JPH0464460B2 - - Google Patents

Info

Publication number
JPH0464460B2
JPH0464460B2 JP24553885A JP24553885A JPH0464460B2 JP H0464460 B2 JPH0464460 B2 JP H0464460B2 JP 24553885 A JP24553885 A JP 24553885A JP 24553885 A JP24553885 A JP 24553885A JP H0464460 B2 JPH0464460 B2 JP H0464460B2
Authority
JP
Japan
Prior art keywords
metal plate
semi
substrate
lead frame
piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP24553885A
Other languages
Japanese (ja)
Other versions
JPS62104041A (en
Inventor
Mitsuhiro Ishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP24553885A priority Critical patent/JPS62104041A/en
Publication of JPS62104041A publication Critical patent/JPS62104041A/en
Publication of JPH0464460B2 publication Critical patent/JPH0464460B2/ja
Granted legal-status Critical Current

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  • Die Bonding (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、基板にリードフレーム及び半導体
チツプを接着した、ワイヤボンデイング工程前の
半製品状態のガラス封止形半導体装置の製造装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for manufacturing a glass-sealed semiconductor device in a semi-finished state before a wire bonding process, in which a lead frame and a semiconductor chip are bonded to a substrate.

〔従来の技術〕[Conventional technology]

デユアルインライン(DIL)形半導体集積回路
など、ガラス封止形半導体装置の半導体チツプを
ボイデイングするまでの構成部材を、第5図に分
解図で示す。1はセラミツクなど絶縁材からなる
基板で、上面の中央にキヤビテイ1aが設けら
れ、このキヤビテイ1aの中央部と他の上面全体
とに接着用ガラス(封止ガラス)2が塗布されて
いる。3は基板1上に接着用ガラス2で接着され
るリードフレーム、4はキヤビテイ1aに接着用
ガラス2で接着される金属板で、銀板などからな
る。5はこの金属板上の端部にはんだ接合される
接地端子用小片(以下「端子用小片」と称する)
で、第8図に示す素材から形成される。図におい
て、6は42アロイ材6aを母材とし、表面にアル
ミ材6bを、裏面にはんだ材6cを結合してなる
三層金属合板材で、テープ状になつている。この
三層金属合板材6から鎖線で示す小円形に打抜
き、第9図に拡大図で示す端子用小片5が形成さ
れる。
FIG. 5 shows an exploded view of the constituent members of a glass-sealed semiconductor device, such as a dual-in-line (DIL) semiconductor integrated circuit, until the semiconductor chip is voided. Reference numeral 1 denotes a substrate made of an insulating material such as ceramic, and a cavity 1a is provided at the center of the upper surface, and an adhesive glass (sealing glass) 2 is applied to the center of the cavity 1a and the entire other upper surface. 3 is a lead frame that is bonded onto the substrate 1 with adhesive glass 2; 4 is a metal plate that is bonded to the cavity 1a with adhesive glass 2, and is made of a silver plate or the like. 5 is a small piece for a ground terminal (hereinafter referred to as a "small piece for a terminal") which is soldered to the end of this metal plate.
It is formed from the material shown in FIG. In the figure, 6 is a three-layer metal plywood material made of a 42 alloy material 6a as a base material, an aluminum material 6b on the front surface, and a solder material 6c on the back surface, and is shaped like a tape. This three-layer metal plywood material 6 is punched out into a small circle shown by a chain line to form a small terminal piece 5 shown in an enlarged view in FIG. 9.

第5図に戻り、7は金属板4上中央に付着され
る接合用のはんだ薄片、8はこのはんだ薄片を介
し金属板4にダイボンデイングされる半導体チツ
プである。
Returning to FIG. 5, numeral 7 denotes a thin solder piece for bonding that is attached to the center of the metal plate 4, and 8 denotes a semiconductor chip that is die-bonded to the metal plate 4 through this thin solder piece.

基板1に金属板4及びリードフレーム3を加熱
圧着すると、第6図に示す圧着工程が終つた前段
の半製品パツケージ9(一般にサーデイツクパツ
ケージと呼ばれている)となる。
When the metal plate 4 and the lead frame 3 are bonded to the substrate 1 under heat and pressure, a semi-finished product package 9 (generally called a third package) shown in FIG. 6 is obtained after the pressure bonding process is completed.

さらに、この半製品パツケージ9にボンデイン
グ工程で、金属板4にはんだ薄片7を付着し、端
子用小片5と半導体チツプ8をそれぞれボンデイ
ングすると、第7図に示す後段の半製品パツケー
ジ10となる。
Further, in a bonding process, a thin solder piece 7 is attached to the metal plate 4, and the small terminal piece 5 and the semiconductor chip 8 are bonded to this semi-finished package 9, thereby forming the subsequent semi-finished package 10 shown in FIG.

従来の製造装置も、この発明による製造装置
も、半導体装置として、ワイヤボンデイング前の
半製品パツケージ10を組立てるための装置であ
る。
Both the conventional manufacturing apparatus and the manufacturing apparatus according to the present invention are apparatuses for assembling a semi-finished package 10 as a semiconductor device before wire bonding.

第10図に半製品パツケージ9,10を整列収
納するパレツト11を示す。
FIG. 10 shows a pallet 11 on which semi-finished product packages 9 and 10 are arranged and stored.

半製品パツケージ10を組立てる、従来の半導
体装置の製造装置を、第11図ないし第14によ
り説明する。第11図aに示すように、治具12
の1対宛の桟12b上に、上面とキヤビテイ1a
の中央とに接着用ガラス2が塗布されてある基板
1を載せ、キヤビテイ1aに金属板4を置き、基
板1上にリードフレーム3を置く。この状態を第
11図bに示す。
A conventional semiconductor device manufacturing apparatus for assembling a semi-finished product package 10 will be explained with reference to FIGS. 11 to 14. As shown in FIG. 11a, the jig 12
The upper surface and the cavity 1a are placed on the crosspiece 12b addressed to the pair of
A substrate 1 coated with adhesive glass 2 is placed on the center of the substrate 1, a metal plate 4 is placed on the cavity 1a, and a lead frame 3 is placed on the substrate 1. This state is shown in FIG. 11b.

治具12は第12図のように、両側の枠部12
a間に1対宛の桟10bが固着されてあり、それ
ぞれ第11図bの状態の基板1が載せられてい
る。これまでの工程は手作業で行つていた。
As shown in FIG. 12, the jig 12 has frame parts 12 on both sides.
A pair of crosspieces 10b are fixed between the crosspieces a, and a substrate 1 in the state shown in FIG. 11b is placed on each crosspiece. Up until now, the process had been done manually.

このような状態の複数の基板1を載せた治具1
2を、第13図に示す赤外線加熱炉13のコンベ
ヤ14に載せ、ゆつくり走行させ加熱する。こう
して、接着用ガラス2を加熱溶融し、リードフレ
ーム3と金属板4とを自重により接着させてい
た。
A jig 1 carrying a plurality of substrates 1 in such a state
2 is placed on the conveyor 14 of the infrared heating furnace 13 shown in FIG. 13, and is heated by running slowly. In this way, the adhesive glass 2 was heated and melted, and the lead frame 3 and the metal plate 4 were adhered by their own weight.

