JPH0456779B2 - - Google Patents

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Publication number
JPH0456779B2
JPH0456779B2 JP27518784A JP27518784A JPH0456779B2 JP H0456779 B2 JPH0456779 B2 JP H0456779B2 JP 27518784 A JP27518784 A JP 27518784A JP 27518784 A JP27518784 A JP 27518784A JP H0456779 B2 JPH0456779 B2 JP H0456779B2
Authority
JP
Japan
Prior art keywords
solid surface
ferrite
forming
liquid film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP27518784A
Other languages
Japanese (ja)
Other versions
JPS61179877A (en
Inventor
Masanori Abe
Yutaka Tamaura
Shoji Ikeda
Masao Ooishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP27518784A priority Critical patent/JPS61179877A/en
Publication of JPS61179877A publication Critical patent/JPS61179877A/en
Publication of JPH0456779B2 publication Critical patent/JPH0456779B2/ja
Granted legal-status Critical Current

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  • Compounds Of Iron (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 [発明の利用分野] 本発明は、磁気記録媒体、光磁気記録媒体、磁
気ヘツド、磁気光学素子、マイクロ波素子、磁歪
素子、磁気音響素子などに広く応用されている
Fe3+を含むスピネル型フエライト膜の作製法に
係り、特に金属、非金属を問わず固体表面に、少
なくとも第1鉄イオンを水溶液を用いて高温
(300℃以上)での熱処理を必要とせずに、スピネ
ル型構造の結晶性フエライトを効率よく堆積・作
成させる方法に関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention is widely applied to magnetic recording media, magneto-optical recording media, magnetic heads, magneto-optical elements, microwave elements, magnetostrictive elements, magnetoacoustic elements, etc.
This method involves the production of spinel-type ferrite films containing Fe 3+ , in particular by applying at least ferrous ions to the solid surface, whether metal or non-metal, using an aqueous solution without requiring heat treatment at high temperatures (300°C or higher). The present invention relates to a method for efficiently depositing and producing crystalline ferrite having a spinel structure.

[発明の背景] 従来、フエライト膜を固体表面に形成する方法
としては、バインダーを用いる塗布法あるいはシ
ート法によるか、バインダーを用いない方法によ
るかに大別されている。
[Background of the Invention] Conventionally, methods for forming a ferrite film on a solid surface are broadly classified into a coating method using a binder, a sheet method, and a method not using a binder.

塗布法によるフエライト膜の例としては、現在
磁気テープ、磁気デイスク等には広く用いられて
いるが、(イ)フエライト粒子の間の非磁性のバイン
ダーが存在するため磁気記録密度が低く、また磁
気光学素子、磁歪素子、磁気音響素子などの多結
晶であることを必要とする素子には利用できな
い、(ロ)膜の磁気異方性を得るのにフエライト粒子
の形状異方性を利用するため、針状の微粒子が得
られるγ−Fe2 O3,Fe3 O4に限られる、とい
う制約があつた。
Examples of ferrite films made by coating methods are currently widely used in magnetic tapes, magnetic disks, etc.; however, (a) magnetic recording density is low due to the presence of nonmagnetic binders between ferrite particles; (b) Utilizes the shape anisotropy of ferrite particles to obtain magnetic anisotropy of the film, which cannot be used for elements that require polycrystals such as optical elements, magnetostrictive elements, and magnetoacoustic elements. However, there was a restriction that the method was limited to γ-Fe 2 O 3 and Fe 3 O 4 from which needle-like fine particles could be obtained.

またシート法によるフエライト膜は、フエライ
ト粒子の充填率が低いために1mm以上の厚い膜と
して電波吸収体として利用される程度であり、高
充填率を必要とする前記した各種素子には利用で
きないという制約がある。
In addition, the ferrite film produced by the sheet method has a low filling rate of ferrite particles, so it can only be used as a radio wave absorber as a thick film of 1 mm or more, and cannot be used for the various devices mentioned above that require a high filling rate. There are restrictions.

