JPH0460554U - - Google Patents
Info
- Publication number
- JPH0460554U JPH0460554U JP10241190U JP10241190U JPH0460554U JP H0460554 U JPH0460554 U JP H0460554U JP 10241190 U JP10241190 U JP 10241190U JP 10241190 U JP10241190 U JP 10241190U JP H0460554 U JPH0460554 U JP H0460554U
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- plasma cvd
- cvd apparatus
- discharge
- ring shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図〜第３図はこの考案の第１実施例を示し
、第１図はプラズマＣＶＤ装置の概略断面図、第
２図は放電電極の底面図、第３図は電界の分布形
態を示す説明図である。第４図は第２実施例を示
す放電電極の縦断正面図である。第５図は従来装
置における電界の分布形態を示す説明図である。
１……真空槽、４……放電電極、５……アース
電極、１２……基板、１３……放電面、１４……
絶縁体。
Figures 1 to 3 show a first embodiment of this invention, with Figure 1 being a schematic cross-sectional view of a plasma CVD apparatus, Figure 2 being a bottom view of a discharge electrode, and Figure 3 showing the form of electric field distribution. It is an explanatory diagram. FIG. 4 is a longitudinal sectional front view of a discharge electrode showing a second embodiment. FIG. 5 is an explanatory diagram showing the form of electric field distribution in a conventional device. 1... Vacuum chamber, 4... Discharge electrode, 5... Earth electrode, 12... Substrate, 13... Discharge surface, 14...
Insulator.
Claims (1)
を支持するアース電極とが対向配置されており、 前記放電電極の放電面に、電界の分布形態を制
御する絶縁体が付設してあることを特徴とするプ
ラズマＣＶＤ装置。 (2) 絶縁体が無端リング状に形成されており、
この絶縁体の複数個を放電面に沿つて多重輪形状
に配置したことを特徴とする請求項(1)記載のプ
ラズマＣＶＤ装置。[Claims for Utility Model Registration] (1) Inside a vacuum chamber, a discharge electrode and a ground electrode supporting a group of substrates are disposed facing each other, and a discharge surface of the discharge electrode has a shape of electric field distribution. A plasma CVD apparatus characterized in that an insulator for control is attached. (2) The insulator is formed into an endless ring shape,
2. The plasma CVD apparatus according to claim 1, wherein a plurality of the insulators are arranged in a multi-ring shape along the discharge surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10241190U JPH0460554U (en) | 1990-09-28 | 1990-09-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10241190U JPH0460554U (en) | 1990-09-28 | 1990-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0460554U true JPH0460554U (en) | 1992-05-25 |
Family
ID=31846645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10241190U Pending JPH0460554U (en) | 1990-09-28 | 1990-09-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0460554U (en) |
-
1990
- 1990-09-28 JP JP10241190U patent/JPH0460554U/ja active Pending
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