JPH046214B2 - - Google Patents
Info
- Publication number
- JPH046214B2 JPH046214B2 JP59274332A JP27433284A JPH046214B2 JP H046214 B2 JPH046214 B2 JP H046214B2 JP 59274332 A JP59274332 A JP 59274332A JP 27433284 A JP27433284 A JP 27433284A JP H046214 B2 JPH046214 B2 JP H046214B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- gas
- processing chamber
- injection port
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、液体注入口を有する高分子材料製容
器の内面と外面とを夫々異なるプラズマガスにて
処理する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for treating the inner and outer surfaces of a polymer material container having a liquid injection port with different plasma gases.
高分子材料等の表面改質法の一つとしてプラズ
マ処理を施こす方法が知られている。
Plasma treatment is known as one of the surface modification methods for polymeric materials and the like.
プラズマ処理方法は、反応ガスのプラズマ化を
プラズマ処理室内で行う方法と、プラズマ処理室
外で行う方法との２つの方法に大別することがで
きる。 Plasma processing methods can be roughly divided into two methods: methods in which the reaction gas is turned into plasma inside the plasma processing chamber, and methods in which the reaction gas is turned into plasma outside the plasma processing chamber.
これらのプラズマ処理方法を第６図及び第７図
に基いて説明する。 These plasma processing methods will be explained based on FIGS. 6 and 7.
第６図はガスのプラズマ化を処理室内で行うタ
イプの装置を、第７図はガスのプラズマ化を処理
室外で行い、プラズマ化したガスを処理室内に導
入するタイプの装置を示し、夫々の装置において
符号１はガスボンベ、２は減圧弁、３は流量調整
弁、４は処理室、４′は処理室のとびら、５は真
空ポンプ、６は反応ガス用バルブ、７はパージ用
バルブ、８は真空排気用バルブ、９はリーク用バ
ルブ、１０はパツキン、１１はジエネレーター、
１５は被処理物を示し、第６図において１２はコ
イル、第７図において１３は導波管、１４はプラ
ズマシヤワー管を示す。 Figure 6 shows a type of device that converts gas into plasma inside the processing chamber, and Figure 7 shows a type of device that converts gas into plasma outside the processing chamber and introduces the plasma gas into the processing chamber. In the apparatus, 1 is a gas cylinder, 2 is a pressure reducing valve, 3 is a flow rate adjustment valve, 4 is a processing chamber, 4' is a door of the processing chamber, 5 is a vacuum pump, 6 is a reaction gas valve, 7 is a purge valve, 8 is a vacuum exhaust valve, 9 is a leak valve, 10 is a gasket, 11 is a generator,
Reference numeral 15 indicates an object to be processed; in FIG. 6, 12 is a coil; in FIG. 7, 13 is a waveguide; and 14 is a plasma shower tube.
被処理物をプラズマ処理する場合、先づ被処理
物１５をプラズマ処理室４の所定の位置に入れと
びら4′を閉じると共にバルブ６，７及び９を閉
じ、バルブ８を開とした後真空ポンプ５をonと
してプラズマ処理室内を排気する。プラズマ処理
室内が所定の圧力に達したらバルブ６を開き、処
理室内を所定の圧力に保ちながらガスボンベ１か
ら反応ガスを供給しつゝジエネレーター１１を
onにし、処理室内でガスをプラズマ化するか、
プラズマ化されたガスをプラズマシヤワー管１４
により処理室内に導入することにより所定の時間
被処理物のプラズマ化処理を行う。被処理物のプ
ラズマ化処理が終つたらジエネレーター１１を
offとし、バルブ６及び８を閉とした後バルブ７
を開として処理室内を大気圧に戻し、とびら４′
を開いて被処理物１５を取り出す。 When subjecting a workpiece to plasma treatment, first place the workpiece 15 in a predetermined position in the plasma processing chamber 4, close the door 4' and close the valves 6, 7, and 9, open the valve 8, and then turn the vacuum on. The pump 5 is turned on to evacuate the plasma processing chamber. When the plasma processing chamber reaches a predetermined pressure, the valve 6 is opened, and the reactant gas is supplied from the gas cylinder 1 while maintaining the predetermined pressure inside the processing chamber and the generator 11 is turned on.
