JPH0464242A - Packaging construction of optical semiconductor device - Google Patents
Packaging construction of optical semiconductor deviceInfo
- Publication number
- JPH0464242A JPH0464242A JP2178270A JP17827090A JPH0464242A JP H0464242 A JPH0464242 A JP H0464242A JP 2178270 A JP2178270 A JP 2178270A JP 17827090 A JP17827090 A JP 17827090A JP H0464242 A JPH0464242 A JP H0464242A
- Authority
- JP
- Japan
- Prior art keywords
- package
- optical semiconductor
- layer
- carrier
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Die Bonding (AREA)
- Led Device Packages (AREA)
Abstract
Description
【発明の詳細な説明】
(概要]
光半導体素子の実装構造、特に近年小型化が進んでいる
、光ファイバを用いた光伝送システムパッケージ内にお
ける光半導体素子の実装に適する実装構造に関し、
金めつき等の表面処理を必要とせず、かつ溶接性、冷却
能にすくれ、安価な光半導体素子の実装構造を実現する
ことを目的とし、
光半導体素子を搭載し、パッケージに取り付けるための
キャリヤであって、
該キャリヤが、パッケージ側と光半導体素子側との2層
構造となっており、
パッケージ側の層は、パッケージとの溶接性にすぐれた
材料から成り、光半導体素子側の層は、熱伝導性にすぐ
れた材料から成っているように構成する。[Detailed Description of the Invention] (Summary) The present invention relates to a mounting structure for an optical semiconductor element, particularly a mounting structure suitable for mounting an optical semiconductor element in an optical transmission system package using optical fibers, which has been miniaturized in recent years. This is a carrier for mounting optical semiconductor elements and attaching them to a package, with the aim of realizing an inexpensive mounting structure for optical semiconductor elements that does not require surface treatment such as surface treatment, has excellent weldability and cooling performance, and is suitable for mounting optical semiconductor elements and attaching them to packages. The carrier has a two-layer structure on the package side and the optical semiconductor element side, the layer on the package side is made of a material that has excellent weldability with the package, and the layer on the optical semiconductor element side is It is made of a material with excellent thermal conductivity.
本発明は、光半導体素子の実装構造、特に近年小型化が
進んでいる、光ファイバを用いた光伝送システムパッケ
ージ内における光半導体素子の実装に適する実装構造に
関する。The present invention relates to a mounting structure for an optical semiconductor element, and particularly to a mounting structure suitable for mounting an optical semiconductor element within an optical transmission system package using optical fibers, which has become increasingly compact in recent years.
第4図は従来の光半導体素子の実装構造を示す断面図で
ある。1は金属製のパッケージであり、その中に、キャ
リヤ2を介して光半導体素子3が搭載されている。光半
導体素子3には、パッケージ1を貫通している光ファイ
バ4が接続されている。また、光半導体素子3と電気的
な接続を行なうための端子5が挿通されている。光ファ
イバ4および端子5の挿通部は、低融点ガラスなどによ
って気密シールされている。FIG. 4 is a sectional view showing the mounting structure of a conventional optical semiconductor element. Reference numeral 1 denotes a metal package, in which an optical semiconductor element 3 is mounted via a carrier 2. An optical fiber 4 passing through the package 1 is connected to the optical semiconductor element 3 . Further, a terminal 5 for electrical connection with the optical semiconductor element 3 is inserted. The insertion portions of the optical fiber 4 and the terminal 5 are hermetically sealed with low melting point glass or the like.
光半導体素子3は、キャリヤ2上にグイボンディングさ
れているが、キャリヤ2は、光半導体素子3の温度上昇
を考慮し、熱伝導率の高い銅ないし銅合金が用いられる
。The optical semiconductor element 3 is bonded onto the carrier 2, and the carrier 2 is made of copper or a copper alloy having high thermal conductivity in consideration of the temperature rise of the optical semiconductor element 3.
