JPH0463464A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0463464A
JPH0463464A JP17802090A JP17802090A JPH0463464A JP H0463464 A JPH0463464 A JP H0463464A JP 17802090 A JP17802090 A JP 17802090A JP 17802090 A JP17802090 A JP 17802090A JP H0463464 A JPH0463464 A JP H0463464A
Authority
JP
Japan
Prior art keywords
heat dissipation
semiconductor element
semiconductor device
heat
block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17802090A
Other languages
Japanese (ja)
Inventor
Yoshihiro Yamauchi
山内 義博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP17802090A priority Critical patent/JPH0463464A/en
Publication of JPH0463464A publication Critical patent/JPH0463464A/en
Pending legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、外部絶縁形の平形の半導体素子を圧接構造
にした半導体装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor device having an externally insulated flat semiconductor element in a press-contact structure.

[従来の技術1 従来、この種の半導体装置には第2図に示すようなもの
があった。
[Prior Art 1] Conventionally, there has been a semiconductor device of this type as shown in FIG.

第2図において、1は放熱フィン、2は平形の半導体素
子、3はこの半導体素子2を圧接挟持する放熱ブロック
であり、この放熱ブロック3はボルト4およびナツト5
で締め付けられ、半導体素子2を圧接している。6はば
ねであり、7は絶縁ブツシュ、8は絶縁板である。そし
て、これらはケース9内に収容され、さらに放熱フィン
1の所定の深さの溝1bに収容されている。1Qはブス
バである。11は前記絶縁板8と放熱フィン1の内壁と
の間にできた微少な隙間である。
In FIG. 2, 1 is a heat dissipation fin, 2 is a flat semiconductor element, and 3 is a heat dissipation block that holds the semiconductor element 2 in pressure contact.
is tightened to press the semiconductor element 2 into contact with the semiconductor element 2. 6 is a spring, 7 is an insulating bush, and 8 is an insulating plate. These are housed in a case 9, and further housed in grooves 1b of a predetermined depth of the radiation fins 1. 1Q is busba. Reference numeral 11 denotes a minute gap formed between the insulating plate 8 and the inner wall of the radiation fin 1.

次に、動作について説明する。Next, the operation will be explained.

半導体素子2は圧接する必要があるため、普通ばね6を
ボルト4.ナツト5.放熱ブロック3によって締め付け
て使用する。また、半導体素子2は通電特大量の熱を発
生するので、これをうま(外気中へ放熱する機構を設け
る必要がある。そのため、熱伝導の良好な絶縁板8を介
して放熱フィン1と密着しており、熱はこの絶縁板8か
ら放熱フィン1を通して外気中に放出される。また、取
り扱い上安全なように電気絶縁物であるケース9により
半導体素子2の陰極、陽極と通じるブスバ10以外は外
部と電気的に遮断された構造となっている。
Since the semiconductor element 2 needs to be pressed together, the spring 6 is usually attached to the bolt 4. Natsu 5. It is used by tightening with the heat radiation block 3. In addition, since the semiconductor element 2 generates a large amount of heat when it is energized, it is necessary to provide a mechanism to dissipate this heat into the outside air. The heat is released from this insulating plate 8 to the outside air through the radiation fins 1.In addition, for safe handling, a case 9, which is an electrical insulator, is used to prevent the bus bar 10, which communicates with the cathode and anode of the semiconductor element 2, from being connected. The structure is electrically isolated from the outside.

[発明が解決しようとする課題] 上記の外部絶縁形の半導体装置は、上記のように構成さ
れているが、半導体素子2の厚みのバラツキ、放熱ブロ
ック3の厚みのバラツキにより、放熱フィン1に設けら
れた満1bに半導体素子2を圧接した放熱ブロック3を
組み込んだ場合、満1bの内壁と放熱ブロック3.絶縁
板8の間に微少な隙間11ができ、そのため熱伝導がう
まく行かず、放熱が不十分となり、温度上昇のため半導
体素子2の特性を十分に発揮することができなかった。
[Problems to be Solved by the Invention] The externally insulated semiconductor device described above is configured as described above, but due to variations in the thickness of the semiconductor element 2 and variations in the thickness of the heat dissipation block 3, the heat dissipation fin 1 When the heat dissipation block 3 with the semiconductor element 2 pressed into contact with the provided base 1b is installed, the inner wall of the base 1b and the heat dissipation block 3. A minute gap 11 was formed between the insulating plates 8, which resulted in poor heat conduction, insufficient heat radiation, and an increase in temperature, which prevented the semiconductor element 2 from fully demonstrating its characteristics.

この発明は、上記のような問題点を解決するためになさ
れたものであり、放熱フィンに設けられた溝に放熱ブロ
ックが完全に密着するような構造にして放熱効率を飛躍
的に向上させた半導体装置を得ることを目的とする。
This invention was made to solve the above-mentioned problems, and has a structure in which the heat dissipation block is completely attached to the groove provided in the heat dissipation fin, thereby dramatically improving heat dissipation efficiency. The purpose is to obtain a semiconductor device.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体装置は、放熱フィンに、深くなる
に従って狭くなるような断面形状がv字状の溝を設ける
とともに、半導体素子を両側から圧接する放熱ブロック
にも、前記7字状の溝の傾斜と同じ傾斜を形成すること
により、両者を絶縁板を介して組み立てた時、必ず前記
7字状の溝の内壁に密着するように構成したものである
In the semiconductor device according to the present invention, the heat dissipation fin is provided with a groove having a V-shaped cross section that becomes narrower as it gets deeper, and the heat dissipation block that presses the semiconductor element from both sides is provided with the groove of the seven-shaped groove. By forming the same inclination as the inclination, when the two are assembled with an insulating plate interposed therebetween, the configuration is such that they always come into close contact with the inner wall of the 7-shaped groove.

[作用] この発明においては、放熱ブロック、絶縁板および放熱
フィンが完全に7字状の溝の内壁に密着する構成とした
ことにより、半導体素子の動作時に発生する熱はすみや
かに外気中へ放熱される。
[Function] In this invention, the heat dissipation block, insulating plate, and heat dissipation fin are configured to be in close contact with the inner wall of the figure-7 groove, so that the heat generated during the operation of the semiconductor element is quickly dissipated into the outside air. be done.

[実施例] 以下、この発明の一実施例を第1図について説明する。[Example] An embodiment of the present invention will be described below with reference to FIG.

第1図において、1は放熱フィンであり、1aはこの放
熱フィン1に形成された溝で、この溝1aは深さが深く
なるに従って狭くなる断面V字状に形成されている。ま
た、放熱ブロック3は放熱フィン1に設けた7字状の満
1aの傾斜に等しい傾斜が外側に形成されている。なお
、その他は第2図と同様な構成となっている。
In FIG. 1, 1 is a heat radiation fin, and 1a is a groove formed in the heat radiation fin 1. The groove 1a is formed in a V-shaped cross section that becomes narrower as the depth increases. Further, the heat dissipation block 3 is formed on the outside with an inclination equal to the inclination of the figure 7 shape 1a provided on the heat dissipation fins 1. The rest of the configuration is the same as that shown in FIG. 2.

次に、動作について説明する。Next, the operation will be explained.

半導体素子2と放熱ブロック3をポルト4とナツト5に
よりばね6を介して締め付けた組立物は、半導体素子2
と放熱ブロック3の厚みのバラツキに応じたバラツキを
持ったものとなる。
The assembly in which the semiconductor element 2 and the heat dissipation block 3 are tightened by the port 4 and the nut 5 via the spring 6 is the semiconductor element 2.
and has a variation corresponding to the variation in the thickness of the heat dissipation block 3.

しかし、放熱フィン1に設けた7字状の溝1aは放熱ブ
ロック3と同様なテーパを有しているので、前記組立物
の厚みが大きい場合は上方へ、また、厚みが小さい場合
は下方ヘシフトするだけであり、放熱ブロック3と放熱
フィン1の溝1aの内壁とはいつも絶縁板8を介して完
全に密着していることになる。
However, since the 7-shaped groove 1a provided in the heat dissipation fin 1 has a taper similar to that of the heat dissipation block 3, it shifts upward when the thickness of the assembly is large, and downward when the thickness is small. Therefore, the heat radiation block 3 and the inner wall of the groove 1a of the heat radiation fin 1 are always in complete contact with the insulating plate 8 interposed therebetween.

そのため、半導体素子2の動作時に発生する熱は効率よ
く放熱ブロック3から絶縁板8を通り放熱フィン1に伝
達され、外気中へ放散される。
Therefore, the heat generated during the operation of the semiconductor element 2 is efficiently transmitted from the heat radiation block 3 to the heat radiation fin 1 through the insulating plate 8, and is radiated into the outside air.

なお、上記実施例では半導体素子2が1個の場合を示し
たが、2個以上であってもよ(、上記実施例と同様の効
果を奏する。
In addition, although the case where the number of the semiconductor elements 2 is one was shown in the said Example, it is possible to have two or more (The same effect as the said Example is produced).

[発明の効果1 以上説明したように、この発明は、放熱フィンに設けら
れる溝を、その深さが深くなるに従って狭くなるような
断面形状を7字状に形成するとともに、放熱ブロックに
も7字状の溝の傾斜と同じ傾斜を形成したので、半導体
素子と放熱ブロックを組み合わせたとき、多少の寸法の
バラツキがあっても必ず熱伝導性の良好な絶縁板を介し
て7字状の溝の内壁面に密着する。したがって、常に良
好な放熱が実現でき、半導体素子の特性を十分発揮する
ことができる半導体装置が得られる効果がある。
[Advantageous Effects of the Invention 1] As explained above, in the present invention, the grooves provided in the heat dissipation fins are formed in a cross-sectional shape that becomes narrower as the depth becomes deeper, and the grooves are also formed in the heat dissipation block. Since the slope is the same as that of the 7-shaped groove, when the semiconductor element and the heat dissipation block are combined, even if there are slight variations in dimensions, the 7-shaped groove will always be formed through the insulating plate with good thermal conductivity. Closely adheres to the inner wall surface of the Therefore, there is an effect that good heat dissipation can always be realized and a semiconductor device can be obtained that can fully exhibit the characteristics of the semiconductor element.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例による半導体装置を示す断
面図、第2図は従来の半導体装置を示す断面図である。 図において、1は放熱フィン、1aは溝、2は半導体素
子、3は放熱ブロック、4はボルト、5はナツト、6は
ばね、7は絶縁ブツシュ、8は絶縁板、9はケース、1
oはブスバである。 なお、各図中の同一符号は同一または相当部分を示す。
FIG. 1 is a sectional view showing a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional semiconductor device. In the figure, 1 is a heat radiation fin, 1a is a groove, 2 is a semiconductor element, 3 is a heat radiation block, 4 is a bolt, 5 is a nut, 6 is a spring, 7 is an insulating bushing, 8 is an insulating plate, 9 is a case, 1
o is busba. Note that the same reference numerals in each figure indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】[Claims]  放熱フィンに設けられた溝内に、平形の半導体素子を
放熱ブロックで圧接挟持して収容した外部絶縁形の半導
体装置において、前記放熱フィンに設けられる溝を、そ
の深さが深くなるに従って狭くなるように断面形状をV
字状に形成するとともに、前記放熱ブロックにも前記V
字状の溝の傾斜と同じ傾斜を形成したことを特徴とする
半導体装置。
In an externally insulated semiconductor device in which a flat semiconductor element is held and held under pressure by a heat radiation block in a groove provided in a heat radiation fin, the groove provided in the radiation fin becomes narrower as the depth thereof becomes deeper. The cross-sectional shape is V
The heat dissipation block also has the V shape.
A semiconductor device characterized by forming an inclination that is the same as that of a letter-shaped groove.
JP17802090A 1990-07-03 1990-07-03 Semiconductor device Pending JPH0463464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17802090A JPH0463464A (en) 1990-07-03 1990-07-03 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17802090A JPH0463464A (en) 1990-07-03 1990-07-03 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0463464A true JPH0463464A (en) 1992-02-28

Family

ID=16041175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17802090A Pending JPH0463464A (en) 1990-07-03 1990-07-03 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0463464A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007192901A (en) * 2006-01-17 2007-08-02 Fuji Xerox Co Ltd Fixing device
WO2024204310A1 (en) * 2023-03-31 2024-10-03 三菱電機株式会社 Semiconductor device, power conversion device, inverter substrate, and heat dissipation fin

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007192901A (en) * 2006-01-17 2007-08-02 Fuji Xerox Co Ltd Fixing device
WO2024204310A1 (en) * 2023-03-31 2024-10-03 三菱電機株式会社 Semiconductor device, power conversion device, inverter substrate, and heat dissipation fin
JPWO2024204310A1 (en) * 2023-03-31 2024-10-03

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