JPH0459785A - Fluorine-containing organosilicon compounds - Google Patents
Fluorine-containing organosilicon compoundsInfo
- Publication number
- JPH0459785A JPH0459785A JP2171565A JP17156590A JPH0459785A JP H0459785 A JPH0459785 A JP H0459785A JP 2171565 A JP2171565 A JP 2171565A JP 17156590 A JP17156590 A JP 17156590A JP H0459785 A JPH0459785 A JP H0459785A
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- containing organosilicon
- group
- groups
- organosilicon compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、文献未載の新規な含フツ素有機ケイ素化合物
に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a novel fluorine-containing organosilicon compound that has not been described in any literature.
(従来技術)
フッ素原子を分子中に有するポリシロキサンは、耐溶剤
性、耐薬品性に優れたゴム材料用の素材として有用であ
り、また離型荊、撥水撥油剤等に使用できる素材として
有用であることが知られている。(Prior art) Polysiloxane, which has fluorine atoms in its molecules, is useful as a material for rubber materials with excellent solvent and chemical resistance, and can also be used as a material for mold release, water and oil repellents, etc. Known to be useful.
(発明が解決しようとする課題)
従って本発明は、特に上記の欅なフッ素含有ポリシロキ
サンの製造用原料として有用な新規な含フツ素有機ケイ
素化合物を提供することを目的とするものである。(Problems to be Solved by the Invention) Therefore, an object of the present invention is to provide a novel fluorine-containing organosilicon compound that is particularly useful as a raw material for producing the above-mentioned strong fluorine-containing polysiloxane.
(課題を達成するための手段)
本発明の含フツ素有機ケイ素化合物は、下記−般式(1
)、
式中、
Rは、炭素原子数1〜8の−価炭化水素基であり、複数
のRは互いに同一でも異なっていてもよく、
訂は、炭素原子数1〜10のパーフルオロアルキル基で
ある、
で表わされる。かかる一般式(I)から理解される様に
、本発明の含フツ素有機ケイ素化合物は、文献未載の新
規な化合物である。(Means for achieving the object) The fluorine-containing organosilicon compound of the present invention has the following general formula (1
), in the formula, R is a -valent hydrocarbon group having 1 to 8 carbon atoms, and multiple R's may be the same or different from each other, and R is a perfluoroalkyl group having 1 to 10 carbon atoms. , expressed as . As understood from the general formula (I), the fluorine-containing organosilicon compound of the present invention is a novel compound that has not been described in any literature.
フ イ 人 の上記一般式(I
)で表わされる本発明の含フツ素有機ケイ素化合物は、
下記一般式(II)、H−3i−Cj!
式中、Rは前記の通り、
で表わされるヒドロシランと、下記一般式(III)、
CHzCHJf
C1h=CHSt C12(In)
式中、
Rf及びRは、前記の通りである、
で表わされるビニルシランとを、触媒の存在下で付加反
応することによって製造される。The above general formula (I
) The fluorine-containing organosilicon compound of the present invention represented by
The following general formula (II), H-3i-Cj! In the formula, R is, as described above, a hydrosilane represented by and the following general formula (III),
CHzCHJf C1h=CHSt C12(In) In the formula, Rf and R are as described above. It is produced by carrying out an addition reaction with a vinylsilane represented by the following in the presence of a catalyst.
前記一般式(II)及び(III)において、基Rf及
びRは、それぞれ前記一般式(1)における基Rf及び
Rに対応する基である。In the general formulas (II) and (III), the groups Rf and R correspond to the groups Rf and R in the general formula (1), respectively.
即ち、基Rfは炭素原子数1〜10のパーフルオロアル
キル基であり、好ましくは、 CFs、C4F9゜−ら
F1a + CaF22等の基である。That is, the group Rf is a perfluoroalkyl group having 1 to 10 carbon atoms, preferably a group such as CFs, C4F9°-, F1a + CaF22, and the like.
また基Rは、炭素原子数1〜8の一価炭化水素基であり
、具体的にはメチル基、エチル基、プロピル基、ブチル
基等の炭素原子数8以下の低級アルキル基、シクロヘキ
シル基等のシクロアルキル基、ビニル基、アリル基、プ
ロペニル基、ブテニル基等のアルケニル基、フェニル基
、トリル基、ナフチル基等のアリール基、ベンジル基、
2−フェニルエチル基等のアラルキル基などを挙げるこ
とができる。本発明において、好適なものはアルキル基
であるが、最も好適なものはメチル基である。The group R is a monovalent hydrocarbon group having 1 to 8 carbon atoms, and specifically includes a lower alkyl group having 8 or less carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group, a cyclohexyl group, etc. Cycloalkyl groups, vinyl groups, allyl groups, propenyl groups, alkenyl groups such as butenyl groups, aryl groups such as phenyl groups, tolyl groups, naphthyl groups, benzyl groups,
Examples include aralkyl groups such as 2-phenylethyl group. In the present invention, an alkyl group is preferred, and a methyl group is most preferred.
