JPH047013A - Method and device for producing highly pure gas by adsorption process - Google Patents
Method and device for producing highly pure gas by adsorption processInfo
- Publication number
- JPH047013A JPH047013A JP2107749A JP10774990A JPH047013A JP H047013 A JPH047013 A JP H047013A JP 2107749 A JP2107749 A JP 2107749A JP 10774990 A JP10774990 A JP 10774990A JP H047013 A JPH047013 A JP H047013A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorber
- sub
- desorption
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 91
- 238000001179 sorption measurement Methods 0.000 title claims description 41
- 238000003795 desorption Methods 0.000 claims abstract description 75
- 239000003463 adsorbent Substances 0.000 claims abstract description 30
- 238000011084 recovery Methods 0.000 claims abstract description 12
- 239000002994 raw material Substances 0.000 claims description 26
- 238000000746 purification Methods 0.000 claims description 8
- 239000002699 waste material Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 abstract description 35
- 238000011027 product recovery Methods 0.000 abstract description 8
- 239000007789 gas Substances 0.000 description 174
- 238000010586 diagram Methods 0.000 description 9
- 238000003860 storage Methods 0.000 description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002090 carbon oxide Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000002336 sorption--desorption measurement Methods 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野] 本発明は、圧力スイング吸着法(以下、PSAと称す。[Detailed description of the invention] [Industrial application field] The present invention is directed to a pressure swing adsorption method (hereinafter referred to as PSA).
)を用いることにより、原料ガス中から目的成分ガスを
取出し、高純度で回収するための方法および装置に関す
るものである。The present invention relates to a method and apparatus for extracting a target component gas from a source gas and recovering it with high purity by using the following method.
従来、原料ガス中から目的成分ガスを取出し、回収する
手段として、吸着剤による特定ガスの吸着機能を利用し
たPSAが広く知られている。このPSAは、−酸化炭
素および窒素を主成分とする転炉ガスから一酸化炭素を
濃縮回収する場合や、二酸化炭素および窒素を主成分と
する燃焼排ガスから二酸化炭素を濃縮回収する場合等に
好適に利用されている。BACKGROUND ART Conventionally, PSA, which utilizes the adsorption function of a specific gas by an adsorbent, has been widely known as a means for extracting and recovering a target component gas from a source gas. This PSA is suitable for concentrating and recovering carbon monoxide from converter gas whose main components are carbon oxide and nitrogen, and concentrating and recovering carbon dioxide from combustion exhaust gas whose main components are carbon dioxide and nitrogen. It is used for.
第8図は、このPSAを行うための従来装置の一例を示
したものである。この装置は、原料ガス送風機80、吸
着器81.82、真空ポンプ84、製品ガス貯槽86等
を備え、各通路の適所には自動弁87〜97が配設され
ている。FIG. 8 shows an example of a conventional device for performing this PSA. This device includes a raw material gas blower 80, adsorbers 81, 82, a vacuum pump 84, a product gas storage tank 86, etc., and automatic valves 87 to 97 are provided at appropriate locations in each passage.
この装置において、次に説明する4つの工程を順次行い
、繰返すことにより、製品ガスの精製が行われる。ここ
では、例として一方の吸着器81で行われる工程につい
て説明する。In this apparatus, the product gas is purified by sequentially performing and repeating the four steps described below. Here, a process performed in one adsorption device 81 will be described as an example.
■吸着工程
原料ガス送風機80の作動により、自動弁87を通じて
吸着器81内に原料ガスを供給する。ここで吸着されな
かったガスは、自動弁95を通じて装置外へ廃棄する。(2) Adsorption process By operating the raw material gas blower 80, raw material gas is supplied into the adsorber 81 through the automatic valve 87. The gas not adsorbed here is disposed of outside the apparatus through an automatic valve 95.
■洗浄(パージ)工程
製品ガス貯槽86に貯蔵されている製品ガスの一部を、
洗浄ガス供給管98および自動弁91を通して吸着器8
1に供給し、このガスによって、吸着器81内の非目的
成分、具体的には吸着剤外表面等の死空間に滞留してい
る非目的成分ガスを追い出す。この洗浄工程において、
主吸着器81から排出される洗浄排ガスは、原料ガスと
比べると目的成分に富んでいるので、これを再回収、す
なわち自動弁93および洗浄排ガス回収管99を通じて
原料ガス送風機80の上流側に戻し、他の吸着器82で
の吸着に用いる。■Cleaning (purging) process A part of the product gas stored in the product gas storage tank 86 is
Adsorber 8 through cleaning gas supply pipe 98 and automatic valve 91
1, and this gas expels non-target components within the adsorber 81, specifically, non-target component gas staying in dead spaces such as the outer surface of the adsorbent. In this cleaning process,
The cleaning exhaust gas discharged from the main adsorber 81 is rich in target components compared to the raw material gas, so it is collected again, that is, returned to the upstream side of the raw material gas blower 80 through the automatic valve 93 and the cleaning exhaust gas recovery pipe 99. , used for adsorption in other adsorbers 82.
■脱着工程
真空ポンプ84の作動により、自動弁89を通じて吸着
器81内のガスを吸引し、吸着器81内を減圧する。こ
れにより、吸着剤に吸着された目的成分ガスが脱着され
、製品ガスとして回収される。(2) Desorption process The vacuum pump 84 is operated to suck the gas inside the adsorber 81 through the automatic valve 89, thereby reducing the pressure inside the adsorber 81. As a result, the target component gas adsorbed by the adsorbent is desorbed and recovered as a product gas.
