JPH0459399B2 - - Google Patents
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- Publication number
- JPH0459399B2 JPH0459399B2 JP63226433A JP22643388A JPH0459399B2 JP H0459399 B2 JPH0459399 B2 JP H0459399B2 JP 63226433 A JP63226433 A JP 63226433A JP 22643388 A JP22643388 A JP 22643388A JP H0459399 B2 JPH0459399 B2 JP H0459399B2
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- Prior art keywords
- lead
- metal layer
- alloy
- tin
- current
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Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は鋼帯などの金属ストリツプを連続的に
電気メツキする装置の陽極用として用いられる不
溶解電極およびその製造方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an insoluble electrode used as an anode of an apparatus for continuously electroplating metal strips such as steel strips, and a method for manufacturing the same.
(従来の技術)
通常の電気メツキラインは第3図に示すよう
に、陽極用電極8を通板する鋼帯の上下に配置し
て、ノズル19よりメツキ液を供給するもので、
図中の17は鋼帯と接触する通電ロールであり、
18は通電ロール17を支持する補助ロールであ
る。この陽極用電極8の構造は第4図に示すよう
に通電用ブースバー6に銅製又は鉄製の通電板B
21が溶接7により接続され、この通電板21の
全体を鉛合金22で覆うもので、通電板21を鉛
合金22で覆うに当つては、鉛合金の鋳放母材を
アセチレンガスその他のバーナーを用いて直接加
熱しながら溶解し、順次肉盛る方法が行なわれて
いた。(Prior Art) As shown in FIG. 3, a normal electric plating line is arranged above and below a steel strip through which the anode electrode 8 is passed, and a plating liquid is supplied from a nozzle 19.
17 in the figure is an energized roll that comes into contact with the steel strip,
Reference numeral 18 denotes an auxiliary roll that supports the energizing roll 17. As shown in FIG. 4, the structure of this anode electrode 8 is as shown in FIG.
21 are connected by welding 7, and the entire current-carrying plate 21 is covered with a lead alloy 22. In order to cover the current-carrying plate 21 with the lead alloy 22, the cast base material of the lead alloy is heated using an acetylene gas or other burner. The method used was to melt the material while directly heating it using a molten metal and then apply it one by one.
なお、図中5はストリツプと電極の接触防止を
目的としたセパレータである。 Note that 5 in the figure is a separator for the purpose of preventing contact between the strip and the electrode.
この方法で製造された不溶解電極を硫酸メツキ
液中で電気亜鉛メツキ用の陽極として使用した場
合、不溶解電極表面に被覆されている鉛合金の表
層が順次電解腐食によつて減耗し電極表面と鋼帯
の間隔が増加し、電気メツキ時の電極と鋼帯間の
電気抵抗がメツキ中の通電距離の増加により大き
くなる。そのため通電時の電圧降下が増大しメツ
キ電力が増加する。また電食による減耗が表面各
部でその都合が異なるため表面に凹凸が発生す
る。この場合、電極表面でのメツキ液の滑らかな
流れが阻害され、電極表面に発生する電気分解に
よるガスが円滑に排出されないため、電極表面と
メツキ液との境界部分に局部的なガス溜りが生
じ、電気抵抗が大きくなり、電極と鋼帯の間隔の
増大と同じように通電時の電圧降下が増大する。 When an insoluble electrode manufactured by this method is used as an anode for electrogalvanizing in a sulfuric acid plating solution, the surface layer of the lead alloy coated on the insoluble electrode surface is gradually worn away by electrolytic corrosion, and the electrode surface The distance between the steel strip and the steel strip increases, and the electrical resistance between the electrode and the steel strip during electroplating increases due to the increase in the current conduction distance during plating. Therefore, the voltage drop during energization increases and the plating power increases. In addition, since the wear and tear caused by electrolytic corrosion is different for each part of the surface, unevenness occurs on the surface. In this case, the smooth flow of the plating liquid on the electrode surface is obstructed, and the gas generated by electrolysis on the electrode surface cannot be smoothly discharged, resulting in local gas accumulation at the boundary between the electrode surface and the plating liquid. , the electrical resistance increases, and the voltage drop during energization increases in the same way as the distance between the electrode and the steel strip increases.
また電極表面の凹凸はさらに電極と鋼帯間をメ
ツキ液が通過する時の圧力損失を増大させ、ポン
プ特性からメツキ液流量を低下させ、やはりガス
円滑な排出を阻害する。 Moreover, the unevenness of the electrode surface further increases the pressure loss when the plating liquid passes between the electrode and the steel strip, reduces the flow rate of the plating liquid due to the pump characteristics, and also impedes smooth gas discharge.