Turn it on and turn the gas into plasma in the processing chamber, or
The plasma gas is transferred to the plasma shower tube 14.
By introducing the plasma into the processing chamber, the object to be processed is subjected to plasma processing for a predetermined period of time. After the plasma processing of the object to be processed is completed, turn on the generator 11.
off, and after closing valves 6 and 8, valve 7
Open the door 4' to return the processing chamber to atmospheric pressure.
Open it and take out the object 15 to be processed.
また、プラズマ処理を行う場合、使用する反応
ガス（プラズマ化ガス）の種類により被処理物表
面の改質効果が異なることが知られている。そし
て、一つの部品に対して２種類以上のガスを用い
て順次プラズマ処理を施す方法、或いは２種類以
上の混合ガスを用いてプラズマ処理をする方法も
知られているが、一つの部品の部位によるガスの
種類を異にするプラズマ処理に関しては、先ずマ
スキングして第１のガスによるプラズマ処理を行
つた後該マスキングをはがし、ついで第１のガス
によるプラズマ処理を行つた部分をマスキング
し、第２のガスによるプラズマ処理を行うという
方法しかなく、面倒な操作を必要とする。 Furthermore, when plasma processing is performed, it is known that the effect of modifying the surface of the object to be processed differs depending on the type of reaction gas (plasmaization gas) used. There are also known methods in which one part is subjected to plasma treatment sequentially using two or more types of gas, or a method in which plasma treatment is performed using a mixed gas of two or more types. Regarding plasma processing using different types of gases, first masking is performed and plasma processing is performed using the first gas, then the masking is removed, and then the area that has been subjected to the plasma processing using the first gas is masked, and the The only method available is to perform plasma treatment using the second gas, which requires troublesome operations.
本発明は、プラズマ処理室内において、液体注
入口を有する高分子材料製容器の内面と外面とを
夫々異なるプラズマガスで同時に処理することに
より内面に液透過性を防止する性質を与え、外面
に塗装性あるいは接着性を向上せしめる性質を与
える方法を提供するものである。
The present invention provides properties that prevent liquid permeability to the inner surface by simultaneously treating the inner and outer surfaces of a polymer material container with a liquid injection port with different plasma gases in a plasma processing chamber, and coating the outer surface. The present invention provides a method for imparting properties that improve adhesiveness or adhesiveness.
本発明は、プラズマ処理室内において、液体注
入口を有する高分子材料製容器の内側に、液体注
入口に挿入したプラズマガスシヤワー管より液透
過性を防止する性質を付与しうるプラズマガス
を、外側に塗装・接着性を向上せしめる性質を付
与しうるプラズマガスを同時に供給することを特
徴とする液体注入口を有する高分子材料製容器の
プラズマ処理方法である。
The present invention provides plasma gas capable of imparting properties that prevent liquid permeability to the inside of a polymer material container having a liquid injection port in a plasma processing chamber through a plasma gas shower tube inserted into the liquid injection port. This is a plasma treatment method for a container made of a polymeric material having a liquid injection port, characterized in that a plasma gas capable of imparting properties that improve coating and adhesion properties to the container is simultaneously supplied.
以下、本発明方法を詳しく説明する。 The method of the present invention will be explained in detail below.
処理室内の圧力、プラズマ化ガスの流量、ジエ
ネレーターの出力、処理時間等は、処理室の大き
さ、被処理物の材質とガスの組み合わせ、或いは
希望するプラズマ処理の程度により適宜決定する
ことができる。 The pressure inside the processing chamber, the flow rate of the plasma-forming gas, the output of the generator, the processing time, etc. can be determined as appropriate depending on the size of the processing chamber, the combination of the material and gas of the object to be processed, or the desired degree of plasma processing. .