また、このようなCu合金製のキャリヤ2とパッケージ
1との接合には、一般にはんだ付けが用いられている。Moreover, soldering is generally used to join the carrier 2 made of a Cu alloy and the package 1.
ところが、はんだ付けでは、はんだが軟質なために、ク
リープによる光ファイバ4の光軸ずれが発生しやすく、
長期信顛性の点で問題があった。However, in soldering, since the solder is soft, the optical axis of the optical fiber 4 is easily misaligned due to creep.
There were problems with long-term reliability.
そこで、はんだ付けに代わる固定方法として、第5図に
示すように、レーザ溶接が用いられている。2はキャリ
ヤであり、金めつき層6で覆われている。またパッケー
ジl側も必要に応して金めっきされる。このキャリヤ2
と鉄系合金のパッケージ1との間が、レーザ光を照射す
ることにより、1000℃以上の高温で接合されている
。Therefore, as a fixing method instead of soldering, laser welding is used as shown in FIG. 2 is a carrier, which is covered with a gold plating layer 6. The package L side is also plated with gold if necessary. This carrier 2
and the iron-based alloy package 1 are bonded together at a high temperature of 1000° C. or higher by irradiating laser light.
接合を行う箇所が多いことから、キャリヤ2およびパッ
ケージ1の双方に、接合性にすぐれたAuめっきなどの
表面処理が施しである。したがって、通常の溶接方法で
は、溶接部に微量のAuが混入して溶湯の凝固温度幅を
著しく増大させ、その結果溶接部7において、凝固時に
クランク8が発生する。あるいは、キャリヤ2の材質が
、熱伝導率の高いCuであることから、溶接部7が放熱
されて温度が上がらず、充分な溶込み深さが得られない
ために、溶接強度が低下するといった問題が生した。Since there are many places to be bonded, both the carrier 2 and the package 1 are subjected to surface treatment such as Au plating, which has excellent bonding properties. Therefore, in the normal welding method, a small amount of Au is mixed into the welded part, significantly increasing the solidification temperature range of the molten metal, and as a result, a crank 8 is generated in the welded part 7 during solidification. Alternatively, since the material of the carrier 2 is Cu, which has high thermal conductivity, heat is radiated from the welding part 7 and the temperature does not rise, making it impossible to obtain a sufficient penetration depth, resulting in a decrease in welding strength. A problem arose.
そこで従来は、このクラックを防止し、かつ充分な溶込
み深さを得る方法として、クラックの原因となる金が溶
接部に混入しないように、被溶接箇所の金めつき層を機
械加工により研削する方法、あるいは化学的に剥離する
などの方法、部分めっきなどの処理を行った後溶接する
方法、また新しい手法として、被溶接部にCu−Ni−
Auシートを挿入して溶接することが行なわれていた。Conventionally, as a method to prevent this cracking and obtain a sufficient penetration depth, the gold-plated layer at the welded area was mechanically ground to prevent the gold that would cause cracks from getting into the welded area. There are methods such as chemical stripping, methods such as partial plating and then welding, and new methods such as Cu-Ni-
Conventionally, an Au sheet was inserted and welded.
しかしながら、これらの方法では、Auめっきを取り除
くための工程が必要なだけでな(、剥離のためにエツチ
ングや研削などを行うと、エツチング液残渣による腐食
や部品の寸法精度が低下するなどの欠点が生じていた。However, these methods not only require a step to remove the Au plating (but also have drawbacks such as corrosion due to etching solution residue and reduced dimensional accuracy of parts when etching or grinding is performed to remove the Au plating). was occurring.
また、Au−Ni−Cuシートを挿入する手法も、挿入
や位置合わせ等の工程が増えるため、自動化の妨げとな
り、生産性に欠ける。Furthermore, the method of inserting the Au-Ni-Cu sheet also requires additional steps such as insertion and positioning, which hinders automation and lacks productivity.
