JPH045503A - Inclination correcting method - Google Patents
Inclination correcting methodInfo
- Publication number
- JPH045503A JPH045503A JP10609390A JP10609390A JPH045503A JP H045503 A JPH045503 A JP H045503A JP 10609390 A JP10609390 A JP 10609390A JP 10609390 A JP10609390 A JP 10609390A JP H045503 A JPH045503 A JP H045503A
- Authority
- JP
- Japan
- Prior art keywords
- scanning
- sample
- probe
- signal
- sample surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 14
- 239000000523 sample Substances 0.000 claims abstract description 112
- 238000012937 correction Methods 0.000 claims description 6
- 238000005259 measurement Methods 0.000 abstract description 10
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、探針を試料表面上で走査し試料表面形状の測
定を行う測定装置における、試料表面の傾きを補正する
方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for correcting the inclination of a sample surface in a measuring device that measures the sample surface shape by scanning a probe over the sample surface.
探針の走査方向若しくは試料の取付方向を回転させて、
探針の走査方向と試料表面に必ず存在する傾きのない方
向を一致させることにより、試料表面の傾きを補正し、
探針を試料表面上で走査し試料表面の形状測定を行う測
定装置における形状測定の精度の向上と効率を実現する
ものである。By rotating the scanning direction of the probe or the mounting direction of the sample,
Corrects the tilt of the sample surface by matching the scanning direction of the probe with the direction without tilt that always exists on the sample surface.
This is intended to improve the accuracy and efficiency of shape measurement in a measuring device that measures the shape of a sample surface by scanning a probe over the sample surface.
例えば、トンネル効果を利用して試料表面と探針間の距
離を一定に保持しながら、試料表面に沿って探針を面内
方向に走査し、この時の探針の高さ情報から試料表面の
三次元微細形状を得るSTM(走査型トンネル顕微鏡)
においては、試料表面の傾きによる測定像の傾きを補正
するために、探針の高さ情報を取り込む部分にバイパス
フィルターを組み込み、試料の傾きに起因する取り込み
情報のゆるやかな増減は排除しつつ、試料表面の微細形
状の凹凸に起因する情報のみを取り込む方法、取り込ん
だ情報を後からデータ処理することにより傾き補正を行
う方法等が試みられている。For example, by using the tunnel effect to keep the distance between the sample surface and the probe constant, the probe is scanned in the in-plane direction along the sample surface, and from the height information of the probe at this time, the sample surface is STM (scanning tunneling microscope) to obtain three-dimensional microscopic shapes
In order to correct the inclination of the measurement image due to the inclination of the sample surface, a bypass filter is installed in the part that takes in the height information of the probe, while eliminating the gradual increase and decrease of the captured information caused by the inclination of the sample. Attempts have been made to include a method of capturing only information caused by minute irregularities on the surface of a sample, and a method of performing tilt correction by data processing the captured information afterwards.
しかし、バイパスフィルターを用いる方法においては、
試料表面のゆるやかな微細形状の情報が消えてしまう恐
れがあり、更に探針の走査の折り返し点である各走査線
の出発点においては、試料表面の傾きによる取り込み情
報のゆるやかな増減が急激に逆方向に変化することにな
り、この影響をバイパスフィルターで排除することはで
きず、かえって測定像を乱すこととなり、従って正確な
試料表面の微細形状を得ることが困難となる。However, in the method using a bypass filter,
There is a risk that information about the gradual fine shapes on the sample surface will disappear, and furthermore, at the starting point of each scanning line, which is the turning point of the probe's scan, the gradual increase or decrease of information acquired due to the tilt of the sample surface may suddenly occur. This will change in the opposite direction, and this influence cannot be eliminated by a bypass filter, which will instead disturb the measurement image, making it difficult to obtain an accurate microscopic shape of the sample surface.
また、後からデータ処理を行う方法においては、その処
理に大きな時間を費やすこととなり非常に効率が悪くな
るばかりでなく、測定と同時に観察像を得る同時観察も
不可能となってしまう。Furthermore, in a method in which data processing is performed later, a large amount of time is spent on the processing, which not only results in very low efficiency, but also makes it impossible to perform simultaneous observation to obtain observation images at the same time as measurement.