ジエネレーターの高周波としては、13.56MHz
のラジオ波、約2450MHzのマイクロ波等を使用す
ることができ、また反応ガスとしてはO2，N2，
He，Ar，H2，CO，CF4，CCl2F2等プラズマ処
理に使用可能なあらゆるガスの中から目的に応じ
て適当なものを選んで使用することができる。 The high frequency of the generator is 13.56MHz.
Radio waves of about 2450 MHz, microwaves of about 2450 MHz, etc. can be used, and the reaction gases include O 2 , N 2 ,
An appropriate gas can be selected and used depending on the purpose from among all the gases that can be used for plasma processing, such as He, Ar, H 2 , CO, CF 4 , and CCl 2 F 2 .
つぎに図面に基いて具体例を説明するが、本発
明は以下に説明する具体例に限定されるものでは
ない。 Next, specific examples will be explained based on the drawings, but the present invention is not limited to the specific examples described below.
実施例 １
第１図に示す装置に用いてポリオレフイン樹脂
製燃料タンクの外面はO2ガスにより、内面はフ
ツ化炭化水素系ガスによりプラズマ処理を行つ
た。第１図において、符号１，１′はガスボンベ、
２，２′は減圧弁、３，３′は流量調整弁、４は処
理室、４′は処理室のとびら、５は真空ポンプ、
６，６′は反応用ガスバルブ、７はパージ用バル
ブ、８は真空排気用バルブ、９はリーク用バル
ブ、１０はパツキン、１１，１１′はジエネレー
ター、１３，１３′は導波管、１４，１４′はプラ
ズマシヤワー管、１５はポリオレフイン樹脂製燃
料タンクを示す。Example 1 Using the apparatus shown in FIG. 1, the outer surface of a polyolefin resin fuel tank was subjected to plasma treatment with O 2 gas, and the inner surface was subjected to plasma treatment with fluorinated hydrocarbon gas. In Fig. 1, symbols 1 and 1' are gas cylinders,
2 and 2' are pressure reducing valves, 3 and 3' are flow rate adjustment valves, 4 is a processing chamber, 4' is a door of the processing chamber, 5 is a vacuum pump,
6, 6' are reaction gas valves, 7 is a purge valve, 8 is a vacuum exhaust valve, 9 is a leak valve, 10 is a gasket, 11, 11' is a generator, 13, 13' is a waveguide, 14, 14' is a plasma shower tube, and 15 is a polyolefin resin fuel tank.
処理室４内に、ポリオレフインン樹脂製燃料タ
ンクの内部にプラズマシヤワー管１４′を挿入し、
外部にプラズマシヤワー管１４が位置するように
タンクを配置した後、前に説明したのと同様に処
理室内を減圧し、所定の圧力に達したとき、プラ
ズマシヤワー管１４′よりフツ化炭化水素系プラ
ズマガスを供給し、プラズマシヤワー管１４によ
りO2プラズマガスを供給した。その結果、タン
ク内面にはＣ−Ｆ供給が生じ、塗装・接着等は困
難になるが、燃料の透過性を防止する性質が付与
され、一方、タンク外面には＞Ｃ＝０結合或いは
−COOH結合等の極性基が形成され、塗装・接
着等の二次加工性が向上した。 A plasma shower pipe 14' is inserted into a polyolefin resin fuel tank in the processing chamber 4,
After arranging the tank so that the plasma shower tube 14 is located outside, the pressure inside the processing chamber is reduced in the same manner as described above, and when the predetermined pressure is reached, fluorinated hydrocarbons are discharged from the plasma shower tube 14'. Plasma gas was supplied, and O 2 plasma gas was supplied through the plasma shower tube 14 . As a result, C-F supply occurs on the inner surface of the tank, making painting and adhesion difficult, but it imparts properties that prevent fuel permeability.On the other hand, on the outer surface of the tank, >C=0 bonds or -COOH Polar groups such as bonds are formed, improving secondary processability such as painting and adhesion.
第１図に示す装置の場合、第２図及び第３図に
示すように、仕切り板１８を設けて２種以上のガ
スがお互に接触しないようにするのが好ましい。 In the case of the apparatus shown in FIG. 1, it is preferable to provide a partition plate 18 as shown in FIGS. 2 and 3 to prevent two or more types of gas from coming into contact with each other.