■昇圧工程
自動弁95.96を開き、吸着器82内のガスを吸着器
81内に送り込むこと1.こより、吸着器81内を昇圧
する。■ Pressurization step Open the automatic valves 95 and 96 and send the gas in the adsorber 82 into the adsorber 81 1. This increases the pressure inside the adsorber 81.
以上、一般にPSAで行われる工程を示したが、さらに
特開昭62−61616号公報では、高純度ガスの分離
方法として、上記脱着工程を初期工程、中期工程、末期
工程に分け、中期工程で脱着されたガスのみを製品ガス
として回収するものが開示されている。この方法によれ
ば、比較的純度の低い脱着初期および脱着末期の回収ガ
スを洗浄用として利用し、比較的純度の高い脱着中期の
回収ガスのみを製品ガスとして回収することにより、製
品ガスの高純度化を図ることができる。The steps generally performed in PSA have been shown above, but in JP-A No. 62-61616, as a method for separating high-purity gas, the desorption step is divided into an initial step, a middle step, and a final step, and the middle step is A method is disclosed in which only the desorbed gas is recovered as a product gas. According to this method, the recovered gas at the early and final stages of desorption, which has relatively low purity, is used for cleaning, and only the recovered gas at the middle stage of desorption, which has relatively high purity, is recovered as product gas. Purification can be achieved.
上記第8図に基ついて説明した従来方法には、次のよう
な問題点がある。The conventional method described above with reference to FIG. 8 has the following problems.
(1) 上記方法では、回収ガスの純度を高めるため
に、吸着剤外表面等から非目的ガスを追出す洗浄工程を
行っているが、このような洗浄工程では製品ガスの一部
(実際には回収量の半分以上)を装置内で循環させなけ
ればならないので、洗浄工程を行わない場合に比べ、装
置全体の動力費が倍量上となる。(1) In the above method, in order to increase the purity of the recovered gas, a cleaning process is performed to expel non-target gas from the outer surface of the adsorbent, etc., but in this cleaning process, a part of the product gas (actually Because more than half of the recovered amount must be circulated within the device, the power cost for the entire device is double that of a case where no cleaning step is performed.
(2) まだ洗浄工程が行われていない状態では、各
主吸着器81.82内に多分の非目的成分か含まれてい
るので、装置始動時から直ちに高純度の製品ガスを得る
ことは困難であり、実際には吸脱着サイクルを繰返し実
行することにより徐々にガスの純度を高めなければなら
ない。従って、高純度ガスを得るまでには比較的長い時
間を要し、また動力費の節減も困難になる。(2) If the cleaning process has not yet been carried out, it is difficult to obtain high-purity product gas immediately from the start of the equipment, as many non-target components are contained in each main adsorber 81, 82. In reality, the purity of the gas must be gradually increased by repeatedly performing adsorption/desorption cycles. Therefore, it takes a relatively long time to obtain high-purity gas, and it is also difficult to reduce power costs.
(3) 上記方法では、製品ガスの一部を洗浄ガスと
して吸着器に循環させる一方、この洗浄工程での排ガス
を再回収して吸着器に供給するようにしているが、この
ような再回収を行っても、この再回収ガスに含まれる目
的成分を100%取出すことは不可能であり、製品回収
率の低下は免れ得ない。(3) In the above method, while a part of the product gas is circulated to the adsorber as cleaning gas, the exhaust gas from this cleaning process is recovered and supplied to the adsorber. Even if this is done, it is impossible to extract 100% of the target component contained in this re-recovered gas, and a decrease in product recovery rate is inevitable.
一方、上記特開昭62−61616号公報の方法によれ
ば、脱着されたガスの純度が最も高くなる脱着中期の回
収ガスのみを製品ガスとして取出すことにより、製品の
高純度化を図ることができるが、脱着初期および末期に
おいて回収されるガスも、原料ガスと比べると目的成分
ガスに富んでおり、このような回収ガスを製品として取
出さずに廃棄し、あるいは洗浄ガスとして循環させるこ
とは製品回収率の低下につながり、経済性を損うことに
なる。On the other hand, according to the method disclosed in JP-A-62-61616, the purity of the product can be increased by extracting only the recovered gas in the middle stage of desorption, when the purity of the desorbed gas is highest, as the product gas. However, the gas recovered at the initial and final stages of desorption is also rich in target component gases compared to the raw material gas, and it is difficult to dispose of such recovered gas without extracting it as a product or to circulate it as a cleaning gas. This will lead to a decrease in product recovery rate, which will impair economic efficiency.
本発明は、このような事情に鑑み、洗浄工程の削減ある
いは廃止を図りながら、回収される製品ガスの純度を高
純度に維持し、これによって動力費の削減や製品回収率
の向上を図ることができる高純度ガスの精製方法および
装置を提供することを目的とする。In view of these circumstances, the present invention aims to maintain the purity of the recovered product gas at a high level while reducing or eliminating the cleaning process, thereby reducing power costs and improving the product recovery rate. The purpose of the present invention is to provide a method and apparatus for purifying high-purity gas.
