JPH046548A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH046548A JPH046548A JP10804890A JP10804890A JPH046548A JP H046548 A JPH046548 A JP H046548A JP 10804890 A JP10804890 A JP 10804890A JP 10804890 A JP10804890 A JP 10804890A JP H046548 A JPH046548 A JP H046548A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- formula
- emulsion layer
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 105
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 52
- 239000004332 silver Substances 0.000 title claims abstract description 52
- 239000000463 material Substances 0.000 title claims description 29
- 239000000839 emulsion Substances 0.000 claims abstract description 48
- 150000001875 compounds Chemical class 0.000 claims abstract description 45
- 238000011161 development Methods 0.000 claims abstract description 20
- 150000002429 hydrazines Chemical class 0.000 claims abstract description 10
- 239000003112 inhibitor Substances 0.000 claims abstract description 10
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 claims abstract description 9
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 6
- 239000003513 alkali Substances 0.000 claims abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 125000000623 heterocyclic group Chemical group 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000001931 aliphatic group Chemical group 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 239000000084 colloidal system Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 3
- 125000004104 aryloxy group Chemical group 0.000 claims description 3
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 2
- 230000008030 elimination Effects 0.000 claims description 2
- 238000003379 elimination reaction Methods 0.000 claims description 2
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 claims description 2
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 31
- 125000004429 atom Chemical group 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 36
- 108010010803 Gelatin Proteins 0.000 description 29
- 239000008273 gelatin Substances 0.000 description 29
- 229920000159 gelatin Polymers 0.000 description 29
- 235000019322 gelatine Nutrition 0.000 description 29
- 235000011852 gelatine desserts Nutrition 0.000 description 29
- 125000001424 substituent group Chemical group 0.000 description 27
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000000975 dye Substances 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000013078 crystal Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 11
- 238000012545 processing Methods 0.000 description 11
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 206010070834 Sensitisation Diseases 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000008313 sensitization Effects 0.000 description 9
- 238000003776 cleavage reaction Methods 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 125000004122 cyclic group Chemical group 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 125000004434 sulfur atom Chemical group 0.000 description 5
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000000565 sulfonamide group Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 229910021607 Silver chloride Inorganic materials 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 description 3
- 239000004816 latex Substances 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000120 polyethyl acrylate Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 2
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000004442 acylamino group Chemical group 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 208000015181 infectious disease Diseases 0.000 description 2
- 230000002458 infectious effect Effects 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical compound CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000006179 pH buffering agent Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 125000004149 thio group Chemical group *S* 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- AGBQKNBQESQNJD-SSDOTTSWSA-N (R)-lipoic acid Chemical compound OC(=O)CCCC[C@@H]1CCSS1 AGBQKNBQESQNJD-SSDOTTSWSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- KQZLRWGGWXJPOS-NLFPWZOASA-N 1-[(1R)-1-(2,4-dichlorophenyl)ethyl]-6-[(4S,5R)-4-[(2S)-2-(hydroxymethyl)pyrrolidin-1-yl]-5-methylcyclohexen-1-yl]pyrazolo[3,4-b]pyrazine-3-carbonitrile Chemical compound ClC1=C(C=CC(=C1)Cl)[C@@H](C)N1N=C(C=2C1=NC(=CN=2)C1=CC[C@@H]([C@@H](C1)C)N1[C@@H](CCC1)CO)C#N KQZLRWGGWXJPOS-NLFPWZOASA-N 0.000 description 1
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical class C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 1
- PBLNBZIONSLZBU-UHFFFAOYSA-N 1-bromododecane Chemical compound CCCCCCCCCCCCBr PBLNBZIONSLZBU-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- HBEDSQVIWPRPAY-UHFFFAOYSA-N 2,3-dihydrobenzofuran Chemical class C1=CC=C2OCCC2=C1 HBEDSQVIWPRPAY-UHFFFAOYSA-N 0.000 description 1
- XIKPFWZTDXFLRW-UHFFFAOYSA-N 2-(5-nitroindazol-2-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(N2N=C3C=CC(=CC3=C2)[N+]([O-])=O)=C1 XIKPFWZTDXFLRW-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- IEEHKTFVUIVORU-UHFFFAOYSA-N 2-methylpropanedioyl dichloride Chemical compound ClC(=O)C(C)C(Cl)=O IEEHKTFVUIVORU-UHFFFAOYSA-N 0.000 description 1
- HZGTYCFBIJQZMA-UHFFFAOYSA-N 2-sulfanylbenzimidazole-2-sulfonic acid Chemical class C1=CC=CC2=NC(S(=O)(=O)O)(S)N=C21 HZGTYCFBIJQZMA-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical class N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 125000004080 3-carboxypropanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C(O[H])=O 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はハロゲン化銀写真感光材料及びそれを用いた超
硬調ネガ画像形成方法に関するものであり、特に写真製
版工程に用いられるハロゲン化銀写真感光材料に適した
超硬調ネガ型写真感光材料に関するものである。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a silver halide photographic light-sensitive material and a method for forming an ultra-high contrast negative image using the same, and in particular to a silver halide photograph used in a photolithography process. The present invention relates to ultra-high contrast negative type photographic materials suitable for photosensitive materials.
(従来技術)
写真製版の分野においては、印刷物の多様性、複雑性に
対処するために、オリジナル再現性の良好な写真感光材
料、安定な処理液あるいは、補充の簡易化などの要望が
ある。(Prior Art) In the field of photoengraving, in order to deal with the diversity and complexity of printed matter, there are demands for photosensitive materials with good original reproducibility, stable processing solutions, and easy replenishment.
特に線画撮影工程における、原稿は写植文字、手書きの
文字、イラスト、網点化された写真などが貼り込まれて
作られる。したがって原稿には、濃度や、線巾の異なる
画像が混在し、これらの原稿を再現よく仕上げる製版カ
メラ、写真感光材料あるいは、画像形成方法が強く望ま
れている。Particularly in the line drawing process, manuscripts are created by pasting typesetting characters, handwritten characters, illustrations, halftone photographs, etc. Therefore, a document contains images of different densities and line widths, and there is a strong desire for a plate-making camera, a photosensitive material, or an image forming method that can finish these documents with good reproduction.
方、カタログや、大型ポスターの製版には、網写真の拡
大(目伸し)あるいは縮小(目縮め)が広く行なわれ、
網点を拡大して用いる製版では、線数が粗くなりボケた
点の撮影となる。縮小では原稿よりさらに線数/インキ
が大きく細い点の撮影になる。従って網階調の再現性を
維持するためより一層広いラチチュードを有する画像形
成方法が要求されている。On the other hand, enlarging (stretching) or reducing (shrinking) net photographs is widely used in the making of catalogs and large posters.
In plate making that uses enlarged halftone dots, the number of lines becomes coarser, resulting in blurred dots. When reduced, the number of lines/ink is larger than that of the original, resulting in a photograph of a thinner point. Therefore, in order to maintain halftone reproducibility, an image forming method having a wider latitude is required.
製版用カメラの光源としては、ハロゲンランプあるいは
、キセノンランプが用いられている。これらの光源に対
して撮影感度を得るために、写真感光材料は通常オルソ
増感が施される。ところがオルソ増感した写真感光材料
はレンズの色収差の影響をより強く受け、そのために画
質が劣化しやすいことが判明した。またこの劣化はキセ
ノンランプ光源に対してより顕著となる。A halogen lamp or a xenon lamp is used as a light source for a plate-making camera. In order to obtain sensitivity to these light sources, photographic materials are usually orthosensitized. However, it has been discovered that ortho-sensitized photographic materials are more strongly affected by the chromatic aberration of lenses, and as a result, image quality tends to deteriorate. Moreover, this deterioration is more noticeable for xenon lamp light sources.
広いラチチュードの要望に応えるシステムとして塩臭化
銀(すくなくとも塩化銀含有率が50%以上)から成る
リス型ハロゲン化銀感光材料を、亜硫酸イオンの有効濃
度をきわめて低くした(通常0.1モル/1以下)ハイ
ドロキノン現像液で処理することにより、画像部と非画
像部が明瞭に区別された、高いコントラストと高い黒化
濃度をもつ線画あるいは網点画像を得る方法が知られて
いる。しかしこの方法では現像液中の亜硫酸濃度が低い
ため、現像は空気酸化に対して極めて不安定であり、液
活性を安定に保つためにさまざまな努力と工夫がなされ
て使用されていたり、処理スピードが著しく遅い、作業
効率を低下させているのが現状であった。As a system that meets the demands for wide latitude, we use a lithium-type silver halide photosensitive material made of silver chlorobromide (silver chloride content of at least 50% or more) with an extremely low effective concentration of sulfite ions (usually 0.1 mol/min). 1 or less) A method is known in which a line image or a halftone dot image with high contrast and high blackening density, in which image areas and non-image areas are clearly distinguished, is obtained by processing with a hydroquinone developer. However, due to the low concentration of sulfite in the developing solution, this method is extremely unstable to air oxidation, and various efforts and innovations have been made to keep the solution activity stable. Currently, the process is extremely slow, reducing work efficiency.
このため、上記のような現像方法(リス現像システム)
による画像形成の不安定さを解消し、良好な保存安定性
を有する処理液で現像し、超硬調な写真特性が得られる
画像形成システムが要望され、その1つとして米国特許
4,166.742号、同4.168.977号、同4
.221,857号、同4,224,401号、同4.
243739号、同4,272,606号、同4.31
1.781号にみられるように、特定のアシルヒドラジ
ン化合物を添加した表面潜像型ハロゲン化銀写真感光材
料を、pH11,0〜12.3で亜硫酸保恒剤を0.1
5モル/1以上含み、良好な保存安定性を有する現像液
で処理して、Tが10を越える超硬調のネガ画像を形成
するシステムが捉案された。この新しい画像形成システ
ムには、従来の超硬調画像形成では塩化銀含有率の高い
塩臭化銀しか使用できなかったのに対して、沃臭化銀や
塩沃臭化銀でも使用できるという特徴がある。For this reason, the above development method (lith development system)
There is a need for an image forming system that eliminates the instability of image formation caused by the process, develops with a processing solution that has good storage stability, and obtains ultra-high contrast photographic characteristics, and one example of this is U.S. Pat. No. 4.168.977, No. 4
.. No. 221,857, No. 4,224,401, No. 4.
No. 243739, No. 4,272,606, No. 4.31
As seen in No. 1.781, a surface latent image type silver halide photographic light-sensitive material to which a specific acylhydrazine compound has been added is mixed with a sulfite preservative of 0.1 at pH 11.0 to 12.3.
A system has been devised for forming ultra-high contrast negative images with a T of over 10 by processing with a developer containing 5 mol/1 or more and having good storage stability. This new image forming system has the feature that it can also use silver iodobromide and silver chloroiodobromide, whereas conventional ultra-high contrast image formation could only use silver chlorobromide, which has a high silver chloride content. There is.
上記画像システムはシャープな網点品質、処理安定性、
迅速性およびオリジナルの再現性という点ですぐれた性
能を示すが、近年の印刷物の多様性に対処するためにさ
らにオリジナル再現性の改良されたシステムが望まれて
いる。The above image system has sharp halftone dot quality, processing stability,
Although it shows excellent performance in terms of speed and original reproducibility, a system with further improved original reproducibility is desired in order to deal with the variety of printed matter in recent years.
特開昭56−153,336号、同61−156.04
3号、同61−230,135号および同62−296
,138号に酸化により写真有用基を放出するレドック
ス化合物を含む感光材料が示され、階調再現域を広げる
試みが示されている。JP-A-56-153,336, JP-A No. 61-156.04
No. 3, No. 61-230, 135 and No. 62-296
, No. 138 discloses a photographic material containing a redox compound that releases a photographically useful group upon oxidation, and an attempt is made to widen the gradation reproduction range.
しかしながら、ヒドラジン誘導体を用いた超硬調処理シ
ステムではこれらのレドックス化合物は硬調化を阻害す
る弊害があり、その特性を活すことができなかった。However, in ultra-high contrast processing systems using hydrazine derivatives, these redox compounds have the disadvantage of inhibiting high contrast, and their properties cannot be utilized.
(発明の目的)
本発明の目的は、安定性の高い硬調画像作成法において
網階調再現域の広い製版用感光材料を提供することにあ
る。(Object of the Invention) An object of the present invention is to provide a photosensitive material for plate making that has a wide halftone gradation reproduction range in a highly stable high contrast image creation method.
第2に、網階調再現域が広く、かつ、硬調な製版用感光
材料を提供することにある。The second object is to provide a photosensitive material for plate making that has a wide halftone reproduction range and high contrast.
(発明の目的)
本発明の目的は、支持体上に、少なくとも一種のハロゲ
ン化銀乳剤を含む第一のハロゲン化銀乳剤層を有し、該
乳剤層又は他の非感光性親水性コロイド層にヒドラジン
誘導体を含み、かつ第2のハロゲン化銀乳剤層を有し、
該第2の乳剤層に一般式(1)で表わされる化合物を含
むことを特徴とするハロゲン化銀写真感光材料によって
達成された。(Object of the invention) The object of the invention is to have a first silver halide emulsion layer containing at least one silver halide emulsion on a support, the emulsion layer or other non-photosensitive hydrophilic colloid layer. contains a hydrazine derivative and has a second silver halide emulsion layer,
This was achieved by a silver halide photographic material characterized in that the second emulsion layer contains a compound represented by general formula (1).
一般式[Iコ
^
式(1)において、Ql は少なくとも1個のへテロ原
子を含み結合する炭素原子とともに5員環以上の複素環
を形成するに必要な原子群を表わし、R+ はハイドロ
キノン母核に置換可能な基を表わし、Bは、ハイドロキ
ノン母核より脱離後PUGを放出する基を表わし、PU
Gは現像抑制剤を表わし、lは0またはlを表わし、A
およびA′は水素原子または、アルカリで除去されうる
基を表わす。General formula [Ico^ In formula (1), Ql represents an atomic group containing at least one heteroatom and necessary to form a 5-membered or more heterocyclic ring with the bonding carbon atom, and R+ represents a hydroquinone mother group. B represents a group that can be substituted on the nucleus, B represents a group that releases PUG after elimination from the hydroquinone mother nucleus, and PU
G represents a development inhibitor, l represents 0 or l, A
and A' represents a hydrogen atom or a group that can be removed with an alkali.
以下式(1)について説明する。Formula (1) will be explained below.
以下式(1)について詳しく説明する。Formula (1) will be explained in detail below.
Qlは、少なくとも1個のへテロ原子を含む2価の基で
あり、それらの例としては、アミド結合、二価のアミノ
基、エーテル結合、チオエーテル結合、イミノ結合、ス
ルホニル基、カルボニル基アルキレン基、アルケニレン
基などが挙げられ、これらのうちの複数を組み合せた基
でもよく、これらは更に置換基を有していてもよい、た
だし、Qlにエーテル結合を含む場合は、5員環である
ことはない。Ql is a divalent group containing at least one heteroatom, examples of which include amide bond, divalent amino group, ether bond, thioether bond, imino bond, sulfonyl group, carbonyl group, alkylene group , alkenylene groups, etc., and may be a group combining multiple of these, and these may further have a substituent. However, if Ql contains an ether bond, it must be a 5-membered ring. There isn't.
R1にハイドロキノン母俵に置換可能な基であるが、具
体的には、水素原子、1換、無置換のアルキル基(好ま
しくは炭素数/〜30であり、例としてはメチル、エチ
ル、t−ブチル、t−オクチル、ジメチルアミンメチル
、n−はンタデンルなど)、置換、無置換のアリール基
(好ましくは炭素数t〜30であり、フェニル、p−ト
リルなど)、置換・無置換のアルキルチオ基(好ましく
は炭素数/〜30であり、例とじてにn−ブチルチオ、
n−オクチルチオ、5ec−オクチルチオ、テトラデン
ルチオ、λ−ジメチルアミノエチルチオなど)、1換、
無置換のアリールチオ基(好ましくは炭素ばt〜30で
あり、汐りとしてはフェニルチオ、2−力ルホキンフェ
ニルチオ、p−クロロフェニルチオ、コーフ゛トキンー
1−1−オクチルフェニル+、t、 j−メトキ/カ
ルボニルフェニルチオなどン、ハロゲン澹子(F、Q!
、Br、I)、ヒドロキンル基、置換、無置換のアルコ
キノ暴(好ましくは炭素数/〜30であり、Fllとし
てにメトキン、エトキン、ペンジルオキン、オクチルオ
キシ、ドデンルオキンなど)、置換、無置換のアリール
オキ/基(好ましくは炭素数A〜30であり、例とじて
に7二ノキシ、グーカルぞキノフェノキンなど)、置換
、無置換のア/ル基(好ましくは炭素数7〜30であり
、例とじてにアセチル、フロヒオニル、〈ンソイル、ク
ロロアセチル、3−カルボキンプロピオニル、オクタデ
シロイルなど)、置換、無置換のアルコキンカルビニル
基(好ましくは炭素数2〜30であり、例としてはメト
キシカルボニル、エトキシカルボニル、フェノキンカル
ボ′ニル、オクタデンロキン力ルボニル、メトキシエト
キ7カルボ゛ニルなと)、置換、無置換のアミド基(好
ましくに炭素数/〜30であり、例としてはアセタミド
、プロピオナミド、3−カルボ゛キシプロピオナミド基
、ラウロイルアミドなど)、置換、無置換のスルホンア
ミド基(好1しくに炭素数7〜30であり、例とじてに
メタンスルホンアミド、p−トルエンスルホンアミド7
”j ト)、置換、無置換のカル・ぐモイル基(好まし
くは炭素数/〜30であ(ハ例としてにカル・ζモイル
、N−ブチルカル/ζモイル、N−(r−メトモノエチ
ル)カルバモイル、N−オクチル刀ルノξモイル、ピコ
リジノカルボ゛ニル、モルホリノカルボニル、N−へキ
サデンルカル・ぐモイルなと)、1妃無置換のスルファ
モイル基(好ましく(″:炭素数O〜30であり、例と
じてにスルファモイル、ジブチルスルファモイルなど)
、置換、無WPOスルホニル基(好ましくは炭素は/〜
30であり、メタンスルホニル、ベンゼンスルホニル、
p−ドデンルベンゼンスルホニルなど)、へf Ca
5fl 基f 例とじてによ一テトラノ゛リル、−一ベ
ンノ万キ7ノリルなど)?表わす。R1 is a group that can be substituted with hydroquinone, specifically, a hydrogen atom, a monosubstituted or unsubstituted alkyl group (preferably carbon number/~30, examples include methyl, ethyl, t- butyl, t-octyl, dimethylaminemethyl, n-antaddenyl, etc.), substituted or unsubstituted aryl groups (preferably carbon atoms t to 30, such as phenyl, p-tolyl), substituted or unsubstituted alkylthio groups (preferably carbon number/~30, examples include n-butylthio,
n-octylthio, 5ec-octylthio, tetradenruthio, λ-dimethylaminoethylthio, etc.), 1-substituted,
Unsubstituted arylthio group (preferably carbon number t to 30, examples include phenylthio, 2-hydroxyphenylthio, p-chlorophenylthio, carbonylthio-1-1-octylphenyl+, t, j-methoxy) Carbonylphenylthio, etc., halogen (F, Q!
, Br, I), a hydroquine group, a substituted or unsubstituted alkoxy group (preferably carbon number/~30, and as a Fll, metquine, etkyne, penzyluoquine, octyloxy, dodenluoquine, etc.), a substituted or unsubstituted aryl group/ group (preferably has a carbon number of A to 30, examples include 7dinoxy, goukalzoquinofenoquine, etc.), substituted or unsubstituted a/l groups (preferably has a carbon number of 7 to 30, examples include acetyl, furohionyl, <nsoyl, chloroacetyl, 3-carboxypropionyl, octadecyloyl, etc.), substituted or unsubstituted alkoxycarbonyl groups (preferably having 2 to 30 carbon atoms, examples include methoxycarbonyl, ethoxycarbonyl, fenoquine carbonyl, octadenroquine carbonyl, methoxyethoxy7carbonyl), substituted or unsubstituted amide groups (preferably carbon number/~30, examples include acetamide, propionamide, 3-carboxyl), propionamide group, lauroylamide, etc.), substituted or unsubstituted sulfonamide group (preferably has 7 to 30 carbon atoms, examples include methanesulfonamide, p-toluenesulfonamide, etc.)
"j), a substituted or unsubstituted carbamoyl group (preferably carbon number/~30), examples include carbamoyl, N-butylcal/zemoyl, N-(r-methmonoethyl)carbamoyl , N-octyl ξmoyl, picolidinocarbonyl, morpholinocarbonyl, N-hexadelene carbonyl), unsubstituted sulfamoyl group (preferably ('': carbon number O to 30, e.g. sulfamoyl, dibutylsulfamoyl, etc.)
, substituted, non-WPO sulfonyl group (preferably carbon is /~
30, methanesulfonyl, benzenesulfonyl,
p-dodenlebenzenesulfonyl, etc.), fCa
5fl Group f Examples are 1-tetranoryl, -1-bennomyl, 7-noryl, etc.)? represent.
式CI)において、
AおよびA′がアルカリ(でより除去さnうる基(以下
、プレカーサー基という)?表r)丁とき、好ましくに
アンル基、アルニヤ/カルボニル基、アリールオキンカ
ルiニル話、カルバモイル基、イミドイル基、オキサノ
リル基、スル丁ニル基7−。In formula CI), when A and A' are a group that can be removed by an alkali (hereinafter referred to as a precursor group), it is preferably an anru group, an alnia/carbonyl group, an aryloquine group, , carbamoyl group, imidoyl group, oxanolyl group, sulfonyl group 7-.
どの刃口水分解されうる基、米国特許舅弘、009゜0
2り号に記載の逆マイケル反応?利用した型のゾレカー
サー基、米国特許第≠、310,612号に記載の環開
裂反応の後発生したアニオンを分子内求核基として利用
する型のプレカーサー基、米国特許第3.6714,1
Atr号、同J、932゜グ10号もしくは同3.タタ
3.tt1号に記載のアニオンが共役系を介して電子移
動しそれにより開裂反応を起こさせるプレカーサー基、
米国特許第≠、336,200号に記載の環開裂後反応
したアニオンの電子移動により開裂反応を起こさせるプ
レカーサー基またに米国特訂第≠、3t3゜rtr号、
同a、<ilo、tie号に記Vのイミドメチル基?利
用したプレカーす一基が挙げられる。Which cutting edge water-decomposable group, U.S. Pat.
Reverse Michael reaction described in issue 2? Zolecursor groups of the type utilized, U.S. Pat.
Atr No., J, 932゜G No. 10 or No. 3. Tata 3. a precursor group in which the anion described in tt1 transfers electrons via a conjugated system and thereby causes a cleavage reaction;
Precursor group that causes a cleavage reaction by electron transfer of the anion reacted after ring cleavage as described in U.S. Patent No. ≠, 336,200;
Same a, <ilo, imidomethyl group of notation V in tie number? One example is a preliminary car that was used.
式〔I〕、において
Bで表わされる基に、ハイドロキノン母核が現像時に現
像主薬酸化体により、欧化されキノ7体となった後、0
+B+、PUG k放出し、さらにその後PUGk放
出しうる2価の基?表わし、タイミング調節機能を有し
ていてもよく、また、もう−分子の現像生薬酸化体と反
応してPUGi放出する −″ 酸化還
元基であってもよい。ここで、lがOの場合に、PUG
が直接、ハイドロキノン母核に結合している場合を意味
し、lが2以上の場合には、同じあるいに異なるBの2
つ以上の組合せを表わす。In the group represented by B in formula [I], after the hydroquinone core is converted into a quino-7 form by an oxidized developing agent during development, 0
+B+, a divalent group that releases PUG k and can subsequently release PUGk? It may have a timing adjustment function, or it may be an oxidation-reduction group that reacts with the oxidized herbal drug of the molecule to release PUGi.Here, when l is O, ,PUG
means the case where is directly bonded to the hydroquinone mother nucleus, and when l is 2 or more, 2 of the same or different B
Represents a combination of two or more.
Bがタイミング調節機能ヲ有する二価の連結基である場
合、それらの例とじてに、以下のものが挙げられる。When B is a divalent linking group having a timing adjustment function, examples thereof include the following.
(1)ヘミアセタールの開裂反応を利用する基例えば米
国特評第≠、/4Z4.39を号、特開昭6o−21,
tyit、tr号オヨび同10−14’ 9 /≠り号
に記載があり下記一般式で表わさnる基である。ここに
*印に式〔I〕において左側に結合する位置を表わし、
**印に式CI)に2いて右側に結合する位!を表わす
。(1) Groups that utilize the cleavage reaction of hemiacetal, such as U.S. Special Review No.
It is a group represented by the following general formula and is described in No. tyit, No. tr. Here, the * mark represents the bonding position on the left side in formula [I],
** mark is 2 in formula CI) and the bonding position on the right side! represents.
一般式(T−/)
式中、Wにば素原子、イオウ原子またIrXN−R67
基を表わし、R65およびR66は水素原子または置換
基を表わし、R67に置換基全表わし、tに/またに、
2を表わ丁。tが2のとき2つの−W−C−に同じもの
もしくに異なるもの全表わす。R65およびR66が置
換基を表わすときおよびR67の代表的な例に各々R6
9基、R69C〇−基、R69So2−基、R69N
G O−基またにR69NS02−基などR70R70
が掌げられる。ここでR69に脂肪族基、芳香族基また
に複素環基を表わし、R70ぼ脂肪原基、芳香涙基、複
素環基寸た(グ水素原子を表わ丁。R65、’Rssお
よびR67の各々に一価基全表わし、連結し、環状構造
を形成する場合も包含される。一般式(T−/)で表わ
される基の具体昨夕りとしては以下のような基が挙げら
れる。General formula (T-/) In the formula, W represents a boron atom, a sulfur atom or an IrXN-R67 group, R65 and R66 represent a hydrogen atom or a substituent, R67 represents all substituents, and t/or ,
2 is displayed. When t is 2, two -W-C- represent the same or different things. When R65 and R66 represent a substituent, and in a representative example of R67, R6
9 groups, R69C〇- group, R69So2- group, R69N
G O- group and R70R70 such as R69NS02- group are included. Here, R69 represents an aliphatic group, an aromatic group, or a heterocyclic group, and R70 represents an aliphatic radical, an aromatic radical, or a heterocyclic group (represents a hydrogen atom). The case where each monovalent group is fully represented and connected to form a cyclic structure is also included.Specific examples of the group represented by the general formula (T-/) include the following groups.
H3
(2) 分子内求核置換反応を利用して開裂反応を起
こさせる基
例えば米国特許第ダ1.2≠♂、り62号に記載のある
タイミング基が挙げられる。下記一般式で表わすことが
できる。H3 (2) A group that causes a cleavage reaction using an intramolecular nucleophilic substitution reaction Examples include timing groups described in US Pat. It can be expressed by the following general formula.
一般式(T−λン
*−O
*−Nu−L i n k−E −**式中、*印は式
CI)において左側に結合する位置全表わし、**印は
式CI)において右ツリに結合する位置を表わし、Nu
に求杉基を表わし、酸素原子またにイオウ原子が求核種
の例であり、Eに求電子基金表わし、Nuより求核攻撃
を受けて**印との結合を開裂できる基でありLink
にNuとEとが分子内求核置換反応することができるよ
うに立体的に関係づける連紹基を表わす。General formula (T-λn *-O *-Nu-L i n k-E -**In the formula, the * mark represents all positions bonded to the left side in formula CI), and the ** mark represents all positions bonded to the left side in formula CI). Represents the position to join the tree, Nu
represents a cedar group, an oxygen atom or a sulfur atom is an example of a nucleophilic species, and E represents an electrophilic group, which is a group that can cleave the bond with the mark ** upon receiving a nucleophilic attack from Nu. Link
represents a linked introduction group that sterically relates Nu and E so that they can undergo an intramolecular nucleophilic substitution reaction.
一般式(T−2)で表わされる基の具体yllとじてに
例えば以下のものである。Specific examples of the group represented by general formula (T-2) are as follows.
*−〇
*−0
(3)共役系に沿った電子移動反応を利用して開裂反応
を起こさせる基。*-〇*-0 (3) A group that causes a cleavage reaction using an electron transfer reaction along a conjugated system.
例えば、米国特旺第グ、≠Oり、3−3号またに同≠、
≠27.t≠!号に記載があり下記一般式で表わされる
基である。For example, U.S. Special Forces No. 3, No. 3-3,
≠27. t≠! It is a group described in No. 1 and represented by the following general formula.
一般式CI−j )
式中、*印、**印、W、 R65、R66およびtに
(T−/)について説明したのと同じ意味を表わす。具
体的には以下のような基が挙げられる。General formula CI-j) In the formula, *, **, W, R65, R66 and t have the same meaning as explained for (T-/). Specifically, the following groups may be mentioned.
(4)エステルの加水分解による開裂反応を利用する基
。(4) A group that utilizes a cleavage reaction due to ester hydrolysis.
例えば西独公開特杆第j、Aコz、3/よ号に記載のあ
る連結基であり以下の基が挙げられる。For example, the linking groups described in West German Published Patent Application No. J, Akoz, 3/Y include the following groups.
式中*印および**印に式(T−/)について説明した
のと同じ意味である。The * and ** marks in the formula have the same meaning as explained for the formula (T-/).
一般式(T−弘) 一般式(T−j)S
I II*−o−c
−** *−5−c−**(5) イミ7
ヶタールの開裂反応を利用する基。General formula (T-Hiroshi) General formula (T-j) S I II*-o-c
-** *-5-c-**(5) Imi7
A group that utilizes the catalytic cleavage reaction.
例えば米国特許第1t 、!4t 、073号に記載の
ある連結基であり、以下の式で表わされる基である。For example, US Patent No. 1t! 4t, No. 073, and is a group represented by the following formula.