前記問題点は当然探針の走査方向に対して試料表面か傾
いているがゆえに発生するものである。The above problem naturally occurs because the sample surface is tilted with respect to the scanning direction of the probe.
そのため何らかの手段で探針の走査方向に対する試料表
面の傾きをなくせば前記問題点の解決をはかることが可
能となる。しかしながら、試料表面の傾きを補正するた
めの試料傾き補正テーブル等を設けることは、測定装置
の機能を複雑にするばかりでなく、その傾きを正確に補
正することは多大な労力と時間を費やすことになり、事
実上非常に困難である。Therefore, the above-mentioned problem can be solved by eliminating the inclination of the sample surface with respect to the scanning direction of the probe by some means. However, providing a sample tilt correction table to correct the tilt of the sample surface not only complicates the function of the measuring device, but also requires a great deal of effort and time to accurately correct the tilt. This is actually extremely difficult.
そこで、ある面が水平面に対して傾いた状態で存在して
いたとしても、その面上に必ず水平面と平行な直線が存
在するという点と、xy平面内をSTM等で走査する場
合、一画面分の走査を行う場合、X軸方向には何回も走
査を繰り返し行うがY軸方向にはわずか1回の走査を行
うものであるという点に着目し、探針の走査方向若しく
は試料の取付方向を回転させることにより、探針のX軸
走査方向と試料表面上に必ず存在する傾きのない方向を
一致させ、更にY軸方向の1回の走査時間、すなわち一
画面の走査時間中にわずか一回発生するのみのY軸走査
方向の試料表面の傾きに起因する探針の高さ情報の増減
を排除できる程度の極めて弱いバイパスフィルターを組
み込み試料表面の微細形状の測定を行うという方法であ
る。Therefore, even if a certain surface exists in an inclined state with respect to the horizontal plane, there is always a straight line parallel to the horizontal plane on that surface, and when scanning the xy plane with STM etc., one screen Focusing on the fact that when scanning for minutes, scanning is repeated many times in the X-axis direction, but only once in the Y-axis direction, the scanning direction of the probe or the attachment of the sample is By rotating the direction, the X-axis scanning direction of the probe coincides with the non-tilted direction that always exists on the sample surface, and furthermore, the X-axis scanning direction of the probe coincides with the non-tilted direction that always exists on the sample surface. This method measures the fine shape of the sample surface by incorporating an extremely weak bypass filter that can eliminate increases and decreases in probe height information due to the tilt of the sample surface in the Y-axis scanning direction, which occurs only once. .
前記の方法により、複雑な機構を設けて多大な補正作業
を行うことなく、探針の走査方向若しくは試料の取付方
向を回転させる手段と、取り込む探針の高さ情報に対し
ほとんど影響を与えることのないバイパスフィルターを
組み込むという簡便な手段を用いることによって、極め
て容易に試料表面の傾き補正を行い、試料表面の微細形
状の正確な測定と同時観察が可能となる。The method described above provides a means for rotating the scanning direction of the probe or the mounting direction of the sample without providing a complicated mechanism and performing a large amount of correction work, and having little influence on the height information of the probe to be captured. By using the simple means of incorporating a bypass filter without a burr, the tilt of the sample surface can be corrected very easily, allowing accurate measurement and simultaneous observation of the fine shape of the sample surface.
本実施例は、特に圧電素子を用いて探針を面内方向に走
査し、この時の探針の高さ情報から試料表面の三次元微
細形状を得る37M装置における試料表面の傾きの補正
方法について示すものであり、以下図面に従って説明を
行う。This example describes a method for correcting the inclination of a sample surface in a 37M apparatus, in which a piezoelectric element is used to scan a probe in the in-plane direction, and a three-dimensional fine shape of the sample surface is obtained from the height information of the probe at this time. The explanation will be given below according to the drawings.
(第一実施例)
第1図は本発明の第一実施例に適用する装置構成を示し
たものである。(First Embodiment) FIG. 1 shows an apparatus configuration applied to a first embodiment of the present invention.