さらに溶出した鉛が鋼板のメツキ層に混入した
場合はメツキ面の耐熱性を損うため品質上の問題
もある。 Furthermore, if leached lead gets mixed into the plating layer of the steel sheet, it will impair the heat resistance of the plating surface, causing quality problems.
これらの問題点を解決するために本出願人は先
に実開昭62−180077号公報で電気メツキ用通電板
の放電側表面に鉛合金の圧延板又は引き抜き材か
らなる層を被覆することを提案している。 In order to solve these problems, the present applicant previously proposed in Japanese Utility Model Application Publication No. 62-180077 to cover the discharge side surface of a current-carrying plate for electroplating with a layer made of a rolled lead alloy plate or drawn material. is suggesting.
(発明が解決しようとする課題)
本発明者は先に出願した実開昭62−180077号公
報で提示する技術においても不溶解電極として充
分に活用出来ることを確認したが、更に浴中にお
ける耐食性と通電性について向上するよう工夫し
た。ホモゲン加工又は鋳込みにより第4図の不溶
解電極の通電板21に鉛合金2を肉盛りした場
合、組織が粗大で、しかも気孔等が多くあり密度
が粗となる。(Problems to be Solved by the Invention) The present inventor has confirmed that the technology presented in the previously filed Utility Model Publication No. 180077/1983 can be fully utilized as an insoluble electrode, but in addition, the corrosion resistance in a bath is We devised ways to improve electrical conductivity. When the lead alloy 2 is built up on the current-carrying plate 21 of the insoluble electrode shown in FIG. 4 by homogenization or casting, the structure is coarse and has many pores and the like, resulting in a coarse density.
またホモゲン加工及び鋳込特有の巣が錫の偏析
等の内部欠陥が多く存在するためメツキ液が鉛合
金の表面から内部に浸透・拡散し易い。さら鉛合
金組織内の偏析があるとメツキ液存在下で局部電
池を形成し、接液界面の錫が溶出し、その部分の
肌が荒れ、さらに電極間を通過するメツキ液によ
るエロージヨン摩耗によつて減耗する。亜鉛メツ
キ用の不溶解電極の場合、更にメツキ液の浸透・
拡散によつて腐食が連鎖的に進行し、早期に摩耗
する。 Furthermore, since there are many internal defects such as cavities peculiar to homogeneous processing and casting, such as segregation of tin, the plating solution easily penetrates and diffuses from the surface of the lead alloy into the interior. Furthermore, if there is segregation within the lead alloy structure, a local battery will be formed in the presence of the plating liquid, and tin at the interface in contact with the liquid will be eluted, making the skin of that area rough, and further caused by erosion wear due to the plating liquid passing between the electrodes. It wears out. In the case of non-dissolving electrodes for galvanizing, further penetration and
Corrosion progresses in a chain due to diffusion, leading to early wear.
また最近電極通電面を被覆する鉛合金材質とし
て、銀(Ag)またはインジユウム(In)などの
高級元素を添加した高価な鉛合金が開発されて来
ている。これらの材質を通電面に適用すれば電極
寿命が大巾に向上することが特公昭60−24197号
公報で知られている。ただし鉛合金を通電面に被
覆する場合に、そ厚みが薄いと鉛合金がわずかに
減耗しても通電板が露出し、ストリツプが露出部
分に接触した場合にシヨート時の熱が鉛の融解熱
として消費されないため、それが着火源となり、
電極面で発生した水素に引火して小爆発を引起
す。 Recently, expensive lead alloys to which high-grade elements such as silver (Ag) or indium (In) are added have been developed as lead alloy materials for coating the current-carrying surfaces of electrodes. It is known from Japanese Patent Publication No. 60-24197 that if these materials are applied to the current-carrying surface, the life of the electrode will be greatly improved. However, when coating a current-carrying surface with a lead alloy, if the thickness is too thin, the current-carrying plate will be exposed even if the lead alloy wears down slightly, and if the strip comes into contact with the exposed part, the heat from the shot will be absorbed by the melting heat of the lead. It becomes a source of ignition because it is not consumed as
Hydrogen generated on the electrode surface ignites, causing a small explosion.
こ問題を防止するために鉛合金の厚みを一般に
10mm以上厚くしているが、先の銀、インジユウム
等の高級元素を添加した鉛合金を厚み方向の全体
に単一材質にて使用すると、価格がきわめて高く
なる。 To prevent this problem, the thickness of the lead alloy is generally
Although the thickness is 10 mm or more, if the lead alloy added with high-grade elements such as silver and indium is used as a single material throughout the thickness, the price will be extremely high.