本発明は、吸着剤を有する主吸着器内に原料ガスを通し
てこの原料ガス中の目的成分を選択的に吸着させる吸着
工程と、上記主吸着器内を減圧することにより上記吸着
剤に吸着されたガスを脱着する脱着工程とを順次行い、
この脱着したガスを回収する高純度ガスの精製方法にお
いて、上記脱着工程の初期では主吸着器の吸着剤から脱
着されたガスを吸着剤を有する副吸着器に導いて上記ガ
ス中の目的成分を吸着させ、この脱着工程初期の終了時
から脱着工程終了時までの期間では主吸着器から脱着さ
れたガスを製品ガスとして回収し、上記脱着工程の後は
副吸着器内を減圧してこの副吸着器内の吸着剤に吸着さ
れたガスを脱着し、このガスを製品ガスとして回収する
ものである(請求項1)。The present invention includes an adsorption step in which a raw material gas is passed through a main adsorbent having an adsorbent, and a target component in the raw material gas is selectively adsorbed; The desorption process of desorbing the gas is performed sequentially.
In this high-purity gas purification method for recovering the desorbed gas, in the early stage of the desorption step, the gas desorbed from the adsorbent in the main adsorber is guided to a sub-adsorber having an adsorbent to remove the target component in the gas. During the period from the end of the initial stage of the desorption process to the end of the desorption process, the gas desorbed from the main adsorber is recovered as product gas, and after the desorption process, the pressure inside the sub-adsorber is reduced to recover this sub-adsorber. The gas adsorbed by the adsorbent in the adsorber is desorbed and this gas is recovered as a product gas (Claim 1).
ここで、脱着工程初期の終了時から脱着工程終了時まで
の期間では、主吸着器から脱着されたガスを直接製品ガ
スとして回収するようにしてもよいし、上記ガスを副吸
着器に通した後に回収するようにしてもよい。Here, during the period from the initial end of the desorption process to the end of the desorption process, the gas desorbed from the main adsorber may be directly recovered as product gas, or the gas may be passed through the sub-adsorber. It may be collected later.
また本発明は、上記方法を実施するための装置と“して
、原料ガス中の目的成分を選択的に吸着する吸着剤を有
する主吸着器と、この主吸着器に原料ガスを供給する原
料ガス供給手段と、上記主吸着器内を減圧してガスを脱
着させる脱着手段とを備えた高純度ガスの精製装置にお
いて、上記主吸着器の出口側に接続され、この主吸着器
から脱着されたガス中の上記目的成分を選択的に吸着す
る吸着剤を有する副吸着器と、この副吸着器内を減圧し
てガスを脱着させる副脱着手段と、この副吸着器の出口
側の通路を同副吸着器から排出されたガスを回収側へ送
る通路と廃棄側へ送る通路とに選択的に切換える通路切
換手段とを備えたものである(請求項2)。The present invention also provides an apparatus for implementing the above method, which includes a main adsorber having an adsorbent that selectively adsorbs target components in the raw material gas, and a raw material for supplying the raw material gas to the main adsorber. In a high-purity gas purification apparatus comprising a gas supply means and a desorption means for depressurizing the inside of the main adsorption device to desorb the gas, the gas is connected to the outlet side of the main adsorption device and is desorbed from the main adsorption device. a sub-adsorber having an adsorbent that selectively adsorbs the target component in the gas, a sub-desorption means for depressurizing the inside of the sub-adsorber to desorb the gas, and a passage on the outlet side of the sub-adsorber. A passage switching means is provided for selectively switching the gas discharged from the sub-adsorber between a passage to the recovery side and a passage to the disposal side (Claim 2).
上記構成によれば、脱着工程初期では、主吸着器から脱
着されたガスかそのまま副吸着器に導かれ、上記ガス中
の目的成分が吸着される。その後、脱着工程が進んで主
吸着器からの脱着ガスの純度が高くなると、このガスは
直接あるいは副吸着器等を通じて製品ガスとして回収さ
れる。そして、この脱着工程終了後、上記副吸着器を減
圧することにより、この副吸着器で吸着されていたガス
が脱着され、製品ガスとして回収される。According to the above configuration, in the initial stage of the desorption process, the gas desorbed from the main adsorption device is directly guided to the sub adsorption device, and the target component in the gas is adsorbed. Thereafter, as the desorption process progresses and the purity of the desorbed gas from the main adsorber becomes high, this gas is recovered as a product gas either directly or through a sub-adsorber or the like. After the desorption step is completed, the sub-adsorber is depressurized, whereby the gas adsorbed by the sub-adsorber is desorbed and recovered as a product gas.
第1図〜第6図は、本発明方法を実施するための一実施
例装置の全体構成を示したものである。1 to 6 show the overall configuration of an embodiment of an apparatus for carrying out the method of the present invention.
この装置は、原料ガス送風機(原料ガス供給手段)10
、主吸着器11,12、真空ポンプ(脱着手段および副
脱着手段として兼用)14、および製品ガス貯槽16を
備え、各主吸着器11,12は、原料ガス中の目的成分
を選択的に吸着する吸着剤を内蔵している。This device includes a raw material gas blower (raw material gas supply means) 10
, main adsorbers 11 and 12, a vacuum pump (also used as a desorption means and a sub-desorption means) 14, and a product gas storage tank 16, and each main adsorption device 11 and 12 selectively adsorbs target components in the raw material gas. It has a built-in adsorbent.