X軸走査信号発生器1から発生するX軸方向走査信号X
を二系統に分け、一系統はCoS信号変調器5に入力し
、もう一系統は反転増幅器3で信号を反転した上でSI
N信号変調器6に入力する。X-axis scanning signal X generated from the X-axis scanning signal generator 1
is divided into two systems, one system is input to the CoS signal modulator 5, and the other system inverts the signal with the inverting amplifier 3 and then outputs the signal to the SI.
N signal is input to the modulator 6.
Y軸走査信号発生器2から発生するY軸方向走査信号Y
は、二系統に分けてそのままCO8信号変調器7とSU
N信号変調器8に入力する。基準電圧発生器4は、探針
16の面内走査方向を回転させようとする角度に応じた
基準電圧θを発生するものであり、基準電圧発生器4か
ら発注する角度に応じた基準電圧θは、四系統に分けら
れてCO8信号変調器5.7及びSIN信号変調器6,
8の基準電圧としてそれぞれ入力される。CO8信号変
調器5.7は、それぞれ入力された信号X、Yを基準電
圧θのCoS関数で変調して、それぞれxcosθ、y
cosθという信号を出力する。Y-axis scanning signal Y generated from Y-axis scanning signal generator 2
is divided into two systems and directly connected to CO8 signal modulator 7 and SU
N signal is input to the modulator 8. The reference voltage generator 4 generates a reference voltage θ corresponding to the angle at which the in-plane scanning direction of the probe 16 is to be rotated, and generates a reference voltage θ corresponding to the angle ordered from the reference voltage generator 4. is divided into four systems: a CO8 signal modulator 5.7, a SIN signal modulator 6,
8 reference voltages, respectively. The CO8 signal modulator 5.7 modulates the input signals X and Y with the CoS function of the reference voltage θ to obtain xcosθ and y, respectively.
A signal called cos θ is output.
また、SJN信号変調器6.8は、それぞれ入力された
信号−X、Yを基準電圧θのSIN関数で変調して、そ
れぞれ−XSINθ、YSINθという信号を出力する
。Further, the SJN signal modulator 6.8 modulates the input signals -X and Y using the SIN function of the reference voltage θ, and outputs signals -XSINθ and YSINθ, respectively.
CO8信号変調器5から出力された信号XC○Sθは、
SIN信号変調器8から出力された信号YSINθは、
加算器9に入力され、加算器9から出力される加算信号
YSINθ十COSθは高圧アンプ11で所望の増幅率
で増幅されて、面内走査機構の一例である円筒形圧電素
子13のX軸電極14に印加されて、円筒形圧電素子1
3の先端に取り付けられている探針16を、探針16に
対向するように配置されている試料I7の表面に沿って
、X方向に走査する。The signal XC○Sθ output from the CO8 signal modulator 5 is
The signal YSINθ output from the SIN signal modulator 8 is
The addition signal YSINθ+COSθ input to the adder 9 and output from the adder 9 is amplified at a desired amplification factor by the high voltage amplifier 11, and is applied to the X-axis electrode of the cylindrical piezoelectric element 13, which is an example of an in-plane scanning mechanism. 14, the cylindrical piezoelectric element 1
The probe 16 attached to the tip of the sample I7 is scanned in the X direction along the surface of the sample I7, which is arranged to face the probe 16.
SIN信号変調器6から出力された信号−XSINθと
、CoS信号変調器7から出力された信号VCO3θは
、加算器10に入力され、加算器10から出力される加
算信号ycosθ−XSINθは高圧アンプ12で所望
の増幅率で増幅されて、円筒形圧電素子13のX軸電極
15に印加されて、円筒形圧電素子13の先端に取り付
けられている探針16を探針16に対向するように配置
されている試料17の表面に沿って、Y方向に走査する
。The signal -XSINθ output from the SIN signal modulator 6 and the signal VCO3θ output from the CoS signal modulator 7 are input to the adder 10, and the addition signal ycosθ−XSINθ output from the adder 10 is input to the high voltage amplifier 12. The signal is amplified by a desired amplification factor and applied to the X-axis electrode 15 of the cylindrical piezoelectric element 13, and the probe 16 attached to the tip of the cylindrical piezoelectric element 13 is placed so as to face the probe 16. scan in the Y direction along the surface of the sample 17.