本発明の技術的課題は、このような問題に着目し、金め
つき等の表面処理を必要とせず、かつ溶接性、冷却能に
すぐれ、安価な光半導体素子の実装構造を実現すること
を目的とする。The technical problem of the present invention is to address these problems and to realize an inexpensive mounting structure for optical semiconductor elements that does not require surface treatment such as gold plating, has excellent weldability and cooling ability, and is inexpensive. purpose.
(課題を解決するための手段)
(1) 第1図は本発明による光半導体素子の実装構
造の基本原理を説明する側面図である。9は本発明によ
るキャリヤであり、2層構造になっている。すなわち、
パッケージl側の層9pと、光半導体素子3側の層9t
との2層から成っている。(Means for Solving the Problems) (1) FIG. 1 is a side view illustrating the basic principle of the mounting structure of an optical semiconductor element according to the present invention. 9 is a carrier according to the present invention, which has a two-layer structure. That is,
A layer 9p on the package l side and a layer 9t on the optical semiconductor element 3 side
It consists of two layers.
しかもパッケージl側の層9pは、パッケージ1との溶
接性にすぐれた材料から成り、光半導体素子3側の層9
tは、熱伝導性にすぐれた材料から成っている。Moreover, the layer 9p on the package l side is made of a material that has excellent weldability with the package 1, and the layer 9p on the optical semiconductor element 3 side
t is made of a material with excellent thermal conductivity.
(2)光半導体素子3側の層9tは銅(Cu)ないし銅
合金からなっており、パッケージ1側の層9pはニッケ
ル(Ni)ないしニッケル合金からなっている。(2) The layer 9t on the optical semiconductor element 3 side is made of copper (Cu) or a copper alloy, and the layer 9p on the package 1 side is made of nickel (Ni) or a nickel alloy.
そして、ニッケルないしニッケル合金から成る層9pと
銅ないし銅合金から成る層9tとの2層構造は、粉末冶
金法によって一体作製されている。The two-layer structure of the layer 9p made of nickel or a nickel alloy and the layer 9t made of copper or a copper alloy is integrally manufactured by a powder metallurgy method.
(1)本発明のキャリヤ9は、パッケージ1側のN9p
が、パッケージ1との溶接性にすぐれた材質から成って
いるため、キャリヤ9とパッケージ1との溶接が確実に
かつ容易に行なわれる。(1) The carrier 9 of the present invention is N9p on the package 1 side.
Since the carrier 9 and the package 1 are made of a material that has excellent weldability with the package 1, welding between the carrier 9 and the package 1 can be performed reliably and easily.
また、光半導体素子3側の層9tは、熱伝導性にすぐれ
た材質から成っているので、光半導体素子3が効果的に
放熱される。Further, since the layer 9t on the side of the optical semiconductor element 3 is made of a material with excellent thermal conductivity, heat from the optical semiconductor element 3 is effectively dissipated.
(2)通常、パッケージ1として、SUSなどの鉄系材
料が多用されている。そのため、キャリヤ9のパッケー
ジ1側の層9pが、NiないしNi合金から成り、光半
導体素子3例の層9tがCuないしCu合金からなって
いる。その結果、キャリヤ9とパッケージ1との接合は
、NiないしNi合金と鉄系合金のパッケージ1との溶
接となり、光半導体素子3とキャリヤ9との接合は、C
uないしCu合金と光半導体素子3とのボンディングと
なる。(2) Usually, iron-based materials such as SUS are often used for the package 1. Therefore, the layer 9p of the carrier 9 on the package 1 side is made of Ni or a Ni alloy, and the layer 9t of the three optical semiconductor devices is made of Cu or a Cu alloy. As a result, the carrier 9 and the package 1 are joined by welding the package 1 made of Ni or Ni alloy and the iron-based alloy, and the optical semiconductor element 3 and the carrier 9 are joined by welding with the package 1 made of Ni or Ni alloy and iron-based alloy.
This results in bonding between the u or Cu alloy and the optical semiconductor element 3.
Fe系合金のパッケージ1とNiないしNi合金とは溶
接性にすぐれ、またNiは熱伝導率が低いため熱が逃げ
にくく、充分に高い溶接温度が得られ、Auめっきなど
の処理を必要とせずに、確実に溶接できる。Fe-based alloy package 1 and Ni or Ni alloy have excellent weldability, and since Ni has low thermal conductivity, heat does not easily escape, a sufficiently high welding temperature can be obtained, and treatments such as Au plating are not required. It can be welded reliably.
一方、光半導体素子3側の層9tは、Cuからなってい
るため、光半導体素子3の冷却能にすくれている。On the other hand, since the layer 9t on the side of the optical semiconductor element 3 is made of Cu, it has insufficient cooling ability for the optical semiconductor element 3.
特に、ニッケルないしニッケル合金から成る層9pと銅
ないし銅合金から成る層9tを有する2層構造のキャリ
ヤ9を、粉末冶金法を用いて作製した場合、光半導体素
子3側の層9tとパッケージ1側の層9pとの間の組成
が徐々に変化する。そのため、2つの層9p、9tとの
間の接合強度が充分となる。In particular, when a two-layer carrier 9 having a layer 9p made of nickel or a nickel alloy and a layer 9t made of copper or a copper alloy is produced using a powder metallurgy method, the layer 9t on the optical semiconductor element 3 side and the package 1 The composition between the layer 9p and the side layer 9p gradually changes. Therefore, the bonding strength between the two layers 9p and 9t becomes sufficient.
[実施例]
次に本発明による光半導体素子の実装構造が実際上どの
ように具体化されるかを実施例で説明する。第1図に示
す光半導体素子3側の層9tとパッケージ1側の層9ρ
との間は、両者間の接合強度の観点から、組成が徐々に
変化していることが望ましい。ゆるやかな組成変化を得
るには、例えば粉末冶金法を用いて作製するのが適して
いる。[Example] Next, how the mounting structure of an optical semiconductor element according to the present invention is actually implemented will be explained using an example. A layer 9t on the optical semiconductor element 3 side and a layer 9ρ on the package 1 side shown in FIG.
From the viewpoint of bonding strength between the two, it is desirable that the composition changes gradually. In order to obtain a gradual change in composition, it is suitable to produce the material using, for example, a powder metallurgy method.
すなわち、Niの粉末とCuの粉末を、徐々に組成が変
化するように型に充填し、圧粉成形後焼結して作製する
。That is, Ni powder and Cu powder are filled into a mold so that the composition gradually changes, and the mold is compacted and then sintered.
次に粉末冶金法によるキャリヤの製造方法を例示する。Next, a method for manufacturing a carrier using a powder metallurgy method will be illustrated.
第1図に示すようにNiから成る、パッケージ1側の層
9pの上に、Cuから成る光半導体素子3側の層9tを
積層したキャリヤ構造とする場合、金型中において、上
側に純度99%、−325メツシユのCu粉末を、下側
に純度99%、−325メツシユのNi粉末をそれぞれ
配置し、5 xlOxlOrIlIm)の圧粉体を作製
した。この圧粉体を焼結温度900°C1焼結時間1h
の条件で真空中で焼結した。As shown in FIG. 1, when forming a carrier structure in which a layer 9t on the optical semiconductor element 3 side made of Cu is laminated on a layer 9p on the package 1 side made of Ni, the purity 99 % and -325 mesh, and Ni powder with a purity of 99% and -325 mesh were placed on the lower side, respectively, to produce a green compact of 5xlOxlOrIlIm). This green compact is sintered at a temperature of 900°C and a sintering time of 1 hour.
It was sintered in vacuum under the following conditions.
このように粉末冶金法によって成型すれば、第2図に示
すように、光半導体素子3側の層9tとパッケージ1側
の層9pとの間における組成が順次変化する。すなわち
、銅とニッケルとの比率が徐々に変化している。When molding is performed by powder metallurgy in this manner, the composition between the layer 9t on the optical semiconductor element 3 side and the layer 9p on the package 1 side changes sequentially, as shown in FIG. That is, the ratio of copper to nickel is gradually changing.
このようにして作製したキャリヤ9に、光半導体素子3
をダイボンディングし、このキャリヤ9をパッケージ(
42アロイ合金性、Ni表面処理)中に搭載する。すな
わち、パッケージ1とキャリヤ9との突き合わせ部に対
して、端面からレーザ照射し、キャリヤ9の周りを、4
〜6箇所程度スボント溶接した。溶接に用いたレーザは
Nd−YAGレーザであり、溶接条件はパルス幅2ms
、焦点はずし量Omm、照射エネルギー1パルスあたり
5〜20J、レンズ焦点距離100mm、シールドガス
はAr、ガス圧力1.5kg/c11N、ガス流量30
1 /rRinであった。The optical semiconductor element 3 is placed on the carrier 9 produced in this way.
die bonding and package this carrier 9 (
42 alloy, Ni surface treatment). That is, the abutting portion of the package 1 and carrier 9 is irradiated with a laser from the end face, and the area around the carrier 9 is irradiated with a laser beam.
Spont welding was performed at about 6 locations. The laser used for welding was a Nd-YAG laser, and the welding conditions were a pulse width of 2 ms.
, defocus amount Omm, irradiation energy 5 to 20 J per pulse, lens focal length 100 mm, shielding gas is Ar, gas pressure 1.5 kg/c11N, gas flow rate 30
1/rRin.
その結果、キャリヤ9とパッケージ1の接合部は、キャ
リヤ9側およびパッケージ1側ともに深(まで熔融する
ため、第3図に示すように良好な溶接形状を呈し、第5
図に示すようなAuめっき表面処理部材の接合の際に生
じたクラックは認められない。As a result, the joint between the carrier 9 and the package 1 is melted to a deep depth on both the carrier 9 side and the package 1 side, so that it exhibits a good welded shape as shown in FIG.
No cracks were observed that occurred during the joining of the Au-plated surface-treated members as shown in the figure.
すなわち、キャリヤ9のパッケージ1例の部分9pは、
熱伝導率の低いNi (熱伝導率: 0.21cal/
g・deg)から成っているため、熱が逃げに((充
分に温度が上昇し、容易にかつ確実に溶接される。That is, the portion 9p of one example of the package of the carrier 9 is
Ni with low thermal conductivity (thermal conductivity: 0.21 cal/
g・deg), the heat can be dissipated ((temperature rises sufficiently and welding can be performed easily and reliably).
また、光半導体素子3と接合する面は、熱伝導率の高い
Cu (熱伝導率: 0.94cal/ g −deg
)であることから、高い冷却能が実現できる。しかも、
Cu、Niとも、接合部材との接合性は高いので、Au
めっき等の表面処理を必要としない。Further, the surface to be bonded to the optical semiconductor element 3 is made of Cu having high thermal conductivity (thermal conductivity: 0.94 cal/g-deg
), high cooling performance can be achieved. Moreover,
Both Cu and Ni have high bonding properties with the bonding member, so Au
No surface treatment such as plating is required.
光半導体素子3とキャリヤ9との間は、Au系ろう材を
用いてダイボンディングした。金糸のろう材として、A
uGeやAuSiなどが用いられる。キャリヤ9の光半
導体素子取り付は面は、Auめっきを行なってもよい。Die bonding was performed between the optical semiconductor element 3 and the carrier 9 using an Au-based brazing material. As a brazing material for gold thread, A
uGe, AuSi, etc. are used. The surface of the carrier 9 on which the optical semiconductor element is mounted may be plated with Au.
なお、光半導体素子3は、発光素子であっても、受光素
子であってもよい。Note that the optical semiconductor element 3 may be a light emitting element or a light receiving element.