一般式(T−A)
式中、*印、**印およびWは式(T−/)において説
明したのと同じ意味であり、Ft6aにR67と同じ意
味を表わす。式(T−&)で表わされる基の具体例とじ
てに以下の基が挙げられる。General formula (TA) In the formula, *, ** and W have the same meaning as explained in formula (T-/), and Ft6a has the same meaning as R67. Specific examples of the group represented by formula (T-&) include the following groups.
一般式(1)においてBで表わされる基がハイドロキノ
ン母核より開裂して酸化還元基となる基を表わすとき、
好ましくは下記一般式(R−1)で表わされる。When the group represented by B in general formula (1) represents a group that becomes a redox group by cleavage from the hydroquinone core,
It is preferably represented by the following general formula (R-1).
一般式(R−1>
*−P−(X=Y)、−Q−A
式中、PおよびQはそれぞれ独立に酸素原子または置換
もしくは無置換のイミノ基を表わし、n個のXおよびY
の少なくとも1個は−PUGを置換基として有するメチ
ン基を表わし、その他のXおよびYは置換もしくは無置
換のメチン基または窒素原子を表わし、nは1ないし3
の整数を表わしくn個のX、n個のYは同じものもしく
は異なるものを表わす)、Aは水素原子またはアルカリ
により除去されうる基を表わし、式(1)におけるAと
同じ意味を持つ、ここでP、X、Y、QおよびAのいず
れか2つの置換基が2価基となって連結し環状構造を形
成する場合も包含される0例えば(X=Y)、がベンゼ
ン環、ピリジン環などを形成する場合である。General formula (R-1> *-P-(X=Y), -Q-A In the formula, P and Q each independently represent an oxygen atom or a substituted or unsubstituted imino group, and n X and Y
At least one of represents a methine group having -PUG as a substituent, the other X and Y represent a substituted or unsubstituted methine group or a nitrogen atom, and n is 1 to 3
represents an integer of n X and n Y represent the same or different), A represents a hydrogen atom or a group that can be removed by an alkali, and has the same meaning as A in formula (1), Here, the case where any two substituents of P, X, Y, Q and A become divalent groups and connect to form a cyclic structure is also included. This is the case when forming a ring or the like.
PおよびQが置換または無置換のイミノ基を表わすとき
、好ましくはスルホニル基またはアシル基で置換された
イミノ基であるときである。When P and Q represent a substituted or unsubstituted imino group, preferably an imino group substituted with a sulfonyl group or an acyl group.
このときPおよびQは下記のように表わされる。At this time, P and Q are expressed as follows.
一般式(N−1) 一般式(N−2)sow
−c
o−G
ここに*印はAと結合する位置を表わし、**印は−(
X=Y)、−の自由結合手の一方と結合する位置を表わ
す。General formula (N-1) General formula (N-2) sow
-c o-G Here, the * mark represents the bonding position with A, and the ** mark indicates -(
X=Y), represents the bonding position with one of the free bonds of -.
式中、Gで表わされる基は炭素数1〜32、好ましくは
1〜22の直鎖または分岐、鎖状または環状、飽和また
は不飽和、置換または無置換の脂肪族基(例えばメチル
、エチル、ベンジル、フェノキシブチル、イソプロピル
)、炭素数6〜10の置換または無置換の芳香族基(例
えばフェニル基、4−メチルフェニル基、1−ナフチル
基、4ドデシルオキシフエニル基など)、またはへテロ
原子として窒素原子、イオウ原子もしくは酸素原子より
選ばれる4員ないし7員環の複素環基(例えば2−ピリ
ジル基、1−フェニル−4−イミダゾリル基、2−フリ
ル基、ベンゾチエニル基など)が好ましい例である。In the formula, the group represented by G is a straight chain or branched, chain or cyclic, saturated or unsaturated, substituted or unsubstituted aliphatic group having 1 to 32 carbon atoms, preferably 1 to 22 carbon atoms (for example, methyl, ethyl, benzyl, phenoxybutyl, isopropyl), a substituted or unsubstituted aromatic group having 6 to 10 carbon atoms (e.g. phenyl group, 4-methylphenyl group, 1-naphthyl group, 4-dodecyloxyphenyl group, etc.), or hetero A 4- to 7-membered heterocyclic group selected from a nitrogen atom, a sulfur atom, or an oxygen atom (e.g., 2-pyridyl group, 1-phenyl-4-imidazolyl group, 2-furyl group, benzothienyl group, etc.) This is a preferable example.
−a式(R−1)においてPおよびQは好ましくはそれ
ぞれ独立に酸素原子または一般式(Nl)で表わされる
基である。-a In formula (R-1), P and Q are preferably each independently an oxygen atom or a group represented by general formula (Nl).
一般式(R−1)において好ましくはPが酸素原子を表
わし、Aが水素原子を表わすときである。In general formula (R-1), preferably P represents an oxygen atom and A represents a hydrogen atom.
一般式(R−1)においてさらに好ましくは、Xおよび
Yが、置換基としてPUGを有するメチン基である場合
を除いて他のXおよびYが置換もしくは無置換のメチン
基であるときである。More preferably in general formula (R-1), except when X and Y are methine groups having PUG as a substituent, the other X and Y are substituted or unsubstituted methine groups.
一般式(R−1)で表わされる基において特に好ましい
基は下記一般式(R−2)または(R−3)で表わされ
るものである。Among the groups represented by the general formula (R-1), particularly preferred groups are those represented by the following general formula (R-2) or (R-3).
一般式(R−2)
一般式(R−3)
式中、本印はハイドロキノン母核と結合する位置を表わ
し、本本印はPUGと結合する位置を表わす。General Formula (R-2) General Formula (R-3) In the formula, this mark represents the position where it binds to the hydroquinone core, and this mark represents the position where it binds to PUG.
R44は置換基を表わし、qは0、lないし3の整数を
表わす、qが2以上のとき2つ以上のRa4は同じでも
異なっていてもよく、また2つのRh4が隣接する炭素
上の置換基であるときにはそれぞれ2価基となって連結
し環上構造を表わす場合も包含する。そのときはベンゼ
ン縮合環となり例えばナフタレン類、ベンゾノルボルネ
ン類、クロマン類、インドール類、ベンゾチオフェン類
、キノリン類、ベンゾフランl[,2,3−ジヒドロベ
ンゾフラン類、インダン類、またはインデン類などの環
構造となり、これらはさらに1個以上の置換基を有して
もよい、これらの縮合環に置換基を有するときの好まし
い置換基の例、およびRbaが縮合環を形成していない
ときのRbaの好ましい例は以下に挙げるものである。R44 represents a substituent, q represents an integer of 0, 1 to 3, when q is 2 or more, two or more Ra4 may be the same or different, and two Rh4 are substituted on adjacent carbons. When it is a group, it also includes the case where each becomes a divalent group and is connected to represent a cyclic structure. In that case, a benzene condensed ring is formed, such as a ring structure such as naphthalenes, benzonorbornenes, chromans, indoles, benzothiophenes, quinolines, benzofuran l[, 2,3-dihydrobenzofurans, indanes, or indenes. and these may further have one or more substituents, examples of preferred substituents when these fused rings have a substituent, and preferred examples of Rba when Rba does not form a fused ring Examples are listed below.
すなわち、アルコキシ基(例えばメトキシ基、エトキシ
基など)、アシルアミノ基(例えばアセドアミド基、ベ
ンズアミド基など)、スルホンアミド基(例えばメタン
スルホンアミド基、ベンゼンスルホンアミド基など)、
アルキルチオ基(例えばメチルチオ基、エチルチオ基な
ど)、カルバモイル基(例えばN−プロピルカルバモイ
ル基、N−t−ブチルカルバモイル基、N−1−プロピ
ルカルバモイル基など)、アルコキシカルボニル基(例
えばメトキシカルボニル基、プロポキシカルボニル基、
など)、脂肪族基(例えばメチル基、t−ブチル基など
)、ハロゲン原子(例えばフルオロ基、クロロ基など)
、スルファモイル基(例えばN−プロピルスルファモイ
ル基、スルファモイル基など)、アシル基(例えばアセ
チル基、ベンゾイル基など)、ヒドロキシル基、カルボ
キシル基、またはへテロ環チオ基(例えば1−フェニル
テトラゾリル−5−チオ基、1〜エチルテトラゾリル−
5−チオ基など後述のPUGで表わされる基)が挙げら
れる。またR64が2つ連結し環状構造を形成する場合
の代表的な例としては本−〇
(本印および**印は一般式(R−3)で説明したのと
同じ意味を表わす)が挙げられる。That is, alkoxy groups (for example, methoxy groups, ethoxy groups, etc.), acylamino groups (for example, acedoamide groups, benzamide groups, etc.), sulfonamide groups (for example, methanesulfonamide groups, benzenesulfonamide groups, etc.),
Alkylthio groups (e.g., methylthio group, ethylthio group, etc.), carbamoyl groups (e.g., N-propylcarbamoyl group, N-t-butylcarbamoyl group, N-1-propylcarbamoyl group, etc.), alkoxycarbonyl groups (e.g., methoxycarbonyl group, propoxycarbonyl group, etc.) carbonyl group,
), aliphatic groups (e.g. methyl group, t-butyl group, etc.), halogen atoms (e.g. fluoro group, chloro group, etc.)
, sulfamoyl group (e.g. N-propylsulfamoyl group, sulfamoyl group, etc.), acyl group (e.g. acetyl group, benzoyl group, etc.), hydroxyl group, carboxyl group, or heterocyclic thio group (e.g. 1-phenyltetrazolyl group). -5-thio group, 1-ethyltetrazolyl-
Groups such as a 5-thio group (represented by PUG, which will be described later) can be mentioned. In addition, a typical example of a case where two R64s are linked to form a cyclic structure is this-〇 (this mark and ** mark represent the same meaning as explained in general formula (R-3)). It will be done.
一般式(1)においてPLIGで表わされる基は現像抑
制剤を表わす、詳しくはテトラゾリルチオ基、ベンゾイ
ミダゾリルチオ基、ベンゾチアジアゾリルチオ基、ヘン
ジオキサゾリルチオ基、ヘンシトリアゾリル基、ペンゾ
インダゾリル基、トリアゾリルチオ基、オキサジアゾリ
ルチオ基、イミダゾリルチオ基、チアジアゾリルチオ基
、チオエーテル置換トリアゾリル基(例えば米国特許第
4579.816号に記載のある現像抑制剤)またはオ
キサゾリルチオ基などでありこれらは適宜、置換基を有
してもよく、好ましい置換基としては以下のものが挙げ
られる。すなわち、R7を基、RyeO−基、R7q
S−基、R,,0CO−基、R? ?OS Oを−基、
ハロゲン原子、シアノ基、ニトロ基、R着SO!−基、
RtmCO−基、RvyCOO−基、RytSOgN−
基、ts
Ry*NSOg−基、RtsNCO−基、R?雫
R’9R7!
R?f
RtmNCON−基、Rt、So、o−基、またはRy
* Rs。In the general formula (1), the group represented by PLIG represents a development inhibitor, specifically a tetrazolylthio group, a benzimidazolylthio group, a benzothiadiazolylthio group, a hendioxazolylthio group, a henzytriazolyl group, a penzoindazoylthio group. a lyl group, a triazolylthio group, an oxadiazolylthio group, an imidazolylthio group, a thiadiazolylthio group, a thioether-substituted triazolyl group (for example, the development inhibitor described in U.S. Pat. No. 4,579,816), or an oxazolylthio group; may have a substituent as appropriate, and preferred substituents include the following. That is, R7 is a group, RyeO- group, R7q
S- group, R,,0CO- group, R? ? OS O - group,
Halogen atoms, cyano groups, nitro groups, R-attached SO! - group,
RtmCO- group, RvyCOO- group, RytSOgN-
group, ts Ry*NSOg- group, RtsNCO- group, R? drop
R'9R7! R? f RtmNCON- group, Rt, So, o- group, or Ry
*Rs.
脂肪族基、芳香族基または複素環基を表わし、R□、R
??およびR,。は脂肪族基、芳香族基、複素環基また
は水素原子を表わす。−分子中にRffff、R’a、
R??およびR8゜が2個以上あるときこれらが連結し
て環(例えばベンゼン環)を形成してもよい、ここで脂
肪族基とは炭素数1〜20、好ましくは1〜10の飽和
もしくは不飽和、分岐もしくは直鎖、鎖状もしくは環状
、置換もしくは無置換の脂肪族炭化水素基である。芳香
族基とは炭素数6〜20、好ましくは6〜10の置換も
しくは無置換のフェニル基または置換もしくは無置換の
ナフチル基である。複素環基とは炭素数1〜18、好ま
しくは1〜7の、複素原子として窒素原子、イオウ原子
もしくは酸素原子より選ばれる。飽和もしくは不飽和の
、置換もしくは無置換の複素環基であり、好ましくは4
員ないし8員環の複素環基である。これらの脂肪族基、
芳香族基および複素環基が置換基を有するとき、置換基
の例としては前記現像抑制剤の例として挙げた複素環チ
オ基または複素環基の有してもよい置換基として列挙し
た置換基が挙げられる。Represents an aliphatic group, aromatic group or heterocyclic group, R□, R
? ? and R,. represents an aliphatic group, an aromatic group, a heterocyclic group or a hydrogen atom. -Rffff, R'a, in the molecule
R? ? and when there are two or more R8゜s, these may be linked to form a ring (for example, a benzene ring). Here, an aliphatic group is a saturated or unsaturated group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms. , branched or straight chain, chain or cyclic, substituted or unsubstituted aliphatic hydrocarbon group. The aromatic group is a substituted or unsubstituted phenyl group or a substituted or unsubstituted naphthyl group having 6 to 20 carbon atoms, preferably 6 to 10 carbon atoms. The heterocyclic group has 1 to 18 carbon atoms, preferably 1 to 7 carbon atoms, and the hetero atom is selected from a nitrogen atom, a sulfur atom, or an oxygen atom. A saturated or unsaturated, substituted or unsubstituted heterocyclic group, preferably 4
It is a heterocyclic group having 8- to 8-membered rings. These aliphatic groups,
When the aromatic group and the heterocyclic group have a substituent, examples of the substituent include the heterocyclic thio group listed as an example of the development inhibitor or the substituents listed as optional substituents of the heterocyclic group. can be mentioned.
一般式(1)において特に好ましい現像抑制剤は、開裂
したときは現像抑制性を有する化合物であるが、それが
発色現像液中に流れ出した後は、実質的に写真性に影響
を与えない化合物に分解される(もしくは変化する)性
質を有する現像抑制剤である。Particularly preferred development inhibitors in general formula (1) are compounds that have development inhibitory properties when cleaved, but do not substantially affect photographic properties after flowing out into the color developer. It is a development inhibitor that has the property of being decomposed (or changed) into
例えば米国特許第4.477.563号、特開昭60−
218644号、同60−221750号、同60−2
33650号、または同61−11743号に記載のあ
る現像抑制剤が挙げられる。For example, U.S. Pat.
No. 218644, No. 60-221750, No. 60-2
Examples thereof include development inhibitors described in No. 33650 and No. 61-11743.
式〔1〕において、Qlは好ましくは
N−Co−Q”−で表わされ、Q”+71例としては二
価のアミノ基、エーテル結合、チオエーテル結合、アル
キレン基、エチレン結合、イミノ結合、スルホニル基、
カルボニル基、了り−レン基、二価のへテロ環基、これ
らの複数を組み合せた基が挙げられる。In formula [1], Ql is preferably represented by N-Co-Q"-, and examples of Q"+71 include a divalent amino group, an ether bond, a thioether bond, an alkylene group, an ethylene bond, an imino bond, and a sulfonyl group. basis,
Examples thereof include a carbonyl group, an arylene group, a divalent heterocyclic group, and a combination of a plurality of these groups.
RBは水素原子、アルキル基(置換基を有するものを含
む、好ましくは炭素数1〜10.例えばメチル、エチル
、イソプロピル、ブチル、シクロヘキシル、2−メトキ
シエチル、ベンジル、アリール)、アリール基・(N換
基を有するものを含む。RB is a hydrogen atom, an alkyl group (including those having a substituent, preferably having 1 to 10 carbon atoms; for example, methyl, ethyl, isopropyl, butyl, cyclohexyl, 2-methoxyethyl, benzyl, aryl), an aryl group (N Including those with substituents.
好ましくは炭素数6〜120例えばフェニル、Pトリル
)または複素環(置換基を有するものを含む、好ましく
は炭素数3〜10.例えば2−ピリジル、2−イミダゾ
リル、2−フリル)を表わす R1O中で好ましいもの
は水素原子である。R1O preferably represents a carbon number of 6 to 120 (for example, phenyl, P-tolyl) or a heterocycle (including those having substituents, preferably 3 to 10 carbon atoms, for example, 2-pyridyl, 2-imidazolyl, 2-furyl) The preferred one is a hydrogen atom.
R1としては、水素原子あるいは、ハメットの置換基定
数σpで0以上の置換基が好ましく、それらの例として
は、前述のR1で説明した置換基の中から、ハロゲン原
子、置換または無置換のアシル基、アルコキシカルボニ
ル基、アミド基、スルホンアミド基、カルバモイル基、
スルファモイル基、スルホニル基、ホルミル基、シアノ
基、置換メチル基(例えばクロロメチル、トリフルオロ
メチル、ヒドロキシメチル、ベンジルなど)、ヘテロ環
残基などが挙げられる。R1 is preferably a hydrogen atom or a substituent whose Hammett's substituent constant σp is 0 or more, and examples thereof include a halogen atom, substituted or unsubstituted acyl, and group, alkoxycarbonyl group, amide group, sulfonamide group, carbamoyl group,
Examples thereof include a sulfamoyl group, a sulfonyl group, a formyl group, a cyano group, a substituted methyl group (eg, chloromethyl, trifluoromethyl, hydroxymethyl, benzyl, etc.), and a heterocyclic residue.
Q’を含むヘテロ環の環員数としては5から7員環が好
ましく、その中でも下記式(If)で示される化合物が
さらに好ましい。The number of ring members of the heterocycle containing Q' is preferably 5 to 7 members, and among these, the compound represented by the following formula (If) is more preferred.
式[n]において、Q8は前述と同じ意味を持ち、R’
、A、A’、B、PUGおよびlは式[1]と同じ意
味を持つ。In formula [n], Q8 has the same meaning as above, and R'
, A, A', B, PUG and l have the same meaning as in formula [1].
以下に本発明に用いられる化合物の具体例を列記するが
本発明はこれらに限られるものではない。Specific examples of the compounds used in the present invention are listed below, but the present invention is not limited thereto.
H CB。H C.B.
NO!
NU!
0■
H
H
H
H
COOCsHtn
tHs
以下に具体的な化合物の合成例を示すが、本発明で用い
られる化合物は同様の方法で容易に合成することができ
る。NO! Nu! 0■ H H H H COOCsHtn tHs Specific synthesis examples of compounds are shown below, but the compounds used in the present invention can be easily synthesized by a similar method.
合成例(例示化合物(1)の合成)
(1−A)
(1−B)
(1−C)
(1−D)
(1−E)
(1−F)
(1−G)
(1−H)
□ 例示化合物
1)(1−A)の合成
2.5−ジメトキシアニリン31(g)とピリジン17
(+d)をアセトニトリル350(m)に加え、これに
メチルマロニルクロライ)’20(Nl)をアセトニト
リル50(m)に加えた溶液を滴下した。室温で5時間
撹拌後、水を加え酢酸エチルにて抽出、水洗、乾燥後、
′I4縮した。残留分を酢酸エチル、n−へキサンの混
合溶媒にて晶析、標記化合物31(g)を得た。Synthesis example (synthesis of exemplified compound (1)) (1-A) (1-B) (1-C) (1-D) (1-E) (1-F) (1-G) (1-H ) □ Synthesis of Exemplary Compound 1) (1-A) 2.5-dimethoxyaniline 31 (g) and pyridine 17
(+d) was added to 350 (m) of acetonitrile, and a solution of methylmalonylchloride'20 (Nl) in 50 (m) of acetonitrile was added dropwise thereto. After stirring at room temperature for 5 hours, water was added, extracted with ethyl acetate, washed with water, and dried.
'I4 contracted. The residue was crystallized from a mixed solvent of ethyl acetate and n-hexane to obtain the title compound 31 (g).
2)(1−B)合成
上記で得られた(1−A)5.0 (g)にメタノール
50(ad)を加え、更にロジウムメトキシド28%メ
タノール溶液3.8 (g)を加えた。2) (1-B) Synthesis 50 (ad) of methanol was added to 5.0 (g) of (1-A) obtained above, and further 3.8 (g) of a 28% methanol solution of rhodium methoxide was added. .
室温で10分間撹拌後、n−ドデシルブロマイド4.9
(g)を滴下した0反応混合物を45℃にて3時間撹
拌、放冷後、水に注ぎ、析出した結晶を濾別、水洗、乾
燥した。これをメタノールにて再結晶、標記化合物1.
9 (g)を得た。After stirring for 10 minutes at room temperature, n-dodecyl bromide 4.9
The reaction mixture to which (g) was added dropwise was stirred at 45° C. for 3 hours, left to cool, and then poured into water, and the precipitated crystals were separated by filtration, washed with water, and dried. This was recrystallized from methanol to obtain the title compound 1.
9 (g) was obtained.
3)(1−C)の合成
上記で得られた(1−B)1.8 (g)に5%水酸化
ナトリウム水溶液30(m)、メタノール10(m)を
加え、70〜75℃にて2.5時間撹拌した。放冷後、
反応混合物を塩酸水溶液に注ぎ、析出した結晶を濾別、
水洗、乾燥し、標記化合物1.7 (g)を得た。3) Synthesis of (1-C) 30 (m) of 5% aqueous sodium hydroxide solution and 10 (m) of methanol were added to 1.8 (g) of (1-B) obtained above, and the mixture was heated to 70-75°C. The mixture was stirred for 2.5 hours. After cooling,
The reaction mixture was poured into an aqueous hydrochloric acid solution, and the precipitated crystals were separated by filtration.
After washing with water and drying, 1.7 (g) of the title compound was obtained.
4)(1−D)の合成
上記方法にて得られた(1−C)3.0 (g)にオキ
シ塩化リン15(M&)を加え、1時間加熱還流を行っ
た。放冷後、反応混合物を水に徐々に注ぎ、析出した結
晶を濾別、水洗、乾燥した。これをメタノールにて再結
晶し、標記化合物2. 0(g)を得た。4) Synthesis of (1-D) Phosphorous oxychloride 15 (M&) was added to 3.0 (g) of (1-C) obtained by the above method, and the mixture was heated under reflux for 1 hour. After cooling, the reaction mixture was gradually poured into water, and the precipitated crystals were separated by filtration, washed with water, and dried. This was recrystallized from methanol to obtain the title compound 2. 0 (g) was obtained.
5)(1−E)の合成
上記方法にて得られた(1−D>2.5 (g)にイソ
プロピルアルコール30 (−)、水10(−)を加え
、更に濃硫酸5 (−)を加えた後、8.5時間加熱還
流を行った。放冷後、反応混合物を水に注ぎ、析出した
結晶を濾別、水洗、乾燥し、標記化合物2.0 (g)
を得た。5) Synthesis of (1-E) To (1-D>2.5 (g) obtained by the above method, 30 (-) of isopropyl alcohol and 10 (-) of water were added, and further 5 (-) of concentrated sulfuric acid was added. After adding, the reaction mixture was heated under reflux for 8.5 hours. After cooling, the reaction mixture was poured into water, and the precipitated crystals were separated by filtration, washed with water, and dried to obtain 2.0 (g) of the title compound.
I got it.
6)(1−F)の合成
上記方法にて得られた(1−E)3.5 (g)にイソ
プロピルアルコール110(1d)、水酸化ナトリウム
0.3 (g)に水10(d)を加えた溶液を加え、更
に10%パラジウム炭素1. 0(g)を加えた後、水
素20 (■/cd) 、80〜85℃にて7.5時間
撹拌した。6) Synthesis of (1-F) 3.5 (g) of (1-E) obtained by the above method, 110 (1d) of isopropyl alcohol, 0.3 (g) of sodium hydroxide, 10 (d) of water. Add a solution containing 10% palladium on carbon and add 1. After adding 0 (g) of hydrogen, the mixture was stirred at 80 to 85°C for 7.5 hours under 20 (■/cd) of hydrogen.
放冷後、触媒を濾去、濾液をfM縮した。残留分に水を
注ぎ、析出した結晶を濾別、水洗、乾燥し、標記化合物
2.7 (g)を得た。After cooling, the catalyst was removed by filtration, and the filtrate was subjected to fM condensation. Water was poured into the residue, and the precipitated crystals were separated by filtration, washed with water, and dried to obtain 2.7 (g) of the title compound.
7)(1−G)の合成
上記で得られた(1−F)2.6 (g)に47%臭化
水素酸40(IRl)を加え、3.5時間加熱還流を行
った。放冷後、水を加え酢酸エチルにて抽出、水洗、乾
燥後、濃縮した。残留分をアセトニトリルにて晶析、標
記化合物2.1 (g)を得た。7) Synthesis of (1-G) 47% hydrobromic acid 40 (IRl) was added to 2.6 (g) of (1-F) obtained above, and heated under reflux for 3.5 hours. After cooling, water was added, extracted with ethyl acetate, washed with water, dried, and concentrated. The residue was crystallized from acetonitrile to obtain 2.1 (g) of the title compound.
8)(1−H)の合成
上記で得られた(1−G)2.0 (g)と二酸化マン
ガン6.0 (g)に酢酸エチル150(d)を加え、
室温にて1.5時間撹拌した。不溶物を濾去後、濾液を
濃縮、標記化合物1.9 (g)を得た。8) Synthesis of (1-H) Add 150 (d) of ethyl acetate to 2.0 (g) of (1-G) obtained above and 6.0 (g) of manganese dioxide,
Stirred at room temperature for 1.5 hours. After removing the insoluble matter by filtration, the filtrate was concentrated to obtain 1.9 (g) of the title compound.
9)例示化合物(1)の合成
上記で得られた(1−H)1.8 (g)に塩化メチレ
ン50(sd)を加え、これに5−メルカプ)−1−(
4−ニトロフェニル)−テトラゾール1.23gとp−
)ルエンスルホン酸−水和物o 。9) Synthesis of Exemplified Compound (1) 50 (sd) of methylene chloride was added to 1.8 (g) of (1-H) obtained above, and 5-mercap)-1-(
1.23 g of 4-nitrophenyl)-tetrazole and p-
) Luenesulfonic acid-hydrate o.
1 (g)を加えた後、室温にて1時間撹拌した。After adding 1 (g), the mixture was stirred at room temperature for 1 hour.
析出した結晶を濾別、アセトニトリルにて洗浄後、乾燥
し、標記化合物1.3gを得た。The precipitated crystals were separated by filtration, washed with acetonitrile, and dried to obtain 1.3 g of the title compound.
本発明の一般式(1)の化合物は、1.0×10−7〜
1 、 OX 10−” mol/ rd、好ましくは
1.0XIO−’〜1. OXI O−’ mol/
rrrの範囲内で用いられる。The compound of general formula (1) of the present invention is 1.0×10-7 to
1, OX 10-" mol/rd, preferably 1.0XIO-' to 1.OXI O-' mol/rd
Used within the range of rrr.
本発明の化合物は、適当な水混和性有機溶媒、例えば、
アルコール!!(メタノール、エタノール、プロパツー
ル、フッ素化アルコール)、ケトン類(アセトン、メチ
ルエチルケトン)、ジメチルホルムアミド、ジメチルス
ルホキシド、メチルセルソルブなどに溶解して用いるこ
とができる。The compounds of the invention can be prepared in a suitable water-miscible organic solvent, e.g.
alcohol! ! (methanol, ethanol, propatool, fluorinated alcohol), ketones (acetone, methyl ethyl ketone), dimethyl formamide, dimethyl sulfoxide, methyl cellosolve, etc. for use.
また、既に良く知られている乳化分散力によって、ジブ
チルフタレート、トリクレジルフォスフェート、グリセ
リルトリアセテートあるいはジエチルフタレートなどの
オイルに、酢酸エチルやシクロヘキサノンなどの補助溶
媒を用いて溶解し、機械的に乳化分散物を作成して用い
ることもできる。ある(1.は固体分散法として知られ
ている方法によって、化合物の粉末を水の中にボールミ
ル、コイイドミル、あるいは超音波によって分散して用
いることもできる。In addition, using the well-known emulsifying dispersion power, dibutyl phthalate, tricresyl phosphate, glyceryl triacetate, or diethyl phthalate can be dissolved in oil using an auxiliary solvent such as ethyl acetate or cyclohexanone, and mechanically emulsified. A dispersion can also be prepared and used. (1) can also be used by dispersing the powder of the compound in water using a ball mill, a coid mill, or an ultrasonic wave, by a method known as a solid dispersion method.
本発明に用いられるヒドラジン誘導体は、下記一般式(
IV)によって表わされる化合物が好ましい。The hydrazine derivative used in the present invention has the following general formula (
Preference is given to compounds represented by IV).
一般式(IV’) R,−N−N−G、−R。General formula (IV’) R, -N-N-G, -R.
A、 At
式中、R2は脂肪族基または芳香族基を表わし、R1は
水素原子、アルキル基、アリール基、アルコキシ基、ア
リールオキシ基、アミン基またはヒドラジノ基を表わし
、G1は一〇−基、−SO。A, At In the formula, R2 represents an aliphatic group or an aromatic group, R1 represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amine group, or a hydrazino group, and G1 represents a 10-group. ,-S.O.
II 1111
一基、−8〇−基、−P−基、−C−C−基、チオカル
ボニル基又はイミノメチレン基を表わし、AI、A2は
ともに水素原子あるいは一方が水素原子で他方が置換も
しくは無置換のアルキルスルホニル基、又は置換もしく
は無置換のアリールスルホニル基、又は置換もしくは無
置換のアシル基を表わす。II 1111 represents a monogroup, -80- group, -P- group, -C-C- group, thiocarbonyl group, or iminomethylene group, and AI and A2 are both hydrogen atoms, or one is a hydrogen atom and the other is a substituted or It represents an unsubstituted alkylsulfonyl group, a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group.
一般式(rt/)において、R,で表される脂肪族基は
好ましくは炭素数1〜30のものであって、特に炭素数
1〜20の直鎖、分岐または環状のアルキル基である。In the general formula (rt/), the aliphatic group represented by R preferably has 1 to 30 carbon atoms, particularly a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms.
このアルキル基は置換基を有していてもよい。This alkyl group may have a substituent.
一般式(IV)においてR1で表される芳香族基は単環
または2環のアリール基または不飽和へテロ環基である
。ここで不飽和へテロ環基はアリール基と縮環していて
もよい。In the general formula (IV), the aromatic group represented by R1 is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be fused with an aryl group.
R1として好ましいものはアリール基であり、特に好ま
しくはベンゼン環を含むものである。Preferred as R1 is an aryl group, particularly preferably one containing a benzene ring.
R1の脂肪族基または芳香族基は置換されていてもよく
、代表的な置換基としては例えばアルキル基、アラルキ
ル基、アルケニル基、アルキニル基、アルコキシ基、ア
リール基、置換アミノ基、ウレイド基、ウレタン基、ア
リールオキシ基、スル2アモイル基、カルバモイル基、
アルキルまたはアリールチオ基、アルキルまたはアリー
ルスルホニル基、アルキルまたはアリールスルフィニル
基、ヒドロキシ基、ハロゲン原子、シアノ基、スルホ基
、アリールオキシカルボニル基、アシル基、アルコキシ
カルボニル基、アシルオキシ基、カルボンアミド基、ス
ルホンアミド基、カルボキシル基、リン酸アミド基、ジ
アシルアミノ基、イミドましい置換基としてはアルキル
基(好ましくは炭素数1〜20のもの)、アラルキル基
(好ましくは炭素数7〜30のもの)、アルコキシ基(
好ましくは炭素数1〜20のもの)、置換アミノ基(好
ましくは炭素数1〜20のアルキル基で置換されたアミ
ノ基)、アシルアミノ基(好ましくは炭素数2〜30を
持つもの)、スルホンアミド基(好ましくは炭素数1〜
30を持つもの)、ウレイド基(好ましくは炭素数1〜
30を持つもの)、リン酸アミド基(好ましくは炭素数
1〜30のもの)などである。The aliphatic group or aromatic group of R1 may be substituted, and typical substituents include an alkyl group, an aralkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a substituted amino group, a ureido group, Urethane group, aryloxy group, sulfamoyl group, carbamoyl group,
Alkyl or arylthio group, alkyl or arylsulfonyl group, alkyl or arylsulfinyl group, hydroxy group, halogen atom, cyano group, sulfo group, aryloxycarbonyl group, acyl group, alkoxycarbonyl group, acyloxy group, carbonamide group, sulfonamide Preferred substituents include alkyl groups (preferably those with 1 to 20 carbon atoms), aralkyl groups (preferably those with 7 to 30 carbon atoms), and alkoxy groups. Group (
(preferably one having 1 to 20 carbon atoms), substituted amino group (preferably an amino group substituted with an alkyl group having 1 to 20 carbon atoms), acylamino group (preferably one having 2 to 30 carbon atoms), sulfonamide Group (preferably 1 to 1 carbon atoms)
30), a ureido group (preferably a carbon number of 1 to
30), a phosphoric acid amide group (preferably one having 1 to 30 carbon atoms), and the like.
一般式(IV)においてRtで表わされるアルキル基と
しては、好ましくは炭素数1〜4のアルキル基であり、
アリール基としては単環または2環のアリール基が好ま
しい(例えばベンゼン環を含むもの)。The alkyl group represented by Rt in general formula (IV) is preferably an alkyl group having 1 to 4 carbon atoms,
The aryl group is preferably a monocyclic or bicyclic aryl group (for example, one containing a benzene ring).
I
G、が−C−基の場合、R2で表わされる基のうち好ま
しいものは、水素原子、アルキル基(例えば、メチル基
、トリフルオロメチル基、3−ヒドロキシプロピル基、
3−メタンスルホンアミドプロピル基、フェニルスルホ
ニルメチル基など)、アラルキル基(例えば、0−ヒド
ロキシベンジル基など)、アリール基(例えば、フェニ
ル基、3゜5−ジクロロフェニル基、0−メタンスルホ
ンアミドフェニル基、4−メタンスルホニルフェニル基
、2−ヒドロキシメチルフェニル基など)などであり、
特に水素原子が好ましい。When IG is a -C- group, preferred among the groups represented by R2 are a hydrogen atom, an alkyl group (for example, a methyl group, a trifluoromethyl group, a 3-hydroxypropyl group,
3-methanesulfonamidopropyl group, phenylsulfonylmethyl group, etc.), aralkyl group (e.g., 0-hydroxybenzyl group, etc.), aryl group (e.g., phenyl group, 3°5-dichlorophenyl group, 0-methanesulfonamidophenyl group) , 4-methanesulfonylphenyl group, 2-hydroxymethylphenyl group, etc.),
Particularly preferred is a hydrogen atom.
R2は置換されていても良(、置換基としては、R1に
関して列挙した置換基が適用できる。R2 may be substituted (as the substituent, the substituents listed for R1 can be applied).
○ I 一般式(IV)のGとしては−C−基が最も好ましい。○ I G in general formula (IV) is most preferably a -C- group.
又、R8はG1 R1の部分を残余分子から分裂させ、
G+ Rt部分の原子を含む環式構造を生成させる
環化反応を生起するようなものであってもよく、その例
としては例えば特開昭63−29751号などに記載の
ものが挙げられる。Also, R8 splits the G1 R1 part from the remaining molecules,
It may be one that causes a cyclization reaction to produce a cyclic structure containing an atom of the G+ Rt moiety, and examples thereof include those described in JP-A-63-29751.
A + 、A tとしては水素原子が最も好ましい。A hydrogen atom is most preferable as A+ and At.
一般式(IV)のR1またはR1はその中にカプラー等
の不動性写真用添加剤において常用されているバラスト
基またはポリマーが組み込まれているものでもよい。バ
ラスト基は8以上の炭素数を有する写真性に対して比較
的不活性な基であり、例えばアルキル基、アルコキシ基
、フェニル基、アルキルフェニル基、フェノキシ基、ア
ルキルフェノキシ基などの中から選ぶことができる。ま
たポリマーとしては例えば特開平1−100530号に
記載のものが挙げられる。R1 or R1 in the general formula (IV) may have a ballast group or a polymer commonly used in immobile photographic additives such as couplers incorporated therein. The ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, and may be selected from, for example, an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group, an alkylphenoxy group, etc. I can do it. Examples of the polymer include those described in JP-A-1-100530.
一般式(■)のR3またはR2はその中にハロゲン化銀
粒子表面に対する吸着を強める基が組み込まれているも
のでもよい。かかる吸着基としては、チオ尿素基、複素
環チオアミド基、メルカプト複素環基、トリアゾール基
などの米国特許第4゜385.108号、同4,459
,347号、特開昭59−195,233号、同59−
200゜231号、同59=201,045号、同59
−201.046号、同59−201,047号、同5
9−201,048号、同59−201,049号、特
開昭61−170,733号、同61−270,744
号、同62−948号、特願昭62−67.508号、
同62−67.501号、同62−67.510号に記
載された基があげられる。R3 or R2 in the general formula (■) may have a group incorporated therein to enhance adsorption to the silver halide grain surface. Such adsorption groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups, triazole groups, etc.
, No. 347, JP-A No. 59-195, 233, No. 59-
200° No. 231, No. 59 = No. 201,045, No. 59
-201.046, 59-201,047, 5
9-201,048, 59-201,049, JP-A-61-170,733, JP-A-61-270,744
No. 62-948, patent application No. 62-67.508,
Examples include the groups described in No. 62-67.501 and No. 62-67.510.
一般式(R’)で示される化合物の具体例を以下に示す
。但し本発明は以下の化合物に限定されるものではない
。Specific examples of the compound represented by the general formula (R') are shown below. However, the present invention is not limited to the following compounds.
N−1
■−3
V−5
V−1
■−12
■−13
■−14
V−6
■−10
V−1
V−16
q腎
■−18
■−20
■−25
■−26
■−23
■−24
本発明に用いられるヒドラジン誘導体としては、上記の
ものの他に、RESEARCHDISCLOSURE
Item23516 (1983年11月号、P、34
6)およびそこに引用された文献の他、米国特許4゜0
80.207号、同4,269,929号、同4.27
6.364号、同4,278,748号、同4,385
,108号、同4,459,347号、同4,560,
638号、同4.478. 928号、英国特許2,0
11,391B、特開昭60−179734号、同62
−270,948号、同63−29,751号、同61
−170゜733号、同61−270,744号、同6
2−948号、EP217,310号、またはUS4゜
686.167号、特開昭62−178,246号、同
63−32,538号、同63−104゜047号、同
63−121,838号、同63−129.337号、
同63−223,744号、同63−234,244号
、同63−234,245号、同63−234,246
号、同63−294.552号、同63−306,43
8号、特開平1−100,530号、同1. 105.
941号、同1−105,943号、特開昭64−1
0.233号、特開平1−90,439号、特願昭63
−105,682号、同63−114,118号、同6
3−110,051号、同63−114.119号、同
63−116,239号、同63−147,339号、
同63−”179.760号、同63−229,163
号、特願平1−18.377号、同1−18,378号
、同1−IL379号、同1−15,755号、同1−
16.814号、同1−40,792号、同1−42.
615号、同1−42,616号、同1−123.69
3号、同1−126,284号に記載されたものを用い
ることができる。N-1 ■-3 V-5 V-1 ■-12 ■-13 ■-14 V-6 ■-10 V-1 V-16 q kidney ■-18 ■-20 ■-25 ■-26 ■-23 ■-24 In addition to the above-mentioned hydrazine derivatives used in the present invention, RESEARCH DISCLOSURE
Item23516 (November 1983 issue, P, 34
6) and the documents cited therein, as well as U.S. Pat.
No. 80.207, No. 4,269,929, No. 4.27
No. 6.364, No. 4,278,748, No. 4,385
, No. 108, No. 4,459,347, No. 4,560,
No. 638, 4.478. No. 928, British Patent 2,0
11,391B, JP-A-60-179734, JP-A No. 62
-270,948, 63-29,751, 61
-170゜733, 61-270,744, 6
No. 2-948, EP No. 217,310, or US Pat. No. 63-129.337,
No. 63-223,744, No. 63-234,244, No. 63-234,245, No. 63-234,246
No. 63-294.552, No. 63-306, 43
No. 8, JP-A No. 1-100,530, 1. 105.
No. 941, No. 1-105,943, JP-A-64-1
No. 0.233, Japanese Patent Application Publication No. 1-90,439, Patent Application No. 1983
-105,682, 63-114,118, 6
No. 3-110,051, No. 63-114.119, No. 63-116,239, No. 63-147,339,
63-”179.760, 63-229,163
No., Japanese Patent Application No. 1-18.377, No. 1-18,378, No. 1-IL379, No. 1-15,755, No. 1-
No. 16.814, No. 1-40,792, No. 1-42.
No. 615, No. 1-42, 616, No. 1-123.69
No. 3, No. 1-126,284 can be used.
本発明におけるヒドラジン誘導体の添加量としてはハロ
ゲン化銀1モルあたりlXl0−’モルないし5X10
−”モル含有されるのが好ましく、特にlXl0−’モ
ルないし2X10−2モルの範囲が好ましい添加量であ
る。The amount of the hydrazine derivative added in the present invention is from 1X10-' mole to 5X10 mole per mole of silver halide.
-'' mol is preferable, and a particularly preferable addition amount is in the range of 1X10-' mol to 2X10-2 mol.
第1および第2のハロゲン化銀乳剤層は、支持体上にど
のような順に塗設されても良い。例えば、支持体の上に
順に、第2のハロゲン化銀乳剤層、第1のハロゲン化銀
乳剤層、あるいはこの逆でも良い。また、これらの層の
間に、別の親水性コロイド層を設けてもよい。第2のハ
ロゲン化銀乳剤層、および/もしくは該親水性コロイド
層または他の隣接する親水性コロイド層に、ヒドラジン
誘導体を含むことができる。The first and second silver halide emulsion layers may be coated on the support in any order. For example, the second silver halide emulsion layer and the first silver halide emulsion layer may be placed on the support in this order, or vice versa. Further, another hydrophilic colloid layer may be provided between these layers. The second silver halide emulsion layer and/or the hydrophilic colloid layer or other adjacent hydrophilic colloid layer may contain a hydrazine derivative.
第1の乳剤層は、好ましくは、塗布銀量が0゜01〜2
.0g/rdで、好ましくは、0.05〜1.0g/r
rr、第2の乳剤層の塗布銀量は、0゜5〜7.5g/
rri、好ましくは1.0〜6.0g/イが適当である
。The first emulsion layer preferably has a coated silver amount of 0°01 to 2
.. 0g/rd, preferably 0.05-1.0g/r
rr, the amount of coated silver in the second emulsion layer is 0°5 to 7.5 g/
rri, preferably 1.0 to 6.0 g/i is appropriate.
前述の親水性コロイド層はゼラチンまたは合成ポリマー
(ポリ酢酸ビニル、ポリアクリルアミド、ポリビニルア
ルコールなど)を含み0.1〜5゜0μ、好ましくは、
0.2〜4.0μが適当である。The aforementioned hydrophilic colloid layer contains gelatin or a synthetic polymer (polyvinyl acetate, polyacrylamide, polyvinyl alcohol, etc.) and has a thickness of 0.1 to 5°0μ, preferably
A suitable value is 0.2 to 4.0μ.
本発明の第1および第2のハロゲン化銀乳剤層に用いら
れるハロゲン化銀乳剤は塩化銀、塩臭化銀、沃臭化銀、
沃塩臭化銀、臭化銀等どの組成でもかまわない。The silver halide emulsions used in the first and second silver halide emulsion layers of the present invention include silver chloride, silver chlorobromide, silver iodobromide,
Any composition such as silver iodochlorobromide or silver bromide may be used.
本発明に用いられるハロゲン化銀の平均粒子サイズは微
粒子(例えば0.7μ以下)の方が好ましく、特に0.
5μ以下が好ましい。粒子サイズ分布は基本的には制限
はないが、単分散である方が好ましい。ここでいう単分
散とは重量もしくは粒子数で少なくともその95%が平
均粒子サイズの±40%以内の大きさを持つ粒子群から
構成されていることをいう。The average grain size of the silver halide used in the present invention is preferably fine (for example, 0.7 μm or less), particularly 0.7 μm or less.
It is preferably 5μ or less. There are basically no restrictions on the particle size distribution, but monodisperse distribution is preferable. Monodisperse herein means that at least 95% of the particles by weight or number of particles is composed of particles having a size within ±40% of the average particle size.
写真乳剤中のハロゲン化銀粒子は立方体、八面体のよう
な規則的(regular)な結晶体を有するものでも
よく、また球状、板状などのような変則的(1rrej
ular)な結晶を持つもの、あるいはこれらの結晶形
の複合形を持つものであってもよい。The silver halide grains in the photographic emulsion may have a regular crystal structure such as a cube or an octahedron, or may have an irregular crystal structure such as a spherical shape or a plate shape.
ular) crystals, or a composite form of these crystal forms.
ハロゲン化銀粒子は内部と表層が均一な相から成ってい
ても、異なる相からなっていてもよい。The interior and surface layers of the silver halide grains may be composed of uniform phases or may be composed of different phases.
別々に形成した2種以上のハロゲン化銀乳剤を混合して
使用してもよい。Two or more silver halide emulsions formed separately may be used in combination.
本発明に用いるハロゲン化銀乳剤にはハロゲン化銀粒子
の形成または物理熟成の過程においてカドミウム塩、亜
硫酸塩、鉛塩、タリウム塩、ロジウム塩もしくはその錯
塩、イリジウム塩もしくはその錯塩などを共存させても
よい。In the silver halide emulsion used in the present invention, cadmium salt, sulfite, lead salt, thallium salt, rhodium salt or its complex salt, iridium salt or its complex salt, etc. are allowed to coexist in the silver halide grain formation or physical ripening process. Good too.
本発明の乳剤層又は、その他の親水性コロイド層に、フ
ィルター染料として、あるいはイラジェーション防止そ
の他、種々の目的で、染料を含有してもよい。フィルタ
ー染料としては、写真感度をさらに低めるための染料、
好ましくは、ハロゲン化銀の固有感度域に分光吸収極大
を有する紫外線吸収剤や、明室感光材料として取り扱わ
れる際のセーフライト光に対する安全性を高めるための
、主として350nm〜600nmの領域に実質的な光
吸収をもつ染料が用いられる。The emulsion layer or other hydrophilic colloid layer of the present invention may contain a dye as a filter dye or for various purposes such as preventing irradiation. Filter dyes include dyes to further reduce photographic sensitivity;
Preferably, an ultraviolet absorber having a spectral absorption maximum in the intrinsic sensitivity range of silver halide, or a UV absorber having a spectral absorption maximum in the intrinsic sensitivity region of silver halide, or a UV absorber mainly in the region of 350 nm to 600 nm to increase safety against safelight light when handled as a bright room photosensitive material is preferably used. Dyes with high light absorption are used.
これらの染料は、目的に応じて乳剤層に添加するか、あ
るいはハロゲン化銀乳剤層の上部、即ち、支持体に関し
てハロゲン化銀乳剤層より遠くの非感光性親水性コロイ
ド層に媒染剤とともに添加して固定して用いるのが好ま
しい。These dyes are added to the emulsion layer depending on the purpose, or they are added together with a mordant to the upper part of the silver halide emulsion layer, that is, to the non-light-sensitive hydrophilic colloid layer which is further away from the silver halide emulsion layer with respect to the support. It is preferable to use it by fixing it.
染料のモル吸光係数により異なるが、通常10−2g
/ rd〜1 g/rr?の範囲で添加される。好まし
くは50■〜500■/dである。It varies depending on the molar extinction coefficient of the dye, but usually 10-2 g.
/rd~1g/rr? It is added within the range of Preferably it is 50 to 500 μ/d.
用いられる染料は、各種の公知の特許に開示されている
。例えば、特開昭55−155,350、同55−15
5.351、同52−92716、同56−12639
、同63−27838、米国特許4276373、WO
28104794に記載されている。The dyes used are disclosed in various known patents. For example, JP 55-155,350, JP 55-15
5.351, 52-92716, 56-12639
, No. 63-27838, U.S. Pat. No. 4,276,373, WO
28104794.
また、公知の水溶性染料も用いることができる。Additionally, known water-soluble dyes can also be used.
いくつかの例を次にあげる。Here are some examples:
0sNa
0sNa
写真乳剤の結合剤または保護コロイドとしては、ゼラチ
ンを用いるのが有利であるが、それ以外の親水性コロイ
ドも用いることができる。たとえばゼラチン誘導体、ゼ
ラチンと他の高分子とのグラフトポリマー、アルブミン
、カゼイン等の蛋白質:ヒドロキシエチルセルロース、
カルボキシメチルセルロース、セルロース硫酸エステル
類等の如きセルロース誘導体、アルギン酸ソーダ、澱粉
誘導体などの糖誘導体、ポリビニルアルコール、ポリビ
ニルアルコール部分のアセタール、ポリ−N−ビニルピ
ロリドン、ポリアクリル酸、ポリメタクリル酸、ポリア
クリルアミド、ポリビニルイミダゾール、ポリビニルピ
ラゾール等の単一あるいは共重合体の如き多種の合成親
水性高分子物質を用いることができる。0sNa 0sNa As binder or protective colloid for photographic emulsions, gelatin is advantageously used, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein: hydroxyethyl cellulose,
Cellulose derivatives such as carboxymethylcellulose and cellulose sulfate esters, sugar derivatives such as sodium alginate and starch derivatives, polyvinyl alcohol, acetal of polyvinyl alcohol moiety, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, A wide variety of synthetic hydrophilic polymeric materials can be used, such as single or copolymers of polyvinylimidazole, polyvinylpyrazole, and the like.
ゼラチンとしては石灰処理ゼラチンのほか、酸処理ゼラ
チンを用いてもよく、ゼラチン加水分解物、ゼラチン酵
素分解物も用いることができる。As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin may be used, and gelatin hydrolysates and gelatin enzymatically decomposed products can also be used.
本発明の方法で用いるハロゲン化銀乳剤は化学増感され
ていなくてもよいが、化学増感されていてもよい。ハロ
ゲン化銀乳剤の化学増感の方法として、硫黄増感、還元
増感及び貴金属増感法が知られており、これらのいずれ
をも単独で用いても、又併用して化学増感してもよい。The silver halide emulsion used in the method of the present invention does not need to be chemically sensitized, but may be chemically sensitized. Sulfur sensitization, reduction sensitization, and noble metal sensitization methods are known as methods for chemical sensitization of silver halide emulsions, and any of these methods can be used alone or in combination for chemical sensitization. Good too.
貴金属増感法のうち金増感法はその代表的なもので金化
合物、主として全錯塩を用いる。金以外の貴金属、たと
えば白金、パラジウム、イリジウム等の錯塩を含有して
も差支えない。その具体例は米国特許2,448,06
0号、英国特許618.061号などに記載されている
。Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses a gold compound, mainly a total complex salt. There is no problem in containing complex salts of noble metals other than gold, such as platinum, palladium, and iridium. A specific example is U.S. Patent No. 2,448,06
No. 0, British Patent No. 618.061, etc.
硫黄増感剤としては、ゼラチン中に含まれる硫黄化合物
のほか、種々の硫黄化合物、たとえばチオ硫酸塩、チオ
尿素類、チアゾール類、ローダニン類等を用いることが
できる。As the sulfur sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines, etc. can be used.
還元増感剤としては第一すず塩、アミン類、ホルムアミ
ジンスルフィン酸、シラン化合物などを用いることがで
きる。As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, silane compounds, etc. can be used.
本発明で用いられるハロゲン化銀乳剤層には、公知の分
光増感色素を添加してもよい。A known spectral sensitizing dye may be added to the silver halide emulsion layer used in the present invention.
本発明の感光材料には、感光材料の製造工程、保存中あ
るいは写真処理中のカブリを防止しあるいは写真性能を
安定化させる目的で、種々の化合物を含有させることが
できる。すなわちアゾール類たとえばベンゾチアゾリウ
ム塩、ニトロインダゾール類、クロロベンズイミダゾー
ル類、ブロモベンズイミダゾール類、メルカプトチアゾ
ール類、メルカプトベンゾチアゾール類、メルカプトチ
アジアゾール類、アミノトリアゾール類、ベンゾチアゾ
ール類、ニトロベンゾトリアゾール類、など;メルカプ
トピリミジン類;メルカプトトリアジン類:たとえばオ
キサゾリンチオンのようなチオケト化合物;アザインデ
ン類、たとえばトリアザインデン類、テトラアザインデ
ン類(特に4−ヒドロキシ置換(1,3,3a、7)テ
トラザインデン類)、ペンタアザインデン類など;ベン
ゼンチオスルフォン酸、ベンゼンスルフィン酸、ベンゼ
ンスルフオン酸アミド等のようなカブリ防止剤または安
定剤として知られた多くの化合物を加えることができる
。これらのものの中で、好ましいのはベンゾトリアゾー
ル類(例えば、5−メチル−ベンゾトリアゾール)及び
ニトロインダゾール類(例えば5−ニトロインダゾール
)である。また、これらの化合物を処理液に含有させて
もよい。The light-sensitive material of the present invention may contain various compounds for the purpose of preventing fogging or stabilizing photographic performance during the manufacturing process, storage, or photographic processing of the light-sensitive material. That is, azoles such as benzothiazolium salts, nitroindazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzothiazoles, nitrobenzotriazoles, mercaptopyrimidines; mercaptotriazines: thioketo compounds such as oxazolinthione; azaindenes, such as triazaindenes, tetrazaindenes (particularly 4-hydroxy-substituted (1,3,3a,7) tetrazaindenes); A number of compounds known as antifoggants or stabilizers can be added, such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonic acid amide, etc.), pentaazaindenes, etc.; Among these, preferred are benzotriazoles (eg 5-methyl-benzotriazole) and nitroindazoles (eg 5-nitroindazole). Further, these compounds may be included in the treatment liquid.
本発明の写真感光材料には、写真乳剤層その他の親水性
コロイド層に無機または有機の硬膜剤を含有してよい。The photographic material of the present invention may contain an inorganic or organic hardener in the photographic emulsion layer or other hydrophilic colloid layer.
例えばクロム塩(クロムミョウバンなど)、アルデヒド
類、ゲルタールアルデヒドなど)、N−メチロール化合
物(ジメチロール尿素、など)、ジオキサン誘導体、活
性ビニル化合物(1,3,5−トリアクリロイル−へキ
サヒドロ−5−トリアジン、l、3−ビニルスルホニル
−2−プロパツールなど)、活性ハロゲン化合物(2,
4−ジクロル−6−ヒドロキシ−5−トリアジンなど)
、ムコハロゲン酸類、などを単独または組み合わせて用
いることができる。For example, chromium salts (chromium alum, etc.), aldehydes, geltaraldehyde, etc.), N-methylol compounds (dimethylol urea, etc.), dioxane derivatives, activated vinyl compounds (1,3,5-triacryloyl-hexahydro-5- triazine, l,3-vinylsulfonyl-2-propatol, etc.), active halogen compounds (2,
4-dichloro-6-hydroxy-5-triazine, etc.)
, mucohalogen acids, etc. can be used alone or in combination.
本発明を用いて作られる感光材料の写真乳剤層または他
の親水性コロイド層には塗布助剤、帯電防止、スベリ性
改良、乳化分散、接着防止及び写真特性改良(例えば、
現像促進、硬調化、増感)等種々の目的で、種々の界面
活性剤を含んでもよい。The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material prepared using the present invention may contain coating aids, antistatic properties, smoothness improvement, emulsification dispersion, adhesion prevention, and photographic property improvement (e.g.
Various surfactants may be included for various purposes such as development acceleration, high contrast, and sensitization.
例えばサポニン(ステロイド系)、アルキレンオキサイ
ド誘導体(例えばポリエチレングリコール、ポリエチレ
ングリコール/ポリプロピレングリコール縮金物、ポリ
エチレングリコールアルキルエーテル類又はポリエチレ
ングリコールアルキルアリールエーテル類、ポリエチレ
ングリコールエステル類、ポリエチレングリコールソル
ビタンエステル類、ポリアルキレングリコールアルキル
アミン又はアミド類、シリコーンのポリエチレンオキサ
イド付加物類)、グリシドール誘導体(例えばアルケニ
ルコハク酸ポリグリセリド、アルキルフェノールポリグ
リセリド)、多価アルコールの脂肪酸エステル類、等の
アルキルエステル類などの非イオン性界面活性剤;アル
キルカルボン酸塩、アルキルスルフォン酸塩、アルキル
ベンゼンスルフォン酸塩、アルキルナフタレンスルフォ
ン酸塩、アルキル硫酸エステル類、アルキルリン酸エス
テル類、N−アシル−N−アルキルタウリン類、スルホ
コハク酸エステル類、スルホアルキルポリオキシエチレ
ンアルキルフェニルエーテル類、ポリオキシエチレンア
ルキルリン酸エステル類などのような、カルボキシ基、
スルホ基、ホスホ基、硫酸エステル基、リン酸エステル
基等の酸性基を含むアニオン界面活性剤;アミノ酸類、
アミノアルキルスルホン酸類、アミノアルキル硫酸又は
すン酸エステル類、アルキルベタイン類、アミンオキシ
ド類などの両性界面活性剤:アルキルアミン塩類、脂肪
族あるいは芳香族第4級アンモニウム塩類、ピリジニウ
ム、イミダゾリウムなどの複素環第4級アンモニウム塩
類、及び脂肪族又は複素環を含むホスホニウム又はスル
ホニウム塩類などのカチオン界面活性剤を用いることが
できる。For example, saponins (steroids), alkylene oxide derivatives (e.g. polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, polyalkylene glycols Nonionic surfactants such as alkyl esters such as alkylamines or amides, polyethylene oxide adducts of silicone), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, etc. Agents; alkyl carboxylates, alkyl sulfonates, alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfonate Carboxy groups, such as alkyl polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, etc.
Anionic surfactants containing acidic groups such as sulfo groups, phospho groups, sulfate ester groups, phosphate ester groups; amino acids;
Ampholytic surfactants such as aminoalkyl sulfonic acids, aminoalkyl sulfates or sulfates, alkyl betaines, and amine oxides; alkylamine salts, aliphatic or aromatic quaternary ammonium salts, pyridinium, imidazolium, etc. Cationic surfactants such as heterocyclic quaternary ammonium salts and phosphonium or sulfonium salts containing aliphatic or heterocycles can be used.
特に本発明において好ましく用いられる界面活性剤は特
公昭58−9412号公報に記載された分子量600以
上のポリアルキレンオキサイド類である。又、寸度安定
性の為にポリアルキルアクリレートの如きポリマーラテ
ックスを含有せしめることができる。In particular, surfactants preferably used in the present invention are polyalkylene oxides having a molecular weight of 600 or more described in Japanese Patent Publication No. 58-9412. Additionally, a polymer latex such as polyalkyl acrylate may be included for dimensional stability.
本発明に用いるのに適した現像促進剤あるいは造核伝染
現像の促進剤としては、特開昭53−77616、同5
4−37732、同53−137゜133、同60−1
40,340、同60−14959、などに開示されて
いる化合物の他、N又はS原子を含む各種の化合物が有
効である。Development accelerators or nucleating and infectious development accelerators suitable for use in the present invention include JP-A-53-77616 and JP-A-53-77616;
4-37732, 53-137゜133, 60-1
In addition to the compounds disclosed in US Pat. No. 40,340, No. 60-14959, etc., various compounds containing N or S atoms are effective.
次に具体例を列挙する。Next, specific examples are listed.
2C1@
(CrHs)!NCH2CHCH20H,0H
n−C+HeN(CtH+0H)z
S CkhCkhNくしtHs)zこれらの促進剤
は、化合物の種類によって最適添加量が異なるが1.o
xlo−’〜o、5g/rr?、好ましくは5.0Xl
O−’〜0.1g/mの範囲で用いるのが望ましい。こ
れらの促進剤は適当な溶媒(H,O)メタノールやエタ
ノールなどのアルコール類、アセトン、ジメチルホルム
アミド、メチルセルソルブなど)に溶解して塗布液に添
加される。2C1@(CrHs)! NCH2CHCH20H,0H n-C+HeN(CtH+0H)z S CkhCkhN combtHs)z The optimum addition amount of these accelerators varies depending on the type of compound, but 1. o
xlo-'~o, 5g/rr? , preferably 5.0Xl
It is desirable to use it in the range of O-' to 0.1 g/m. These promoters are dissolved in a suitable solvent (H, O, alcohols such as methanol and ethanol, acetone, dimethylformamide, methylcellosolve, etc.) and added to the coating solution.
これらの添加剤を複数の種類を併用してもよい。A plurality of types of these additives may be used in combination.
本発明のハロゲン化銀感光材料を用いて超硬調の写真特
性を得るには、従来の伝染現像液や米国特許第2,41
9,975号に記載されたpH13に近い高アルカリ現
像液を用いる必要はなく1、安定な現像液を用いること
ができる。In order to obtain ultra-high contrast photographic properties using the silver halide photosensitive material of the present invention, it is necessary to use a conventional infectious developer or U.S. Pat.
It is not necessary to use a highly alkaline developer with a pH close to 13 as described in No. 9,975, and a stable developer can be used.
すなわち、本発明のハロゲン化銀感光材料は、保恒剤と
しての亜硫酸イオンを0.15モル/1以上含み、pH
10,5〜12.3、特にpH11,0〜12.0の現
像液によって充分に超硬調のネガ画像を得ることができ
る。That is, the silver halide photosensitive material of the present invention contains 0.15 mol/1 or more of sulfite ion as a preservative, and has a pH of
By using a developer having a pH of 10.5 to 12.3, particularly 11.0 to 12.0, a sufficiently high contrast negative image can be obtained.
本発明の方法において用いつる現像主薬には特別な制限
はなく、例えばジヒドロキシベンゼン類(例えばハイド
ロキノン)、3−ピラゾリドン類(例えば1−フェニル
−3−ピラゾリドン、4゜4−ジメチル−1−フェニル
−3−ピラゾリドン)、アミノフェノール類(例えばN
−メチル−p−アミノフェノール)などを単独あるいは
組み合わせてもちいることかできる。There are no particular limitations on the developing agents used in the method of the present invention, such as dihydroxybenzenes (e.g. hydroquinone), 3-pyrazolidones (e.g. 1-phenyl-3-pyrazolidone, 4゜4-dimethyl-1-phenyl- 3-pyrazolidone), aminophenols (e.g. N
-methyl-p-aminophenol), etc. can be used alone or in combination.
本発明のハロゲン化銀感光材料は特に、主現像主薬とし
てジヒドロキシベンセン類を、補助現像主薬として3−
ピラゾリドン類またはアミノフェノール類を含む現像液
で処理されるのに適している。好ましくはこの現像液に
おいてジヒドロキシベンゼン類は0.05〜0.5モル
/l、3−ピラゾリドン類またはアミンフェノール類は
0.06モル/l以下の範囲で併用される。In particular, the silver halide light-sensitive material of the present invention contains dihydroxybenzenes as a main developing agent and 3-3 as an auxiliary developing agent.
Suitable for processing with developers containing pyrazolidones or aminophenols. Preferably, in this developer, dihydroxybenzenes are used in an amount of 0.05 to 0.5 mol/l, and 3-pyrazolidones or aminephenols are used in an amount of 0.06 mol/l or less.
また米国特許4269929号に記載されているように
、アミン類を現像液に添加することによって現像速度を
高め、現像時間の短縮化を実現することもできる。Further, as described in US Pat. No. 4,269,929, the development speed can be increased and the development time can be shortened by adding amines to the developer.
現像液にはその他、アルカリ金属の亜硫酸塩、炭酸塩、
ホウ酸塩、及びリン酸塩の如きpH緩衝剤、臭化物、沃
化物、及び有機カブリ防止剤(特に好ましくはニトロイ
ンダゾール類またはベンゾトリアゾール類)の如き現像
抑制剤ないし、カブリ防止剤などを含むことができる。The developer also contains alkali metal sulfites, carbonates,
Contains pH buffering agents such as borates and phosphates, development inhibitors or antifoggants such as bromides, iodides, and organic antifoggants (particularly preferably nitroindazoles or benzotriazoles). I can do it.
又必要に応じて、硬水軟化剤、溶解助剤、色調剤、現像
促進剤、界面活性剤(とくに好ましくは前述のポリアル
キレンオキサイド類)、消泡剤、硬膜剤、フィルムの銀
汚れ防止剤(例えば2−メルカプトベンズイミダゾール
スルホン酸類など)を含んでもよい。If necessary, water softeners, solubilizing agents, color toning agents, development accelerators, surfactants (especially preferably the aforementioned polyalkylene oxides), antifoaming agents, hardeners, and film silver stain preventive agents may be added. (for example, 2-mercaptobenzimidazole sulfonic acids, etc.).
定着液としては一般に用いられる組成のものを用いるこ
とができる。定着剤としてはチオ硫酸塩、チオシアン酸
塩のほか、定着剤としての効果が知られている有機硫黄
化合物を用いることができる。As the fixer, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as fixing agents can be used.
定着液には硬膜剤として水溶性アルミニウム塩などを含
んでもよい。The fixing solution may contain a water-soluble aluminum salt or the like as a hardening agent.
本発明の方法における処理温度は普通18℃から50℃
の間に選ばれる。The processing temperature in the method of the invention is usually from 18°C to 50°C.
selected between.
写真処理には自動現像機を用いるのが好ましいが、本発
明の方法により、感光材料を自動現像機に入れてから出
てくるまでのトータルの処理時間を60秒〜120秒に
設定しても、充分に超硬調のネガ階調の写真特性が得ら
れる。Although it is preferable to use an automatic processor for photographic processing, according to the method of the present invention, the total processing time from the time the photosensitive material is put into the automatic processor until it comes out can be set to 60 seconds to 120 seconds. , sufficiently ultra-high contrast negative gradation photographic characteristics can be obtained.
本発明の現像液には銀汚れ防止剤として特開昭56−2
4,347号に記載の化合物を用いることかできる。現
像液中に添加する溶解助剤として特願昭60−109,
743号に記載の化合物を用いることかできる。さらに
現像液に用いるpH緩衝剤として特開昭60−93,4
33号に記載の化合物あるいは特願昭62−18625
9に記載の化合物を用いることができる。In the developing solution of the present invention, JP-A-56-2 is used as a silver stain preventive agent.
The compounds described in No. 4,347 can be used. Patent application 1986-109 as a solubilizing agent added to the developer.
The compounds described in No. 743 can also be used. Furthermore, as a pH buffering agent for use in developing solutions, JP-A-60-93,4
Compounds described in No. 33 or Japanese Patent Application No. 18625/1986
9 can be used.
以下実施例により、本発明の詳細な説明する。The present invention will be explained in detail below with reference to Examples.
実施例1
(感光性乳剤の調製)
乳剤−A
50°Cに保ったゼラチン水溶液に銀1モル当り4X1
0−’モルの6塩化イリジウム(II[)カリおよびア
ンモニアの存在下で、硝酸銀水溶液と沃化カリウム、臭
化カリウムの水溶液を同時に60分間で加えその間のp
Agを7.8に保つことにより、平均粒子サイズ0.2
8μで、平均ヨウ化銀含有量0. 3モル%の立方体単
分散乳剤を調製した。この乳剤をフロキュレーション法
により、脱塩を行いその後に、銀1モル当り40gの不
活性セラチンを加えた後に50℃に保ち増感色素として
5,5′−ジクロロ−9−エチル−3,3′ビス(3−
スルフォブロピル)オキサカルボシアニンと、銀1モル
当りlO−1モルのKl溶液に加え、15分分間時させ
た後降温した。Example 1 (Preparation of photosensitive emulsion) Emulsion-A 4X1 per mole of silver was added to an aqueous gelatin solution kept at 50°C.
In the presence of 0-' mole of potassium iridium(II[) chloride and ammonia, an aqueous solution of silver nitrate and an aqueous solution of potassium iodide and potassium bromide were simultaneously added for 60 minutes while p
By keeping Ag at 7.8, the average particle size is 0.2
8μ, average silver iodide content 0. A 3 mol % cubic monodisperse emulsion was prepared. This emulsion was desalted by the flocculation method, and then 40 g of inert ceratin per mole of silver was added and kept at 50°C as a sensitizing dye, 5,5'-dichloro-9-ethyl-3, 3' screw (3-
sulfopropyl)oxacarbocyanine and a Kl solution of lO-1 mole per mole of silver were added, and the mixture was allowed to stand for 15 minutes, and then the temperature was lowered.
乳剤−B
50℃に保ったpH=4.0のゼラチン水溶液中に硝酸
銀水溶液と銀1モルあたり、1.4X10−7モルの6
塩化ロジウム(III)酸アンモニウムドと4×10−
1モルの6塩化イリジウム(III)酸カリを含む、塩
化ナトリウムおよび臭化カリウムの混合水溶液を同時に
一定の速度で30分間添加して平均粒子サイズ0.23
μの塩臭化銀単分散乳剤(C1組成70モル%)を調製
した。Emulsion-B In a gelatin aqueous solution with pH=4.0 kept at 50°C, a silver nitrate aqueous solution and 1.4 x 10-7 mol of 6 per mol of silver were added.
ammonium rhodium(III) chloride and 4×10−
A mixed aqueous solution of sodium chloride and potassium bromide containing 1 mol of potassium hexachloroiridium(III) acid was added simultaneously at a constant rate for 30 minutes to obtain an average particle size of 0.23.
A silver chlorobromide monodisperse emulsion (C1 composition: 70 mol %) of μ was prepared.
この乳剤を常法に従って水洗して可溶性塩類を除去した
あと、チオ硫酸ナトリウムとカリウムクロロオーレート
を加えて化学増感を施した。さらにl111モルあたり
0.1モル%に相当する沃化カリウム溶液を添加し粒子
表面のコンバージョンを行なった。This emulsion was washed with water in a conventional manner to remove soluble salts, and then chemical sensitization was performed by adding sodium thiosulfate and potassium chloroaurate. Furthermore, a potassium iodide solution corresponding to 0.1 mol % per 111 mol was added to convert the particle surface.
更に、この後に、50℃に保ち増感色素として次の化合
物を2.7X10−’モル/Agモル加え、15分分間
時させた後に、降温収納した。Furthermore, after this, the following compound was added as a sensitizing dye at 50 DEG C. at 2.7.times.10@-' mol/Ag mol, and after standing for 15 minutes, the temperature was lowered and stored.
(塗布試料の作成)
支持体;塩化ビニリデン共重合体からなる下塗層(0,
5μ)を有するポリニチレンテレフタレートフィルム(
150μ)支持体上に、支持体側から順次UL、ML、
OL、PCの層構成になる様に塗布した。以下に各層の
調製法及び塗布量を示す。(Preparation of coating sample) Support: Undercoat layer made of vinylidene chloride copolymer (0,
Polynylene terephthalate film (5μ) with
150μ) On the support, UL, ML,
It was applied so that it had a layer structure of OL and PC. The preparation method and coating amount of each layer are shown below.
(UL)
前記、乳剤−Bをゼラチンと共に40℃で溶解した後、
5−メチルベンズトリアゾール、85■/d、4−ヒド
ロキシ−1,3,3a、7−テトラザインデン12■/
ゴ、下記化合物(イ)、(ロ)、(ハ)及びゼラチンに
対して30wt%のポリエチルアクリレート及びゼラチ
ン硬化剤として下記化合物(ニ)を添加し、Ag3.6
g/m、表−1に示したヒドラジン化合物2.8X10
−’mol/m、セラチン1.9g/mとなるように塗
布した。(UL) After dissolving the emulsion-B together with gelatin at 40°C,
5-methylbenztriazole, 85/d, 4-hydroxy-1,3,3a, 7-tetrazaindene 12/d
Go, add the following compounds (a), (b), (c) and gelatin to 30 wt% polyethyl acrylate and the following compound (d) as a gelatin hardening agent, Ag3.6
g/m, hydrazine compound shown in Table-1 2.8X10
-'mol/m, and Seratin was applied at a concentration of 1.9 g/m.
化合物(ロ)
C1e
15■/d
化合物(ハ)
CaHlt CH=CH+CHt+yCON CH
tCHzSOJaCH。Compound (b) C1e 15■/d Compound (c) CaHlt CH=CH+CHt+yCON CH
tCHzSOJaCH.
50■/ゴ
化合物(ニ)
H
CH2= CH30tCHzCHC)lxsOtcH=
CH!ゼラチンに対して2.0wt%
(ML)
ゼラチン10g、前記化合物(ニ)をゼラチンに対して
2.0wt%を添加し、完成量250−になるように水
を加えて調製し、ゼラチン1.5g/dになるように塗
布した。50■/Go compound (d) H CH2= CH30tCHzCHC)lxsOtcH=
CH! 2.0 wt% based on gelatin (ML) 10 g of gelatin, 2.0 wt% of the above compound (d) based on gelatin were added, and water was added to make a final amount of 250 - to prepare gelatin 1. It was applied at a concentration of 5 g/d.
(OL)
前記、乳剤−Aを40℃にて溶解し、5−メチルベンズ
トリアゾール3■/rd、4−ヒドロキシ−1,3,3
a、7−チトラザインデン、表−1に示す本発明の一般
式(I)の化合物4.3X10−’mol/rd、化合
物(イ) 0. 4tuz/m、(ロ)1.5+og/
rrr、 (ハ) l 5+ng/rr(及びゼラ
チンに対して30wt%のポリエチルアクリレート及び
ゼラチン硬化剤として化合物(ニ)ゼラチンに対して2
wt%を添加し調製した。Ag0.4g/rdとなる様
に塗布した。(OL) The above emulsion-A was dissolved at 40°C, and 5-methylbenztriazole 3/rd, 4-hydroxy-1,3,3
a, 7-chitrazaindene, the compound of general formula (I) of the present invention shown in Table 1 4.3X10-'mol/rd, compound (A) 0. 4tuz/m, (b) 1.5+og/
rrr.
It was prepared by adding wt%. It was applied so that Ag was 0.4 g/rd.
(P C)
ゼラチン溶液にポリメチルメタクリレート分散物(平均
粒径5.0μ)、更に次の界面活性剤を添加し、ゼラチ
ン1.5g/m、ポリメチルメタクリレートとして0.
3g/rrfとなる様に塗布した。(P C) A polymethyl methacrylate dispersion (average particle size 5.0 μm) and the following surfactant were added to the gelatin solution, and the gelatin was 1.5 g/m and the polymethyl methacrylate was 0.5 g/m.