尚、一般式(I[)で表されるビニルシランは、例えば
ビニルマグネシウムプロミド等のビニルグリニヤール試
薬と、パーフルオロアルキルエチル基を有するジクロロ
シランとを反応させることにより合成することができる
。Note that the vinylsilane represented by the general formula (I[) can be synthesized, for example, by reacting a vinyl Grignard reagent such as vinylmagnesium bromide with a dichlorosilane having a perfluoroalkylethyl group.
これらのヒドロシランとビニルシランとの付加反応に際
して用いられる触媒としては、白金族金属系の触媒を例
示することができ、例えば塩化白金酸、アルコール変性
塩化白金酸(米国特許第3.220.972号明細書参
照)、塩化白金酸とオレフィンとのコンプレックス(米
国特許第3.159.601号、同第3.159.66
2号、同第3.775.452号明細書参照)、白金黒
またはパラジウム等をアルミナ、シリカ、カーボン等の
担体に担持させたもの、ロジウム−オレフィンコンプレ
ックス等を好適に使用することができる。これらの触媒
の内、特にコンプレックスタイプのものは、アルコール
系、ケトン系、エーテル系、炭化水素系等の溶剤に溶解
させて使用することが好適である。またこれらの白金族
金属系触媒の使用量は、一般に白金族金属換算で、ヒド
ロシラン及びビニルシランの合計量に対して0.1〜5
00 pp+* 、特に0.5〜200 ppmの範囲
とすることが望ましい。Examples of catalysts used in the addition reaction between hydrosilane and vinylsilane include platinum group metal catalysts, such as chloroplatinic acid, alcohol-modified chloroplatinic acid (U.S. Pat. No. 3,220,972) ), complexes of chloroplatinic acid and olefins (U.S. Pat. Nos. 3.159.601 and 3.159.66)
No. 2, No. 3.775.452), platinum black or palladium supported on a carrier such as alumina, silica, carbon, rhodium-olefin complex, etc. can be suitably used. Among these catalysts, complex type catalysts in particular are preferably used after being dissolved in an alcohol-based, ketone-based, ether-based, or hydrocarbon-based solvent. In addition, the amount of these platinum group metal catalysts used is generally 0.1 to 5% relative to the total amount of hydrosilane and vinylsilane, calculated as platinum group metal.
00 ppm+*, particularly preferably in the range of 0.5 to 200 ppm.
前記ヒドロシランとビニルシランとの反応は無溶剤系で
行なうことができるが、必要により不活性溶剤、例えば
、ベンゼン、トルエン、キシレン、n−ヘキサン、シク
ロヘキサン等を用いて行なうこともできる0反応温度は
、60〜150℃、特に80〜120℃の範囲とするこ
とが好適である。The reaction between hydrosilane and vinylsilane can be carried out without a solvent, but if necessary, it can also be carried out using an inert solvent such as benzene, toluene, xylene, n-hexane, cyclohexane, etc. The temperature is preferably in the range of 60 to 150°C, particularly 80 to 120°C.
反応終了後は、蒸留等のそれ自体公知の精製手段により
、目的とする含フツ素有機ケイ素化合物を得ることがで
きる。After the reaction is completed, the desired fluorine-containing organosilicon compound can be obtained by purification means known per se, such as distillation.
フ・ 、 イ、ム
かくして得られる本発明の含フツ素有機ケイ素化合物は
、前述した一般式(1)で表わされる分子構造を有する
。本発明の含フツ素有機ケイ素化合物の代表例を以下に
示す。The fluorine-containing organosilicon compound of the present invention obtained in this manner has a molecular structure represented by the above-mentioned general formula (1). Representative examples of the fluorine-containing organosilicon compound of the present invention are shown below.
CHi L;Hコ CH。CHi L;H CH.
CH2GHzCaF。CH2GHzCaF.
耐溶剤性シルエチレンシロキサンゴム、離型剤等に使用
できる素材として特に有用である。It is particularly useful as a material that can be used for solvent-resistant silethylene siloxane rubber, mold release agents, etc.