以上のような構成にすることにより、X軸方向走査信号
X及びY軸方向走査信号Yを、探針16の面内走査方向
を回転させるようとする角度に応した信号θに応じて、
それぞれYSINθ+XCQSθ、ycosθ−XSI
Nθに変換することが可能となり、探針16をX軸方向
にYSINθ十XCO5θ、またY軸方向にycosθ
−XSINθという信号に応じて走査することとなり、
これは角度信号θに応して探針16の面内走査方向をX
及びY信号が0の点を中心として左方向に回転させるこ
ととなり、よって探針16の面内走査方向を任意の角度
に回転させることが可能となる。 また、本装置は37
M装置構成の一部分として、図示していない部分で試料
17と探針16との間の距離は一定に制御されており、
また探針16の高さ情報は試料I7の表面形状の情報と
して取り込まれ、画像化されるようになっている。With the above configuration, the X-axis scanning signal
YSINθ+XCQSθ, ycosθ−XSI, respectively
It becomes possible to convert the probe 16 to YSINθ + XCO5θ in the X-axis direction and ycosθ in the Y-axis
Scanning is performed according to the signal -XSINθ,
This changes the in-plane scanning direction of the probe 16 to X according to the angle signal θ.
The in-plane scanning direction of the probe 16 can therefore be rotated to an arbitrary angle. In addition, this device has 37
As part of the M device configuration, the distance between the sample 17 and the probe 16 is controlled to be constant in a part not shown.
Further, the height information of the probe 16 is taken in as information on the surface shape of the sample I7 and is converted into an image.
更に、探針16の高さ情報の取り込み部には、ごく弱い
バイパスフィルター、すなわち極めて低い周波数の信号
のみカットするフィルターが組み込まれており、極めて
長い周期の傾き信号以外のすべての信号は通過し画像化
されるようになっている。Furthermore, a very weak bypass filter, that is, a filter that cuts only extremely low frequency signals, is built into the height information acquisition part of the probe 16, and all signals except for extremely long period tilt signals are passed through. It is now being visualized.
ここで、37M装置においては一般的にX軸走査信号発
生器1、及びY軸走査信号発生器2からは、その走査軌
跡が第3図の面内走査軌跡とその回転例を示す図に示さ
れるような探針走査軌跡21となるような信号が発生さ
れており、基準電酸発生器4から角度信号θを発生させ
ることによって、回転前の探針走査軌跡21が回転後の
探針走査軌跡22のように変化することになる。Here, in the 37M device, the scanning trajectories of the X-axis scanning signal generator 1 and the Y-axis scanning signal generator 2 are generally shown in FIG. 3, which shows an in-plane scanning trajectory and an example of its rotation. By generating the angle signal θ from the reference electro-acid generator 4, the probe scanning trajectory 21 before rotation changes to the probe scanning trajectory 21 after rotation. It will change like the trajectory 22.
