JPH045892A - Machining method for through-hole in multilayer circuit board - Google Patents

Machining method for through-hole in multilayer circuit board

Info

Publication number
JPH045892A
JPH045892A JP10523290A JP10523290A JPH045892A JP H045892 A JPH045892 A JP H045892A JP 10523290 A JP10523290 A JP 10523290A JP 10523290 A JP10523290 A JP 10523290A JP H045892 A JPH045892 A JP H045892A
Authority
JP
Japan
Prior art keywords
hole
liquid
circuit board
multilayer circuit
smear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10523290A
Other languages
Japanese (ja)
Inventor
Riichi Okubo
利一 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP10523290A priority Critical patent/JPH045892A/en
Publication of JPH045892A publication Critical patent/JPH045892A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To reduce the extraction of an organic section, and to prevent environmental pollution by treating a resin on the inner surface of a through-hole by using a heated alkaline aqueous solution when smear in the through-hole formed in a multilayer circuit board is removed. CONSTITUTION:The aqueous solution of sodium hydroxide, potassium hydroxide or lithium hydroxide is heated and used as a liquid employed in a swelling process. A trace quantity of a surface active agent are added to the liquid, and the wettability of the liquid to the inwall of a through-hole 3 can also be improved. A multilayer board dipped in the liquid is washed by water or dipped in a de-smear treatment. Accordingly, the discharge of an organic section is reduced, thus preventing environmental pollution.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は多層回路基板の透孔に発生するスミアの除去の
ための加工法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a processing method for removing smear generated in through holes of a multilayer circuit board.

[従来の技術] 従来、多層回路基板は第1図に示すように、エポキシ樹
脂等よりなる多層の絶縁層1.1間及び表面に例えば銅
よりなる回路2,2を形成し、これに第2図に示すよう
に透孔(スルーホール)3を穿設し、内外層及び中間の
回路2.2の導通をもたせるために第3図に示すように
スルーホルめっき4を施す。かかる一連の工程において
透孔3を形成するときに、第4図に示す第2図のA部拡
大図で明らかなように、孔あけの際、ドリルの刃の摩擦
熱で絶縁層1を構成するエポキシ樹脂等が溶けて、回路
2の端面を覆ってしまういわゆるスミア5が発生する。
[Prior Art] Conventionally, a multilayer circuit board, as shown in FIG. As shown in FIG. 2, a through hole 3 is bored, and through hole plating 4 is applied as shown in FIG. 3 in order to provide continuity between the inner and outer layers and the intermediate circuit 2.2. When forming the through hole 3 in this series of steps, as is clear from the enlarged view of part A in FIG. 2 shown in FIG. A so-called smear 5 occurs in which the epoxy resin or the like melts and covers the end face of the circuit 2.

このままの状態でスルーホールめっき4を施すと、回路
2とスルーホールめっき4との間に絶縁層1のスミア5
が残っているために導通不良となる。そこでスミア5を
取り除いてからスルーホールめっきをする必要がある。
If through-hole plating 4 is applied in this state, smear 5 of insulating layer 1 will be formed between circuit 2 and through-hole plating 4.
remains, resulting in poor continuity. Therefore, it is necessary to perform through-hole plating after removing smear 5.

従来のスミア除去法としては、濃硫酸浸漬、クロム酸浸
漬、プラズマによる方法などがあるが、最近ではアルカ
リ性過マンガン酸塩溶液を使用することが一般的となっ
てきている。この方法は■膨潤、■デスミア、■還元と
いう3工程よりなるのが普通である。この中、■の膨潤
工程は、樹脂を有機分の高い溶液に浸漬することにより
樹脂を膨潤して■のデスミア工程におけるアルカリ性過
マンガン酸塩の作用による樹脂の酸化溶解を促進するも
のである。■の還元では樹脂上に付着したマンガン分を
還元除去する。
Conventional smear removal methods include concentrated sulfuric acid immersion, chromic acid immersion, and plasma methods, but recently it has become common to use an alkaline permanganate solution. This method usually consists of three steps: (1) swelling, (2) desmearing, and (2) reduction. Among these, the swelling step (2) swells the resin by immersing the resin in a solution with a high organic content and promotes oxidative dissolution of the resin by the action of alkaline permanganate in the desmear step (2). In the reduction (2), manganese attached to the resin is reduced and removed.

[発明が解決しようとする課題] 上記従来技術における■膨潤工程では、樹脂の網目構造
の間に、膨潤液中の有機分が侵入して、次工程への有機
分の排出量が多くなる。ところが、昨今の環境保護の観
点から、工場から有機分の排出を少なくすることが重要
である。
[Problems to be Solved by the Invention] In the swelling step (1) in the prior art described above, organic components in the swelling liquid enter between the network structures of the resin, increasing the amount of organic components discharged to the next step. However, from the perspective of environmental protection these days, it is important to reduce the amount of organic matter discharged from factories.