(課題を解決するための手段)
そこで本発明者等は従来の不溶解電極に比べて
電流効率を損なうことなく、メツキ浴での強度及
び耐食性にも優れたものを開発したので、ここに
提供する。(Means for Solving the Problems) Therefore, the inventors of the present invention have developed an electrode that does not impair current efficiency and has superior strength and corrosion resistance in plating baths compared to conventional insoluble electrodes. do.
本願発明の要旨は、電気メツキ用通電板の放電
側表面に型枠に鋳込んで成形されたか、或いはホ
モゲン加工によつて肉盛りされた鉛かまたは錫2
〜8%残部鉛及び不可避的不純物からなる鉛又は
鉛−錫合金の第1金属層と第1金属層の上に圧延
板又は引き抜き材からなる銀0.2〜1.0%、インジ
ユウム1〜5%の何れか、または双方を含み残部
鉛及び不可避的不純物からなる鉛又は鉛−錫合金
の第2金属層を重ねて、該鉛合金の第2金属層と
鉛又は鉛−錫合金の第1金属層の接着面を拡散に
より接合して構成されたことを特徴とする金属ス
トリツプ連続式電気亜鉛メツキ用不溶解電極、及
び、
電気メツキ用通電板の放電側表面に型枠に鋳込
んで成形されたか、或いはホモゲン加工によつて
肉盛りされた鉛かまたは錫2〜8%残部鉛及び不
可避的不純物からなる鉛又は鉛−錫合金の第1金
属層と鉛又は鉛−錫合金の第1金属層の上に圧延
板又は引き抜き材からなる銀0.2〜1.0%、インジ
ユウム1〜5%の何れか、または双方を含み残部
鉛及び不可避的不純物からなる鉛合金の第2金属
層を重ねて、これを加圧容器内に挿入して、不活
性ガスを充填した後、加圧して内部圧力が600〜
2000Kg/cm2、加熱温度100〜300℃の範囲でしばら
く保持し、通電板と各第1金属層、第2金属層を
接合することを特徴とする金属ストリツプ連続式
電気亜鉛メツキ用不溶解電極の製造方法である。 The gist of the present invention is that lead or tin 2 is formed on the discharge side surface of a current-carrying plate for electroplating by being cast into a mold or overlaid by homogenization.
A first metal layer of lead or lead-tin alloy consisting of ~8% balance lead and unavoidable impurities, and either 0.2~1.0% silver or 1~5% indium consisting of a rolled plate or drawn material on the first metal layer. Or, a second metal layer of lead or lead-tin alloy containing both and the balance consisting of lead and unavoidable impurities is overlaid, and the second metal layer of lead alloy and the first metal layer of lead or lead-tin alloy are stacked. An insoluble electrode for continuous electrogalvanizing of metal strips, characterized in that the adhesive surfaces are bonded by diffusion, and an electrode formed by casting in a mold on the discharge side surface of a current-carrying plate for electroplating. Alternatively, a first metal layer of lead or a lead-tin alloy made of lead or tin with a balance of 2 to 8% lead and unavoidable impurities and a first metal layer of lead or a lead-tin alloy overlaid by homogen processing. A second metal layer of a lead alloy made of rolled plate or drawn material containing either 0.2 to 1.0% silver, 1 to 5% indium, or both, and the balance consisting of lead and unavoidable impurities is overlaid, and this is processed. After inserting it into a pressure vessel and filling it with inert gas, pressurize it until the internal pressure reaches 600~
An insoluble electrode for continuous electrogalvanizing of metal strips, which is characterized by bonding a current-carrying plate to each of the first and second metal layers by holding the electrode at a heating temperature of 100 to 300°C for a while at 2000Kg/ cm 2 This is a manufacturing method.
(作 用)
本発明不溶解電極の構成は第1図に示すように
電気メツキ用通電板A1の放電側表面に鉛(Pb)
かまたは錫(Sn)2〜8%を含有する鉛又は鉛
−錫合金の第1金属層2と、銀(Ag)0.2〜1.0
%、インジユウム(In)1〜5%の何れか、また
は双方を含む鉛合金の第2金属層3を重ねて3層
構造としたものである。(Function) As shown in Fig. 1, the insoluble electrode of the present invention has a structure in which lead (Pb) is placed on the discharge side surface of the current-carrying plate A1 for electroplating.
or a first metal layer 2 of lead or lead-tin alloy containing 2 to 8% of tin (Sn) and 0.2 to 1.0 of silver (Ag).
