JPH0454508B2 - - Google Patents
Info
- Publication number
- JPH0454508B2 JPH0454508B2 JP60229508A JP22950885A JPH0454508B2 JP H0454508 B2 JPH0454508 B2 JP H0454508B2 JP 60229508 A JP60229508 A JP 60229508A JP 22950885 A JP22950885 A JP 22950885A JP H0454508 B2 JPH0454508 B2 JP H0454508B2
- Authority
- JP
- Japan
- Prior art keywords
- wastewater
- added
- sio
- polymer flocculant
- iron powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Separation Of Suspended Particles By Flocculating Agents (AREA)
Description
【発明の詳細な説明】
(イ) 技術分野
本発明は、微細粒子が懸濁する排水を処理する
方法に関するもので、特に半導体製造工程等から
排出される微細なSiO2（硅酸）粒子を処理するこ
とに特徴のあるものである。[Detailed Description of the Invention] (a) Technical Field The present invention relates to a method for treating wastewater in which fine particles are suspended, and in particular, a method for treating fine SiO 2 (silicic acid) particles discharged from semiconductor manufacturing processes, etc. It is characterized by its processing.
(ロ) 従来技術
近年、半導体産業の発展と共に、この製造工程
においてモノシラン等のシランガスを使用する機
会が多くなり、それに伴つてそのガス処理が問題
となり、燃焼等によりSiO2として固定し、これ
を水洗によつて排液として処理するのが通常であ
る。(b) Prior art In recent years, with the development of the semiconductor industry, opportunities to use silane gas such as monosilane in this manufacturing process have increased, and with this, gas processing has become a problem. Usually, it is treated as wastewater by washing with water.
この場合、排液中のSiO2は非常に微細な形態
であり、これを処理する方法としては、硫酸バン
ドを添加して共沈させる方法が良く知られている
が、充分な除去率を得るまでに至つていないのが
現状である。 In this case, the SiO 2 in the wastewater is in a very fine form, and a well-known method for treating this is to add sulfuric acid band to cause coprecipitation, but this method does not achieve a sufficient removal rate. The current situation is that this has not yet been achieved.
(ハ) 発明の構成
本発明は、上述のような従来法における問題を
解決した新規な微細粒子含有排水の処理方法を提
供するものである。(C) Structure of the Invention The present invention provides a novel method for treating wastewater containing fine particles, which solves the problems of the conventional methods as described above.
即ち、本発明は微細粒子懸濁排水を処理するに
際し、まず原液のPHを４以下好ましくは２〜４に
調整した後、鉄粉を添加して撹拌した後、アルカ
リ剤を添加してPHを７以上好ましくは８〜10に調
整して酸化処理した後、有機系の高分子凝集剤を
添加して固液分離することを特徴とするものであ
る。 That is, when treating fine particle suspended wastewater, the present invention first adjusts the pH of the stock solution to 4 or less, preferably 2 to 4, then adds iron powder and stirs, and then adds an alkali agent to lower the pH. It is characterized in that after adjusting the temperature to 7 or more, preferably 8 to 10, and oxidizing it, an organic polymer flocculant is added and solid-liquid separation is performed.
更に良好な形態としては、例えばSiO2等の微
細粒子が懸濁する排水のPHをPH４以下好ましくは
２〜４に調整した後、鉄粉を添加して一定時間撹
拌し、次いでNaOH等のアルカリ剤を添加して
PHをアルカリ側好ましくは８〜10調整し、エアレ
ーションや撹拌等の酸化処理を施した後、有機系
でノニオン系の高分子凝集剤を添加して固液分離
するもので、これにより液中のSiO2はほとんど
除去される。 For a better form, for example, after adjusting the pH of the wastewater in which fine particles such as SiO 2 are suspended to 4 or less, preferably 2 to 4, iron powder is added and stirred for a certain period of time, and then an alkali such as NaOH is added. by adding the agent
After adjusting the pH to an alkaline side, preferably 8 to 10, and performing oxidation treatments such as aeration and stirring, an organic nonionic polymer flocculant is added to perform solid-liquid separation. Most of the SiO 2 is removed.
本発明において、鉄粉のSiO2に対する挙動は
充分には解明されていないが、鉄粉自体及び該鉄
粉が酸と反応して溶出した鉄イオンがアルカリ剤
と反応して生成した活性度を有する水酸化鉄によ
りSiO2を吸着し、かつアルカリ側において上記
の高分子凝集剤と反応して、充分に共沈するもの
と思われる。 In the present invention, although the behavior of iron powder toward SiO 2 has not been fully elucidated, the activity of the iron powder itself and the iron ions eluted when the iron powder reacts with acid reacts with an alkali agent. It is thought that SiO 2 is adsorbed by the iron hydroxide contained therein, and reacts with the above-mentioned polymer flocculant on the alkali side, resulting in sufficient co-precipitation.
以下に本発明法を実施例をもつて詳細に説明す
る。 The method of the present invention will be explained in detail below using examples.