さて、このような装置構成において、X軸走査信号発生
器1とY軸走査信号発住器2から走査信号X、Yをそれ
ぞれ発生させると、それら走査信号に応して探針16が
試料17の表面に沿って面内走査されることになる。こ
の時試料17の表面が探針16に直交する平面に比較し
て傾いていた場合、探針16の高さは試料17の表面形
状とその傾きに応して変化する。この状態で実際に探針
16の試料17の表面に沿った面内走査を行いつつ、基
準電圧発生器4から発生する角度信号θを逐次変化させ
ることにより探針16の試料17の表面に沿った面内走
査の方向を変化させていきながら、測定と同時に観察像
を得る同時観察により試料17の表面形状を観察するこ
とにより、基準電圧発生器4から発生する角度信号θに
よる探針16の試料17の表面に沿った面内走査の方向
の変化の範囲が最大180°以内で必ず、観察像の横方
向、すなわちX軸方向の傾きがなくなる点が存在する。Now, in such an apparatus configuration, when scanning signals X and Y are generated from the X-axis scanning signal generator 1 and the Y-axis scanning signal generator 2, respectively, the probe 16 moves to the sample 17 in response to these scanning signals. will be in-plane scanned along the surface of. At this time, if the surface of the sample 17 is inclined compared to a plane perpendicular to the probe 16, the height of the probe 16 changes depending on the surface shape of the sample 17 and its inclination. In this state, while actually in-plane scanning the probe 16 along the surface of the sample 17, by sequentially changing the angle signal θ generated from the reference voltage generator 4, the probe 16 is scanned along the surface of the sample 17. By observing the surface shape of the sample 17 through simultaneous observation while changing the direction of in-plane scanning and obtaining an observation image at the same time as the measurement, the angle signal θ generated from the reference voltage generator 4 is used to observe the surface shape of the probe 16. If the range of change in the direction of in-plane scanning along the surface of the sample 17 is within a maximum of 180 degrees, there always exists a point at which the observed image is no longer tilted in the lateral direction, that is, in the X-axis direction.
この時の探針16のX軸走査信号発生器1からの走査信
号Xによる走査の方向が、試料17の表面に必ず存在す
る傾きのない方向ということになる。そして以後は基準
電圧発注器4からの角度信号θを固定したままで測定を
続行すれば良いだけである。The direction in which the probe 16 is scanned by the scanning signal X from the X-axis scanning signal generator 1 at this time is the direction in which there is no inclination that always exists on the surface of the sample 17. From then on, it is only necessary to continue the measurement while keeping the angle signal θ from the reference voltage orderer 4 fixed.
以上のように何ら特別な技術を必要とせず、測定開始時
に観察像を見ながら横方向の傾きがなくなるように探針
16の面内走査方向を回転させるという極めて容易な方
法により試料17の傾き補正が行われることになる。As described above, the inclination of the sample 17 can be adjusted by the extremely easy method of rotating the in-plane scanning direction of the probe 16 so that the lateral inclination is eliminated while looking at the observed image at the start of measurement without requiring any special techniques. Corrections will be made.
(第二実施例)
第2図は本発明第二実施例に適用する装置構成を示した
ものであるが、第一実施例と傾き補正の方法はほとんど
同しであるので異なる部分のみ説明を行う。(Second Embodiment) Figure 2 shows the configuration of the device applied to the second embodiment of the present invention, but since the method of tilt correction is almost the same as in the first embodiment, only the different parts will be explained. conduct.
第一実施例においては、走査信号を回転変換することに
より探針16の試料17の表面に沿った面内走査の方向
を変える事により、X軸走査信号発生器1からの走査信
号Xによる走査の方向と試料17の表面に必ず存在する
傾きのない方向を一致させるものであるが、第二実施例
においては、基準電圧発生器4からの角度信号θにより
、試料17を搭載している試料回転ステージ18を回転
させることにより、X軸走査信号発生1からの走査信号
Xによる走査の方向と試料17の表面に必ず存在する傾
きのない方向を一致させるものであり、その他はすべて
同じである。In the first embodiment, scanning by the scanning signal In the second embodiment, the direction of the sample 17 on which the sample 17 is mounted is made to match the direction with no inclination that always exists on the surface of the sample 17. By rotating the rotary stage 18, the direction of scanning by the scanning signal .
以上のように本発明の方法を用いることにより、非常に
簡単に試料の傾き補正を行うことが可能となり、これに
より試料表面の微細形状の測定を、リアルタイムで正確
に行うことが可能となり、よって測定の高精度化、高速
化が実現する。As described above, by using the method of the present invention, it is possible to correct the tilt of the sample very easily, which makes it possible to accurately measure the minute shape of the sample surface in real time. Achieves higher precision and faster measurement.