第３図は第２図のＡ−Ａ線における断面図を示
し、両図面において１６は台車、１７はレール、
１８は仕切板、１９はジヤツキ、８′は真空排気
用バルブを示し、他の符号は、第１図で説明した
符号と同一の意味を有し、且つ第２図及び該第３
図において処理室の部分のみの断面図を示す。 FIG. 3 shows a cross-sectional view taken along the line A-A in FIG.
18 is a partition plate, 19 is a jack, and 8' is a vacuum exhaust valve; other symbols have the same meanings as those explained in FIG.
The figure shows a sectional view of only the processing chamber.
第２図及び第３図に示す装置を用いて被処理物
のプラズマ処理を行う場合には、処理装置内に設
置したレール１７上を台車に乗せて被処理物を移
動させ、タンクの開口部と仕切り板１８に設けた
穴の位置があつた時点で、台車に設けたジヤツキ
１９を上げることにより、穴の部分にタンクの開
口部が挿入されるようにタンクを位置せしめた後
プラズマ処理を行う。 When performing plasma processing on a workpiece using the apparatus shown in FIGS. 2 and 3, the workpiece is moved on a trolley on rails 17 installed in the processing apparatus, and the workpiece is moved through the opening of the tank. When the hole provided in the partition plate 18 is located, the tank is positioned by raising the jack 19 provided on the cart so that the opening of the tank is inserted into the hole, and then plasma treatment is performed. conduct.
板１８の穴と被処理物の開口部との間の隙間
は、ゴムシール等によりほゞ完全にシールしても
よいが、第４図に示すように、シール代１８′を
設け、この部分を大きくすれば、プラズマ化した
ガスは隙間を通過する際に失活するため、完全に
シールする必要はない。 The gap between the hole in the plate 18 and the opening of the object to be treated may be almost completely sealed with a rubber seal or the like, but as shown in FIG. If the gap is made larger, the plasma gas will be deactivated when passing through the gap, so it is not necessary to completely seal it.
またプラズマ化したガスが失活する距離が判明
している場合には、プラズマ化ガスシヤワー管と
仕切り部との距離を前記距離に合わせることによ
り、仕切りを省略することができる。 Furthermore, if the distance at which the plasma gas is deactivated is known, the partition can be omitted by adjusting the distance between the plasma gas shower tube and the partition part to the aforementioned distance.
また、仕切り板を設ける代りに、第５図に示す
ように板状の仕切り用治具１８″に被処理物１５
の開口部にはめこみうる接合部２０を設けた板を
開口部にはめ込んだ後、処理室に入れるようにし
てもよい。 Moreover, instead of providing a partition plate, as shown in FIG.
A plate provided with a joint 20 that can be fitted into the opening may be fitted into the opening and then placed into the processing chamber.
なお、２種類のガスの混合を少なくするために
は、真空排気用管とシヤワー管との相対位置を工
夫し各々のガスがまざらないようなガスの流れと
することが望ましい。 In order to reduce the mixing of the two types of gases, it is desirable to devise the relative positions of the evacuation pipe and the shower pipe so that the gases flow so that the respective gases do not mix.
以上説明した方法により被処理物をプラズマ処
理する場合において、夫々のプラズマ化ガスによ
る処理時間が異なる場合、一方のプラズマガスの
みを長時間導入し、他方は短時間導入するように
してもよい。 When subjecting a workpiece to plasma treatment using the method described above, if the processing times for each plasma gas are different, only one plasma gas may be introduced for a long time and the other plasma gas may be introduced for a short time.
なお、この場合、短時間導入するプラズマガス
の導入を停止し、一方のプラズマガスのみを送り
続ける場合、処理室内の圧力が変動し、処理効果
のバランスがくずれる恐れがあるので、短時間導
入するプラズマガスは、処理が終つた段階でジエ
ネレーターのみを停止しプラズマ化しないガスを
送り続けるのが好ましい。 In this case, if the introduction of the plasma gas that is introduced for a short time is stopped and only one plasma gas is continued to be sent, the pressure inside the processing chamber may fluctuate and the balance of the processing effect may be lost. As for the plasma gas, it is preferable to stop only the generator at the stage where the treatment is completed and continue to feed the gas that does not turn into plasma.
