JPH0460553U - - Google Patents
Info
- Publication number
- JPH0460553U JPH0460553U JP10241090U JP10241090U JPH0460553U JP H0460553 U JPH0460553 U JP H0460553U JP 10241090 U JP10241090 U JP 10241090U JP 10241090 U JP10241090 U JP 10241090U JP H0460553 U JPH0460553 U JP H0460553U
- Authority
- JP
- Japan
- Prior art keywords
- rotating
- vacuum chamber
- nut body
- movable electrode
- outside
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第1図〜第3図はこの考案の第1実施例を示し
、第1図はプラズマCVD装置の概略断面図、第
2図は第1図における−線断面図、第3図は
第1図における−線断面図である。第4図は
第2実施例のプラズマCVD装置における駆動機
構の正面図である。
1……真空槽、2……可動電極、3……固定電
極、8……回転軸、12……基板、14……回転
機構、15……往復機構。
1 to 3 show a first embodiment of this invention, in which FIG. 1 is a schematic sectional view of a plasma CVD apparatus, FIG. 2 is a sectional view taken along the - line in FIG. 1, and FIG. FIG. FIG. 4 is a front view of the drive mechanism in the plasma CVD apparatus of the second embodiment. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 2... Movable electrode, 3... Fixed electrode, 8... Rotating shaft, 12... Substrate, 14... Rotating mechanism, 15... Reciprocating mechanism.
Claims (1)
れた可動電極と固定電極とが内外二重に配設され
ており、 外周に一群の基板が装着される前記可動電極を
、真空槽を内外に貫通する回転軸を介して回転自
在に支持し、 真空槽の外部に、前記回転軸を介して可動電極
を回転操作する回転機構と、回転軸をその軸心に
沿つて往復操作する往復機構を設けたプラズマC
VD装置。 (2) 回転機構がモータと減速装置とで構成され
、減速装置の出力軸を回転軸に連結し、 往復機構が、正逆転モータと、モータ動力を往
復動作に変換するねじ軸及びねじ軸に噛み合うナ
ツト体とからなり、 前記回転機構がナツト体で支持されている請求
項(1)記載のプラズマCVD装置。[Scope of Claim for Utility Model Registration] (1) A movable electrode and a fixed electrode each formed into a cylindrical shape are arranged inside and outside the vacuum chamber, and a group of substrates is attached to the outer periphery. The movable electrode is rotatably supported via a rotating shaft penetrating the vacuum chamber inside and outside, and a rotating mechanism for rotating the movable electrode via the rotating shaft is provided outside the vacuum chamber; Plasma C equipped with a reciprocating mechanism that reciprocates along the heart
VD device. (2) The rotating mechanism is composed of a motor and a reduction gear, and the output shaft of the reduction gear is connected to the rotating shaft, and the reciprocating mechanism is composed of a forward/reverse motor, a screw shaft that converts motor power into reciprocating motion, and a screw shaft. The plasma CVD apparatus according to claim 1, further comprising a nut body that engages with the nut body, and wherein the rotation mechanism is supported by the nut body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10241090U JPH0460553U (en) | 1990-09-28 | 1990-09-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10241090U JPH0460553U (en) | 1990-09-28 | 1990-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0460553U true JPH0460553U (en) | 1992-05-25 |
Family
ID=31846643
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10241090U Pending JPH0460553U (en) | 1990-09-28 | 1990-09-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0460553U (en) |
-
1990
- 1990-09-28 JP JP10241090U patent/JPH0460553U/ja active Pending
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