It was coated at a concentration of 3 g/rrf.
界面活性剤 現像液 CHCOOC,H,。surfactant developer CHCOOC, H.
37■/rd
S Os N a
(性能の評価)
これらの試料を、3200°にのタングステン光で光学
クサビ又は、光学クサビとコンタクトスクリーン(富士
フィルム、150Lチエーンド・ソト型)を通して露光
後、次の現像液で34°C30秒間現像し、定着、水洗
、乾燥した。37■/rd S Os Na (Performance evaluation) After exposing these samples to tungsten light at 3200° through an optical wedge or an optical wedge and a contact screen (Fuji Film, 150L chained soto type), the following It was developed with a developer for 30 seconds at 34°C, fixed, washed with water, and dried.
定着液としては、富士写真フィルム(!@社製、GR−
Flを用いた。As a fixer, Fuji Photo Film (!@, GR-
Fl was used.
得られた結果を表1に示した。The results obtained are shown in Table 1.
階調(γ)は特性曲線で濃度0゜ 0の点を結ぶ直線の傾きである。The gradation (γ) is a characteristic curve with a density of 0° It is the slope of the straight line connecting the 0 points.
3の点と3゜ 網階調は次式で表わした。3 point and 3° The halftone gradation is expressed by the following formula.
*網階調=95%の網点面積率を与える露光量(fog
E95%−5%の網点面積率を与える露光量(logE
5%)
網点品質は、視覚的に5段階評価した。5段階評価は、
「5」が最も良く、「1」が最も悪い品質を示す。製版
用網点原版としては、「5」、「4」が実用可能で、「
3」が実用可能な限界レベルであり、「2」、「l」は
実用不可能な品質である。*Hatton gradation = Exposure amount that gives a dot area ratio of 95% (fog
The exposure amount (log E
5%) The halftone dot quality was visually evaluated on a five-level scale. The 5-level evaluation is
"5" indicates the best quality and "1" indicates the worst quality. As halftone dot originals for plate making, "5" and "4" are practical, and "
3" is the practical limit level, and "2" and "l" are impractical quality.
を 表−1の結果から、 高り、#I4階調が広く、 えることがわかる。of From the results in Table-1, High, #I4 gradation is wide, I understand that it can be done.
表 1
本発明のサンプルが、Tが
網点品質の良好な画像を与
[
比較化合物A(特開昭62−296138、特開昭61
−156043に記載)
比較化合物B(特開昭61−230,135に記載)
比較化合物C(特開昭56−153336に記載)2−
(5−ニトロ−2−インダゾリ
ル)ハイドロキノン
実施例2
(感光性乳剤Cの調製)
50℃に保ったゼラチン水溶液に銀1モル当り3.0X
10−”モルの(NH4)sRhCムの存在下で硝酸銀
水溶液と塩化ナトリウム水溶液を同時に混合したのち、
当業界でよく知られた方法にて、可溶性塩を除去したの
ちにゼラチンを加え、化学熟成せずに安定化剤として2
−メチル−4−ヒドロキシ−1,3,3a、7−チトラ
ザインデンを添加した。この乳剤は平均サイズが0.1
5μの立方晶形をした単分散乳剤であった。Table 1 Samples of the present invention T gave images with good halftone quality
2-
(5-nitro-2-indazolyl)hydroquinone Example 2 (Preparation of photosensitive emulsion C) 3.0X per mole of silver was added to an aqueous gelatin solution kept at 50°C.
After simultaneously mixing an aqueous silver nitrate solution and an aqueous sodium chloride solution in the presence of 10-'' moles of (NH4)sRhC,
After removal of soluble salts, gelatin is added as a stabilizing agent without chemical ripening using methods well known in the art.
-Methyl-4-hydroxy-1,3,3a,7-chitrazaindene was added. This emulsion has an average size of 0.1
It was a monodisperse emulsion with a cubic crystal shape of 5μ.
(感光乳剤層の塗布)
第−層
感光乳剤Cに、ヒドラジン化合物rV−8(25■/r
rり 、5−メチルヘンシトリアゾール(5×1 (I
3mol/Ag園O1)、ポリエチルアクリレートラテ
ックス(30wt%対ゼラチン)、および13−ジビニ
ルスルホニル−2−プロパツール(2゜Qwt%対ゼラ
チン)を添加した。塗布ui量は3゜5 g/rdであ
った。(Coating of photosensitive emulsion layer) Hydrazine compound rV-8 (25 μ/r
ri, 5-methylhencytriazole (5×1 (I
3 mol/Agen O1), polyethyl acrylate latex (30 wt% to gelatin), and 13-divinylsulfonyl-2-propanol (2°Qwt% to gelatin) were added. The coating amount was 3.5 g/rd.
第二層 ゼラチン(1,0g/イ)
第三層
感光乳剤Cと同様に但し、6.0X10−’モルの(N
Ha) JhCムの存在下で調製した感光乳剤D(塗布
銀量0.4g/nf) 、5−メチルベンゾトリアゾー
ル(5X 10−’ mol/Ag mol) 、ポリ
エチルアクリレートラテックス(30wt%対ゼラチン
)、1.3−ジビニルスルホニル−2−プロパツール(
2wt%対ゼラチン)、および表−2に示した本発明の
一般式(I)の化合物を添加した。Second layer gelatin (1.0 g/a) Third layer Same as photosensitive emulsion C except that 6.0 x 10-' mol of (N
Emulsion D (coated silver amount: 0.4 g/nf) prepared in the presence of Ha) JhC, 5-methylbenzotriazole (5X 10-' mol/Ag mol), polyethyl acrylate latex (30 wt% to gelatin) , 1,3-divinylsulfonyl-2-propatol (
2 wt % to gelatin) and the compound of general formula (I) of the present invention shown in Table 2 were added.
第四層
ゼラチン1.5g/n(と、マント剤として、ポリメチ
ルメタクリレート粒子(平均粒径2.5μ)0.3g/
rd、さらに塗布助剤として次の界面活性剤、安定剤、
および紫外線吸収染料を含む保護層を塗布し、乾燥した
。Fourth layer gelatin 1.5g/n (and as a cloak agent, polymethyl methacrylate particles (average particle size 2.5μ) 0.3g/n
rd, and the following surfactants and stabilizers as coating aids:
and a protective layer containing ultraviolet absorbing dye was applied and dried.
界面活性剤
CHiCOOCJrs
CHCOOC6HI3
SO,Na
37■/m
C,F、、So□NCFlzCOOK
CsHq 2. 5■/ボ安
定剤
チオクト酸
紫外線吸収剤
2、 1■/d
このサンプルに大日本スクリーン■製明室プリンターp
−607で、第1図に示すような原稿を通して画像露光
し38℃20秒現像処理し、定着、水洗、乾燥したのち
、抜き文字画質の評価を行った。Surfactant CHiCOOCJrs CHCOOC6HI3 SO,Na 37■/m C,F,,So□NCFlzCOOK CsHq 2. 5■/Bostabilizer Thioctic Acid UV Absorber 2, 1■/d This sample was used with Dainippon Screen ■Meisho Printer p
-607, image exposure was carried out through the original as shown in FIG. 1, and the image was developed at 38° C. for 20 seconds, fixed, washed with water, and dried. After that, the image quality of cut-out characters was evaluated.
抜文字画質5とは第1図の如き原稿を用いて50%の網
点面積が返し用感光材料上に50%の網点面積となる様
な適性露光した時30μm巾の文字が再現される画質を
言い非常に良好な抜文字画質である。−力抜文字画t1
とは同様な適性露光を与えた時150μm巾以上の文字
しか再現することのできないN質を言い良くない抜文字
品質であり、5と1の間に官能評価で4〜20ランクを
設けた。3以上が実用し得るレヘルである。Extracted character image quality 5 means that characters with a width of 30 μm are reproduced when a document as shown in Figure 1 is used and exposed appropriately so that 50% of the halftone dot area becomes 50% of the halftone dot area on the photosensitive material for return. In terms of image quality, the image quality is very good. -Effortless character stroke t1
"N quality" means that only characters with a width of 150 μm or more can be reproduced when the same appropriate exposure is given, and it is poor character extraction quality, and a sensory evaluation of 4 to 20 ranks was set between 5 and 1. A level of 3 or higher is a practical level.
結果を表2に示した0本発明のサンプルは抜文字画質が
優れる。The results are shown in Table 2. The sample of the present invention has excellent cut-out character image quality.
【図面の簡単な説明】
第1図は、重ね返しによる抜文字画像形成を行なう場合
の、露光時構成を示したものであり各符号は以下のもの
を示す。
(イ)透明もしくは半透明の貼りこみベース(ロ)線画
原稿(なお黒色部分は線画を示す)(ハ)i3明もしく
は半透明の貼りこみベース(ニ)w4点原稿(なお黒色
部分は網点を示す)(ホ)返し用怒光材料(なお、斜線
部は怒光層を示す)
特許出願人 富士写真フィルム株式会社手続補正書
平成2年Z月lk日
1゜
2゜
事件の表示
発明の名称
平成2年特願第108048号
ハロゲン化銀写真感光材料
3、 補正をする者
事件との関係BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows the configuration during exposure when forming a character image by overlapping and repeating, and each reference numeral indicates the following. (b) Transparent or semi-transparent pasting base (b) Line drawing original (black parts indicate line drawings) (c) i3 bright or semi-transparent pasting base (d) w 4-point original (black parts are halftone dots) ) (e) Glowing material for return (the shaded area indicates the glistening layer) Patent applicant: Fuji Photo Film Co., Ltd. Procedural Amendment of the Claimed Invention of the 1゜2゜ Incident, Z, 1990 Title: 1990 Japanese Patent Application No. 108048 Silver Halide Photographic Light-sensitive Material 3 Relationship with the Amendment Person Case
Claims (1)
含む第一のハロゲン化銀乳剤層を有し、該乳剤層又は他
の非感光性親水性コロイド層にヒドラジン誘導体を含み
、かつ第2のハロゲン化銀乳剤層を有し、該第2の乳剤
層に一般式( I )で表わされる化合物を含むことを特
徴とするハロゲン化銀写真感光材料。 一般式[ I ] ▲数式、化学式、表等があります▼ 式( I )において、Q^1は少なくとも1個のヘテロ
原子を含み結合する炭素原子とともに5員環以上の複素
環を形成するに必要な原子群を表わし、R_1はハイド
ロキノン母核に置換可能な基を表わし、Bは、ハイドロ
キノン母核より脱離後PUGを放出する基を表わし、P
UGは現像抑制剤を表わし、lは0または1を表わし、
AおよびA′は水素原子または、アルカリで除去されう
る基を表わす。 2)ヒドラジン誘導体が次の一般式(IV)で表わされる
ことを特徴とする特許請求の範囲(1)のハロゲン化銀
写真感光材料。 一般式(IV) ▲数式、化学式、表等があります▼ 式中、R_1は脂肪族基または芳香族基を表わし、R_
2は水素原子、アルキル基、アリール基、アルコキシ基
、アリールオキシ基、アミノ基またはヒドラジノ基を表
わし、G_1は▲数式、化学式、表等があります▼基、
−SO_2−基、−SO−基、▲数式、化学式、表等が
あります▼基、▲数式、化学式、表等があります▼基、
チオカルボニル基又はイミノメチレン基を表わし、A_
1、A_2はともに水素原子あるいは一方が水素原子で
他方が置換もしくは無置換のアルキルスルホニル基、又
は置換もしくは無置換のアリールスルホニル基、又は置
換もしくは無置換のアシル基を表わす。[Scope of Claims] 1) A first silver halide emulsion layer containing at least one type of silver halide emulsion is provided on a support, and a hydrazine derivative is included in the emulsion layer or other non-photosensitive hydrophilic colloid layer. 1. A silver halide photographic material comprising a second silver halide emulsion layer, the second emulsion layer containing a compound represented by formula (I). General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In formula (I), Q^1 contains at least one hetero atom and is necessary to form a 5-membered or more heterocyclic ring with the bonding carbon atom. R_1 represents a group capable of substituting into the hydroquinone core, B represents a group that releases PUG after elimination from the hydroquinone core, and P
UG represents a development inhibitor, l represents 0 or 1,
A and A' represent a hydrogen atom or a group that can be removed with an alkali. 2) The silver halide photographic material according to claim (1), wherein the hydrazine derivative is represented by the following general formula (IV). General formula (IV) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, R_1 represents an aliphatic group or an aromatic group, and R_
2 represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group, or a hydrazino group, and G_1 is a ▲ group with a mathematical formula, chemical formula, table, etc.;
-SO_2- group, -SO- group, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ groups, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ groups,
Represents a thiocarbonyl group or iminomethylene group, A_
1 and A_2 both represent a hydrogen atom, one hydrogen atom and the other a substituted or unsubstituted alkylsulfonyl group, a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2108048A JP2663037B2 (en) | 1990-04-24 | 1990-04-24 | Silver halide photographic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2108048A JP2663037B2 (en) | 1990-04-24 | 1990-04-24 | Silver halide photographic material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH046548A true JPH046548A (en) | 1992-01-10 |
| JP2663037B2 JP2663037B2 (en) | 1997-10-15 |
Family
ID=14474611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2108048A Expired - Fee Related JP2663037B2 (en) | 1990-04-24 | 1990-04-24 | Silver halide photographic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2663037B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0419645A (en) * | 1990-05-14 | 1992-01-23 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
| EP0694808A1 (en) | 1994-07-29 | 1996-01-31 | Dainippon Ink And Chemicals, Inc. | Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor |
| EP0704757A1 (en) | 1994-09-29 | 1996-04-03 | Konica Corporation | A silver halide photographic light sensitive material |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61156043A (en) * | 1984-12-27 | 1986-07-15 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
| JPS6389844A (en) * | 1986-10-02 | 1988-04-20 | Konica Corp | Silver halide photographic sensitive material having improved resistance to roller mark |
| JPS6472139A (en) * | 1987-09-12 | 1989-03-17 | Konishiroku Photo Ind | Silver halide photographic sensitive material which is improved in retouch work |
| JPH03110543A (en) * | 1989-09-25 | 1991-05-10 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
-
1990
- 1990-04-24 JP JP2108048A patent/JP2663037B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61156043A (en) * | 1984-12-27 | 1986-07-15 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
| JPS6389844A (en) * | 1986-10-02 | 1988-04-20 | Konica Corp | Silver halide photographic sensitive material having improved resistance to roller mark |
| JPS6472139A (en) * | 1987-09-12 | 1989-03-17 | Konishiroku Photo Ind | Silver halide photographic sensitive material which is improved in retouch work |
| JPH03110543A (en) * | 1989-09-25 | 1991-05-10 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0419645A (en) * | 1990-05-14 | 1992-01-23 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
| EP0694808A1 (en) | 1994-07-29 | 1996-01-31 | Dainippon Ink And Chemicals, Inc. | Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor |
| EP0704757A1 (en) | 1994-09-29 | 1996-04-03 | Konica Corporation | A silver halide photographic light sensitive material |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2663037B2 (en) | 1997-10-15 |
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