また、前記装置を使用して部分的に表面処理し
たい場合、処理したい面に面した方のみにプラズ
マ化したガスを導入し、処理を欲しない側にはプ
ラズマ化してないガスを導入することにより、処
理したい面のみを効率よくプラズマ処理すること
ができる。 In addition, if you want to partially treat the surface using the above device, you can introduce plasma gas only to the side facing the surface you want to treat, and introduce non-plasma gas to the side you don't want to treat. , it is possible to efficiently perform plasma treatment on only the surface to be treated.
第１図、第２図は本発明方法を説明するための
概略図、第３図は第２図のＡ−Ａ線における断面
図、第４図及び第５図は仕切板と開口部の接合状
態を示す図、第６図及び第７図は従来方法を説明
するための図である。
１，１′……ガスボンベ、４……処理室、５，
５′……真空ポンプ、１１，１１′……ジエネレー
ター、１３，１３′……導波管、１４，１４′……
プラズマガスシヤワー管、１５，１５′……被処
理物、１６……台車、１７……レール、１８……
仕切り板、１９……ジヤツキ。
Figures 1 and 2 are schematic diagrams for explaining the method of the present invention, Figure 3 is a sectional view taken along the line A-A in Figure 2, and Figures 4 and 5 are joints between the partition plate and the opening. The state diagrams, FIGS. 6 and 7, are diagrams for explaining the conventional method. 1,1'...Gas cylinder, 4...Processing chamber, 5,
5'...Vacuum pump, 11,11'...Generator, 13,13'...Waveguide, 14,14'...
Plasma gas shower tube, 15, 15'... object to be treated, 16... trolley, 17... rail, 18...
Partition plate, 19... Jyatsuki.
Claims (1)
する高分子材料製容器の内側に、液体注入口に挿
入したプラズマガスシヤワー管から液透過性を防
止する性質を付与しうるプラズマガスを、外側に
塗装・接着性を向上せしめる性質を付与しうるプ
ラズマガスを同時に供給することを特徴とする液
体注入口を有する高分子材料製容器のプラズマ処
理方法。1. In a plasma processing chamber, a plasma gas that can impart properties that prevent liquid permeability is applied to the inside of a polymer material container having a liquid injection port from a plasma gas shower tube inserted into the liquid injection port. A plasma processing method for a container made of a polymeric material having a liquid injection port, characterized in that a plasma gas capable of imparting properties that improve adhesiveness is simultaneously supplied.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27433284A JPS61155430A (en) | 1984-12-28 | 1984-12-28 | Plasma treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27433284A JPS61155430A (en) | 1984-12-28 | 1984-12-28 | Plasma treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61155430A JPS61155430A (en) | 1986-07-15 |
| JPH046214B2 true JPH046214B2 (en) | 1992-02-05 |
Family
ID=17540177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27433284A Granted JPS61155430A (en) | 1984-12-28 | 1984-12-28 | Plasma treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61155430A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3844151B2 (en) * | 1997-05-14 | 2006-11-08 | 凸版印刷株式会社 | Surface treatment equipment |
| DE102005029360B4 (en) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Two methods for continuous atmospheric pressure Plasma treatment of workpieces, in particular material plates or sheets |
| JP6224139B2 (en) * | 2016-01-22 | 2017-11-01 | 沖野 晃俊 | Plasma processing equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS515869A (en) * | 1974-07-02 | 1976-01-19 | Torao Tobisu | Ekitaino seidenjokasochi |
| JPS59126437A (en) * | 1983-01-07 | 1984-07-21 | Unitika Ltd | Low-temperature plasma treatment of sheet |
-
1984
- 1984-12-28 JP JP27433284A patent/JPS61155430A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61155430A (en) | 1986-07-15 |
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| JPS608048A (en) | Plasmic treatment | |
| JPH0120112Y2 (en) |