原料ガス送風機10は、自動弁19’、20を各々介し
て主吸着器11.12の入口に接続され、真空ポンプ1
4も自動弁23.24を介して主吸着器11.12の入
口に各々接続されている。各主吸着器11.12の出口
は、自動弁27.28を各々介して廃ガス排出管30に
接続されるとともに、自動弁31.32および洗浄排ガ
ス回収管34を介して上記原料ガス送風機10の上流側
に接続されている。製品ガス貯槽16は、上記真空ポン
プ14の下流側に配置されるとともに、洗浄ガス供給管
36および自動弁37.38を介して各主吸着器11.
12の入口側に接続されている。The raw gas blower 10 is connected to the inlet of the main adsorber 11, 12 through automatic valves 19' and 20, respectively, and the vacuum pump 1
4 are also respectively connected to the inlets of the main adsorber 11.12 via automatic valves 23.24. The outlet of each main adsorber 11.12 is connected to the waste gas discharge pipe 30 through automatic valves 27.28, respectively, and is connected to the raw gas blower 10 through automatic valves 31.32 and cleaning exhaust gas recovery pipe 34. connected to the upstream side of the The product gas storage tank 16 is located downstream of the vacuum pump 14, and is connected to each main adsorber 11.
It is connected to the entrance side of 12.
さらに、この装置の特徴として、上記真空ポンプ14と
製品ガス貯槽16との間には副吸着器40か設けられて
いる。この副吸着器40も、上記主吸着器11.12と
同様に、原料ガス中の目的成分のみを選択的に吸着する
吸着剤を内蔵している。Furthermore, as a feature of this apparatus, a sub-adsorption device 40 is provided between the vacuum pump 14 and the product gas storage tank 16. Similar to the main adsorbers 11 and 12, this sub-adsorber 40 also contains an adsorbent that selectively adsorbs only the target component in the raw material gas.
この副吸着器40と真空ポンプ14との間には、自動弁
42〜44が配設されている。副吸着器40の出口側通
路管は、製品ガス貯槽16へつながる製品ガス回収管4
6と、廃棄側へつながる廃棄管47とに分岐しており、
容管46,47には、通路切換用の自動弁(通路切換手
段)50.51か配設されている。また、上記真空ポン
プ14と製品ガス貯槽16とはバイパス管54によって
直結されており、このバイパス管54の途中にも自動弁
56が配設されている。Automatic valves 42 to 44 are disposed between the sub-adsorber 40 and the vacuum pump 14. The outlet side passage pipe of the sub-adsorber 40 is the product gas recovery pipe 4 connected to the product gas storage tank 16.
6 and a waste pipe 47 that leads to the waste side.
Automatic valves (passage switching means) 50 and 51 for switching passages are provided in the container pipes 46 and 47. Further, the vacuum pump 14 and the product gas storage tank 16 are directly connected by a bypass pipe 54, and an automatic valve 56 is also provided in the middle of the bypass pipe 54.
次に、この装置により行われる製品ガス(高純度ガス)
の精製工程を説明する。この装置では、第7図に示され
るように、各主吸着器11.12について4つの工程か
互いに位相をずらしながら順次実行されるとともに、副
吸着器40で吸脱着工程が交互に行われることにより、
高純度ガスの精製が行われるか、ここでは主吸着器11
で行われる工程を主にして説明を進める。Next, the product gas (high purity gas) produced by this equipment
The purification process will be explained. In this device, as shown in FIG. 7, four steps are performed sequentially in each main adsorber 11, 12 with a phase shift from each other, and adsorption/desorption steps are performed alternately in the sub-adsorber 40. According to
Here, the main adsorber 11
The explanation will mainly focus on the processes performed in .
■吸着工程(第1図)
自動弁19を開き、原料ガス送風機10を作動させて原
料ガスを主吸着器11内に供給する。これにより、原料
ガス中の目的成分か主吸着器11内の吸着剤に吸着され
、吸着されなかったガスは、自動弁27を通じて廃ガス
排出管30から装置外へ廃棄される。■ Adsorption step (FIG. 1) The automatic valve 19 is opened, the raw material gas blower 10 is operated, and the raw material gas is supplied into the main adsorber 11. As a result, the target component in the raw material gas is adsorbed by the adsorbent in the main adsorber 11, and the unadsorbed gas is disposed of outside the apparatus from the waste gas discharge pipe 30 through the automatic valve 27.
■洗浄工程(第2図)
自動弁37を開き、製品ガス貯槽16に貯留されている
製品ガスを洗浄ガスとして主吸着器11内に略大気圧下
で送り込む。この洗浄ガスによって、吸着剤外表面等の
死空間に滞留している非目的成分ガスが追い出される。■Cleaning process (FIG. 2) The automatic valve 37 is opened and the product gas stored in the product gas storage tank 16 is sent into the main adsorber 11 as a cleaning gas under approximately atmospheric pressure. With this cleaning gas, non-target component gases remaining in dead spaces such as the outer surface of the adsorbent are expelled.
このとき主吸着器11から排出される洗浄排ガスは、自
動弁31および洗浄排ガス回収管34を通じて原料ガス
送風機10の上流側へ戻されることにより再回収され、
再び主吸着器12での吸着に供される。At this time, the cleaning exhaust gas discharged from the main adsorber 11 is returned to the upstream side of the raw material gas blower 10 through the automatic valve 31 and the cleaning exhaust gas recovery pipe 34 to be recovered again.
It is again subjected to adsorption in the main adsorber 12.
■脱着工程(第3図および第4図)
)初期(第3図)
自動弁23を開き、真空ポンプ14を作動させて主吸着
器11内を減圧し、脱着を行うとともに、自動弁42.
44を開き、主吸着器11から脱着されたガスを副吸着
器40内に送り込む。この副吸着器40により、脱着ガ
ス中に含まれる目的成分ガスが吸着される。■Desorption process (Figures 3 and 4)) Initial stage (Figure 3) Open the automatic valve 23, operate the vacuum pump 14 to reduce the pressure inside the main adsorber 11, and perform desorption.
44 is opened, and the gas desorbed from the main adsorption device 11 is sent into the sub adsorption device 40. This sub-adsorber 40 adsorbs the target component gas contained in the desorption gas.
この脱着工程の初期の段階では、主吸着器11から排出
される脱着ガス中にはまだ非目的ガスが多く含まれてい
るため、副吸着器40でも吸着されなかった残りのガス
は、製品ガスとして充分な純度は有していない。従って
、この初期の段階では、自動弁50を閉じ、自動弁51
のみを開くことによって、上記副吸着器40から排出さ
れるガスを廃棄管47を通じて装置外部へ廃棄する。At the initial stage of this desorption process, the desorption gas discharged from the main adsorber 11 still contains a large amount of non-target gas, so the remaining gas that was not adsorbed in the sub adsorber 40 is also used as the product gas. It does not have sufficient purity. Therefore, at this initial stage, the automatic valve 50 is closed and the automatic valve 51 is closed.
By opening only the sub-adsorber 40, the gas discharged from the sub-adsorber 40 is disposed of to the outside of the apparatus through the waste pipe 47.
ii )初期終了後(第4図)
上記脱着工程初期か終わり、脱着が進行すると、この脱
着ガス中に含まれる非目的成分は少量となり、この脱着
ガスは充分な純度を有する状態となる。このため、副吸
着器40で吸着されなかったガス、すなわち副吸着器4
0から排出されるガスも製品ガスとして利用に耐え得る
純度をもつ。従って、この期間では自動弁51を閉じ、
自動弁50のみを開くことにより、副吸着器40から排
出されたガスを製品ガスとして回収する。ii) After the initial completion (FIG. 4) When the desorption progresses at the beginning or end of the desorption process, the amount of non-target components contained in the desorption gas becomes small, and the desorption gas has sufficient purity. Therefore, the gas that was not adsorbed by the sub-adsorber 40, that is, the sub-adsorber 4
The gas discharged from 0 also has a purity sufficient to be used as a product gas. Therefore, during this period, the automatic valve 51 is closed,
By opening only the automatic valve 50, the gas discharged from the sub-adsorber 40 is recovered as product gas.
このように、脱着工程初期が終了した後は、副吸着器4
0て目的成分の吸着が行われなくても製品ガスの回収が
可能であるので、副吸着器40の吸着剤が破過状態とな
っても差支えない。In this way, after the initial stage of the desorption process is completed, the sub-adsorber 4
Since the product gas can be recovered even if the target component is not adsorbed at zero, there is no problem even if the adsorbent in the sub-adsorber 40 is in a breakthrough state.
従って、副吸着器40の吸着剤は、少なくとも脱着工程
初期で良好な吸着を行うことができるだけの吸着量を有
しておればよい。Therefore, the adsorbent in the sub-adsorber 40 only needs to have an adsorption amount sufficient to perform good adsorption at least in the initial stage of the desorption process.
■副吸着器40の脱着工程(第5図)
自動弁42.43を開き、真空ポンプ14を作動させる
ことにより、副吸着器40内を減圧し、吸着されている
ガスの脱着を行う。これとともに、自動弁56を開くこ
とにより、上記副吸着器4゜から脱着されたガスをバイ
パス管54を通じて製品ガス回収管46に送り込み、上
記脱着ガスを製品ガスとして回収する。(2) Desorption step of the sub-adsorber 40 (Fig. 5) By opening the automatic valves 42 and 43 and operating the vacuum pump 14, the pressure inside the sub-adsorber 40 is reduced and the adsorbed gas is desorbed. At the same time, by opening the automatic valve 56, the gas desorbed from the sub-adsorber 4° is sent through the bypass pipe 54 to the product gas recovery pipe 46, and the desorbed gas is recovered as product gas.
なお、このような副吸着器40の脱着工程が行われてい
る間、自動弁27.28を開き、主吸着器12内のガス
を主吸着器11内に供給することにより主吸着器11の
昇圧を行い、その後上記吸着工程に戻る。Note that while the desorption process of the sub-adsorber 40 is being performed, the automatic valves 27 and 28 are opened and the gas in the main adsorber 12 is supplied into the main adsorber 11, thereby depleting the main adsorber 11. The pressure is increased, and then the process returns to the adsorption step.
以上のように、この装置では、主吸着器11゜12の出
口側に副吸着器40を設け、この副吸着器40でも目的
成分の吸着を行うようにしているので、従来のように洗
浄工程に頼ることなく、また製品回収率を下げることな
く、高純度のガスを精製することができる。このため、
上記洗浄工程の削減、場合によっては洗浄工程の廃止を
実現することができる。洗浄工程を廃止する場合には、
第1図〜第5図において破線で示される要素、すなわち
洗浄ガス供給管36、洗浄排ガス回収管34、および各
自動弁31.32,37.38を省略することかできる
。As described above, in this apparatus, the sub-adsorber 40 is provided on the outlet side of the main adsorber 11, 12, and the target component is also adsorbed in this sub-adsorber 40, so that the cleaning process can be performed as usual. It is possible to purify high-purity gas without relying on the gas or reducing the product recovery rate. For this reason,
It is possible to reduce the cleaning process described above, and in some cases eliminate the cleaning process. When eliminating the cleaning process,
The elements indicated by broken lines in FIGS. 1 to 5, namely the cleaning gas supply pipe 36, the cleaning exhaust gas recovery pipe 34, and the automatic valves 31, 32, 37, 38, can be omitted.
しかも、この方法では、吸着工程初期が終了した時点、
すなわち、主吸着器11から吸引される脱着ガスの純度
が十分に高くなった時点からは、副吸着器40を通過す
るガスをも製品ガスとして回収し、主吸着器11の脱着
工程後期と副吸着器40の脱着工程の双方で製品ガスを
回収するようにしているので、上記主吸着器11の脱着
工程で製品ガスを回収する分、副吸着器40の脱着によ
り回収しなければならないガス量は少なくて済む。Moreover, in this method, when the initial stage of the adsorption process is completed,
That is, from the time when the purity of the desorption gas sucked from the main adsorption device 11 becomes sufficiently high, the gas passing through the sub-adsorption device 40 is also recovered as a product gas, and the gas passing through the sub-adsorption device 40 is also recovered as a product gas. Since the product gas is recovered in both the desorption processes of the adsorber 40, the amount of gas that must be recovered in the desorption process of the sub-adsorber 40 is equal to the amount of product gas recovered in the desorption process of the main adsorber 11. less.
従って、この副吸着器40の脱着に要する動力を極力削
減することにより、従来のように洗浄工程の実行によっ
て製品ガスの高純度化を図る方法に比へ、動力費の大幅
な節減を図ることができる。Therefore, by reducing the power required for desorption of the sub-adsorber 40 as much as possible, it is possible to significantly reduce power costs compared to the conventional method of achieving high purity of product gas by performing a cleaning process. I can do it.
次に、実験データを示す。前記第8図の従来装置におい
て、次頁の第1表に示される条件で運転を行い、−酸化
炭素の回収を行ったところ、運転開始から約2.75時
間経過した後に、純度98゜7%の製品ガスを製品回収
率67%で安定して得ることができた。Next, experimental data will be shown. The conventional apparatus shown in FIG. 8 was operated under the conditions shown in Table 1 on the next page, and carbon oxide was recovered. After about 2.75 hours from the start of operation, the purity was 98.7. % of product gas could be stably obtained with a product recovery rate of 67%.
第1表
これに対し、第1図〜第5図に示される本発明装置を次
頁の第2表の条件で運転し、同じく一酸化炭素ガスの純
度が98,7%となるように通路切換のタイミングを調
節したところ、運転開始後1時間以内に、上記純度をも
つ製品ガスを回収率73%で得ることかできた。(以下
、余白)ここで、洗浄時のガス量は製品ガスの全回収量
の1/2に相当するが、実際には製品の高純度化を図る
ため、それ以上の洗浄ガス量が要求されることになる。Table 1: On the other hand, the apparatus of the present invention shown in FIGS. By adjusting the switching timing, it was possible to obtain product gas with the above purity at a recovery rate of 73% within one hour after the start of operation. (Hereafter, blank space) Here, the amount of gas during cleaning is equivalent to 1/2 of the total amount of product gas recovered, but in reality, a larger amount of cleaning gas is required in order to achieve high purity of the product. That will happen.
第2表
二こて、洗浄時のガス流量が0とあるのは、実質上、洗
浄工程が行われなかったことを示している。In Table 2, the fact that the gas flow rate during cleaning is 0 indicates that substantially no cleaning process was performed.
この結果は、本発明方法および装置が、従来と比べて安
定化時間、製品回収率、ともに優れていることを示して
いる。This result shows that the method and apparatus of the present invention are superior to the conventional method in both stabilization time and product recovery rate.
また、本発明方法では、従来の洗浄工程を行う方法と同
様に、主吸着器11.12の脱着および副吸着器40の
脱着の双方を行う必要があるか、上にも述べたように、
主吸着器11.12の脱着工程初期終了後はこの脱着工
程中でも製品ガスを回収しているので、その分、副吸着
器40の脱着で回収する製品ガス量を抑えることができ
、このため、洗浄工程に大きく頼る従来方法に比べ、動
力費の削減を図ることができる。具体的に、上記第1図
〜第5図の装置において自動弁56の下流側に積算流量
計を設け、上記条件下での運転中に副吸着器40から脱
着、回収される製品ガスの総量を検出したところ、この
量はサイクル全体の回収量の27%程度であることが確
かめられている。In addition, in the method of the present invention, as in the conventional method of performing a cleaning step, it is necessary to perform both the desorption of the main adsorbers 11 and 12 and the desorption of the sub-adsorption device 40, as described above.
After the initial stage of the desorption process in the main adsorbers 11 and 12 is completed, the product gas is recovered even during this desorption process, so the amount of product gas recovered in the desorption process in the sub-adsorber 40 can be reduced accordingly. Compared to conventional methods that rely heavily on the cleaning process, power costs can be reduced. Specifically, in the apparatus shown in FIGS. 1 to 5, an integrating flow meter is provided downstream of the automatic valve 56, and the total amount of product gas desorbed and recovered from the sub-adsorber 40 during operation under the above conditions is measured. It has been confirmed that this amount is about 27% of the total recovery amount of the cycle.
