JPH0470734U - - Google Patents
Info
- Publication number
- JPH0470734U JPH0470734U JP11416790U JP11416790U JPH0470734U JP H0470734 U JPH0470734 U JP H0470734U JP 11416790 U JP11416790 U JP 11416790U JP 11416790 U JP11416790 U JP 11416790U JP H0470734 U JPH0470734 U JP H0470734U
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- processing liquid
- internal space
- liquid
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000012993 chemical processing Methods 0.000 description 4
- 239000012050 conventional carrier Substances 0.000 description 1
Landscapes
- Weting (AREA)
Description
第1図は本考案に係る薬液処理装置の実施例を
示す要部側断面図、第2図と第3図は第1図薬液
処理装置のキヤリア側板における各透孔を示す各
部分側面図、第4図は第1図薬液処理装置のキヤ
リア底板におけるスリツトを示す部分側面図、第
5図は従来のキヤリアを示す斜視図、第6図は従
来の薬液処理装置の一具体例を示す要部側断面図
である。
4……ウエーハ、10……キヤリア、11……
処理液供給手段、12……側板、13……端板、
14……底板、15……流下管、16……吹き上
げ管、17……シヤワ、20……処理液。
FIG. 1 is a sectional side view of main parts showing an embodiment of the chemical processing device according to the present invention, FIGS. 2 and 3 are partial side views showing each through hole in the carrier side plate of the chemical processing device shown in FIG. 1, Fig. 4 is a partial side view showing the slit in the carrier bottom plate of the chemical processing device shown in Fig. 1, Fig. 5 is a perspective view showing a conventional carrier, and Fig. 6 is a main part showing a specific example of the conventional chemical processing device. FIG. 4...Wafer, 10...Carrier, 11...
Processing liquid supply means, 12... side plate, 13... end plate,
14...Bottom plate, 15...Downflow tube, 16...Blow up tube, 17...Shower, 20...Treatment liquid.
Claims (1)
下開口の矩形枠体からなり、その内部空間に複数
の半導体ウエーハを整列状態で収納・保持し、上
記内部空間を処理液が流れる液槽としたキヤリア
と、上記キヤリアの上方又は下方に配され、キヤ
リア内に処理液を流入させる処理液供給手段とを
具備したことを特徴とする薬液処理装置。 It consists of a rectangular frame with upper and lower openings formed by opposing pairs of side plates and end plates, and a liquid tank in which a plurality of semiconductor wafers are housed and held in an aligned state in the internal space, and a processing liquid flows through the internal space. What is claimed is: 1. A chemical liquid processing apparatus, comprising: a carrier; and a processing liquid supply means disposed above or below the carrier to cause a processing liquid to flow into the carrier.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11416790U JPH0470734U (en) | 1990-10-30 | 1990-10-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11416790U JPH0470734U (en) | 1990-10-30 | 1990-10-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0470734U true JPH0470734U (en) | 1992-06-23 |
Family
ID=31861830
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11416790U Pending JPH0470734U (en) | 1990-10-30 | 1990-10-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0470734U (en) |
-
1990
- 1990-10-30 JP JP11416790U patent/JPH0470734U/ja active Pending
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