JPH0466680A - Method for etching metal sheet - Google Patents

Method for etching metal sheet

Info

Publication number
JPH0466680A
JPH0466680A JP2176782A JP17678290A JPH0466680A JP H0466680 A JPH0466680 A JP H0466680A JP 2176782 A JP2176782 A JP 2176782A JP 17678290 A JP17678290 A JP 17678290A JP H0466680 A JPH0466680 A JP H0466680A
Authority
JP
Japan
Prior art keywords
etching
metal plate
width
groove
metal sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2176782A
Other languages
Japanese (ja)
Other versions
JP2943259B2 (en
Inventor
Ryuji Ueda
龍二 上田
Kazuyuki Horii
堀井 和之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP17678290A priority Critical patent/JP2943259B2/en
Publication of JPH0466680A publication Critical patent/JPH0466680A/en
Application granted granted Critical
Publication of JP2943259B2 publication Critical patent/JP2943259B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】[Detailed description of the invention] 【産業上の利用分野】[Industrial application field]

本発明は、金属板のエツチング方法に関するものである
。
The present invention relates to a method of etching a metal plate.

【従来の技術】[Conventional technology]

液晶ディスブー用カラーフィルターは、凹版オフセット
印刷等の印刷手法によって現在盛んに製造されている。 この様にフィルターを印刷手法によって製造するために
は、微細なストライプ状の画線溝を多数繰り返し形成し
た印刷版が必要であり、現在この画線溝は主にエツチン
グ手法によって刻設されている。
Color filters for liquid crystal displays are currently being actively manufactured using printing techniques such as intaglio offset printing. In order to manufacture filters using printing methods in this way, a printing plate is required in which many fine striped grooves are repeatedly formed.Currently, these grooves are mainly carved by etching. .

【発明が解決しようとする課題】[Problem to be solved by the invention]

金属板1の表面にレジスト2を所望のパターン状に残存
形成させ、例えば窓状露出部11をエツチングして画線
溝12を形成する際には、金属板1はエツチング液との
接触面に垂直にエツチングされるため、板厚方向のエツ
チングと共に幅方向にもエツチングが同時進行するので
、レジスト2によって被覆されている下側にもエツチン
グが及ぶ。したがって、エツチングの進行と共に画線溝
12は幅が広がり、またこのために両サイド程浅く形成
される。この様な形状の画線溝からは、精度の高い画線
を印刷形成することは・困難であり、また幅方向にはイ
ンキむらが生じて濃淡のあるカラーフィルターしか製造
することが出来ないと云う問題点があった。このため、
可能な限り幅の増加が少なく、深さも出来る限り均一な
画線溝を刻設することが出来るエツチング方法の開発が
強く望まれて、いた。
When the resist 2 is left in a desired pattern on the surface of the metal plate 1 and, for example, the window-like exposed portion 11 is etched to form the image groove 12, the metal plate 1 is left on the surface that will come into contact with the etching solution. Since etching is performed vertically, etching progresses simultaneously in the width direction as well as in the thickness direction, so that the etching also extends to the lower side covered by the resist 2. Therefore, as the etching progresses, the width of the image groove 12 increases, and for this reason, it is formed shallower on both sides. It is difficult to print highly accurate lines from such shaped line grooves, and ink unevenness occurs in the width direction, making it possible to produce only color filters with shading. There was a problem. For this reason,
There has been a strong desire to develop an etching method that can form grooves with as little increase in width as possible and with as uniform a depth as possible.

【課題を解決するための手段】[Means to solve the problem]

本発明は上記した従来技術の課題を解決するためになさ
れたもので、レジストがパターン状に残存形成された金
属板表面に、47’Be’を越える濃度の塩化第二鉄液
を60℃を越える温度で15c+sより短い距離から2
 Kgf/cm2を越える圧力でスプレー噴射すること
を特徴とする金属板のエツチング方法を提供するもので
ある。
The present invention was made to solve the problems of the prior art described above, and a ferric chloride solution with a concentration exceeding 47'Be' is heated at 60°C on the surface of a metal plate on which a resist remains in a pattern. 2 from a distance shorter than 15c+s at a temperature exceeding
The present invention provides a method for etching a metal plate characterized by spraying at a pressure exceeding Kgf/cm2.

【作用】[Effect]

本発明のエツチング方法は、従来のエツチング法に比べ
てエツチング液を高濃度、高温にして近距離から高圧で
吹き付けるため、エツチングが幅方向よりも板厚方向に
大きく進行する。このため、画線溝は幅方向にはそれ径
拡大せず、板厚方向に深く形成される。
Compared to conventional etching methods, the etching method of the present invention sprays the etching liquid at a high concentration and high temperature from a short distance under high pressure, so that etching progresses more in the thickness direction than in the width direction. Therefore, the image groove does not increase in diameter in the width direction, but is formed deep in the thickness direction.