さらに、この実施例装置では、真空ポンプ14を主吸着
器11.12に関する脱着手段および副吸着器40に関
する脱着手段として兼用しているので、装置の簡略化お
よび低コスト化を図ることができるとともに、主吸着器
11.12の脱着および副吸着器40の脱着が誤って同
時に行われることを未然に防ぐことができる効果がある
。Furthermore, in this example device, the vacuum pump 14 is used both as a desorption means for the main adsorber 11 and 12 and as a desorption device for the sub-adsorption device 40, so the device can be simplified and reduced in cost. This has the effect of preventing the desorption of the main adsorbers 11, 12 and the sub adsorption device 40 from being mistakenly performed at the same time.
なお、上記実施例では、脱着工程初期の終了後も主吸着
器11.12からの脱着ガスを副吸着器40に導くよう
にしているが、この脱着工程後期では副吸着器40によ
る吸着は特に必要としないので、第6図に示されるよう
に、主吸着器11゜12からの脱着ガスをバイパス管5
4を通じて直接回収側へ送るようにしてもよい。In the above embodiment, the desorption gas from the main adsorbers 11 and 12 is led to the sub-adsorber 40 even after the end of the initial stage of the desorption process, but in the latter stage of the desorption process, the adsorption by the sub-adsorber 40 is particularly Since this is not necessary, as shown in FIG.
4 may be directly sent to the collection side.
また、本発明において、脱着工程初期の具体的な時間に
ついては、装置の具体的な仕様に応じて適宜設定すれば
よ(、具体的には、脱着ガスが高純度状態に安定する時
点をもって脱着工程初期の終了とすることが望ましい。In addition, in the present invention, the specific time at the initial stage of the desorption process may be set as appropriate depending on the specific specifications of the apparatus (specifically, the desorption process starts when the desorption gas stabilizes in a high purity state). It is desirable to end the process at the beginning of the process.
また、本発明では、主吸着器および副吸着器の具体的な
構造および個数を問わず、適宜設定すればよい。ただし
、上記実施例に示されるように複数の主吸着器を装備す
ることにより、製品ガスの精製を連続的に行うことがで
きる。Further, in the present invention, the main adsorption device and the sub adsorption device may be appropriately set regardless of their specific structure and number. However, by equipping a plurality of main adsorbers as shown in the above embodiment, the product gas can be continuously purified.
以上のように本発明は、主吸着器の脱着工程初期におい
ては、脱着されたガスをさらに副吸着器に導き、ここで
目的成分を吸着させ、この脱着工程初期か終了した後は
、脱着されるガスを製品ガスとして回収し、さらに、脱
着工程後に副吸着器の脱着を行って脱着ガスを製品ガス
として回収するようにしたものであるので、洗浄工程の
削減あるいは廃止を図りながら、製品ガスの純度を高純
度に維持することができ、これによって動力費の削減や
製品回収率の向上を図ることができる効果がある。As described above, in the present invention, in the early stage of the desorption process of the main adsorber, the desorbed gas is further guided to the sub-adsorber, where the target component is adsorbed, and after the desorption process is completed, the desorbed gas is This system recovers the desorbed gas as product gas, and then desorbs the sub-adsorber after the desorption process and recovers the desorbed gas as product gas. The purity of the product can be maintained at a high level, which has the effect of reducing power costs and improving the product recovery rate.
第1□□□は本発明の一実施例における高純度ガス精製
装置において主吸着器の吸着工程時のガスの流れを示す
全体構成図、第2図は同装置において主吸着器の洗浄工
程時のガスの流れを示す全体構成図、第3図は同装置に
おいて主吸着器の脱着工程初期のガスの流れを示す全体
構成図、第4図は同装置において主吸着器の脱着工程初
期終了後のガスの流れを示す全体構成図、第5図は同装
置において主吸着器の昇圧工程時および副吸着器の脱着
工程時のガスの流れを示す全体構成図、第6図は同装置
において副吸着器の脱着工程時のガスの流れの変形例を
示す全体構成図、第7図は同装置の各主吸着器および副
吸着器において実行される工程を示す工程図、第8図は
従来の高純度精製装置の一例を示す全体構成図である。
10・・・原料ガス送風機(原料ガス供給手段)、11
.12・・・主吸着器、14・・・真空ポンプ(脱着手
段および副脱着手段)、40・・・副吸着器、46・・
・製品ガス回収管、47・・・廃棄管、50.51・・
・自動弁(通路切換手段)。
特許出願人 株式会社 神戸製鋼折代 理 人
弁理士 小谷 悦司第
図1st □□□ is an overall configuration diagram showing the gas flow during the adsorption process of the main adsorber in a high purity gas purification device according to an embodiment of the present invention, and Fig. 2 is a diagram showing the flow of gas during the main adsorber cleaning process in the same device. Figure 3 is an overall configuration diagram showing the gas flow at the beginning of the desorption process in the main adsorber in the same equipment, and Figure 4 is an overall diagram showing the gas flow in the same equipment at the beginning of the desorption process in the main adsorption unit. Figure 5 is an overall configuration diagram showing the gas flow during the pressure increase process in the main adsorber and the desorption process in the sub-adsorber in the same equipment, and Figure 6 is an overall configuration diagram showing the gas flow in the equipment during the pressure increase process in the main adsorber and the desorption process in the sub-adsorber. An overall configuration diagram showing a modified example of the gas flow during the desorption process of the adsorber, Fig. 7 is a process diagram showing the steps executed in each main adsorber and sub-adsorber of the same device, and Fig. 8 is a conventional FIG. 1 is an overall configuration diagram showing an example of a high purity purification apparatus. 10... Raw material gas blower (raw material gas supply means), 11
.. 12... Main adsorption device, 14... Vacuum pump (desorption means and sub-desorption means), 40... Sub-adsorption device, 46...