(ニ) 実施例
実施例
半導体製造工程から排出されたSiO2を1000
mg／含有する排水１に鉱酸を添加してPH3.0
とし、この排水に鉄粉を10ｇ添加して３分間撹拌
した後、NaOHを添加してPH8.2にし、エアレー
ションした後、高分子凝集剤としてポリアクリル
アミド（ノニオン系）を10mg／添加して30秒間
撹拌した。その後、３分間静置して固液分離を行
つた。(d) Example Example SiO 2 discharged from the semiconductor manufacturing process is
PH3.0 by adding mineral acid to wastewater 1 containing mg/
Then, 10g of iron powder was added to this wastewater, stirred for 3 minutes, NaOH was added to adjust the pH to 8.2, aeration was performed, and 10mg of polyacrylamide (nonionic) was added as a polymer flocculant. Stir for seconds. Thereafter, the mixture was allowed to stand for 3 minutes to perform solid-liquid separation.
液中のSiO2を分析した結果は２mg／であ
つた。 The analysis result of SiO 2 in the liquid was 2 mg/.
比較例 １
上記実施例と同一の排水１に、鉄粉を添加す
ることなく、NaOHを添加してPHを約８に調整
し、３分間撹拌したのち高分子凝集剤（ポリアク
リルアミド）を10mg／添加して再び30秒間撹拌
後、３分間静置して固液分離を行ない、液中の
SiO2を分析した。Comparative Example 1 To the same wastewater 1 as in the above example, without adding iron powder, NaOH was added to adjust the pH to about 8, and after stirring for 3 minutes, 10 mg/kg of polymer flocculant (polyacrylamide) was added. After adding it and stirring again for 30 seconds, let it stand for 3 minutes to perform solid-liquid separation.
SiO2 was analyzed.
その結果、SiO2は980mg／であり、ほとんど
除去されなかつた。 As a result, the amount of SiO 2 was 980 mg/, which was hardly removed.
比較例 ２
上記実施例の同一の排水１に、鉄粉を添加す
ることなく、NaOHを添加してPHを約８に調整
し、３分間撹拌したのち高分子凝集剤として硫酸
バンドを１％の割合で添加して再び30秒間撹拌
後、３分間静置して固液分離を行ない、液中の
SiO2を分析した。Comparative Example 2 To the same wastewater 1 of the above example, without adding iron powder, NaOH was added to adjust the pH to about 8, and after stirring for 3 minutes, 1% of sulfuric acid was added as a polymer flocculant. After stirring again for 30 seconds, let stand for 3 minutes to perform solid-liquid separation.
SiO2 was analyzed.
その結果SiO2は450mg／であり、更に液中
に懸濁粒子が残存していることが確認された。 As a result, it was confirmed that the amount of SiO 2 was 450 mg/, and that suspended particles remained in the liquid.
(ホ) 発明の効果
以上の如く、本発明法によれば従来の各種処理
法では不適当であつた微細粒子懸濁排水を低コス
トで完全に処理できる利点がある。(E) Effects of the Invention As described above, the method of the present invention has the advantage that fine particle suspended wastewater, for which various conventional treatment methods were unsuitable, can be completely treated at low cost.
Claims (1)
粒子懸濁排水を処理する際に、該排水のPHを４以
下好ましくは２〜４に調整し、鉄粉を添加して撹
拌した後、アルカリ剤を添加してPHを８〜10に調
節して酸化処理した後、有機系高分子凝集剤を添
加して固液分離することを特徴とする微細粒子懸
濁排水の処理方法。1 When treating SiO 2 fine particle suspended wastewater discharged from semiconductor manufacturing factories, etc., the pH of the wastewater is adjusted to 4 or less, preferably 2 to 4, and after adding iron powder and stirring, an alkali agent is added. 1. A method for treating fine particle suspended wastewater, which comprises adding an organic polymer flocculant to perform oxidation treatment by adjusting the pH to 8 to 10, followed by solid-liquid separation by adding an organic polymer flocculant.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22950885A JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22950885A JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6291288A JPS6291288A (en) | 1987-04-25 |
| JPH0454508B2 true JPH0454508B2 (en) | 1992-08-31 |
Family
ID=16893272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22950885A Granted JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6291288A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2800367B1 (en) * | 1999-11-03 | 2001-12-28 | Air Liquide Electronics Sys | PROCESS FOR REMOVING SOLID PARTICLES, IN PARTICULAR SILICA AND / OR ALUMINA FROM AQUEOUS EFFLUENTS |
| DE10022561A1 (en) * | 2000-05-10 | 2001-11-22 | Infineon Technologies Ag | Purification of aqueous waste liquor containing silicon from chip production involves acidifying liquor by adding metal salt, neutralizing by adding aqueous caustic alkali solution and removing silicon |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5016351A (en) * | 1973-06-01 | 1975-02-20 | ||
| JPS5136757A (en) * | 1974-09-09 | 1976-03-27 | Lion Fat Oil Co Ltd | Gyoshuchindenhoho |
-
1985
- 1985-10-15 JP JP22950885A patent/JPS6291288A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6291288A (en) | 1987-04-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |