JPH0462171B2 - - Google Patents
Info
- Publication number
- JPH0462171B2 JPH0462171B2 JP57226519A JP22651982A JPH0462171B2 JP H0462171 B2 JPH0462171 B2 JP H0462171B2 JP 57226519 A JP57226519 A JP 57226519A JP 22651982 A JP22651982 A JP 22651982A JP H0462171 B2 JPH0462171 B2 JP H0462171B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- cracks
- tantalum
- tantalum oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
- Semiconductor Memories (AREA)
- Local Oxidation Of Silicon (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57226519A JPS59119734A (ja) | 1982-12-25 | 1982-12-25 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57226519A JPS59119734A (ja) | 1982-12-25 | 1982-12-25 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59119734A JPS59119734A (ja) | 1984-07-11 |
| JPH0462171B2 true JPH0462171B2 (de) | 1992-10-05 |
Family
ID=16846397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57226519A Granted JPS59119734A (ja) | 1982-12-25 | 1982-12-25 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59119734A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100468638C (zh) | 2001-12-18 | 2009-03-11 | 松下电器产业株式会社 | 半导体元件的制造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5325980B2 (de) * | 1972-07-12 | 1978-07-29 | ||
| JPS53108373A (en) * | 1977-03-04 | 1978-09-21 | Hitachi Ltd | Manufacture for semiconductor device |
-
1982
- 1982-12-25 JP JP57226519A patent/JPS59119734A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59119734A (ja) | 1984-07-11 |
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