%, indium (In) 1 to 5%, or both, the second metal layer 3 is stacked to form a three-layer structure.
本発明においては、上層の鉛合金の第2金属層
3には高価である耐腐食性と通電性の高いものを
使用している。また下層の鉛又は鉛−錫合金の第
2金属層2には比較的に低価格の鉛又は鉛−錫合
金で通電性の高いものを使用して、鉛又は鉛−錫
合金の第1金属層2と鉛合金の第2金属層3との
密着性を高めるために接着面を拡散により接合し
ている。下層の鉛又は鉛−錫合金の第1金属層2
の組成成分を錫(Sn)を2〜8%を含有する鉛
合金と限定した理由は錫は本来電気伝導性のあま
りよくない鉛表面に形成した酸化鉛(BbO2)表
面をポーラスにして通電性を高める機能を果す
が、錫が8%以上になると錫の溶出が激しくな
り、電極表面の肌荒れが早期に発生する。また%
以下ではPbO2により通電抵抗が増し、電気メツ
キ8%を越えた時の電力原単位が増加する。 In the present invention, an expensive material with high corrosion resistance and electrical conductivity is used for the upper second metal layer 3 of lead alloy. In addition, relatively low-cost lead or lead-tin alloy with high electrical conductivity is used for the second metal layer 2 of lead or lead-tin alloy in the lower layer, and the first metal layer 2 of lead or lead-tin alloy is used. In order to improve the adhesion between the layer 2 and the second metal layer 3 made of lead alloy, the adhesive surfaces are bonded by diffusion. Lower lead or lead-tin alloy first metal layer 2
The reason why we limited the composition to a lead alloy containing 2 to 8% tin (Sn) is that tin is a lead oxide (BbO 2 ) formed on the lead surface, which originally does not have very good electrical conductivity.It makes the surface porous and conducts electricity. However, if the tin content exceeds 8%, the elution of tin becomes intense and the surface of the electrode becomes rough. Also%
Below, PbO 2 increases the current carrying resistance and increases the electric power consumption when the electroplating exceeds 8%.
また上層の鉛合金の第2金属層3の組成成分を
銀(Ag)0.2〜1.0%、インジユウム(In)1〜5
%と限定した理由は銀・インジユウムを鉛中に添
加するのは、これらの元素によりPbO2の被膜表
面を故意に不均一化して、通電抵抗を小さくする
と同時に、機械的強度の小さいPbO2を補強する
ためであるが銀・インジユウムの下限が銀で0.2
%、インジユウム1.0%を切ると、その効果が著
しく小さくなるためである。 In addition, the composition of the second metal layer 3 of the upper lead alloy is 0.2 to 1.0% silver (Ag) and 1 to 5% indium (In).
The reason for adding silver and indium to lead is to intentionally make the surface of the PbO 2 coating non-uniform with these elements, thereby reducing current carrying resistance, and at the same time reducing PbO 2 , which has low mechanical strength. Although it is for reinforcement, the lower limit of silver/indium is 0.2 for silver.
This is because if the amount of indium is less than 1.0%, the effect becomes significantly smaller.
また上限を銀1.0%、インジユウム5.0%とした
のは、これ以上になるとこれらの添加金属が高価
なため電極の製造価格がきわめて高くなるためで
ある。 The reason why the upper limits are set to 1.0% silver and 5.0% indium is that if the content exceeds these limits, these additive metals are expensive, so the manufacturing cost of the electrode becomes extremely high.
また本発明の不溶解電極の製造方法は第2図に
示すように鉛又は鉛−錫合金の第1金属層2,鉛
合金の第2金属層3を重ねた溶解電極8を加圧容
器内9に装入して、不活性ガスを充填した後加圧
して内部圧力が600〜2000Kg/cm2、加熱温度100〜
300℃の範囲でしばらく保持し、通電板と各第1
金属層と第2金属層を接合するものである。 Furthermore, as shown in FIG. 2, the method for producing an insoluble electrode of the present invention is to place a dissolving electrode 8 in which a first metal layer 2 of lead or a lead-tin alloy and a second metal layer 3 of a lead alloy are stacked in a pressurized container. 9, and after filling with inert gas, pressurize until the internal pressure is 600~2000Kg/cm 2 and the heating temperature is 100~2000Kg/cm2.
Hold the temperature in the range of 300℃ for a while, then connect the current-carrying plate and each
The metal layer and the second metal layer are bonded together.