(実施例)
参考例;
本発明の含フツ素有機ケイ素化合物は、種々の用途に用
いることができるが、特に耐溶剤性に優れたポリシルエ
チレンシロキサンの製造用原料として極めて有用である
。例えば本発明の含フツ素有機ケイ素化合物を加水分解
し、アルカリ金属水酸化物を用いてクランキングを行な
って5員環モノマーを合成し、該モノマーを重合するこ
とにより、側鎖にパーフロロアルキル基を有するポリシ
ルエチレンシロキサンポリマーを合成することができる
。このポリマーはフッ素含有率が高いため、冷却管、撹
拌棒、温度針及び滴下ロートを備えた101四つロフラ
スコに、
ヘプタデカフロロデシルメチルジクロロシラン2525
g 。(Examples) Reference Example: The fluorine-containing organosilicon compound of the present invention can be used for various purposes, but is particularly useful as a raw material for producing polysilethylene siloxane having excellent solvent resistance. For example, by hydrolyzing the fluorine-containing organosilicon compound of the present invention and performing cranking using an alkali metal hydroxide to synthesize a 5-membered ring monomer, and polymerizing the monomer, perfluoroalkyl is added to the side chain. Polysilethylene siloxane polymers having groups can be synthesized. Because this polymer has a high fluorine content, heptadecafluorodecylmethyldichlorosilane 2525
g.
及び、
テトラヒドロフラン 2500 g
を仕込み、次いで予め調製しておいた、ビニルマグネシ
ウムプロミドのテトラヒドロフラン溶液2489g (
ビニルマグネシウムプロミド4.5モル)
を、滴下ロートにより2時間かけて滴下した。Then, 2500 g of tetrahydrofuran was charged, and then 2489 g of a tetrahydrofuran solution of vinyl magnesium bromide prepared in advance (
4.5 mol of vinylmagnesium bromide) was added dropwise through a dropping funnel over a period of 2 hours.
滴下後、60℃で3時間加熱攪拌した後、ガスクロマト
グラフィーにより反応混合物を分析したところ、原料の
へブタデカフロロデシルメチルジクロロシラン(A)の
ピーク、及びヘプタデカフロロデシルビニルメチルクロ
ロシラン(B)とへブタデカフロロデシルジビニルメチ
ルシラン(C)が重なったピークが、それぞれ8.6%
、11.8%の比率で確認された。After the dropwise addition, the reaction mixture was heated and stirred at 60°C for 3 hours, and then analyzed by gas chromatography. The peak of the raw material heptadecafluorodecylmethyldichlorosilane (A) and the peak of heptadecafluorodecyl vinylmethylchlorosilane (B) were detected. ) and hebutadecafluorodecyldivinylmethylsilane (C) overlapped at 8.6% each.
, confirmed at a rate of 11.8%.
この反応混合物を吸引炉遇し、塩を取り除き、炉液を減
圧蒸留することにより、沸点lO5〜110”C/7m
sHgの留分(A ; 32.3χ、B+C;66.2
χ)1819gが得られた。This reaction mixture was placed in a suction furnace, salts were removed, and the furnace liquid was distilled under reduced pressure to obtain a boiling point of 1O5 to 110"C/7m.
Fraction of sHg (A; 32.3χ, B+C; 66.2
χ) 1819 g was obtained.
1隻班上
冷却管、撹拌棒、温度針及び滴下ロートを備えた32四
つロフラスコに、
前記参考例で得られた留分 1527 g塩化白金酸の
1%イソプロパツール溶液0.1gを仕込み、80℃に
加熱した。1527 g of the fraction obtained in the above reference example and 0.1 g of a 1% isopropanol solution of chloroplatinic acid were charged into a 32-four-bottle flask equipped with a cooling tube, a stirring bar, a temperature needle, and a dropping funnel. , heated to 80°C.
次いでこのフラスコ内に、 ジメチルクロロシラン261g を滴下ロートより2時間かけて滴下した。Then in this flask, 261g dimethylchlorosilane was added dropwise from the dropping funnel over a period of 2 hours.
滴下終了後、さらに80℃の温度で1時間加熱攪拌を行
なった。反応混合物を減圧蒸留することによって、沸点
158〜160℃/8m1g、及び融点38〜40°C
の留分515g (収率72.0%)が得られた。この
留分について、’H−NMR,赤外吸収スペクトル、”
F−NMR及び元素分析による分析を行なったところ、
以下の結果を得た。After the dropwise addition was completed, heating and stirring was further performed at a temperature of 80° C. for 1 hour. By distilling the reaction mixture under reduced pressure, the boiling point is 158-160°C/8ml/g, and the melting point is 38-40°C.
515 g of a fraction (yield 72.0%) was obtained. Regarding this fraction, 'H-NMR, infrared absorption spectrum,
When analyzed by F-NMR and elemental analysis,
The following results were obtained.
’H−NMR; CCj! a中、内部標準CHCj!