第1図は本発明の第一実施例に適用する装置の説明図で
あり、第2図は本発明の第二実施例に適用する装置の説
明図である。また、第3図は面内走査軌跡とその回転例
を示す図である。
1・・・X軸走査信号発生器
2・・・Y軸走査信号発生器
3・・・反転増幅器
4・・・基準電圧(角度信号)発生器
5.7・・・COS信号変調器
6.8・・・SIN信号変調器
9.10・・・加算器
11、12・・・高圧アンプ
13・・・円筒形圧電素子
14・・・X軸電極
15・・・Y軸電極
16・・・探針
17・・・試料
1B・・・試料回転ステージ
19・・・回転前の面内走査エリア
20・・・回転後の面内走査エリア
21・・・回転前の探針走査軌跡
22・・・回転後の探針走査軌跡
以上
出願人 セイコー電子工業株式会社
代理人 弁理士 林 敬 之 助FIG. 1 is an explanatory diagram of an apparatus applied to a first embodiment of the invention, and FIG. 2 is an explanatory diagram of an apparatus applied to a second embodiment of the invention. Further, FIG. 3 is a diagram showing an in-plane scanning locus and an example of its rotation. 1...X-axis scanning signal generator 2...Y-axis scanning signal generator 3...Inverting amplifier 4...Reference voltage (angle signal) generator 5.7...COS signal modulator 6. 8...SIN signal modulator 9.10...Adder 11, 12...High voltage amplifier 13...Cylindrical piezoelectric element 14...X-axis electrode 15...Y-axis electrode 16... Probe 17... Sample 1B... Sample rotation stage 19... In-plane scanning area 20 before rotation... In-plane scanning area 21 after rotation... Probe scanning locus 22 before rotation...・Probe scanning trajectory after rotation Applicant: Seiko Electronics Industries Co., Ltd. Patent attorney: Keinosuke Hayashi
Claims (1)
針の走査方向を試料表面の傾きのない方向に一致させる
事により試料表面の傾きを補正することを特徴とする傾
き補正方法。A tilt correction method characterized by correcting the tilt of the sample surface by rotating the probe scanning direction or the sample mounting direction to match the probe scanning direction with a direction in which the sample surface is not tilted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10609390A JP2936489B2 (en) | 1990-04-20 | 1990-04-20 | Tilt correction method and fine shape measurement method using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10609390A JP2936489B2 (en) | 1990-04-20 | 1990-04-20 | Tilt correction method and fine shape measurement method using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH045503A true JPH045503A (en) | 1992-01-09 |
| JP2936489B2 JP2936489B2 (en) | 1999-08-23 |
Family
ID=14424930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10609390A Expired - Fee Related JP2936489B2 (en) | 1990-04-20 | 1990-04-20 | Tilt correction method and fine shape measurement method using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2936489B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006220597A (en) * | 2005-02-14 | 2006-08-24 | Sii Nanotechnology Inc | Surface information measuring device. |
| KR101469365B1 (en) * | 2013-05-30 | 2014-12-08 | 안동대학교 산학협력단 | A atomic force microscope with rotatable probe and scanning method using the atomic force microscope |
| CN106643602A (en) * | 2016-12-24 | 2017-05-10 | 上海与德信息技术有限公司 | Probe reference compensation system and method |
| CN111133319A (en) * | 2017-09-13 | 2020-05-08 | 安东帕有限责任公司 | Operating device for operating measuring probes |
-
1990
- 1990-04-20 JP JP10609390A patent/JP2936489B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006220597A (en) * | 2005-02-14 | 2006-08-24 | Sii Nanotechnology Inc | Surface information measuring device. |
| KR101469365B1 (en) * | 2013-05-30 | 2014-12-08 | 안동대학교 산학협력단 | A atomic force microscope with rotatable probe and scanning method using the atomic force microscope |
| CN106643602A (en) * | 2016-12-24 | 2017-05-10 | 上海与德信息技术有限公司 | Probe reference compensation system and method |
| CN106643602B (en) * | 2016-12-24 | 2019-03-12 | 重庆与德通讯技术有限公司 | A probe reference compensation system and method |
| CN111133319A (en) * | 2017-09-13 | 2020-05-08 | 安东帕有限责任公司 | Operating device for operating measuring probes |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2936489B2 (en) | 1999-08-23 |
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