本発明法により鉛合金部分が高温・高圧下で収
縮し、組織が緻密になるため液の浸透拡散が抑制
され、連鎖的な腐食が防止出来るのに加えて偏析
しやすい鉛等の元素の一部が再固溶化するため偏
析はいちじるしく改善され、電極内部の局部電池
形成による腐食が大巾に抑制出来る。 By the method of the present invention, the lead alloy part contracts under high temperature and high pressure, and the structure becomes dense, which suppresses the penetration and diffusion of liquid and prevents chain corrosion. Since the part is reconstituted into a solid solution, segregation is significantly improved, and corrosion due to local battery formation inside the electrode can be greatly suppressed.
本発明における加圧容器内の圧力を600〜2000
Kg/cm2と限定したのは、600Kg/cm2以下だと、組
織の緻密化及び偏析改善効果がきわめて少いため
で、また上限を2000Kg/cm2としたのはこれ以上だ
と装置価格が高くなり経済的でないのと、またそ
れに見合う改質効果がそれほど大きく期待出来な
いためである。 The pressure inside the pressurized container in the present invention is 600 to 2000.
The reason why we set the upper limit to Kg/cm 2 is that if it is less than 600 Kg/cm 2 , the effect of densifying the structure and improving segregation is extremely small, and we set the upper limit to 2000 Kg/cm 2 because if it is higher than this, the equipment price will increase. This is because it becomes expensive and uneconomical, and the reforming effect commensurate with the cost cannot be expected to be that large.
また、加熱温度を100〜300℃と限定したのは、
温度100℃以下では圧力同様に改質効果が小さい
ためであり、また上限の300℃は鉛合金の融点か
らおのずから決まる値である。 In addition, the heating temperature was limited to 100 to 300℃ because
This is because, like the pressure, the reforming effect is small at temperatures below 100°C, and the upper limit of 300°C is a value naturally determined from the melting point of the lead alloy.
(実施例)
第1図は本発明の電気亜鉛メツキ用不溶性電極
の全体を示す概要図である。又、第2図は先の不
溶性電極の製造法を示す概要図である。(Example) FIG. 1 is a schematic diagram showing the entire insoluble electrode for electrogalvanizing of the present invention. Moreover, FIG. 2 is a schematic diagram showing the method for manufacturing the above-mentioned insoluble electrode.
第1図に示すようにチタン製の通電板A1の放
電側表面に鉛95%、錫5%の成分の鉛合金の圧延
板又は引き抜き加工板を中間板2として、合せ端
面の周囲を電子ビーム溶接等でシール溶接する方
法で取付け、さらにその接合面と反対側の面に錫
0.5%、インジユウム3%、残り鉛のやはり圧延
板又は引き抜き加工板3を先の中間板2と同様の
シール溶接にて取付け、通電板と中間及び上層の
鉛合金板の3層構造となる様に積層したうえで、
該積層板を第2図に示す加圧容器9の中に装入し
て、内部に窒素又はアルゴン等の不活性ガスを充
填した後、圧縮機10にて内部圧力を1200Kg/cm2
まで昇圧すると同時に加熱温度を300℃として約
1時間保持した電気亜鉛メツキ用不溶解電極を製
作し、電気亜鉛メツキ設備で使用した。 As shown in Figure 1, a rolled or drawn plate of a lead alloy containing 95% lead and 5% tin is used as the intermediate plate 2 on the discharge side surface of the titanium current-carrying plate A1, and the periphery of the mating end surface is exposed to electron beams. It is installed by seal welding, etc., and then tin is applied to the surface opposite to the joint surface.
A rolled plate or drawn plate 3 made of 0.5% indium, 3% indium, and the remaining lead is attached by seal welding in the same way as the intermediate plate 2, so that it has a three-layer structure of the current-carrying plate and the middle and upper layer lead alloy plates. After laminating the
The laminate is placed in a pressurized container 9 shown in FIG. 2, and after filling the inside with an inert gas such as nitrogen or argon, the internal pressure is increased to 1200 Kg/cm 2 using a compressor 10.
An insoluble electrode for electrogalvanizing was fabricated by increasing the pressure to 300°C and holding the heating temperature for about 1 hour, and used it in electrogalvanizing equipment.
