着法によシ金1!(Cu)膜を形成し、さ
らにポジ型フォトレジヌトをスピンコータで4〜5μ票
の厚さに塗布し、プリベーク後密着露光並びに現像を行
い、幅約5μ説の直線状の溝を形成する。その後希硝酸
に浸して露出している金属をエツチングすることによっ
てマスクを形成しRIEを行う。約10μ鯛の深さまで
ガラスをエツチングした後、不要となったレジストは0
2ガスで灰化し除去する。さらにその後希硝酸に浸して
金属を除去する。第2図にはここで用いたRIE装置の
概略図を示す。After thoroughly cleaning the glass substrate (24aw x 241w x 1), a layer of gold was applied using a vacuum evaporation method. A (Cu) film is formed, and a positive photoresin is applied to a thickness of 4 to 5 μm using a spin coater. After prebaking, contact exposure and development are performed to form linear grooves approximately 5 μm in width. Thereafter, the exposed metal is etched by dipping in dilute nitric acid to form a mask, and RIE is performed. After etching the glass to a depth of about 10 μm, there is no unnecessary resist.
Ash and remove with 2 gases. Then, the metal is removed by soaking it in dilute nitric acid. FIG. 2 shows a schematic diagram of the RIE apparatus used here.
こうして作製した光導波溝付き基板の上面に溝を形成し
ていない基板を重ね合わせることによシできた空隙に、
MNAをキャピラリライズ法によ多充填し、水平ブリッ
ジマン法によ多結晶成長を行うことによって光導波路を
形成した。またこの後上面基板を剥がすことによシ、上
面クラブト層が空気の先導波路とすることも可能である
(第8図)。In the gap created by overlapping the substrate without grooves on the top surface of the substrate with optical waveguide grooves produced in this way,
An optical waveguide was formed by filling a large number of MNAs by the capillary rise method and growing polycrystals by the horizontal Bridgman method. Further, by peeling off the upper substrate after this, it is possible to use the upper crab layer as a leading wave path for air (FIG. 8).
なお、本実施例では結晶成長に際して水平プリフジマン
法を用いたが、溶媒蒸着法を用いても何等差し支えない
。In this example, the horizontal Prifgeman method was used for crystal growth, but a solvent evaporation method may also be used.
(発明の効果)
本発明の非線形光学素子とその製造方法は次のような効
果がある。(Effects of the Invention) The nonlinear optical element and the manufacturing method thereof of the present invention have the following effects.
(1)本発明の非線形光学素子は、垂直方向、水平方向
ともに狭く限られた部分に光導波路の中心部が形成され
ているため、光の閉じ込めが効果的に行われ効率の高い
素子となっている。(1) In the nonlinear optical element of the present invention, the center of the optical waveguide is formed in a narrow and limited area both in the vertical and horizontal directions, so light is effectively confined and the element is highly efficient. ing.
(2)本発明の製造方法によれば、垂直方向だけでなく
水平方向の狭く限られた部分にも有機結晶を成長させる
ことができる。このため得られた非線形光学素子は、光
パワー密度が高く効率のよいものとなる。(2) According to the manufacturing method of the present invention, organic crystals can be grown not only in the vertical direction but also in a narrowly limited portion in the horizontal direction. Therefore, the obtained nonlinear optical element has high optical power density and high efficiency.
(3)本発明による製造方法はブリッジマン法あるいは
溶媒蒸発法で作製できる結晶に応用できるため、適用で
きる材料が多い。(3) Since the production method according to the present invention can be applied to crystals that can be produced by the Bridgman method or the solvent evaporation method, it can be applied to many materials.
(4)本発明による光導波溝の作製においては、ドライ
エッチング法を用いているため、比較的簡便でかつ一度
に大量に、しかも歩留まり良く素子作製ができるため、
製造コヌトの削減につながる。(4) In the production of the optical waveguide groove according to the present invention, a dry etching method is used, so it is relatively simple, and devices can be produced in large quantities at a time with a high yield.
This will lead to a reduction in manufacturing costs.
第1図(a)乃至(i)は光導波溝の作製工程を示した
図、第2図は本発明に用いたRIE装置の概略図、第8
図[alは本発明により得られた非線形光学素子の断面
図、第8図[blは本発明により得られた非線形光学素
子の平面図である。
代理人 弁理士 梅 1) 勝(他2名)(Cl)[
=二===コI境
<r)ロ=]二=コqを
第1図
第゛3
図1(a) to (i) are diagrams showing the manufacturing process of the optical waveguide groove, FIG. 2 is a schematic diagram of the RIE apparatus used in the present invention, and FIG.
Figure [al] is a sectional view of the nonlinear optical element obtained according to the present invention, and Figure 8 [bl] is a plan view of the nonlinear optical element obtained according to the present invention. Agent Patent Attorney Ume 1) Masaru (2 others) (Cl) [
=2===koI boundary<r)b=]2=koq in Figure 1Figure 3
Claims (1)
その周囲が対象とする波長域で透明である1つ以上の材
料からなる非線形光学素子の作製方法において、 前記対象とする波長域で透明である材料にドライエッチ
ングを施して光導波溝を形成し、該光導波溝に有機非線
形光学材料を結晶成長させることを特徴とする非線形光
学素子の作製方法。[Claims] 1. The center portion is made of an organic material with high nonlinear optical properties,
In a method for manufacturing a nonlinear optical element made of one or more materials whose surroundings are transparent in a target wavelength range, an optical waveguide groove is formed by performing dry etching on the material that is transparent in the target wavelength range. . A method for manufacturing a nonlinear optical element, which comprises growing a crystal of an organic nonlinear optical material in the optical waveguide groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16364290A JPH0453932A (en) | 1990-06-21 | 1990-06-21 | Production of nonlinear optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16364290A JPH0453932A (en) | 1990-06-21 | 1990-06-21 | Production of nonlinear optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0453932A true JPH0453932A (en) | 1992-02-21 |
Family
ID=15777827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16364290A Pending JPH0453932A (en) | 1990-06-21 | 1990-06-21 | Production of nonlinear optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0453932A (en) |
-
1990
- 1990-06-21 JP JP16364290A patent/JPH0453932A/en active Pending
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