そこで、本発明では有機分を全くあるいはほとんど含′
まない液によるスミア除去方法を提供し、公害防止を図
るものである。
Therefore, in the present invention, the organic component is completely or hardly contained.
The purpose is to provide a method for removing smear using a liquid that does not contain liquid, and to prevent pollution.

[課題を解決するための手段] 本発明は、上記課題を解決するためになされたもので、
多層回路基板に設けた透孔のスミアを除去するに当り、
加熱アルカリ水溶液を用いて透孔内面の樹脂を処理する
多層回路基板の透孔の加工法である。
[Means for Solving the Problems] The present invention has been made to solve the above problems, and
When removing smear from through holes in a multilayer circuit board,
This is a method for processing through-holes in a multilayer circuit board in which the resin on the inner surface of the through-hole is treated using a heated alkaline aqueous solution.

すなわち、本発明では前記従来技術における■膨潤工程
に使用する液として、水酸化ナトリウム、水酸化カリウ
ム又は水酸化リチウムの水溶液を加熱して使用する。こ
の液は溶液のくみ山し量や蒸発量を考慮して、濃度は1
0〜500g/l、好ましくは50〜800g/l、温
度は60〜100’c、好ましくは75〜90℃が適当
である。この液はごく少量の界面活性剤を添加して、ス
ルーホール内壁への液の濡れ性を向上させることもでき
る。
That is, in the present invention, an aqueous solution of sodium hydroxide, potassium hydroxide, or lithium hydroxide is heated and used as the liquid used in the swelling step (1) in the prior art. The concentration of this solution is 1, considering the amount of solution pumped and the amount of evaporation.
A suitable temperature is 0 to 500 g/l, preferably 50 to 800 g/l, and the temperature is 60 to 100'C, preferably 75 to 90'C. A very small amount of surfactant can be added to this liquid to improve the wettability of the liquid to the inner wall of the through hole.

この界面活性剤の濃度は101/I又は10g/ l以
下と低濃度であることが望ましい。この液に浸漬した多
層基板は続いて水洗するか、又は続いてデスミア処理液
に浸漬する。
The concentration of this surfactant is preferably as low as 101/I or 10 g/l or less. The multilayer substrate immersed in this liquid is then washed with water or subsequently immersed in a desmear treatment liquid.

デスミア処理液としては、商品名CP 922(日本鉱
業■製)が挙げられる。この液はKMn O440−9
0g/l、N a OH30〜60g/ l、界面活性
剤10m1/1未満のもので60〜90℃で10分程度
前記処理基板を浸漬する。この後、水洗し更に透孔壁面
に生成している二酸化マンガンを溶解除去するため還元
処理を行う。液として還元剤を含む弱酸性の溶液である
商品名CP933(日本鉱業■製)液が挙げられる。こ
れに常温で2〜5分程度基板を浸漬する。その後再び基
板を水洗する。
Examples of the desmear treatment liquid include the trade name CP 922 (manufactured by Nippon Mining Co., Ltd.). This liquid is KMn O440-9
The treated substrate is immersed in a solution containing 0 g/l, 30 to 60 g/l of NaOH, and less than 1/1 surfactant at 60 to 90° C. for about 10 minutes. Thereafter, the material is washed with water and further subjected to a reduction treatment to dissolve and remove manganese dioxide formed on the wall surfaces of the through holes. As the liquid, a weakly acidic solution containing a reducing agent, trade name CP933 (manufactured by Nippon Mining Co., Ltd.), can be used. The substrate is immersed in this for about 2 to 5 minutes at room temperature. After that, wash the board again with water.

以上のスミア除去の工程に続き、無電解銅めつき、電気
銅めっきをおこない、スルーホールが形成される。
Following the above smear removal process, electroless copper plating and electrolytic copper plating are performed to form through holes.

[実施例] 銅よりなる回路を形成した多層のエポキシ樹脂基板(P
R−4グレード)に直径0.3及び0.8mmの透孔を
形成し、Na0HSKOH又はLiOHを含有する溶液
を用いて処理し、次いでデスミア処理液(商品名CP 
922) 、還元処理液(商品名CP H3)で処理し
た。デスミア処理は85℃で10分、還元処理は25℃
で3分行った。
[Example] A multilayer epoxy resin board (P
R-4 grade) was formed with through holes of 0.3 and 0.8 mm in diameter, treated with a solution containing Na0HSKOH or LiOH, and then treated with a desmear treatment solution (trade name: CP
922) and a reduction treatment solution (trade name CP H3). Desmear treatment at 85℃ for 10 minutes, reduction treatment at 25℃
I went for 3 minutes.