その際の第1図の通電板1は厚み10mmとし中間
板2は厚み15mm、上層の鉛合金3は厚み5mmとし
た。また4はそれぞれの接合面を示す。尚、第2
図において11は加熱用のヒーター、12は装入
部の蓋、13は断熱材、14は支持台、15は高
圧ガスの導入管を示す。 At that time, the current-carrying plate 1 in FIG. 1 was 10 mm thick, the intermediate plate 2 was 15 mm thick, and the upper layer lead alloy 3 was 5 mm thick. Further, 4 indicates each joint surface. Furthermore, the second
In the figure, 11 is a heater for heating, 12 is a lid for the charging section, 13 is a heat insulating material, 14 is a support stand, and 15 is a high pressure gas introduction pipe.
また今回は通電板1に圧延板又は引き抜き板を
接合して3層構造としたが、中間層2を圧延板又
は引き抜き板のかわりにホモゲン加工と呼ばれる
肉盛り、又は鋳込み法を用いて事前に被覆した後
に本発明の処理を行つてもよい。 In addition, this time, we created a three-layer structure by joining a rolled plate or a drawn plate to the current-carrying plate 1, but instead of using a rolled or drawn plate, the intermediate layer 2 was made in advance using a build-up called homogen processing or a casting method. The treatment of the present invention may be carried out after coating.
第1図において鉛又は鉛−錫合金の第1金属層
2及び鉛金属の第2金属層3を融点付近まで高圧
力下で昇温するため、チタンの通電板界面の拡散
が一層促進され放電板1及び中間板2並びに上層
3の各接合面4の接合強度が従来のホモゲン加工
では2〜3Kg/mm2であつたが今回の製造方法では
4〜6Kg/mm2と大巾に向上した。 In Figure 1, the first metal layer 2 of lead or lead-tin alloy and the second metal layer 3 of lead metal are heated under high pressure to near their melting points, which further promotes the diffusion of titanium at the interface of the current-carrying plate and causes discharge. The bonding strength of each bonding surface 4 of the plate 1, intermediate plate 2, and upper layer 3 was 2 to 3 Kg/mm 2 in the conventional homogen processing, but it was greatly improved to 4 to 6 Kg/mm 2 in the present manufacturing method. .
(発明の効果)
本発明による電気亜鉛メツキ用電極を適用する
ことによりホモゲン加工及び鋳込みにより被覆さ
れた電極において従来の化学組成を変更すること
なく、その耐腐食性と通電板との密着性をきわめ
て簡便に高めることが出来る。そのため、先に述
べた電極間距離の増加及びメツキ液の流れを阻害
する等の問題が相当改善出来る。(Effect of the invention) By applying the electrode for electrogalvanizing according to the present invention, the corrosion resistance and adhesion to the current-carrying plate can be improved without changing the conventional chemical composition of the electrode coated by homogenization and casting. It can be increased very easily. Therefore, the above-mentioned problems such as the increase in the distance between the electrodes and the obstruction of the flow of the plating solution can be considerably improved.
また通電板と鉛合金の密着性が高まることによ
り、この間の電気抵抗値が低減し、前述の極間及
びメツキ液の改善と同様にメツキ電圧の抑制か
ら、メツキ電力の削減が可能になる。またメツキ
液中に溶出する鉛が低減するためメツキ金属中に
鉛が混入する品質トラブルが大巾に改善出来る。 In addition, by increasing the adhesion between the current-carrying plate and the lead alloy, the electrical resistance value between them is reduced, and as with the improvement of the gap between electrodes and the plating liquid described above, it is possible to reduce the plating power by suppressing the plating voltage. In addition, since the amount of lead eluted into the plating solution is reduced, quality problems caused by lead being mixed into the plating metal can be greatly improved.
第1図は本発明の電気亜鉛メツキ用不溶解電極
の断面説明図、第2図は本発明不溶解電極の製造
法を示す装置断面説明図、第3図は不溶解電極を
用いた電気亜鉛メツキ装置の概要図、第4図は従
来の不溶解電極の断面説明図である。
1…通電板A、2…下層にライニングした鉛又
は鉛−錫合金の第1金属層、3…上層のライニン
グした鉛合金の第2金属層、4…固相接合した異
種鉛合金の接合界面、5…ストリツプと電極の接
触防止化を目的としたセパレータ、6…不溶解電
極に電気を供給するためのブースバー、7…ブー
スバーを通電板に接合するための溶接、8…不溶
解電極板、9…加圧容器、10…圧縮機、11…
ヒーター、12…蓋、13…断熱材、14…支持
台、15…高圧ガスの導入管、16…電極取付フ
レーム、17…通電ロール、18…補助ロール、
19…メツキ液ノズル、20…メツキ槽、21…
通電板B、22…鉛合金。
Fig. 1 is an explanatory cross-sectional view of an insoluble electrode for electrogalvanizing of the present invention, Fig. 2 is an explanatory cross-sectional view of an apparatus showing a method for manufacturing an insoluble electrode of the present invention, and Fig. 3 is an explanatory cross-sectional view of an electrolytic galvanizing electrode using an insoluble electrode. A schematic diagram of the plating device, and FIG. 4 is a cross-sectional explanatory diagram of a conventional insoluble electrode. 1... Current-carrying plate A, 2... First metal layer of lead or lead-tin alloy lined in the lower layer, 3... Second metal layer of lead alloy lined in the upper layer, 4... Joint interface of solid-phase bonded dissimilar lead alloys. , 5... Separator for the purpose of preventing contact between the strip and the electrode, 6... Booth bar for supplying electricity to the undissolved electrode, 7... Welding for joining the booth bar to the current carrying plate, 8... Undissolved electrode plate, 9... Pressurized container, 10... Compressor, 11...