このような接着工程を終り、第6図に示す前段
の半製品パツケージ9となる。
After completing this bonding process, the semi-finished package 9 shown in FIG. 6 is obtained.

上記のように、赤外線加熱炉13から搬出され
た半製品パツケージ9は治具12から取出され、
所定の洗浄及び乾燥された後、次のボンデイング
工程の装置にかけるために、第10図に示すパレ
ツト11上に整列される。
As mentioned above, the semi-finished product package 9 carried out from the infrared heating furnace 13 is taken out from the jig 12,
After being washed and dried in a predetermined manner, they are arranged on a pallet 11 shown in FIG. 10 in order to be subjected to a device for the next bonding process.

第14図は従来のボンデイング工程での製造装
置を示す。15はローダ部で、半製品パツケージ
9が収納されたパレツト11が載せられ、周知の
直交3軸形ロボツト16により半製品パツケージ
9を1個宛ヒータレール17上に載せ、リードフ
レーム3の折曲げられた両側のリード部を両側部
にまたがらす。
FIG. 14 shows a manufacturing apparatus for a conventional bonding process. Reference numeral 15 denotes a loader section, on which a pallet 11 containing semi-finished product packages 9 is loaded, and a well-known orthogonal triaxial robot 16 loads the semi-finished products 9 one by one onto a heater rail 17, and bends the lead frame 3. Straddle the lead parts on both sides.

次に、18は前進送り手段で複数の送り爪18
aが突出,所定ストロークの前進移動,引込み後
退移動復帰の動作を繰返すことにより、ヒータレ
ール17上の半製品パツケージ9を1個宛間欠前
進させ、位置決め機構(図示は略す)によつて位
置決め固定し、加熱させる。
Next, reference numeral 18 denotes a forward feeding means having a plurality of feeding claws 18.
By repeating the operations of protrusion, forward movement of a predetermined stroke, retraction, backward movement, and return, the semi-finished product package 9 on the heater rail 17 is intermittently advanced one by one, and is positioned and fixed by a positioning mechanism (not shown). and heat it up.

つづいて、第9図のように、あらかじめ打抜か
れてある端子用小片5が周知のボールフイーダ
(パーツフイーダとも言う)19に供給され、こ
のボールフイーダからの端子用小片5が、1個宛
ピツクアンドプレース(市販機械)20により、
ヒータレール17上に停止されている半製品パツ
ケージ9の基板1の金属板4上の一端に載せら
れ、端子用小片5の自体のはんだの溶融で接合さ
せる。21ははんだ片付着手段で、端子用小片5
が接合されヒータレール17上を前進送りされ、
位置決めされた半製品パツケージ9の金属板4上
の中央にはんだ薄片7を載せ接合する。22はダ
イボンド工程での半導体チツプ8を位置決めし供
給するチツプ供給手段で、次のように構成されて
いる。位置決め機構をもつXYテーブル23上に
トレイ24を固定し、このトレイ上には粘着シー
トを引き張り保持していて、この粘着シート上に
はウエーハから分割された多数の半導体チツプ8
が張付けられている。
Next, as shown in FIG. 9, the pre-punched terminal pieces 5 are supplied to a well-known ball feeder (also called parts feeder) 19, and the terminal pieces 5 from this ball feeder are picked and placed one by one. (Commercially available machine) 20,
The semi-finished product package 9, which is stopped on the heater rail 17, is placed on one end of the metal plate 4 of the substrate 1, and the terminal pieces 5 are joined by melting their own solder. 21 is a solder piece attachment means, and a small piece 5 for terminal
are joined and fed forward on the heater rail 17,
A solder thin piece 7 is placed on the center of the metal plate 4 of the positioned semi-finished product package 9 and bonded. 22 is a chip supply means for positioning and supplying the semiconductor chip 8 in the die bonding process, and is constructed as follows. A tray 24 is fixed on an XY table 23 with a positioning mechanism, and an adhesive sheet is stretched and held on this tray, and a large number of semiconductor chips 8 separated from a wafer are placed on this adhesive sheet.
is attached.

25は検出カメラで、吸着しようとする半導体
チツプ8の位置を検出し、この検出信号が処理回
路に入れられ、この指令信号により所定の吸着位
置になるようにXYテーブル23により移動調整
される。
A detection camera 25 detects the position of the semiconductor chip 8 to be picked up, this detection signal is input to a processing circuit, and the movement is adjusted by the XY table 23 according to this command signal so that it is at a predetermined picked up position.

26はダイボンド手段で、位置決めされたトレ
イ24上の半導体チツプ8を吸着ヘツド26aに
より吸着して移動し、ヒータレール17上を前進
送りされ、位置決めされてある半製品パツケージ
9の金属板4上にはんだ薄片7を介しダイボンデ
イングする。こうして、第7図に示す後段の半製
品パツケージ10が形成される。
Reference numeral 26 denotes die bonding means, which moves the semiconductor chip 8 on the positioned tray 24 by suctioning it with a suction head 26a, moves it forward on the heater rail 17, and places it on the metal plate 4 of the positioned semi-finished product package 9. Die bonding is performed through the solder thin piece 7. In this way, the latter semi-finished product package 10 shown in FIG. 7 is formed.

この半製品パツケージ10は、収納部27に前
進送りされ、周知の直交三軸形ロボツト28によ
り、パレツト11に収納される。
This semi-finished product package 10 is fed forward to a storage section 27 and stored on a pallet 11 by a well-known orthogonal triaxial robot 28.

さらに、パレツト11に収納された各半製品パ
ツケージ10は、次の目視検査工程に送られ、良
否判定及び不良品除去が行われる。この後、次の
ワイヤボンデイング工程に送られ、ワイヤボンデ
イング後は、上部に絶縁ふたがガラス封止接合さ
れる。
Furthermore, each semi-finished product package 10 stored in the pallet 11 is sent to the next visual inspection process, where it is judged good or bad and defective products are removed. Thereafter, it is sent to the next wire bonding step, and after the wire bonding, an insulating lid is glass-sealed and bonded to the top.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記のような従来のガラス封止形半導体装置の
製造装置では、赤外線加熱炉13を要し、この加
熱炉に通すために手作業で基板1上にリードフレ
ーム3及び金属板4を置き、この状態で基板1を
治具12上に載せねばならなかつた。加熱炉13
に通し接着工程の終つた各半製品パツケージ9を
治具12から取出し、付着した異物除去のため、
手作業などにより洗浄,乾燥を行わねばならない
という問題点があつた。
The conventional glass-sealed semiconductor device manufacturing apparatus described above requires an infrared heating furnace 13, and the lead frame 3 and metal plate 4 are manually placed on the substrate 1 to pass through the heating furnace. The substrate 1 had to be placed on the jig 12 in this state. Heating furnace 13
Each semi-finished package 9 that has been passed through the bonding process is taken out from the jig 12, and in order to remove any foreign matter that has adhered to it,
There was a problem in that cleaning and drying had to be done manually.

