JPH0461629U - - Google Patents
Info
- Publication number
- JPH0461629U JPH0461629U JP10202990U JP10202990U JPH0461629U JP H0461629 U JPH0461629 U JP H0461629U JP 10202990 U JP10202990 U JP 10202990U JP 10202990 U JP10202990 U JP 10202990U JP H0461629 U JPH0461629 U JP H0461629U
- Authority
- JP
- Japan
- Prior art keywords
- pedestal
- gas line
- heater
- valve
- heating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
第１図は、本考案の一実施例を示すＭＯＣＶＤ
装置の概略構成図、第２図はガスラインのバルブ
加熱装置の構成図、第３図は他の実施例を示すバ
ルブ加熱装置の構成図、第４図はガスラインのマ
スフローコントローラ加熱装置の構成図である。
１……反応室、２……基板、３……高周波加熱
コイル、４……排ガス処理装置、５……恒温槽、
６……バブラ、７……ベローズバルブ、８……ニ
ードルバルブ、９……マスフローコントローラ、
１０……台座、１１……温度センサ、１２……ヒ
ータ配線、１３……ヒータ電源、１４……温度コ
ントローラ、１５……歪センサ、１６……歪コン
トローラ。
FIG. 1 shows an MOCVD device showing an embodiment of the present invention.
A schematic configuration diagram of the device, FIG. 2 is a configuration diagram of a gas line valve heating device, FIG. 3 is a configuration diagram of a valve heating device showing another embodiment, and FIG. 4 is a configuration diagram of a gas line mass flow controller heating device. It is a diagram. 1... Reaction chamber, 2... Substrate, 3... High frequency heating coil, 4... Exhaust gas treatment device, 5... Constant temperature chamber,
6... Bubbler, 7... Bellows valve, 8... Needle valve, 9... Mass flow controller,
10... Pedestal, 11... Temperature sensor, 12... Heater wiring, 13... Heater power supply, 14... Temperature controller, 15... Strain sensor, 16... Strain controller.
Claims (1)
けられ、この台座にヒータが設けられていること
を特徴とするガスライン加熱装置。 (2) ガスラインに介装されたバルブに台座が設
けられ、この台座にヒータとともに温度センサが
設けられ、かつ前記台座とバルブにそれぞれ歪セ
ンサが設けられていることを特徴とするガスライ
ン加熱装置。 (3) ガスラインに介装されたマスフローコント
ローラに台座が設けられ、この台座にヒータが設
けられていることを特徴とするガスライン加熱装
置。[Claims for Utility Model Registration] (1) A gas line heating device characterized in that a valve installed in a gas line is provided with a pedestal, and a heater is provided on the pedestal. (2) Gas line heating characterized in that the valve installed in the gas line is provided with a pedestal, the pedestal is provided with a temperature sensor together with a heater, and the pedestal and the valve are each provided with a strain sensor. Device. (3) A gas line heating device characterized in that a mass flow controller installed in a gas line is provided with a pedestal, and a heater is provided on the pedestal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10202990U JPH0461629U (en) | 1990-09-28 | 1990-09-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10202990U JPH0461629U (en) | 1990-09-28 | 1990-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0461629U true JPH0461629U (en) | 1992-05-27 |
Family
ID=31845953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10202990U Pending JPH0461629U (en) | 1990-09-28 | 1990-09-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0461629U (en) |
-
1990
- 1990-09-28 JP JP10202990U patent/JPH0461629U/ja active Pending
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