こうして透孔を清浄化した回路基板の透孔に無電解銅め
っき(0,5μm)及び電気めっき(35μ11)を施
した。この試験基板の透孔部を硬化性樹脂に埋め込み、
透孔部の断面を顕微鏡で観察し、スミアの残留の有無を
検査した。
Electroless copper plating (0.5 μm) and electroplating (35 μm) were applied to the through holes of the circuit board whose through holes were thus cleaned. The through holes of this test board are embedded in hardening resin,
The cross section of the through hole was observed under a microscope to check for the presence or absence of smear residue.

その結果を第1表に示す。The results are shown in Table 1.

第1表 注1)COD (化学的酸素要求ff1)は、月S K
−0102,17の方法で測定した。
Table 1 Note 1) COD (chemical oxygen demand ff1) is monthly S K
-0102,17.

注2)市販有機膨潤液:ポリエーテル系化合物、水酸化
ナトリウムを含む溶液 第1表から明らかなように、実施例1〜5のデスミア前
処理液のCODは、すべて5ppm未満であった。この
5ppm未満という値は、排水処理上全く問題になるも
のではなく、この処理液を排出する場合にはHCIやH
2SO4による中和のみで容易に行うことができる。
Note 2) Commercially available organic swelling liquid: Solution containing a polyether compound and sodium hydroxide As is clear from Table 1, the COD of the desmear pretreatment liquids of Examples 1 to 5 were all less than 5 ppm. This value of less than 5 ppm is not a problem at all in terms of wastewater treatment, and when discharging this treated liquid, HCI and H
This can be easily carried out only by neutralization with 2SO4.

一方、比較例として示した市販有機膨潤液のCODは、
110000ppであり、この溶液を排出する前には中
和処理のほか、酸化処理等が必要である。
On the other hand, the COD of the commercially available organic swelling liquid shown as a comparative example is
110,000 pp, and before discharging this solution, it is necessary to perform oxidation treatment in addition to neutralization treatment.

[発明の効果] 本発明では、デスミア処理における前処理を水酸化アル
カリ溶液により行うので、従来の有機分を含む膨潤剤の
使用において、液のもち出し、その排出により起った排
出処理上の問題点を解決することができる。
[Effects of the Invention] In the present invention, the pretreatment in the desmear treatment is performed using an alkaline hydroxide solution, so that when using a conventional swelling agent containing an organic component, there is no problem in the discharge treatment caused by lifting out and discharging the liquid. Problems can be resolved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の処理対象物である多層回路載板の構成
の説明図、第2図は第1図の基板に透孔を穿設した状態
の説明図、第3図は第2図のもののデスミア処理後スル
ーホールめっきを施した状態の説明図、第4図は第2図
のA部拡大説明図である。 ■・・・絶縁層、2・・・回路、3・・・透孔、4、・
・・スルーホールめっき、5・・・スミア。
Fig. 1 is an explanatory diagram of the structure of a multilayer circuit board, which is the object to be processed by the present invention, Fig. 2 is an explanatory diagram of the state in which through holes are bored in the substrate of Fig. FIG. 4 is an enlarged explanatory view of section A in FIG. 2. ■...Insulating layer, 2...Circuit, 3...Through hole, 4...
...Through hole plating, 5...Smear.

Claims (2)

【特許請求の範囲】[Claims] (1)多層回路基板に設けた透孔のスミアを除去するに
当り、加熱アルカリ水溶液を用いて透孔内面の樹脂を処
理することを特徴とする多層回路基板の透孔の加工法。
(1) A method for processing a through hole in a multilayer circuit board, which comprises treating the resin on the inner surface of the through hole using a heated alkaline aqueous solution when removing smear from the through hole provided in the multilayer circuit board.
(2)加熱アルカリ水溶液が60〜100℃で10〜5
00g/lの濃度の水酸化ナトリウム、水酸化カリウム
又は水酸化リチウム溶液である請求項(1)記載の多層
回路基板の透孔の加工法。
(2) Heated alkaline aqueous solution at 60-100℃
The method for processing through holes in a multilayer circuit board according to claim 1, wherein the solution is a sodium hydroxide, potassium hydroxide or lithium hydroxide solution having a concentration of 00 g/l.
JP10523290A 1990-04-23 1990-04-23 Machining method for through-hole in multilayer circuit board Pending JPH045892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10523290A JPH045892A (en) 1990-04-23 1990-04-23 Machining method for through-hole in multilayer circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10523290A JPH045892A (en) 1990-04-23 1990-04-23 Machining method for through-hole in multilayer circuit board

Publications (1)

Publication Number Publication Date
JPH045892A true JPH045892A (en) 1992-01-09

Family

ID=14401912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10523290A Pending JPH045892A (en) 1990-04-23 1990-04-23 Machining method for through-hole in multilayer circuit board

Country Status (1)

Country Link
JP (1) JPH045892A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150099450A (en) * 2014-02-21 2015-08-31 김학경 method of board game

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150099450A (en) * 2014-02-21 2015-08-31 김학경 method of board game

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