以上のように本発明によれば、光半導体素子3を搭載す
るキャリヤ9が2層構造となっており、しかもパッケー
ジ1側の層9pは、パッケージ1との溶接性にすぐれた
材質から成っているため、パッケージ1とキャリヤ9と
の溶接が確実となり、クラックなどが発生することな(
、充分な溶接強度が得られる。また、光半導体素子3側
の層9tは、熱伝導性にすぐれた材質から成っているの
で、光半導体素子−3から発生した熱が効果的に放散す
る。As described above, according to the present invention, the carrier 9 on which the optical semiconductor element 3 is mounted has a two-layer structure, and the layer 9p on the package 1 side is made of a material that has excellent weldability with the package 1. Therefore, the welding between the package 1 and the carrier 9 is ensured, and cracks etc. do not occur (
, sufficient welding strength can be obtained. Furthermore, since the layer 9t on the side of the optical semiconductor element 3 is made of a material with excellent thermal conductivity, the heat generated from the optical semiconductor element-3 is effectively dissipated.
さらに、光半導体素子3側の層9tを銅ないし銅合金で
構成し、パッケージ1側の層9pをニッケルないしニッ
ケル合金で構成するとともに、粉末冶金法によって成型
すれば、2層構造にも係わらず、強度にすぐれたキャリ
ヤが得られる。特別な処理も必要ないので、安価に製造
できる。Furthermore, if the layer 9t on the optical semiconductor element 3 side is made of copper or a copper alloy, and the layer 9p on the package 1 side is made of nickel or a nickel alloy, and if they are molded by powder metallurgy, even though it has a two-layer structure, , a carrier with excellent strength can be obtained. Since no special treatment is required, it can be manufactured at low cost.
パッケージ1も、表面処理は必ずしも必要ではなく、た
とえ行なうとしても、従来の高価なAuめっきに代わっ
てNiめっきで代用できるので、経済的に優れ、コスト
ダウンが可能となる。The package 1 also does not necessarily require surface treatment, and even if surface treatment is performed, Ni plating can be substituted for the conventional expensive Au plating, which is economically advantageous and enables cost reduction.
第1図は本発明による光半導体素子の実装構造の基本原
理を説明する側面図、
第2図は2層構造のキャリヤにおける組成変化を示す図
、
第3図は本発明のキャリヤとパッケージとの溶接部を示
す拡大断面図、
第4図は従来の光半導体素子の実装構造を示す断面図、
第5図は従来のキャリヤとパッケージとの溶接部を示す
拡大断面図である。
図において、1はパッケージ、2は従来のキでリヤ、3
は光半導体素子、4は光ファイバ、5は端子、6はAu
めっき部、7は溶接部、8はクランク、9は本発明によ
るキャリヤ、9tは光半導体素子側の層、9pはパッケ
ージ側の層をそれぞれ示す。
本発明ω基本原理
第1図
特許出願人 富士通株式会社
復代理人 弁理士 福 島 康 文
第2図
lパ・フワーミ;゛FIG. 1 is a side view illustrating the basic principle of the mounting structure of an optical semiconductor device according to the present invention, FIG. 2 is a diagram showing compositional changes in a carrier with a two-layer structure, and FIG. 3 is a diagram showing the relationship between the carrier and package of the present invention. FIG. 4 is an enlarged sectional view showing a welded part. FIG. 4 is a sectional view showing a conventional mounting structure of an optical semiconductor element. FIG. 5 is an enlarged sectional view showing a conventional welded part between a carrier and a package. In the figure, 1 is the package, 2 is the conventional key rear, and 3 is the package.