一方、バインダーを用いないフエライト膜作製
法としては、(1)溶液コート法、(2)電気泳動電着
法、(3)スパツタ、真空蒸着、アーク放電などの乾
式メツキ法、(4)溶融スプレー法、(5)気相成長法な
どが従来知られているが、前記(1)〜(3)の方法では
膜を非晶質状態で堆積させた後所望するフエライ
ト結晶構造をもつた膜とする手法であるため、
(1),(2)では700℃の高温の熱処理、(3)ではフエラ
イトが金属元素として鉄のみを含む場合でも300
℃以上、鉄以外の金属元素をも含む場合には700
℃以上の高温で熱処理を施さねばならない。また
(4)の方法では膜堆積中において基板を1000℃以上
に保たねばならず、更に(5)の方法でも基盤が高融
点の酸化物単結晶のものでなければならないの
で、結局これらのいずれの方法によるとしても融
点、分解温度の低い物質を基板として用いること
ができない制約があつた。
On the other hand, methods for producing ferrite films that do not use a binder include (1) solution coating, (2) electrophoretic electrodeposition, (3) dry plating methods such as sputtering, vacuum evaporation, and arc discharge, and (4) melt spraying. Methods (1) to (3) described above deposit a film in an amorphous state and then form a film with the desired ferrite crystal structure. Because it is a method to
In (1) and (2), heat treatment is performed at a high temperature of 700℃, and in (3), even if the ferrite contains only iron as a metal element,
℃ or higher, and 700 if it also contains metal elements other than iron.
Heat treatment must be performed at a high temperature of ℃ or higher. Also
In method (4), the substrate must be kept at a temperature of 1000°C or higher during film deposition, and in method (5), the substrate must be made of a single crystal oxide with a high melting point. Even if this method is used, there is a restriction that substances with low melting points and low decomposition temperatures cannot be used as substrates.

そこで、本発明者等は、前記した従来のフエラ
イト膜形成の方法とはその技術思想を全く異にし
た新規な方法、すなわち固体表面に、金属イオン
として少なくとも第1鉄イオンを含む水溶液を接
触させて、前記固体表面にFeOH+又はこれと他
の水酸化金属イオンを吸着させ、吸着FeOH+
酸化によりフエライト結晶化反応を行なわせるフ
エライト膜形成法を提案(特開昭59−111929号公
報)した。
Therefore, the present inventors developed a new method whose technical concept is completely different from the conventional method of forming a ferrite film described above, in which a solid surface is brought into contact with an aqueous solution containing at least ferrous ions as metal ions. Therefore, we proposed a method for forming a ferrite film in which FeOH + or other hydroxide metal ions are adsorbed onto the solid surface, and a ferrite crystallization reaction is carried out by oxidation of the adsorbed FeOH + (Japanese Patent Application Laid-Open No. 111929/1983). did.

このフエライト膜形成法は、例えば、水溶液浴
中のフエライトを構成する金属をフエライトとし
て析出させる目的に従い、まず固体と水溶液の境
界面における界面活性を利用した固体表面での反
応により、金属イオンを固体表面に吸着させ、次
いで該金属イオンを適宜の方法で酸化せしめて、
フエライト膜を形成せしめるものである。
In this ferrite film formation method, for example, in order to precipitate the metal constituting ferrite in an aqueous solution bath as ferrite, metal ions are first transferred to the solid by a reaction on the solid surface using surface activity at the interface between the solid and the aqueous solution. adsorbed on the surface, and then oxidized the metal ions by an appropriate method,
It forms a ferrite film.

代表的には、Fe3+を含むスピネル型構造の結
晶性フエライト膜は、以下の方法により形成され
る。
Typically, a crystalline ferrite film with a spinel structure containing Fe 3+ is formed by the following method.

すなわち、少なくともFeOH+を含む水溶液中
に、吸着に対して界面活性をもつ固体を浸すと、
この固体表面上にはFeOH+が吸着される。これ
を化学式で表すと次()式の如くなる。
That is, when a solid with surface activity against adsorption is immersed in an aqueous solution containing at least FeOH + ,
FeOH + is adsorbed onto this solid surface. If this is expressed as a chemical formula, it will be as shown in the following formula ().

FeOH+→FeOH+−(固体) () なお、水溶液中に第1鉄イオンがFeOH+以外
の形すなわちFeA〓+(2-〓〓)(ただしAは価数αの陰
イオンであり、例えばSO2- 4とすればα=2、β
=1)で存在し、加水分解を伴なつて前記()
式の反応を次式の如く生じさせる場合 FeA〓+(2-
FeOH + FeOH + − (solid) () Note that ferrous ions in an aqueous solution are in a form other than FeOH If SO 2- 4 , α=2, β
=1), and with hydrolysis, the above ()
When the reaction of the formula occurs as shown in the following formula, FeA〓 +(2-

Claims (1)