・Product gas recovery pipe, 47...Disposal pipe, 50.51...
・Automatic valve (passage switching means). Patent Applicant Kobe Steel Oriyo Co., Ltd. Patent Attorney Etsushi Kotani
Claims (1)
原料ガス中の目的成分を選択的に吸着させる吸着工程と
、上記主吸着器内を減圧することにより上記吸着剤に吸
着されたガスを脱着する脱着工程とを順次行い、この脱
着したガスを回収する高純度ガスの精製方法において、
上記脱着工程の初期では主吸着器の吸着剤から脱着され
たガスを吸着剤を有する副吸着器に導いて上記ガス中の
目的成分を吸着させ、この脱着工程初期の終了時から脱
着工程終了時までの期間では主吸着器から脱着されたガ
スを製品ガスとして回収し、上記脱着工程の後は副吸着
器内を減圧してこの副吸着器内の吸着剤に吸着されたガ
スを脱着し、このガスを製品ガスとして回収することを
特徴とする吸着法による高純度ガスの精製方法。 2、原料ガス中の目的成分を選択的に吸着する吸着剤を
有する主吸着器と、この主吸着器に原料ガスを供給する
原料ガス供給手段と、上記主吸着器内を減圧してガスを
脱着させる脱着手段とを備えた高純度ガスの精製装置に
おいて、上記主吸着器の出口側に接続され、この主吸着
器から脱着されたガス中の上記目的成分を選択的に吸着
する吸着剤を有する副吸着器と、この副吸着器内を減圧
してガスを脱着させる副脱着手段と、この副吸着器の出
口側の通路を同副吸着器から排出されたガスを回収側へ
送る通路と廃棄側へ送る通路とに選択的に切換える通路
切換手段とを備えたことを特徴とする吸着法による高純
度ガスの精製装置。[Claims] 1. An adsorption step in which a raw material gas is passed into a main adsorbent having an adsorbent to selectively adsorb target components in the raw material gas, and the adsorbent is removed by reducing the pressure inside the main adsorbent. In a high-purity gas purification method that sequentially performs a desorption step of desorbing the gas adsorbed to the gas and recovering the desorbed gas,
At the beginning of the desorption process, the gas desorbed from the adsorbent in the main adsorbent is guided to the sub-adsorption unit having an adsorbent to adsorb the target component in the gas, and from the end of the initial desorption process to the end of the desorption process. During the period up to, the gas desorbed from the main adsorber is recovered as product gas, and after the desorption step, the pressure inside the sub-adsorber is reduced to desorb the gas adsorbed by the adsorbent in this sub-adsorber. A method for purifying high-purity gas using an adsorption method, which is characterized by recovering this gas as a product gas. 2. A main adsorber having an adsorbent that selectively adsorbs target components in the raw material gas, a raw material gas supply means for supplying the raw material gas to the main adsorber, and a gas supply unit that reduces the pressure inside the main adsorber to In a high-purity gas purification apparatus equipped with a desorption means for desorption, an adsorbent is connected to the outlet side of the main adsorption device and selectively adsorbs the target component in the gas desorbed from the main adsorption device. a sub-adsorber having a sub-adsorber, a sub-desorption means for depressurizing the inside of the sub-adsorber to desorb the gas, and a passage on the outlet side of the sub-adsorber for sending gas discharged from the sub-adsorber to a recovery side. 1. An apparatus for purifying high-purity gas using an adsorption method, characterized by comprising a passage switching means for selectively switching between a passage to a waste side and a passage to be sent to a waste side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2107749A JPH047013A (en) | 1990-04-23 | 1990-04-23 | Method and device for producing highly pure gas by adsorption process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2107749A JPH047013A (en) | 1990-04-23 | 1990-04-23 | Method and device for producing highly pure gas by adsorption process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH047013A true JPH047013A (en) | 1992-01-10 |
| JPH0583286B2 JPH0583286B2 (en) | 1993-11-25 |
Family
ID=14466997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2107749A Granted JPH047013A (en) | 1990-04-23 | 1990-04-23 | Method and device for producing highly pure gas by adsorption process |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH047013A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5681369A (en) * | 1996-05-10 | 1997-10-28 | Jordan Holding Company | Apparatus and method for recovering volatile liquid |
| US8979982B2 (en) | 2013-05-01 | 2015-03-17 | Jordan Technologies, Llc | Negative pressure vapor recovery system |
-
1990
- 1990-04-23 JP JP2107749A patent/JPH047013A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5681369A (en) * | 1996-05-10 | 1997-10-28 | Jordan Holding Company | Apparatus and method for recovering volatile liquid |
| US8979982B2 (en) | 2013-05-01 | 2015-03-17 | Jordan Technologies, Llc | Negative pressure vapor recovery system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0583286B2 (en) | 1993-11-25 |
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