! 。'H-NMR; CCj! In a, internal standard CHCj!
! .
δ(ppm)
0.55 (s、 Si CHs、 6H)0.5
7 (s、 Si CHs、3H)1.01 (
s、 Si CH2CHz St、 4H)1.2
2 (t、 St −CHg、 21)2.36
(t、 CFz−CHz+ 2H)赤外吸収スペクトル
; 第1図に示す。δ (ppm) 0.55 (s, Si CHs, 6H) 0.5
7 (s, Si CHs, 3H) 1.01 (
s, Si CH2CHz St, 4H) 1.2
2 (t, St -CHg, 21) 2.36
(t, CFz-CHz+2H) Infrared absorption spectrum; shown in FIG.
C−Fピーク 1130〜1280cm+−’”F−N
MRHCFsCOOH標準
d : −40,15pps
e : −5,71ppm
元素分析;
以上の分析結果より、上記留分は、下記構造式で表わさ
れる化合物であることが確認された。C-F peak 1130-1280cm+-'”F-N
MRHCFsCOOH standard d: -40,15 pps e: -5,71 ppm Elemental analysis; From the above analysis results, it was confirmed that the above fraction was a compound represented by the following structural formula.
(発明の効果)
本発明によれば、耐溶剤性に優れたポリシルエチレンシ
ロキサンの製造用原料として極めて有用な新規含フツ素
有機ケイ素化合物が提供される。(Effects of the Invention) According to the present invention, a novel fluorine-containing organosilicon compound is provided which is extremely useful as a raw material for producing polysilethylene siloxane having excellent solvent resistance.
第1図は、実施例1で得られた含フツ素有機ケイ素化合
物の赤外吸収スペクトルを示す図である。FIG. 1 is a diagram showing an infrared absorption spectrum of the fluorine-containing organosilicon compound obtained in Example 1.
Claims (1)
のRは互いに同一でも異なっていてもよく、 Rfは、炭素原子数1〜10のパーフルオロアルキル基
である、 で表わされる含フッ素有機化合物。(1) The following general formula [I], ▲Mathematical formula, chemical formula, table, etc.▼[I] In the formula, R is a monovalent hydrocarbon group having 1 to 8 carbon atoms, and multiple R's are the same as each other. A fluorine-containing organic compound represented by the following, wherein Rf is a perfluoroalkyl group having 1 to 10 carbon atoms.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2171565A JPH0459785A (en) | 1990-06-29 | 1990-06-29 | Fluorine-containing organosilicon compounds |
| DE69112148T DE69112148T2 (en) | 1990-06-29 | 1991-06-28 | Organic silicon compounds containing fluorine. |
| EP91305915A EP0465177B1 (en) | 1990-06-29 | 1991-06-28 | Fluorine-containing organic silicon compounds |
| US07/723,980 US5117026A (en) | 1990-06-29 | 1991-07-01 | Fluorine-containing organic silicon compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2171565A JPH0459785A (en) | 1990-06-29 | 1990-06-29 | Fluorine-containing organosilicon compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0459785A true JPH0459785A (en) | 1992-02-26 |
Family
ID=15925499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2171565A Pending JPH0459785A (en) | 1990-06-29 | 1990-06-29 | Fluorine-containing organosilicon compounds |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0459785A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0688777A2 (en) | 1994-06-22 | 1995-12-27 | Dow Corning Toray Silicone Company, Limited | Fluorine-containing organosilicon compounds and method for their preparation |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB999125A (en) * | 1963-03-25 | 1965-07-21 | Dow Corning | A process for preparing organosilicon polymers |
| GB1014156A (en) * | 1963-01-14 | 1965-12-22 | Dow Corning | Organosilicon compounds |
| GB1022743A (en) * | 1961-09-05 | 1966-03-16 | Dow Corning | A process for polymerising organosilicon compounds |
-
1990
- 1990-06-29 JP JP2171565A patent/JPH0459785A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1022743A (en) * | 1961-09-05 | 1966-03-16 | Dow Corning | A process for polymerising organosilicon compounds |
| GB1014156A (en) * | 1963-01-14 | 1965-12-22 | Dow Corning | Organosilicon compounds |
| GB999125A (en) * | 1963-03-25 | 1965-07-21 | Dow Corning | A process for preparing organosilicon polymers |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0688777A2 (en) | 1994-06-22 | 1995-12-27 | Dow Corning Toray Silicone Company, Limited | Fluorine-containing organosilicon compounds and method for their preparation |
| EP0688777A3 (en) * | 1994-06-22 | 1999-05-19 | Dow Corning Toray Silicone Company, Limited | Fluorine-containing organosilicon compounds and method for their preparation |
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