また、上記半製品パツケージ9をボンデイング
工程の手段に供給するために、手作業でパレツト
11に整列収納しなければならなく、作業性が非
常に低かつた。
Furthermore, in order to supply the semi-finished packages 9 to the means for the bonding process, they must be manually aligned and stored on the pallet 11, resulting in very low workability.

さらに、ボールフイーダ19による端子用小片
5の整列供給が、表裏が逆になつて出ることが生
じるという問題点があつた。
Furthermore, there was a problem in that the terminal pieces 5 were fed in an aligned manner by the ball feeder 19, but the terminal pieces 5 were sometimes delivered with the front and back sides reversed.

そのうえ、赤外線加熱炉13を通り加熱されて
後、洗浄,乾燥により冷却された半製品パツケー
ジ9を、ダイボンド手段26で半導体チツプ8の
熱圧着のために、ヒータレール17で再度加熱し
ており、これらのヒートサイクルにより金属板4
の表面に酸化膜が生じ、ダイボンデイング時のは
んだ薄片7のはんだ材の広がりが阻害され、ダイ
ボンドの不良が生じるという大きな問題点があつ
た。
Furthermore, the semi-finished package 9 which has been heated through the infrared heating furnace 13 and cooled by cleaning and drying is heated again by the heater rail 17 in order to thermocompress the semiconductor chip 8 by the die bonding means 26. These heat cycles cause the metal plate 4 to
There was a major problem in that an oxide film was formed on the surface of the die bonding, which inhibited the spread of the solder material in the solder flakes 7 during die bonding, resulting in defective die bonding.

この発明は、このような問題点を解決するため
になされたもので、基板への金属板及びリードフ
レームの圧着工程と、はんだ薄片,端子用小片及
び半導体チツプの各ボンデイング工程が自動的に
一貫してなされ、生産性を大幅に向上し、異物の
付着をなくし、その洗浄,乾燥を要せず、従来の
ようなヒートサイクルをなくし、品質良好なダイ
ボンドができるガラス封止形半導体装置の製造装
置を得ることを目的としている。
This invention was made to solve these problems, and the process of crimping the metal plate and lead frame to the board, and the bonding process of solder thin pieces, terminal pieces, and semiconductor chips are automatically and consistently performed. Manufacture of glass-sealed semiconductor devices that greatly improves productivity, eliminates the adhesion of foreign substances, eliminates the need for cleaning and drying, eliminates conventional heat cycles, and allows for high-quality die bonding. The purpose is to obtain equipment.

さらには、各圧着工程と各ボンデイング工程ご
とに自動的に不良が検出され、不良品は次後のボ
ンデイング工程を施こすことなく通され、最後に
不良品として取除かれ、良品の半製品パツケージ
がパレツトに収納され、目視検査を不要とし省力
化した半導体装置の製造装置を得ることを目的と
している。
Furthermore, defects are automatically detected in each crimping process and each bonding process, and the defective products are passed through the next bonding process without being carried out, and are finally removed as defective products, leaving the non-defective semi-finished product package. The object of the present invention is to provide a manufacturing apparatus for semiconductor devices which is housed in pallets and which eliminates the need for visual inspection and saves labor.

〔問題点を解決するための手段〕[Means for solving problems]

この発明にかかるガラス封止形半導体装置の製
造装置は、ヒータレールと搬送手段を平行に配設
し、基板供給手段により基板を1枚宛ヒータレー
ル上に供給し、搬送手段により各工程の所定位置
宛間欠前進送りし、金属板圧着手段,リードフレ
ーム圧着手段,はんだ片付着手段,端子用小片圧
着手段,ダイボンド手段及びダイボンド手段への
チツプ供給手段を順に配設し、結合形成された半
製品パツケージのうち不良品を除去する不良品除
去手段と良品をパレツトに収納する収納手段を設
け、各圧着工程及び各ボンデイング工程ごとに認
識手段の撮像カメラを配置し、圧着部材の相互位
置を検出記憶し、この情報により良否を判定し、
この情報指令を前記不良品除去手段に与えるよう
にしたものである。
In the glass-sealed semiconductor device manufacturing apparatus according to the present invention, a heater rail and a transport means are arranged in parallel, the substrate supply means supplies the substrates one by one onto the heater rail, and the transport means supplies the substrates to each step in a predetermined manner. A semi-finished product is formed by intermittent forward feeding to a position, and a metal plate crimping means, a lead frame crimping means, a solder piece adhering means, a terminal small piece crimping means, a die bonding means, and a chip supplying means to the die bonding means are sequentially arranged and bonded. A defective product removing means for removing defective products from the package and a storage means for storing non-defective products in pallets are provided, and an imaging camera as a recognition means is arranged for each crimping process and each bonding process to detect and store the mutual positions of the crimping members. Then, use this information to determine pass/fail.
This information command is given to the defective product removal means.

〔作用〕[Effect]

この発明においては、ヒータレール上を前進送
りされてきた基板に、金属板圧着手段で金属板を
加熱圧着し、リードフレーム圧着手段によりリー
ドフレームを加熱圧着し、つづいて、基板の金属
板上の中央に、はんだ片付着手段によりはんだ薄
片を付着し、次に、金属板上の一端に、端子用小
片圧着手段により端子用小片をボンデイングし、
さらに、金属板上の中央にはんだ薄片を介し、ダ
イボンド手段により半導体チツプをボンデイング
し、半製品パツケージが形成され、各工程に配置
の撮像カメラによる位置関係を各認識手段により
検出記憶し、コンピユータにより良否を判定し、
この指令で不良品は除去手段で除去し、良品を収
納手段により各パレツト上に順次整列収納し、次
のワイヤボンデイング工程へ送られるようにす
る。
In this invention, a metal plate is heated and crimped by a metal plate crimping means, a lead frame is heated and crimped by a lead frame crimping means, and then a A thin solder piece is attached to the center using a solder piece adhering means, and then a small terminal piece is bonded to one end of the metal plate using a small terminal piece crimping means,
Furthermore, a semiconductor chip is bonded to the center of the metal plate by die-bonding means through a solder thin piece, and a semi-finished product package is formed. Determine whether it is good or bad,
In response to this command, defective products are removed by the removal means, and good products are sequentially arranged and stored on each pallet by the storage means, so that they can be sent to the next wire bonding process.

〔実施例〕〔Example〕

第1図はこの発明によるガラス封止形半導体装
置の製造装置の一実施例を示す斜視図である。3
1は長手方向に配設され、上部に載せられ送られ
る基板1を適温に加熱するヒータレール、32は
このヒータレール31に平行に配設された搬送手
段で、ヒータレール31上の基板1を前後1対の
挟み爪32a,32bで挟付け、所定の各工程の
位置に間欠前進送りする。
FIG. 1 is a perspective view showing an embodiment of a glass-sealed semiconductor device manufacturing apparatus according to the present invention. 3
Reference numeral 1 denotes a heater rail arranged in the longitudinal direction to heat the substrate 1 placed on the upper part and fed to an appropriate temperature; 32 is a conveying means arranged parallel to this heater rail 31; It is pinched by a pair of front and rear pinching claws 32a and 32b, and is intermittently fed forward to each predetermined process position.

ヒータレール31に沿い前半部には順に、基板
供給手段33,金属板仮付手段40,第1の加圧
手段44,リードフレーム仮付手段45,第2の
加圧手段53が配設されている。
In the front half along the heater rail 31, a substrate supply means 33, a metal plate temporary attachment means 40, a first pressure means 44, a lead frame temporary attachment means 45, and a second pressure means 53 are arranged in order. There is.

さらに、後半部には順に、はんだ片仮付手段5
4,端子用小片圧着手段58,ダイボンド手段6
2,不良品除去手段68及び良品の収納手段69
が配設されている。65はダイボンド手段62に
半導体チツプ8を供給するチツプ供給手段、74
は各工程の手段をコンピユータにより自動制御す
る制御盤である。
Further, in the latter half, a solder piece tacking means 5 is sequentially provided.
4, Terminal small piece crimping means 58, die bonding means 6
2. Defective product removal means 68 and good product storage means 69
is installed. 65 is a chip supply means for supplying the semiconductor chip 8 to the die bonding means 62; 74;
is a control panel that automatically controls the means of each process using a computer.

各圧着工程及びボンデイング工程の箇所にはそ
れぞれ、第1の認識手段の撮像カメラ81,第2
の認識手段の撮像カメラ82,第3の認識手段の
撮像カメラ83及び第4の認識手段の撮像カメラ
84が配置されており、各圧着部材の相互関係位
置を撮像し、各認識手段(いずれも図示は略す)
のビデオ信号回路により検出記憶され、前記制御
盤74のコンピユータにより良否が判定されその
情報指令が出される。
At each crimping process and bonding process, an imaging camera 81 as a first recognition means and a second
An image pickup camera 82 of the recognition means, an image pickup camera 83 of the third recognition means, and an image pickup camera 84 of the fourth recognition means are arranged. (Illustrations omitted)
It is detected and stored by the video signal circuit of the control panel 74, and the computer of the control panel 74 determines whether it is good or bad and issues an information command.

85は第5の認識手段の撮像カメラで、チツプ
供給手段65の多数の各半導体チツプ8を撮像
し、認識手段(図示は略す)で、ビデオ信号回路
により位置検出記憶と、画像記憶がされ、制御盤
74のコンピユータにより良否が判定され、この
良否とその位置との情報指令が出される。
Reference numeral 85 denotes an imaging camera as a fifth recognition means, which takes images of each of the semiconductor chips 8 of the chip supply means 65, and the recognition means (not shown) detects and stores the position and stores the image using a video signal circuit. The computer of the control panel 74 determines the quality of the product, and issues an information command regarding the quality and its position.

前記各認識手段はそれぞれ撮像カメラ及びビデ
オ信号処理回路を有しており、撮像カメラは例え
ば、イメージセンサカメラ(CCDカメラ)から
なる。
Each of the recognition means has an imaging camera and a video signal processing circuit, and the imaging camera is, for example, an image sensor camera (CCD camera).

前記第1図の装置の前半部の圧着工程の各手段
部の構成と動作を、第2図の拡大図により説明す
る。
The structure and operation of each means in the crimping process in the front half of the apparatus shown in FIG. 1 will be explained with reference to the enlarged view in FIG. 2.

基板供給手段33は、次のように構成されてい
る。34は左右にしゆう動可能なステージで、前
記第5図のように、上面及びキヤビテイ1aに接
着用ガラス2が付着された基板1を、多数枚重ね
収納したチユーブ35を複数列平行に取付けてい
る。チユーブ35内の基板1は下部から押上げ機
構36で押上げられ、最上部に至つた基板1が1
枚宛周知のピツクアンドプレース37により予熱
ヒータレール38上に移される。この予熱ヒータ
レール上の基板1を送込み機構39により、ヒー
タレール31上に送り込む。
The substrate supply means 33 is configured as follows. Reference numeral 34 denotes a stage that can be moved left and right, and as shown in FIG. There is. The substrate 1 in the tube 35 is pushed up from the bottom by the push-up mechanism 36, and the substrate 1 that has reached the top is 1
The sheet is transferred onto the preheating heater rail 38 by a well-known pick and place 37. The substrate 1 on this preheating heater rail is sent onto the heater rail 31 by the feeding mechanism 39.

このように、あるチユーブ35内の基板1が全
部取出され空になると、ステージ34が移動し次
のチユーブ35が取出し位置にされ、基板1が1
枚宛取出される。この動作が順次繰返され各チユ
ーブ35内の基板1が取出され供給される。
In this way, when all the substrates 1 in a certain tube 35 are taken out and become empty, the stage 34 is moved and the next tube 35 is set to the take-out position, and one substrate 1 is taken out.
Each sheet is taken out. This operation is repeated in sequence, and the substrates 1 in each tube 35 are taken out and supplied.

周知の搬送手段32は、第3図に動作説明図で
示すように、前後1対宛の挟み爪32a,32b
の組が多数組配設されてあり、復帰位置BからC
位置に突出され、ヒータレール31上に送り込ま
れた基板1を両端から挟付ける。つづいて、所定
のストロークでD位置に前進送りし、挟み爪32
a,32bは挟付けを開放し、E位置に引込まれ
てから復帰位置Bに戻る。この動作を繰返し、基
板1を1枚宛間欠前進送りする。
The well-known conveyance means 32 has a pair of front and rear pinching claws 32a, 32b, as shown in the operation explanatory diagram in FIG.
A large number of sets are arranged, and from return position B to C.
The substrate 1 that has been projected to the position and sent onto the heater rail 31 is pinched from both ends. Next, move forward to the D position with a predetermined stroke, and press the pinch claw 32.
a and 32b are released from the pinch, and are pulled into the E position and then returned to the return position B. This operation is repeated to intermittently feed the substrate 1 forward one by one.

こうして、ヒータレール31上をA方向に前進
送りされ所定の温度に加熱された基板1は、金属
板仮付手段40の位置に至り両挟み爪32a,3
2bに挟付けられたまま停止される。
In this way, the substrate 1, which is fed forward on the heater rail 31 in the direction A and heated to a predetermined temperature, reaches the position of the metal plate temporary attachment means 40, and the two pinching claws 32a, 3
It is stopped while being pinched by 2b.

金属板仮付手段40は、次のように構成されて
いる。リール機構41にリボン状金属材を巻付け
ており、打抜き機構42により金属板4(第5図
参照)に打抜き、周知のピツクアンドプレース4
3により吸着し前記所定位置で停止している基板
1のキヤビテイ1aに仮付けする。
The metal plate temporary attachment means 40 is configured as follows. A ribbon-shaped metal material is wound around a reel mechanism 41, and is punched out into a metal plate 4 (see FIG. 5) by a punching mechanism 42, using a well-known pick and place 4.
3, and is temporarily attached to the cavity 1a of the substrate 1, which is stopped at the predetermined position.

金属板4が仮付けされた基板1は、ヒータレー
ル31上を第1の認識手段の撮像カメラ81下に
送られ、金属板4,基板1が撮像され、認識手段
により位置関係が検出記憶される。
The board 1 to which the metal plate 4 is temporarily attached is sent over the heater rail 31 to below the imaging camera 81 of the first recognition means, the metal plate 4 and the board 1 are imaged, and the recognition means detects and stores the positional relationship. Ru.

つづいて、基板1はヒータレール31上を第1
の加圧手段44の位置に送られ、金属板4が加熱
圧着される。
Subsequently, the board 1 is placed on the heater rail 31 in the first place.
The metal plate 4 is heated and pressed to the position of the pressure means 44 .

金属板4が圧着された基板1は、ヒータレール
31上を前進送りされリードフレーム仮付手段4
5の位置に停止される。
The board 1 with the metal plate 4 crimped thereon is fed forward on the heater rail 31 and is attached to the lead frame temporary attachment means 4.
It is stopped at position 5.

リードフレーム仮付手段45は、次のように構
成されている。46は左右にしゆう動可能なステ
ージで、リードフレーム3を多数個整列収納した
チユーブ47を複数列平行に取付けている。チユ
ーブ47内のリードフレーム3は下部から押上げ
機構48で押上げられ、周知のピツクアンドプレ
ース49により、最上部に至つたリードフレーム
3を1個宛予熱ヒータレール50上に移す。この
予熱ヒータレール上のリードフレーム3を送り機
構51で移動し、周知のピツクアンドプレース5
2により、前記所定位置で停止している基板1上
に仮付けする。
The lead frame temporary attachment means 45 is configured as follows. Reference numeral 46 denotes a stage that can be moved left and right, and tubes 47 in which a large number of lead frames 3 are arranged and housed are attached in parallel in a plurality of rows. The lead frames 3 in the tube 47 are pushed up from the bottom by a push-up mechanism 48, and the lead frames 3 that have reached the top are moved one by one onto the preheating heater rail 50 by a well-known pick and place 49. The lead frame 3 on this preheating heater rail is moved by a feeding mechanism 51, and the lead frame 3 is placed on the well-known pick and place 5
2, it is temporarily attached onto the substrate 1 which is stopped at the predetermined position.

リードフレーム3が仮付けされた基板1は、ヒ
ータレール31上を第2の認識手段の撮像カメラ
82下に送られ、基板1,リードフレーム3が撮
像され、認識手段により位置関係が検出記憶され
る。
The board 1 to which the lead frame 3 is temporarily attached is sent over the heater rail 31 to below the imaging camera 82 of the second recognition means, the board 1 and the lead frame 3 are imaged, and the positional relationship is detected and stored by the recognition means. Ru.

つづいて、基板1はヒータレール31上を、複
数組の第2の加圧手段53に順に送られ、複数段
階の温度に加熱され加圧されてリードフレーム3
が圧着される。こうして、圧着工程を終えた半製
品パツケージ9(第6図参照)とする。
Subsequently, the substrate 1 is sequentially sent on the heater rail 31 to a plurality of sets of second pressurizing means 53, heated to a plurality of temperatures and pressurized, and then placed on the lead frame 3.
is crimped. In this way, a semi-finished package 9 (see FIG. 6) which has completed the crimping process is obtained.

次に、前記第1図の装置の後半部のボンデイン
グ工程の各手段部の構成と動作を、第4図の拡大
図により説明する。
Next, the structure and operation of each means in the bonding process in the latter half of the apparatus shown in FIG. 1 will be explained with reference to the enlarged view in FIG. 4.

前記リードフレーム3が圧着された半製品パツ
ケージ9は、ヒータレール31上を送られはんだ
片仮付手段54の位置に停止される。このはんだ
片仮付手段54は、次のように構成されている。
リール機構55にリボン状はんだ薄材を巻付けて
おり、切断機構56により所定長さのはんだ薄片
7(第5図参照)に切断し、このはんだ薄片7を
ピツクアンドプレース57により基板1の金属板
4上の中央に仮付けする。
The semi-finished product package 9 to which the lead frame 3 is crimped is sent on the heater rail 31 and stopped at the position of the solder piece tacking means 54. This solder piece tacking means 54 is constructed as follows.
A thin ribbon-shaped solder material is wound around a reel mechanism 55, and is cut into solder thin pieces 7 of a predetermined length (see FIG. 5) by a cutting mechanism 56. These thin solder pieces 7 are placed on the board 1 by a pick-and-place 57. Temporarily attach it to the center of the metal plate 4.

このはんだ薄片7が仮付けされた半製品パツケ
ージ9は、ヒータレール31上を端子用小片圧着
手段58の位置に停止される。
The semi-finished product package 9 to which the solder thin piece 7 is temporarily attached is stopped on the heater rail 31 at the position of the terminal small piece crimping means 58.

この端子用小片圧着手段58は、次のようにな
つている。リール機構59にはんだ材6c(第8
図参照)を裏側にし巻付けられたリボン状の三層
合板材6から、打抜き機構60により端子用小片
5(第9図参照)に打抜き、ピツクアンドプレー
ス61により吸着し、はんだ材6cを裏側にした
状態で基板1の金属板4上の一端にボンデイング
する。
This terminal small piece crimping means 58 is constructed as follows. Solder material 6c (eighth
A small terminal piece 5 (see Fig. 9) is punched out by a punching mechanism 60 from a ribbon-shaped three-layer plywood material 6 wrapped with a (see figure) on the back side, and is adsorbed by a pick and place 61 to form a solder material 6c. Bonding is performed on one end of the metal plate 4 of the substrate 1 while the substrate 1 is on the back side.

この端子用小片5が接着された半製品パツケー
ジ9は、ヒータレール31上を第3の認識手段の
撮像カメラ83下に送られ、金属板4,端子用小
片5が撮像され、認識手段により位置関係が検出
記憶される。
The semi-finished product package 9 to which the small terminal piece 5 is glued is sent over the heater rail 31 to below the imaging camera 83 of the third recognition means, where the metal plate 4 and the small terminal piece 5 are imaged, and the position is determined by the recognition means. Relationships are detected and stored.

撮像カメラ83で撮像された半製品パツケージ
9は、ヒータレール31上をダイボンデイング工
程位置に送られる。
The semi-finished product package 9 imaged by the imaging camera 83 is sent on the heater rail 31 to a die bonding process position.

チツプ供給手段65は、次のように構成されて
いる。位置決め機構をもつXYテーブル66上
に、上面に粘着シートを引き張り保持したトレイ
67が固定され、この粘着シート上には分割され
た多数の半導体チツプ8が張付けられている。
The chip supply means 65 is constructed as follows. A tray 67 with an adhesive sheet stretched and held on its upper surface is fixed on an XY table 66 having a positioning mechanism, and a large number of divided semiconductor chips 8 are pasted on this adhesive sheet.

このトレイ67はXYテーブル66により第5
の認識手段の撮像カメラ85下に移動され、各半
導体チツプ8が撮像され、認識手段とコンピユー
タにより、各位置と良否の情報指定が出される。
この指定によりXYテーブル66が移動調整して
良品の半導体チツプ8を所定の吸着位置にする。
This tray 67 is placed in the fifth position by the XY table 66.
is moved under the imaging camera 85 of the recognition means, each semiconductor chip 8 is imaged, and the recognition means and computer output information designation of each position and quality.
Based on this designation, the XY table 66 is moved and adjusted to place the good semiconductor chip 8 at a predetermined suction position.

そこで、周知のダイボンド手段62の吸着ヘツ
ド63がトレイ67側に移動され、吸着位置の半
導体チツプ8を撮像カメラ84で撮像し、第4の
認識手段により位置検出し、コンピユータにより
位置修正指令を出し、これによりXYテーブル6
6が半導体チツプ8を正しい吸着位置に移動修正
する。ついで、この吸着位置の半導体チツプ8を
吸着ヘツド63で吸着し、ヒータレール31上に
待期している半製品パツケージ9の基板1の金属
板4上の中央に、はんだ薄片7を介しダイボンデ
イングする。
Therefore, the suction head 63 of the well-known die bonding means 62 is moved to the tray 67 side, the semiconductor chip 8 at the suction position is imaged by the imaging camera 84, the position is detected by the fourth recognition means, and a position correction command is issued by the computer. , this results in XY table 6
6 moves and corrects the semiconductor chip 8 to the correct suction position. Next, the semiconductor chip 8 at this suction position is suctioned by the suction head 63, and die bonded via the solder thin piece 7 to the center of the metal plate 4 of the substrate 1 of the semi-finished package 9 waiting on the heater rail 31. .

このとき、吸着ヘツド63に支持されてある第
4の認識手段の撮像カメラ84により基板1,半
導体チツプ8が撮像され、相互の位置とはんだ薄
片7の溶融によるぬれ広がり状態が検出記憶され
る。
At this time, the substrate 1 and the semiconductor chip 8 are imaged by the imaging camera 84 of the fourth recognition means supported by the suction head 63, and the mutual positions and the state of wetting and spreading due to the melting of the solder flakes 7 are detected and stored.

こうして、ボンデイング工程が終えてなる半製
品パツケージ10(第7図参照)は、搬送手段3
2によりヒータレール31上を前進送りされ、不
良品除去手段68の位置に至る。この不良品除去
手段68は周知の直交3軸形ロボツトからなり、
前記各圧着工程ごとに設けられた第1〜第4の認
識手段による各工程別の検出に基づく良否判定情
報により、不良品を不良品パレツト11aに収容
する。
In this way, the semi-finished product package 10 (see FIG. 7) that has undergone the bonding process is transferred to the conveying means 3.
2, it is fed forward on the heater rail 31 and reaches the position of the defective product removing means 68. This defective product removal means 68 is composed of a well-known orthogonal triaxial robot.
Defective products are stored in the defective product pallet 11a based on the quality determination information based on the detection for each process by the first to fourth recognition means provided for each of the crimping processes.

一方、良品の半製品パツケージ10は、搬送手
段32により収納手段69の吸着位置に送られ
る。収納手段69は、次のように構成されてい
る。両側のパレツト収容機構70によりパレツト
11を積重ねており、パレツト11の位置決め機
構と、上下,左右に移動可能なパレツト移動機構
(いづれも図示は略す)を備えている。さらに、
中央には上下,前後に移動可能な直交2軸移動機
構71と、半製品パツケージ10の吸着機構72
とを備えている。
On the other hand, the non-defective semi-finished product package 10 is sent to the suction position of the storage means 69 by the conveyance means 32. The storage means 69 is configured as follows. The pallets 11 are stacked by pallet storage mechanisms 70 on both sides, and are provided with a positioning mechanism for the pallets 11 and a pallet moving mechanism (both not shown) capable of moving vertically and horizontally. moreover,
In the center, there is an orthogonal two-axis movement mechanism 71 that can move up and down and back and forth, and a suction mechanism 72 for the semi-finished product package 10.
It is equipped with

これらの各機構により良品の半製品パツケージ
10をパレツト11上に順次整列収納していく。
By each of these mechanisms, the semi-finished products packages 10 of good quality are sequentially arranged and stored on the pallet 11.

前記のように、各工程の手段による動作を繰返
し、半製品パツケージ10が一貫し連続して形成
される。
As described above, by repeating the operations by means of each step, the semi-finished package 10 is formed consistently and continuously.

上記基板供給手段33及びリードフレーム仮付
手段45への基板1及びリードフレーム3の補充
は、ステージ34及び46にチューブ35及び4
7ごと補充を行えばよく、装置の動作を停止させ
なくてもよい。
To replenish the substrate 1 and lead frame 3 to the substrate supply means 33 and the lead frame temporary attachment means 45, the tubes 35 and 4 are placed on the stages 34 and 46.
It is only necessary to replenish the liquid every 7 hours, and there is no need to stop the operation of the device.

金属板仮付手段40,はんだ薄片仮付手段54
及び端子用小片圧着手段58への各リールの交換
は、リールへの各テープ状部材を十分な長さ量で
巻いておけば長時間交換が不要で、かつ、交換の
際も補充のリールごとに交換すればよく、短時間
で容易にできる。
Metal plate tacking means 40, solder flake tacking means 54
Replacement of each reel with the terminal small piece crimping means 58 can be done by wrapping each tape-like member around the reel to a sufficient length so that replacement is unnecessary for a long time, and when replacing each reel, it is necessary to replace each reel with a refill. All you have to do is replace it, which can be easily done in a short time.

端子用小片圧着手段58は、三層合板材6をは
んだ材6cを裏側にしてリールに巻付けてあり、
はんだ材6cを裏側に一定して供給され、従来の
ように表裏整列不良が生じることなく、これによ
る不良品がなくされる。
The terminal small piece crimping means 58 has a three-layer plywood material 6 wound around a reel with the solder material 6c on the back side.
Since the solder material 6c is constantly supplied to the back side, there is no front-back misalignment as in the conventional case, and defective products due to this are eliminated.

前記ダイボンデイング工程において、トレイ6
7上の半導体チツプ8群から良品のみをダイボン
ド手段62により吸着供給され、残つた不良半導
体チツプ8はトレイ67ごとトレイ搬送手段65
により新しいトレイと自動交換され、連続して良
品半導体チツプ8が供給される。
In the die bonding process, the tray 6
Only non-defective semiconductor chips 8 from the 8 groups of semiconductor chips on the semiconductor chips 7 are adsorbed and supplied by the die bonding means 62, and the remaining defective semiconductor chips 8 are transferred together with the tray 67 to the tray conveying means 65.
The tray is automatically replaced with a new one, and good semiconductor chips 8 are continuously supplied.

また、不良品除去手段68の下方に配置された
不良品用パレツト11aは、各工程別に生じた不
良半製品を収容するものであるが、製造装置が連
続稼動中において、実際の不良品発生は極めて少
なく、パレツト11aの自動交換機構を設ける必
要はない。
In addition, the defective product pallet 11a placed below the defective product removal means 68 is for storing defective semi-finished products generated in each process, but when the manufacturing equipment is in continuous operation, the actual occurrence of defective products does not occur. There is no need to provide an automatic exchange mechanism for the pallets 11a.

さらに、良品半製品パツケージ10の収納手段
69には、パレツト11の収容機構70と、パレ
ツト移動機構と、直交2軸移動機構71及び吸着
機構72によつて、順次パレツト11に良品半製
品パツケージ10を整列収納した後、自動的に空
のパレツト11と交換するので、作業者は空のパ
レツト11の補充と、半製品パツケージ10が詰
つたパレツト11の取出しをすればよい。
Furthermore, in the storage means 69 for the non-defective semi-finished product packages 10, the non-defective semi-finished product packages 10 are sequentially placed on the pallet 11 by a storage mechanism 70 for the pallets 11, a pallet moving mechanism, an orthogonal two-axis moving mechanism 71, and a suction mechanism 72. After they are arranged and stored, they are automatically replaced with empty pallets 11, so the operator only has to replenish the empty pallets 11 and take out the pallets 11 filled with semi-finished product packages 10.

なお、基板1へ各部材を接合する工程で、各認
識手段で不良が判定されると、この基板には以後
の工程では部材を接合することなく素通りさせる
ように制御するようにしてある。
In addition, in the step of joining each member to the substrate 1, if each recognition means determines that the member is defective, the control is such that the member is allowed to pass through the board without being joined in subsequent steps.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれはぼ、基板供給
手段により基板を1枚宛ヒータレール上に送り込
み、搬送手段により各所定位置宛前進送りし、基
板への各部材の圧着手段及びボンデイング手段を
順に配設し、でき上つた半製品パツケージの不良
品除去手段及び良品の収納手段を配設し、各部材
の接着工程ごとに配置した認識手段の撮像カメラ
により撮像し、相互部材の位置検出に基づき良,
不良を判定しその情報指令により、半製品パツケ
ージのうち、不良品を除去手段で除去し、良品を
収納手段で収納するようにしたので、基板への各
部材の接着工程が自動的に一貫して行え、生産性
が大幅に向上され、従来のようにヒートサイクル
や手作業による異物の付着がなくされ、品質が向
上される。
As described above, according to the present invention, the substrate feeding means feeds the substrate one by one onto the heater rail, the conveying means advances the substrate to each predetermined position, and the pressing means and bonding means for each member to the substrate are applied. A means for removing defective products and a means for storing non-defective products from the completed semi-finished product package are arranged in order, and images are taken by an imaging camera of a recognition means arranged for each bonding process of each member, and the position of each member is detected. Good basis,
Defects are determined and information commands are used to remove defective products from the semi-finished package using a removing means and store non-defective products in a storage means, so that the bonding process of each component to the board is automatically and consistently. This greatly improves productivity, eliminates the conventional heat cycles and manual work, and improves quality.

また、認識手段の導入により全数目視検査を省
くことができ、省力化される。
In addition, by introducing the recognition means, it is possible to omit visual inspection of all products, resulting in labor savings.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明によるガラス封止形半導体装
置の製造装置の一実施例の斜視図、第2図は第1
図の装置の前半部の構成各手段部の拡大斜視図、
第3図は第2図の搬送装置の1対の挟み爪の動作
説明図、第4図は第1図の装置の後半部の構成各
手段部の拡大斜視図、第5図はガラス封止形半導
体装置の半製品パツケージの分解斜視図、第6図
は第5図の基板に金属板とリードフレームを圧着
してなる前段の半製品パツケージの斜視図、第7
図は第6図の半製品パツケージに端子用小片とチ
ツプをボンデイングしてなる後段の半製品パツケ
ージの斜視図、第8図は第5図の接地端子用小片
の素材の三層金属合板材の斜視図、第9図は第8
図の素材から打抜かれた接地端子用小片を示す斜
視図、第10図は第6図及び第7図の半製品パツ
ケージを整列収納するパレツトの斜視図、第11
図ないし第14図は従来の製造装置を示し、第1
1図は治具を用いた基板への各部材の接合を順に
示す正面断面図、第12図は第11図の治具の斜
視図、第13図は第12図の治具に載せられた半
製品パツケージの赤外線加熱炉の斜視図、第14
図は第13図の加熱炉で処理された半製品パツケ
ージのボンデイング工程の各手段部を示す斜視図
である。 1……基板、1a……キヤビテイ、2……接着
用ガラス、3……リードフレーム、4……金属
板、5……接地端子用小片、6……三層金属合板
材、7……はんだ薄片、8……半導体チツプ、1
0……半製品パツケージ、11……パレツト、3
1……ヒータレール、32……搬送手段、32
a,32b……挟み爪、33……基板供給手段、
40……金属板仮付手段、44……第1の加圧手
段、45……リードフレーム仮付手段、53……
第2の加圧手段、54……はんだ片仮付手段、5
8……端子用小片圧着手段、62……ダイボンド
手段、63……吸着ヘツド、65……チツプ供給
手段、66……XYテーブル、67……トレイ、
68……不良品除去手段、69……収納手段、8
1〜85……第1〜第5の認識手段の撮像カメ
ラ、なお、図中同一符号は同一又は相当部分を示
す。
FIG. 1 is a perspective view of an embodiment of a glass-sealed semiconductor device manufacturing apparatus according to the present invention, and FIG.
An enlarged perspective view of the configuration of the first half of the device shown in the figure,
Fig. 3 is an explanatory diagram of the operation of a pair of pinching claws of the conveying device shown in Fig. 2, Fig. 4 is an enlarged perspective view of the constituent means of the rear half of the device shown in Fig. 1, and Fig. 5 is a glass sealing FIG. 6 is an exploded perspective view of a semi-finished package for a shaped semiconductor device, and FIG.
The figure is a perspective view of a subsequent semi-finished package made by bonding a small terminal piece and a chip to the semi-finished package shown in Fig. 6, and Fig. 8 is a three-layer metal plywood material used as the material for the ground terminal piece shown in Fig. 5. Perspective view, Figure 9 is the 8th
Fig. 10 is a perspective view showing a small piece for a ground terminal punched from the material shown in Fig. 10;
Figures 1 to 14 show conventional manufacturing equipment, and the first
Figure 1 is a front sectional view showing in order the joining of each member to the board using a jig, Figure 12 is a perspective view of the jig in Figure 11, and Figure 13 is a diagram showing the jig mounted on the jig in Figure 12. Perspective view of infrared heating furnace for semi-finished product packages, No. 14
This figure is a perspective view showing each means part of the bonding process of the semi-finished package processed in the heating furnace of FIG. 13. 1... Board, 1a... Cavity, 2... Adhesive glass, 3... Lead frame, 4... Metal plate, 5... Small piece for ground terminal, 6... Three-layer metal plywood material, 7... Solder Thin piece, 8... Semiconductor chip, 1
0...Semi-finished product package, 11...Pallet, 3
1... Heater rail, 32... Transport means, 32
a, 32b...Pinch claw, 33...Substrate supply means,
40... Metal plate temporary attachment means, 44... First pressurizing means, 45... Lead frame temporary attachment means, 53...
Second pressurizing means, 54...Solder piece tacking means, 5
8...Small piece crimping means for terminal, 62...Die bonding means, 63...Suction head, 65...Chip feeding means, 66...XY table, 67...Tray,
68... Defective product removal means, 69... Storage means, 8
1 to 85...imaging cameras of the first to fifth recognition means, and the same reference numerals in the drawings indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】 1 次の各手段を順次配設してなるガラス封止形
半導体装置の製造装置。 (a) 長手方向に配設されてあり、上部に載せられ
送られる基板を加熱するヒータレール、 (b) このヒータレールと平行に配設され、ヒータ
レール上の基板を両端から1対宛の挟み爪で挟
付け順次間欠送りし、各工程位置に停止させる
搬送手段、 (c) 上面と上部中央に設けられたキヤビテイとに
接着用ガラスが塗布された基板を、1枚宛前記
ヒータレール上に供給する基板供給手段、 (d) テープ状金属板材から小片の金属板に切断
し、前記ヒータレール上の前記基板のキヤビテ
イに仮付けする金属板仮付手段、 (e) 前記基板と金属板の位置を検出記憶する第1
の認識手段、 (f) 前記金属板を加熱圧着する第1の加圧手段、 (g) 前記基板上面に前記接着用ガラスを介しリー
ドフレームを加熱仮付けするリードフレーム仮
付け手段、 (h) この状態の基板とリードフレームの位置を検
出記憶する第2の認識手段、 (i) 前記リードフレームを加熱圧着する第2の加
圧手段、 (j) テープ状はんだ材をはんだ薄片に切断し、前
記基板の金属板上の中央に付着するはんだ片仮
付手段、 (k) テープ状三層金属合板材を接地端子用小片に
打抜き、前記基板の金属板上の一端に熱圧着す
る端子用小片圧着手段、 (l) 前記金属板と前記端子用小片の位置を検出記
憶する第3の認識手段、 (m) 位置決め機構を有するXYテーブル上にトレ
イを固定し、このトレイ上に張られた粘着シー
ト面に、分割された多数の半導体チツプが付着
されており、半導体チツプを所定の吸着位置に
するチツプ供給手段、 (n) 前記トレイ上の各半導体チツプの位置及び画
像を検出記憶し、この検出情報をコンピユータ
に入れ良否を判定させ、前記チツプ供給手段に
良品の半導体チツプのみを吸着位置にさせるよ
うにするための第5の認識手段、 (p) 前記トレイ上で吸着位置にされた前記半導体
チツプを吸着ヘツドで吸着し、前記基板の金属
板上の中央に前記はんだ薄片を介し熱圧着する
ダイボンド手段、 (q) 前記金属板と前記半導体チツプの位置を検出
記憶する第4の認識手段、 (r) 前記各認識手段による検出情報でコンピユー
タにより良否判定され、その指令が与えられ、
前記ダイボンデイングを終えてなる半製品パツ
ケージのうち不良品を除く不良品除去手段、 (s) 前記半製品パツケージの良品をパレツトに整
列収納する収納手段。
[Scope of Claims] 1. An apparatus for manufacturing a glass-sealed semiconductor device, which includes the following means arranged in sequence. (a) A heater rail that is arranged in the longitudinal direction and heats the board placed on the top to be fed; (b) A heater rail that is arranged parallel to this heater rail and that heats the board on the heater rail in pairs from both ends. (c) A conveying means that pinches and feeds substrates intermittently using pinching claws and stops at each process position; (d) metal plate temporary attachment means for cutting a tape-shaped metal plate into small pieces of metal plates and temporarily attaching them to the cavity of the substrate on the heater rail; (e) the substrate and the metal plate; The first to detect and store the position of
(f) first pressure means for heat-pressing the metal plate; (g) lead frame tacking means for heating and tacking the lead frame onto the upper surface of the substrate via the adhesive glass; (h) a second recognition means for detecting and storing the position of the board and lead frame in this state; (i) a second pressurizing means for heat-pressing the lead frame; (j) cutting the tape-shaped solder material into solder thin pieces; means for temporarily attaching a solder piece to the center of the metal plate of the board; (k) a small piece for a ground terminal that is punched out of a tape-like three-layer metal plywood material and thermocompressed to one end of the metal plate of the board; crimping means; (l) third recognition means for detecting and storing the positions of the metal plate and the terminal piece; (m) a tray is fixed on an XY table having a positioning mechanism, and an adhesive stretched on the tray; A chip supply means which has a large number of divided semiconductor chips attached to the sheet surface and which places the semiconductor chips at a predetermined adsorption position; (n) detects and stores the position and image of each semiconductor chip on the tray; (p) a fifth recognition means for inputting the detection information into a computer to judge whether the chips are good or bad, and causing the chip supply means to place only non-defective semiconductor chips at the suction position; die-bonding means for adsorbing a semiconductor chip with a suction head and thermocompression-bonding it to the center of the metal plate of the substrate via the solder thin piece; (q) fourth recognition means for detecting and storing the positions of the metal plate and the semiconductor chip; , (r) A computer determines pass/fail based on the information detected by each of the recognition means, and a command thereof is given;
A means for removing defective products from the semi-finished packages after the die bonding process; (s) A storage means for arranging and storing the non-defective products of the semi-finished packages on a pallet.
JP24553885A 1985-10-30 1985-10-30 Apparatus for manufacturing glass-sealed semiconductor device Granted JPS62104041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24553885A JPS62104041A (en) 1985-10-30 1985-10-30 Apparatus for manufacturing glass-sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24553885A JPS62104041A (en) 1985-10-30 1985-10-30 Apparatus for manufacturing glass-sealed semiconductor device

Publications (2)

Publication Number Publication Date
JPS62104041A JPS62104041A (en) 1987-05-14
JPH0464460B2 true JPH0464460B2 (en) 1992-10-15

Family

ID=17135185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24553885A Granted JPS62104041A (en) 1985-10-30 1985-10-30 Apparatus for manufacturing glass-sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPS62104041A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102432018B1 (en) * 2020-03-13 2022-08-16 주식회사 파워로직스 Apparatus For Manufacturing Protection Circuit Module

Also Published As

Publication number Publication date
JPS62104041A (en) 1987-05-14

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