JPH0460331B2 - - Google Patents

Info

Publication number
JPH0460331B2
JPH0460331B2 JP58184433A JP18443383A JPH0460331B2 JP H0460331 B2 JPH0460331 B2 JP H0460331B2 JP 58184433 A JP58184433 A JP 58184433A JP 18443383 A JP18443383 A JP 18443383A JP H0460331 B2 JPH0460331 B2 JP H0460331B2
Authority
JP
Japan
Prior art keywords
diffraction grating
light
gap
diffracted
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58184433A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6077423A (ja
Inventor
Hiroo Kinoshita
Atsunobu Une
Makoto Inoshiro
Nobuyuki Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58184433A priority Critical patent/JPS6077423A/ja
Publication of JPS6077423A publication Critical patent/JPS6077423A/ja
Publication of JPH0460331B2 publication Critical patent/JPH0460331B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP58184433A 1983-10-04 1983-10-04 ２重回折格子によるギヤツプ・位置合せ制御法 Granted JPS6077423A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58184433A JPS6077423A (ja) 1983-10-04 1983-10-04 ２重回折格子によるギヤツプ・位置合せ制御法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58184433A JPS6077423A (ja) 1983-10-04 1983-10-04 ２重回折格子によるギヤツプ・位置合せ制御法

Publications (2)

Publication Number Publication Date
JPS6077423A JPS6077423A (ja) 1985-05-02
JPH0460331B2 true JPH0460331B2 (mo) 1992-09-25

Family

ID=16153064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58184433A Granted JPS6077423A (ja) 1983-10-04 1983-10-04 ２重回折格子によるギヤツプ・位置合せ制御法

Country Status (1)

Country Link
JP (1) JPS6077423A (mo)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006013400A (ja) * 2004-06-29 2006-01-12 Canon Inc ２つの対象物間の相対的位置ずれ検出方法及び装置
NL2003871A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography.
JP5284212B2 (ja) * 2009-07-29 2013-09-11 株式会社東芝 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6077423A (ja) 1985-05-02

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