Heater, 12... Lid, 13... Heat insulating material, 14... Support stand, 15... High pressure gas introduction pipe, 16... Electrode mounting frame, 17... Current supply roll, 18... Auxiliary roll,
19...Plating liquid nozzle, 20...Plating tank, 21...
Current-carrying plate B, 22...Lead alloy.
Claims (1)
込んで成形されたか、或いはホモゲン加工によつ
て肉盛りされた鉛かまたは錫2〜8%残部鉛及び
不可避的不純物からなる鉛又は鉛−錫合金の第1
金属層と第1金属層の上に圧延板又は引き抜き材
からなる銀0.2〜1.0%、インジユウム1〜5%の
何れか、または双方を含み残部鉛及び不可避的不
純物からなる鉛合金の第2金属層を重ねて、該鉛
又は鉛−錫合金の第1金属層と鉛合金の第2金属
層の接着面を拡散により接合してしてなることを
特徴とする金属ストリツプ連続式電気亜鉛メツキ
用不溶解電極。 2 電気メツキ用通電板の放電側表面に型枠に鋳
込んで成形されたか、或いはホモゲン加工によつ
て肉盛りされた鉛かまたは錫2〜8%残部鉛及び
不可避的純物からなる鉛又は鉛−錫合金の第1金
属層と該鉛又は鉛−錫合金の第1金属層の上に圧
延板又は引き抜き材からなる銀0.2〜1.0%、イン
ジユウム1〜5%の何れか、または双方を含み残
部鉛及び可避的不純物からなる鉛合金の第2金属
層を重ねて、これを加圧容器内に装入して、活性
ガスを充填した後、加圧して内部圧力が600〜
2000Kg/cm2、加熱温度100〜300℃の範囲でしばら
く保持し、通電板と各第1金属層、第金属層を接
合することを特徴とする金属ストリツプ連続式電
気亜鉛メツキ用不溶解電極の製造方法。[Scope of Claims] 1. Lead or tin 2 to 8% balance lead and unavoidable lead molded on the discharge side surface of the current-carrying plate for electroplating or built up by homogenization. The first of lead or lead-tin alloys consisting of impurities.
A second metal of a lead alloy made of rolled plate or drawn material on the metal layer and the first metal layer, containing either 0.2 to 1.0% silver, 1 to 5% indium, or both, and the balance consisting of lead and inevitable impurities. For continuous electrogalvanizing of metal strips, the adhesive surfaces of the first metal layer of lead or lead-tin alloy and the second metal layer of lead alloy are bonded by diffusion in stacked layers. Insoluble electrode. 2. Lead that has been cast into a mold on the discharge side surface of the current-carrying plate for electroplating, or has been overlaid by homogen processing, or lead that is made of 2 to 8% tin, the balance being lead and unavoidable pure substances. On the first metal layer of lead-tin alloy and the first metal layer of lead or lead-tin alloy, either 0.2 to 1.0% of silver, 1 to 5% of indium, or both, made of rolled plate or drawn material is applied. A second metal layer of lead alloy consisting of residual lead and unavoidable impurities is layered, placed in a pressurized container, filled with active gas, and pressurized until the internal pressure reaches 600 -
2000Kg/cm 2 , heating temperature range of 100 to 300℃ for a while to join the current-carrying plate and each of the first and second metal layers. Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22643388A JPH0277599A (en) | 1988-09-12 | 1988-09-12 | Insoluble electrode for continuously electrogalvanizing metallic strip and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22643388A JPH0277599A (en) | 1988-09-12 | 1988-09-12 | Insoluble electrode for continuously electrogalvanizing metallic strip and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0277599A JPH0277599A (en) | 1990-03-16 |
| JPH0459399B2 true JPH0459399B2 (en) | 1992-09-22 |
Family
ID=16845038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22643388A Granted JPH0277599A (en) | 1988-09-12 | 1988-09-12 | Insoluble electrode for continuously electrogalvanizing metallic strip and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0277599A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6940681B2 (en) | 2001-08-20 | 2005-09-06 | Quantum Corporation | Optical to magnetic alignment in magnetic tape system |
