JPH0457682U - - Google Patents
Info
- Publication number
- JPH0457682U JPH0457682U JP9992090U JP9992090U JPH0457682U JP H0457682 U JPH0457682 U JP H0457682U JP 9992090 U JP9992090 U JP 9992090U JP 9992090 U JP9992090 U JP 9992090U JP H0457682 U JPH0457682 U JP H0457682U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum processing
- gas
- chamber
- load lock
- lock chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005192 partition Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Description
第1図は本考案の一実施例を示す真空処理装置
のロードロツク室の模式断面図、第2図は本考案
の他の実施例を示す真空処理装置のロードロツク
室の模式断面図、第3図は従来の真空処理装置を
示すブロツク図、第4図は第3図のロードロツク
室を示す模式断面図である。
1……ロードロツク室、2……均圧板、3……
排気口、4……ガス導入バルブ、5……ガス導入
口、6a,6……層流板、8……ゲートバルブ、
9……バルブ、10……真空処理室、11……メ
インバルブ、12……圧力調整器、13……排気
装置、15……ロツクバルブ。
FIG. 1 is a schematic cross-sectional view of a load lock chamber of a vacuum processing apparatus showing one embodiment of the present invention, FIG. 2 is a schematic cross-sectional view of a load lock chamber of a vacuum processing apparatus showing another embodiment of the present invention, and FIG. 4 is a block diagram showing a conventional vacuum processing apparatus, and FIG. 4 is a schematic sectional view showing the load lock chamber of FIG. 3. 1... Load lock chamber, 2... Pressure equalization plate, 3...
Exhaust port, 4...Gas introduction valve, 5...Gas introduction port, 6a, 6...Laminar flow plate, 8...Gate valve,
9... Valve, 10... Vacuum processing chamber, 11... Main valve, 12... Pressure regulator, 13... Exhaust device, 15... Lock valve.
Claims (1)
処理室と、この真空処理室を直空排気する排気装
置と、前記真空処理室の第1のガス導入口よりガ
ス気体を室内に導入するガス導入バルブと、前記
真空処理室と隣接して仕切弁を介して取付けられ
るとともに被加工物を一時的に保管する排気口と
第2のガス導入口をもつロードロツク室とを備え
る真空処理装置において、前記ロードロツク室内
の排気口側に設けられた複数個の第1の穴を有す
る第1の仕切板と、前記ロードロツク室内の前記
第2のガス導入口側に設けられた前記第1の穴よ
り小さい複数個の第2の穴を有する第2の仕切板
とを備え、前記ロードロツク室にガス導入時及び
真空排気時のいずれかの時に、前記ロードロツク
室内のガス気体の流れを層流にすることを特徴と
する真空処理装置。 A vacuum processing chamber that houses a workpiece and performs vacuum processing, an exhaust device that directly evacuates the vacuum processing chamber, and a gas introduction valve that introduces gas into the chamber from a first gas introduction port of the vacuum processing chamber. and a load lock chamber which is installed adjacent to the vacuum processing chamber via a gate valve and has an exhaust port for temporarily storing the workpiece and a second gas inlet port, a first partition plate having a plurality of first holes provided on the exhaust port side of the room; and a plurality of holes smaller than the first holes provided on the second gas introduction port side of the load lock chamber. and a second partition plate having a second hole, and the flow of gas in the load lock chamber is made into a laminar flow either when gas is introduced into the load lock chamber or when evacuation is performed. vacuum processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9992090U JPH0457682U (en) | 1990-09-25 | 1990-09-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9992090U JPH0457682U (en) | 1990-09-25 | 1990-09-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0457682U true JPH0457682U (en) | 1992-05-18 |
Family
ID=31842189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9992090U Pending JPH0457682U (en) | 1990-09-25 | 1990-09-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0457682U (en) |
-
1990
- 1990-09-25 JP JP9992090U patent/JPH0457682U/ja active Pending
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