【実施例および比較例】[Examples and comparative examples]

つぎに、本発明を比較例との関連で詳細に説明する。 金属板1として板厚が100Bのステンレス鋼販を用い
、この片面に適宜のレジスト(例えばカゼイン)2を1
0gMの厚さで均一に塗膜し、従来周知のホトリソグラ
フィの手法によってマスクa光させ、例えば露光部を4
01111幅に除去して金属板1の中央部に窓状露出部
11を形成した。 前記窓状露出部11を上に向けて金属板1を水平に設置
し、上方からエツチング液の塩化第二鉄液3を表−1に
示した条件でスプレー噴射し、金属板1の窓状露出部1
1に対応して刻設された深さ50g−の画線溝12の形
状を比較した。 表−1 エツチング状況の優劣は、画線溝の深さ、幅等を単独で
比較するのではなく、第4図に示す様に窓状露出部11
の幅をWIN実際に刻設された画線溝12の深さを01
幅をW2としたとき、次式によって定義されるエッチフ
ァクターE、Fを求め、この値をパラメーターとして比
較した。なお、このエッチファクターE、Fは定義から
分かる様に値が大きい程、加工精度の観点から好ましい
。 W2   Wt      R 比較結果を示す第1図から明らかな様に、本発明の実験
番号15と16は、他の実験番号のエッチファクターE
、Fより高い。したがって、幅方向より、深さ方向にエ
ツチングが効果的に進行したことが分かる。これは、実
験番号16によって刻設された画線溝12の断面形状(
第2a図)と、実験番号1により得られた画線溝12の
断面形状(第2b図)の比較からも明らかである。この
様に、本発明のエツチング方法によれば、従来と同−深
さの画線溝12を形成する際にも、溝幅の増加が少ない
ので、予め適宜の幅に窓状露出部11を形成しておくと
、この幅から大きく拡がることがないため、溝幅の精度
を高めることが出来る。そして、画線溝12の両サイド
も従前の技術と比較すると、浅くなる程度が大幅に解消
されているので、カラーフィルター等の印刷形成に用い
た場合に、幅精度が高り、シかも幅方向に濃淡の安定し
た画線が容易に形成される。 なお、本発明は上記実施例に限定されるものではないの
で、金属板1としては銅板のほかにも黄銅、ニッケル、
鉄/ニッケル合金、5US−304等のステンレス鋼、
キュープロニッケル等であって良いし、レジスト2につ
いても所望の精度でエツチングすべき部分のみを露出す
ることが出来るものであれば、材質等は問うものではな
いし、露出させる形状、大きさ、個数等についても限定
されるものではない。また、塩化第二鉄液を吹き付ける
方法についても、金属板1の露出表面に−様な圧力で吹
き付けることの出来る方法であれば何れの方法であって
も構わない。
Next, the present invention will be explained in detail in connection with a comparative example. A stainless steel plate with a thickness of 100B is used as the metal plate 1, and a suitable resist (for example, casein) 2 is coated on one side of the plate.
A film is uniformly coated with a thickness of 0 gM, and a mask is exposed using a well-known photolithography method, for example, the exposed area is
A window-like exposed portion 11 was formed in the center of the metal plate 1 by removing the metal plate 1 to a width of 01111 mm. The metal plate 1 is placed horizontally with the window-like exposed portion 11 facing upward, and the etching solution ferric chloride solution 3 is sprayed from above under the conditions shown in Table 1 to form the window-like shape of the metal plate 1. Exposed part 1
The shapes of the drawing grooves 12 with a depth of 50 g formed corresponding to No. 1 were compared. Table 1 The quality of etching is determined not by comparing the depth, width, etc. of the print grooves, but by comparing the window-like exposed portion 11 as shown in Figure 4.
The width of WIN is 01, and the depth of the drawing groove 12 actually engraved is 01.
When the width is W2, etch factors E and F defined by the following equations were determined and compared using these values as parameters. As can be seen from the definitions, the larger the etch factors E and F, the better from the viewpoint of processing accuracy. W2 Wt R As is clear from FIG. 1 showing the comparison results, experiment numbers 15 and 16 of the present invention have the etch factor E of the other experiment numbers.
, higher than F. Therefore, it can be seen that etching progressed more effectively in the depth direction than in the width direction. This is the cross-sectional shape (
This is also clear from the comparison of the cross-sectional shape of the image line groove 12 obtained in Experiment No. 1 (FIG. 2b). As described above, according to the etching method of the present invention, even when forming the image line groove 12 of the same depth as the conventional etching method, the increase in the groove width is small, so that the window-like exposed portion 11 is formed in advance to an appropriate width. If formed in advance, the groove width will not expand significantly beyond this width, so the accuracy of the groove width can be improved. In addition, since the depth of both sides of the image groove 12 is significantly reduced compared to the previous technology, the width accuracy is high when used for printing color filters, etc. A line with stable shading in the direction is easily formed. Note that the present invention is not limited to the above embodiments, and the metal plate 1 may be made of brass, nickel,
Iron/nickel alloy, stainless steel such as 5US-304,
It may be made of cupronickel, etc., and the material of the resist 2 does not matter as long as it can expose only the part to be etched with the desired precision, and the shape, size, and number of resists to be exposed can be changed. etc., are not limited either. Further, as for the method of spraying the ferric chloride solution, any method may be used as long as it can spray the exposed surface of the metal plate 1 at a pressure similar to -.

【発明の効果】【Effect of the invention】

以上説明した様に従来のエツチング法に比べてエツチン
グ液を高濃度、高温にして近距離から高圧で吹き付ける
本発明の金属板のエツチング方法は、エツチングが幅方
向よりも板厚方向に大きく進行するので、画線溝は幅方
向にはそれ程拡大せず、板厚方向に深く形成される。し
たがって、両サイドが殆ど浅くなっていない形状の画線
溝が高い精度で刻設されるため、液晶ディスブー用カラ
ーフィルター等の印刷版を製造する上で極めて有効なエ
ツチング方法である。
As explained above, compared to conventional etching methods, the metal plate etching method of the present invention, in which the etching solution is sprayed at a high concentration and high temperature from a short distance under high pressure, allows etching to proceed more in the thickness direction than in the width direction. Therefore, the drawing groove does not expand so much in the width direction, but is formed deep in the thickness direction. Therefore, it is an extremely effective etching method for manufacturing printing plates such as color filters for liquid crystal display devices, since image grooves with a shape that is not nearly shallow on both sides are etched with high precision.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例と比較例の実験結果を示す説明
図、第2a図と第2b図は各々実験番号16と1による
画線溝の断面形状を示す図、第3図はエツチング要領を
示す説明図、第4図は形杖測定例を示す説明図である。 1・・・金属板 11・・・窓状露出部 12・・・画線溝 2・・・レジスト 3・・・塩化第二鉄液
FIG. 1 is an explanatory diagram showing the experimental results of the example of the present invention and a comparative example, FIGS. 2a and 2b are diagrams showing the cross-sectional shape of the drawing groove according to experiment numbers 16 and 1, respectively, and FIG. 3 is an illustration of the etching pattern. FIG. 4 is an explanatory diagram showing the procedure, and FIG. 4 is an explanatory diagram showing an example of shape cane measurement. 1... Metal plate 11... Window-like exposed portion 12... Image groove 2... Resist 3... Ferric chloride liquid

Claims (1)

【特許請求の範囲】[Claims]  レジストがパターン状に残存形成された金属板表面に
、47’Be’を越える濃度の塩化第二鉄液を60℃を
越える温度で15cmより短い距離から2Kgf/cm
^2を越える圧力でスプレー噴射することを特徴とする
金属板のエッチング方法。
A ferric chloride solution with a concentration exceeding 47'Be' is applied to the surface of the metal plate on which the resist remains in a pattern at a temperature exceeding 60°C from a distance shorter than 15 cm at a rate of 2 Kgf/cm.
A method for etching a metal plate, characterized by spraying at a pressure exceeding ^2.
JP17678290A 1990-07-04 1990-07-04 Metal plate etching method Expired - Lifetime JP2943259B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17678290A JP2943259B2 (en) 1990-07-04 1990-07-04 Metal plate etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17678290A JP2943259B2 (en) 1990-07-04 1990-07-04 Metal plate etching method

Publications (2)

Publication Number Publication Date
JPH0466680A true JPH0466680A (en) 1992-03-03
JP2943259B2 JP2943259B2 (en) 1999-08-30

Family

ID=16019750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17678290A Expired - Lifetime JP2943259B2 (en) 1990-07-04 1990-07-04 Metal plate etching method

Country Status (1)

Country Link
JP (1) JP2943259B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002356793A (en) * 2001-05-30 2002-12-13 Kyushu Hitachi Maxell Ltd Electroformed metal and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002356793A (en) * 2001-05-30 2002-12-13 Kyushu Hitachi Maxell Ltd Electroformed metal and its manufacturing method

Also Published As

Publication number Publication date
JP2943259B2 (en) 1999-08-30

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