【特許請求の範囲】 1 フエライト膜を形成させる固体表面を常に薄
い液膜で漏らした状態に維持するため、少なくと
も第1鉄イオンを含む脱酸素水溶液を前記固体表
面に連続的に流下又は噴霧し、該液膜内で前記固
体表面に吸着する水酸化第1鉄イオン又はこれと
他の水酸化金属イオンを、前記水溶液の流下又は
噴霧と並行して液膜内に連続的に酸素を供給する
ことで酸化させ、フエライト結晶化反応を行なわ
せることを特徴とするフエライト膜の形成方法。 2 固体表面上への薄い液膜の形成を含酸素雰囲
気下で行なうことで、液膜中に酸素を供給するこ
とを特徴とする特許請求の範囲第1項に記載した
フエライト膜の形成方法。 3 固体表面上の薄い液膜に含酸素気体を吹き付
けることで、液膜中の酸素を供給することを特徴
とする特許請求の範囲第1項に記載したフエライ
ト膜の形成方法。 4 固体表面上に水溶液を噴霧するためのガスに
含酸素気体を用いることで、液膜中に酸素を供給
することを特徴とする特許請求の範囲第1項に記
載したフエライト膜の形成方法。 5 固体表面上の液膜を形成する水溶液は、重力
又は遠心力によつて流動性が付与されていること
を特徴とする特許請求の範囲第1項に記載したフ
エライト膜の形成方法。 6 固体表面上の液膜を形成する水溶液が、付与
された流動性により固体表面から連続的に流出す
るようになつていることを特徴とする特許請求の
範囲第1項に記載したフエライト膜の形成方法。 7 固体表面がプラズマで前処理されたものであ
ることを特徴とする特許請求の範囲第1項乃至第
6項のいずれかに記載したフエライト膜の形成方
法。
[Claims] 1. In order to maintain the solid surface on which the ferrite film is to be formed in a thin liquid film leaking state, a deoxidized aqueous solution containing at least ferrous ions is continuously flowed or sprayed onto the solid surface. , ferrous hydroxide ions or other hydroxide metal ions adsorbed on the solid surface within the liquid film, and oxygen is continuously supplied into the liquid film in parallel with the flowing down or spraying of the aqueous solution. A method for forming a ferrite film, which is characterized by oxidizing the film and causing a ferrite crystallization reaction. 2. The method for forming a ferrite film according to claim 1, characterized in that oxygen is supplied into the liquid film by forming a thin liquid film on the solid surface in an oxygen-containing atmosphere. 3. The method for forming a ferrite film according to claim 1, characterized in that oxygen in the liquid film is supplied by spraying an oxygen-containing gas onto the thin liquid film on the solid surface. 4. The method for forming a ferrite film according to claim 1, characterized in that oxygen is supplied into the liquid film by using an oxygen-containing gas as the gas for spraying the aqueous solution onto the solid surface. 5. The method for forming a ferrite film according to claim 1, wherein the aqueous solution forming the liquid film on the solid surface is given fluidity by gravity or centrifugal force. 6. The ferrite film according to claim 1, wherein the aqueous solution forming the liquid film on the solid surface continuously flows out from the solid surface due to the imparted fluidity. Formation method. 7. The method for forming a ferrite film according to any one of claims 1 to 6, wherein the solid surface is pretreated with plasma.
JP27518784A 1984-12-27 1984-12-27 Formation of ferrite film Granted JPS61179877A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27518784A JPS61179877A (en) 1984-12-27 1984-12-27 Formation of ferrite film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27518784A JPS61179877A (en) 1984-12-27 1984-12-27 Formation of ferrite film

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6416085A Division JPS61222924A (en) 1985-03-28 1985-03-28 Method for forming ferrite film

Publications (2)

Publication Number Publication Date
JPS61179877A JPS61179877A (en) 1986-08-12
JPH0456779B2 true JPH0456779B2 (en) 1992-09-09

Family

ID=17551891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27518784A Granted JPS61179877A (en) 1984-12-27 1984-12-27 Formation of ferrite film

Country Status (1)

Country Link
JP (1) JPS61179877A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2508479B2 (en) * 1987-02-24 1996-06-19 ソニー株式会社 Soft magnetic ferrite thin film
US7160636B2 (en) 2002-09-13 2007-01-09 Nec Tokin Corporation Ferrite thin film, method of manufacturing the same and electromagnetic noise suppressor using the same

Also Published As

Publication number Publication date
JPS61179877A (en) 1986-08-12

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