| US6940676B1 (en) | 2000-06-07 | 2005-09-06 | Quantum Corporation | Triple push-pull optical tracking system |
| US6961200B2 (en) | 1999-07-27 | 2005-11-01 | Quantum Corporation | Optical servo track identification on tape storage media |
| US6980390B2 (en) | 2003-02-05 | 2005-12-27 | Quantum Corporation | Magnetic media with embedded optical servo tracks |
| US7023650B2 (en) | 2001-11-07 | 2006-04-04 | Quantum Corporation | Optical sensor to recording head alignment |
| US7029726B1 (en) | 1999-07-27 | 2006-04-18 | Quantum Corporation | Method for forming a servo pattern on a magnetic tape |
| US7110210B2 (en) | 1998-03-24 | 2006-09-19 | Quantum Corporation | Multi-channel magnetic tape system having optical tracking servo |
| US7153366B1 (en) | 1998-03-24 | 2006-12-26 | Quantum Corporation | Systems and method for forming a servo pattern on a magnetic tape |
| US7187515B2 (en) | 2003-02-05 | 2007-03-06 | Quantum Corporation | Method and system for tracking magnetic media with embedded optical servo tracks |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57184577A (en) * | 1981-05-06 | 1982-11-13 | Showa Entetsu:Kk | Build-up welding method for corrosion resistant metal and lead or lead alloy |
| JPS6024197B2 (en) * | 1982-08-05 | 1985-06-11 | 住友金属工業株式会社 | Pb alloy insoluble anode for electroplating |
| JPS6024197A (en) * | 1983-07-19 | 1985-02-06 | Kyowa Hakko Kogyo Co Ltd | Production of glutathione |
| JPS62197265A (en) * | 1986-02-21 | 1987-08-31 | Kawasaki Steel Corp | Building-up method for insoluble electrode for electroplating |
| JPS62297498A (en) * | 1986-06-16 | 1987-12-24 | Yasunori Kashio | Production of electrode for plating |
| JPS6380975A (en) * | 1986-09-22 | 1988-04-11 | Kobe Steel Ltd | Build-up welding method of lead or lead alloy to corrosion resistant metal |
| JPS6380974A (en) * | 1986-09-24 | 1988-04-11 | Showa Entetsu:Kk | Build-up welding method of corrosion resistant metal and lead or lead alloy |
| JPS6396299A (en) * | 1986-10-13 | 1988-04-27 | Yoshizawa Kiko Toubu Kk | Insoluble anode made of lead alloy |
-
1988
- 1988-09-12 JP JP22643388A patent/JPH0277599A/en active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7110210B2 (en) | 1998-03-24 | 2006-09-19 | Quantum Corporation | Multi-channel magnetic tape system having optical tracking servo |
| US7153366B1 (en) | 1998-03-24 | 2006-12-26 | Quantum Corporation | Systems and method for forming a servo pattern on a magnetic tape |
| US6961200B2 (en) | 1999-07-27 | 2005-11-01 | Quantum Corporation | Optical servo track identification on tape storage media |
| US7029726B1 (en) | 1999-07-27 | 2006-04-18 | Quantum Corporation | Method for forming a servo pattern on a magnetic tape |
| US6940676B1 (en) | 2000-06-07 | 2005-09-06 | Quantum Corporation | Triple push-pull optical tracking system |
| US6940681B2 (en) | 2001-08-20 | 2005-09-06 | Quantum Corporation | Optical to magnetic alignment in magnetic tape system |
| US7023650B2 (en) | 2001-11-07 | 2006-04-04 | Quantum Corporation | Optical sensor to recording head alignment |
| US6980390B2 (en) | 2003-02-05 | 2005-12-27 | Quantum Corporation | Magnetic media with embedded optical servo tracks |
| US7187515B2 (en) | 2003-02-05 | 2007-03-06 | Quantum Corporation | Method and system for tracking magnetic media with embedded optical servo tracks |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0277599A (en) | 1990-03-16 |
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