is an optical semiconductor element, 4 is an optical fiber, 5 is a terminal, 6 is Au
A plating part, 7 a welding part, 8 a crank, 9 a carrier according to the present invention, 9t a layer on the optical semiconductor element side, and 9p a layer on the package side, respectively. Basic Principles of the Present Invention Fig. 1 Patent Applicant Fujitsu Limited Sub-Agent Patent Attorney Yasushi Fukushima Fig. 2
Claims (1)
取り付けるためのキャリヤ(9)であって、 該キャリヤ(9)が、パッケージ(1)側と光半導体素
子(3)側との2層構造となっており、 パッケージ(1)側の層(9p)は、パッケージ(1)
との溶接性にすぐれた材料から成り、光半導体素子(3
)側の層(9t)は、熱伝導性にすぐれた材料から成っ
ていることを特徴とする光半導体素子の実装構造。 2、請求項1記載のキャリヤ(9)において、パッケー
ジ(1)側の層(9p)はニッケルないしニッケル合金
から成り、光半導体素子(3)側の層(9t)は銅ない
し銅合金から成っており、 ニッケルないしニッケル合金と銅ないし銅合金とから成
る2層構造は、粉末冶金法によって一体作製されたもの
であることを特徴とする光半導体素子の実装構造。[Claims] 1. A carrier (9) for mounting an optical semiconductor element (3) and attaching it to the package (1), wherein the carrier (9) is connected to the package (1) side and the optical semiconductor element. It has a two-layer structure with the package (1) side and the package (1) side layer (9p).
It is made of a material that has excellent weldability with optical semiconductor devices (3
) side layer (9t) is made of a material with excellent thermal conductivity. 2. In the carrier (9) according to claim 1, the layer (9p) on the package (1) side is made of nickel or a nickel alloy, and the layer (9t) on the optical semiconductor element (3) side is made of copper or a copper alloy. A mounting structure for an optical semiconductor element, wherein the two-layer structure consisting of nickel or a nickel alloy and copper or a copper alloy is integrally manufactured by a powder metallurgy method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2178270A JPH0464242A (en) | 1990-07-04 | 1990-07-04 | Packaging construction of optical semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2178270A JPH0464242A (en) | 1990-07-04 | 1990-07-04 | Packaging construction of optical semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0464242A true JPH0464242A (en) | 1992-02-28 |
Family
ID=16045547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2178270A Pending JPH0464242A (en) | 1990-07-04 | 1990-07-04 | Packaging construction of optical semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0464242A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04108402A (en) * | 1990-08-29 | 1992-04-09 | Achilles Corp | Manufacture of injection molding shoe |
-
1990
- 1990-07-04 JP JP2178270A patent/JPH0464242A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04108402A (en) * | 1990-08-29 | 1992-04-09 | Achilles Corp | Manufacture of injection molding shoe |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6444489B1 (en) | Semiconductor chip assembly with bumped molded substrate | |
| US5329159A (en) | Semiconductor device employing an aluminum clad leadframe | |
| US5046971A (en) | Terminal pins for flexible circuits | |
| GB2332573A (en) | A method for producing a fuse element | |
| JP3432988B2 (en) | Metal lid substrate for electronic component package and method of manufacturing metal lid | |
| JP3409781B2 (en) | Method for manufacturing optical semiconductor module | |
| EP0098176A2 (en) | The packaging of semiconductor chips | |
| JP2009016794A (en) | Capless package and manufacturing method thereof | |
| JP4572984B2 (en) | Laser welding structure and laser welding method | |
| JPH0464242A (en) | Packaging construction of optical semiconductor device | |
| JP3724028B2 (en) | Metal containers and packages | |
| JPWO2003010867A1 (en) | Optical semiconductor module and manufacturing method thereof | |
| JP2006269970A (en) | Method for soldering electronic parts | |
| CN117690900A (en) | A ceramic packaging substrate structure | |
| JP5206399B2 (en) | Laser apparatus and manufacturing method thereof | |
| KR100543385B1 (en) | Electronic component package and manufacturing method thereof | |
| JP3766589B2 (en) | Optical semiconductor element storage package | |
| JP2004055580A (en) | Lid for sealing electronic component packages | |
| CN114823942B (en) | Semiconductor packaging structure and packaging method | |
| JP4025612B2 (en) | Optical semiconductor element storage package and optical semiconductor device | |
| JP3825337B2 (en) | Optical semiconductor element storage package and optical semiconductor device | |
| JP2004134557A (en) | Hermetic seal cap | |
| JP3279158B2 (en) | Surface acoustic wave device | |
| JP4497762B2 (en) | Optical semiconductor element storage package and optical semiconductor device | |
| JPH05145004A (en) | Method for manufacturing semiconductor device |